201107069 六、發明說明： 【發明戶斤屬之技術領域3 技術領域 本發明相關於包含雷射細微加工之各種雷射加工製程 所利用之雷射加工裝置中，產生多數光束之光學系統及利 用該光學系統的雷射加工裝置。 c先前技術3 背景技術 於半導體零件製造工程中，藉由在半導體晶圓表面配 列成格子狀之所謂界道(street)之分割預定線而區劃成複數 領域，而於此業經區劃之領域形成積體電路等零件。沿著 界道切斷此半導體晶圓而分割業經形成零件的領域，以製 造各個半導體零件。 沿著形成半導體晶圓等板狀之被加工物所形成之界道 的分割，係藉由所謂切割器之切削裝置來進行，但是，近 年來，已提出有沿著界道形成在被加工物之界道照射雷射 光線以形成雷射加工溝，沿著此雷射加工溝並藉由機械切 斷裝置來切斷的方法(例如參照專利文獻1)。 先行技術文獻 專利文獻 專利文獻1 :特開平10 —305420號公報 專利文獻2 :特開2004 —268144號公報 【發明内容】 發明概要 201107069 發明欲解決之課題 然而’可得知在利用脈衝寬度為微微(pic〇)秒範圍之短 脈衝雷_^工，與湘奈秒之短脈衝雷射的情形比 較可實現TBJ的抗折強度與加工面品質。又微微秒範圍 之短脈衝魏的平均輸出上，無法實現與奈秒範圍之短脈 衝雷射輸出匹敵之輸出（15w以上）’因此，可期待高流通量 的加工。 但是，在加工處理的特性上，可增進每—單位面積之 加工的雷射脈衝的能量受到限制，而無法充分制雷射振 盪器的輸出。 又，已提出了利用繞射光學元件（D0E : Diffraction201107069 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to an optical system for generating a plurality of beams in a laser processing apparatus used in various laser processing processes including laser fine processing, and Laser processing equipment for optical systems. c. Prior art 3 BACKGROUND OF THE INVENTION In the semiconductor component manufacturing process, a plurality of fields are divided by a predetermined dividing line of a so-called street in which a semiconductor wafer surface is arranged in a lattice shape, and a product is formed in the field of the division. Parts such as body circuits. The semiconductor wafer is cut along the boundary to divide the fields in which the parts are formed to manufacture individual semiconductor parts. The division along the boundary formed by forming a sheet-like workpiece such as a semiconductor wafer is performed by a so-called cutter cutting device. However, in recent years, it has been proposed to form a workpiece along the boundary. A method in which the boundary light is irradiated with laser light to form a laser processing groove, and is cut along the laser processing groove by a mechanical cutting device (for example, refer to Patent Document 1). CITATION LIST Patent Literature Patent Literature 1: JP-A-2004-268144 (Patent Document 2) JP-A-2004-268144 SUMMARY OF INVENTION Technical Problem 201107069 The problem to be solved by the invention However, it can be seen that the pulse width is pico (pic〇) The short-pulse mine of the second range can achieve the flexural strength and the quality of the processed surface of the TBJ compared with the case of the short-pulse laser of the Xiangna second. On the average output of the short pulse Wei in the picosecond range, the output (15w or more) which is comparable to the short pulse laser output in the nanosecond range cannot be achieved. Therefore, high throughput processing can be expected. However, in the processing characteristics, the energy of the laser pulse for processing per unit area is limited, and the output of the laser oscillator cannot be sufficiently produced. Also, the use of diffractive optical elements (D0E: Diffraction) has been proposed.
Optical Elements)或繞射光學元件與聚光透鏡之組合而將 單-的雷射光束轉換成複數雷射光束來聚光，藉由複數雷 射光束同時進行複數線狀的加工的雷射加工裝置（參照專 利文獻2)。於該雷射加工裂置揭示了以光軸為中心使前述 繞射光學元件旋轉’藉由調整該旋轉角度而能調整加工線 的間距間隔。 然而’專利文獻2記載的雷射加工裝置藉由使繞射光學 元件旋轉以調整加工線的間距間隔，因此會有難以調整光 軸的問題。又，_間隔的變更伴隨著繞射光料件的旋 轉，因此在自由的光束點配置會有限制的問題。 本發明係鑑於以上貫情而完成的發明，目的在於提供 光學系統及雷射加工裝置’該光學系統及雷射加工裝置即 使可增進每-單位面積加卫之雷射脈衝的能量受到限制， 4 201107069 也能充分活用雷射振盪器的效力，且能任意地設定多光束 之光束間距離之同時，容易調整光軸並且能簡單地對每一 被加工物切換加工條件。 用以欲解決課題之手段 本發明之光學系統的特點在於包含有：光源；由前述 光源發出之光可入射，且可將該入射光分歧成複數光的繞 射光學元件；可將在前述繞射光學元件已分歧之光聚光於 與分歧角度對應之複數處的聚光透鏡；及，可對由前述光 源側入射前述繞射光學元件之光賦與至少朝1軸方向變倍 的第1作用，並可對由前述繞射光學元件出射而朝向前述聚 光透鏡側的光賦與抵銷前述第1作用之第2作用的歪像 (anamorphic)光學機構。 依據此構成，對入射繞射光學元件之光賦與至少朝1軸 方向變倍的第1作用，並對由繞射光學元件出射而朝向聚光 透鏡側的光賦與抵銷第1作用的第2作用，因此，不須旋轉 繞射光學元件，而以調整歪像光學機構所造成之第1及第2 作用，即能任意設定聚光透鏡之聚光點的光束點間隔。 上述光學系統中，調整設定於前述歪像光學機構的變 倍率，能控制形成在前述聚光透鏡之聚光位置的光點間隔。 上述光學系統中，前述歪像光學機構能設成包含有構 成變倍光學系統之棱鏡體的構成。 以棱鏡體構成歪像光學機構，除了聚光透鏡以外，能 以非球面光學構件構成其他光學元件，可容易達到合併光 轴0 5 201107069 又，上述光學系統中，前述歪像光學機構包含有使前 述稜鏡體旋轉的旋轉機構。 藉此，以使棱鏡體旋轉之簡單的動作能調整光點間 隔，空間小也可進行，因此能達到省空間化、小型化。 又，本發明於上述光學系統中，其特點在於前述繞射 光學元件為透過型繞射光學元件，前述歪像光學機構具有 配置於前述繞射光學元件之光軸上前後的第1及第2稜鏡 體，前述旋轉機構以前述透過型繞射光學元件作為對稱 面，使前述第1稜鏡體與前述第2稜鏡體對稱地旋轉。 依據如此的構成，藉由使用透過型繞射光學元件，不 須於光源至聚光透鏡之路徑使用偏光光束分離器，即能構 成光學系統，因此，可建構能量損失小的光學系統。 又，於上述光學系統中，前述第1稜鏡體可包含有第1 棱鏡與第2稜鏡而構成，前述第2稜鏡體可包含有第3稜鏡與 第4稜鏡而構成。 如此一來，分別以稜鏡對構成第1及第2稜鏡體，即便 是使稜鏡旋轉，也因由稜鏡發出之光為一定方向，因此， 能固定繞射光學元件與聚光透鏡的位置，能將光學系統之 機械構成予以簡單化。 又，本發明於上述光學系統中，其特點在於前述光源 為可發出脈衝雷射光的雷射光源，前述聚光透鏡可使前述 脈衝雷射光對被加工物聚光。 依據如此的構成，可適用於使脈衝雷射聚光於被加工 物以進行雷射加工的雷射加工裝置。 201107069 又，本發明之雷射加工裝置係包含有：可保持被加工 物之保持機構；及，可對已被前述保持機構保持之被加工 物照射脈衝雷射的加工機構，其特點在於前述加工機構包 含有上述任一光學系統。 依據如此的雷射加工裝置，以調整歪像光學機構所造 成之第1及第2作用而能任意設定聚光透鏡之聚光點的光束 點間隔，因此，能將加工條件簡單地切換至每一被加工物， 能達到雷射加工的效率化。 發明效果 依據本發明，即使可增進每一單位面積加工之雷射脈 衝的能量受到限制，也能充分活用雷射振盪器的效力，能 增進將短脈衝雷射以良好效率加工。 圖式簡單說明 第1圖係一實施形態之多光束光學系統的全體構成圖。 第2圖顯示於第1圖之光學系統中形成有1線多光束點 的狀態。 第3圖顯示形成有與第2圖之光束點不同光點間隔之多 光束點的狀態。 第4圖（a)係顧示多光束型的能量分布及光束輪廓的圖 式、第4圖（b)係顯示頂帽(top-hat)型的能量分布及光束輪廓 的圖式。 第5圖係另一實施形態之多光束光學系統的全體構成 圖。 第6圖（a)係顯示1線5光點且3線同時加工的光束配列的 201107069 圖式、第6圖（b)係顯示頂帽型之線光束且2線同時加工的光 束配列的圖式。 第7圖係使用反射型繞射光學元件之多光束光學系統 的全體構成圖。 第8圖係雷射加工裝置的外觀圖。 【實施方式3 用以實施發明之形態 以下針對本發明之實施形態參照附加圖式來詳細說 明。 第1圖係本發明之一實施形態之光學系統之包含到驅 動機構的構成圖。本實施形態之光學系統，建構成將由雷 射光源11出射之單一短脈衝雷射光入射透過型之繞射光學 元件12而分歧成分別具有預定角度的複數光，利用聚光透 鏡13使已分歧之光在被加工物W上聚光成線狀或2次元矩 陣狀。 本實施形態中，於繞射光學元件12之光源側的光路上 配置有第1光束徑變倍光學系統14，於繞射光學元件12之聚 光透鏡13側的光路上配置有第2光束徑變倍光學系統15。第 1及第2光束徑變倍光學系統14、15分別包含有歪像光學構 件。本例子中，以第1及第2光束徑變倍光學系統14、15構 成歪像光學機構。 第1光束徑變倍光學系統14對入射光賦與可使入射光 束之剖面形狀變換成橢圓形狀的第1作用。又，第2光束徑 變倍光學系統15設定成可對由繞射光學元件12出射之分歧 201107069 光，賦與可抵銷已被第1光束徑變倍光學系統14賦與之第1 作用的第2作用之光學構件配置（包含角度）。 第1及第2光束徑變倍光學系統14、15分別包含有構成 歪像光學構件的稜鏡體（14a、14b)、（15a、15b)。第1光束 徑變倍光學系統14包含有相對於構成稜鏡體之稜鏡14a、 4b可個別調整入射面角度（旋轉角度）的第丨稜鏡驅動機構 第2光束徑變倍光學系統15包含有相對於構成棱鏡體之 稜鏡l5a、15b可個別調整入射面角度(旋轉角度）的第2棱鏡 驅動機構17。以第1及第2棱鏡驅動機構16、17構成旋轉機 構。 相對於構成各稜鏡體之各個稜鏡（14a、14b)、（15a、15b) 之光軸，藉由調整旋轉角度而能變更第丨及第2光束徑變倍 光學系統14、U之變倍倍率。本實施形態調整棱鏡（14a、 14b)、（15a、15b)的角度，以使第1光束徑變倍光學系統14 賦與將入射光束之剖面光束形狀變換成橢圓形狀的第1作 用’第2光束徑變倍光學系統15賦與抵銷第1作用的第2作 用具體上’保持著對繞射光學元件12垂直地入射光束的 條件，且針對配置於兩側之4個稜鏡使外側各棱鏡（14a、 15b)'内側各稜鏡(14b、15a)朝反方向僅旋轉相同角度。即， 以繞射光學元件12作為對稱面，而使一側的稜鏡（14a、14b) 與另一側的稜鏡(l5a、15b)對稱地旋轉，藉此，能不變更光 束徑即可控制入射聚光透鏡13之各光束構成的角度。入射 聚光透鏡13之各光束構成的角度係以聚光透鏡13所造成的 作用而於被加工物（無點位置）形成配列成線狀之光點間隔 201107069 變化來顯現。 · 控制電路18以CPU、ROM、RAM等硬體資源來構成， C PU讀出已記憶在R Ο Μ之控制用軟體並依照程式而實行處 理°控制電路18產生已對應依據被加工物之加工條件而設 定之光點間隔的角度控制指令，並輸入第1及第2棱鏡驅動 機構16、17。第1圖例示藉由ΧΥ軸工作台19a、19b而可將 被加工物以相對於光軸在XY平面内二次元移動的系統。控 制電路18對雷射光源11及XY軸工作台19a、19b賦與可給予 動作時序的時序指令。藉此，可實現沿著形成在被加工物 W之複數界道的雷射加工。 第2圖顯示將多光束設定成光點間隔=D之光學系統及 該光學系統之各圖式所示位置中的光束剖面形狀。繞射光 學元件設計成可將入射光分歧成分別具有不同角度的複數 光。本例子係設計成於丨軸方向分歧成具有不同角度，然 而，例如可設計成於2軸方向二次元分歧成具有不同分歧角 度。 由雷射光源11出射之短脈衝雷射光入射第丨光束徑變 倍光學系統14之光源側的稜鏡i4a。雷射光源接受來自於 控制電路18的時序信號，而出射脈衝寬度為微微秒範圍或 奈秒範圍之短脈衝雷射光。但是，本發明並非限定於微微 秒範圍或奈秒範圍之短脈衝雷射。對於比短波長之毫微微 秒範圍或奈秒範圍更長波長的脈衝雷射也可適用。 第1光束徑變倍光學系統14賦與剖面光束形狀為略橢 圓形之入射光束朝1軸方向（第2圖所示之X方向）以預定變 201107069 倍率（N倍）變倍，並變換成橢圓形狀的光束形狀的第1作 用。由第1光束徑變倍光學系統14之繞射光學元件側的稜鏡 14b出射之剖面橢圓形狀的光束，對繞射光學元件12垂直入 射。 已垂直入射繞射光學元件12之橢圓形狀的光束，於分 別的入射點分歧成相同軸方向具有不同角度的複數光。