TW201010982A - 2-benzyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound - Google Patents
2-benzyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound Download PDFInfo
- Publication number
- TW201010982A TW201010982A TW098129659A TW98129659A TW201010982A TW 201010982 A TW201010982 A TW 201010982A TW 098129659 A TW098129659 A TW 098129659A TW 98129659 A TW98129659 A TW 98129659A TW 201010982 A TW201010982 A TW 201010982A
- Authority
- TW
- Taiwan
- Prior art keywords
- compound
- dichlorophenyl
- hydrochloride
- methylimidazole
- benzyl
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3615—N-compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
- C23C22/52—Treatment of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Chemical Treatment Of Metals (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
Description
201010982 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種新穎2_节基4-(3,4-二氣苯基)·5_甲基 哺β坐化合物。 【先前技術】 類似本發明化合物之咪唑化合物,例如2_(2,4-二氯-苄 基)-5-(3,4-二氯-苯基)-1Η-咪唑係揭示於專利文件丨。但於該 文件中,並未揭示其中曱基係鍵結至咪唑環之4(5)位置之咪 β坐化合物。 引述表單 專利參考文獻 [PLT 1] JP-T-2003-500357(第 7 頁,第 51 頁) 【發明内容】 本發明之目的係提供一種新穎2_苄基_4_(3,4_二氯苯 基)-5-甲基》米唾化合物。 為了解決前述問題,發明人進行全面性密集調查研究。妹 果,發明人發現式⑴表示之軸24基邻,4•二氯苯基)_5_ 甲基咪唾化合物可被合成,如此完成本發明。 換言之’本發明於其最廣義組態中包括下列態樣: ⑴一種式(1)表示之2-节基邻,4_二氯苯基)_5·甲基口米唾 化合物: 098129659 4 201010982201010982 VI. Description of the Invention: [Technical Field to Which the Invention Is Applicable] The present invention relates to a novel 2-membered 4-(3,4-diphenyl)-5-methyl stilbene compound. [Prior Art] An imidazole compound similar to the compound of the present invention, for example, 2-(2,4-dichloro-benzyl)-5-(3,4-dichloro-phenyl)-1 fluorene-imidazole is disclosed in the patent document 丨. However, in this document, the stilbene-based compound in which the thiol group is bonded to the 4 (5) position of the imidazole ring is not disclosed. LISTING FORM Patent Reference [PLT 1] JP-T-2003-500357 (page 7, page 51) [Invention] The object of the present invention is to provide a novel 2-benzyl- 4_(3,4-dichloride Phenyl)-5-methyl" rice salic compound. In order to solve the aforementioned problems, the inventors conducted a comprehensive intensive investigation study. As a result, the inventors have found that the axis of the formula (1) represented by the formula (1) is a group of 24, and the 4, dichlorophenyl)-5-methylimidyl compound can be synthesized, thus completing the present invention. In other words, the present invention includes the following aspects in its broadest configuration: (1) a 2-node-based, 4-dichlorophenyl)-5-methyl-m-salt represented by the formula (1) Compound: 098129659 4 201010982
:中…2為相同或相異’且表示氫原子、氣原子或漠原 ❹ 發明之2m(3,4-二氣苯基)-5_甲基味唾化合物可 ,為金屬特別為銅(包括銅合金)表面之抗氧化劑及環氧 树月曰之固化劑或固化加速劑,也可用於醫藥化學品及農用化 學品領域作為中間原料。 【實施方式】 後文將說明本發明之細節。 、本發明之2-节基冰(3,4_二氯苯基)j甲基味峻化合物係 〇以下式(I)表示及其實例包括: 2-苄基-4-(3,4-二氯苯基)_5·甲基咪唑, 2-(2-氯苄基)_4_(3,4_二氣苯基基咪唑, 2-(3-氯苄基)_4_(3,4_二氣苯基)_5_ ▼基咪唑, 2-(4-氯苄基)_4-(3,4-二氯苯基)_5-甲基咪唑, 2-(2,3-二氯节基)_4_(3,4-二氣苯基)_5_f基咪唑, 2·(2,4~二氯苄基)-4-(3,4-二氯苯基)_5_甲基咪唑, 2-(2,5-二氯苄基>4-(3,4-二氯苯基)-5-甲基咪唑, 098129659 5 201010982 2-(2,6-一氣午基)-4-(3,4-二氯苯基)-5-甲基咪β坐, 2-(3,4-一氣节基)_4-(3,4-二氯苯基)-5-甲基味β坐, 2-(3,5-一氯午基)-4-(3,4-二氣苯基)-5-曱基咪哇, 2-(2-溴苄基)-4-(3,4-二氣苯基)-5-曱基咪唑, 2-(3-溴苄基)-4-(3,4-二氯苯基)-5-甲基咪唑, 2-(4-溴苄基)-4-(3,4-二氣苯基)-5-甲基咪唑, 2-(2,3-二溴苄基)_4_(3,4_二氯苯基)-5-甲基咪唑, 2-(2,4-二溴苄基)_4-(3,4-二氣苯基)-5-甲基咪唑, 2-(2,5-二溴苄基)_4-(3,4-二氣苯基)-5-甲基咪唑, 2-(2,6-二溴节基)_4_(3,4_二氣苯基)_5_曱基咪嗤, 2-(3,4-二溴苄基)-4-(3,4-二氣苯基)-5-曱基咪嗤, 2-(3,5-二溴苄基)-4-(3,4-二氯苯基)_5_曱基咪唑, 2-(3-溴-2-氣苄基)_4-(3,4_二氣苯基)_5_甲基咪唑, 2-(4-溴-2-氯苄基)_4_(3,4_二氣笨基)_5•曱基咪唑, 2-(5-溴-2-氣苄基)_4-(3,4-二氣笨基)·5_曱基咪唑, 2-(2-溴-6-氯苄基)_4·(3,4_二氣苯基)·5_甲基咪唑, 2-(2-溴-3-氣苄基)_4·(3,4_二氣笨基)_5_曱基咪唑, 2-(4-溴-3-氣节基)_4_(3,4_二氣笨基)_5_甲基咪唑, 2-(5-漠-3-氣f基)斗(3,4_二氣笨基)_5_甲基咪唑, 2-(2-溴-5-氯节基)_4_(3,4_二氯苯基)_5_甲基咪唑, 2-(2-/臭-4-氣节基)_4_(3,4_二氣笨基)_5_曱基_唑,及 2-(3-漠-4-氯节基)_4_(3,4_二氣笨基)_5_甲基咪唑。 098129659 6 201010982:中...2 is the same or different ' and represents a hydrogen atom, a gas atom or a desert ❹. The 2m(3,4-diphenyl)-5-methyl-salt compound of the invention may be a metal, especially copper ( Antioxidants on the surface of copper alloys and curing accelerators or curing accelerators of Epoxy resin can also be used as intermediate materials in the fields of pharmaceutical chemicals and agrochemicals. [Embodiment] Details of the present invention will be described later. The 2-mercapto-ice (3,4-dichlorophenyl)j methyl sulphate compound of the present invention is represented by the following formula (I) and examples thereof include: 2-benzyl-4-(3,4- Dichlorophenyl)_5·methylimidazole, 2-(2-chlorobenzyl)_4_(3,4-diphenylphenylimidazole, 2-(3-chlorobenzyl)_4_(3,4_digas Phenyl)_5_ ▼-imidazole, 2-(4-chlorobenzyl)_4-(3,4-dichlorophenyl)-5-methylimidazole, 