TW201008952A - Silane based compound, method for preparing the same, and surface treating agent composition for copper foil including the silane based compound - Google Patents
Silane based compound, method for preparing the same, and surface treating agent composition for copper foil including the silane based compound Download PDFInfo
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- TW201008952A TW201008952A TW098124124A TW98124124A TW201008952A TW 201008952 A TW201008952 A TW 201008952A TW 098124124 A TW098124124 A TW 098124124A TW 98124124 A TW98124124 A TW 98124124A TW 201008952 A TW201008952 A TW 201008952A
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- Prior art keywords
- compound
- formula
- copper foil
- surface treatment
- copper
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 137
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 12
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 184
- 239000011889 copper foil Substances 0.000 title claims description 124
- 239000000203 mixture Substances 0.000 title claims description 123
- 238000000034 method Methods 0.000 title claims description 27
- 239000003795 chemical substances by application Substances 0.000 title claims description 16
- 239000001257 hydrogen Substances 0.000 claims abstract description 27
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 27
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 10
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 claims abstract 2
- 238000004381 surface treatment Methods 0.000 claims description 77
- -1 fluorenyl compound Chemical class 0.000 claims description 69
- 230000000052 comparative effect Effects 0.000 claims description 68
- 229910052802 copper Inorganic materials 0.000 claims description 61
- 239000010949 copper Substances 0.000 claims description 61
- 238000006243 chemical reaction Methods 0.000 claims description 51
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 40
- 239000002904 solvent Substances 0.000 claims description 32
- 229920001721 polyimide Polymers 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 230000015572 biosynthetic process Effects 0.000 claims description 25
- 238000003786 synthesis reaction Methods 0.000 claims description 25
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 23
- 239000011877 solvent mixture Substances 0.000 claims description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 22
- 239000010410 layer Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 19
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 19
- 238000002360 preparation method Methods 0.000 claims description 19
- 239000011259 mixed solution Substances 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 17
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 17
- 238000005259 measurement Methods 0.000 claims description 17
- 239000002966 varnish Substances 0.000 claims description 17
- 239000000178 monomer Substances 0.000 claims description 14
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 13
- 239000012756 surface treatment agent Substances 0.000 claims description 13
- 229940126214 compound 3 Drugs 0.000 claims description 12
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 claims description 12
- 238000011156 evaluation Methods 0.000 claims description 11
- 230000007062 hydrolysis Effects 0.000 claims description 11
- 238000006460 hydrolysis reaction Methods 0.000 claims description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 11
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 229940125904 compound 1 Drugs 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 10
- 229940014800 succinic anhydride Drugs 0.000 claims description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 9
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 8
- 150000004985 diamines Chemical class 0.000 claims description 8
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000012360 testing method Methods 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 229910000831 Steel Inorganic materials 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- 238000002845 discoloration Methods 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 239000010959 steel Substances 0.000 claims description 6
- 229920001646 UPILEX Polymers 0.000 claims description 5
- 239000011888 foil Substances 0.000 claims description 5
- IBIKHMZPHNKTHM-RDTXWAMCSA-N merck compound 25 Chemical compound C1C[C@@H](C(O)=O)[C@H](O)CN1C(C1=C(F)C=CC=C11)=NN1C(=O)C1=C(Cl)C=CC=C1C1CC1 IBIKHMZPHNKTHM-RDTXWAMCSA-N 0.000 claims description 5
- 230000000704 physical effect Effects 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 5
- 230000003746 surface roughness Effects 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000003086 colorant Substances 0.000 claims description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 4
- MCQOWYALZVKMAR-UHFFFAOYSA-N furo[3,4-b]pyridine-5,7-dione Chemical compound C1=CC=C2C(=O)OC(=O)C2=N1 MCQOWYALZVKMAR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000012044 organic layer Substances 0.000 claims description 4
- 238000007719 peel strength test Methods 0.000 claims description 4
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 claims description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 239000005864 Sulphur Substances 0.000 claims description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims description 3
- 229940093499 ethyl acetate Drugs 0.000 claims description 3
- 235000019439 ethyl acetate Nutrition 0.000 claims description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 3
- 229920005575 poly(amic acid) Polymers 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 claims description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 2
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 claims description 2
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 claims description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 2
- YDNKGFDKKRUKPY-JHOUSYSJSA-N C16 ceramide Natural products CCCCCCCCCCCCCCCC(=O)N[C@@H](CO)[C@H](O)C=CCCCCCCCCCCCCC YDNKGFDKKRUKPY-JHOUSYSJSA-N 0.000 claims description 2
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 claims description 2
- 239000003849 aromatic solvent Substances 0.000 claims description 2
- 229940106189 ceramide Drugs 0.000 claims description 2
- ZVEQCJWYRWKARO-UHFFFAOYSA-N ceramide Natural products CCCCCCCCCCCCCCC(O)C(=O)NC(CO)C(O)C=CCCC=C(C)CCCCCCCCC ZVEQCJWYRWKARO-UHFFFAOYSA-N 0.000 claims description 2
- 238000010835 comparative analysis Methods 0.000 claims description 2
- OUFLLVQXSGGKOV-UHFFFAOYSA-N copper ruthenium Chemical compound [Cu].[Ru].[Ru].[Ru] OUFLLVQXSGGKOV-UHFFFAOYSA-N 0.000 claims description 2
- 125000006612 decyloxy group Chemical group 0.000 claims description 2
- 238000010586 diagram Methods 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 125000002883 imidazolyl group Chemical group 0.000 claims description 2
- 125000005462 imide group Chemical group 0.000 claims description 2
- 150000002466 imines Chemical class 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- VVGIYYKRAMHVLU-UHFFFAOYSA-N newbouldiamide Natural products CCCCCCCCCCCCCCCCCCCC(O)C(O)C(O)C(CO)NC(=O)CCCCCCCCCCCCCCCCC VVGIYYKRAMHVLU-UHFFFAOYSA-N 0.000 claims description 2
