201124350 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種石灸:玻璃元件，其至少具一作用為散射或 反射層之不透明中央區，以及關於一種方法，用以製造此類石英 玻璃元件。 【先前技術】 許多技術應用，石英玻璃元件會被暴露於高溫負載當中。其 中，除了高溫穩定度及溫度變化耐受度之外，良好隔熱效果亦扮 演重要角色。熱石英玻璃可做為熱輻射導體，並加以利用，使能 量透過熱輻射由爐内排出。關鍵部位，通常不允許超過預定溫度， 以避免密封元件或隔離材料過度受熱，例如該元件末端之凸緣。 不透明石英玻璃有助於減少穿透量，或改變由石英玻璃元件 穿透出之光譜。有許多不同方法可以用來製造不透明特性，其中， 不透明特性係由石英玻璃元件本體或表面之改變，或透過組合元 件之製造產生。 用以避免導熱之組合元件，舉例來說，其應用形式為間距保 持器（即所謂之「墊片」），或透過元件之焊接完成，而該元件係由 透明及不透明石英玻璃之合成體構成，内有不透明區域。此種方 法需繁複之接合及安裝步驟，通常以手工製做，也容易形成廢料。 表面為透明之石英玻璃元件之改變方法，係透過噴砂或腐蝕 之磨糙法，以便產生一種熱量及反射光線之表面。另一種方法， —如德國專利案第DE 10 2004 051 846號所揭露者，係加装一層 能反射熱輻射之表面層。其係建議，於一石英玻璃元件上由不透 明石英玻璃所製成’且能散射及反射之反射層，係由透明石英玻 璃以泥漿法製成。一種能澆灌、含非晶系二氧化矽(Si〇2)粒子之泥 漿，係塗抹於石英玻璃元件表面，成為泥漿層，然後再乾燥，並 201124350 燒結’以形成或多或少不透明之石英玻璃層。 —但此種方法有缺點’其元件表面會有坑洞而且不平滑，且合 隨著時間增加受化學伽而改變。然而石英玻璃元件經常暴露ς 化學侵触環境下，因鱗於化學耐受度及腐減拒度，甚至壽命 及粒子純淨度，都有很高之要求，而„_不光滑之表面無法以足夠 程度滿足其需求。 關於石英玻璃元件壽命，接近表面區域之氣泡淨練度，亦 扮次重要角色。首先，因為封閉氣泡可能於使用期間經由材料損 壞或清潔程序關π，並導致雜質或微粒錢，使該元件壽命中 止’播法再用於微粒敏感之應用。 因此，即使係完全由不透明石英玻璃所製成，用以屏蔽熱輻 射之元件’通常希望具有足解、不含氣泡之表面層。於一=致 上不透明之石魏璃元件上’製造表面為光滑之隔熱或遮光石英 玻璃之方法，德國專利案第DE444〇 1〇4C2號已有敘述。化學純 度為列.9% 1氧化珍(別〇2)之二氧化邦必)粒子水懸浮液，將注 入石膏模型内，而以此種方式所取得之綠體，將置於爐内，以 1350 C至1450 C之燒結溫度加熱，燒結成為一由不透明石英玻璃 構成之基本型體。隨後，不透明基本型體之表面將以氫氧焰局部 加熱到1650t至2220°C之高溫，使不透明之基本材料表面區域， 轉變成為透明之石英玻璃。 利用此方法，即可得到一種中央區不透明，且表面層為透明 石英厚玻璃之石英玻璃元件。但厚度大於2mm之透明層幾乎無法 達到，因為燒結過程中所形成之厚表面層，使以下本體難以達到 足夠熱度。此問題無法利用較高之火焰溫度解決，因為此方法會 使該元件產生塑性形變，並產生氣狀之一氧化碎(Si〇)蒸氣。 此種增大密閉燒結表面層厚度之方法，其演變過程係根據德 201124350 國專利案第DE 10 2007 030 698 A1號之建議，於第一步先使用二 氧化矽(Si〇2)泥漿產生綠體，然後再塗上一層由其他泥漿所構成之 泥漿層，此種泥漿含大量具有燒結活性之二氧化矽(Si〇2)奈米粒 子，因此也有一相較之下較低之燒結溫度。經過燒結後，即可於 一不透明之基本形體上，得到一密實，且相對而言較厚之密封層。 具燒結活性之上層泥漿覆層於玻璃化之過程中，位於下方基 本形體之不透明材料也會產生變化，此變化可能導致應力及應 變。針對此點，上述泥漿法即需使用高純度、難以製備之粉末狀 材料，以及大量製程步驟，該些皆使製造程序變貴。 【發明内容】 本發明之基本目的，係提出一簡單而便宜之方法，用以重覆 製造一表面光滑且密實，而且尺寸精準度很高之石英玻璃元件， 該元件至少具一能屏蔽熱輻射之不透明中央區。 本發明方法之目的，係以如下方式解決，即讓石英玻璃元件 由透明石英玻璃製備而成，並且於石英玻璃元件内部，利用雷射 内雕法於300μηι或更深之深度形成玻璃結構缺陷，以產生一平面 狀之不透明中央區。 本發明係由一元件為起點’該元件係由透明石英玻璃所構 成。與特定不透明或半透明石英玻璃之製造相比，由人工合成之 二氧化矽(Si02)或由自然生產之石英原料製作透明石英玻璃，並沒 有特殊技術難度。該元件内部係以雷射内雕法產生不透明中央 區’該區適合以光學散射及反射之方式，來反射並阻隔熱輻射。 於石英玻璃元件内部製造不透明中央區，需利用雷射内雕法 產生缺陷。缺陷會形成玻璃結構之裂縫或融化區，其中融化區基 本上具有不同密度之點狀團塊’而裂縫基本上係射線形狀，長度 由幾個μιη —直到最大之ΙΟΟμιη組成。此類缺陷形成法，對於玻 201124350 璃塊上面製做裝飾用圖案、書寫文字或記號而言，基本上係已知， 由橫向落下之光線即可看見該缺陷。例如歐洲專利案第EP 〇 543 899 B1號’即敍述一種利用雷射内雕法於玻璃塊上產生記號之方 法’其中雷射射線係聚焦於該玻璃元件内部之記號區内。雷射射 線之能量密度大小，使記號區產生永恆之變化。因此，比如說雷 射射線之工作波長為紅外線波長領域(1.06μιη)時，記號區内建議之 能量密度最少即需為10J/cm2,因為該能量密度波適合使局部之玻 璃分子離子化。 根據本發明’透明石英玻璃基體不透明中央區之製作方式， 使該中央區適合作為熱輻射之散射、反射或隔離層 。此處係以雷 射内雕法讓石英玻璃結構產生許多點狀或裂缝狀缺陷，該缺陷於 觀察方向看去為並排或間隔狀排於一起，且具相同或類似之幾何 形狀，而且於觀察方向有一密集疊於一起之範圍，形成一扁平狀 之印象，與點狀或線狀安排相反。最簡單之情形為，扁平狀散射 中央區或反射中央區係與元件表面平行，而且做成平面狀；該中 央區也可與元件表面呈傾斜，或做成内凹或外凸狀。 利用雷射内雕法，可經由局部輻射精準植入所需缺陷，使其 具有預定大小、幾何形狀、密度，且不會傷到石英玻璃元件表面。 此外，兀件表面至缺陷之間距，以及缺陷表面層之厚度，都可預 疋，根據本發明，該厚度至少為3〇〇μιη。不透明中央區之散射或 反射特性，僅由缺陷之形成產生，並不會改變玻璃之組成成份， 如此即可避免由不同熱祕係數所引起之機械應力，並簡化加 工。即使幾何形狀複雜之石英玻璃元件，也可利用此種方式簡單 5又置一層熱輻射之散射或反射及隔離層，而且尺寸精準度很高。 雷射内雕法所產生之缺陷，可隨機分布，或以預定之排列方 式產生。除了表面鄰近區域厚度至少3〇〇μιη之一層之外，缺陷會 201124350 填滿元件整體或元件整體之局部。缺陷會形成個別、散射或反射 之扁平產物’或為許多彼此分離或彼此相關之扁平產物。 雷射内雕法通常採用固態雷射，例如Nd:YAG或Nd:YV04。 當玻璃結構產生平面格點狀缺陷時，表現最佳。 此時，玻璃結構之缺陷係以電腦控制之機械產生，因此，缺 陷產生位置之間之側面間距，可於平面格點上保持常數，或以預 定之方式變化。與缺陷產生位置完全相同之格點，不需改變用以 產生雷射内雕法之焦距或能量。如此，即可簡單快速產生不透明 中央區，並且讓散射及反射特性有特別高之重現性。 由垂直於格點平面方向看去，最好有許多扁平狀玻璃結構之 缺陷格點層層相疊於一起。 不透明中央區之厚度，係由雷射内雕法所產生，層層相疊於 一起之缺陷格點平面所定義。與缺陷產生位置相鄰之格點平面， 通常偏離雷射主要傳播方向，但如果較深之缺陷優先產生時，也 可互相重疊。讓相鄰之格點缺陷產生位置偏移，可能會產生非等 向性之散射、反射或熱衰減特性。隨格點平面間距之不同，於該 平面法線方向之投影，比其垂直方向之投影有較高缺陷密度(每平 面單位）。 較小之不透明中央區厚度，或中央區具有局部較小之缺陷厚 度，會導致不透明度變小。截至目前為止，根據本發明方法可使 一具有明確、較小不透明度之石英玻璃製造變得相當簡單，而且 為非慣常習知之方法。扁平狀不透明中央區形成時，若要形成有 效之隔熱，必須保證於平面法線方向至少擴大lmm，最好擴大範 圍為4mm至l〇mm。 不透明中央區於熱輻射主要傳播方向擴得越大，相同局部缺 陷密度下所入射之熱輻射被散射成份越大。當扁平狀不透明中央 201124350 區之擴大小於lmm時，熱輻射之散射、反射及隔離效果就很小。 當擴大超過10mm時，產生一層之花費與熱輻射之散射、反射及 隔離之增加相比，已不具經濟意義。 當不透明中央區至少於某一方向之缺陷數量或大小係有變化 率，對於石英玻璃元件之某些應用而言為優點。 於某一方向逐漸增加之缺陷數量及/或缺陷大小，會使石英玻 璃元件於該方向之不透明度逐漸增加，而且舉例來說會有如下用 處，即熱量於一段路徑中逐漸開脫，以免熱輻射於突然開脫或阻 隔區域内形成熱堆積。 鄰近缺陷，最好有50μιη以上之平均間距，彼此之平均間距範 圍最好係60μιη至300μιη。 如此一來，石英玻璃元件於不透明中央區内之機械弱化，即 可大幅避免。 當石英玻璃元件產生不透明中央區之後，再施予熱處理，而 該熱處理包含加熱至120(TC至1400°C之溫度範圍時，為有益。 熱處理會促使較尖銳之缺陷尖角及裂縫尖端融化。和其他缺 陷區域相比，此類尖角及尖端因為具有較高之燒結活性或毛細管 效應，所以相對而言較容易融化。針對此點，快速加熱或短暫置 於較高溫度中或以較低溫度緩慢加熱或長時間置於較低溫度中， 均能滿足要求。 當元件越大，缺陷密度及缺陷數量對於元件之熱處理越有意 義。透過熱處理，即可解除機械應力。針對此目的，該元件於雷 射内雕法結束後即加熱至950。(：至1200。(：之範圍，而且於較高溫 度下保持一定之時間，然後再緩慢冷卻，一如光學石英玻璃也很 常見之「消除應力熱處理」那般。 不透明中央區係由一優良方法產生，該中央區與石英玻璃元 201124350 件之受照 射面平行伸展。 英坡璃元件之受照射面通常係指一種 =(隔離之频射之主要傳播方向垂直。與受照射二= =區’驗’ 0初元絲㈣=不透明 改麦用以進行雷射内雕法之雷射焦點或能量。 ° 點，不 =明巾央區係由另—同㈣良方法產生，該巾央區係伸展 ;平，，而該平面與石英玻璃元件之受照射面傾斜。' 石英坡璃元件之受照射面㈣-種表面，絲面與 (隔離之)熱1¾射之主要傳播方向垂直，斜之平面法線，會把要被 反射之(隔離之)熱輻射由主要傳播方向上引開。此一類之元件，舉 例來說可當做過濾器或遮蔽器使用。 、止根據本發明方法，—特別優良之變化係—石英玻璃元件之製 造，該7L件係由許多石英玻璃單元組成，而該石英玻璃單元中， 至少有一中央區係於組合後製成。 石英坡璃元件，舉例來說係指一種用於半導體製造或應用於 化學工業之器械。該元件係由許多石英玻璃單元所組成，該些單 元通常係彼此焊接而成。於焊接過程中導入石英玻璃單元之熱 玄，可说會導致變形。細部結構或石英玻璃單元内之缺陷，可能 因此而改變或被破壞，讓不透明石英玻璃單元局部變成透明。根 據本發明之方法，可利用簡單方式於不透明中央區内後續製造缺 陷，所以此些缺陷後續就不會改變。 關於石英玻璃元件，以本文開頭所述類型之石英玻璃元件為 起點之前述目的，係以如下方式解決，即於深度soopm或更深之 處’設置一扁平之不透明中央區，該區係由形式為裂縫或融化區 域之玻璃結構缺陷所構成。 根據本發明，由透明石英玻璃製成之石英玻璃元件具一不透 201124350 明中央區，該區適合做為純射之散射、反射或隔離層，而熱麵 射則係被形式為裂縫或融化區域之石英玻璃結構缺陷所壓制。: 此即形成-種組態’該組態至少於視線方向上與人射之熱輕射基 本^垂直’而且呈扁平狀。用以散射或反射之扁平狀中央區， 最簡單之情形為平行於元件表面，而且做成平面；但中央區也可 與元件表面呈傾斜角或内凹或外凸。 除了表面鄰近區域有至少3〇〇μιη之一層之外，缺陷會填滿元 件整體或7L件整體之局部。㈣會形成刪、散射或反射之產物， 或係許多彼此分離或彼此相關之產物。 不透明中央區基本上係根據前述雷射内雕法來產生。如此， 即可於精準之位置植人所驗陷，不會酬石英絲元件表面。 元件表面至缺陷之間距以及缺陷表面層之厚度，都可預定。 