2-(2,3-dichlorobenzyl)_4_(3 , 4-diphenylphenyl)_5_f-based imidazole, 2·(2,4-dichlorobenzyl)-4-(3,4-dichlorophenyl)-5-methylimidazole, 2-(2,5- Dichlorobenzyl> 4-(3,4-dichlorophenyl)-5-methylimidazole, 098129659 5 201010982 2-(2,6-a-indolyl)-4-(3,4-dichlorobenzene -5-methyl-m-β sitting, 2-(3,4-one agglomerate)_4-(3,4-dichlorophenyl)-5-methyl-flavored β, 2-(3,5- Monochloroindolyl-4-(3,4-diphenyl)-5-indolyl, 2-(2-bromobenzyl)-4-(3,4-diphenyl)-5 - mercapto imidazole, 2-(3-bromobenzyl)-4-(3,4-dichlorophenyl)-5-methylimidazole, 2-(4-bromobenzyl)-4-(3,4 -diphenylphenyl)-5-methylimidazole, 2-(2,3-dibromobenzyl)_4_(3,4-dichlorophenyl)-5-methylimidazole, 2-(2,4- Dibromobenzyl) 4-(3,4-diphenyl)-5-methylimidazole, 2-(2,5- Dibromobenzyl) 4-(3,4-diphenyl)-5-methylimidazole, 2-(2,6-dibromo-benzyl)_4_(3,4-diphenyl)_5_曱Gimidine, 2-(3,4-dibromobenzyl)-4-(3,4-diphenyl)-5-mercaptoimidine, 2-(3,5-dibromobenzyl)- 4-(3,4-Dichlorophenyl)-5-mercaptoimidazole, 2-(3-bromo-2-abenzyl)-4-(3,4-diphenyl)-5-methylimidazole, 2 -(4-bromo-2-chlorobenzyl)_4_(3,4_dioxyl)_5•nonyl imidazole, 2-(5-bromo-2-ylbenzyl)_4-(3,4-di (5) mercapto imidazole, 2-(2-bromo-6-chlorobenzyl)_4·(3,4-diphenyl)-5-methylimidazole, 2-(2-bromo- 3-gas benzyl)_4·(3,4_二气笨基)_5_mercaptoimidazole, 2-(4-bromo-3-indolyl)_4_(3,4_二气笨基)_5_ Methylimidazole, 2-(5-indol-3-gas f-based) bucket (3,4_di-gas), 5-methylimidazole, 2-(2-bromo-5-chlorobenzyl)_4_(3 , 4_dichlorophenyl)_5_methylimidazole, 2-(2-/odor-4-pyloryl)_4_(3,4_digas stupyl)_5_mercapto-oxazole, and 2-( 3- Desert-4-Chlorobenzyl)_4_(3,4_dioxyl)_5-methylimidazole. 098129659 6 201010982
其中Xi&X2為相同或相異且表示氫原子、氯原子或溴原子。 本發明之2-苄基-4-(3,4-二氯苯基)-5-甲基咪唑化合物可 根據已知方法合成。例如如下反應圖所示,該化合物可經由Wherein Xi&X2 is the same or different and represents a hydrogen atom, a chlorine atom or a bromine atom. The 2-benzyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound of the present invention can be synthesized according to a known method. For example, as shown in the reaction diagram below, the compound can be
3’,4’-二氣苯丙酮化合物與芳基乙脒化合物反應而合成。The 3',4'-dioxapropiophenone compound is synthesized by reacting with an aryl acetamidine compound.
其中X2係如前文說明,及X3表示氯原子、溴原子或 峨原子。 於前述反應中,相對於2-鹵化3’,4’-二氯苯丙酮化合物, 芳基乙脒化合物之用量較佳為前者之0.8至1.5倍莫耳比, 更佳為0.9至1.1莫耳比。相對於2-鹵化3’,4’-二氯苯丙酮 化合物,脫鹵化氫劑之用量較佳為1至10倍當量。 098129659 7 201010982 至於前述2-鹵化3’,4’-二氯苯丙酮化合物,其可為2-氯 _3’,4’_二氣苯丙酮、2-溴-3’,4’-二氣苯丙酮及2-碘-3’,4’-二氯 苯丙晒。 2-鹵化3’,4’-二氯苯丙酮化合物係經由鹵化3’,4’-二氯苯 丙酮之2位置獲得。有關於鹵化作用,亦可為氯化或碘化, 但其中等莫耳量溴與3’,4’-二氣苯丙酮反應之溴化反應為最 簡單最方便。 有關於3’,4’-二氯苯丙酮,可使用市售者作為試劑。 前述芳基乙脒化合物可由芳基乙脒鹽酸鹽與強鹼劑反應 及去除氯化氩獲得。於前述咪唑化合物之合成反應中,也可 使用芳基乙脒鹽酸鹽或芳基乙脒化合物與習知無機酸或有 機酸之鹽來替代芳基乙脒化合物。 芳基乙脒鹽酸鹽可根據已知方法合成。例如,如下反應圖 所示,經由氰化苄基化合物與氯化氫氣體及低碳烷醇諸如乙 醇反應來執行轉化成芳基乙醯亞胺酸鹽酸鹽,及進一步允許 其與氨反應,可合成芳基乙脒鹽酸鹽。Wherein X2 is as previously described, and X3 represents a chlorine atom, a bromine atom or a ruthenium atom. In the foregoing reaction, the amount of the aryl acetamidine compound is preferably from 0.8 to 1.5 times the molar ratio, more preferably from 0.9 to 1.1 moles per mole of the 2-halogenated 3',4'-dichloropropiophenone compound. ratio. The dehydrohalogenating agent is preferably used in an amount of from 1 to 10 equivalents based on the 2-halogenated 3',4'-dichloropropiophenone compound. 098129659 7 201010982 As for the aforementioned 2-halogenated 3',4'-dichloropropiophenone compound, which may be 2-chloro-3', 4'-dioxapropiophenone, 2-bromo-3', 4'-diox Propiophenone and 2-iodo-3',4'-dichlorophenylpropene. The 2-halogenated 3',4'-dichloropropiophenone compound is obtained via the 2 position of the halogenated 3',4'-dichlorophenylacetone. Regarding the halogenation, it may also be chlorination or iodination, but the bromination reaction in which the molar amount of bromine is reacted with 3',4'-dioxapropanone is the simplest and most convenient. Regarding 3',4'-dichloropropiophenone, a commercially available one can be used as a reagent. The above aryl acetamidine compound can be obtained by reacting aryl acetamidine hydrochloride with a strong base agent and removing argon chloride. In the synthesis reaction of the above imidazole compound, an aryl acetamidine hydrochloride or an aryl acetamidine compound and a salt of a conventional inorganic acid or organic acid may be used instead of the aryl acetamidine compound. The aryl acetamidine hydrochloride can be synthesized according to known methods. For example, as shown in the following reaction scheme, conversion to an aryl acetimidate hydrochloride is carried out by reacting a benzyl cyanide compound with a hydrogen chloride gas and a lower alkanol such as ethanol, and further allowing it to react with ammonia, which can be synthesized. Aryl acetamidine hydrochloride.