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 2
- 201000008827 tuberculosis Diseases 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 5
- 108010002350 Interleukin-2 Proteins 0.000 claims 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 4
- 238000012937 correction Methods 0.000 claims 3
- 239000007921 spray Substances 0.000 claims 3
- KDHWOCLBMVSZPG-UHFFFAOYSA-N 3-imidazol-1-ylpropan-1-amine Chemical compound NCCCN1C=CN=C1 KDHWOCLBMVSZPG-UHFFFAOYSA-N 0.000 claims 2
- ABHSCNLDUBMZKC-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCC ABHSCNLDUBMZKC-UHFFFAOYSA-N 0.000 claims 2
- 210000003298 dental enamel Anatomy 0.000 claims 2
- 150000003949 imides Chemical class 0.000 claims 2
- QSJNAFJALFWFMT-UHFFFAOYSA-N meridine Chemical compound N1C=CC(=O)C2=C1C(=O)C1=NC=CC3=C(C=CC=C4)C4=NC2=C13 QSJNAFJALFWFMT-UHFFFAOYSA-N 0.000 claims 2
- 150000002923 oximes Chemical class 0.000 claims 2
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical compound OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 claims 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 claims 2
- XOMKZKJEJBZBJJ-UHFFFAOYSA-N 1,2-dichloro-3-phenylbenzene Chemical compound ClC1=CC=CC(C=2C=CC=CC=2)=C1Cl XOMKZKJEJBZBJJ-UHFFFAOYSA-N 0.000 claims 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 claims 1
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 claims 1
- YSUIQYOGTINQIN-UZFYAQMZSA-N 2-amino-9-[(1S,6R,8R,9S,10R,15R,17R,18R)-8-(6-aminopurin-9-yl)-9,18-difluoro-3,12-dihydroxy-3,12-bis(sulfanylidene)-2,4,7,11,13,16-hexaoxa-3lambda5,12lambda5-diphosphatricyclo[13.2.1.06,10]octadecan-17-yl]-1H-purin-6-one Chemical compound NC1=NC2=C(N=CN2[C@@H]2O[C@@H]3COP(S)(=O)O[C@@H]4[C@@H](COP(S)(=O)O[C@@H]2[C@@H]3F)O[C@H]([C@H]4F)N2C=NC3=C2N=CN=C3N)C(=O)N1 YSUIQYOGTINQIN-UZFYAQMZSA-N 0.000 claims 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 claims 1
- AVRJKFUFVBIFIB-UHFFFAOYSA-N 3-imidazol-1-ylpropan-1-amine Chemical compound NCCCN1C=CN=C1.NCCCN1C=CN=C1 AVRJKFUFVBIFIB-UHFFFAOYSA-N 0.000 claims 1
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- ZCRHCHOHWXDDGH-UHFFFAOYSA-N CCCCCCCCCCC(OC)(OC)OC Chemical compound CCCCCCCCCCC(OC)(OC)OC ZCRHCHOHWXDDGH-UHFFFAOYSA-N 0.000 claims 1
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
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- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims 1
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- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
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- 229930182490 saponin Natural products 0.000 description 2
- QQPGUSCXBDPHSR-UHFFFAOYSA-N 4,4,4-trimethoxybutan-1-amine Chemical compound COC(OC)(OC)CCCN QQPGUSCXBDPHSR-UHFFFAOYSA-N 0.000 description 1
- NTPNUCYXFRZQTP-UHFFFAOYSA-N C=1(C(=CC=CC=1)CCCCCCCCCCCCCC(=O)O)C1=CC=CC=C1 Chemical compound C=1(C(=CC=CC=1)CCCCCCCCCCCCCC(=O)O)C1=CC=CC=C1 NTPNUCYXFRZQTP-UHFFFAOYSA-N 0.000 description 1
- 101100328518 Caenorhabditis elegans cnt-1 gene Proteins 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 241000772413 Lutrogale perspicillata Species 0.000 description 1
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 1
- HCYMDXFBIFWJPO-UHFFFAOYSA-N NCCCC(C(OOC)(OOC)OOC)CCCCCCCC Chemical compound NCCCC(C(OOC)(OOC)OOC)CCCCCCCC HCYMDXFBIFWJPO-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001785 cerium compounds Chemical class 0.000 description 1
- GBAOZECSOKXKEL-UHFFFAOYSA-N copper yttrium Chemical compound [Cu].[Y] GBAOZECSOKXKEL-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000006166 lysate Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 150000004060 quinone imines Chemical class 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
Abstract
Description
201008952 六、發明說明: 【相關申請案】 本申請案主張優先權為2008年7月18曰在韓國智財 局申請的韓國專利申請號10-2008-0070080,其揭露内容在 此併入本文參考。 【發明所屬之技術領域】 本發明是有關於一種石夕烧基(silane_based)化合物及其 製備方法,以及包含此矽烷基化合物之銅箔用表面處理劑 組成物,特別是有關於一種新的矽烷基化合物及其製備方 法’以及包含此矽烷基化合物之銅箔用表面處理劑組成物。 【先前技術】 撓性覆銅箔層壓板(flexible copper clad laminate; FCCL)為印刷電路板(Printed circuit board ; PCB)之一種形 式,且其現今需求曰漸增加。FCCL為由二或三層形成^ 夕層薄膜,其中聚酿亞胺(P〇lyimjde)層壓在銅箔上。當印 刷在FCCL上之佈線的準確性增加,姓刻的準確性也同樣 增加’因此需要降低銅H之表面粗縫度。然而,當降低銅 箔之表面粗糙度時,銅箔與基板(例如,聚醯亞胺薄膜之 間的剝離強度(peel strength)會下降。在這點上,靈 剝離強度之手段。 用於PCB之铺通常使时絲合㈣崎之表面 處理劑以進行之,用以強化㈣與基板之__強度, 其揭露於日本專利申請案1990-026097。 然而,隨著使用在PCB中之銅箱之物理性質的要求 201008952 變嚴(tight),仍然需要具有改良之物理性質之表面處理薄 膜形成於上之用於PCB的銅箔。 【發明内容】 本發明提供一種新的矽烷基化合物(其於基板及銅箔 之間提供優良的剝離強度)及其製備方法,以及包含此矽烷 基化合物之銅箔用表面處理劑組成物。 根據本發明之一方面,提供由式1至式4表示的石夕炫 基化合物: <式1> ⑩201008952 VI. Description of the Invention: [Related Application] The priority of the present application is the Korean Patent Application No. 10-2008-0070080 filed on Jan. 18, 2008 in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference. . TECHNICAL FIELD OF THE INVENTION The present invention relates to a silane-based compound, a process for the preparation thereof, and a surface treatment composition for a copper foil comprising the above-described decyl compound, and more particularly to a novel decane. A base compound and a method for producing the same, and a surface treatment composition for a copper foil containing the above-described decyl group compound. [Prior Art] A flexible copper clad laminate (FCCL) is a form of a printed circuit board (PCB), and its demand is increasing today. The FCCL is formed of two or three layers of a film in which polyacrylonitrile (P〇lyimjde) is laminated on a copper foil. When the accuracy of the wiring printed on the FCCL is increased, the accuracy of the surname is also increased. Therefore, it is necessary to reduce the surface roughness of the copper H. However, when the surface roughness of the copper foil is lowered, the peel strength between the copper foil and the substrate (for example, the polyimide film is lowered). In this regard, the means of peeling strength is used. The shop is usually made of a surface treatment agent for the purpose of strengthening (4) and the strength of the substrate, which is disclosed in Japanese Patent Application No. 1990-026097. However, with the use of a copper box in the PCB The physical property requirement 201008952 is tight, and there is still a need for a copper foil for a PCB formed by a surface-treated film having improved physical properties. SUMMARY OF THE INVENTION The present invention provides a novel fluorenyl compound (which Providing excellent peel strength between the substrate and the copper foil, and a method for preparing the same, and a surface treatment composition for a copper foil containing the fluorenyl compound. According to an aspect of the invention, the stone represented by Formulas 1 to 4 is provided Xi Xuan base compound: <Formula 1> 10
<式2><Formula 2>
<式3><Formula 3>
〈式4> 6 201008952 D iy I D\)U.<Formula 4> 6 201008952 D iy I D\)U.
其中RrRs及R3可以各自獨立為(^至C3的烷基, 且R4及R5可以各自獨立為氫或(^至(:5的烷基。Wherein RrRs and R3 may each independently be an alkyl group of (^ to C3), and R4 and R5 may each independently be hydrogen or (^ to (: 5 alkyl).
根據本發明之另一方面,提供銅箔用表面處理劑組成 物,其包含選自由式1至式4表示的矽烷基化合物所組成According to another aspect of the present invention, there is provided a surface treating agent composition for copper foil comprising a selected from the group consisting of a decyl group compound represented by Formulas 1 to 4.
