201110181 六、發明說明： 【發明所屬之技術領域】 本發明係關於離子槍，特別是有關作爲離子槍之陰極 的燈絲之改良。 【先前技術】 離子槍一般係使用於壓電元件之頻率調整裝置等，其 原理是在離子槍內部產生電漿，從該電漿引出離子予以加 速，藉此形成離子束。 專利文獻1揭示有一種離子槍，其係配置有複數個離 子束引出孔，用於射出具有對應的電流密度峰値之離子束 〇 專利文獻2揭示有將複數燈絲配置於長邊方向之構成 。根據該構成，只要各燈絲之發熱量相同，則熱陰極亦即 陰極之熱分布均勻，可期待被射出之離子束的電流密度也 均勻化。 [專利文獻1]日本特開2006- 1 002 05號公報 [專利文獻2]日本特開200 7-3 1 1 1 1 8號公報 【發明內容】 但是，如專利文獻2之構成，則必須使複數電源對應 於複數燈絲而設置，離子槍之構成將複雜化、大型化，並 且有變成高成本之問題。 因此，如上述之整齊排列有複數之離子束引出孔的離 201110181 子槍中，係以將離子束電流密度變成不均勻之問題（特別 是端部側之電流密度變小）藉由簡單且方便之構成予以解 決作爲課題。 本發明之第1側面係一種離子槍，其係具備：電漿產 生手段，由陰極（10)及陽極（20)構成；以及柵極（30 )，用於從電漿產生手段所產生的電漿引出離子束；陰極 係由架設在一對燈絲電極（1 3 )間的燈絲（1 2 )所構成， 柵極係具有與燈絲平行排列的複數個離子束引出孔（3 1 ) ，包含該燈絲兩端部（1 2a )之每單位空間的發熱量，係 大於包含燈絲中央部（1 2b )之每單位空間的發熱量。 其中，燈絲兩端部爲捲繞成線圈狀之構成亦可，兩端 部被彎曲之構成亦可。 本發明之第2側面係一種離子槍，其係具備：電漿產 生手段，由陰極（10)及陽極（20)構成；以及柵極（30 )，用於從電漿產生手段所產生的電漿引出離子束；陰極 係由架設在一對燈絲電極間的燈絲（1 2 )所構成，柵極係 具有與燈絲平行排列的複數個離子束引出孔（3 1 ) ’相對 於該燈絲中央部，兩端側係緻密地捲繞著。 針對整齊排列有複數個離子束引出孔的離子槍’可藉 由簡單且便宜的構成解決離子束端部側之電流密度減少的 問題，使離子束之電流密度均勻化。 【實施方式】 第1圖之離子槍1 00係具備：架設在—對燈絲電極 -6- 201110181 1 3之間的燈絲1 1 (陰極1 0 )、與燈絲1 1平行地對向配 置之陽極20、具有複數個離子束引出孔31之柵極30、以 及將陰極10及陽極20密閉於內部並且使複數個離子束引 出孔31露出之本體40。陰極10和陽極20係構成電漿產 生手段，並且連接在分別的電源（不圖示）。又，本體 40係具備：氣體導入口 41，用於導入放電氣體；及遮蔽 板42，用於防止陰極1 0和陽極20之間不必要的放電。 如第2Α圖及第2Β圖所示，柵極30的複數個離子束 引出孔3 1係於藉由環狀的陽極2 0所隔成之區域內部，整 齊排列在與燈絲1 1同一方向。 離子槍之動作係首先將氬等放電氣體從氣體導入口 41導入本體40之內部。分別在陰極10施加負電壓、在 陽極20施加正電壓，藉由其電位差進行放電而產生電漿 。在柵極30施加電壓時，藉由複數個離子束引出孔31從 電漿引出離子予以加速，形成離子束。 其中，針對陽極20予以補充。第9圖（a) 〜（d) 係顯示陽極的形狀（皆爲俯視圖）變化者。第9圖（a ) 係第2圖所示之環狀型者，但其他還有如（b )之在長邊 方向分割者，如（c )之3形者，如（d )之在寬方向分割 者等。又’不限於方形，也可以是橢圓形。此外，亦可不 設陽極20而將本體4本身當作陽極。 又，針對複數個離子束引出孔3 1予以補充。第1 〇圖 (a )〜（e )係顯示複數個離子束引出孔3 1之變化者。如 此地，除了第2圖（亦即，第〗〇圖（d ))所顯示者之外 201110181 ，離子束3 1可獲得各種形態。本說明書及申請專利範圍 所說的「複數個離子束引出孔」係包含上述例示之全部態 様及其類似之態様。 總之，如第1圖之離子槍也是耐於實用者，但熱陰極 亦即燈絲Π端部之溫度仍低於燈絲電極1 3之散熱，因此 從端部側之離子束引出孔31所射出之離子束的電流密度 會有減少之情形。 第3圖係顯示此構成中的距離柵極面25mm之位置， 亦即配置有處理基板的位置中的離子束之電流密度者。如 圖示，各峰値係對應於各離子束引出孔3 1，相對於中心 附近的電流密度峰値，端部側的電流密度峰値略微減少。 如此地，在第1圖之構成中，離子束電流密度會有變成不 均勻者之情形。 因此，第4A圖係顯示進一步改良後的本發明之離子 槍200。離子槍200的陽極20、柵極30及本體40之構成 係與前述第1圖、第2圖、第9圖及第10圖同樣，因此 賦予相同符號而省略其説明。 第4A圖中，熱陰極亦即陰極1〇係由一對架設在燈 絲電極1 3之間的燈絲12構成。此外，第4 A圖中也是陰 極1 〇和陽極2 0構成電漿產生手段，且連接在分別的電源 (不圖示）。 爲了方便説明，如第4B圖所示，將燈絲1 2當作由端 部1 2a和中央部1 2b構成者。端部1 2a係捲繞成線圈狀， 相較於以往的燈絲Π，端部之發熱量變大。藉此，即使 -8- 201110181 燈絲1 2因燈絲電極1 3而被散熱，端部1 2a的温度仍可維 持於預定之高温。 第5圖係顯示第4A圖之離子槍200中的距離柵極面 2 5mm之位置，亦即配置有處理基板的位置中的離子束之 電流密度者。第5圖中也是電流密度之峰値對應於各離子 束引出孔3 1。與第3圖比較即可明瞭，端部側之電流密 度峰値相對於離子束中心附近之電流密度峰値的降低被減 輕，可使離子束電流密度涵蓋其長邊方向爲大致均勻者。 此外，藉由調節在端部1 2 a之捲繞數或捲繞密度，可 調整該離子束電流密度之分布。 例如，如第6 A圖，可使捲繞成線圈狀的燈絲1 2於 其捲繞中具有粗密，亦可使靠近端部側之捲繞爲密，使靠 近中心部之捲繞爲疏。又，如第6B圖，亦可使燈絲端部 之捲繞徑大於燈絲中心部之捲繞徑。又，如第6 C圖，可 使捲繞成線圈狀的燈絲1 2於其捲繞徑具有傾斜，亦可使 靠近端部側之捲繞徑變大，使靠近中心部之捲徑變小。 如第7圖所示，本發明之核心在於包含燈絲端部1 2a 之每單位空間A的發熱量大於包含燈絲中央部1 2b之每 單位空間B的發熱量。因而，實施形態不限於第4B圖之 構成，如以下之變形例亦包含在本發明。 例如，如第8A圖及第.8B圖所示，亦可使燈絲端部 1 2a彎曲以增加端部側之發熱量。此外，各圖不一定要依 照顯示之尺寸。 又，亦可使燈絲1 2的阻抗値曲線傾斜，使端部側的 -9- 201110181 阻抗値高於中心部側的阻抗値，增加端部側的發熱° 【圖式簡單說明】 第1圖係顯示本發明之離子槍之圖。 第2A圖係柵極的構成之説明圖。 第2B圖係柵極的構成之説明圖。 第3圖係本發明之説明圖。 第4A圖係顯示本發明之離子槍之圖。 第4B圖係顯示本發明之燈絲之圖。 第5圖係本發明之説明圖。 第6A圖係顯示本發明之燈絲之變形例圖。 第6B圖係顯示本發明之燈絲之變形例圖》 第6C圖係顯示本發明之燈絲之變形例圖。 第7圖係本發明之説明圖。 第8A圖係顯示本發明之燈絲之變形例圖。 第8B圖係顯示本發明之燈絲之變形例圖。 第9圖係本發明之補充圖。 第1 0圖係本發明之補充圖。 