其中乂!及X2係如前文說明。 098129659 8 201010982 經由此等反應所得之芳基乙脒化合物之鹽酸鹽之實例包 括: 苯基乙脒鹽酸鹽, (2-氯苯基)乙肺鹽酸鹽, (3-氯苯基)乙脒鹽酸鹽, (4-氯苯基)乙脒鹽酸鹽, (2,3-二氣苯基)乙脒鹽酸鹽, Q (2,4-二氯苯基)乙脒鹽酸鹽, (2,5-二氯苯基)乙脒鹽酸鹽, (2,6-二氯苯基)乙脒鹽酸鹽, (3,4-二氣苯基)乙脒鹽酸鹽, (3,5-二氯苯基)乙脒鹽酸鹽, (2-溴苯基)乙胨鹽酸鹽, (3-溴苯基)乙脒鹽酸鹽, 〇 (4-溴苯基)乙脎鹽酸鹽, (2,3-二溴苯基)乙脒鹽酸鹽, (2,4-二溴苯基)乙脒鹽酸鹽, (2,5-二溴苯基)乙肺鹽酸鹽, (2,6-二溴苯基)乙脒鹽酸鹽, (3,4-二溴苯基)乙脒鹽酸鹽, (3,5-二溴苯基)乙脒鹽酸鹽, (3-溴-2-氯苯基)乙脒鹽酸鹽, 098129659 9 201010982 (4-溴-2-氯苯基)乙脒鹽酸鹽, (5-溴-2-氯苯基)乙脒鹽酸鹽, (2-溴-6-氣苯基)乙脒鹽酸鹽, (2-溴-3-氣苯基)乙脒鹽酸鹽, (4-溴-3-氯苯基)乙脒鹽酸鹽, (5-溴-3-氯苯基)乙脒鹽酸鹽, (2-溴-5-氯苯基)乙脒鹽酸鹽, 馨 (2-溴-4-氣苯基)乙脒鹽酸鹽,及 (3_溴-4-氯苯基)乙脒鹽酸鹽。 至於前述脫鹵化氫劑,可使用任一種已知之脫 囹化氣劑而 無特殊限制。此種脫齒化氫劑之實例包括無機鹼化八物諸 氫氧化鈉、氫氧化鉀、氫氧化鈣、碳酸鈉、碳酸卸、# 鈉、及碳酸氩鉀;有機鹼化合物諸如三乙基胺及 灭酸氫 夂 1 5 8 ·二 〇Y 一 環[5·4.〇]-7-十一碳烯(DBU);金屬烧氧化物諸如甲氧4 第三丁氧化鉀;等。 、及 至於前述反應溶劑,可使用任何已知溶劑而無特殊限制, 只要該溶劑可溶解2 - i化3 ’,4 二氣苯丙酮化合物及芳其乙 脒化合物且不會涉入反應即可。此種溶劑之實例包括烷醇類 諸如異丙醇及第三丁醇;烴類諸如己烷及曱苯;_化烴類諸 如氣仿及氣苯;酯類諸如乙酸乙酯;腈類諸如乙腈;醚類諸 如四氫呋喃、二α号u山及乙二醇二甲醚;醯胺類諸如Ν,Ν—二 曱基甲酿胺(DMF)及Ν,Ν-二甲基乙醯胺(DMAC);二曱亞硪 098129659 10 201010982 (DMSO);等。此等溶劑可組合使用。 反應溫度較佳係由室溫至回流溫度,及反應時間較佳係由 1小時至10小時。反應通常係於大氣壓下進行。 於前述反應條件下所形成之2·苄基_4_(3,4_二氣苯基)_5_ 甲基咪唑化合物可藉尋常後處理分離。舉例言之,經由於反 應完成後將反應混合物分溶於水層及有機溶劑層,以及於以 水洗滌該有機溶劑層後,蒸發去除有機溶劑,可獲得化合物 ❹之粗產物,及該粗產物進一步可藉再結晶操作等純化。 [實施例] 後文將參考實施例特別說明本發明,但不可將本發明解譯 為囿限於該等實施例。參考例丨及2分別顯示苯基乙肺鹽酸 鹽及2-漠_3’,4’_二氯苯丙鋼之合成例。 [參考例1] (本基乙脉鹽酸鹽之合成) 於由克α〇〇6莫耳)苯基乙腈及S5 =醇所組成之溶液内於5一經4= i日及iT.22莫耳)氣化氫氣體。當允許反應溶液於代靜置 酸 後基Γ亞胺酸,酸鹽經軋碎 於以冰冷竹藉減分錢 成之溶液 伤添加至其中。然後,混合物於 098129659 201010982 以冰冷卻下勝2小時’進—步於室溫㈣隔夜。於過濾去 除白色固狀我性㈣後,較域壓下濃駐乾獲得 172·5克(1·011莫耳’產率1〇〇 5%)苯基乙肺鹽酸鹽,呈灰黃 色稠厚糖漿狀形式。 [參考例2] (2-溴-3,,4’-二氣苯丙酮之合成) 於45.8克(0.226莫耳)3,,4,_二氣苯丙酮* 46克甲醇所組 成之溶液内於62t至65。(:歷經50分鐘時間逐滴添加36克❹ (0.2253莫耳)>臭。於反應溶液冷卻後,分溶於75克甲苯及 91克水。於曱苯層以水洗滌及以硫酸鎂脫水後,溶劑於減 壓下蒸發獲得64.3克(0.228莫耳’產率l0l.lo/Q)2_溴_3,,4,- 二氣苯丙酮,呈淺黃綠色油形式。 [實施例1] (2-苄基-4-(3,4-二氣苯基)-5_曱基咪唑之合成) 於由28.7克(〇.丨68莫耳)苯基乙脒鹽酸鹽,59克(Μη莫 ❹ 耳)碳酸鉀’及210毫升N,N-二甲基曱醯胺所組成之懸浮液 於5〇。(:攪拌30分鐘後,於同溫48.8克(0.173莫耳)2-漠-3,,4,-二氯笨丙鲖分成數份添加至其中,接著又於同溫攪拌4小 時。然後,於反應懸浮液冷卻後,分溶於800毫升水及3〇〇 毫升氣仿。氯仿層以水洗兩次後,氯仿於減壓下蒸發,經由 添加150毫升甲苯至所得稠厚糖漿狀濃縮產物及於加熱下 授拌,晶體沉澱。沉澱出之晶體藉過濾收集,及於以曱苯洗 098129659 12 201010982 滌後經乾燥獲得乳酪色粉末。粉末由乙腈再結晶,獲得18.8 克(0.059莫耳,產率35.3%)乳白色粉狀晶體。 所得晶體之熔點、薄層層析術之Rf值及1H-NMR資料及 質譜資料如下。Which one! And X2 is as explained above. 098129659 8 201010982 Examples of the hydrochloride salt of the aryl acetamidine compound obtained by such reaction include: phenylacetamidine hydrochloride, (2-chlorophenyl)ethylglycol hydrochloride, (3-chlorophenyl) Acetate hydrochloride, (4-chlorophenyl)acetamidine hydrochloride, (2,3-diphenyl)acetamidine hydrochloride, Q (2,4-dichlorophenyl)acetamidine hydrochloride Salt, (2,5-dichlorophenyl)acetamidine hydrochloride, (2,6-dichlorophenyl)acetamidine hydrochloride, (3,4-diphenyl)acetamidine hydrochloride, (3,5-Dichlorophenyl)acetamidine hydrochloride, (2-bromophenyl)acetamidine hydrochloride, (3-bromophenyl)acetamidine hydrochloride, hydrazine (4-bromophenyl) Acetate hydrochloride, (2,3-dibromophenyl)acetamidine hydrochloride, (2,4-dibromophenyl)acetamidine hydrochloride, (2,5-dibromophenyl)ethyl Hydrochloride, (2,6-dibromophenyl)acetamidine hydrochloride, (3,4-dibromophenyl)acetamidine hydrochloride, (3,5-dibromophenyl)acetamidine hydrochloride Salt, (3-bromo-2-chlorophenyl)acetamidine hydrochloride, 098129659 9 201010982 (4-bromo-2-chlorophenyl)acetamidine hydrochloride, (5-bromo-2-chlorophenyl) Acetate hydrochloride, (2-bromo-6-phenylphenyl)acetamidine hydrochloride, (2-bromo-3-gas) Ethyl hydrazine hydrochloride, (4-bromo-3-chlorophenyl)acetamidine hydrochloride, (5-bromo-3-chlorophenyl)acetamidine hydrochloride, (2-bromo-5-chloro Phenyl)acetamidine hydrochloride, bis (2-bromo-4-phenylphenyl)acetamidine hydrochloride, and (3-bromo-4-chlorophenyl)acetamidine hydrochloride. As the aforementioned dehydrohalogenating agent, any known desulfurizing agent can be used without particular limitation. Examples of such a dehydrogenating agent include inorganic alkalized eight kinds of sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, carbonic acid unloading, #sodium, and potassium argonate; and an organic base compound such as triethylamine. And chlorinated hydroquinone 1 5 8 · diterpene Y a ring [5·4.