TW201040616A - Active device array substrate, repairing method thereof and liquid crystal display device - Google Patents

Abstract

A method for laser repairing an active device array substrate including at least the following steps is provided. First, a substrate is provided. And a first patterned conductive layer, a gate insulating layer, a plurality of channels, a second patterned conductive layer and a passivation layer are formed on the substrate in proper order. The first patterned conductive layer includes a plurality of scan lines and gates, and the second patterned conductive layer includes a plurality of data lines and sources/drains. After the scan and data lines are formed on the substrate, detecting if the defect lines are formed. After all, forming a repairing line on the passivation layer to repair the active device array substrate.

Description

201040616

iZITW 24342 twf.doc/n VI. Description of the Invention: [Technical Field] The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display 7F device and a repair method thereof. [Prior Art] Although the current liquid crystal display technology has matured, the liquid crystal display panel will inevitably produce some defects during the manufacturing process, and these defects may cause sensory discomfort when displaying images on the liquid crystal display. Discarding these defective LCD panels will result in a significant increase in manufacturing costs. It is often difficult to rely solely on improved process technology to achieve zero defect rate, so the hysteresis patching technology for liquid crystal display panels has become quite important. In general, a liquid crystal display mainly includes a liquid crystal display panel and a backlight module for providing a sufficient light source. The liquid crystal display panel mainly comprises a thin film transistor array substrate and a color filter and an optical substrate. Thin Film Transistor ❹ The substrate will inevitably produce some disconnection plague during the manufacturing process. These wire breaks can be detected by an array test and can be repaired by laser chemical vapor deposition (laser CVD) during the fabrication of the thin film transistor array substrate. The procedure for repairing a plague by laser chemical vapor deposition is as follows: after the first metal layer is formed on the substrate, the first metal layer is detected by an array test and the laser is detected by laser Chemical vapor deposition repairs broken wires. Then, the substrate is cleaned to avoid debris or debris on the substrate; 20100416 aw; rW 24342twf.doc/n 耆. Then, the gate insulating layer and the second metal are sequentially formed on the substrate and the disconnection of the second metal layer is detected and repaired. After that, the substrate needs to be washed. Thereafter, a protective layer is formed on the second metal layer to form a thin film transistor array substrate. From the above, it is known that the laser CVD of the film transistor array substrate by laser chemical vapor deposition requires two times of vapor deposition and two cleanings. Therefore, Automated Material Handling Systems (AMHS) needs to transport the thin film transistor array substrate to the machine for cleaning and deposition. Not only does the production cycle of the crystal array substrate be complicated and long, but it is also costly from the pure material processing system. Saki, because it requires an additional two production = ^ 'cost of cleaning surface equipment, and the cleaning is required ^ ^ = money blame' so the cost of the thin film transistor array substrate is also g, however, not all broken lines瑕疵 All are suitable for laser repair ^ to repair. For example, when the disconnection sputum is found in the first metal layer ^ but = = two metal layers, and the broken line area is located in the layer parent connection area, then the second metal layer is on the case = if When the first metal layer is repaired, a short circuit between the genus layer and the first metal layer occurs. [Invention] The invention provides a board for repairing an active component array with high yield. The invention provides a liquid crystal which can save cost _ 201040616

iZITW 24342twf.doc/n The present invention provides a laser repairing method for an active device array substrate, which can reduce the manufacturing cycle time of the active device array substrate. The present invention provides an active device array substrate comprising a substrate, a first patterned conductive layer, a gate insulating layer, a plurality of channel layers, a second conductive layer, a protective layer, and at least a repair line. First patterning

In the O-picking, the first patterned conductive layer includes a plurality of scan lines and a night gate, and at least one of the scan lines is broken. Between the two, it is disposed on the substrate, where the gate insulating layer covers the first patterned conductive; the absolute = configuration: the gate insulating layer. The second patterned conductive layer is disposed on the first layer, and the second patterned conductive layer includes a plurality of data lines and a plurality of protective layers disposed on the edge layer, wherein the protective layer covers the through layer and has a plurality of layers Contact window, and part of the contact window through the rhythm: ',,, 邑 to expose the broken wiring. The repair line is configured to protect the i line/middle repair line and fill it in the thief line to repair 瑕