【主要元件符號說明】 10 :陰極 1 1、1 2 :燈絲 12a :燈絲端部 l2b :燈絲中央部 1 3 :燈絲電極 -10- 201110181 2 0 :陽極 3 0 :柵極 31 :離子束引出孔 40 :本體 41 :氣體導入口 4 2 :遮蔽板 1 0 0、2 0 0 :離子槍201110181 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to an ion gun, and more particularly to an improvement of a filament as a cathode of an ion gun. [Prior Art] The ion gun is generally used for a frequency adjusting device of a piezoelectric element or the like, and the principle is that plasma is generated inside the ion gun, and ions are extracted from the plasma to accelerate, thereby forming an ion beam. Patent Document 1 discloses an ion gun in which a plurality of ion beam extraction holes are disposed for emitting an ion beam having a corresponding current density peak. Patent Document 2 discloses a configuration in which a plurality of filaments are arranged in a longitudinal direction. According to this configuration, as long as the heat generation amount of each of the filaments is the same, the heat distribution of the hot cathode, i.e., the cathode, is uniform, and the current density of the ion beam to be emitted is also expected to be uniform. [Patent Document 1] Japanese Patent Laid-Open Publication No. JP-A-2006- No. PCT-A No. JP-A No. JP-A No. JP-A-2006 The plurality of power sources are provided corresponding to the plurality of filaments, and the composition of the ion guns is complicated, large, and has a problem of becoming a high cost. Therefore, in the above-mentioned 201110181 sub-gun, in which the plurality of ion beam extraction holes are arranged neatly, the problem of the ion beam current density becoming uneven (especially the current density at the end side is reduced) is simple and convenient. The composition is solved as a problem. A first aspect of the present invention is an ion gun comprising: a plasma generating means comprising a cathode (10) and an anode (20); and a grid (30) for generating electricity from a plasma generating means The slurry extracts an ion beam; the cathode system is composed of a filament (1 2 ) spanned between a pair of filament electrodes (13), and the grid has a plurality of ion beam extraction holes (3 1 ) arranged in parallel with the filament, including The amount of heat generated per unit space of the both ends of the filament (1 2a ) is greater than the amount of heat generated per unit space including the central portion (1 2b ) of the filament. Here, the both ends of the filament may be wound in a coil shape, and the both ends may be bent. A second aspect of the invention is an ion gun comprising: a plasma generating means comprising a cathode (10) and an anode (20); and a grid (30) for generating electricity from the plasma generating means The slurry extracts an ion beam; the cathode system is composed of a filament (1 2 ) spanned between a pair of filament electrodes, and the gate has a plurality of ion beam extraction holes (3 1 ) arranged in parallel with the filament with respect to the central portion of the filament The ends of both ends are densely wound. The ion gun' in which a plurality of ion beam extraction holes are arranged neatly can solve the problem of reduction in current density at the end side of the ion beam by a simple and inexpensive configuration, and uniformize the current density of the ion beam. [Embodiment] The ion gun 100 of Fig. 1 includes a filament 1 1 (cathode 1 0) spanned between a filament electrode -6-201110181 1 3 and an anode disposed opposite to the filament 1 1 20. A gate electrode 30 having a plurality of ion beam extraction holes 31, and a body 40 having a cathode 10 and an anode 20 sealed therein and exposing a plurality of ion beam extraction holes 31. The cathode 10 and the anode 20 constitute a plasma generating means and are connected to respective power sources (not shown). Further, the main body 40 includes a gas introduction port 41 for introducing a discharge gas, and a shielding plate 42 for preventing unnecessary discharge between the cathode 10 and the anode 20. As shown in Fig. 2 and Fig. 