〇]-7-undecene (DBU); metal oxide oxide such as methoxy 4 potassium butoxide; And as far as the above reaction solvent, any known solvent can be used without particular limitation as long as the solvent can dissolve the 2 -i 3 ', 4 dioxapropiophenone compound and the aryl acetophenone compound without being involved in the reaction. . Examples of such a solvent include alkanols such as isopropanol and tert-butanol; hydrocarbons such as hexane and toluene; _hydrocarbons such as gas and gas benzene; esters such as ethyl acetate; nitriles such as acetonitrile Ethers such as tetrahydrofuran, di-alpha u and ethylene glycol dimethyl ether; guanamines such as hydrazine, hydrazine-dimercaptoamine (DMF) and hydrazine, hydrazine-dimethylacetamide (DMAC) ; 二曱亚硪 098129659 10 201010982 (DMSO); and so on. These solvents can be used in combination. The reaction temperature is preferably from room temperature to reflux temperature, and the reaction time is preferably from 1 hour to 10 hours. The reaction is usually carried out under atmospheric pressure. The 2·benzyl-4-(3,4-diphenyl)-5-methylimidazole compound formed under the aforementioned reaction conditions can be isolated by ordinary post treatment. For example, after the reaction is completed, the reaction mixture is dissolved in an aqueous layer and an organic solvent layer, and after washing the organic solvent layer with water, the organic solvent is evaporated to obtain a crude product of the compound hydrazine, and the crude product. Further, it can be purified by a recrystallization operation or the like. [Examples] Hereinafter, the present invention will be specifically described with reference to the examples, but the invention should not be construed as being limited to the examples. Reference Examples 2 and 2 show synthesis examples of phenylephrine hydrochloride and 2-di- 3',4'-dichlorophenylpropylidene steel, respectively. [Reference Example 1] (Synthesis of Benyl Ethyl Hydrochloride) In a solution consisting of 〇〇α6 mol)phenylacetonitrile and S5 = alcohol in 5:4 = i day and iT.22 Ear) gasification of hydrogen gas. When the reaction solution is allowed to stand for acid acid, the acid salt is crushed and added to the ice-cooled bamboo to reduce the amount of the solution. Then, the mixture was chilled under ice cooling for 2 hours at 098,129,659, 201010982, and was allowed to stand at room temperature (iv) overnight. After filtering and removing the white solidity (IV), the phenylethylamine hydrochloride was obtained as a gray-yellow thicker under the pressure of the domain under the pressure of 172·5 g (1·011 mol [yield 1〇〇5%]). Thick syrup form. [Reference Example 2] (Synthesis of 2-bromo-3,4'-dioxapropiophenone) In a solution consisting of 45.8 g (0.226 mol) of 3,4,-diacetophenone* 46 g of methanol From 62t to 65. (: 36 g ❹ (0.2253 mol) was added dropwise over 50 minutes. After the reaction solution was cooled, it was dissolved in 75 g of toluene and 91 g of water. The benzene layer was washed with water and dehydrated with magnesium sulfate. Thereafter, the solvent was evaporated under reduced pressure to give 64.3 g (yield: 0.228 m) yield of </ </ RTI> </ RTI> bromo-3, br. (Synthesis of 2-benzyl-4-(3,4-diphenyl)-5-mercaptoimidazole) from 28.7 g (〇.丨68 mol) phenylacetamidine hydrochloride, 59 g (Μη莫❹ ear) a suspension of potassium carbonate' and 210 ml of N,N-dimethylguanamine at 5 〇. (: After stirring for 30 minutes, at the same temperature 48.8 g (0.173 mol) 2- Indif-3,4,-dichloropropanoid was added to several portions, followed by stirring at the same temperature for 4 hours. Then, after the reaction suspension was cooled, it was dissolved in 800 ml of water and 3 ml of gas. After the chloroform layer was washed twice with water, the chloroform was evaporated under reduced pressure, and the crystals were precipitated by adding 150 ml of toluene to the obtained thick syrup-like concentrated product, and crystals were precipitated. The precipitated crystals were collected by filtration, and Washed with benzene benzene 09812 9659 12 201010982 After drying, a cheese-colored powder was obtained by drying. The powder was recrystallized from acetonitrile to obtain 18.8 g (0.059 mol, yield 35.3%) of milky white powder crystals. The melting point of the obtained crystal, the Rf value of the thin layer chromatography and The 1H-NMR data and mass spectrometry data are as follows.
• mp. 158-161 °C • TLC(二氧化矽凝膠,丙酮):Rf = 0·70 ^H-NMR (CDC13) δ: 2.28 (s, 3Η> , 3.94 (s, 2Η) , 7.12-7.66 (ία, 7Η). ® -MS m/z (%) : 316 100)/ 301 (3), 281 (3) ^ 239 (4), 198 (2), 171 (4ϊ, 144 (3>, 122 (9>, 103 (6》,91 77 i4J. 基於此等光譜資料,所得化合物識別為下式表示之2-苄 基-4-(3,4-二氣苯基)-5-甲基咪唑。• mp. 158-161 °C • TLC (cerium oxide gel, acetone): Rf = 0·70 ^H-NMR (CDC13) δ: 2.28 (s, 3Η>, 3.94 (s, 2Η), 7.12- 7.66 (ία, 7Η). ® -MS m/z (%) : 316 100)/ 301 (3), 281 (3) ^ 239 (4), 198 (2), 171 (4ϊ, 144 (3>, 122 (9>, 103 (6), 91 77 i4J. Based on these spectral data, the obtained compound was identified as 2-benzyl-4-(3,4-diphenyl)-5-methyl represented by the following formula Imidazole.
