201022710 九、發明說明： 【發明所屬之技術領域】 本發明係有關於光學元件之製造方法，且特別是有關 於一種利用溶膠-凝膠（sol-gel)製程來製備光學元件之方 法。 【先前技術】 傳統光學元件製程可區分為研磨與模造兩種方法。研 磨製程疋採用玻璃毛胚為初始基材，經切削、研磨、拋光、 對心等工序製成。研磨製程適合製作球面透鏡等高精度之 成像透鏡’但無法製作直徑曲率比（D/R)大於1.8以上之 鏡片，且研磨製程既費時又費工。模造製程係將玻璃球胚 加溫至約400-600°C將玻璃軟化後再施以高壓將球胚壓合 成型，之後經過退火、回火、研磨、拋光等工序而成。模 造製程適合製作非球面或複合曲面等研磨製程無法生產之 光學元件，如透鏡陣列，且成品之精度已達成像等級，可 普遍應用於高階光學系統中。在模造製程中，透鏡是在高 溫高壓的環境下成型，内部應力釋放不易，製程損壞率較 间。此外，為了因應高溫高壓下之工作條件，模具的材料 及維修成本十分高昂。 近年來隨著溶膠-凝膠技術的興起和發展，以溶膠-凝膠 製程來製備矽玻璃也越來越普遍。利用溶膠-凝膠製程來製 備矽玻璃（silica glass)時，主要是將矽酸酯在酸或鹼的催 化下進行水解及縮聚反應，以得到一濕凝膠（wM )，再 201022710 將上述濕凝谬乾燥後進行燒結即可得到矽玻璃。 濕凝膠是由三維的固態網狀結構為主體，其具有非常 多的孔隙’而孔隙中通常佈滿了反應時所用的溶劑或苴他 物質。一般而言，濕凝膠的乾燥方式可分為一般加熱^以 及超臨界乾燥法（SUpercrjtical㈣丨％ )。 利用一般加熱法所得的中間產物稱為乾凝膠 (xerogel)’其係利用一般的加熱蒸發裝置來移除濕凝膠孔 〇 隙中之溶劑。然而，在溶劑蒸發的過程中，會產生不均勻 的毛細管張力而破壞凝膠的網狀結構，進而使得整個膠體 大幅收縮（收縮率可高達90%)。上述現象往往會導致乾凝 膠破裂’因it匕一般乾燥法不適合用以大量生產具有優良精 度之光學元件。 為了解決一般乾燥法面臨的膠體破裂之問題，相關領 域中開發出了超臨界乾燥法，其係在溶劑的超臨界狀態下 利用氣體取代孔隙中的溶劑，由於此種方法對凝膠結構的 參破壞力幸父低，因此所得到的氣凝膠（aer〇gel)較不易破裂。 然而，溶膠-凝膠製程中常用的溶劑之臨界點都屬於高溫高 壓的狀態，因此其設備成本和操作危險性較高。此外，氣 凝膠的收縮率較小，通常介於15%左右，因此也不適合用 來製造尺寸較小的精密光學元件。 有鑑於此’相關領域亟需提出一種高生產效率、低設 備成本之光學元件的製造方法。 【發明内容】 201022710 因此，根據本發明之一態樣，提供了一種光學元件之 製造方法，其係利用溶膠-凝膠製程以及於常壓下加熱以大 量生產精密光學元件。 f據本發明—實施例’上述光學s件之製造方法包含 將-乳化㊉奈米粒子加人水中以形成分散液丨將四燒氧基 石夕加入分散液中；調整分散液之pH值並㈣分散液以形成 溶膠溶液（S〇l s〇lutiGn);將轉料到人模具中；陳化201022710 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a method of fabricating an optical component, and more particularly to a method of fabricating an optical component using a sol-gel process. [Prior Art] The conventional optical component process can be distinguished into two methods of grinding and molding. Grinding process 疋 uses glass blank as the initial substrate, and is made by cutting, grinding, polishing, and centering. The polishing process is suitable for producing a high-precision imaging lens such as a spherical lens, but it is impossible to produce a lens having a diameter to curvature ratio (D/R) of more than 1.8, and the polishing process is time consuming and labor intensive. The molding process heats the glass bulb to about 400-600 ° C, softens the glass, and then applies high pressure to press-form the pellets, and then is subjected to annealing, tempering, grinding, polishing, and the like. The molding process is suitable for making optical components such as lens arrays that cannot be produced by grinding processes such as aspherical or compound curved surfaces, and the precision of the finished product has reached the imaging level, which is widely used in high-order optical systems. In the molding process, the lens is molded in a high temperature and high pressure environment, the internal stress release is not easy, and the process damage rate is relatively high. In addition, in order to cope with the working conditions under high temperature and high pressure, the material and maintenance cost of the mold are very high. In recent years, with the rise and development of sol-gel technology, it has become more and more common to prepare bismuth glass by sol-gel process. When preparing a silica glass by a sol-gel process, the phthalic acid ester is mainly subjected to hydrolysis and polycondensation