之族群的至少一化合物,以及溶劑。 <式1>At least one compound of the group, and a solvent. <Formula 1>
<式4> 201008952<Formula 4> 201008952
且可以 J从各自獨立為氫或(^至^的烷基。 根據本發明m面,提供選自 由式1至式4表示 的石夕炫基化合物馳成之族群之—化合物的製備方法。此 方法包含將由式5或式7表示的矽烷基化合物與選自由式 6表示的化合物、琥站酸酐(Sljecinic anhydride)、2,3-n比咬 二酸酐(2,3-pyridinedicarboxylie anhydride)及偏苯三酸酐 (1,2,4-benzenetricarboxylic anhydride)所組成之族群之一化 合物於-10 °C至1〇〇 °C的溫度反應: 〈式1> r/ <式2> 〇 h r/ <式.3> 201008952 j iy / jpiiFurther, J may be independently a hydrogen or an alkyl group of (^ to ^. According to the m-plane of the present invention, a method of preparing a compound selected from the group consisting of the compound represented by Formula 1 to Formula 4 is provided. The method comprises the hydrazine alkyl compound represented by Formula 5 or Formula 7 and a compound selected from the group consisting of Formula 6, Sljecinic anhydride, 2,3-pyridinedicarboxylie anhydride, and trimellitic anhydride ( The compound of one of the groups consisting of 1,2,4-benzenetricarboxylic anhydride is reacted at a temperature of -10 ° C to 1 ° C: <Formula 1> r / < Formula 2 > 〇hr / < Formula .3 >; 201008952 j iy / jpii
4 <式4>4 <Formula 4>
<式5> 。 7 卜/2 4<Formula 5>. 7 Bu/2 4
<式6><Formula 6>
r/ 其中,RpRz及R3可以各自獨立為匸!至C3的烷基, 201008952 J 17 ! jpil 且R_4及R5可以各自獨立為氫或(^至C5的烷基。 為讓本發明之上述特徵和優點能更明顯易懂,下文特 舉實施例,並配合所附圖式作詳細說明如下。 【實施方式】 · 以下’將根據本發明之實施例更詳細地描述矽烷基化 合物及及其製備方法,以及包含此矽烷基化合物之銅落用 表面處理劑纟且成物。 根據本實施例’矽烷基化合物可以由式1至式4表禾。 <式1>r/ Where RpRz and R3 can each be independent! Alkyl group to C3, 201008952 J 17 ! jpil and R_4 and R5 may each independently be hydrogen or an alkyl group of (C to C5). To make the above features and advantages of the present invention more apparent, the following specific examples, The present invention will be described in detail below with reference to the accompanying drawings. [Embodiment] The following description will be made in more detail based on an embodiment of the present invention, and a method for preparing a ruthenium alkyl compound and a copper drop surface treatment comprising the same. According to the present embodiment, the 'alkylene compound can be represented by the formula 1 to the formula 4. <Formula 1>
<式4><Formula 4>
10 20100895210 201008952
其中Ri、R2及R3可以各自獨立為Ci至c3的烧基, 且1^4及尺5可以各自獨立為氫或Cl至c5的烷基。 石夕烧基化合物在其一端具有梦氧炫基(siloxane group) 用以與銅箔形成共價鍵,在其另一端具有味唾基(imidazole group)和/或亞酿胺基(imide group),其中'"米σ坐基和/或亞酿 胺具有與聚醯亞胺薄膜相似的結構,因此可以提高與聚醯 亞胺薄膜的鍵結強度。所以,可以提高銅箔與聚醯亞胺薄 膜之間的鍵結強度。 根據本發明另一實施例,石夕炫基化合物中之&、反 及R3各自獨立為甲基或乙基,且R4及Rs可以為氫。2Wherein Ri, R2 and R3 may each independently be a C to C3 alkyl group, and 1^4 and 5 may each independently be hydrogen or a C to C5 alkyl group. The sulphur-based compound has a siloxane group at one end for forming a covalent bond with the copper foil and an imidazole group and/or an imide group at the other end. Among them, '" rice sigma and/or saponin have a structure similar to that of a polyimide film, and thus the bonding strength with the polyimide film can be improved. Therefore, the bonding strength between the copper foil and the polyimide film can be improved. According to another embodiment of the present invention, &, and R3 are each independently a methyl group or an ethyl group, and R4 and Rs may be hydrogen. 2
根據本發明另一實施例,銅箔用表面處理劑組成物可 以包含選自由式1至式4表示的矽烷基化合物所纟且成之於、 群的至少一化合物,以及溶劑。 、 <式1>According to another embodiment of the present invention, the surface treatment composition for copper foil may comprise at least one compound selected from the group consisting of the fluorenyl compounds represented by Formulas 1 to 4, and a solvent, and a solvent. , <Formula 1>
<式2> 11 201008952 〇 iy<Formula 2> 11 201008952 〇 iy
在上面的式1至式4中,R!、R2及R3可以各自獨立In Equations 1 to 4 above, R!, R2, and R3 may be independent of each other.
為ci至C3的烷基,且仏及r5可以各自獨立為氫或Ci 至C5的燒基。 在被包含於表面處理劑組成物中之矽烷基化合物 中’藉由與溶劑進行水解,统氧基(alk〇xy group)改變為經 基(hydroxy group)。矽烷基化合物藉由濃縮反應而彼此互 相連結,且經連結之矽烷基化合物藉由與形成在銅箱上之 經基的共價鍵以固定於銅箱。 表面處理敝絲除了魏基化合物 可 含本領域具有通常,者所㈣其絲面處_或:= 12 201008952 J 17 I jy/LL· 劑,且表面處理劑或防鏽劑沒有特定限制。 根據本發明另一實施例,矽烷基化合物之Ri、R2及 R_3可以各自獨立為甲基或乙基,且I及心可以為氣。 根據本發明另一實施例’被包含於銅箔用表面處理劑 組成物中之溶劑可以選自由水、甲醇、乙醇及其組合所組 成之族群之一。例如,溶劑可以是藉由以1:9之體積比率 混合水及酒精(甲醇或乙醇)而得到的水及酒精之混合物。 ❼ 石夕烧基化合物之數量的範圍可以為組成物的0.001至 20重量%,可以為組成物的〇·〇ι至1〇重量%、〇 〇5至5 重量%,例如,0,1至2重量%。當矽烷基化合物之數量為 0.001重量%或更低時’從表面處理劑得到的有機層可能無 法充份地覆蓋在銅箔上,因此可能無法提高剝離強度。當 =烷基化合物之數量為20重量。/。或更高時,從表面處理^ 得到的有機層的厚度增加,且可能覆蓋銅箔上的小節 (nodules),因此可能無法提高剥離強度。 銅箔包含經結核作用(n〇dulation)處理的銅箔,銅箔除 了純銅箔之外,更具有形成於其上的熱阻(heai_bl〇ckin幻 層及防鏽層,或銅箔具有合金表面。此外,銅箔包含任何 銅荡且可以對銅箱進行本領域具有通常知識者使用之一 塗覆製程。 表面處理劑組成物被限制在銅箔令使用;然而’也可 以在其他金屬中使用。因此,表面處理劑組成物可以在辞 或其他合金中使用。 表面處理劑組成物可以藉由在水、酒精例如甲醇‘或乙 13 201008952 jiy/jpu 醇_例如丙綱、酯例如乙酸乙酯(ethylacetate)、或芳香 基溶劑例如甲苯中稀釋〇 〇〇1至2〇重量%之選自由式】至 式4表示的石夕烧基化合物所組成的族群之至少一而製備 之。 可以在已塗覆表面處理劑組成物於上之銅箔上進一 步塗覆聚酿胺酸(Polyamie acid)或聚醯亞胺薄膜,因此可以 製備二層或三層之撓性覆銅箔層壓板(FCCL)。可以藉由塗 覆及硬化聚醯胺酸亮光漆(varnish)而得到聚醯亞胺薄膜。 聚醯胺酸可以包含至少一個二酐(dianhydride)單體及至少 ❹ 一個二胺(diamine)單體。二酐單體及二胺單體之元素 (elements)並沒有特別限制,且可以使用本領域具有通常知 識者使用的其他單體。至少一個二酐單體可以選自由苯均 四酸二野(pyromellitic dianhydride)及 聯苯四曱酸 , 一Sf (3,3 ,4,4 -biphenonetetrahydrocarboxylic dianhydride ; BTDA)所組成之族群,且至少一個二胺單體可以選自由 4,4'-二氨基二苯醚(4,4,_OXydianiline ; 〇DA)、對苯二胺 (para-phenylene diamine ; PDA)及矽氧烷二胺(siloxane ❿ diamine ; SD)所組成之族群。 聚醯胺酸亮光漆可以例如是pMDA/〇DA混合物、 BTDA/PDA 混合物、BTDA/PMDA/ODA/PDA 混合物或 PMDA/ODA-SD 混合物。 根據本發明另一實施例,由式1至式4表示的矽烷基 化合物所組成之族群之一化合物的製備方法包含將由式5 或式7表示的矽烷基化合物與選自由式6表示的合物 14 201008952 /^pu 琥轴酸酐(succinic anhydride)、2,3-吼 e定二酸酐 (2,3 -pyridinedicarboxylic anhydride)及偏苯三酸酐 (1,2,4-benzenetricarboxylie anhydride)所組成之族群之一化 合物於-10 °C至100 °C的溫度反應。