O nitriding implementation, the material of the above-mentioned gate insulating layer includes crystal 4:: - In the embodiment, the material of the above-mentioned channel layer includes the non-invention of the present invention, and the upper substrate is further included A flat layer disposed on the protective layer. In the present invention, the material of the upper flat layer includes the pixel electrode layer on the flat layer of the active device array substrate in the embodiment of the present invention. The pixel electrode layer is electrically connected to the drain through the adjacent blade contact window. Including the shape r, the above-mentioned silk element array substrate is further disposed on the patterned halogen element layer on the protective layer, and the germanium layer is electrically connected through a partial contact window. In the present invention, the active device array substrate further includes a color filter layer disposed on the halogen electrode layer. A liquid crystal display device comprising a pair of substrates, a wire element array plate and a liquid crystal layer. The active device array substrate is disposed under the opposite substrate, and includes a substrate, a first-patterned conductive layer, a gate insulating layer, a plurality of channel layers, a second patterned conductive layer, a protective layer, and at least one repairing line . The first patterned conductive layer is disposed on the substrate, wherein the first patterned conductive layer comprises a plurality of scan lines and a plurality of gates, and at least one of the scan lines is broken. The gate insulating layer is disposed on the substrate, wherein the gate insulating layer covers the first patterned conductive layer. The channel layer is disposed on the gate insulating layer. The second patterned conductive layer is disposed on the gate insulating layer, and the first patterned conductive layer includes a plurality of data wirings and a plurality of source/drain electrodes. The protective layer is disposed on the gate insulating layer, wherein the protective layer covers the second patterned conductive layer and has a plurality of contact windows, and a part of the contact window penetrates the gate insulating layer to blast the broken scan lines. The repair line is disposed on the protective layer, wherein the repair line fills the contact window exposing the scan wiring to repair the scan wiring. The liquid crystal layer is disposed between the opposite substrate and the active device array substrate. In an embodiment of the invention, the material of the gate insulating layer comprises nitride nitride. 201040616

liZITW 24342twf.doc/n In one embodiment of the invention, the material of the channel layer described above includes a non-crystalline or polycrystalline stone. In an embodiment of the invention, the liquid crystal display device further includes a flat layer disposed on the protective layer. In an embodiment of the invention, the material of the flat layer comprises an organic photoresist. In an embodiment of the invention, the active device array substrate further includes a halogen electrode layer disposed on the flat layer, wherein the cover electrode layer is electrically connected to the drain through a part of the contact window. In an embodiment of the invention, the active device array substrate further includes a patterned halogen electrode layer disposed on the protective layer, wherein the halogen electrode layer is electrically connected to the drain through the partial contact window. In an embodiment of the invention, the active device array substrate further includes a color neon disposed on the halogen electrode layer. The substrate is in the shape of the hair - the implementation of the wealth, the upper shape of the opposite base lacks color