under the catalysis of acid or alkali to obtain a wet gel (wM), and then the above wet After the coagulation is dried and sintered, the bismuth glass is obtained. The wet gel is dominated by a three-dimensional solid network structure, which has a very large number of pores, and the pores are usually filled with the solvent or other substances used in the reaction. In general, the drying method of the wet gel can be classified into general heating and supercritical drying (SUpercrjtical (four) 丨%). The intermediate product obtained by the usual heating method is called xerogel, which uses a general heating evaporation device to remove the solvent in the wet gel pore gap. However, during the evaporation of the solvent, uneven capillary tension is generated to break the network structure of the gel, which in turn causes the entire colloid to shrink significantly (the shrinkage rate can be as high as 90%). The above phenomenon often leads to cracking of the dry gel. The general drying method is not suitable for mass production of optical components having excellent precision. In order to solve the problem of colloidal rupture faced by the general drying method, a supercritical drying method has been developed in the related art, which uses a gas to replace the solvent in the pore under the supercritical state of the solvent, because of the participation of the gel structure in this method. The destructive power of the father is low, so the obtained aerogel (aer〇gel) is less likely to break. However, the critical point of the solvent commonly used in the sol-gel process is a high temperature and high pressure state, so the equipment cost and operational risk are high. In addition, aerogels have a small shrinkage rate, usually around 15%, and are therefore not suitable for making small precision optical components. In view of this, there is a need to propose a method for manufacturing an optical component with high production efficiency and low equipment cost. SUMMARY OF THE INVENTION 201022710 Accordingly, in accordance with one aspect of the present invention, a method of fabricating an optical component is provided which utilizes a sol-gel process and heating at atmospheric pressure to mass produce precision optical components. f according to the present invention - the embodiment of the above optical s manufacturing method comprises adding - emulsified ten nano particles to human water to form a dispersion 丨 adding four alkoxylates to the dispersion; adjusting the pH of the dispersion and (d) Dispersing liquid to form a sol solution (S〇ls〇lutiGn); will be transferred to a human mold; aged
^gmg)轉溶液以得龍鄉；以微酸水溶液沖洗濕凝 膠’於常壓下加熱乾燥上述濕凝膠以得到乾凝膠；以及燒 結乾凝膠以得到光學元件。 根據本發明之另―能嫌，担2 之各種精密光學元件二在上述方法所製造 中所仔之乾滅勝的體積收縮率為約25_4〇%。 【實施方式】 子凡件製程以及溶膠_凝膠製程各有 本《月實知例係針對既有的溶勝-凝 如上所述，傳統光 其應用上的優缺點，而 勝製程加以改良。 低乾燥過程令膠體破型从L :’但超臨界乾燥法對於操作條件的要求Μ，=比 貝的設備。就目前的超臨界乾燥 。又而要昂 度約為25(TC,而壓力約* 〃 1 。，所需的乾燥溫 往會在㈣錢卜，㈣界乾燥法往 之水分，此-溶劑置換步至少部分取代膠體孔隙中 ㈣換㈣導致在後續燒結步料，必須 201022710 使得燒結步 加入額外的燒結氣體以蒋 移除溶劑或其他雜質 驟及所需設備更為複雜。 因此本發明之__ 並成功克服了以往運 問題。由於根據本發 置換、超臨界乾燥、 低製程的複雜度，同 根據本發明之_ 步驟： 悲樣係針對於常壓下加熱進行改良， 用於常麼下加熱難以避免的膠體破裂 明實施例之方法，不需進行上述溶劑 額外氣體燒結等步驟，因此可大幅降 時可節省時間與設備成本。