不透明中央區之散射或反射特性，僅由缺陷之形成產生，並 不會改變玻璃之組成成份’如此即可避免由不同熱膨脹係數所引 起之機械應力’並簡化加工。即使幾何形狀複雜之石英玻璃元件， 例如由許多石英玻璃單元組合而成之器械，也可利用此方式簡單 設置多層熱輻射之光學散射或反射及隔離層，且尺寸精準度很高。 舉例來說’石英玻璃元件可做成管狀、平板狀、圓頂狀。不 透明中央區係位於單一燒結側或二個燒結側下方，而且沿著圓拄 長軸方向阻隔熱輻射。 散射及反射特性取決於缺陷之大小、分布以及局部性密度， 而且可具有等向性。對於某些應用而言，例如過濾器或遮蔽器， 有一種應用形式為較佳，即其不透明中央區具有不等向光學特性。 石英玻璃元件對於波長為Ιμιη之光輻射具有直接之光譜穿透 性，而每一公釐之不透明區厚度可減少5%以上20%以下之穿透 量。 201124350 此方式具相當小之不透明度，讓該元件之應用特別適合 射或其他輻射之擴散性有較小需求之場合，例如於輻射之二間、輻 度分布不均勻之場合，做為擴散器或均勻器使用。 二強 本發明石英玻璃元件其他優良組態，係列於附屬 只要附屬申請項所提出之石英玻璃元件組態，根據本::;方:於 附屬申請項所述之方法建造，即為上述與方时請專利有關 應用之補充敘述。 【實施方式】 一邊長為10cm、厚度為5rmn及表面拋光之正方形石英玻璃 板，係使用Nd:YV〇4固態雷射，以波長為53施之雷射輻射加以 照射。其係以一般光學完成，使雷射輻射聚焦於石英玻璃板中心， 而焦點則位於表面下4.5mm之處。雷射以15kHz之脈衝頻率來 動，脈波週期為15ns及焦點嶋2GW左右。 雷射輻射之焦點係以1〇〇μιη間距之格點打於焦點平面上，並 於石英玻璃板中央，以隨機分布之傳播方向產生點狀之石英玻璃 、’、σ構缺陷，其平均直徑約為l〇〇pm。利用此方式，即可於整個平 面上產生由電腦控制格點之焦點植入式點狀缺陷。之後，焦點平 面會於雷射之方向上升200μιη，並且於相對之新焦點平面上，同 樣於整個平面產生間距150μιη、平均直徑約1〇〇μιη之格點狀缺 陷，而且偏移至底下一層焦點平面缺陷之正中央。此道程序及焦 點平面往上升高200μπι之動作’將不斷重覆，直至一層厚度為4mm 之缺陷層完工為止。 圖一所示為此種方法製成之石英玻璃板1，其中有許多平行之 缺陷平面係以雷射内雕法製成，同時形成一封閉且扁平之不透明 區2，該區伸展於一大約4mm之高度，而且適合用來做為熱散射 區。除了邊緣區域之外，不透明區2分布於平板1之整個平面之 11 201124350 平板中央。石英玻璃板之整個平面，即以此方式，由一透明、沒 有遮蔽、約〇.5mm之石英玻璃之表面層3構成。 隨後，石英玻璃板1將加熱至1250。(：，並且於此溫度下保持 10小時之久。如此一來，裂縫之尖角即會變圓或融化，但不會使 不透明區2之不透明度產生明顯變化。對於垂直於平面側方向入 射、波長為Ιμιη之輻射，石英玻璃板丨會讓穿透率減少4〇。/()。此 係一種微弱不透明度之石英玻璃板丨，穿透率之衰減相當小。此種 平板1適合做為擴散器，讓空間強度分佈不均勻之輻射均勻化。 圖二所示為一石英玻璃製成之光棒20，其具一入口耦合端21 及一截面為圓形不透明區22 ’該區被一未遮蔽之石英玻璃23包圍 住。 該光棒20之外徑為8mm，長度為l〇cm。不透明區22之直徑 為6mm，而長軸24方向上之長度為9cm。 不透明區22之製造，係採用上述方法’以雷射内雕法於其柱 狀圓周面照射而成。因此’光棒係逐步於其長轴上旋轉，並且利 用雷射照射其外壁，其焦點係於透明石英玻璃本體内。其雷射為 YVO4固態雷射’並以20kHz之脈衝頻率來驅動，脈波週期為15ns 及焦點能量為20J/cm2左右。 雷射内雕法之後’即可於石英玻璃本體内部產生點狀缺陷， 該缺陷之平均直徑為200μιη左右。不透明區22之特色，係入口搞 合端21至另一端之缺陷密度’係如圖表中以點狀線25所示那般， 呈指數增加。此處「DJ係指相對之缺陷密度。 由入口耦合端21入射之熱輻射，會於不透明區散射，並因此 由光棒20上開脫。理想情況下’會有一沿著長軸為均勻之開脫量， 一如圖表及塊狀箭頭26所示那般’其中「I」代表開脫熱輻射之相 對強度。 12 201124350 圖三係示意圖，表示一圓頂狀反應器u之縱剖面，〆如半導 體之製造用於蝕刻或化學氣相沉積(CVD)製程者。該反應器li係 由一透明石英玻璃製成之圓頂13及一圓柱狀部位16所構成，其 外徑為420mm，壁厚為4mm。其額面15有焊接一由不透明石英 玻璃所製成之凸緣14。 圓柱狀邵位16被一加熱裝置18所包圍，而且於一大約超過 50cm之長度上，佈滿一圍於四周之不透明區12，而該區係由雷射 内雕法製成，一如圖二所示之光棒那般。其缺陷係由照射於反應 器11之柱狀圓周面之輻射所產生，其中，於圓柱狀部位16之縱 軸方向上之環狀缺陷平面，係沿著縱軸12方向以2〇〇μιη<步距由 雷射植入法產生’並以300μιη之間距彼此並排一起。 不透明區12係由許多於中心軸17方向疊於一起、而且互為 平行面之缺陷平面所構成，缺陷平面含有點狀缺陷，缺陷之平均 大小約為50μιη，而格點之間距則設定為1〇〇μιη。與缺陷中心點相 鄰之缺陷平面，彼此偏移量分別係1〇μιη，因此，由中心軸方向看 去，會於不透明區12之長軸方向得到一強烈之不透明度，但相反 之，由柱狀圓周面方向看去，有一距離為3〇〇μιη之較大缺陷平面 間距’因此會有較小之不透明度，甚至還可瞥見反應器之内室。 因此，不透明區12之散射特性，係取決於輻射之入射方向。 、不透明區之每一面，均由未遮蔽之石英玻璃所包圍。此點， 於圖四之剖面圖中亦有明示。不透明區12之内部及外部，均被厚 度約〇.5mm，由無缺陷透明玻璃所製成之環狀區域19所包圍，如 此即可避免該表面受到傷害或變薄。此種不透明區12之厚度，至 多為3mm。 圖五所示為根據本發明一種應用形式為石英玻璃板5丨之石英 玻璃7G件’其中有—分成兩部分之τ、透明區，各為平板狀之不透 13 201124350 明區52及53。不透明區52及53係由雷射内雕法製成，而且四周 均被透明之供缺陷石英破璃3所包圍。不透明區52及53之間有 一窗戶54，該窗戶舉例來說，係於一側壁外表大致上為不透明之 石英玻璃器械上，做為層間窗戶，而該器械係由許多石英玻璃單 兀所組成。此處不透明區52及53、以及層間窗戶54 ,係於該器 械組合完成之後，即以雷射内雕法製成，一如上文中圖一所述那 般。 圖六所不為根據本發明石英玻璃元件之另一種應用形式，形 狀為邊長10cm及厚度5mm之正方形石英玻璃板61，内有許多長 方形之不透明區62。邊緣區63及不透明區62之間之區域3，均 由無缺陷之透明石英玻璃所構成。 由圖七俯視圖可看出，其不透明區62係彼此平行，而且除了 於平板61其中一侧保留一道無缺陷之邊緣63之外，均伸展至兩 侧，一如圖六及圖七所見，不透明區62之伸展長度為5mm，而不 透明區62之間之間距，同樣也係5mm。無缺陷之邊緣63，每一 側之厚度約為500μιη »不透明區62之邊線長度尺寸為 90mmx30mmx〇.5mm。因此，石英玻璃板61之光學穿透率，即可 透過該板於輻射路徑上之角度調整，產生大範圍變化，而且就此 而言’已可做為光學遮蔽器使用。 圖八為石英玻璃板61之圖示，顯示不透明區62於箭頭c(圖 七)之方向上，有最大遮蔽面積。由此方向看去，石英玻璃板61 可謂對於所有波長均為不透明。主要傳播方向為塊狀箭頭c(圖七） 之熱輻射，即近乎完全被隔絕，但主要傳播方向為塊狀箭頭B之 熱輻射，則係相反，呈現透明至半透明狀。本發明根據圖九應用 形式之石英玻璃元件，係一設有許多相同幾何圖案之不透明區92 之石英玻璃板91，該不透明區於縱軸93方向係間距排開，而且彼 201124350 此^行編排其形狀同樣也係長方形甚至為平行四邊形，而不透 明區92 (縱轴與石英玻璃板91之縱軸93彼此傾斜。不透明區92 係利用雷射内雕法製成，*且四周均被無㈣之透明石英玻璃3 所包圍。 於此種組態下，不透明區92之熱輕射穿透性會與方向產生強 烈關係。由縱軸方向看去，該平板91近乎不透明，但於與此垂直 之方向上’則或多或少為透明。 圖十之穿透率曲線，展示圖一元件之入射輻射之直接光譜穿 透率T(以％表示)與波長λ之關係，由石英玻璃板丨之平坦側之平 面法線方向測得。由此可看出，厚度為4mm之不透明區，於約 200nm至3500nm之波長範圍内會減少大約3〇%至6〇%之穿透量， 並因此產生一相對而言較小之不透明度。 【圖式簡單說明】 下文中，本發明將依據實施例及圖式進一步說明。以示意圖 圖示： 圖一一具有不透明中央區之石英玻璃板，應用為熱輻射之擴散 器，侧視截面圖， 圖二具有漸近式不透明中央區之光棒之中心截面圖，加上缺陷密 度變化’以及光棒長度方向上所開脫之光之強度分布， 圖三處理半導體晶圓所用之圓頂狀反應器，具有不透明中央區， 侧視截面圖， 圖四圖三之反應器沿A-A線之剖面圖， 圖五第〆實施例中’石英玻璃板之不透明中央區之幾何組態及方 向， 圖六另一實施例，正方形石英玻璃板之不透明中央區之幾何組態 及方向，侧視圖， 15 201124350 圖七圖六之石英玻璃板，由塊狀箭頭B(圖六）方向看去之俯視圖， 圖八圖六及圖七之石英玻璃板，由塊狀箭頭c(圖七)之角落方向 看去之側視圖， 圖九另一實施例，石英玻璃板之不透明中央區之幾何組態及方 向，以及 & 圖十一圖表，展示圖一元件於不透明區之垂直方向上波長範圍由 190nm至4800nm左右之穿透率T。 【主要元件符號說明】 1 石英玻璃板 2 不透明區 3 表面層 11 反應器 12 圍於四周之不透明區 13 圓頂 14 凸緣 15 額面 16 圓柱狀部位 17 中心軸 18 加熱裝置 19 環狀區域 20 光棒 21 入口耦合端 22 圓形不透明區 23 未遮蔽之石英破璃 24 長轴 201124350 25 缺陷密度 26 均勻之開脫量 D 相對之缺陷密度 I 強度 51 圓形石英玻璃板 52 > 53 平板狀之不透明區 54 窗戶 61 正方形石英玻璃板 62 不透明區 63 無缺陷之邊緣區 箭頭B、C 光之傳播方向 91 石英玻璃板 92 不透明區 93 縱軸 17201124350 VI. Description of the Invention: [Technical Field] The present invention relates to a stone moxibustion: a glass element having at least one opaque central region acting as a scattering or reflecting layer, and a method for fabricating such quartz Glass component. [Prior Art] For many technical applications, quartz glass components are exposed to high temperature loads. In addition to high temperature stability and temperature change tolerance, good thermal insulation also plays an important role. The hot quartz glass can be used as a heat radiation conductor and utilized to allow energy to be discharged from the furnace through heat radiation. The critical part, usually not allowed to exceed the predetermined temperature, to avoid excessive heating of the sealing element or insulation material, such as the flange of the end of the element. Opaque quartz glass helps to reduce the amount of penetration or to change the spectrum that