In the embodiment of the present invention, the liquid crystal: backlight module, wherein the active device array substrate and the liquid crystal layer 4 are disposed on the backlight JL side. I. Counter substrate—The first active device array substrate includes a substrate, a second protective layer, and at least one repair line. The first patterning i and the upper layer of the patterned conductive layer comprises a plurality of sweep lines and a gate. The gate insulating layer is disposed on the substrate, wherein the gate insulating layer 201040616 ru/uuDUAiz^iTW 24342twf.doc/n covers the first patterned conductive layer. The channel layer is disposed on the gate insulating layer. The first patterned conductive layer is disposed on the gate insulating layer, and the second patterned conductive layer includes a plurality of data wires and a plurality of source/drain electrodes, and at least one of the data wires is broken. The protective layer is disposed on the gate insulating layer, wherein the protective layer covers the first patterned conductive layer and has a plurality of contact windows, and the partial contact window exposes the broken data wiring. The repairing layer is placed on the protective layer, and the repairing line is filled in the contact window of the exposed data wiring to repair the data wiring. In an embodiment of the invention, the material of the above-mentioned dummy insulating layer comprises tantalum nitride. In the embodiment of the present invention, the material of the channel layer includes a non-crystallite or a polycrystalline stone. In one embodiment of the invention, a photoresist disposed on a protective layer in accordance with an embodiment of the present invention is included. The active element array substrate described above is more uniform. The material of the above flat layer includes a scoop two Γ 'hip, the above-mentioned active element array base (four) 邙 = = touch:: 4" the layer of the halogen electrode on the layer, wherein the halogen electrode layer is over-contacted* Electrically connected to the bungee. Included - the pattern disposed on the lamella layer, the pole layer is transmitted through the partial contact window and the 汲 纽 ^ ^ 中 中 中 ^ Included in the above-mentioned active device array substrate

A color filter 'light layer' on the Hi electrode layer. X sunrise liquid crystal | display device, including - opposite substrate, Z1TW 24342twf.doc/n 201040616