^gmg) The solution is transferred to Delong Town; the wet gel is rinsed with an aqueous solution of slightly acidic acid to dry the above wet gel under normal pressure to obtain a xerogel; and the xerogel is sintered to obtain an optical element. According to another aspect of the present invention, the volumetric shrinkage ratio of the various precision optical components of the second embodiment which is produced by the above method is about 25_4%. [Embodiment] The sub-process process and the sol-gel process have their own "Knowledge of the system" for the existing solution-coagulation as described above, the advantages and disadvantages of the conventional light application, and the process is improved. The low drying process causes the colloid to break from the L:' but supercritical drying method for the operating conditions Μ, = Bie equipment. The current supercritical drying. Also, the degree of angstrom is about 25 (TC, and the pressure is about * 〃 1. The required drying temperature will be in (4) Qian Bu, (4) the boundary drying method, and the solvent replacement step at least partially replaces the colloidal pores. (4) Changing (4) leads to the subsequent sintering of the step, which must be 201022710 to make the sintering step to add additional sintering gas to remove the solvent or other impurities and to meet the required equipment. Therefore, the invention has successfully overcome the problems of the past. According to the complexity of the present invention, supercritical drying, low process, and the _ step according to the present invention: the sad sample is improved for heating under normal pressure, and is used for the implementation of colloidal cracking which is difficult to avoid under normal heating. For example, the above-mentioned solvent extra gas sintering step is not required, so that time and equipment cost can be saved by drastically reducing the time.
(a) (b) (c) 態樣，光學元件之製造方法包含下列 將二氧切奈米粒子加人水中以形成分散液； 將四烷氧基矽加入分散液中； 調整分散液之pH值並攪拌分散液以形成溶膠 溶液； (d) 將溶膠溶液到入模具中； (〇陳化溶膠溶液以得到濕凝膠； (f) 以微酸水溶液沖洗濕凝膠； (g) 於常Μ下加熱乾燥上述濕凝膠以得到乾凝膠； 以及 (h ) 燒結乾凝膠以得到光學元件。 時可於分散液 約 1.5-2.5 ，以 。舉例而言， 在本發明一實施例中，在進行步驟（a) 中加入無機酸，將該分散液之pH值調整至 利二氧化矽奈米粒子均勻地分布於分散液中 上述無機酸可為鹽酸。 亦可在步驟（a)中利 此外’在本發明另一實施例中 201022710 用㈣分散器來搜拌分散液，以利二氧化石夕奈米粒子 地分布於分散液中。舉例來說，上述撥摔可視情形調整為 數分鐘至數小時。 為 在本發明—實施例中，步驟⑴所用之二氧化石夕 粒子的粒徑大小為約5. nme在本發明又—實施例^，、 2上5-1:氧化石夕奈米粒子估分散液之重量百分比為約 ❿ ❹ 在本發明—實施财，步驟⑴所用之㈣氧基石夕可 ”、四乙氧石夕燒（tetraeth〇XySilane，TE〇s )或四甲氧石夕产 ㈤贿ethGXysiIane，TMS)。在本發明又—實施例中，2 述分散液與四烷氧基矽之重量比約為3 ··丨至* : 1。 在：發明一實施例中’步驟(c)係利用 月^，直到分散液之PH值為約4.6_5.〇。舉例 二 四級胺可為氫氧化銨。 上這 根，本發明實施例，步驟⑷所用的模具形狀可依欲 传到之光學元件的形狀來設計。 根據本發明實施例，步驟（(a) (b) (c) In the aspect, the optical element manufacturing method comprises the following steps of adding dignet particles to water to form a dispersion; adding a tetraalkoxy hydrazine to the dispersion; adjusting the pH of the dispersion And stirring the dispersion to form a sol solution; (d) feeding the sol solution into the mold; (〇 aging the sol solution to obtain a wet gel; (f) rinsing the wet gel with a slightly acidic aqueous solution; (g) Drying the above wet gel under the