is transmitted through the quartz glass element. There are a number of different methods that can be used to create opaque properties, wherein the opaque properties are caused by changes in the body or surface of the quartz glass component, or by the fabrication of the composite components. A composite component for avoiding heat conduction, for example, is applied as a spacer (so-called "shield"), or by soldering of a component which is composed of a composite of transparent and opaque quartz glass. There are opaque areas inside. This method requires complicated joining and installation steps, usually by hand, and it is easy to form waste. The method of changing the surface of a transparent quartz glass element is by sandblasting or etching to produce a heat and a surface that reflects light. Another method, as disclosed in German Patent No. DE 10 2004 051 846, is the addition of a surface layer which is capable of reflecting thermal radiation. It is suggested that a reflective layer made of opaque quartz glass on a quartz glass element and capable of scattering and reflecting is made of a transparent quartz glass by a mud method. A slurry capable of being poured and containing amorphous cerium oxide (Si〇2) particles is applied to the surface of a quartz glass element to form a slurry layer, which is then dried and sintered at 201124350 to form a more or less opaque quartz glass. Floor. - However, this method has the disadvantage that its surface will be pitted and not smooth, and the combination will change with chemical gaze over time. However, quartz glass components are often exposed to chemical ingress. Due to chemical resistance and corrosion reduction, even life and particle purity, there is a high demand, and „_smooth surface cannot be enough. To meet the needs of the quartz glass component life, close to the surface area of the bubble cleanliness, also plays a secondary role. First, because the closed bubble may be used during the use of material damage or cleaning procedures π, and lead to impurities or particulate money, The life of the component is suspended. The sowing method is reused for particle-sensitive applications. Therefore, even if it is made entirely of opaque quartz glass, the element for shielding heat radiation is generally desired to have a surface layer that is free of bubbles and free of bubbles. On the opaque stone glazed element, the method of making the surface is smooth heat-insulating or shading quartz glass, as described in German Patent No. DE444〇1〇4C2. The chemical purity is 9%. The water-suspension of the particles of Jane (Double 2) will be injected into the plaster model, and the green body obtained in this way will be placed in the furnace to 1350. The sintering temperature of C to 1450 C is heated and sintered into a basic body composed of opaque quartz glass. Subsequently, the surface of the opaque basic body will be locally heated to a high temperature of 1650t to 2220°C with an oxyhydrogen flame to make the opacity basic. The surface area of the material is transformed into transparent quartz glass. With this method, a quartz glass component with a central region opaque and a transparent quartz glass thick surface can be obtained. However, a transparent layer with a thickness greater than 2 mm can hardly be achieved because of the sintering process. The thick surface layer formed in the middle makes it difficult to achieve sufficient heat for the following body. This problem cannot be solved with a higher flame temperature because this method causes plastic deformation of the element and produces a gas oxidized ash (Si 〇). The method of increasing the thickness of the closed sintered surface layer is based on the proposal of DE 12 2007 030 698 A1, and the first step is to use a cerium oxide (Si〇2) slurry. Produce a green body, and then apply a layer of mud composed of other muds containing a large amount of sintered oxygen矽(Si〇2) nanoparticle, so there is also a lower sintering temperature. After sintering, a dense, relatively thick sealing layer can be obtained on an opaque basic body. In the process of vitrification with the upper layer of the sinter active mud layer, the opaque material located below the basic shape may also change, which may cause stress and strain. For this point, the above mud method needs to use high purity and is difficult to use. The prepared powdery material, as well as a large number of process steps, which make the manufacturing process expensive. [SUMMARY OF THE INVENTION] The basic object of the present invention is to provide a simple and inexpensive method for repetitively manufacturing a smooth and dense surface. Moreover, the quartz glass component with high dimensional accuracy has at least one opaque central region capable of shielding heat radiation. The purpose of the method of the present invention is to solve the problem that the quartz glass element is made of transparent quartz glass, and inside the quartz glass element, the glass structure defect is formed by laser engraving at a depth of 300 μm or deeper. Produces a planar opaque central zone. The present invention is based on a component which is constructed of transparent quartz glass. Compared to the