[實施例2] (2-(2-氯苄基)-4-(3,4-二氣苯基)-5-曱基咪唑之合成) 首先,將參考例1之苯基乙腈改成(2-氯苯基)乙腈,根據 參考例1之方法合成(2-氯苯基)乙脒鹽酸鹽。 其次,將實施例1之苯基乙脎鹽酸鹽改成(2-氯苯基)乙胨 鹽酸鹽,經由根據實施例1之方法進行合成實驗獲得乳白色 098129659 13 201010982 粉狀晶體。 所得晶體之熔點、薄層層析術之Rf值及1h_nmR資料及 質譜資料如下。 • mp. 150-152〇c • TLC(二氧化矽凝膠,乙酸乙酯):Rf = 〇 58 {de-DMSO) δ: 2.3Θ (8, 3Η) , 4.09 (S/ 2») ^ 7.27-7.80 {m, 7Η> . •MS π»/Ζ (%>: 3S0 (η% 23>, 315 <100》,280 ⑶,171 ⑵, 137 ⑶,122 (i〇>, ι〇2 ⑷,的 <3). 基於此等光譜資料’所得化合物識別為下式表示之2-(2- 氣苄基)-4-(3,4-二氣苯基)-5-曱基咪唑。[Example 2] Synthesis of (2-(2-chlorobenzyl)-4-(3,4-diphenyl)-5-mercaptoimidazole) First, the phenylacetonitrile of Reference Example 1 was changed to ( 2-Chlorophenyl)acetonitrile, (2-chlorophenyl)acetamidine hydrochloride was synthesized according to the method of Reference Example 1. Next, the phenylacetamidine hydrochloride of Example 1 was changed to (2-chlorophenyl)acetamidine hydrochloride, and a synthetic experiment was carried out according to the method of Example 1 to obtain a milky white 098129659 13 201010982 powdery crystal. The melting point of the obtained crystal, the Rf value of the thin layer chromatography, and the 1 h_nmR data and mass spectrum data are as follows. • mp. 150-152〇c • TLC (cerium oxide gel, ethyl acetate): Rf = 〇58 {de-DMSO) δ: 2.3Θ (8, 3Η) , 4.09 (S/ 2») ^ 7.27 -7.80 {m, 7Η> . • MS π»/Ζ (%>: 3S0 (η% 23>, 315 <100), 280 (3), 171 (2), 137 (3), 122 (i〇>, ι〇 2 (4), <3). Based on these spectral data, the obtained compound is identified as 2-(2-gasbenzyl)-4-(3,4-diphenyl)-5-fluorenyl represented by the following formula Imidazole.
[實施例3] (2-(4-氯苄基)-4-(3,4-二氯苯基)-5-曱基咪唑之合成) 首先,將參考例1之苯基乙腈改成(4-氯苯基)乙腈,根據 參考例1之方法合成(4_氣苯基)乙脒鹽酸鹽。 其次,將實施例1之苯基乙脒鹽酸鹽改成(4_氯苯基)乙脒 鹽酸鹽,經由根據實施例1之方法進行合成實驗獲得黃白色 粉狀晶體。 098129659 14 201010982 所得晶體之熔點、薄層層析術之Rf值及1H-NMR資料及 質譜資料如下。[Example 3] Synthesis of (2-(4-chlorobenzyl)-4-(3,4-dichlorophenyl)-5-mercaptoimidazole) First, the phenylacetonitrile of Reference Example 1 was changed ( 4-chlorophenyl)acetonitrile was synthesized according to the method of Reference Example 1 (4-phenylphenyl)acetamidine hydrochloride. Next, the phenylacetamidine hydrochloride of Example 1 was changed to (4-chlorophenyl)acetamidine hydrochloride, and a yellow-white powdery crystal was obtained by conducting a synthesis experiment according to the method of Example 1. 098129659 14 201010982 The melting point of the obtained crystal, the Rf value of the thin layer chromatography, and the 1H-NMR data and mass spectrometry data are as follows.
• mp. 180-18TC • TLC(二氧化矽凝膠,丙酮):Rf=0.72 ’H-NMR <d«HDMSO> δ: 2.36 <s, 3H), 3·96 (sr 2H>, 7.29-7.80 (m, 7H). •MS m/z (It) : 350 (M% 100) , 33S ⑴,315 (14J , 279 ⑶, 190 (3), 175 <4>, 164 (4》,137 (7>, 125 <1〇>, 122 (15>, 102 (8) , 89 (4) , 75 <3). ® 基於此等光譜資料,所得化合物識別為下式表示之2-(4-氯苄基)-4-(3,4-二氣苯基)-5-曱基咪唑。• mp. 180-18TC • TLC (cerium oxide gel, acetone): Rf=0.72 'H-NMR <d«HDMSO> δ: 2.36 <s, 3H), 3·96 (sr 2H>, 7.29 -7.80 (m, 7H). • MS m/z (It) : 350 (M% 100) , 33S (1), 315 (14J, 279 (3), 190 (3), 175 <4>, 164 (4), 137 (7>, 125 <1〇>, 122 (15>, 102 (8), 89 (4), 75 < 3). ® Based on these spectral data, the obtained compound is identified as 2 -(4-Chlorobenzyl)-4-(3,4-diphenyl)-5-mercaptoimidazole.
(2-(2,4-二氣苄基)-4-(3,4-二氯苯基)-5-曱基咪唑之合成) 首先,將參考例1之苯基乙腈改成(2,4-二氯苯基)乙腈, 根據參考例1之方法合成(2,4-二氯苯基)乙脒鹽酸鹽。 其次,將實施例1之苯基乙脒鹽酸鹽改成(2,4·二氯苯基) 乙胨鹽酸鹽,經由根據實施例1之方法進行合成實驗獲得白 色粉狀晶體。 098129659 15 201010982 所得晶體之炫點、薄層層析術之Rf值及1H_NMR資料及 質譜資料如。 • mp. 117~h90q • TLC(一氣化石夕凝膠,丙酮):Rf = 0.74(Synthesis of 2-(2,4-dioxabenzyl)-4-(3,4-dichlorophenyl)-5-mercaptoimidazole) First, the phenylacetonitrile of Reference Example 1 was changed to (2, 4-Dichlorophenyl)acetonitrile, (2,4-dichlorophenyl)acetamidine hydrochloride was synthesized according to the method of Reference Example 1. Next, the phenylacetamidine hydrochloride of Example 1 was changed to (2,4·dichlorophenyl)acetamidine hydrochloride, and a white powdery crystal was obtained by conducting a synthesis experiment according to the method of Example 1. 098129659 15 201010982 The Rf value of the obtained crystal, the Rf value of the thin layer chromatography and the 1H_NMR data and mass spectrometry data. • mp. 117~h90q • TLC (one gasification gel, acetone): Rf = 0.74
(m, 7HJ. MS m/z (%) : 386 (M+2/ l〇〇), 384 , 31), 349 (100), 299 (3)# 279 (3)f 1^3 (4), 171 (7), 159 (9>, 139 (i〇), 121 (6), l〇2 (S)· 基於此等光譜資料,所得化合物識別為下式表示之2-(2,4- ❿ 二氯苄基)_4-(3,4-二氯苯基)-5-曱基咪唑。(m, 7HJ. MS m/z (%): 386 (M+2/ l〇〇), 384, 31), 349 (100), 299 (3)# 279 (3)f 1^3 (4) , 171 (7), 159 (9>, 139 (i〇), 121 (6), l〇2 (S)· Based on these spectral data, the obtained compound is identified as 2-(2,4- represented by the following formula ❿ Dichlorobenzyl) 4-(3,4-dichlorophenyl)-5-mercaptoimidazole.