arm to obtain a xerogel; and (h) sintering the xerogel to obtain an optical element. The dispersion may be about 1.5 to 2.5, for example, in an embodiment of the present invention. In the step (a), the inorganic acid is added, and the pH of the dispersion is adjusted so that the cerium dioxide nanoparticles are uniformly distributed in the dispersion. The inorganic acid may be hydrochloric acid. Also in the step (a) In addition, in another embodiment of the present invention, 201022710 uses a (four) disperser to search for a dispersion to distribute the silica dioxide particles in the dispersion. For example, the above-mentioned dialing can be adjusted to several minutes. Up to several hours. In the present invention - an embodiment, The particle size of the cerium oxide particles used in the step (1) is about 5. nme in the present invention - Example ^, 2 5-1: the weight percentage of the dispersion of the oxidized stone smectite particles is about ❿ ❹ In the present invention - the implementation of the step (1) used in the (four) oxet, "tetraeth XySilane (TE〇s) or tetramethoxine (5) bribe ethGXysiIane, TMS). In the present invention Further, in the examples, the weight ratio of the dispersion to the tetraalkoxyquinone is about 3 ··丨 to * : 1. In the first embodiment of the invention, the step (c) is carried out using a month until the dispersion The pH value is about 4.6_5. 举例. For example, the second quaternary amine may be ammonium hydroxide. In this embodiment, the shape of the mold used in the step (4) may be designed according to the shape of the optical element to be passed. Embodiments of the present invention, steps (
m a η 〇 r, 所用之微酸水溶液的pH 值為力4.0-8.0，較佳的範圍為約4 發明-實施例中，可利用水沖# f例而言，在本 I上这步驟⑺的進行時間可視需要加以調整，一般而 a ’沖洗時間為約uo小時。 又 根據本發明實施例，於但溫恒濕機中進行 根據本發明實施例，步驟（g) g 6〇°c a ^ ή * j. L煤條件為溫度小於等於 相對濕度大於等於在本發明實施例中，上 201022710 述步驟（g)的進行時間為約η、 際乾燥時間可視模且、力48小時，其中實 Τ义保昇r濕蛱膠尺寸來軟 乾燥時間也越短。 正通㊉尺寸越小 根據本發明實施例，步驟（h) air)進行婷紝_ ’、用衣境空氣（ambient ’進盯K ’而不需如先前技術—般，需好 提供含氧氣或氣離子之士 70 ° 仃 發明實施例Φ I體夕除其中之雜質。在本 ± 、當的燒結溫度應大於等於約1200。(：，且Ma η 〇r, the pH of the aqueous solution of the slightly acidic acid used is a force of 4.0 to 8.0, preferably in the range of about 4, in the invention-embodiment, in the case of water, in the case of this step (7) The time of the adjustment can be adjusted as needed, generally a 'washing time is about uo hours. According to an embodiment of the present invention, in the temperature and humidity machine according to the embodiment of the present invention, the step (g) g 6〇°ca ^ ή * j. L coal condition is temperature less than or equal to the relative humidity greater than or equal to the implementation of the present invention. In the example, the proceeding time of step (g) of the above 201022710 is about η, the drying time is visible, and the force is 48 hours, wherein the soft drying time is shorter as the size of the wet gel is increased. According to the embodiment of the present invention, the step (h) air) is carried out, and the ambient air (ambient 'into the K' is not required to provide oxygen or gas as in the prior art. Ionics 70 ° 仃Inventive Example Φ I body annihilation of impurities therein. In this ±, when the sintering temperature should be greater than or equal to about 1200. (:, and