O o The active device array substrate and the liquid crystal layer described above. The active device array substrate includes a substrate, a first patterned conductive layer, a gate insulating layer, a plurality of channel layers, a second patterned conductive layer, a protective layer, and a repair line. The first patterned conductive layer is disposed on the substrate, wherein the first patterned conductive layer comprises a plurality of scan lines and a plurality of gates. The gate insulating layer is disposed on the substrate, and the t gate insulating layer covers the first patterned conductive layer. The channel layer is placed on the gate insulating layer. The second acidified conductive layer is disposed on the gate insulating layer 丄, and the second patterned conductive layer includes a plurality of data wirings and a plurality of source/no ’ and at least one of the data lines. (4) The layer is disposed in the gate insulation 2', wherein the protective layer covers the second conductive layer, and has a plurality of connections, and some of the connections are exposed (four) lines: #料线路. The repair line is matched with the contact window of the towel and the lion filling the exposed data wiring. The material of the liquid crystal layer disposed on the opposite substrate and the active device array is composed of a material including the above-mentioned channel layer, including a liquid crystal display device not including the above-mentioned flat layer, and includes a material in the embodiment of the present invention. In the gas fossil eve. In one embodiment of the invention, germanium or polysilicon is used. The planar layer disposed on the protective layer in one embodiment of the invention is a photoresist in one embodiment of the invention. In the present invention, the above-mentioned wire element substrate; the pattern-formed halogen electrode layer disposed on the flat layer, wherein the vegetarian drink 201040616 ru/uu^u/\iz, i 1W 24342twf The .doc/n pole layer is electrically connected to the drain through a partial contact window. In the embodiment of the present invention, the active device array substrate further includes a halogen electrode layer disposed on the protective layer, wherein the halogen electrode layer is electrically connected to the drain through a portion of the contact window. In an embodiment of the invention, the active device array substrate further includes a color filter layer disposed on the halogen electrode layer. In the embodiment of the present invention, the pair of pure plates is a color filter substrate. In the embodiment of the present invention, the liquid crystal display device further includes a dynamic element array substrate, a liquid crystal layer, and a counter substrate. The present invention provides a method for repairing an active device array substrate, and the first method provides a substrate. Forming a patterned V-electrode layer, a gate insulating layer, a plurality of channel layers, a θ-positive conductive layer, and a protective layer, wherein the first patterning the plurality of idle electrodes and the second patterned conductive layer are sequentially formed on the substrate Layers include = wiring and more remarks / _. After that, the scan wiring and the data are arranged: after the substrate is mounted, and then the scan wiring and the data wiring are broken. The most-stacking method is formed on the protective layer - the repairing line - the nitriding 5 - the implementation of the invention, the material of the insulating layer of the above-mentioned gate includes a crystal stone trtr. In an embodiment, the material of the above-mentioned channel layer includes non-201040616 - --------IZ.1TW 24342twf.doc/n Having completed the invention to form a plurality of contact windows in the protective layer. In one embodiment of the invention, part of the contact window penetrates the protective layer and violently flows out of the material. Wiring. In one embodiment of the invention, a portion of the contact window extends through the protective layer and the gate insulating layer' and exposes the scan lines. Oo In one embodiment of the present invention, the method of forming the repair line includes laser chemical vapor deposition or injection of metal thin film (InjectMetalFilm). In the consistent embodiment of the present invention, after repairing the active device array substrate, A flat layer is formed on the protective layer. In an embodiment of the invention, the material of the flat layer comprises an organic photoresist. The invention of the invention, the implementation of the money, the domain of the silk component _ substrate: the shot repair method is further included in the flat layer field - the pixel f-pole layer, the inner-dano-electrode layer and by partial replacement with the polarity connection. In the embodiment of the present invention, the method for repairing the active device array substrate further includes forming a halogen element layer on the protective layer, and the layer of the electrode in the basin is connected to the drain electrode by a partial contact t Electrical connection. In the embodiment of the present invention, a color filter and a light layer are further included. Forming on the pole layer The present invention is used in the first and second patterned conductive sounds = two or not, and then the repair line is used, and the array substrate is processed in a process step. Therefore, the present invention is an active active element array substrate and its lightning 201040616 rvTW 24342twf.doc/n shot repairing method and liquid crystal display device, which has the advantages of cost saving, manufacturing cycle time and high repair success rate. The above described features and advantages of the present invention will become more apparent from the following description. 1 is a flow chart of a method for repairing an active device array substrate according to an embodiment of the present invention, and FIG. 2 is a top view of an active device array substrate according to an embodiment of the present invention, and FIGS. 3A to 3E are along the same. 2 schematic diagram of the manufacturing process of the active component array substrate A-A' hatching. Referring to FIG. 1 and FIG. 3A simultaneously, first, in step S100, a substrate 21 is provided, and a first patterned conductive layer 22 is formed on the substrate 21A. The first patterned conductive layer 22A includes a plurality of scan lines 222 and a plurality of gates 224 connected to the scan lines 222. Then, as shown in FIG. 1 and FIG. 3B, a gate, an edge layer 230 and a plurality of channel layers are formed on the substrate 210 (the gate insulating layer 23 is covered with the patterned conductive layer 220' and the gate insulating layer is formed). The material of the 23 〇 is tantalum nitride. The channel layer (not shown) is disposed on the gate insulating layer 230, and the material of the channel layer (not shown) includes amorphous germanium or polycrystalline germanium. After that, reference is also made to FIG. 1 and FIG. 2 . And in FIG. 3C, a second patterned conductive layer 240 is formed on the gate insulating layer 23, and a protective layer 250. The first patterned conductive layer 24 includes a plurality of data lines 242 and a plurality of sources 244/ = pole 246. The protective layer 250 will cover the second patterned conductive layer 240. It is to be noted that, as in step Si1, after forming the protective layer 25, 12 201040616

