201107794 六、發明說明： 【發明所屬之技術領域】 本發明係有關於一種微透鏡之製造方法及其結構，特別是有關 於一種利用岸堤材料層以避免黏劑殘留的微透鏡製造方法及其結 構。 【先前技術】 微透鏡陣列元件是在透明的基材上製作出許多曲面狀的微結構 圖樣，其具有折射光線與聚焦光束的功能，其可應用於一光電元件， 例如為數位相機之影像感測器、發光二極體、或太陽能電池。 舉例來說，將微透鏡附加發光二極體的發光面，可有效地減少 全反射現象和波導效應，以藉此而提升發光二極體的出光效率；將 微透鏡附加至太陽能電池的光接收面，可提升光的吸收效率及改盖 光電轉換效率；將微透鏡附加至光偵測器，可將訊號光透過聚焦作 用而集中於感光區，藉此來提升光的利用率、改善光偵測器的訊號 與噪音的比率、縮短反應時間、以及減少失真。 一種廣泛使用之微透鏡的製造方法為微透鏡陣列壓印法，其利 用精密加工之壓印模具壓印塗佈在基板上的黏劑，並且利用紫外光 來固化黏劑以形成微透鏡陣列。此方式的缺點在於微透鏡陣列完成 201107794 後，在每-微透鏡之間會有固化__留，殘留在微透鏡週圍的 黏劑可能會影響後續微透鏡的透光效果，並且，殘留的黏劑也是原 料上的浪費。 有鑑於此，必要發展新的製程以降低製造成本，提升生產效能 以及避免殘留的黏劑影響微透鏡的光學表現。 【發明内容】 本發明提供-種微透鏡之製造方法及其結構，以改良先前技術 之缺點並具有更高的生產效益。 本發明的目的之—是提供—種微透鏡製程，包含：提供-基板， 包含一微透鏡預定區域和一周圍區域；提供一壓印模具，包含一透 鏡塑形區；於該基板的該周圍區域形成—第—岸堤材料層，並且該 第一岸堤材料層圍繞該微透鏡預定區；於該微透鏡預定區形成一微. 透鏡材料層；進行一塵印程序，以該壓印模具之該透鏡塑形區接觸 該微透鏡材料層，壓印出一過渡微透鏡結構；進行一固化處理，使 該過渡微透鏡結構固化，以形成一微透鏡；以及移除該壓印模具。 本發明的另一目的是提供一種應用於微透鏡製程之岸堤圖案， 該岸堤圖案係設於—基板上，該基板包含—微透鏡預定區域和一周 圍區域，該岸堤圖案包含：一第一岸堤材料層位於該周圍區域並且 201107794 圍繞該微透鏡預定區；以及一第二岸堤材料層位於該周圍區域並且 圍繞該第一岸堤材料層，其中該第一岸堤材料層和該第二 一序乂材料 層之間形成一凹槽。 本發明的特色在於以岸堤材料層圍繞微透鏡預定區域，以限定 微透鏡材料層的範圍，並且，本發明利用岸堤材料層形成的凹槽， 谷納在壓印時溢出的微透鏡材料。因此，在微透鏡完成後，微透於 之間不會有黏劑殘留。 為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本 發明’下文特列舉本發明之數個較佳實施例，並配合所附圖式’詳 細說明本發明的構成内容及所欲達成之功效。 【實施方式】 第1圖至第5圖為根據本發明實施例所繪示的微透鏡製程示音 圖’第6圖為根據本發明之一實施例之基板上視圖，第7圖與第8 圖分別為本發明之另一實施例之基板上視圖與侧視示意圖。 參照第1圖和第6圖，首先提供一基板1〇，其上定義出一微透 鏡預疋區域A和一周圍區域B，基板10僅示範性地顯示三個微透 鏡預定區，但其於具體實施上，可能包括數萬或數百萬個微透鏡預 定區。此基板10可例如為玻璃基板或矽基板，可應用於數位相機之 201107794 影像感測器晶片元件、發光二極體晶片元件、或太陽能電池晶片元 件。接著，形成一光阻層（圖未示)全面覆蓋基板10，並且利用曝光 顯影製程，移除覆蓋在微透鏡預定區A上的光阻，曝露出微透鏡預 定區域A’剩餘的光阻層則形成一第一岸堤材料層12於周圍區域B 上以圍燒祕透鏡預定區域A。如第6圖所示，微透鏡預定區A係為 一第一圖形14’例如圓形。然而，該第一圖形14亦可以為橢圓形、 矩形、三角形、六邊形或其它形狀。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of fabricating a microlens and a structure thereof, and more particularly to a method of manufacturing a microlens using a bank material layer to avoid adhesive residue and structure. [Prior Art] The microlens array element is formed on a transparent substrate by a plurality of curved microstructure patterns, which have the function of refracting light and focusing the light beam, and can be applied to a photoelectric element, for example, a digital camera. Detector, light-emitting diode, or solar cell. For example, adding the microlens to the light emitting surface of the light emitting diode can effectively reduce the total reflection phenomenon and the waveguide effect, thereby improving the light extraction efficiency of the light emitting diode; and attaching the microlens to the light receiving of the solar cell. The surface can improve the absorption efficiency of light and change the photoelectric conversion efficiency; attaching the microlens to the photodetector can focus the light on the photosensitive region through the focusing effect, thereby improving the utilization of light and improving the optical detection. The signal-to-noise ratio of the detector, reduced reaction time, and reduced distortion. A widely used microlens manufacturing method is a microlens array imprinting method which imprints an adhesive coated on a substrate by using a precision-machined imprinting mold, and cures the adhesive with ultraviolet light to form a microlens array. The disadvantage of this method is that after the microlens array completes 201107794, there will be curing between each microlens, and the adhesive remaining around the microlens may affect the light transmission effect of the subsequent microlens, and the residual viscosity The agent is also a waste of raw materials. In view of this, it is necessary to develop new processes to reduce manufacturing costs, improve production efficiency, and avoid residual adhesives affecting the optical performance of the microlenses. SUMMARY OF THE INVENTION The present invention provides a method of fabricating a microlens and a structure thereof to improve the disadvantages of the prior art and to have higher