第2 圖例示分歧成1軸方向具有不同角度之三種光的情形。其結 果，入射繞射光學元件12的一光束可變換成由分別為相同 角度分歧光之束所構成的複數分歧光束。例如，若是於繞 射光學元件12中分歧成三光束，則將入射繞射光學元件12 的一光束變換成分別為能量分割成1/3的三分歧光束。利 用繞射光學元件12分歧之光束，入射隔著繞射光學元件12 而配置於相反側之第2光束徑變倍光學系統14。 第2光束徑變倍光學系統14對入射光賦與可抵銷以第1 光束徑變倍光學系統14所賦與之第1作用的第2作用。.具體 上，第1光束徑變倍光學系統14以預定變倍率(N倍）朝向第2 圖所示X方向變倍作為第1作用，因此，朝X軸方向反變倍 (1/N倍)作為第2作用。如此一來，已透過第2光束徑變倍 光學系統15之分歧光束之光束尺寸及形狀與朝向第1光束 徑變倍光學系統14入射前相同，且以分歧成複數的狀態（多 光束）射出。由第2光束徑變倍光學系統14射出的分歧光束 朝聚光透鏡13入射。 聚光透鏡13將由第2光束徑變倍光學系統14入射之分 歧光束聚光於被加工物上，形成配列成1線狀之多光束的光 201107069 點。第2圖顯示以光點間隔=D配列成1線狀多光束點。 本實施形態藉由利用第1光束徑變倍光學系統14賦與 入射光束之變倍作用（及利用第2光束徑變倍光學系統15賦 與的反變倍作用）的變倍率，控制第2圖所示各分歧光束之 光束點的光點間隔=D。右是將第1光束徑變倍光學系統14 之變倍率設得大，則能將各光束之光點間隔=D設得大，若 是將第1光束徑變倍光學系統14之變倍率設得小，則能將各 光束之光點間隔=D設得小。控制電路18—旦賦與對應被加 工物W之加工條件之光點間隔=〇時，計算（14a、1仆）、 (15a、15b)之旋轉量而對第1及第2稜鏡驅動機構i6、17賦與 角度控制指令’而將稜鏡14a、14b、15a、15b的角度控制 成可實現所希望光點間隔的角度。 第3圖顯示將光點間隔設得較第2圖所示光學系統小之 光學系統及該光學系統之各圖式所示位置的光束剖面形 狀。將第1光束徑變倍光學系統14之放大率設定成較第2圖 所不光學系統之狀態小的值，而使第2光束徑變倍光學系統 15之反變倍率與第1光束徑變倍光學系統14之放大率對應 變更。具體上’保持光束對繞射光學元件12垂直入射的條 件’且第1稜鏡驅動機構16將第1光束徑變倍光學系統14之 棱鏡14a朝逆時鐘方向旋轉預定該之同時，第2稜鏡驅動 機構Π將第2光束徑變倍光學系統^之稜鏡⑸朝向與稜鏡 14a反方向之時鐘方向旋轉相同角度。又，第1稜鏡驅動機 構16將第1光束徑變倍光學系統14之稜鏡14b朝時鐘方向旋 轉預定角度之同時，第2稜鏡驅動機構17將第2光束徑變倍 12 201107069 =學系統15之稜鏡15a朝向與稜鏡14b反方^逆時鐘方向 旋轉相同角度。其結果如第3_心保持光細繞射光學 垂直人射的條件’且利用繞射光學元件12分歧成不 同角度之各分歧光的分歧角度變小，而㈣聚光透鏡⑽ 光之分歧光束的光點間隔變窄。第3圖中光點間隔變窄至形 成在被加工物W之光束點為無間隙地配列程度。 在此說明形成在被加工物W之分歧光束之光束輪廊。 第4圖⑷顯示由七光束構成之分歧光束所構成光束:方向 之能量分布與光束輪廓。將七個光束點以無間隙排列於形 成在被加卫物W之界道方向（加:^方向）的狀態，能大幅縮短 加工時間，能利用搭載於雷射光源u之振盈器之輸出最大 限度。 第4圖(b)顯示頂帽型光束之能量分布與光束輪廊 。以利 用頂帽用之繞射光學it件而能形成頂帽型光束。於上述光 學系統中，以利用頂帽用繞射光學元件作為繞射光學元件 12而能調整光束的長度。又，能量分布為高斯（Gaussi〇n) 分布之高斯型光束中，光束徑方向端部之能量低的部分無 法增進加工。第4圖（b)所示之頂帽型光束較高斯型光束可更 有效率地使用能量。而且，高斯型光束相對於加工線將高 斯線橫置的話，可調整加工線的寬度。又，也能達到使業 經雷射加工之溝的底成為平面的作用效果。 如上所述依據本實施形態，於透過型之繞射光學元件 12兩端配置第1變倍光學系統14(歪像稜鏡對！4a、14b)與第2 變倍光學系統15(歪像稜鏡對15a、15b)，而將已透過第2變 13 201107069 倍光學系統15之分歧光導向聚光透鏡13，因此，能以調整 稜鏡（Ma、Mb)、（l5a、l5b)的角度而能簡單地控制第1光 束徑變倍光學系統14的變倍率(N)與第2光束徑變倍光學系 統15的變倍率（1/N)，能設定所希望的光點間隔d。又，僅 使稜鏡旋轉而不需要大的空間，因此也可達到小型化。 又，依據本實施形態，將第1變倍光學系統14、15及繞 射光學元件12係部以非球面光學元件來構成以作為歪像稜 鏡對（14a、14b)、（15a、15b)，因此，與利用球面光學元件 的情形相比較，乃具有非常容易合併光軸的優點。 又，依據本實施形態，以歪像稜鏡對（14a、14b)、（15a、 15b)構成第1變倍光學系統14、15，因此，即便是使稜鏡 14a、14b、15a、15b旋轉’也因能使由稜鏡出射之光的方 向固定於一定方向，所以能回定繞射光學元件12及聚光透 鏡13的位置，能以簡單的機械構成來實現光學系統。 其次’參照第5圖來說明可將分歧光束所造成之光點配 列成二次元狀的光學系統。第5圖中合併顯示該光學系統之 各圖所示位置中的光束剖面形狀。本實施形態之光學系統 將第1圖所示之第1及第2變倍光學系統14、15與繞射光學元 件12設為第1組合，而追加具有與第1組合同樣構成的第2組 合。配置有光學構件，以構成一旦藉由第1組合而形成之多 光束配列於第1方向時，則使第2組合朝向與第1方向正交的 第2方向多光束配列。 第5圖所示之多光束光學系統包含有：由第1變倍光學 系統14、繞射光學元件12及第2變倍光學系統15構成的第1 14 201107069 組合；及，由第3變倍光學系統21、透過型繞射光學元件22 及第4變倍光學系統23構成的第2組合。已透過第2變倍光學 系統15之分歧光束入射第3變倍光學系統21。 又，第5圖中第卜第2、第3、第4變倍光學系統14、15、 21、23之各稜鏡配置僅為用以例示構成要素而方便地顯 示。實際上，配置各稜鏡以使第1及第2變倍光學系統14、 15之變倍方向與第3及第4變倍光學系統21、23之變倍方向 為正交方向。 第3變倍光學系統21以歪像棱鏡對(21a、21b)來構成， 可對與第1變倍光學系統14之變倍方向即第1方向正交的第 2方向賦與以任意變倍率來變倍的第3作用。其結果如第5圖 所示，將第2方向作為長軸方向之橢圓光束朝向第1方向成 複數配列的狀態。複數橢圓光束垂直入射第2組合的繞射光 學元件22。 第2組合的繞射光學元件22與第1組合的繞射光學元件 12相同設計，但是，設定了配置角度使分歧方向成為與第1 組合的繞射光學元件12正交的方向。使配置於前段的繞射 光學元件12與配置於後段的繞射光學元件22之相互分歧方 向正交，而能最有效率地將光束點配列成矩陣狀。但是， 不一定要正交，只要是雙方繞射光學元件之分歧方向的角 度相互不同，則能將光束點配列成矩陣狀。 利用繞射光學元件2 2分歧的光入射第4變倍光學系統 23而賦與可抵銷在第3變倍光學系統所賦與之第3作用的第 4作用。即，與第1及第2變倍光學系統14、15的關係相同， 15 201107069 於第4變倍光學系統23設定與設定於第3變倍光學系統21之 變倍率相對的反變倍率。利用控制各稜鏡21a、21b、23a、 23b而能任意設定第3及第4變倍光學系統21、23之變倍率設 定的的變倍率。控制電路18藉由第3及第4稜鏡驅動機構 24、25而控制各棱鏡21a、21b、23a、23b的角度。 以利用聚光透鏡13將已透過第4變倍光學系統之二次 元分歧光束予以聚光而形成配列成矩陣狀的光束點。第5圖 中例示了於1線形成有4光點的狀態。能以第丨組合之第丨及 第2變倍光學系統14、15任意設定第丨方向的光點間隔，而 能以第2組合之第3及第4變倍光學系統21、23任意設定第2 方向的光點間隔。控制電路18由第1方向及第2方向之光點 間隔來計算稜鏡的角度，並產生可實現業經計算之角度的 角度控制指令信號，而輸入第丨〜第4稜鏡驅動電路16、17、 24、25。如此一來，能形成第丨方向及第2方向之光點間隔 設定成所希望值之矩陣狀的光束點。 第6圖（a)顯示1線排列5光點且一次可加工〗線的二次元 光束配列。例如’能以第1組合來設定同一線上的光點間 隔’而以第2組合來設定線間隔。又，圖中的箭頭顯示加工 進行方向。 又’如第6圖（b)所示，於1線緊密地配列1〇光點以形成 頂帽型線光束，也能同時於2線形成頂帽型線光束。如第6 圖（b)所示，以將頂帽型線光束形成複數線，即使被加工物 為長方形晶片的作業(work)，也能一次2線加工，能大幅縮 短加工時間。又，圖中的箭頭顯示加工進行方向。 16 201107069 又，於第1圖所示之光學系統中，也可使用 < 將入射光 朝二次元方向分歧之二次元繞射光學元件以取代繞射光學 元件12。藉由使用二次元繞射光學元件可不要第2組合 (21、22、23)而能達到光學系統的簡單化及小蜇化。但疋 變得無法個別控制第1方向及第2方向的光點間隔。 以上的說明中，將個別的變倍光學系統配置於繞射光 學元件的兩側，但是，以使用反射型繞射光學元件能建構 成將變倍光學系統僅配置於繞射光學元件之單側的光學系 統。 第7圖係使用反射型繞射光學元件之光學系統的構成 圖。 第7圖所示之光學系統，將由未以圖式顯示之雷射光源 入射之短脈衝雷射光入射配置在光軸上的偏光光束分離器 31，並使具有預定偏光面之反射成分朝反射型繞射光學元 件側反射。藉由偏光光束分離器31導向光軸上之短脈衝雷 射光入射變倍光學系統32。變倍光學系統32以歪像稜鏡對 32a、32b構成，且建構成藉由稜鏡驅動機構41而可從控制 電路18個別控制稜鏡角度。變倍光學系統32在從一側的棱 鏡32&側朝另—側之稜鏡32b側透過的往路上，賦與以預定 倍率朝預定方向變倍的第丨作用。 於變倍光學系統3 2之往路被賦與第1作用而變換成橢 圓形狀的檐圓雷射光束，藉由1/4波長板33而垂直入射反 射型繞射光學元件34。1/4波長板33將作為直線偏光而進 來的光束變換成圓偏光。 17 201107069 反射型繞射光學元件34將在變倍光學系統32已被賦與 第1作用的橢圓雷射光束予以反射且分歧成不同角度而出 射。由反射型繞射光學元件34出射的分歧光束再度通過丨/4 波長板33時，將圓偏光變換為與往路成偏光面9〇。旋轉的直 線偏光。 而且，由反射型繞射光學元件34出射的分歧光束從變 倍光學系統32之反方向入射《變倍光學系統32在從反方向 入射的返路賦與可抵銷在往路賦與之第丨作用的第2作用。 於變倍光學系統32之返路被賦與第2作用的分歧光束 入射偏光光束分離器31。已入射偏光光束分離㈣之分歧 光束兩次通過1/4波長板33後直線偏光之偏光面％。旋 轉，因此會透過分歧面31a。已透過偏光光束分離器3ι之分 歧光束聚光透鏡35·光於被加工物^ q射聚光 透鏡35之分歧光束與妓射錄射絲元件M的分歧方向 對應而使角度不同’所以，與分歧數對應之光束點以預定 間隔形成於藉由聚光透鏡35所造成之聚光點。 如上所述，以使用反射型繞射光學元件％而構成多光 先學系統’ Mi«料學线_量巾缺構成 ^使収射魏射光學元件34的情形下，因光束透過之 ==件增加而會有產生若干能量損失的㈣，^ 政引用省空間化優點的光學系統設計。 可 又’當使紐拉_龍來取代〜波長板 降低利用繞射光學科34之能量損失，因此更佳。 其次說明使用上述光學系統的雷射加工裝置。 201107069 第8圖係使用多光學系統的雷射加卫裝置的構成例。 半導體晶圓W形成略圓板狀，表面藉由配列成格子狀 之分割預定線而區劃成複數領域，於此業經區劃的領域形 成有IC、LSI等零件72。又，半導體晶圓w藉由貼著帶加 被環狀框71支撐。 又’本實施形態中舉出石夕晶圓等半導體晶圓作為作業 的例來說明’然、而，並非限定於此構成’可將貼著於半導 體晶圓W之DAF(Die Attach Film)等黏著構件、半導體製品 之封包、陶瓷、玻璃、藍寶石（Ah。3)類無機材料基板、各 種電構件與被要求微米級加卫位置精度的各種加工材料作 為作業。 雷射加工裝置50於加工台51配設有形成於丫轴方向之 —對Y軸導執52a、52bQY軸工作台53被載置成沿著丫轴導 軌52a、52b可朝Y軸方向自由移動。丫轴工作台此背面側 形成有未以圖式顯示之螺母部’球螺栓54螺合於螺母部。 匕來於球螺检54之端部連結驅動馬達55 ,而球螺栓 54藉由驅動馬達55可旋轉驅動。 Y轴工作台53上配設有形成於與Y軸方向正交之X軸方 向之一對X軸導軌56a、56b〇X轴工作台57被載置成沿著X 輪導軌56a、56b可朝X軸方向自由移動。χ軸工作台57之背 ，側Φ成有未以圖式顯示之螺母部，球螺栓綱合於螺母 士此來’於球螺栓58之端部連結驅動馬達59，而球 螺拴58藉由驅動馬達59可旋轉驅動。 轴作°57上设置有夾頭工作台60。夾頭工作台60 19 201107069 包含有工作台支#部6卜可吸著並保持半導體晶圓_晶 圓保持部62,而該半導體晶圓W具有設於工作台支撐部“ 之上部的加工預定’界道、及，簡環狀框的框保持部 63。於工作台支撐部61内部設有使晶圓保持部以吸著並保 持半導體晶圓W的吸取源。 又，加工台51立設有支柱部64，由支柱部料之上端部 朝夾頭工作台60上方伸出的臂65支撐著雷射照射單元的。 雷射照射單元66收納有前述光學系統。 於以上所述構成之雷射加工襄置50中，半導體晶圓w 被載置於夾頭工作台60。如此一來，半導體晶圓w藉由未 以圖式顯示之吸取源而被晶圓保持部62吸取。 其次，雷射照射單元66驅動，藉由X軸工作台57、γ軸 工作台53調整位置後開始雷射加工。此情形下，雷射照射 單元66朝界道照射雷射光線。此時，利用第5圖所示光學系 統進行第6圖（a)所示3線同時加工的情形下，可控制與線間 隔及相同線狀之光點間隔對應而搭載於雷射照射單元6 6之 光學系統的稜鏡角度。又’如第6圖（b)所示頂帽型線光束所 造成2線同時加工的情形下’控制光點間隔以使以第1組合 設定線間隔，並以第2組合形成頂帽型線光束。 如上所述，依據使用了上述光學系統的雷射加工裝 置，可複數線同時加工之同時’且僅以調整稜鏡角度而能 任意設定與作業對應之線間隔及同—線上的光點間隔。 又，不僅上述線加工，也能適用於通道孔加工之開孔 加工、使晶圓的一部分陷入的面加工。 20 201107069 此次揭示的實施形態中，全部的點均為例示而非限制 於此貫施形態者。本發明的範圍不僅為上述實施形態所說 明者，而係以發明專利申請專利範圍來表示，乃指包含與 發明專利申請專利範圍均等的意思及範圍内全部的變更。 產業之可利用性 本發明可適用於利用多光束將半導體晶圓等被加工物 予以雷射加工的雷射加工裝置。 【圖式簡單說^月】 第1圖係一貫施形態之多光束光學系統的全體構成圖。 第2圖顯示於第1圖之光學系統中形成有1線多光束點 的狀態。 第3圖顯示形成有與第2圖之光束點不同光點間隔之多 光束點的狀態。 第4圖（a)係顧示多光束型的能量分布及光束輪廓的圖 式、第4圖（b)係顯示頂帽(t〇p_hat)型的能量分布及光束輪廓 的圖式。 第5圖係另一實施形態之多光束光學系統的全體構成 圖。 第6圖（a)係顯示1線5光點且3線同時加工的光束配列的 圖式、第6圖（b)係顯示頂帽型之線光束且2線同時加工的光 束配列的圖式。 第7圖係使用反射型繞射光學元件之多光束光學系統 的全體構成圖。 第8圖係雷射加工裝置的外觀圖。 21 201107069 【主要元件符號說明】 11.. .雷射光源 12.. .繞射光學元件 13.. .聚光透鏡 14.. .第1變倍光學系統 14a、14b...棱鏡 15.. .