It is a ci to C3 alkyl group, and hydrazine and r5 may each independently be hydrogen or a C to C5 alkyl group. In the decyl group compound contained in the surface treating agent composition, the alk〇xy group is changed to a hydroxy group by hydrolysis with a solvent. The fluorenyl compounds are bonded to each other by a concentration reaction, and the linked fluorenyl compound is fixed to the copper tank by a covalent bond with a radical formed on the copper tank. The surface-treated silk yarn may contain, in addition to the Wei-based compound, a general surface thereof, or a silk surface thereof, or a surface treatment agent or a rust inhibitor, which is not particularly limited. According to another embodiment of the present invention, Ri, R2 and R_3 of the mercaptoalkyl compound may each independently be a methyl group or an ethyl group, and I and the heart may be a gas. The solvent contained in the surface treatment composition for copper foil according to another embodiment of the present invention may be selected from one of the groups consisting of water, methanol, ethanol, and a combination thereof. For example, the solvent may be a mixture of water and alcohol obtained by mixing water and alcohol (methanol or ethanol) in a volume ratio of 1:9. The amount of the cerium compound may range from 0.001 to 20% by weight of the composition, may be from 〇·〇ι to 1% by weight of the composition, 〇〇5 to 5% by weight, for example, 0,1 to 2% by weight. When the amount of the decyl group compound is 0.001% by weight or less, the organic layer obtained from the surface treating agent may not sufficiently cover the copper foil, and thus the peel strength may not be improved. When the number of = alkyl compounds is 20% by weight. /. Or higher, the thickness of the organic layer obtained from the surface treatment is increased, and may cover nodules on the copper foil, so peeling strength may not be improved. The copper foil comprises a copper foil treated by tuberculosis, and the copper foil has a thermal resistance formed thereon (in addition to the pure copper foil) (heai_bl〇ckin phantom layer and rustproof layer, or copper foil has an alloy surface) In addition, the copper foil contains any copper coating and can be used in one of the coating processes used by those skilled in the art. The surface treatment composition is limited to copper foil use; however, it can also be used in other metals. Therefore, the surface treatment composition can be used in rhetoric or other alloys. The surface treatment composition can be used in water, alcohol such as methanol' or B13 201008952 jiy/jpu alcohols such as propyl, esters such as ethyl acetate (ethylacetate), or an aromatic solvent such as toluene diluted in an amount of 1 to 2% by weight, which is prepared from at least one of the group consisting of a group of compounds represented by the formula 4 to the formula 4. The surface treatment composition is coated with a polyamie acid or polyimide film on the copper foil, so that a two-layer or three-layer flexible copper-clad laminate (FCCL) can be prepared. The polyimine film can be obtained by coating and hardening a polyamic acid varnish. The polyaminic acid can comprise at least one dianhydride monomer and at least one diamine monomer. The elements of the dianhydride monomer and the diamine monomer are not particularly limited, and other monomers which are generally used by those skilled in the art may be used. At least one dianhydride monomer may be selected from pyromellitic acid (pyromellitic dianhydride) and biphenyltetradecanoic acid, a group consisting of Sf (3,3,4,4-biphenonetetrahydrocarboxylic dianhydride; BTDA), and at least one diamine monomer may be selected from 4,4'-diamino 2 a group of phenyl ether (4,4, _OXydianiline; 〇DA), para-phenylene diamine (PDA) and siloxane oxime diamine (SD). Polyglycolic varnish can be used. For example, a pMDA/〇DA mixture, a BTDA/PDA mixture, a BTDA/PMDA/ODA/PDA mixture, or a PMDA/ODA-SD mixture. According to another embodiment of the present invention, the oxime alkyl compound represented by Formulas 1 to 4 is composed. Preparation of a compound of one of the ethnic groups Containing a fluorenylalkyl compound represented by Formula 5 or Formula 7 and a compound selected from Formula 6 : 201008952 / pu succinic anhydride, 2,3- pyridine dianhydride (2,3- pyridine dicarboxylic anhydride) And a compound of one of the groups consisting of trimellitic anhydride (1,2,4-benzenetricarboxylie anhydride) is reacted at a temperature of from -10 °C to 100 °C.
<式1><Formula 1>
<式3><Formula 3>
<式4〉<Formula 4>
<式5> 15 201008952<Formula 5> 15 201008952
<式6><Formula 6>
r/ 其中’ Ri、R2及Rs可以各自獨立為C!至c3的院基, 且R4及R5可以各自獨立為氫或Ci至C5的烧基。 由式5表示的化合物與由式6表示的化合物在溫度約 95 C反應,因此可以得到由式1表示的石夕院基化合物。由 式7表示的化合物與琥珀酸酐在約-5。〇:至5 °C的溫度反 應’因此可以得到由式2表示的矽烷基化合物。由式7表 示的化合物與2,3-吡啶二酸酐在約-5。(:至5 °C的溫度反 應’因此可以得到由式3表示的矽烷基化合物。由式7表 示的化合物與偏笨三酸酐在溫度約-5。(:至5 °C的溫度反 應,因此可以得到由式4表示的碎烧基化合物。 以下’將參照下述實例更詳細描述本發明;然而,本 發明並不以此為限。使用Brucker DRX-SOOMHzJH-lSiMR.:: 16 201008952 4· / / 九 及Jasco 610 FT-IR來確認在下述實例中經合成之化合物的 結構。 (矽烧基化合物(1)之合成) 實例1 ··化合物1之合成 根據下面的反應機制1來合成由式1表示的化合物r / wherein ' Ri , R 2 and R s may each independently be a C + to c 3 院 , and R 4 and R 5 may each independently be hydrogen or a C to C 5 alkyl group. The compound represented by the formula 5 is reacted with the compound represented by the formula 6 at a temperature of about 95 C, whereby a compound of the invention can be obtained. The compound represented by Formula 7 and succinic anhydride are at about -5. 〇: Reaction at a temperature of 5 ° C. Thus, a fluorenyl compound represented by Formula 2 can be obtained. The compound represented by the formula 7 and the 2,3-pyridine dianhydride are at about -5. (: a reaction to a temperature of 5 ° C. Thus, a mercaptoalkyl compound represented by Formula 3 can be obtained. The compound represented by Formula 7 reacts with the trimellitic anhydride at a temperature of about -5 ° (: to 5 ° C, thus The calcined compound represented by Formula 4 can be obtained. The present invention will be described in more detail below with reference to the following examples; however, the invention is not limited thereto. Brucker DRX-SOOMHzJH-lSiMR.:: 16 201008952 4· / / Nine and Jasco 610 FT-IR to confirm the structure of the compound synthesized in the following examples. (Synthesis of the mercapto compound (1)) Example 1 · Synthesis of the compound 1 According to the following reaction mechanism 1 Compound represented by Formula 1
<反應機制1><Reaction mechanism 1>