燒結時間約需1〇_24小時。 且 本發明另-態樣提出利用上述製造方法所得的光學元 在本發明實施例t，上述製造方法中所得乾凝膠的體 積收縮率為約25_4G%(體積收縮率的計算方式如下：模且 體積為Μ卜乾凝膠體積為M2，則體積收縮率s :㈣- M2)/M1 ”〇〇%)，此外所得光學元件的體積收縮率為約 45-55%。 在本發明實施例中，可利用不同的模具以得到各種形 狀、尺寸及種類之光學元件。舉例來說，上述光學元件可 以是透鏡、鏡片陣列、砲彈型光學元件或長條型光學元件。 可想而知，上述光學元件之類型僅為例示，本發明實施例 不限於上述特定類型之光學元件。 下文舉出數個實驗例與比較例，以進一步闡明根據本 發明實施例來製造光學元件時，不同參數對於光學元件良 率及no質之影響’上述參數包括沖洗條件、乾燥溫度、乾 燥濕度、乾燥時間等。 201022710 . 實驗例及比較例之製備方法 本說明書中，各實驗例及比較例之製造方法如下·· 首先，製備約3000 g之二氧化矽分散液，其中二氧化 =粒子之粒徑為約5_1GG nm，分散液t二氧化梦粒子的重 量百分比約25-40。/。。在分散液中加入_g濃度為〇〇ι n 之鹽酸，並以擾拌器搜拌約3〇分鐘。在分散液中加入約 1000 L之四乙氧矽烷，並以攪拌器攪拌約9〇分鐘。 • 接著’利賴度〜1 N之氫氧化㈣定上述分散液，直 到分散液之PH值為約5.〇。將滴定完成之分散液（溶膠溶 液）倒入成型用之模具中，使溶膠溶液在模具中陳化（即 進行水解及縮聚反應），以得到成型之濕凝膠。 以微酸水溶液沖洗濕凝膠，在下述各實驗例及比較例 中’所用之微酸水溶液的pH值可能不同，將於個別實驗例 中另行指明相關參數。 在冲洗之後利用於常壓下力口熱來乾燥上述濕凝膠。 ❹=下述各實驗例及比較例中，係、將濕凝膠放置於恆溫怪濕 内以不同的/皿度及相對濕度條件，將濕凝膠乾燥為乾 /膠。此外’隨著模具尺寸不同’所需的乾燥時間亦不相 同。 最後，在周圍空氣的條件下，燒結乾凝膠以得到光學 ^牛。所用的燒結溫度為約13⑼。c，燒結時間約12個小 實驗1 :沖洗條件對光學元件品質之影響 201022710 2 了探討沖洗步驟以及不同沖洗條件對於光學元件品 質：影響，本系列實驗利用上述方法來製備12職之透： 光學几件。在本系列實驗中，皆將濕凝膠放置於怪溫恆= 機中，以约40。（：及相對濕度約65%的條件乾燥，乾燥時 =約10小時。各實驗例不同之處在於用以沖洗濕凝膠之微 酸水溶液的pH值不同，而比較例丨則未進行沖洗步驟。下 表I列出各實驗例及比較例之相關參數與結果·· 表 1沖洗所用微酸水溶液之pH值及產品良率The sintering time takes about 1 〇 24 hours. Further, the present invention provides an optical element obtained by the above manufacturing method. In the embodiment t of the present invention, the volume shrinkage of the dry gel obtained in the above manufacturing method is about 25_4 G% (the volume shrinkage ratio is calculated as follows: The volume is a dry gel volume of M2, and the volume shrinkage ratio s : (4) - M2) / M1 "〇〇%), and the volume shrinkage of the obtained optical element is about 45-55%. In the embodiment of the present invention Different molds can be utilized to obtain optical elements of various shapes, sizes, and types. For example, the optical elements can be lenses, lens arrays, bullet-type optical elements, or elongated optical elements. The types of elements are merely exemplary, and embodiments of the present invention are not limited to the specific types of optical elements described above. Several experimental examples and comparative examples are exemplified below to further clarify different parameters for optical elements when manufacturing optical elements according to embodiments of the present invention. The influence of yield and no quality 'The above parameters include washing conditions, drying temperature, drying humidity, drying time, etc. 201022710 . Preparation of experimental examples and comparative examples In the present specification, the production methods of the respective experimental examples and comparative examples are as follows: First, about 3000 g of a ceria dispersion is prepared, wherein the particle size of the dioxide = particle is about 5_1 GG nm, and the dispersion t is a dioxide dioxide particle. The weight percentage is about 25-40%. Add _g hydrochloric acid with a concentration of 〇〇ι n to the dispersion, and mix with a stirrer for about 3 minutes. Add about 1000 L of tetraethoxy in the dispersion. The decane is stirred with a stirrer for about 9 minutes. • Next, the above dispersion is fixed to the pH of the dispersion until the pH of the dispersion is about 5. 