[實施例5] (2-(3,4-二氯苄基)-4-(3,4-二氯苯基)_5-甲基咪唑之合成) 首先,將參考例1之苯基乙腈改成(3,4-二氯苯基)乙腈, 根據參考例1之方法合成(3,4-二氣笨基)乙脒鹽酸鹽。 其次,將實施例1之苯基乙脒鹽酸鹽改成(3,4-二氯苯基) 乙脒鹽酸鹽’經由根據實施例1之方法進行合成實驗獲得乳 白色粉狀晶體° 098129659 16 201010982 所得晶體之熔點、薄層層析術之Rf值及1H-NMR資料及 質譜資料如下。[Example 5] Synthesis of (2-(3,4-dichlorobenzyl)-4-(3,4-dichlorophenyl)-5-methylimidazole) First, the phenylacetonitrile of Reference Example 1 was changed. To (3,4-dichlorophenyl)acetonitrile, (3,4-dioxaphenyl)acetamidine hydrochloride was synthesized according to the method of Reference Example 1. Next, the phenylacetamidine hydrochloride of Example 1 was changed to (3,4-dichlorophenyl)acetamidine hydrochloride. The synthesis experiment was carried out according to the method of Example 1 to obtain milky white powder crystals. 098129659 16 201010982 The melting point of the obtained crystal, the Rf value of the thin layer chromatography and the 1H-NMR data and mass spectrometry data are as follows.
• mp. 194-195〇C • TLC(二氧化矽凝膠,丙酮):Rf = 0.67 ^H-NMR (de-DMSO) δ: 2.33 (s, 3Η) , 3.96 <s, 2Η) , 7.25-7.77 (m, 6Η). •MS m/z (%J ; 386 (M+2, 100) , 384 {it, 78) , 371 ⑴,349 <7ϊ, 314 (9), 239 (7), 212 (3), 198 (3), 171 (7), 159 (9), L39 (10> , 122 {1), 102 <4) , 89 (2». 基於此等光譜資料,所得化合物識別為下式表示之2-(3,4-二氯苄基)-4-(3,4-二氣苯基)-5-曱基咪唑。• mp. 194-195〇C • TLC (cerium oxide gel, acetone): Rf = 0.67 ^H-NMR (de-DMSO) δ: 2.33 (s, 3Η), 3.96 <s, 2Η), 7.25 -7.77 (m, 6Η). • MS m/z (%J; 386 (M+2, 100), 384 {it, 78), 371 (1), 349 <7ϊ, 314 (9), 239 (7) , 212 (3), 198 (3), 171 (7), 159 (9), L39 (10>, 122 {1), 102 <4), 89 (2». Based on these spectral data, the obtained compound It is identified as 2-(3,4-dichlorobenzyl)-4-(3,4-diphenyl)-5-mercaptoimidazole represented by the following formula.
[實施例6] (2-(4-溴¥基)-4-(3,4-二氣苯基)-5-曱基咪唑之合成) 首先,將參考例1之苯基乙腈改成(4-溴苯基)乙腈,根據 參考例1之方法合成(4-溴苯基)乙脒鹽酸鹽。 其次,將實施例1之苯基乙胨鹽酸鹽改成(4-溴苯基)乙脒 鹽酸鹽,經由根據實施例1之方法進行合成實驗獲得白色粉 狀晶體。 098129659 17 201010982 所得晶體之熔點、薄層層析術之Rf值及1H-NMR資料及 質譜資料如下。[Example 6] Synthesis of (2-(4-bromo-based)-4-(3,4-diphenyl)-5-mercaptoimidazole) First, the phenylacetonitrile of Reference Example 1 was changed ( 4-(Bromophenyl)acetonitrile, (4-bromophenyl)acetamidine hydrochloride was synthesized according to the method of Reference Example 1. Next, the phenylacetamidine hydrochloride of Example 1 was changed to (4-bromophenyl)acetamidine hydrochloride, and a white powdery crystal was obtained by conducting a synthesis experiment according to the method of Example 1. 098129659 17 201010982 The melting point of the obtained crystal, the Rf value of the thin layer chromatography, and the 1H-NMR data and mass spectrometry data are as follows.
• mp. 207-208〇C • TLC(二氧化矽凝膠,己烷:乙酸乙酯=1 : i) : Rf = 〇幻 • H-NMR (de-DMSO) δ: 2.07 <s, 3Η), 3.92 (s, 2Η), 7.21-7.7¾ (m, 7ΗΪ . MS οι/ζ (%>: 398 46>, 396 (Μ+2, 100), 394 Μ, 62}, 361 (2), 315 (11), 299 (3), 279 (3> , 239 (4), 198 (5), 183 ⑶,171 U0> , 140 (8) , 122 <20} , 102 (14> , 89 ⑹, 75⑶. 基於此等光譜資料’所得化合物識別為下式表示之 溴苄基)-4-(3,4-二氣苯基)-5-甲基咪唑。• mp. 207-208〇C • TLC (cerium oxide gel, hexane: ethyl acetate = 1 : i) : Rf = 〇 • • H-NMR (de-DMSO) δ: 2.07 <s, 3Η ), 3.92 (s, 2Η), 7.21-7.73⁄4 (m, 7ΗΪ . MS οι/ζ (%>: 398 46>, 396 (Μ+2, 100), 394 Μ, 62}, 361 (2) , 315 (11), 299 (3), 279 (3), 239 (4), 198 (5), 183 (3), 171 U0> , 140 (8), 122 <20} , 102 (14), 89 (6), 75(3). Based on these spectral data, 'the obtained compound is identified as bromobenzyl)-4-(3,4-diphenyl)-5-methylimidazole represented by the following formula.