ch3 P 0 1-(3-氨基丙基)咪唑 3-縮水甘油醚氧丙基三甲氧基矽烷 H0 ch3 'i 0 •wW嫌 C«3 s ' H ? API-矽烷 CH3 將 162.68 克的四氫0夫味(tetrahydrofiirane)、6.259 克 φ (0.05莫耳)的縮水甘油醚氧丙基三曱氧基矽烷 (glycidoxypropyltrimetihoxysilane)及 11.817 克(0.05 莫耳)的 1-(3-氨基丙基)p米吐(l-(3-aminopropyl)-imidazole)倒入 (charged)反應器中並反應6小時,在氮氣氛下維持反應器 之溫度為95 °C,且機械攪拌器以300 rpm旋轉。在完成反 應之後’使用旋轉蒸發器2小時以從生成物移除溶劑。然 後,在真空烤箱中乾燥生成物24小時,因此可以得到7 克(產率98 %)由式1表示的化合物1。 二 17 201008952 ji^/jpn bNMR (300 MHz): δ 0.62〜0.68(m,1H)、1.89〜1.96(m, 8H)、1.64〜1.67(t,2H)、2,54〜2.56(t,7H)、2.58〜2,61(m,6H)、 3.28〜3.31(m, SiOCH3)、3.38〜3.40(d,3H)、3.42〜3.44(d, 4H)、3.50〜3.58(m,5H)、3.64(s, -NH-)、3.80(s,OH)、 4.05〜4.10(m,9H)、6.95(s, 10H)、7.12〜7.13(t, 11H)、7.65(s, 12H) IR (純(neat), cnT1):3650~3200(vOH)、 3300〜3200〇NH)、1120〜1050(v 珍_(炫氧基)) (銅箔用表面處理劑組成物的製造) 實例2 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例1中製備的化合物1混合,以 製備具有1.0重量%之化合物1的混合溶液。 (二層FCCL的製造) 實例3 在實例2中製備的混合溶液單獨靜置60分鐘以進行 水解,然後噴灑在經Cr塗覆之滾製(rolled)銅箔(il-2,由 Hjin製造)上。接著,使用塗抹器(appiicat〇r)塗覆滾製銅箔。 在烤箱中於120°C乾燥30分鐘經塗覆之銅箔。 以 KRICT-PAA 亮光漆 (BPDA:PMDA:PDA:0DA=3:7:6:4)喷灑使用表面處理劑級 成物處理的銅箔’並使用刮刀(d〇ct〇r blade)塗覆之。在氮 201008952 ㈣下於6G C進行3G分鐘、12Gt:進行3Q分鐘 行30、分鐘以及40叱進行1〇分鐘來硬化經塗覆 = 酸,以製備聚醯亞胺薄膜,因此,製傷 ^· 覆於上_。在實例3中製備的銅==塗 實例4 鲁 ❹ 以在實例3中同樣的方式製備經聚酿亞胺薄膜 ;上的銅洛’除了使用& J〇〇y_g產業有限公司製造 光漆(產ML1)減Krict_Paa $鱗。^例1 中製備的銅箔以下稱為樣品2。 ' 實例 以在貫例3中’的方式製備經_亞胺薄膜 於上的銅羯’除了使用由Nikko材料製造的滾 : 名AHY福·Τ)取代經Cr、塗覆之滾製銅落(IL_2,由Ch3 P 0 1-(3-Aminopropyl)imidazole 3-glycidyloxypropyltrimethoxydecane H0 ch3 'i 0 •wW suspected C«3 s 'H ? API-decane CH3 162.68 g of tetrahydrogen 0 tetrahydrofiirane, 6.259 g φ (0.05 mol) of glycidoxypropyltrimetihoxysilane and 11.81 g (0.05 mol) of 1-(3-aminopropyl)p The l-(3-aminopropyl)-imidazole was charged into the reactor and reacted for 6 hours, the reactor temperature was maintained at 95 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours, so that 7 g (yield 98%) of Compound 1 represented by Formula 1 was obtained. 2 17 201008952 ji^/jpn bNMR (300 MHz): δ 0.62~0.68 (m, 1H), 1.89~1.96 (m, 8H), 1.64~1.67 (t, 2H), 2, 54~2.56 (t, 7H) ), 2.58~2,61(m,6H), 3.28~3.31(m, SiOCH3), 3.38~3.40(d,3H), 3.42~3.44(d, 4H), 3.50~3.58(m,5H), 3.64 (s, -NH-), 3.80 (s, OH), 4.05 to 4.10 (m, 9H), 6.95 (s, 10H), 7.12 to 7.13 (t, 11H), 7.65 (s, 12H) IR (pure ( Neat), cnT1): 3650~3200 (vOH), 3300~3200〇NH), 1120~1050 (v Jane_(decyloxy)) (Manufacture of surface treatment composition for copper foil) Example 2 Water and methanol were mixed in a volume ratio of 1:9 to obtain a solvent mixture, and the solvent mixture was mixed with Compound 1 prepared in Example 1 to prepare a mixed solution having 1.0% by weight of Compound 1. (Manufacture of two-layer FCCL) Example 3 The mixed solution prepared in Example 2 was allowed to stand alone for 60 minutes for hydrolysis, and then sprayed on a Cr-coated rolled copper foil (il-2, manufactured by Hjin). on. Next, the rolled copper foil was coated using an applicator (appiicat®). The coated copper foil was dried in an oven at 120 ° C for 30 minutes. Spraying a copper foil treated with a surface treatment agent grade with KRICT-PAA varnish (BPDA: PMDA: PDA: 0DA = 3:7:6:4) and coating with a doctor blade (d〇ct〇r blade) It. 3G minutes, 12Gt at 6G C under nitrogen 201008952 (4): 3 minutes, 3 minutes, 30 minutes, and 40 minutes for 1 minute to harden the coated = acid to prepare a polyimide film, thus, the wound is ^· Overlaid on _. Copper prepared in Example 3 ==Coating Example 4 Recklessly prepared a polyimide film in the same manner as in Example 3; the copper ruthenium was used in addition to the varnish used in & J〇〇y_g Industry Co., Ltd. Produced ML1) minus Krict_Paa $ scale. The copper foil prepared in Example 1 is hereinafter referred to as Sample 2. 'Examples of the copper yttrium on the yimide film prepared in the same manner as in Example 3 except that a roll made of Nikko material: AHY Fu·Τ was used instead of Cr, coated rolled copper ( IL_2, by
製造),且自UBE有限公司製造的Upilex形式之亮J 代KRICT_PAA亮光漆。在實例5巾製備的 樣品3 日^卜稱马 比較性實例1 以在實例3帽樣的方式製備經聚酿亞胺薄 於上的銅H,除了省略使絲面處理敝成物來處理銅落 表面的步驟。在味性實例1中製備的銅如下稱為比較 性樣品1。 - 一…. 19 201008952Manufactured, and the bright J-generation KRICT_PAA varnish of the Upilex form manufactured by UBE Co., Ltd. The sample prepared in the Example 5 towel was used for the comparison of Example 1 to prepare the copper H which was thinner than the above in the form of the cap of Example 3, except that the silk-treated composition was omitted to treat the copper. The step of falling the surface. The copper prepared in the taste example 1 is referred to as Comparative Sample 1 as follows. - One.... 19 201008952
J 1 7 fJUlL 比較性f例2 以在實例4中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅箔,除了省略使用表面處理劑組成物來處理銅箔 表面的步驟。在比較性實例2中製備的銅箔以下稱為比較 性樣品2。 比較性f例3 以在實例5中同樣的方式製備經聚醢亞胺薄膜塗覆 _ 於上的銅箔,除了省略使用表面處理劑組成物來處理銅箔 表面的步驟。在比較性實例3中製備的銅箔以下稱為比較 性樣品3。 評估實例Μ :剝離強唐淛試 使用ASTMD-638指定的方法量測樣品1至3及比較 性樣品1至3的剝離強度。橫擔速度(cross-Head speed)為 25 mm/min且樣品的寬度為5 mm。使用Instron 8516進行 ❹ 量測。量測的結果如下面的表1所示。 <表1> 剝離強度[kg/cm] 實例3 (樣品1) 0.73 比較性實例1 (比較性樣品1) 0.32 實例4 (樣品2) 0.76 - 20 201008952 J I ^pxi. 比較性實例2 (比較性樣品2) 0.38 實例5 (樣品3) 0.58 比較性實例3 (比較性樣品3) 0.28 ·· ---- 如表1所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品i至3,使用包含矽 燒基化合物之表面處理劑組成物製備之樣品1至3於聚醯 φ 亞胺及銅箔之間顯示大幅增加的剝離強度。 評估實例1-2 :防潮性潘丨就 於50 C、相對濕度80 %在恆溫渔器(thermo-hygrostat) HIRAYANAPC-R7令儲存樣品1至3進行7天,樣品1至 • 3的變色(discoloration)明顯。7天後,樣品1至3的顏色沒 有改變。 (石夕烧基化合物(2)之合成) • -實例6A :化合物之合成 根據下面的反應機制2合成由式2表示的化合物 2A。 <反應機制2> 〇J 1 7 fJUlL Comparative Example 2 A copper foil coated with a polyimide film was prepared in the same manner as in Example 4 except that the step of treating the surface of the copper foil using the surface treating agent composition was omitted. The copper foil prepared in Comparative Example 2 is hereinafter referred to as Comparative Sample 2. Comparative Example 3 A copper foil coated with a polyimide film was prepared in the same manner as in Example 5 except that the step of treating the surface of the copper foil using the surface treating agent composition was omitted. The copper foil prepared in Comparative Example 3 is hereinafter referred to as Comparative Sample 3. Evaluation Example 剥离: Peeling Strong Tang Zhejiang Test The peel strengths of Samples 1 to 3 and Comparative Samples 1 to 3 were measured using the method specified by ASTM D-638. The cross-head speed is 25 mm/min and the width of the sample is 5 mm. The Instron 8516 was used for ❹ measurement. The results of the measurements are shown in Table 1 below. <Table 1> Peel strength [kg/cm] Example 3 (Sample 1) 0.73 Comparative Example 1 (Comparative Sample 1) 0.32 Example 4 (Sample 2) 0.76 - 20 201008952 JI ^pxi. Comparative Example 2 (Comparative Sex sample 2) 0.38 Example 5 (Sample 3) 0.58 Comparative Example 3 (Comparative Sample 3) 0.28 ·· ---- As shown in Table 1, according to the embodiment of the present invention, no surface treatment agent was used. Comparative Samples i to 3 for Composition Preparation, Samples 1 to 3 prepared using the surface treatment composition containing the sulphur-based compound showed a greatly increased peel strength between the polyfluorene ymine and the copper foil. Evaluation Example 1-2: Moisture-proof Pan Wei at 50 C, relative humidity 80% in thermo-hygrostat HIRAYANAPC-R7 to store samples 1 to 3 for 7 days, sample 1 to 3 discoloration (discoloration )obvious. After 7 days, the colors of samples 1 to 3 did not change. (Synthesis of the compound (2); - Example 6A: Synthesis of the compound The compound 2A represented by the formula 2 was synthesized according to the following reaction mechanism 2. <Reaction mechanism 2> 〇
其中R為曱基。 21 201008952Wherein R is a thiol group. 21 201008952
Jiy/^pu 將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氣基丙基二曱軋基石夕烧(3-aminopropyltrimethoxysilane)及 5.0035克(〇.〇5莫耳)的琥珀酸酐倒入反應器中並反應6小 時’在氮氣氛下維持反應器之溫度為_5 °C至5 °C,且機械 攪拌器以300 rpm旋轉。在完成反應之後,使用旋轉蒸發 器2小時以從生成物移除溶劑。然後,在真空烤箱中乾燥 生成物24小時,因此可以得到13.9克(產率99 %)由式2 表示的化合物2A。 _ !H NMR (300 MHz, (CD3)2SO) : δ 0.53~0.58(m, 1Η) > 1.42〜1.45(m,2H)、2.29〜2.31(d, 4H)、2.38〜2.43(m,5H)、 2.98〜3.00(m,3H)、3.40〜3.46(m, SiOCH3)、8.00(s,-NH-)、 12.00(s, -OH) IR (純,cm·1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(vc〇nh) ' 1120~l〇50(v ❹ f例6B :化合物2B之合成 根據下面的反應機制2合成由式2表示的化合物 <反應機制2>Jiy/^pu pours 125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxysilane and 5.035 grams of succinic anhydride into the succinic anhydride. The reaction was carried out for 6 hours in the reactor. The temperature of the reactor was maintained at _5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours, whereby 13.9 g (yield 99%) of the compound 2A represented by the formula 2 was obtained. _ !H NMR (300 MHz, (CD3)2SO) : δ 0.53~0.58(m, 1Η) > 1.42~1.45(m,2H), 2.29~2.31(d, 4H), 2.38~2.43(m,5H ), 2.98~3.00 (m, 3H), 3.40~3.46 (m, SiOCH3), 8.00 (s, -NH-), 12.00 (s, -OH) IR (pure, cm·1): 3650~3200 (vOH ), 3300 to 3200 (vNH), 1650 (vc〇nh) '1120~l〇50 (v ❹ f Example 6B: Synthesis of Compound 2B According to the following reaction mechanism 2, the compound represented by Formula 2 is synthesized < Reaction Mechanism 2> ;
22 201008952 其中R為乙基。 將125.712克的四氫呋喃、u 0685克(〇 05莫耳)的 3-氣基丙基二乙氧基石夕燒(3-amin〇pr〇pyitriethoxysiIane)及 5.0035克(0.05莫耳)的琥珀酸酐倒入反應器中並反應6小 時,在氮氣氛下維持反應器之溫度為_5 °C至5 °C,且機械 攪拌器以300 rpm旋轉。在完成反應之後,使用旋轉蒸發 器2小時從生成物移除溶劑。然後,在真空烤箱中乾燥生 成物24小時,因此可以得到16克(產率99 %)由式2表示 的化合物2B。 ^NMR (300 MHz, (CD3)2SO) : 50.58~0.60(m, 1H) > 1.22〜1.25(m,Si-CH2)、1.60〜1.63(m,2H)、2.45〜2.49(m,4H)、 2.51〜2.54(m,5H)、3.20〜3.25(m,3H)、3.83〜3.87(m,Si-CH3) IR (純,cm·1) : 3650〜3200(voh)、3300〜3200(Vnh)、 1650(vc〇nh)、1120〜1050(νβ·(烷氧基)) (銅箔用表面處理劑組成物的製造) 實例7至11 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物,將溶劑混合物與在實例6A中製備的化合物2A混合, 以製備分別具有0.5重量%、1重量%、2重量%、3重量% 及5重量%之化合物2A的混合溶液。 23 201008952 oiy/〇pu 實例12至16 藉由以1:9之體積比率混合水及甲醇以得到溶劑滿合 物,將溶劑混合物與在實例6B中製備的化 及5重量%之化合物2B的混合溶液。 夏 (二層FCCL之製造) 實例17 £ 26 Φ 在㈣7幻6巾製制混合溶_精⑽分鐘以 ^水^ ,後分财财經Q㈣之滾製鋼罐_2, 模^㈣上H使用塗抹器(CK TRADING. co., 、,名.CKAF-1003)塗覆滾製銅落。在烤箱令於夏赃乾 煉30分鐘經塗覆之銅箔。 、 真# Jooyoung產業有限公司(產品名:JY-001)製造的 Φ 刀°塗覆喷麗使用表面處理劑組成物處理的銅箱,並使用剎 j 在氮氣氛下於6叱進行30分鐘、120°C進行30 之行%分鐘以及Wc進行1G分鐘來硬化經 酿亞胺笼2酸’以製備聚㈣胺賴,因此,製備經聚 的奶松/、刀別塗覆於上的銅箱。在實例17至26中製備 的銅㈣下稱為樣品4至13。 於上的 11實例17 μ樣的料製備轉輕胺薄膜塗覆 冶’除了省略使用表面處理劑組成物來處理銅箱 24 201008952 •J X. y ! 表面的步驟。在比較性實例4中製備的銅箔以下稱為比較 性樣品4。 評估膏例2-1 :剝離強度測試 使用ASTM D-638指定的方法量測樣品4至13及比 較性樣品4的剝離強度。橫擔速度為25 mm/min且樣品的 寬度為5匪。使用Instr〇n85l6進行量測。量測的結果如 下面的表2所示。 <表2> |離強度[kg/cm] 处8 — 1 _ 0.86 實例17 (樣品4) 實例18 (樣品5) 實例19 (樣品6) ,0^93 實例20 (樣品7) i〇5 實例21 (樣品8) ^92 實例22 (樣品9) 、 0.82 實例23 (樣品10) 、 0.89 實例24 (樣品11) L〇2 實例25 (樣品12) 1.12 實例26 (樣品13) ^ 0.94 比較性實例4 (比較性樣品4) A38 如表2所示,根據本發明之•例,相比於沒有.使用 25 201008952 jiy/3pn 薄膜及鋼f|之間顯示大;二至13於聚醯亞胺 樣:::使用包含魏基22 201008952 wherein R is ethyl. Pour 125.712 g of tetrahydrofuran, u 0685 g (〇05 mol) of 3-amethylpyridylpyridylphosphine (Iamin〇pr〇pyitriethoxysiIane) and 5.035 g (0.05 mol) of succinic anhydride The reactor was reacted for 6 hours, the temperature of the reactor was maintained at _5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, the solvent was removed from the product using a rotary evaporator for 2 hours. Then, the resultant was dried in a vacuum oven for 24 hours, so that 16 g (yield 99%) of the compound 2B represented by the formula 2 was obtained. ^NMR (300 MHz, (CD3)2SO): 50.58~0.60 (m, 1H) > 1.22~1.25 (m, Si-CH2), 1.60~1.63 (m, 2H), 2.45~2.49 (m, 4H) , 2.51 to 2.54 (m, 5H), 3.20 to 3.25 (m, 3H), 3.83 to 3.87 (m, Si-CH3) IR (pure, cm·1): 3650 to 3200 (voh), 3300 to 3200 (Vnh ), 1650 (vc〇nh), 1120 to 1050 (νβ·(alkoxy)) (manufacture of a surface treatment composition for copper foil) Examples 7 to 11 by mixing water and hydrazine in a volume ratio of 1:9 Alcohol was used to obtain a solvent mixture, and the solvent mixture was mixed with Compound 2A prepared in Example 6A to prepare a mixed solution of Compound 2A having 0.5% by weight, 1% by weight, 2% by weight, 3% by weight and 5% by weight, respectively. 