第2變倍光學系統 15a、15b...棱鏡 16.. .第1棱鏡驅動機構 17.. .第2稜鏡驅動機構 18…控制電路 19a... X軸工作台 19b... Y軸工作台 21.. .第3變倍光學系統 21a、21b...稜鏡 22.. .繞射光學元件 23.. .第4變倍光學系統 23a、23b...棱鏡 24.. .第3稜鏡驅動機構 25.. .第4棱鏡驅動機構 31.. .偏光光束分離器 3 la...分歧面 32.. .變倍光學系統 32a、32b...歪像稜鏡對 33.. .1.4波長板 34.. .反射型繞射光學元件 35.. .聚光透鏡 41.. .棱鏡驅動機構 50.. .雷射加工裝置 51.. .加工台 52a、52b...Y軸導軌 53.. . Y軸工作台 54.. .球螺栓 55.. .驅動馬達 56a、56b...X軸導軌 57.. .X軸工作台 58.. .球螺栓 59.. .驅動馬達 60.. .夾頭工作台 61.. .工作台支撐部 62.. .晶圓保持部 63.. .框保持部 64.. .支柱部 65.. .臂 66.. .雷射照射單元 71.. .環狀框 72.. .零件 73.. .貼著帶 W...被加工物(半導體晶圓) 22Optical elements) or a combination of a diffractive optical element and a collecting lens to convert a single-laser beam into a complex laser beam to condense, and a plurality of laser beams are simultaneously processed by a plurality of laser beams (Refer to Patent Document 2). The laser processing split reveals that the diffractive optical element is rotated about the optical axis. The pitch of the processing lines can be adjusted by adjusting the rotation angle. However, the laser processing apparatus described in Patent Document 2 has a problem that it is difficult to adjust the optical axis by rotating the diffractive optical element to adjust the pitch of the processing lines. Further, since the change of the _ interval is accompanied by the rotation of the diffractive material member, there is a problem that the arrangement of the free beam spot is limited. The present invention has been made in view of the above circumstances, and an object thereof is to provide an optical system and a laser processing apparatus. The optical system and the laser processing apparatus are limited in energy even if the laser pulse for each unit area is increased. 201107069 can also fully utilize the effectiveness of the laser oscillator, and can arbitrarily set the distance between the beams of the multiple beams, and can easily adjust the optical axis and can easily switch the processing conditions for each workpiece. Means for Solving the Problem The optical system of the present invention is characterized by comprising: a light source; a diffractive optical element that can be incident by the light emitted by the light source and can divide the incident light into a plurality of lights; a light collecting lens in which the diverging optical elements are condensed on a plurality of condensing lenses corresponding to the divergence angle; and the first light that is incident on the diffractive optical element from the light source side is multiplied at least in the one-axis direction The anomorphic optical mechanism that cancels the second action of the first action can be applied to the light emitted from the diffractive optical element and directed toward the condensing lens side. According to this configuration, the light incident on the diffractive optical element is given a first action that is at least doubled in the one-axis direction, and the light that is emitted by the diffractive optical element and directed toward the collecting lens side is offset by the first action. Since the second action is performed, the first and second actions caused by the anamorphic optical mechanism can be adjusted without rotating the diffractive optical element, that is, the beam spot interval of the condensing point of the condensing lens can be arbitrarily set. In the optical system described above, the magnification of the imaging optical mechanism is adjusted, and the spot interval formed at the condensing position of the condensing lens can be controlled. In the above optical system, the imaging optical mechanism can be configured to include a prism body constituting a variable magnification optical system. The imaging optical mechanism is constituted by a prism body, and other optical elements can be formed by an aspherical optical member in addition to the condensing lens, and the combined optical axis can be easily achieved. The optical axis of the optical system is also disclosed in the above optical system. The rotating mechanism of the aforementioned carcass rotation. Thereby, the light spot interval can be adjusted by the simple operation of rotating the prism body, and the space can be made small, so that space saving and miniaturization can be achieved. Further, in the optical system of the present invention, the diffractive optical element is a transmissive diffractive optical element, and the imaging optical mechanism has first and second first and second optical elements arranged on an optical axis of the diffractive optical element. In the body, the rotation mechanism uses the transmission-type diffractive optical element as a symmetry plane to rotate the first body and the second body symmetrically. According to such a configuration, by using the transmissive diffractive optical element, the optical system can be constructed without using a polarizing beam splitter in the path from the light source to the collecting lens. Therefore, an optical system having a small energy loss can be constructed. Further, in the above optical system, the first body may include a first prism and a second side, and the second body may include a third side and a fourth side. In this way, the first and second bodies are respectively formed by the pair of turns, and even if the turn is rotated, since the light emitted by the click is in a certain direction, the diffractive optical element and the collecting lens can be fixed. The position can simplify the mechanical structure of the optical system. Further, the optical system of the present invention is characterized in that the light source is a laser light source capable of emitting pulsed laser light, and the condensing lens allows the pulsed laser light to condense the workpiece. According to such a configuration, it is applicable to a laser processing apparatus that condenses a pulsed laser beam onto a workpiece to perform laser processing. 201107069 Further, the laser processing apparatus of the present invention includes: a holding mechanism capable of holding a workpiece; and a processing mechanism capable of irradiating a workpiece that has been held by the holding mechanism with a pulsed laser, characterized in that the processing is performed. The mechanism includes any of the above optical systems. According to such a laser processing apparatus, the beam spot spacing of the condensing point of the condensing lens can be arbitrarily set by adjusting the first and second actions caused by the anamorphic optical mechanism, so that the processing conditions can be easily switched to each A workpiece can achieve the efficiency of laser processing. EFFECT OF THE INVENTION According to the present invention, even if the energy of the laser pulse for processing per unit area can be increased, the effectiveness of the laser oscillator can be fully utilized, and the short pulse laser can be processed with good efficiency. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the overall configuration of a multi-beam optical system according to an embodiment. Fig. 2 shows a state in which a 1-line multi-beam spot is formed in the optical system of Fig. 1. Fig. 3 shows a state in which a plurality of beam spots are formed at intervals different from those of the beam spot of Fig. 2. Fig. 4(a) shows a pattern of energy distribution and beam profile of a multi-beam type, and Fig. 4(b) shows a diagram of a top-hat type energy distribution and a beam profile. Fig. 5 is a view showing the overall configuration of a multi-beam optical system of another embodiment. Fig. 6(a) is a diagram showing a beam arrangement in which 1 line of 5 spots and 3 lines are simultaneously processed, and Fig. 6 (b) shows a line arrangement of a top hat type line beam and 2 lines simultaneously processed. formula. Fig. 7 is a view showing the entire configuration of a multi-beam optical system using a reflective diffractive optical element. Figure 8 is an external view of the laser processing apparatus. [Embodiment 3] Mode for Carrying Out the Invention Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a view showing the configuration of an optical system according to an embodiment of the present invention incorporated in a drive mechanism. In the optical system of the present embodiment, a single short-pulse laser light emitted from the laser light source 11 is incident on the diffractive optical element 12, and is branched into a plurality of light beams each having a predetermined angle, and the dichroic lens 13 is used to make the divergence. The light is condensed in a line shape or a two-dimensional matrix shape on the workpiece W. In the present embodiment, the first beam diameter varying optical system 14 is disposed on the optical path of the diffractive optical element 12 on the light source side, and the second beam path is disposed on the optical path of the diffractive optical element 12 on the side of the collecting lens 13 Variable magnification optical system 15. Each of the first and second beam diameter varying optical systems 14 and 15 includes an imaging optical member. In the present example, the first and second beam diameter varying optical systems 14, 15 constitute an imaging optical mechanism. The first beam diameter varying optical system 14 imparts a first action to the incident light to convert the cross-sectional shape of the incident beam into an elliptical shape. Further, the second beam diameter varying optical system 15 is set so as to be able to cancel the first effect of the first beam diameter changing optical system 14 by the divergence 201107069 light emitted from the diffractive optical element 12. The optical member arrangement of the second action (including the angle). Each of the first and second beam diameter varying optical systems 14 and 15 includes a body (14a, 14b) and (15a, 15b) constituting the imaging optical member. The first beam diameter varying optical system 14 includes a second driving mechanism that can individually adjust the incident surface angle (rotation angle) with respect to the crucibles 14a and 4b constituting the crucible. The second beam diameter changing optical system 15 includes The second prism drive mechanism 17 that can individually adjust the angle of incidence (rotation angle) with respect to the rims 15a and 15b constituting the prism body. The first and second prism drive mechanisms 16 and 17 constitute a rotating mechanism. By changing the rotation angle with respect to the optical axes of the respective turns (14a, 14b) and (15a, 15b) constituting each of the bodies, the change of the second and second beam diameter varying optical systems 14 and U can be changed. Double rate. In the present embodiment, the angles of the prisms (14a, 14b) and (15a, 15b) are adjusted so that the first beam diameter varying optical system 14 is given the first action of converting the cross-sectional beam shape of the incident beam into an elliptical shape. The beam diameter varying optical system 15 is provided with a second action for canceling the first action. Specifically, 'the condition of the incident light beam perpendicular to the diffractive optical element 12 is maintained, and the outer sides are arranged for the four sides arranged on both sides. The inner ridges (14b, 15a) of the prisms (14a, 15b) are rotated by the same angle in the opposite direction. In other words, the diffractive optical element 12 is used as a plane of symmetry, and one side of the crucible (14a, 14b) is symmetrically rotated with the other side of the crucible (15a, 15b), whereby the beam path can be changed without changing the beam path. The angle formed by the respective light beams of the incident condenser lens 13 is controlled. The angle formed by each of the light beams incident on the condensing lens 13 is changed by the action of the condensing lens 13 to form a line-shaped spot interval 201107069 which is formed in a workpiece (no dot position). The control circuit 18 is configured by hardware resources such as a CPU, a ROM, and a RAM, and the CPU reads the control software that has been stored in the R Ο 并 and performs processing according to the program. The control circuit 18 generates the corresponding processing according to the workpiece. The angle control command of the spot interval is set under the condition, and the first and second prism drive mechanisms 16 and 17 are input. Fig. 1 exemplifies a system in which a workpiece can be moved by a secondary element in the XY plane with respect to the optical axis by the boring stages 19a and 19b. The control circuit 18 assigns a timing command to the laser light source 11 and the XY axis stages 19a, 19b to give an operation timing. Thereby, laser processing along the plural boundary formed in the workpiece W can be realized. Fig. 2 shows the beam profile shape in the position where the multi-beam is set to the optical system of the spot interval = D and the positions of the optical system. The diffractive optical element is designed to split the incident light into a plurality of light beams having different angles, respectively. The present example is designed to be bifurcated to have different angles in the direction of the x-axis, however, for example, the dipoles may be designed to bifurcate to have different divergence angles in the 2-axis direction. The short-pulse laser light emitted