〇. The solution is poured into a mold for molding, and the sol solution is aged in a mold (that is, subjected to hydrolysis and polycondensation reaction) to obtain a formed wet gel. The wet gel is rinsed with a slightly acidic aqueous solution, in the following experimental examples and In the comparative example, the pH of the aqueous solution of the slightly acidic acid used may be different, and the relevant parameters will be separately indicated in the individual experimental examples. After the rinsing, the above wet gel is dried by the heat of the mouth under normal pressure. ❹ = each experiment described below In the case of the example and the comparative example, the system will wet condensate The glue is placed in a constant temperature and humidity, and the wet gel is dried to dry/glue under different conditions of water and relative humidity. In addition, the drying time required for 'different mold size' is also different. Finally, in the surrounding air Under the conditions, the dry gel was sintered to obtain optical calcin. The sintering temperature used was about 13 (9). c, the sintering time was about 12 small. Experiment 1: The effect of the processing conditions on the quality of the optical components 201022710 2 The rinsing step and the different rinsing were discussed. Conditions for optical component quality: influence, this series of experiments using the above method to prepare 12 positions: optical several pieces. In this series of experiments, the wet gel is placed in the strange temperature constant = machine, about 40. : Dry under conditions of about 65% relative humidity, and about 10 hours when dry. The experimental examples differed in that the pH of the aqueous solution of the slightly acidic acid used to rinse the wet gel was different, whereas in the comparative example, the rinsing step was not performed. Table I below lists the relevant parameters and results of each experimental example and comparative example. Table 1 pH value and product yield of the slightly acidic aqueous solution used for rinsing
❿ ❹ 在比較例1中，以經過沖洗之濕凝膠進行乾燥時，所 得到的乾凝膠中約有15%會破裂，其餘未破裂的乾凝膠經 過燒結後，所得到的光學元件呈現霧狀，屬於不良品。相 較之下，貫驗例1-3中，濕凝膠於乾燥過程中破裂的比例 不到1%，且經燒結所得之光學元件品質良好。 此外，貝驗例1 -3所得之乾凝膠收縮率約為27%，亦 優於比較例1之乾凝膠收縮率20%。 12 201022710 由此可知，在將濕凝膠乾燥之前，根據本發明實施例 利用微酸水溶液沖洗成型的濕凝谬的確有 程中膠體破裂之情形。此外，利用微酸水溶液料=一 步移除濕凝膠中之雜質，因此可利用環境空氣進行燒結， 而不需另外提供含氧或氯之燒結氣體。 實驗2.乾燥條件對光學元件品質之影響 參 為了探討乾燥條件對於光學元件品質之影響，本系列 實驗利用上述方法來製備多種光學以。本㈣實驗中， ㈣用PH值約為“之微酸水溶液來沖洗濕凝膠，沖洗時 _以+在各實㈣中’針對不同類型、尺寸之光學 :件，調签其乾燥時之溫度及相對渴度。下表2列出部分 實驗例及比較例之相關參數與結果： ❹ 光學元件類型 (尺寸） 乾燥溫 度（oc) /相對濕 度（％ ) 透鏡 45/20 (1mm) 45/40 --—-- 60/40 鏡片陣列 一--— 55/20 (15mm* 17mm* 1,8mm ) 55/80 70/80 乾燥 時間 (小 時） 1 -— 15 --- 16 一 _ 12 良率 (%) 乾凝 膠收 縮率 (%) 光學元 件收縮 率（％ ) 50% 85% 35% 0% 85% 0% 27% 27% 27% 3 0% 49.5% 49.5% 49.5% 50% 13 201022710 砲彈型 (R=4mm H=15mm) 40/20 — 一 30 60% 30% 50% 40/60 12 85% 3 0% 50% 55/60 10 0% 30% 50% 長條型 (35mm*5mm*2mm ) 50/20 12 0% 50/95 16 85% 30% 50% 40/95 35 60% 3 0% 50% "一_丨·. 