1Z1TW 24342twf.doc/n We can perform an array test on the substrate 21G to detect the disconnection of the scan wiring 2 2 2 and the data wiring 242. In particular, since the scan wiring 222 and the negative wiring 242 are formed on the substrate 21, when the array test is performed on the substrate 210, the disconnection of the scan wiring and the data wiring 242 can be simultaneously perceived. Compared with the conventional array test of the first metal layer and the second metal layer 140, we can perform only one array test on the substrate 210, which can reduce the fabrication cycle of the active device array 基板 substrate. The process also reduces the number of times the automated material handling system handles the active component array substrate. When it is detected that the scan wiring 222 or the data wiring 242 on the substrate 210 is broken, a repair line 260 is formed on the thinned layer 250 to repair the broken scan wiring 222 or the data wiring 242' as in step S120. In detail, referring to FIG. 1 and FIG. 3D, in step S112, when k detects that the scan wiring 222 on the substrate 210 is broken, we can use the laser to etch the protective layer 250 to form a plurality of contact windows 252. It is worth noting that the contact window 252 will penetrate the gate insulating layer 230 and smash the broken scan wiring 222. Then, a repair line is formed on the protective layer 250 by a laser chemical vapor deposition method or a metal thin film method. The repair line 260 is filled in the contact window 252 to repair the broken scan wiring line 222. Fig. 4 is a cross-sectional view showing the data wiring of the line B-B' of Fig. 2 after repair. Referring to FIG. 4, when it is detected that the data wiring 242 on the substrate 210 is broken, the steps of repairing the data wiring 242 and repairing the scanning wiring 222 are substantially the same. The difference is that when laser etching is used to form the contact window 252, 13 201040616 1 \j i rw 24342twf.doc/n 2? ! The Thunder! 1 power causes the contact window 252 to penetrate only the protective layer 25A, exposing the poor wiring 242. After that, the same method can be used to repair the broken line by using the laser chemical vapor film method on the protective layer 25 形 秘 疋 主 主 主 主 主 主 私 — — — — — — — — — — — — — — — — — — — — — — Detecting the scan wiring 222 and the data wiring 242 can simultaneously traverse only the contact 252 of the protective layer 250 and the contact window 252 that penetrates the gate insulating layer downward. Therefore, in the same-process step, the broken scan wiring 222 and the material wiring 242 can be repaired at the same time. In addition, as a result of this - after the laser repair process, because the follow-up is the yellow light micro-shadow system h_ithGgmphyp job (four), in the Huangguang process will be cleaned first, Xian does not need to be in the process, can effectively save production costs . There is no such thing as the above. 'Our car father knows that the array test and the two cleaning steps are reduced once, and the substrate handling by the automated material handling system is reduced: the number of the substrate is reduced. The purpose of the time of work. In addition, the laser chemical vapor deposition method or the metal thin film method is used to fill the repair line 260 or 260 into the contact window 252 or 252, to avoid the occurrence of the first metal layer if the prior art is generated. The breakage of the metal layer is located in the area where the first metal layer and the second metal layer are over the line, and repairing may cause short circuit. Therefore, the scanning wiring 222 or the secondary wiring 242 can be reliably repaired, and the repairing yield of the active device array substrate can be improved. Referring to FIG. 1 , FIG. 2 and FIG. 3E , in step S122 , a flat layer 280 and a pixel electrode layer 270 are sequentially formed on the protection layer 14 201040616 Z1TW 24342 twf.doc/n layer 250, wherein the flat layer 280 is configured for The repair line 26 is prevented from being electrically connected to the pixel electrode layer 270. In addition, the 'flat layer 28' can make the halogen electrode layer 27〇 disposed on a higher flat surface, which helps to reduce the generation of parasitic capacitance between the metal wire and the halogen electrode, so a larger area can be designed in design. The halogen electrode can effectively increase the aperture ratio. In addition, the germanium electrode layer 270 is electrically connected to the germanium electrode 246 by a portion of the contact window 252. Thus, the active device array substrate 200 of the present embodiment is fabricated. The active device array substrate 2 can be assembled with the pair of substrates 300 and the liquid crystal molecules can be injected between the active device array substrate 200 and the opposite substrate 300 to form a liquid crystal display device 35, as shown in FIG. Show. The opposite substrate 300 can be a color filter substrate. Further, we may form a color filter layer (not shown) on the pixel electrode layer 270 as in step S124' and the counter substrate 3 may be a transparent substrate. In addition, when the liquid crystal display device 350 adopts a transmissive or transflective half-back radiation design, a backlight module 360 may be further included, and the active device array substrate 200, the opposite substrate 3〇〇, and the liquid crystal layer 310 are disposed. Above the backlight module 36〇. The liquid crystal display device 350 can display the light provided by the backlight module 36. In summary, the active device array substrate and the repairing method thereof and the liquid crystal display device of the present invention have at least the following advantages: 1. After the scan wiring and the data wiring are all disposed on the substrate, the array test and repair are required. Reduce the production cycle time. 15 24342twf.doc/n 201040616, after repairing, you can call (4) to continue the yellow light micro-washing to avoid additional cleaning equipment settings. The field substrate is cleaned and only needs to be tested and repaired once. It is effective == the number of plates' and then saves electricity. The material = the rate of the defect fills the repair line into the contact window.