from the laser light source 11 is incident on 光源i4a on the light source side of the second beam-diameter optical system 14. The laser source receives timing signals from the control circuit 18, and the exit pulse width is short pulsed laser light in the picosecond range or nanosecond range. However, the present invention is not limited to short pulse lasers in the picosecond range or the nanosecond range. Pulsed lasers of longer wavelengths than the femtosecond range of the short wavelength or the nanosecond range are also applicable. The first beam diameter varying optical system 14 is configured such that the incident beam having a substantially elliptical cross-sectional beam shape is multiplied in a one-axis direction (X direction shown in FIG. 2) by a predetermined change of 201107069 (N times), and converted into The first role of the elliptical shape of the beam shape. The light beam of the elliptical shape which is emitted from the 稜鏡 14b on the side of the diffractive optical element of the first beam diameter varying optical system 14 is incident perpendicularly to the diffractive optical element 12. The elliptical beam that has been incident perpendicularly to the diffractive optical element 12 splits into a plurality of beams having different angles in the same axial direction at the respective incident points. Fig. 2 exemplifies a case where three kinds of lights having different angles in one axis direction are divided. As a result, a light beam incident on the diffractive optical element 12 can be converted into a complex bifurcated beam composed of bundles of divergent light of the same angle, respectively. For example, if three beams are split into the diffractive optical element 12, a beam incident on the diffractive optical element 12 is converted into a three-divided beam of energy divided into 1/3, respectively. The light beam diverging from the optical element 12 is incident on the second beam diameter varying optical system 14 disposed on the opposite side via the diffractive optical element 12. The second beam diameter varying optical system 14 imparts a second action to the incident light that cancels the first action given by the first beam diameter varying optical system 14. Specifically, the first beam diameter varying power optical system 14 has a first magnification acting in the X direction as shown in FIG. 2 at a predetermined magnification ratio (N times), and therefore is inversely multiplied in the X-axis direction (1/N times). ) as the second role. In this manner, the beam size and shape of the divergent beams that have passed through the second beam diameter varying optical system 15 are the same as those before the incident of the first beam diameter varying optical system 14, and are emitted in a multiplicity (multiple beam). . The divergent light beam emitted from the second beam diameter varying optical system 14 is incident on the collecting lens 13. The condensing lens 13 condenses the astigmatic light beam incident on the object by the second beam diameter varying optical system 14 to form a multi-beam light having a line shape of 1,070,070 points. Fig. 2 shows a multi-beam spot arranged in a line shape at a spot interval = D. In the present embodiment, the first beam diameter varying optical system 14 is used to change the magnification of the incident beam (and the inverse magnification effect by the second beam diameter varying optical system 15), and the second control is performed. The spot spacing of the beam points of the respective divergent beams is shown as D. On the right, if the magnification ratio of the first beam diameter-variable optical system 14 is set to be large, the dot interval of each beam can be set to be large, and the magnification of the first beam diameter-variable optical system 14 can be set. Small, the spot spacing of each beam = D can be set small. The control circuit 18 calculates the rotation amount of (14a, 1 servant) and (15a, 15b) for the first and second 稜鏡 drive mechanisms when the interval of the spot corresponding to the processing condition of the workpiece W is 〇 = 〇 I6, 17 are assigned an angle control command' to control the angles of the turns 14a, 14b, 15a, 15b to an angle at which the desired spot spacing can be achieved. Fig. 3 shows a beam profile shape in which the spot interval is set smaller than that of the optical system shown in Fig. 2 and the positions shown in the respective drawings of the optical system. The amplification factor of the first beam diameter varying optical system 14 is set to a value smaller than the state of the optical system of the second drawing, and the inverse magnification of the second beam diameter varying optical system 15 and the first beam diameter are changed. The magnification of the optical system 14 is changed correspondingly. Specifically, 'the condition that the light beam is incident perpendicularly to the diffractive optical element 12' and the first turn drive mechanism 16 rotates the prism 14a of the first beam diameter change optical system 14 in the counterclockwise direction, and the second edge The mirror driving mechanism 旋转 rotates the second beam diameter zoom optical system (5) at the same angle as the clock direction in the opposite direction of the crucible 14a. Further, the first turn drive mechanism 16 rotates the turn 14b of the first beam diameter change optical system 14 by a predetermined angle in the clock direction, and the second turn drive mechanism 17 doubles the second beam path. The bore 15a of the system 15 is rotated at the same angle as the counterclockwise counterclockwise direction of the crucible 14b. As a result, the divergence angle of each of the divergent lights that are diverged into different angles by the diffractive optical element 12 becomes smaller as in the case of the third-heart-retaining fine-diffraction optical vertical human incidence, and (4) the diffractive beam of the condensing lens (10) The spot spacing is narrowed. In Fig. 3, the spot interval is narrowed to the extent that the beam spot of the workpiece W is arranged without a gap. Here, the beam corridor formed by the divergent beams of the workpiece W will be described. Fig. 4 (4) shows the beam of light composed of the divergent beams composed of seven beams: the energy distribution of the direction and the beam profile. By arranging the seven beam spots in a direction in which the boundary of the object W (addition: ^ direction) is formed without a gap, the processing time can be greatly shortened, and the output of the vibrator mounted on the laser source u can be utilized. Maximize. Figure 4(b) shows the energy distribution of the top hat beam and the beam corridor. A top hat beam can be formed by using a diffractive optical member for the top cap. In the above optical system, the length of the light beam can be adjusted by using the diffractive optical element for the top cap as the diffractive optical element 12. Further, in the Gaussian beam in which the energy distribution is Gaussian, the portion where the energy at the end of the beam diameter is low cannot be processed. The top hat type beam higher beam type shown in Fig. 4(b) can use energy more efficiently. Further, if the Gaussian beam is placed transverse to the processing line, the width of the processing line can be adjusted. Further, it is possible to achieve the effect of making the bottom of the laser-processed groove a flat surface. According to the present embodiment, as described above, the first variable power optical system 14 (the image pair !! 