23 201008952 oiy/〇pu Examples 12 to 16 Mixture of the solvent mixture with the compound prepared in Example 6B and 5% by weight of Compound 2B by mixing water and methanol in a volume ratio of 1:9 to obtain a solvent full compound. Solution. Summer (manufactured by the second layer FCCL) Example 17 £ 26 Φ In the (four) 7 phantom 6 towel system mixed solution _ fine (10) minutes to ^ water ^, after the wealth of Q (four) rolling steel can _2, mold ^ (four) on the H use smear The device (CK TRADING. co., ,, name. CKAF-1003) was coated with a rolled copper drop. The coated copper foil was dried in the oven for 30 minutes in the oven. Φ knives manufactured by Jooyoung Industries Co., Ltd. (product name: JY-001) coated with a copper box treated with a surface treatment agent composition, and subjected to a nitrogen atmosphere at 6 Torr for 30 minutes using a brake j. 120 ° C for 30 minutes % and Wc for 1G minutes to harden the brewed imine cage 2 acid ' to prepare poly (tetra) amine lysate, thus preparing a polyethered pine / knife coated on the copper box . The copper (tetra) prepared in Examples 17 to 26 is referred to as Samples 4 to 13. The above 11 examples of the 17 μ sample preparation of the light amine film coating smelting 'except the use of the surface treatment composition to treat the copper box 24 201008952 • J X. y ! Surface steps. The copper foil prepared in Comparative Example 4 is hereinafter referred to as Comparative Sample 4. Evaluation Paste 2-1: Peel Strength Test The peel strengths of Samples 4 to 13 and Comparative Sample 4 were measured using the method specified in ASTM D-638. The cross-arm speed was 25 mm/min and the width of the sample was 5 匪. Measurements were performed using Instr〇n85l6. The results of the measurements are shown in Table 2 below. <Table 2> | Departure strength [kg/cm] at 8 — 1 _ 0.86 Example 17 (Sample 4) Example 18 (Sample 5) Example 19 (Sample 6), 0^93 Example 20 (Sample 7) i〇5 Example 21 (Sample 8) ^92 Example 22 (Sample 9), 0.82 Example 23 (Sample 10), 0.89 Example 24 (Sample 11) L〇2 Example 25 (Sample 12) 1.12 Example 26 (Sample 13) ^ 0.94 Comparative Example 4 (Comparative Sample 4) A38 As shown in Table 2, according to the example of the present invention, compared with no. The use of 25 201008952 jiy/3pn film and steel f| shows a large; two to 13 in Juyi Amine-like::: Use contains Weiji
防潮性測詖 CA PC_in中_# /對濕度80 %在怪溫漫器HIRAYA& 明顯。7天後,二fj3〗f行7天’樣品4至13的㈣ 便&σσ 4至13的顏色沒有改變。 (石夕燒基化合物(3)之合成) 北合物3之合成 根據下面的反應機制3合成由式3表示的化合物3。 <反應機制3>Moisture resistance test CA PC_in _# / humidity 80% in the strange temperature diffuser HIRAYA & obvious. After 7 days, the two fj3〗 f rows for 7 days 'The color of the samples 4 to 13 (4) & σσ 4 to 13 did not change. (Synthesis of the saponin compound (3)) Synthesis of the urethane 3 The compound 3 represented by the formula 3 was synthesized according to the following reaction mechanism 3. <Reaction mechanism 3>
2,3-«比啶二酸酐 0 0 u • 3-氨基丙基三甲氧基麥烷2,3-«bipyridinedicarboxylic acid 0 0 u • 3-aminopropyltrimethoxymethane
將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三曱氧基矽烷及7.4550克(0.05莫耳)的2,3-咣唆 二酸酐倒入反應器中並反應5小時,在氮氣氛下維持反應 器之溫度為-5 °C至5 t:,且機械攪拌器以300 rpm旋轉。- 26 201008952 jsiy/jpit 在完成反應之後’使用旋轉蒸發器2小時以從生成物移除 溶劑。然後,在真空烤箱中乾燥生成物24小時,因此可以 得到16.4克(產率99%)由式3表示的化合物3。 4 NMR (300 MHz, (CD3)2SO) : δ0·57〜0.59(t,1H)、 1.62〜1.80(m,2H)、3.62〜3.67(m,Si-CH3)、3.85〜3.87(t,3H)、 7.93~7.95(t,4H)、8.56(s, NH)、8.64~8.67(d,5H)、9.09〜9.11(d 6H)、13.80(s,OH) ’ IR (純,cm·1) : 3650〜3200(vOH)、3300〜3200(Vnh)、 1650(vCONH)、1120〜1050(v 矽.(烷氧基)) (銅箔用表面處理劑組成物的製造) 實例28 29 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物,將溶劑混合物與在實例27中製備的化合物3混合,二 製備分別具有0.5重量%及i重量之化合物3的混合^液。 (二層FCCL之製造) AM. 30 JL 31 在實例28至29中製備的混合溶液單獨靜置6〇 ^ 以進行水解’然後分別噴灑在經Cr塗覆之滾製銅刀· 由Iljm製造)上。接著,使用塗抹器塗覆銅落。在 於12CTC乾燥30分鐘經塗覆之銅落。 在烤相 以由UBE有限公司製造的Upilex形式之亮光漆 27 201008952 31973pit 使用表面處理劑組成物處理的鋼 在氮氣氛下於6(τ⑽行3G分#、12Q。 靴進行30分仙及赋進行丨_來鐘之 =酸=備聚醯;,’因此’製備經忑亞胺 :===,"。至31中製備― 上匕較性眚例5 φ 以在實例30中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅箔,除了省略使用表面處理劑組成物來處理銅箔 表面的步驟。在比較性實例5中製備的銅箔以下稱為比較 評估管例3-1 :剝離強度測Μ 使用ASTMD-638指定的方法量測樣品14至15及比 較丨生樣品5的剝離強度。枚擔速度為25 nini/niiii且樣品的 寬度為5 mm。使用Instron 8516進行量測。量測的結果如 下面的表3所示。 ^3> 剝離強度[kgf/cml ^例30 (樣品14) 0.82 1例31 (樣品15) 0.78" - 28 201008952125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxyoxydecane and 7.4550 grams (0.05 moles) of 2,3-sebacic anhydride were poured into the reactor and reacted for 5 hours. The reactor temperature was maintained at -5 °C to 5 t: under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. - 26 201008952 jsiy/jpit After completion of the reaction, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours, whereby 16.4 g (yield 99%) of the compound 3 represented by the formula 3 was obtained. 4 NMR (300 MHz, (CD3) 2SO): δ0·57~0.59 (t, 1H), 1.62~1.80 (m, 2H), 3.62~3.67 (m, Si-CH3), 3.85~3.87 (t, 3H) ), 7.93~7.95(t,4H), 8.56(s, NH), 8.64~8.67(d,5H), 9.09~9.11(d 6H), 13.80(s,OH) 'IR (pure, cm·1) : 3650 to 3200 (vOH), 3300 to 3200 (Vnh), 1650 (vCONH), 1120 to 1050 (v 矽. (alkoxy)) (manufacture of a surface treatment composition for copper foil) Example 28 29 by Water and decyl alcohol were mixed at a volume ratio of 1:9 to obtain a solvent mixture, and the solvent mixture was mixed with Compound 3 prepared in Example 27, and a mixture of Compound 3 having 0.5% by weight and i by weight was prepared. (Manufacturing of two-layer FCCL) AM. 30 JL 31 The mixed solutions prepared in Examples 28 to 29 were separately allowed to stand for 6 〇 to perform hydrolysis 'and then sprayed separately on a Cr-coated rolled copper knives · manufactured by Iljm) on. Next, the copper drop was coated using an applicator. The coated copper was dried at 12 CTC for 30 minutes. In the baking phase, the varnish of the Upilex form manufactured by UBE Co., Ltd. 27 201008952 31973pit The steel treated with the surface treatment composition is subjected to a nitrogen atmosphere at 6 (τ (10) rows, 3G minutes #, 12Q. The boots are subjected to 30 cents and the castings are carried out.丨_来钟之=酸=备聚醯;, 'so' preparation of yttrium imine: ===, ". Preparation to 31 - upper 匕 comparative example 5 φ in the same way as in Example 30 A copper foil coated with a polyimide film was prepared except that the surface treatment composition was omitted to treat the surface of the copper foil. The copper foil prepared in Comparative Example 5 is hereinafter referred to as Comparative Evaluation Tube Example 3 1 : Peel strength measurement 剥离 The samples were measured using the method specified in ASTM D-638 to measure the peel strength of the samples 4 to 15 and the comparative sample 5. The entrainment speed was 25 nini/niiii and the width of the sample was 5 mm. The amount was measured using Instron 8516. The results of the measurement are shown in Table 3. ^3> Peel strength [kgf/cml ^Example 30 (Sample 14) 0.82 1 case 31 (Sample 15) 0.78" - 28 201008952