2, the plurality of ion beam extraction holes 31 of the gate electrode 30 are arranged inside the region partitioned by the annular anode 20, and are arranged in the same direction as the filament 1 1 . The operation of the ion gun first introduces a discharge gas such as argon into the inside of the body 40 from the gas introduction port 41. A negative voltage is applied to the cathode 10, a positive voltage is applied to the anode 20, and discharge is generated by the potential difference to generate a plasma. When a voltage is applied to the gate electrode 30, ions are extracted from the plasma by a plurality of ion beam extraction holes 31 to form an ion beam. Among them, the anode 20 is supplemented. Fig. 9 (a) to (d) show changes in the shape of the anode (both in plan view). Fig. 9(a) is a ring type shown in Fig. 2, but other ones are divided in the long side direction as in (b), such as the 3rd shape of (c), as in (d) in the width direction. Splitter, etc. Further, it is not limited to a square shape, and may be an elliptical shape. Further, the body 4 itself may be used as an anode without providing the anode 20. Further, a plurality of ion beam extraction holes 31 are supplemented. Fig. 1 (a) to (e) show changes in a plurality of ion beam extraction holes 31. As such, in addition to the one shown in Fig. 2 (i.e., the first figure (d)), the ion beam 3 1 can be obtained in various forms. The "plurality of ion beam extraction holes" as used in the specification and the scope of the claims includes all of the above-described states and the like. In short, the ion gun as shown in Fig. 1 is also resistant to practical use, but the temperature of the hot cathode, i.e., the end of the filament, is still lower than that of the filament electrode 13, so that the ion beam extraction hole 31 is emitted from the end side. The current density of the ion beam will be reduced. Fig. 3 is a view showing a position in the configuration of 25 mm from the gate surface, that is, a current density of an ion beam in a position where the substrate is processed. As shown in the figure, each of the peaks corresponds to the current density peak 附近 of the respective ion beam extraction holes 31, and the current density peak at the end side slightly decreases. As described above, in the configuration of Fig. 1, the ion beam current density may become uneven. Therefore, Fig. 4A shows a further improved ion gun 200 of the present invention. The configuration of the anode 20, the gate electrode 30, and the body 40 of the ion gun 200 is the same as that of the first, second, ninth, and ninth drawings, and therefore the same reference numerals will be given thereto, and the description thereof will be omitted. In Fig. 4A, the hot cathode, i.e., the cathode, is composed of a pair of filaments 12 spanned between the filament electrodes 13. Further, in Fig. 4A, the cathode 1 〇 and the anode 20 constitute a plasma generating means, and are connected to respective power sources (not shown). For convenience of explanation, as shown in Fig. 4B, the filament 1 2 is constituted by the end portion 1 2a and the central portion 1 2b. The end portion 1 2a is wound into a coil shape, and the amount of heat generated at the end portion is increased as compared with the conventional filament crucible. Thereby, even if the filament 1 2 is dissipated by the filament electrode 13 from -8 to 201110181, the temperature of the end portion 1 2a can be maintained at a predetermined high temperature. Fig. 5 is a view showing the position of the