[實施例7] 製備含有實施例!至實施例6合成之各別味峻化合物,以 及此等化合物之外含有2_苯基料作為有效成分之表面處 理液。使各處理液接觸銅而於銅表面上形成化學薄膜,測= 熔融軟焊料對銅之賴時間,藉此測定咪妨化物作用於其 上之該銅表面之抗氧化效能。於此種情;兄下,狀濕潤時間 098129659 201010982 愈短’則咪唑化合物之抗氧化效能愈佳。 評估測試細節如下。 (1) 表面處理液之製備: 咪唑化合物、酸、金屬鹽及鹵素化合物溶解於經離子交換 . 水而達成表1所述組成後,使用氨水調整PH來製備表面處 理液。 (2) 表面處理方法: ❹ 材料為金屬銅之試驗件(5毫米X 50毫米x 〇.3毫米尺寸之 銅板)[去爿曰及然後接受軟钮刻。武驗件浸泡於表面處理液 於預定溫度歷經預定時間來於銅表面上形成化學薄膜後,以 水洗滌試驗件及乾燥。 (3) 濕潤時間之測定: 接受表面處理之試驗件浸沒於後助焊劑[商品名 「JS-64MSS」’ Koki Co·,Ltd.製造]’藉軟焊料濕潤測試器 ❹ (SAT-2000,Rhesca Corporation製造)測量軟焊料濕潤時間 (秒)。使用之軟焊料為錫鉛共熔軟焊料(商品名:H63A,Senju Metal Industry Co.,Ltd.製造),及測量條件如下:軟焊料溫 度240°C,浸沒深度2毫米,浸沒速度16毫米/秒。 就此方面而言,該試驗件所測量其軟焊料濕潤時間為(A) 表面處理後即刻;(B)於40°C溫度及90%4目對濕度(rh)之濕 度之恆溫恆濕室内靜置96小時後;及(C)於20(TC進一步加 熱10分鐘後。 098129659 19 201010982 所得測試結果係如表1所示。 098129659 20 201010982 ° 試驗編號 卜 Ο Τ-Η ο I 0.80 I CD C=5 LO Ο Ο* C=5 ΟΟ g § ιΉ <=> oa cd 〇 1—^ CO L〇 oa c=> ο r—Η s <35 <=) CO § 0.29 CD 0.72 m 0.20 C3 isi LO CNI <3> <〇 ◦ ^Η LO 〇 <=> CO CO § , < 〇3 c=> LO CO <〇 S C3 寸 0.20 S o 0.10 cz> τ-Η 0.04 C<i CO § 0.28 οο CO CD CO LO CD CO LO CO d LO 1—< o LO οο CD c6 C3 CO 1_·< ΟΟ Οί <ζ> CO 却 c=> ΟΟ <=i LO <N1 Ο LO <N1 CD o <=> LO CO S r < CO 〇· CD o* 0.25 LO 〇> <=> 〇 C£5 OQ § LO CO C> oa oo CD * 駿 1 -£ φ! •Ifttil ηβη {[»•1 sv 喊 V0 'Sw/ Ψ S- Λ Ί CO Ϋ 讲· Q ψ S- 人 Ί CO Λ 辦 V& X 雄< Ψ &- Λ t4 滅 Ί Λ CO Λ Λ 械 Λ X IK Ψ 砩 &- Λ t-4 Ί Λ CO Λ Ψ- 滅 Ί Λ 〇J IK Ψ 命 s- 丄 Λ Ί Λ CO 寸 人 Ί Λ CO X s 鸯 IK 'w/ Ψ δ ιό Λ 械 Ί Λ CO Λ Λ Λ 2-苯基咪唑 甲酸 乙酸 t乳酸 乙醯丙酸 鲴 乙酸銅 氣化銅 溴化銅 0 ;〇 氣化銨 溴化銨 % Jj 蛾化敍 Ϊ 丨破化銅 D=! a fhll w 喊 iD /—N P W1.1 W 喊 /—N 為 s« % r~N 為 E 赍 W 实 敢 孩 £ 格·· w t 七 CO σ> Μ 泰 tX3 〇ά g 03 P m 墩 φ <3> 严·Η 漩 Ρ ο 衾 七 CO CJi Μ § g 05 Ρ ψ ψ Μ ιγ*7 6S96-860[Example 7] Preparation contains examples! Each of the sulphur compounds synthesized in Example 6 and a surface treatment liquid containing a 2-phenylate as an active ingredient in addition to these compounds. Each of the treatment liquids was brought into contact with copper to form a chemical film on the surface of the copper, and the oxidation time of the molten solder to the copper was measured, thereby measuring the oxidation resistance of the copper surface on which the mimetic compound acts. In this case; under the brother, the wet time 098129659 201010982 is shorter, the better the antioxidant effect of the imidazole compound. The evaluation test details are as follows. (1) Preparation of surface treatment liquid: The imidazole compound, the acid, the metal salt, and the halogen compound are dissolved in ion-exchanged water to obtain the composition described in Table 1, and the surface treatment liquid is prepared by adjusting the pH with ammonia water. (2) Surface treatment method: ❹ The material is a test piece of metallic copper (5 mm X 50 mm x 〇.3 mm size copper plate) [to remove and then accept soft button engraving. The test piece is immersed in the surface treatment liquid. After forming a chemical film on the copper surface at a predetermined temperature for a predetermined time, the test piece is washed with water and dried. (3) Measurement of the wet time: The test piece subjected to the surface treatment was immersed in the post flux [trade name "JS-64MSS"' manufactured by Koki Co., Ltd.] 'By soft solder wet tester ❹ (SAT-2000, Rhesca) Manufactured by Corporation) measures the soft solder wet time (seconds). The soft solder used was tin-lead eutectic soft solder (trade name: H63A, manufactured by Senju Metal Industry Co., Ltd.), and the measurement conditions were as follows: soft solder temperature 240 ° C, immersion depth 2 mm, immersion speed 16 mm / second. In this respect, the soft solder wet time measured by the test piece is (A) immediately after surface treatment; (B) constant temperature and humidity indoor at 40 ° C temperature and humidity of 90% 4 mesh to humidity (rh) After 96 hours; and (C) at 20 (TC further heated for 10 minutes. 098129659 19 201010982 The test results are shown in Table 1. 098129659 20 201010982 ° Test No. Ο Τ-Η ο I 0.80 I CD C= 5 LO Ο Ο* C=5 ΟΟ g § ιΉ <=> oa cd 〇1—^ CO L〇oa c=> ο r—Η s <35 <=) CO § 0.29 CD 0.72 m 0.20 C3 isi LO CNI <3><〇◦ ^Η LO 〇<=> CO CO § , < 〇3 c=> LO CO <〇S C3 inch 0.20 S o 0.10 cz> τ-Η 0.04 C<i CO § 0.28 οο CO CD CO LO CD CO LO CO d LO 1—< o LO οο CD c6 C3 CO 1_·< ΟΟ Οί <ζ> CO but c=> ΟΟ <=i LO <N1 Ο LO <N1 CD o <=> LO CO S r < CO 〇· CD o* 0.25 LO 〇><=> 〇C£5 OQ § LO CO C> oa oo CD * 骏 1 - £ φ! • Ifttil ηβη {[»•1 sv shout V0 'Sw/ Ψ S- Λ Ί CO Ϋ Talk · Q ψ S- 人Ί CO Λ V V& X 雄< Ψ &- Λ t4 Ί Λ Λ CO Λ Λ Λ X IK Ψ 砩 &- Λ t-4 Ί Λ CO Λ Ψ - Ί Ί 〇 J IK Ψ s 丄Λ 丄Λ Ί Λ CO 寸 Ί Λ CO X s 鸯 IK 'w/ Ψ δ ιό Λ Ί Λ Λ CO Λ Λ Λ 2-Phenyl imidazolium formic acid t-lactic acid Copper propionate copper acetate vaporized copper bromide 0; bismuth vaporized ammonium bromide % Jj moth Ϊ Ϊ 丨 铜 D D=! a fhll w shout iD / - NP W1.1 W shout / - N is s« % r~N is E 赍W 实 孩 格 格 · · wt seven CO σ> Μ Thai tX3 〇ά g 03 P m pier φ <3> 严·Η Ρ Ρ 衾 衾7 CO CJi Μ § g 05 Ρ ψ ψ Μ ιγ*7 6S96-860
V 201010982 根據表1所不測試結果,由於含有本發明之2_节基_4_(3,4_ -氣苯基)5甲基咪嗤化合物作為有效成分之表面處理液可 於銅表面上形成防水性及耐熱性優異之化學薄膜,故可用於 銅表面之抗氧化。 (工業應用) 根據本發明,提供2_节基冰(认工氯苯基)_5甲基口米嗤化 合物其可用作為金屬特別為銅(包括銅合金)表面之抗氧化 劑及環氧糾日之固化劑或固化加速劑,也可用於醫藥化學品 及農用化學品領域作為中間原料。 雖然已經詳細且參考其特定具體例說明本發明,但熟諳技 藝人士顯然易知可未悖離本發明之範圍於其中做出多項變 化及修改。 本案係基於日本專利申請案第2〇〇8_225632號,申請曰 2008年9月3日、日本專利申請案第2〇〇9·13〇〇22號,申 請曰2009年5月29日、日本專利申請案第2009-140655號, 申請日2009年6月12日,各案全文内容係以引用方式併入 此處。 098129659 22V 201010982 According to the test results not shown in Table 1, the surface treatment liquid containing the 2_ _ _ 4_(3,4_-gas phenyl) 5 methyl quinone compound of the present invention as an active ingredient can be formed on the copper surface to be waterproof. It is a chemical film with excellent heat resistance and heat resistance, so it can be used for oxidation resistance on copper surfaces. (Industrial Applicability) According to the present invention, there is provided a 2_based ice-based (chlorinated phenyl)-5 methyl methane bismuth compound which can be used as an antioxidant for metals, particularly copper (including copper alloy) surfaces, and epoxy A curing agent or curing accelerator can also be used as an intermediate material in the fields of pharmaceutical chemicals and agrochemicals. Although the present invention has been described in detail with reference to the specific embodiments thereof, it is obvious to those skilled in the art that various changes and modifications can be made therein without departing from the scope of the invention. This application is based on Japanese Patent Application No. 2_225632, filed on September 3, 2008, Japanese Patent Application No. 2〇〇9·13〇〇22, applied for May 29, 2009, Japanese patent Application No. 2009-140655, Application Date June 12, 2009, the full text of each case is hereby incorporated by reference. 098129659 22