production efficiency. It is an object of the present invention to provide a microlens process comprising: providing a substrate comprising a predetermined region of a microlens and a surrounding region; providing an imprinting mold comprising a lens shaping region; surrounding the substrate Forming a first-bank material layer, and the first bank material layer surrounds the microlens predetermined area; forming a micro lens material layer in the predetermined area of the microlens; performing a dust printing process to the imprinting mold The lens shaping region contacts the microlens material layer, embossing a transition microlens structure; performing a curing process to cure the transition microlens structure to form a microlens; and removing the imprinting mold. Another object of the present invention is to provide a bank pattern for a microlens process, the bank pattern is disposed on a substrate, the substrate includes a predetermined area of a microlens and a surrounding area, and the bank pattern comprises: a first bank material layer is located in the surrounding area and 201107794 surrounds the microlens predetermined area; and a second bank material layer is located in the surrounding area and surrounds the first bank material layer, wherein the first bank material layer and A groove is formed between the second layer of material layers. The invention is characterized in that a predetermined area of the microlens is surrounded by a bank material layer to define a range of the microlens material layer, and the present invention utilizes a groove formed by the bank material layer, and the microlens material overflowing during the imprinting. . Therefore, after the microlens is completed, there is no sticking residue between the micro-perforations. The present invention will be further understood by those of ordinary skill in the art to which the present invention pertains. The effect. 1 to 5 are micro-lens process diagrams according to an embodiment of the present invention. FIG. 6 is a top view of a substrate according to an embodiment of the present invention, and FIGS. 7 and 8 The drawings are respectively a top view and a side view of a substrate according to another embodiment of the present invention. Referring to FIGS. 1 and 6, a substrate 1 is first provided, on which a microlens pre-turn region A and a surrounding region B are defined, and the substrate 10 exemplarily displays three microlens predetermined regions, but In specific implementation, it may include tens of thousands or millions of microlens predetermined regions. The substrate 10 can be, for example, a glass substrate or a germanium substrate, which can be applied to a 201107794 image sensor wafer component, a light emitting diode chip component, or a solar cell wafer component of a digital camera. Next, a photoresist layer (not shown) is formed to completely cover the substrate 10, and the photoresist covering the predetermined area A of the microlens is removed by an exposure and development process to expose the remaining photoresist layer of the predetermined area A' of the microlens. Then, a first bank material layer 12 is formed on the surrounding area B to surround the predetermined area A of the lens. As shown in Fig. 6, the microlens predetermined area A is a first pattern 14' such as a circle. However, the first graphic 14 can also be elliptical, rectangular, triangular, hexagonal or other shapes.