ion gun 200 of Fig. 4A which is 2 mm from the gate surface, that is, the current density of the ion beam in the position where the substrate is processed. Also in Fig. 5, the peak of the current density corresponds to each of the ion beam extraction holes 31. As can be seen from comparison with Fig. 3, the current density peak at the end side is reduced with respect to the peak of the current density near the center of the ion beam, and the ion beam current density can be made to be substantially uniform in the longitudinal direction. Further, the distribution of the ion beam current density can be adjusted by adjusting the number of windings or the winding density at the end portion 1 2 a. For example, as shown in Fig. 6A, the filament 12 wound in a coil shape can be made thick in winding, or the winding near the end side can be made dense, and the winding near the center portion can be made thin. Further, as shown in Fig. 6B, the winding diameter of the end portion of the filament may be made larger than the winding diameter of the central portion of the filament. Further, as shown in Fig. 6C, the filament 12 wound in a coil shape can be inclined in the winding diameter, and the winding diameter near the end side can be made larger, and the winding diameter near the center portion can be made smaller. . As shown in Fig. 7, the core of the present invention is that the amount of heat generated per unit space A including the filament end portion 12a is larger than the amount of heat generated per unit space B including the center portion 12b of the filament. Therefore, the embodiment is not limited to the configuration of Fig. 4B, and the following modifications are also included in the present invention. For example, as shown in Figs. 8A and 8B, the filament end portion 12a can also be bent to increase the amount of heat generated at the end side. In addition, the figures do not have to be in accordance with the size of the display. Further, the impedance 値 curve of the filament 12 can be inclined, so that the impedance 値 of the end side -9-201110181 is higher than the impedance 値 of the center side, and the heat generation at the end side is increased. [Simple description of the drawing] Fig. 1 A diagram showing the ion gun of the present invention. Fig. 2A is an explanatory view showing the configuration of the gate. Fig. 2B is an explanatory view showing the configuration of the gate. Figure 3 is an explanatory view of the present invention. Fig. 4A is a view showing the ion gun of the present invention. Figure 4B is a diagram showing the filament of the present invention. Figure 5 is an explanatory view of the present invention. Fig. 6A is a view showing a modification of the filament of the present invention. Fig. 6B is a view showing a modification of the filament of the present invention. Fig. 6C is a view showing a modification of the filament of the present invention. Figure 7 is an explanatory view of the present invention. Fig. 8A is a view showing a modification of the filament of the present invention. Fig. 8B is a view showing a modification of the filament of the present invention. Figure 9 is a supplementary diagram of the present invention. Figure 10 is a supplementary diagram of the present invention. [Description of main components] 10: Cathode 1 1 and 1 2: Filament 12a: Filament end l2b: Filament center portion 13: Filament electrode-10-201110181 2 0: Anode 3 0: Gate 31: Ion beam extraction hole 40: body 41: gas introduction port 4 2 : shielding plate 1 0 0, 2 0 0 : ion gun