manufacture of specific opaque or translucent quartz glass, the production of transparent quartz glass from synthetic cerium oxide (SiO 2 ) or from naturally produced quartz materials is not particularly technically challenging. The interior of the component is internally embossed to produce an opaque central zone. This zone is adapted to reflect and block the radiation by optical scattering and reflection. The manufacture of an opaque central area inside the quartz glass element requires the use of laser engraving to create defects. The defect forms a crack or melt zone of the glass structure, wherein the melt zone has substantially a dot-like mass of different densities, and the crack is substantially ray-shaped, and the length is composed of several μηη - up to the maximum ΙΟΟμιη. Such a defect formation method is basically known for making a decorative pattern, a writing letter or a mark on a glass block of 201124350, and the defect can be seen by the light falling from the lateral direction. For example, European Patent No. EP 543 899 B1' describes a method of generating marks on a glass block by laser engraving, wherein the laser beam is focused on the inside of the glass element. The energy density of the laser beam causes the mark area to change eternally. Therefore, for example, when the operating wavelength of the laser beam is in the infrared wavelength region (1.06 μm), the recommended energy density in the mark region is at least 10 J/cm 2 because the energy density wave is suitable for ionizing the local glass molecule. In accordance with the present invention, the opaque central region of the transparent quartz glass substrate is fabricated such that the central region is suitable as a scattering, reflecting or insulating layer for thermal radiation. Here, the laser glass structure is used to create a plurality of punctiform or crack-like defects in the quartz glass structure, which are arranged side by side or spaced apart in the viewing direction, and have the same or similar geometric shapes, and are observed. The direction has a densely stacked range that creates a flattened impression, as opposed to a point or line arrangement. In the simplest case, the flat scattering central region or the reflective central region is parallel to the surface of the element and is planar; the central portion may also be inclined to the surface of the element or may be concave or convex. With laser engraving, the desired defects can be precisely implanted via localized radiation to a predetermined size, geometry, density without damaging the surface of the quartz glass component. Furthermore, the distance from the surface of the element to the depth of the defect, as well as the thickness of the surface layer of the defect, can be expected to be at least 3 μm according to the invention. The scattering or reflection properties of the opaque central zone are produced only by the formation of defects and do not alter the composition of the glass, thus avoiding mechanical stresses caused by different heat-coefficients and simplifying the processing. Even quartz glass components with complex geometries can be easily fabricated in this way. 5 A layer of thermal radiation scattering or reflection and isolation layers is placed, and the dimensional accuracy is high. The defects produced by the laser engraving method may be randomly distributed or generated in a predetermined arrangement. In addition to one layer of the surface adjacent to the thickness of at least 3 μm, the defect will fill the component or the entire component as a whole. Defects can form individual, scattered or reflected flat products' or a plurality of flat products that are separated from each other or related to each other. Laser engraving usually uses solid-state lasers such as Nd:YAG or Nd:YV04. Best performance when the glass structure produces planar lattice-like defects. At this time, the defects of the glass structure are generated by a computer controlled machine, and therefore, the side spacing between the defective generation positions can be kept constant at the plane lattice points or changed in a predetermined manner. The grid points that are exactly the same as the location where the defects are generated do not need to change the focal length or energy used to create the laser engraving method. In this way, the opaque central zone can be produced simply and quickly, and the scattering and reflection characteristics are particularly reproducible. Viewed from the direction perpendicular to the plane of the lattice point, it is preferable that a plurality of defective lattice layers of the flat glass structure are stacked together. The thickness of the opaque central zone is produced by the laser engraving method, and the layers are stacked on top of each other to define the defect grid plane. The plane of the grid adjacent to the location where the defect is generated is usually offset from the main direction of propagation of the laser, but may overlap if the deeper defects are preferentially produced. Displacement of adjacent lattice point defects may result in anisotropic scattering, reflection or thermal attenuation characteristics. The projection in the normal