蒼照表 <透鏡為例’當乾燥溫度為4) U 且相對濕度為20%時，所得到的乾凝膠收縮率可達27%而 光學元件收縮率可達49.5%，且產品的良率約為5〇%。在 乾無溫度同樣保持45。(：而相對濕度提升至桃時，乾凝勝 收縮率與光學元件收縮率皆與前一條件中相同，但產品的 二率可提升至85%。當將乾燥溫度提高至6〇。。時。產品 良率則為35%，作仿瓦γ ^ 仍了伶到理想的乾凝膠收縮率與光學元 件收縮率。 再以鏡片陣列（只廿_ & , c C 尺寸為 15mm*17mm*1.8mn〇 為例， 由於单一鏡片陣列元件的矣品社L οπ 1 ^ , a . '積大於單一個1 mm透鏡元 透鏡开株政古 d皿度和相對濕度等參數亦與lmm 边鏡兀件略有不同。鈇 π . …、 由表2可以發現，當相對渴产 同樣為80〇/〇時，乾焯、、w 田子日耵濕度 8,0/ . ± 度55 c下鏡片陣列的產品良率為 85〇/〇 ;而乾燥溫度升荠釗7Λ。广士 展印民羊為 〇%。 。J70 C時’鏡片陣列的產品良率為 由表2可知，不认古與一 & 杳—t ’先學几件的類型為何，根櫨太淼帕 貫施例提出之方法推很锞本發明 万决進仃乾燥時，乾燥溫度應小於等於6〇。 14 201022710 虽乾H…『c時，上述四 率都極低甚或為。%。另—方面，乾燥時之相對二= 等於20%。研究結果顯示 二、“大於 ^、β — 牡钇辟過程中，乾燥溫度與相 對 >,.，、度兩種環境參數都會影響產物乾燥的情形 環境參數間也存在交互影響的作用。由上述實驗i及實驗2 可知，根據本發明實_之料元件製造枝，可利用於 常壓下加熱來乾燥濕凝膠。相較於習知超臨界乾燥比较 ❹ In Comparative Example 1, when drying with a rinsed wet gel, about 15% of the resulting xerogel is broken, and the remaining unbroken xerogel is sintered, and the resulting optical element is rendered. It is foggy and belongs to a bad product. In contrast, in Test Examples 1-3, the proportion of the wet gel ruptured during the drying process was less than 1%, and the optical member obtained by sintering was of good quality. Further, the dry gel shrinkage ratio obtained by the test example 1-3 was about 27%, which was also superior to the dry gel shrinkage ratio of Comparative Example 1 of 20%. 12 201022710 It is thus known that the wet gel which is formed by the use of an aqueous solution of a slightly acidic acid according to an embodiment of the present invention does have a colloidal rupture before drying the wet gel. Further, the use of the slightly acidic aqueous solution = one step to remove the impurities in the wet gel, so that the ambient air can be used for sintering without additionally providing a sintering gas containing oxygen or chlorine. Experiment 2. Effect of drying conditions on the quality of optical components. In order to investigate the effects of drying conditions on the quality of optical components, this series of experiments used the above methods to prepare a variety of optics. (4) In the experiment, (4) rinsing the wet gel with a slightly acidic aqueous solution of pH value, and rinsing the temperature of the different types and sizes of optical components during the rinsing process. And relative thirst. Table 2 lists the relevant parameters and results of some experimental examples and comparative examples: 光学 Optical component type (size) Drying temperature (oc) / relative humidity (%) Lens 45/20 (1mm) 45/40 ----- 60/40 lens array one --- 55/20 (15mm* 17mm* 1,8mm) 55/80 70/80 drying time (hours) 1 -— 15 --- 16 a _ 12 yield (%) Dry gel shrinkage (%) Optical component shrinkage (%) 50% 85% 35% 0% 85% 0% 27% 27% 27% 3 0% 49.5% 49.5% 49.5% 50% 13 201022710 Shell Type (R=4mm H=15mm) 40/20 — A 30 60% 30% 50% 40/60 12 85% 3 0% 50% 55/60 10 0% 30% 50% Strip type (35mm*5mm* 2mm) 50/20 12 0% 50/95 16 85% 30% 50% 40/95 35 60% 3 0% 50% "一_丨·. 