While the invention has been described above in terms of the preferred embodiments of the present invention, the scope of the present invention is intended to be within the spirit and scope of the invention. When the attached _ 鄕 界定 界定 界定 界定 界定 界定 界定 界定 界定 界定BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart showing the steps of a repair method of an active device array substrate according to an embodiment of the present invention. Fig. 2 is a top plan view of an active device array substrate in accordance with an embodiment of the present invention. 3Α-3Ε are schematic flow diagrams of the laser repairing method of the active device array substrate Α-Α, the cross section and the line along the FIG. Fig. 4 is a cross-sectional view of the 配线-Β of Fig. 2 after the data line of the hatching is repaired. Fig. 5 is a schematic view of a liquid crystal display device. 16 201040616 ^ 1TW 24342twf.doc/n Ο ο [Description of main component symbols] S100 ·· Providing a substrate, and sequentially forming a first layer, an interlayer insulating layer, a channel layer, a second conductive phase and protection on the substrate Lu S11G. The scanning wiring and the data are formed on the substrate. ^Whether the wiring and the data wiring are disconnected and S112: The contact window S120 is formed on the protective layer: a repairing line is formed on the protective layer to repair the active component storm board S122: Forming an axis flat layer and a 4-element electrode layer S124 on the layer: forming a color filter layer θ 100 on the pixel electrode layer: thin film transistor array substrate 110 120 130 140 150 200 220 222 224 230 240 242 210 · substrate First metal layer gate insulating layer gate insulating layer protective layer active device array substrate first patterned conductive layer scanning line gate gate insulating layer first patterned conductive layer data wiring 244/246: source/dice pole 17 24342twf.doc /n 201040616 250 : Protective layer 252, 252': contact window 260, 260': repair line 270: halogen electrode layer 280: flat layer 300: opposite substrate 310: liquid crystal layer 350: liquid crystal display device

18

Claims (1)