direction of the plane has a higher defect density (per unit of the plane) than the projection in the vertical direction, depending on the plane spacing of the grid points. A smaller opaque central zone thickness, or a centrally located portion with a smaller defect thickness, results in less opacity. Up to now, the method according to the invention makes it possible to manufacture a quartz glass with a clear, low opacity which is relatively simple and which is not customary. When the flat opaque central zone is formed, in order to form effective heat insulation, it must be ensured that the normal direction of the plane is at least 1 mm wide, and preferably extends from 4 mm to 1 mm. The opaque central region expands more in the main propagation direction of thermal radiation, and the incident heat radiation at the same local defect density is larger by the scattering component. When the flat opaque central portion of the 201124350 area is less than 1 mm, the scattering, reflection, and isolation effects of thermal radiation are small. When expanded by more than 10 mm, the cost of producing a layer is not economically significant compared to the increase in scattering, reflection and isolation of thermal radiation. An opaque central zone has a rate of change in the number or size of defects in at least one direction, which is an advantage for certain applications of quartz glass components. The amount of defects and/or the size of the defects gradually increasing in a certain direction causes the opacity of the quartz glass element to increase gradually in this direction, and for example, there is a use in which heat is gradually opened and removed in a path to avoid heat radiation. Thermal build-up is formed in a sudden opening or blocking area. Adjacent defects, preferably have an average pitch of 50 μm or more, and the average pitch of each other is preferably 60 μm to 300 μm. As a result, the mechanical weakening of the quartz glass element in the opaque central region can be substantially avoided. After the quartz glass element produces an opaque central zone, heat treatment is applied, which is beneficial when heated to a temperature range of 120 (TC to 1400 ° C. The heat treatment promotes sharper sharp corners and crack tip melting. Such sharp corners and tips are relatively easy to melt because of their higher sintering activity or capillary effect compared to other defective areas. For this, rapid heating or briefing at higher temperatures or lower The temperature is slowly heated or placed in a lower temperature for a long time, which can meet the requirements. When the component is larger, the defect density and the number of defects are more meaningful for the heat treatment of the component. The mechanical stress can be relieved by heat treatment. For this purpose, the component At the end of the laser engraving method, it is heated to 950. (: to 1200. (: range, and kept at a higher temperature for a certain period of time, then slowly cooled, as is the case with optical quartz glass is also very common The stress-heat treatment is as follows. The opaque central zone is produced by an excellent method, and the central zone and the quartz glass element are illuminated by 201124350 pieces. The surface of the sloping glass element is usually referred to as a kind of = (the main propagation direction of the isolated frequency is vertical. The exposure is 2 = = area 'test' 0 0 elementary wire (4) = opaque wheat is used for The laser focus or energy of the laser engraving method. ° point, not = the central area of the towel is produced by another method of the same (four), the central area of the towel is stretched; flat, and the plane and the quartz glass element are affected by The illuminating surface is inclined. 'The illuminated surface of the quartz glass element (4) - the surface of the surface, the main surface of the silk surface and the (isolated) heat is perpendicular to the direction of propagation, and the normal plane of the oblique plane will be reflected (isolated) The heat radiation is directed away from the main direction of propagation. Elements of this type can be used, for example, as filters or shaders. The method according to the invention, particularly excellent variations, the manufacture of quartz glass elements, the 7L pieces It is composed of a plurality of quartz glass units, and at least one central portion of the quartz glass unit is formed by combination. Quartz glass elements, for example, refer to an apparatus for semiconductor manufacturing or application to the chemical industry. Component Quartz glass unit, which is usually welded to each other. The heat of the quartz glass unit introduced during the welding process can be said to cause deformation. The defects in the detailed structure or quartz glass unit may be changed or Destruction, the opaque quartz glass unit is partially rendered transparent. According to the method of the present invention, defects can be subsequently fabricated in the opaque central region in a simple manner, so that these defects are not subsequently changed. Regarding the quartz glass element, The aforementioned purpose of the quartz glass element of the type is to solve