4a, 14b) and the second variable power optical system 15 are disposed at both ends of the transmissive type diffractive optical element 12. The mirror pair 15a, 15b) directs the divergent light that has passed through the second change 13 201107069 optical system 15 to the collecting lens 13, so that the angles of the 稜鏡 (Ma, Mb), (l5a, l5b) can be adjusted. The magnification ratio (N) of the first beam diameter varying optical system 14 and the magnification ratio (1/N) of the second beam diameter changing optical system 15 can be easily controlled, and a desired spot interval d can be set. Moreover, since only the cymbal is rotated without requiring a large space, miniaturization can be achieved. Further, according to the present embodiment, the first variable power optical systems 14 and 15 and the diffractive optical element 12 are configured as aspherical optical elements as the image pair (14a, 14b) and (15a, 15b). Therefore, compared with the case of using a spherical optical element, there is an advantage that it is very easy to incorporate an optical axis. Further, according to the present embodiment, since the first variable power optical systems 14 and 15 are formed by the pair of 稜鏡 (14a, 14b) and (15a, 15b), even the cymbals 14a, 14b, 15a, 15b are rotated. Since the direction of the light emitted from the crucible can be fixed in a certain direction, the position of the diffractive optical element 12 and the collecting lens 13 can be reset, and the optical system can be realized with a simple mechanical configuration. Next, an optical system in which the light spots caused by the divergent beams can be arranged in a quadratic shape will be described with reference to Fig. 5. The shape of the beam profile in the position shown in each of the optical systems is shown in Fig. 5. In the optical system of the present embodiment, the first and second variable power optical systems 14 and 15 and the diffractive optical element 12 shown in Fig. 1 are first combined, and a second combination having the same configuration as the first combination is added. . When the optical member is disposed so that the plurality of light beams formed by the first combination are arranged in the first direction, the second combination is arranged in the second direction multi-beam orthogonal to the first direction. The multi-beam optical system shown in FIG. 5 includes a first 14 201107069 combination composed of the first variable power optical system 14, the diffractive optical element 12, and the second variable power optical system 15; and, by the third zoom The second combination of the optical system 21, the transmissive diffractive optical element 22, and the fourth variable power optical system 23. The divergent light beams that have passed through the second magnification varying optical system 15 are incident on the third variable power optical system 21. Further, the respective arrangement of the second, third, and fourth variable power optical systems 14, 15, 21, and 23 in Fig. 5 is conveniently displayed only for exemplifying the constituent elements. Actually, the respective magnifications are arranged such that the magnification directions of the first and second variable power optical systems 14, 15 and the magnification directions of the third and fourth variable power optical systems 21, 23 are orthogonal directions. The third variable power optical system 21 is configured by an imaging prism pair (21a, 21b), and is capable of imparting an arbitrary magnification ratio to a second direction orthogonal to the first direction of the first magnification optical system 14, that is, the first direction. The third role to zoom. As a result, as shown in Fig. 5, the elliptical beam in the second direction as the long-axis direction is arranged in a plurality of directions in the first direction. The complex elliptical beam is incident perpendicularly to the diffractive optical element 22 of the second combination. The diffractive optical element 22 of the second combination is designed in the same manner as the diffractive optical element 12 of the first combination. However, the arrangement angle is set such that the divergent direction is a direction orthogonal to the diffractive optical element 12 of the first combination. The diffractive optical element 12 disposed in the front stage and the diffractive optical element 22 disposed in the rear stage are orthogonal to each other, and the beam spots are most efficiently arranged in a matrix. However, it is not necessarily orthogonal, and the beam spots can be arranged in a matrix as long as the angles of the divergent directions of the both diffractive optical elements are different from each other. The light diverging from the diffractive optical element 22 is incident on the fourth variable power optical system 23, and the fourth action that cancels the third action applied to the third variable power optical system is provided. In other words, in the same manner as the relationship between the first and second variable power optical systems 14 and 15, 15 201107069 sets the inverse magnification ratio with respect to the magnification ratio set in the third variable power optical system 21 in the fourth variable power optical system 23. The magnification ratio set by the magnification ratio of the third and fourth variable power optical systems 21 and 23 can be arbitrarily set by controlling the respective turns 21a, 21b, 23a, and 23b. The control circuit 18 controls the angles of the prisms 21a, 21b, 23a, and 23b by the third and fourth driving mechanisms 24 and 25. The dichroic beam that has passed through the fourth variable power optical system is condensed by the condensing lens 13 to form beam spots arranged