JTW 24342twf.doc/n 201040616 VII. Patent application scope: 1. An active device array substrate, comprising: a substrate; a patterned conductive layer disposed on the substrate, wherein the first patterned conductive layer comprises a plurality of strips Scanning wiring and a plurality of _, and at least one of the scanning wirings is broken; the octagonal gorge; I, disposed on the silk plate, the towel edge layer covering the first patterned conductive layer of the Shai; Disposed on the gate insulating layer; a first patterned conductive layer disposed on the gate insulating layer, wherein the first conductive layer comprises a township data wiring and a town pole/no pole; On the gate layer, wherein the protective layer covers the patterned 'electric layer, and has a plurality of contact windows, and some of the contacts are adjacent to the gate insulating layer to expose the scan line of the broken line; and 'configured in the protection On the layer, the repaired line scales are taken over, and the surface scan lines are read. The wire element array substrate according to item 1, wherein the material of the gate insulating layer comprises nitrite. The second it:::1, described in the active device array substrate, includes amorphous dreams or polycrystalline seconds. Further includes an array of substrate elements such as a slewing element, wherein the singularity of the active device array substrate is the same as that of the active device array substrate as described in item 4, and the polar layer is partially transparent. The contact window and the neopolar electrical connection are further included in the package: the active device array substrate described in item 1, the 昼素雷ΓΓ素 layer is disposed on the Wei layer, wherein the 'pole layer A portion of the contact windows are electrically connected to the drain. Furthermore, the active device array substrate, the color filter layer, and the color filter layer are disposed on the halogen electrode layer. The liquid crystal display device includes: a counter substrate; an active=piece_substrate disposed under the opposite substrate, comprising: a substrate; a first patterned conductive layer disposed on the substrate, wherein the small to electric The layer includes a plurality of scan lines and a plurality of gates, and wherein the scan lines are broken; the gate insulating layer is disposed on the base to cover the first patterned conductive layer; the edge layer f channel layers are disposed on The gate insulating layer is disposed on the gate insulating layer, and the core is 0. The conductive layer includes a plurality of data wires and a plurality of sources/covering the edge layer. The layer is divided into three layers to contact the three layers of wood, and has a plurality of contact windows, and the portion ι contacts the through the gate insulating layer to expose the wire to the wire. 2010/04/16 - ί 1TW 24342twf.doc/n a repairing line disposed on the protective layer, filling the wiring for exposing the scan wiring; and repairing the scan between the scan: a liquid crystal layer disposed on the opposite substrate and the active device array Substrate 10. As claimed The nine billion Ο the gate insulating layer comprises nitrogen reading quality cut. 4 ^ Set, its A 11. If the liquid mentioned in the scope of claim 9 is the (four) package of the channel layer _ turn ❹ (four). The liquid crystal element according to the ninth aspect of the patent garden, the base plate further includes a flat layer, which is disposed on the protection ί. 13. The material of the flat layer includes organic Light resistance. The nighttime 曰, , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The liquid crystal display array substrate of the ninth aspect of the present invention further includes a gold-plated active S-layer transparent portion. The contact window and the liquid crystal display device of the ninth aspect of the present invention, the active earth plate further comprises a shirt color filter layer disposed on the pixel electrode layer 201040616 w -_ ----- The liquid crystal display device of claim 9, wherein the opposite substrate is a color filter substrate. 18. The liquid crystal display device of claim 9, further comprising a backlight module, wherein the active device array substrate, the liquid crystal layer and the opposite substrate are disposed above the backlight module. An active device array substrate, comprising: a substrate; a first patterned conductive layer ′ disposed on the substrate, wherein the first patterned conductive layer comprises a plurality of scan lines and a plurality of gates; </ RTI> disposed on the substrate, wherein the gate insulating layer covers the first patterned conductive layer; a plurality of channel layers disposed on the gate insulating layer; a second patterned conductive layer disposed on the gate insulating layer The second patterned conductive layer includes a plurality of data wires and a plurality of source and drain electrodes, and at least one of the data wires is broken; a protective layer is disposed on the gate insulating layer, wherein the protective layer covers the first layer The second conductive layer is patterned, and has a plurality of contact windows, and some of the contact windows expose the data wiring of the broken line; and at least one repair line is disposed on the protective layer, wherein the repair lines are filled and exposed The contact windows of the data wiring are used to repair the data wiring. 20. The active device array substrate of claim 19, wherein the material of the gate insulating layer comprises tantalum nitride. 21. The active device array substrate 22 201040616 ^SITW 24342 twf.doc/n plate according to claim 19, wherein the channel layer is (4) coated sand or polycrystalline. 