the problem of providing a flat opaque central zone in the depth of soopm or deeper, which is composed of defects in the glass structure in the form of cracks or melting zones. According to the present invention, the quartz glass member made of transparent quartz glass has a central area which is not transparent to 201124350, and the area is suitable for scattering, reflection or isolation of pure shots, and the hot surface is formed into cracks or The quartz glass structure defects in the melting zone are suppressed. : This forms a configuration. This configuration is at least perpendicular to the direction of the line of sight and is perpendicular to the human being and is flat. The flat central region for scattering or reflection, in the simplest case, is parallel to the surface of the element and is planar; however, the central region may also be at an oblique angle or concave or convex with the surface of the element. In addition to having a layer of at least 3 μm in the vicinity of the surface, the defect fills the entire part of the element or the entire part of the 7L piece. (d) The formation of products that are deleted, scattered or reflected, or many products that are separated or related to each other. The opaque central zone is basically produced in accordance with the aforementioned laser engraving method. In this way, it can be implanted in a precise position, and the surface of the quartz wire component will not be paid. The distance from the surface of the component to the defect and the thickness of the defect surface layer can be predetermined. The scattering or reflection characteristics of the opaque central zone are produced only by the formation of defects and do not change the composition of the glass 'thus to avoid mechanical stresses caused by different coefficients of thermal expansion' and to simplify processing. Even quartz glass components with complex geometries, such as those made up of many quartz glass units, can be used to simply set up optical scattering or reflection and isolation layers of multiple layers of thermal radiation with high dimensional accuracy. For example, a quartz glass element can be made into a tubular shape, a flat shape, or a dome shape. The opaque central zone is located below the single sintered side or under the two sintered sides and blocks the insulating radiation along the long axis of the circle. The scattering and reflection characteristics depend on the size, distribution, and local density of the defects, and may be isotropic. For some applications, such as filters or shutters, there is a preferred form of application in which the opaque central region has anisotropic optical properties. Quartz glass elements have direct spectral transmission for optical radiation having a wavelength of Ιμιη, and the thickness of each opaque area can be reduced by more than 5% to 20%. 201124350 This method has a relatively small opacity, making the application of this component particularly suitable for applications where the diffusion of radiation or other radiation is less demanding, such as in the case of radiation, where the distribution of the amplitude is not uniform, as a diffuser. Or use a homogenizer. The other two excellent configuration of the quartz glass component of the present invention, the series is attached as long as the configuration of the quartz glass component proposed in the attached application, according to the method described in the attached application, is the above-mentioned Please add a supplementary description of the patent application. [Embodiment] A square quartz glass plate having a length of 10 cm, a thickness of 5 rmn, and a surface finish was irradiated with a laser beam having a wavelength of 53 using a Nd:YV〇4 solid-state laser. It is done in general optics, focusing the laser radiation at the center of the quartz glass plate, while the focus is at 4.5 mm below the surface. The laser is driven at a pulse frequency of 15 kHz with a pulse period of 15 ns and a focus of about 2 GW. The focus of the laser radiation is placed on the focal plane at a lattice spacing of 1 〇〇μιη, and in the center of the quartz glass plate, a quartz glass, ', σ-structure defect, the average diameter of the quartz crystal glass is generated in a randomly distributed propagation direction. About l〇〇pm. In this way, a focus-implanted point defect that is controlled by a computer can be generated on the entire plane. After that, the focal plane will rise by 200μηη in the direction of the laser, and on the opposite new focal plane, the same plane will produce a dot-like defect with a pitch of 150μηη and an average diameter of about 1〇〇μηη, and shift to the bottom layer of focus. The center of the plane defect. This procedure and the action of raising the focal plane upward by 200 μm will continue to repeat until a layer of defects having a thickness of 4 mm is completed. Figure 1 shows a quartz glass plate 1 made by this method, in which a plurality of parallel defect planes are formed by laser engraving while forming a closed and flat opaque zone 2 which extends over an approximately It is 4mm high and is suitable for use as a heat scattering zone. In addition to the edge regions, the