苍照表<Lens as an example' when the drying temperature is 4 U) and a relative humidity of 20%, the resulting dry gel shrinkage rate of up to 27% and optical component shrinkage of up to 4 9.5%, and the yield of the product is about 5%. The same temperature is maintained at 45. (When the relative humidity is raised to the peach, the dry shrinkage shrinkage ratio and the optical component shrinkage rate are the same as in the previous condition. However, the second rate of the product can be increased to 85%. When the drying temperature is increased to 6 〇, the product yield is 35%, and the γ γ ^ is still the ideal dry gel shrinkage ratio and optical components. Shrinkage rate. Then take the lens array (only 廿 & , c C size is 15mm * 17mm * 1.8mn 〇 for example, because the single lens array component of the product company L οπ 1 ^ , a . 'product is greater than a single 1 The mm lens element lens is also slightly different from the lmm edge mirror element. 、π . ..., can be found from Table 2, when the relative thirst is also 80 〇 / ,, Cognac, w Tianzi Sundial Humidity 8,0/. ±55 c The product yield of the lens array is 85〇/〇; and the drying temperature is increased by 7Λ. The Guangshi Zhanyin Sheep is 〇%. At J70 C, the product yield of the lens array is known from Table 2. It is not known about the type of the first and the first. Example consistent method, proposed is pushed when the ingot into ten thousand Ding invention is in no drying, the drying temperature should be less than or equal 6〇. 14 201022710 Although the dry H... "c", the above four rates are extremely low or even. %. On the other hand, the relative two = when dry is equal to 20%. The results show that, in the process of “greater than ^, β — oysters, the drying temperature and the relative environmental parameters of the >, ., and degrees will affect the drying of the product. There are also interactions between the environmental parameters. Experiments i and 2 show that according to the invention, the material component can be dried by heating under normal pressure to dry the wet gel. Compared with the conventional supercritical drying.
發明實施例提供之方法不但不需要高價的設備，亦可大幅 縮短乾燥所需的時間。因此本發明實施例提出之方法，不 但可用於量產各種外形及尺寸之光學元件，更可節省所需 之時間與設備成本H湘本發明實施例提出之光學 元件製造方法，亦可得到理想的乾凝膠收縮率及光 收縮率。 干 雖然本發明已以實施例揭露如上，然其並非用以限定 本發明，任何熟習此技藝者，在不脫離本發明之精神和範 =内，當可作各種之更動與潤飾，因此本發明之保護範圍 虽視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 t 【主要元件符號說明】 15 (*The method provided by the embodiments of the invention not only does not require expensive equipment, but also greatly shortens the time required for drying. Therefore, the method proposed by the embodiment of the present invention can be used not only for mass production of optical components of various shapes and sizes, but also for saving time and equipment cost. The optical component manufacturing method proposed by the embodiment of the present invention can also be ideally obtained. Dry gel shrinkage and light shrinkage. Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and those skilled in the art can make various modifications and retouchings without departing from the spirit and scope of the present invention. The scope of protection is subject to the definition of the scope of the patent application attached. [Simple description of the diagram] t [Description of main component symbols] 15 (*