in a matrix. Fig. 5 illustrates a state in which four spots are formed on one line. The third and fourth variable power optical systems 21 and 23 of the second combination can be arbitrarily set in the second and fourth variable power optical systems 21 and 23 of the second combination by the second and fourth variable power optical systems 14 and 15 of the second combination. Spot spacing in 2 directions. The control circuit 18 calculates the angle of the pupil by the interval between the first direction and the second direction, and generates an angle control command signal for realizing the calculated angle, and inputs the second to fourth driving circuits 16, 17 24, 25. In this way, it is possible to form a beam spot in which the spot spacing in the second direction and the second direction is set to a desired value. Fig. 6(a) shows a two-element beam arrangement in which one line of five spots is arranged and one line can be processed. For example, 'the dot interval on the same line can be set in the first combination' and the line interval can be set in the second combination. Also, the arrows in the figure show the direction in which the machining is performed. Further, as shown in Fig. 6(b), a light spot is closely arranged on one line to form a top hat type line beam, and a top hat type line beam can be simultaneously formed on two lines. As shown in Fig. 6(b), the top hat line beam can be formed into a plurality of lines, and even if the workpiece is a rectangular wafer, it can be processed in two lines at a time, and the processing time can be greatly shortened. Moreover, the arrows in the figure show the direction in which the machining is performed. 16 201107069 Further, in the optical system shown in Fig. 1, it is also possible to use a <secondary element diffractive optical element in which incident light is diverged in the direction of the second element instead of the diffractive optical element 12. By using the secondary element diffractive optical element, the second combination (21, 22, 23) can be eliminated, and the simplification and miniaturization of the optical system can be achieved. However, it becomes impossible to individually control the spot interval in the first direction and the second direction. In the above description, the individual variable power optical systems are disposed on both sides of the diffractive optical element. However, the use of the reflective diffractive optical element can be constructed such that the variable magnification optical system is disposed only on one side of the diffractive optical element. Optical system. Fig. 7 is a view showing the configuration of an optical system using a reflective diffractive optical element. In the optical system shown in Fig. 7, the short-pulse laser light incident from the laser light source not shown in the figure is incident on the polarization beam splitter 31 disposed on the optical axis, and the reflection component having the predetermined polarization surface is directed toward the reflection type. The diffractive optical element side is reflected. The short-pulse laser light guided to the optical axis by the polarization beam splitter 31 is incident on the variable power optical system 32. The variable power optical system 32 is constituted by the image pair 32a, 32b, and is configured to individually control the angle of the cymbal from the control circuit 18 by the cymbal drive mechanism 41. The variable power optical system 32 imparts a third action which is doubled in a predetermined direction at a predetermined magnification on the way from the side of the prism 32& side to the other side of the side 32b. The circular laser beam that is converted into an elliptical shape by the first action of the variable power optical system 3 2 is vertically incident on the reflective diffractive optical element 34 by the quarter-wave plate 33. 1/4 wavelength The plate 33 converts the incoming light beam as a linearly polarized light into circularly polarized light. 17 201107069 The reflective diffractive optical element 34 reflects the elliptical laser beam to which the variable power optical system 32 has been assigned the first action and splits into different angles to emit. When the divergent light beam emitted from the reflective diffractive optical element 34 passes through the 丨/4 wavelength plate 33 again, the circularly polarized light is converted into a polarizing surface 9〇 with the forward path. Rotating linear polarized light. Further, the divergent light beam emitted from the reflective diffractive optical element 34 is incident from the opposite direction of the variable power optical system 32. "The returning optical system 32 is incident on the return path from the opposite direction. The second role of action. The branching light to the variable power optical system 32 is given a divergent beam of the second action to the incident polarization beam splitter 31. The incident polarized beam is split (4). The divergence of the polarized surface of the linearly polarized beam after passing through the quarter-wave plate 33 twice. Rotate, so it will pass through the divergent face 31a. The divergent beam condensing lens 35 that has passed through the polarizing beam splitter 3, the divergent beam that is incident on the workpiece illuminating lens 35 corresponds to the direction of the divergence of the splayed recording element M, and the angle is different. The beam spots corresponding to the divergence numbers are formed at predetermined intervals at the condensing point caused by the condensing lens 35. As described above, in the case where the reflection type diffractive optical element % is used, the multi-optical first-sense system is formed, and the light-transmitting optical element 34 is used. The increase in the number of pieces will result in a number of energy losses (4), and the government will cite the optical system design that saves space. It is better to reduce the energy loss of the diffraction optics 34 by making the Nila_long to replace the ~wavelength plate. Next, a laser processing apparatus using the above optical system will be described. 