opaque regions 2 are distributed throughout the entire plane of the flat panel 1 in the center of the 201124350 tablet. The entire plane of the quartz glass plate, in this way, consists of a transparent, unmasked, surface layer 3 of quartz glass of about 5 mm. Subsequently, the quartz glass plate 1 will be heated to 1250. (:, and keep it at this temperature for 10 hours. As a result, the sharp corner of the crack will round or melt, but will not cause a significant change in the opacity of the opaque zone 2. For the direction perpendicular to the plane side The wavelength is Ιμιη radiation, quartz glass plate 丨 will reduce the penetration rate by 4 〇. / (). This is a kind of weak opacity of quartz glass plate 丨, the attenuation of the penetration is quite small. For the diffuser, the radiation with uneven spatial intensity distribution is homogenized. Figure 2 shows a light rod 20 made of quartz glass with an inlet coupling end 21 and a circular opaque area 22' The unobstructed quartz glass 23 is surrounded by an outer diameter of 8 mm and a length of 10 cm. The opaque region 22 has a diameter of 6 mm and the length of the long axis 24 is 9 cm. The manufacture of the opaque region 22 The above method is used to irradiate the columnar circumferential surface by laser engraving. Therefore, the 'light rod system gradually rotates on its long axis, and the outer wall is irradiated with a laser, and the focus is on the transparent quartz glass. The body. Its laser is Y The VO4 solid-state laser is driven by a pulse frequency of 20 kHz with a pulse period of 15 ns and a focal energy of about 20 J/cm 2 . After the laser engraving method, a point-like defect can be generated inside the quartz glass body. The average diameter is about 200 μηη. The characteristic of the opaque zone 22 is that the defect density of the inlet end 21 to the other end is exponentially increased as indicated by the dotted line 25 in the graph. Here, "DJ means relative The density of the defect. The thermal radiation incident from the inlet coupling end 21 will scatter in the opaque area and thus be detached from the light bar 20. Ideally, there will be a uniform amount of opening and closing along the long axis, as shown in the graph and block. The arrow "26" represents the relative intensity of the open heat radiation. 12 201124350 Figure 3 is a schematic diagram showing the longitudinal section of a dome-shaped reactor u, such as the manufacture of semiconductors for etching or chemical vapor. a deposition (CVD) process. The reactor li consists of a dome 13 made of a transparent quartz glass and a cylindrical portion 16 having an outer diameter of 420 mm and a wall thickness of 4 mm. Opaque stone The flange 14 made of Ying glass. The cylindrical track 16 is surrounded by a heating device 18, and over a length of more than 50 cm, is covered with a opaque zone 12 surrounded by the surrounding area, and the zone is made of thunder The inner engraving method is formed by a light rod as shown in Fig. 2. The defect is caused by radiation irradiated on the cylindrical circumferential surface of the reactor 11, wherein the longitudinal axis of the cylindrical portion 16 is oriented. The annular defect planes are produced by laser implantation along the longitudinal axis 12 in a step size of 2 μm η step and are placed side by side with each other at intervals of 300 μm. The opaque regions 12 are stacked in a plurality of directions from the central axis 17 The defect planes are formed together and parallel to each other, and the defect plane contains point defects, and the average size of the defects is about 50 μm, and the distance between the grid points is set to 1 μm. The defect planes adjacent to the center point of the defect are offset by 1 〇 μιη, respectively. Therefore, as seen from the direction of the central axis, a strong opacity is obtained in the long axis direction of the opaque region 12, but instead, Looking at the direction of the cylindrical circumferential surface, there is a large defect plane spacing of 3 〇〇 μιη ' so there is less opacity, and even the inner chamber of the reactor can be seen. Therefore, the scattering characteristics of the opaque region 12 depend on the direction of incidence of the radiation. Each side of the opaque area is surrounded by unshielded quartz glass. This point is also clearly shown in the cross-sectional view of Figure 4. The inside and outside of the opaque zone 12 are surrounded by an annular region 19 made of defect-free transparent glass, having a thickness of about 55 mm, thereby preventing the surface from being damaged or thinned. The thickness of such opaque zone 12 is at most 3 mm. Fig. 5 shows a quartz glass 7G piece according to an application form of the quartz glass plate 5' which has a two-part τ, a transparent region, each of which is flat-shaped and opaque 13 201124350 open areas 52 and 53. The opaque areas 52 and 53 are made by laser engraving and are surrounded by a transparent, defective quartz glass 3 . Between the opaque areas 52 and 53 is a window 54 which, for example, is attached to a quartz glass apparatus having a substantially opaque outer side wall as an interlayer window, and the apparatus is