I 如第2圖所示，接著，利用喷膠或點膠方式將液體狀的微透鏡 材料層16放置在基板1〇的微透鏡預定區入上。其中，透鏡材料層 16可以為環氧樹脂、光學膠、壓克力系材料㈣ymethylmethacrylates， PMMAs)、聚虱酯系塑膠材料(p〇iyUrethanes，pus)、石夕膠系材料 (p〇lydimethylsil〇xane，PDMS)或其它熱硬化或光硬化之透光材料。 如第3圖所示，提供一壓印模具18，包含一透鏡塑形區2〇， 如第4圖所示’在進行一壓印程序時，將壓印模具18的透鏡塑形區 2〇接觸微透鏡材料層16，使得液體狀的微透鏡材料層16隨著透鏡 塑形區20的形狀，形成一過渡微透鏡結構22。壓印模具18上的透 鏡塑形區20可以為凸面或凹面或是其它雜，端看微透鏡所需而 定。 然後，進行一固化處理以固化過渡微透鏡結構22，根據本發明 之較佳實施例’固化處理例如利用365 nm紫外線照射過渡微透鏡結 201107794 構22約10秒，如第5圖所示，在過渡微透鏡結構π固化之後，形 成-微透鏡24，之後，將壓印模具18移除。另外，第—岸堤材料 層12在微顧24完紅後，可储品設計所需，選擇性移除。 第7圖為本發明之另一實施例之基板上視圖。根據本發明之另 -實施例，在進行曝光_製程時，除形成第—岸堤材料層η外， 亦可同時職-第二岸堤材觸⑵。舉例而言，如第7圖所示， 可先形成-光阻層齡稍蓋基板1G，於進行曝絲影製程後， 移除部分光阻層’曝露諸透鏡預定區域A以及部分觸區域B， 並且使，剩餘的光阻分別在周圍區_上形成第—岸堤材卿i2 和第二岸堤材觸U卜以作為本發赌用於微透鏡製程之岸堤圖 案50。於本實施例中’第一岸堤材料層12之厚度較佳介於〇1至 0.2 而第二岸堤材料層⑵之厚度較佳介於0.1至02 #m。 第二岸堤材料層121形成一第二圖形⑷，例如，圓形，圍繞 第一岸堤材料層12和微透鏡預定區域A，同樣地，第二圖形ΐ2ι 亦可以為橢_、矩形、三㈣、六邊形或其它圖形。值得注意的 是’第-岸堤材料層12和第二岸堤材料層121之間會形成一凹槽 26 ’於進行壓印程序時’壓印模具18之透鏡塑形區2〇接觸微透鏡 材料層16而溢出微透鏡預定區域A的微透鏡材料可以流入凹槽％ 中。如此’即不會在微透鏡24之間發生黏劑殘留的問題。同樣地， 在微透鏡24完成之後，第-岸堤材料層12和第二岸堤材料層121 可以選擇性移除。 曰 201107794 雖然在第7圖中僅输示了第一岸堤材料層12和第二岸堤材料層. 121作為本發明應用於微透鏡製程之岸堤圖案5〇，但並不以此為 限。本發明亦可以形成多數個岸堤材料層，層層圍繞微透鏡預定區 域A，並形成多數個凹槽，以提供更多容納多餘的黏劑的空間。 第8圖為依據第7圖所繪示之本發明另一實施例之側視示意 • 圖，其中，一種微透鏡結構200包含一基板10、一第一岸堤材料層 12覆蓋基板1〇並曝露出微透鏡預定區域a、一微透鏡24形成於微 鏡預定區域A中以及一第二岸堤材料層121圍繞第一岸堤材料層 12’並且在第一岸堤材料層12和第二岸堤材料層121之間形成一凹 槽26。第一岸堤材料層12和第二岸堤材料層121皆可為光阻，而 第一岸堤材料層12之厚度較佳介於〇·ι至〇.2 之間，且第二岸 堤材料層121之厚度較佳介於〇.1至〇.2 之間。 本發明利用岸堤材料層12、121圍繞微透鏡預定區域a，將液 體狀之微透鏡材料層16限定於微透鏡預定區域A的範圍之^，因 此於嘴膠或點勝時’其微透鏡材料層16的塗佈量較容易控制，可節 省微透鏡材料層的使用量，並且，本發明利用岸堤材料層12、121 . 形成凹槽，使壓印時多餘的微透鏡材料可以流入凹槽26中。如此， 在微透鏡24完成後，不會在微透鏡24之間發生黏劑殘留的現象。 以上所述僅為本發明之較佳實施例，凡依本發明申請專利範圍 201107794 所做之解變讀修飾1闕本發明之减範圍。 【圖式簡單說明】I As shown in Fig. 2, next, the liquid microlens material layer 16 is placed on the predetermined area of the microlens of the substrate 1 by means of glue or dispensing. The lens material layer 16 may be epoxy resin, optical glue, acrylic material (4) ymethylmethacrylates, PMMAs), polyfluorene-based plastic materials (p〇iyUrethanes, pus), and stone enamel-based materials (p〇lydimethylsil〇xane). , PDMS) or other thermally hardened or photohardened light transmissive materials. As shown in Fig. 3, an imprint mold 18 is provided, comprising a lens shaping zone 2, as shown in Fig. 4, when the embossing process is performed, the lens shaping zone of the embossing die 18 is 〇 The microlens material layer 16 is contacted such that the liquid microlens material layer 16 forms a transitional microlens structure 22 along with the shape of the lens shaping zone 20. The lens shaping zone 20 on the embossing die 18 can be convex or concave or otherwise miscellaneous depending on the needs of the microlens. Then, a curing treatment is performed to cure the transition microlens structure 22, and the curing process according to the preferred embodiment of the present invention, for example, utilizes 365 nm ultraviolet radiation to illuminate the transition microlens junction 201107794 for about 10 seconds, as shown in FIG. After the transition microlens structure π is solidified, the -microlens 24 is formed, after which the imprinting mold 18 is removed. In addition, the first bank material layer 12 can be selectively removed after the design is completed. Figure 7 is a top plan view of a substrate according to another embodiment of the present invention. According to another embodiment of the present invention, in the exposure-process, in addition to forming the first bank material layer η, it is also possible to simultaneously contact the second-bank material (2). For example, as shown in FIG. 7 , a photoresist-level layered substrate 1G may be formed first, and after performing the exposure process, a portion of the photoresist layer is removed to expose the lens predetermined area A and the partial touch area B. And causing, the remaining photoresists to form a first banknote i2 and a second bank material on the surrounding area, respectively, as the banknote pattern 50 for the microlens process. In the present embodiment, the thickness of the first bank material layer 12 is preferably from 〇1 to 0.2 and the thickness of the second bank material layer (2) is preferably from 0.1 to 02 #m. The second bank material layer 121 forms a second pattern (4), for example, a circle surrounding the first bank