Claims (1)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008225632 | 2008-09-03 | ||
JP2009130022 | 2009-05-29 | ||
JP2009140655A JP5484795B2 (en) | 2008-09-03 | 2009-06-12 | 2-Benzyl-4- (3,4-dichlorophenyl) -5-methylimidazole compound |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201010982A true TW201010982A (en) | 2010-03-16 |
TWI507395B TWI507395B (en) | 2015-11-11 |
Family
ID=41323603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098129659A TWI507395B (en) | 2008-09-03 | 2009-09-03 | 2-benzyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound and derivatives thereof |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5484795B2 (en) |
KR (1) | KR101602978B1 (en) |
CN (1) | CN102144046B (en) |
MY (1) | MY158638A (en) |
TW (1) | TWI507395B (en) |
WO (1) | WO2010027077A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5260208B2 (en) * | 2008-09-22 | 2013-08-14 | 四国化成工業株式会社 | 2- (2,4-Dichlorobenzyl) -4- (halogenated phenyl) imidazole compound |
JP5260367B2 (en) * | 2008-09-26 | 2013-08-14 | 四国化成工業株式会社 | 2- (Chlorobenzyl) -4-phenylimidazole compound |
JP5615227B2 (en) * | 2011-05-23 | 2014-10-29 | 四国化成工業株式会社 | Surface treatment agent for copper or copper alloy and use thereof |
JP5615233B2 (en) * | 2011-06-20 | 2014-10-29 | 四国化成工業株式会社 | Surface treatment agent for copper or copper alloy and use thereof |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3277025B2 (en) * | 1993-05-10 | 2002-04-22 | 四国化成工業株式会社 | Copper and copper alloy surface treatment agent |
TW270944B (en) * | 1993-05-10 | 1996-02-21 | Shikoku Kakoki Co Ltd | |
JPH06329635A (en) * | 1993-05-24 | 1994-11-29 | Shikoku Chem Corp | New imidazole compound |
JP3311858B2 (en) * | 1994-03-08 | 2002-08-05 | 四国化成工業株式会社 | Copper and copper alloy surface treatment agent |
AR024077A1 (en) * | 1999-05-25 | 2002-09-04 | Smithkline Beecham Corp | ANTIBACTERIAL COMPOUNDS |
ATE474944T1 (en) * | 2003-03-19 | 2010-08-15 | Shikoku Chem | SOLDERING PROCESS USING AN IMIDAZOLE COMPOUND |
-
2009
- 2009-06-12 JP JP2009140655A patent/JP5484795B2/en active Active
- 2009-09-02 WO PCT/JP2009/065616 patent/WO2010027077A1/en active Application Filing
- 2009-09-02 KR KR1020117005121A patent/KR101602978B1/en active IP Right Grant
- 2009-09-02 CN CN200980134515.8A patent/CN102144046B/en active Active
- 2009-09-02 MY MYPI2011000846A patent/MY158638A/en unknown
- 2009-09-03 TW TW098129659A patent/TWI507395B/en active
Also Published As
Publication number | Publication date |
---|---|
MY158638A (en) | 2016-10-31 |
KR20110050663A (en) | 2011-05-16 |
JP5484795B2 (en) | 2014-05-07 |
KR101602978B1 (en) | 2016-03-11 |
CN102144046A (en) | 2011-08-03 |
JP2011006323A (en) | 2011-01-13 |
WO2010027077A1 (en) | 2010-03-11 |
CN102144046B (en) | 2014-02-26 |
TWI507395B (en) | 2015-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES2425972T3 (en) | Procedure for the regioselective synthesis of 1-alkyl-3-haloalkyl-pyrazol-4-carboxylic acid derivatives | |
TW201010982A (en) | 2-benzyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound | |
JP5858884B2 (en) | Imidazole compounds having a thiophene ring | |
TWI341837B (en) | ||
BR112015004097B1 (en) | PROCEDURE FOR THE DECARBOXILATION OF 3,5-BIS (HALOalkyl) -PIRAZOL-4-CARBOXYLIC ACID DERIVATIVES | |
TW201336810A (en) | CF3O-containing enaminoketones and their utilization for the preparation of CF3O-containing pyrazoles | |
JP5368241B2 (en) | 2-Benzyl-4- (2,4-dichlorophenyl) -5-methylimidazole compound | |
EP1824823A4 (en) | Process for the manufacture of 3-hydroxy-n-alkyl-1-cycloalkyl-6-alkyl-4-oxo-1,4-dihydropyridine-2-carboxamide and its related analogues | |
JP5368244B2 (en) | 2- (2,4-dichlorobenzyl) -4-aryl-5-methylimidazole compound | |
JP5260208B2 (en) | 2- (2,4-Dichlorobenzyl) -4- (halogenated phenyl) imidazole compound | |
MX2015001756A (en) | Method for the preparation of perfluoroalkyl containing pyrazoles carboxylates. | |
JP5260357B2 (en) | 2- (2,4-dichlorobenzyl) -4-phenyl-5-alkylimidazole compound | |
JP2014040395A (en) | 2-(methoxyphenyl)imidazole compound and antioxidant | |
JP5398076B2 (en) | 2- (Bromobenzyl) -4- (bromophenyl) -5-methylimidazole compound | |
JP5398075B2 (en) | 4- (dichlorophenyl) -2- (4-fluorobenzyl) -5-methylimidazole compound | |
JP5368263B2 (en) | 4- (2,4-dichlorophenyl) -5-methylimidazole compound | |
JP2010077071A (en) | 2-alkyl-4-(3,4-dichlorophenyl)-5-methylimidazole compound | |
PL202813B1 (en) | Oxazin(thi)one compounds used as fungicides | |
JP5204028B2 (en) | 2-Benzyl-4- (4-alkylphenyl) imidazole compound | |
JP5368271B2 (en) | 4- (4-Biphenylyl) -2- (2,4-dichlorobenzyl) imidazole and surface treatment solution | |
JP2004262863A (en) | Method for producing orthobenzidine compound | |
JP2010070479A (en) | 4-aryl-2-(1-naphthylmethyl)imidazole compound | |
JP4305747B2 (en) | 2-Phenyl-4- (dichlorophenyl) imidazole compound | |
JP2010070535A (en) | 2-benzyl-4,5-diphenylimidazole compound | |
JPS60243073A (en) | Preparation of optically active alcohol derivative |