composed of a plurality of quartz glass sheets. Here, the opaque areas 52 and 53 and the interlayer window 54 are formed by laser engraving after the mechanical assembly is completed, as described in Figure 1 above. Fig. 6 is not another application form of the quartz glass member according to the present invention. The shape is a square quartz glass plate 61 having a side length of 10 cm and a thickness of 5 mm, and has a plurality of rectangular opaque regions 62 therein. The region 3 between the edge region 63 and the opaque region 62 is composed of non-defective transparent quartz glass. As can be seen from the top view of Fig. 7, the opaque regions 62 are parallel to each other and extend to both sides except for a non-defective edge 63 on one side of the flat plate 61, as seen in Fig. 6 and Fig. 7, opaque The length of the region 62 is 5 mm, and the distance between the opaque regions 62 is also 5 mm. The defect-free edge 63 has a thickness of about 500 μm on each side. » The opaque area 62 has a side length of 90 mm x 30 mm x 〇 .5 mm. Therefore, the optical transmittance of the quartz glass plate 61 can be adjusted by the angle of the plate on the radiation path to produce a wide range of variations, and in this respect, it can be used as an optical shutter. Figure 8 is a diagram of a quartz glass plate 61 showing the opaque area 62 having the largest shielding area in the direction of arrow c (Figure 7). Looking at this direction, the quartz glass plate 61 can be said to be opaque for all wavelengths. The main direction of propagation is the thermal radiation of the block arrow c (Fig. 7), that is, it is almost completely isolated, but the main direction of propagation is the thermal radiation of the block arrow B, which is reversed and transparent to translucent. The quartz glass element according to the application form of the present invention is a quartz glass plate 91 provided with a plurality of opaque regions 92 of the same geometric pattern, the opaque regions being arranged at a pitch in the direction of the longitudinal axis 93, and the arrangement of the 201124350 The shape is also a rectangle or even a parallelogram, and the opaque area 92 (the longitudinal axis and the longitudinal axis 93 of the quartz glass plate 91 are inclined to each other. The opaque area 92 is made by laser engraving, * and is surrounded by none (4) Surrounded by transparent quartz glass 3. In this configuration, the thermal light penetration of the opaque region 92 is strongly related to the direction. The flat plate 91 is nearly opaque but perpendicular to the vertical axis. In the direction of 'more or less transparent. Figure 10 shows the transmittance curve, showing the direct spectral transmittance T (in %) of the incident radiation of the component of Figure 1 and the wavelength λ, by quartz glass plate The plane normal direction of the flat side is measured. It can be seen that the opaque region having a thickness of 4 mm reduces the penetration amount by about 3% to 6〇% in the wavelength range of about 200 nm to 3500 nm, and thus Produce a relative In the following, the invention will be further illustrated in accordance with the embodiments and the drawings. It is schematically illustrated: Figure 1 A quartz glass plate with an opaque central zone, applied as thermal radiation The diffuser, side cross-sectional view, Figure 2 is a central cross-sectional view of the light bar with the asymptotic opaque central region, plus the defect density change 'and the intensity distribution of the light that is removed during the length of the light bar. Figure 3 Processing the semiconductor crystal The dome-shaped reactor used in the circle has an opaque central zone, a side cross-sectional view, and a cross-sectional view of the reactor of Figure 4 and Figure 3 along the line AA. Figure 5 shows the geometry of the opaque central zone of the quartz glass plate in the third embodiment. Configuration and direction, Figure 6 Another embodiment, geometric configuration and orientation of the opaque central area of a square quartz glass plate, side view, 15 201124350 Figure 7 Figure 6 of the quartz glass plate, by block arrow B (Figure 6) The top view of the direction, the quartz glass plate of Fig. 8 and Fig. 7, the side view seen from the corner direction of the block arrow c (Fig. 7), Fig. 9 another embodiment, quartz The geometric configuration and orientation of the opaque central zone of the glass plate, and the chart of Figure 11 show the transmittance of the component in the vertical direction of the opaque zone from 190 nm to 4800 nm. 】 1 quartz glass plate 2 opaque zone 3 surface layer 11 reactor 12 opaque zone around the circumference 13 dome 14 flange 15 frontal surface 16 cylindrical part 17 central axis 18 heating device 19 annular zone 20 light bar 21 inlet coupling end 22 Round opaque area 23 Unshielded quartz glass 24 Long axis 201124350 25 Defect density 26 Uniform opening amount D Relative defect density I Strength 51 Round quartz glass plate 52 > 53 Flat opaque area 54 Window 61 Square Quartz glass plate 62 opaque area 63 defect-free edge area arrow B, C light propagation direction 91 quartz glass plate 92 opaque area 93 vertical axis 17