201107069 Fig. 8 is a configuration example of a laser-assisted device using a multi-optical system. The semiconductor wafer W is formed in a substantially circular plate shape, and the surface is divided into a plurality of fields by a predetermined dividing line arranged in a lattice shape. In the field of the division, a component 72 such as an IC or an LSI is formed. Further, the semiconductor wafer w is supported by the ring-shaped frame 71 attached to the tape. In the present embodiment, a semiconductor wafer such as a Shihwa wafer is described as an example of the operation. However, the present invention is not limited to the configuration of a DAF (Die Attach Film) that can be attached to the semiconductor wafer W. Adhesive members, semiconductor product packages, ceramics, glass, sapphire (Ah. 3) inorganic material substrates, various electrical components, and various processing materials that require micron-level positional accuracy. The laser processing apparatus 50 is disposed on the processing table 51 in the direction of the x-axis. The pair of Y-axis guides 52a and 52bQY are placed on the shaft table 53 so as to be movable in the Y-axis direction along the x-axis guides 52a and 52b. . On the back side of the boring table, a nut portion not shown in the figure is formed. The ball screw 54 is screwed to the nut portion. The drive motor 55 is coupled to the end of the ball screw 54 and the ball screw 54 is rotatably driven by the drive motor 55. The Y-axis table 53 is disposed on one of the X-axis directions orthogonal to the Y-axis direction to the X-axis guide rails 56a and 56b. The X-axis table 57 is placed along the X-wheel guides 56a and 56b. The X-axis direction moves freely. On the back side of the boring table 57, the side Φ is formed with a nut portion not shown in the figure, and the ball bolt is assembled to the nut to thereby connect the drive motor 59 to the end of the ball bolt 58, and the ball screw 58 is used. The drive motor 59 is rotatably driven. A chuck table 60 is provided on the shaft 57. The chuck table 60 19 201107069 includes a table support portion 6 that can suck and hold the semiconductor wafer_wafer holding portion 62, and the semiconductor wafer W has a processing schedule set on the upper portion of the table support portion The boundary holding portion 63 of the simple annular frame and the inside of the table support portion 61 is provided with a suction source for sucking and holding the semiconductor wafer W in the wafer holding portion 61. Further, the processing table 51 is erected. The pillar portion 64 supports the laser irradiation unit by an arm 65 extending from the upper end portion of the pillar portion to the upper portion of the chuck table 60. The laser irradiation unit 66 accommodates the optical system described above. In the shot processing apparatus 50, the semiconductor wafer w is placed on the chuck table 60. Thus, the semiconductor wafer w is sucked by the wafer holding portion 62 by the suction source not shown in the drawing. The laser irradiation unit 66 is driven, and the laser processing is started by adjusting the position by the X-axis table 57 and the γ-axis table 53. In this case, the laser irradiation unit 66 irradiates the boundary light with the laser beam. Figure 5 shows the optical system shown in Figure 6 (a) In the case of the work, it is possible to control the angle of the optical system mounted on the optical system of the laser irradiation unit 66 in accordance with the interval between the line spacing and the line shape of the same line. Further, the top hat type as shown in Fig. 6(b) In the case where two lines are simultaneously processed by the line beam, 'the spot spacing is controlled so as to be spaced apart by the first combination setting line, and the top hat type line beam is formed by the second combination. As described above, according to the thunder using the above optical system The injection processing device can simultaneously set the line interval corresponding to the operation and the spot interval on the same line only by adjusting the 稜鏡 angle. Moreover, not only the above line processing but also the channel can be applied to the channel. The hole processing of the hole processing and the surface processing in which a part of the wafer is immersed. 20 201107069 All the points in the embodiments disclosed herein are illustrative and not limited to the embodiments. The scope of the present invention is not limited to the above. The description of the embodiments and the scope of the invention patent application are intended to include all modifications within the meaning and scope equivalent to the scope of the invention patent application. The present invention can be applied to a laser processing apparatus that performs laser processing on a workpiece such as a semiconductor wafer by using a plurality of beams. [Simplified diagram of the drawing] Fig. 1 is a general configuration diagram of a multi-beam optical system of a consistent configuration Fig. 2 shows a state in which a multi-beam point of one line is formed in the optical system of Fig. 1. Fig. 3 shows a state in which a plurality of beam spots are formed at positions different from those of the beam spot of Fig. 2. (a) is a diagram showing the energy distribution and beam profile of the multi-beam type, and FIG. 4(b) is a diagram showing the energy distribution of the top cap (t〇p_hat) type and the profile of the beam. Fig. 6(a) is a diagram showing a light beam arrangement in which one line of 5 spots and three lines are simultaneously processed, and Fig. 6(b) shows a top hat type. A pattern in which a line beam and a 2-line beam are simultaneously processed. Fig. 7 is a view showing the entire configuration of a multi-beam optical system using a reflective diffractive optical element. Figure 8 is an external view of the laser processing apparatus. 21 201107069 [Description of main component symbols] 11.. Laser light source 12.. Diffractive optical element 13.. Condenser lens 14.. 1st variable power optical system 14a, 14b... Prism 15.. 2nd variable power optical system 15a, 15b...prism 16... 1st prism drive mechanism 17.. 2nd drive mechanism 18...control circuit 19a... X-axis table 19b...Y Axle table 21. The third variable optical system 21a, 21b...稜鏡22.. Diffractive optical element 23.. 4th variable power optical system 23a, 23b...prism 24.. The third driving mechanism 25: the fourth prism driving mechanism 31.. The polarizing beam splitter 3 la... the divergent surface 32.. The variable magnification optical system 32a, 32b... .. .1.4 Wavelength plate 34.. Reflective diffractive optical element 35.. Condenser lens 41.. Prism drive mechanism 50.. Laser processing device 51.. Processing table 52a, 52b... Y-axis guide 53.. Y-axis table 54.. Ball bolt 55.. Drive motor 56a, 56b... X-axis guide 57.. X-axis table 58.. Ball bolt 59.. Drive motor 60.. chuck work table 61.. table support portion 62.. wafer holding portion 63.. frame holding portion 64.. pillar portion 65. . . . arm 66.. . laser irradiation unit 71.. . ring frame 72.. . parts 73.. . with tape W... workpiece (semiconductor wafer) 22