22. For example, the 19th board of the patent application scope, further includes a flat layer disposed on the movable object array base 23, such as the 22nd board of the patent application garden, wherein the flat layer material comprises a ^^ main-piece array The base ^. &quot;L%VZ7 f 〇 and (four) pole layer 'configuration in the Tan ^ 透 透 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到 到The board further includes an active device array base according to the item - liquid crystal == on the pixel electrode layer. a pair of substrates, ❹ an active = lineup, configuration (4) under the board, including: a first - patterned conductive layer 'disposed on the substrate, (4) wherein the gate insulating layer = layer includes a plurality of scanning wiring and a layer of money, disposed on the substrate, covering the first patterned conductive layer; a plurality of = channel layers, configured by _ the second patterned via λ is provided on the dummy insulating layer, and Secret, and at least one of the two: two wiring: two wiring and multiple sources, 23 24342twf.doc / n 201040616 protective layer, placed on the gate insulation layer, which split, conductive layer 'and has multiple connections. ::ΐThe contact with the data wire from the exposed wire breakage; μ at least one repairing wire is disposed on the protective layer, and the = wire is filled in the contact windows exposing the data wiring to supplement the two materials Wiring; and 丨/complementing a liquid crystal layer between the shells is disposed on the steering substrate and the active component of the brake train substrate 0 t ΜSpecial] The liquid Bag shown in item 27 of the range shows I, and the gate is insulated The material of the layer includes nitriding seconds. </ RTI> 29. The material of the channel layer as described in claim 27 of the patent scope of March includes amorphous or polycrystalline stone. The liquid crystal display device of the device of the present invention is further characterized in that the liquid crystal display device is arranged on the protective layer. (4) Purchase, its moving element 22: The device 'mainly, 1 (four) Gui ♦ Thunder A 4 element electrode layer 'disposed in the flat layer connection: the middle 1 electrode layer transmits part of the contact window and the electric potential 33 The liquid crystal display device array substrate according to claim 27, further comprising: a plurality of layers on the layer of the sputum, and the electrode layer of the decantine in the bean is disposed on the electrically conductive connection. The active layer array substrate further includes a color filter layer disposed on the liquid crystal display device according to claim 27, wherein the active device array substrate further comprises: On the halogen electrode layer. The liquid crystal display device of claim 27, wherein the opposite substrate is a color filter substrate. The liquid crystal display device of claim 27, further comprising a backlight module, wherein the active device array substrate, the liquid crystal layer and the opposite substrate are disposed above the backlight module. 37. A method for repairing an active device array substrate, comprising: ♦ providing a substrate, and sequentially forming a first patterned conductive layer, a gate insulating layer, a plurality of channel layers, and a second patterning on the substrate. a conductive layer and a protective layer, wherein the first patterned conductive layer comprises a plurality of scanning lines and a plurality of gates, and the second patterned conductive layer comprises a plurality of data lines and a plurality of source/dice After the scan lines and the data lines are formed on the substrate, the 〇 detects whether the scan lines and the data lines are broken; a repair line is formed on the shy layer to repair the active device array substrate . 38. The active device array substrate and the evening compensation method according to claim 37, wherein the material of the gate insulating layer comprises tantalum nitride. 39: For example, please refer to the 37th item of the silk element array substrate and the evening compensation method, wherein the material of the channel layer includes amorphous stone or polycrystalline stone. 40. The active device array substrate as described in claim 37 of the patent application, after the formation of the protective layer, is further included in the protective layer shape or a plurality of contact windows. A method of repairing an active device array substrate as described in claim 4, wherein a part of the contact windows penetrate the protective layer and expose the data wiring. The method of repairing an active device array substrate according to claim 40, wherein a part of the contact windows penetrate the protective layer and the gate insulating layer and expose the scanning wiring. 43. A method of repairing an active device array substrate as described in claim 37, wherein the method of forming the repairing wire comprises a laser chemical vapor deposition method or an injection metal thin film method. 44. The active device array substrate=compensation method according to claim 37, after the repairing the active device_substrate, further comprises forming a flat layer on the layer of the doped layer. For example, the material of the flat layer is made of an organic photoresist.修 ΐ ; ; ; ; ; ; 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动 主动The active device array substrate layer described in claim 37, which further includes a halogen electrode electrically connected to the protective layer, and the electrode layer is electrically connected to the electrode layer. And by means of a part of the contact windows, the active device array substrate layer described in claim 47 of the bungee. And further comprising forming a color filter on the halogen electrode layer.