material layer 12 and the microlens predetermined area A. Similarly, the second pattern ΐ2ι may also be an ellipse, a rectangle, or a third (4), hexagons or other graphics. It is worth noting that a groove 26' is formed between the first bank material layer 12 and the second bank material layer 121. When the embossing process is performed, the lens shaping region of the embossing die 18 contacts the microlens. The material layer 16 and the microlens material that overflows the predetermined area A of the microlens can flow into the groove %. Thus, there is no problem that the adhesive remains between the microlenses 24. Likewise, after completion of the microlens 24, the first bank material layer 12 and the second bank material layer 121 may be selectively removed.曰201107794 Although only the first bank material layer 12 and the second bank material layer are shown in Fig. 7, 121 is used as the bank pattern 5 本 of the microlens process of the present invention, but is not limited thereto. . The present invention can also form a plurality of bank material layers which surround the predetermined area A of the microlenses and form a plurality of grooves to provide more space for accommodating excess adhesive. Figure 8 is a side elevational view of another embodiment of the present invention in accordance with Figure 7, wherein a microlens structure 200 includes a substrate 10, a first bank material layer 12 covering the substrate 1 and Exposing the microlens predetermined region a, a microlens 24 is formed in the micromirror predetermined region A, and a second bank material layer 121 surrounds the first bank material layer 12' and in the first bank material layer 12 and the second A groove 26 is formed between the bank material layers 121. The first bank material layer 12 and the second bank material layer 121 may each be a photoresist, and the first bank material layer 12 preferably has a thickness between 〇·ι to 〇.2, and the second bank material The thickness of layer 121 is preferably between 〇.1 and 〇.2. The present invention utilizes the bank material layers 12, 121 to surround the predetermined area a of the microlens, and defines the liquid microlens material layer 16 in the range of the predetermined area A of the microlens, so that the microlens is in the mouth glue or the point wins. The coating amount of the material layer 16 is relatively easy to control, and the amount of use of the microlens material layer can be saved, and the present invention utilizes the bank material layers 12, 121. The grooves are formed so that the excess microlens material can flow into the concave during imprinting. In the slot 26. Thus, after the completion of the microlens 24, no sticking of the adhesive occurs between the microlenses 24. The above is only the preferred embodiment of the present invention, and the scope of the invention is modified by the scope of the invention. [Simple description of the map]
第1圖至第5圖為根據本發明實施例所繪示的微透鏡製程示 第6圖為根據本發曰月之一實施例之基板上視圖。 =7圖為根據本發明之另—實施例之基板上視圖。 第8圖為根據第7圖繪 令知月另—實施例之側視示意圖。 【主要元件符號說明】 10 基底 12 14 第一圖形 16 18 壓印模具 20 22 過渡微透鏡結構 24 26 凹槽 50 100 、 200 微透鏡結構 121 141 第二圖形 第一岸堤材料層 微透鏡材料層 透鏡塑形區 微透鏡 岸堤圖案 第二岸堤材料層1 to 5 are microlens process diagrams according to an embodiment of the present invention. FIG. 6 is a top view of a substrate according to an embodiment of the present invention. Figure 7 is a top view of the substrate in accordance with another embodiment of the present invention. Fig. 8 is a side elevational view showing an alternative embodiment according to Fig. 7. [Main component symbol description] 10 substrate 12 14 first pattern 16 18 imprint mold 20 22 transition microlens structure 24 26 groove 50 100, 200 microlens structure 121 141 second pattern first bank material layer microlens material layer Lens shaping area microlens bank pattern second bank material layer