比較性實例5 (比較性檨品5) 0.32 如表3所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品5,使用包含矽烷基 化合物之表面處理劑組成物製備之樣品14至15於聚 胺薄膜及鋼箔之間具有大幅增加的剝離強度。 粵 實例3 -2 :防潮神海丨詁 於50。(:、相對濕度8〇 %在恆溫溼器HIRayana PC-R7中儲存樣品14至15進行7天,樣品14至15的變 色明顯。7天後,樣品14至15的顏色沒有改變。 (矽烷基化合物(4)之合成) 例32A :化合物4A之合成 根據下面的反應機制4合成由式4表示的化合物4A。 • <反應機制4>Comparative Example 5 (Comparative Sample 5) 0.32 As shown in Table 3, according to the embodiment of the present invention, surface treatment containing a decyl group compound was used as compared with Comparative Sample 5 prepared without using a surface treatment composition. Samples 14 to 15 prepared from the composition of the agent had a greatly increased peel strength between the polyamine film and the steel foil. Guangdong Example 3 - 2: Moisture-proof sea otter at 50. (:, relative humidity 8〇% was stored in the thermostat HIRayana PC-R7 for 14 days, and the discoloration of the samples 14 to 15 was remarkable. After 7 days, the color of the samples 14 to 15 did not change. Synthesis of Compound (4) Example 32A: Synthesis of Compound 4A Compound 4A represented by Formula 4 was synthesized according to the following Reaction Mechanism 4. • < Reaction Mechanism 4>
+ Φ*» OR+ Φ*» OR
龙八?OR 其中R為甲基。 將125.712克的四氩呋喃' 8.9645克(0.05莫耳)的3_ 氨基丙基三曱氧基矽烷及9.6065克(0.Q3莫耳)的偏笨三酸 酐(2,3_吡啶二酸酐)倒入反應器中並反應6小時,在氮氣氛 29 201008952龙八?OR where R is methyl. 125.712 grams of tetrahydrofuran' 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxy decane and 9.6065 grams of (0. Q3 molar) of trimellitic anhydride (2,3-pyridine dianhydride) Into the reactor and react for 6 hours in a nitrogen atmosphere 29 201008952
•MV/jpiI 下維持反應器之溫度為-5 °C至5 °C,且機械攪拌器以250 rpm旋轉。在完成反應之後,使用旋轉蒸發器1小時以從 生成物移除溶劑。然後,在真空烤箱中乾燥生成物48小 時,因此可以得到18.5克(產率99%)由式4表示的化合物 4A ° JH NMR (300 MHz, (CD3)2SO) : 60.62~0.65(t, 1H) > 1.71 〜1.76(tn, 2H)、3.41〜3.47(m,Si-CH3)、3.56〜3.60(m, 3H) > 7.45(s, NH) ❹ IR (純,cm·1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(vc〇nh) ' 1120~1050(v 實例32B :化合物4B之合成 根據下面的反應機制4合成由式4表示的化合物4B。 <反應機制4>• The reactor temperature was maintained at -5 °C to 5 °C at MV/jpiI and the mechanical stirrer was rotated at 250 rpm. After the completion of the reaction, a rotary evaporator was used for 1 hour to remove the solvent from the resultant. Then, the resultant was dried in a vacuum oven for 48 hours, so that 18.5 g (yield 99%) of the compound represented by the formula 4 4A ° JH NMR (300 MHz, (CD3) 2SO): 60.62 to 0.65 (t, 1H) was obtained. > 1.71 to 1.76 (tn, 2H), 3.41 to 3.47 (m, Si-CH3), 3.56 to 3.60 (m, 3H) > 7.45 (s, NH) ❹ IR (pure, cm·1): 3650 ~3200 (vOH), 3300 to 3200 (vNH), 1650 (vc〇nh) '1120 to 1050 (v Example 32B: Synthesis of Compound 4B The compound 4B represented by Formula 4 is synthesized according to the following reaction mechanism 4. <Reaction Mechanism 4>
其中R為乙基。Wherein R is an ethyl group.
將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三乙氧基石夕院及9.6065克(0.05莫耳)的偏苯三酸 酐(2,3-t定二酸酐)倒入反應器中並反應6小時,在氣 下維持反應器之溫度為_5 °C至5。(:,且機械_哭以= 30 201008952 J t jyii rpm旋轉。在完成反應之後,使用旋轉蒸發器i小時以從 生成物移除溶劑。然後,在真空烤箱中乾燥生成物48小 時,因此可以得到20.6克(產率99 %)由式4表示的化合物 4B。 hNMR (300 MHz) : δ0·71〜〇.73(t,1H)、1.14~1.23(m, Si-CH3)、1·71 〜1.74(m, 2H)、3.58〜3.60(t, 3H)、3.79~3.86(m, ❹ Si-CH2)、8.55(s,NH) IR (純,cm*1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(vCONH)、1120 〜1050(ν$·(坑氧基)) (銅箔用表面處理劑組成物的製造) 實例33至34 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例32A中製備的化合物4A混合, 以製備分別具有0.5重量%及1重量%之化合物4A的混合 Φ 溶液。 實例35至36 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物,將溶劑混合物與在實例32B中製備的化合物4B混合, 以製備分別具有0.5重量%及1重量%之化合物4B的混合 溶液。 31 201008952 :uy/,pu (二層FCCL的製造) 實例37至 在實例33至36中製備的混合溶液單獨靜置6〇分鐘 以進行水解’然後分別噴灑在經Cr塗覆之滾製鋼刀/ 由Iljin製造)上。接著,使用塗抹器塗覆銅簿。在 中 於120°C乾燥30分鐘經塗覆之銅箱目 以由Jooyoung有限公司製造的亮光漆125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltriethoxysulfate and 9.6065 grams (0.05 moles) of trimellitic anhydride (2,3-t dianhydride) were poured into the reactor and After reacting for 6 hours, the temperature of the reactor was maintained at _5 ° C to 5 under air. (:, and mechanical_cry to = 30 201008952 J t jyii rpm rotation. After the reaction is completed, a rotary evaporator is used for 1 hour to remove the solvent from the product. Then, the product is dried in a vacuum oven for 48 hours, so 20.6 g (yield 99%) of the compound 4B represented by the formula 4 was obtained. hNMR (300 MHz): δ0·71~〇.73 (t, 1H), 1.14 to 1.23 (m, Si-CH3), 1.71 ~1.74 (m, 2H), 3.58~3.60 (t, 3H), 3.79~3.86 (m, ❹ Si-CH2), 8.55 (s, NH) IR (pure, cm*1): 3650~3200 (vOH) 3300 to 3200 (vNH), 1650 (vCONH), 1120 to 1050 (ν$·(Pitoxy)) (Manufacture of surface treatment composition for copper foil) Examples 33 to 34 by volume of 1:9 Water and methanol were mixed in ratio to obtain a solvent mixture, and the solvent mixture was mixed with Compound 4A prepared in Example 32A to prepare a mixed Φ solution having 0.5% by weight and 1% by weight of Compound 4A, respectively. Examples 35 to 36 A volume ratio of 1:9 was mixed with water and decyl alcohol to obtain a solvent mixture, and the solvent mixture was mixed with Compound 4B prepared in Example 32B to prepare 0.5% by weight and 1 weight, respectively. a mixed solution of the compound 4B in %. 31 201008952 : uy /, pu (manufactured by two-layer FCCL) The mixed solution prepared in Example 37 to Examples 33 to 36 was allowed to stand alone for 6 minutes to carry out hydrolysis 'and then sprayed separately On a Cr coated roll steel knife / manufactured by Iljin). Next, the copper book is coated with an applicator. The coated copper box was dried at 120 ° C for 30 minutes to obtain a varnish made by Jooyoung Co., Ltd.
^)〇1)喷麗使用表面處理劑組成物處理的銅箱,並^刮 刀塗覆之。 J 在氮氣氛下於60t進行3Q分鐘、⑽ 分鐘以及進行1Q分鐘來 Ϊ = 祺,因此,製備經聚上 以下稱為樣品16至…貫例37至4〇中製備的銅箱 比較性實例6 以在實例对同樣的;^製備㈣醯亞胺薄膜塗 ^上的銅H,除了省略使用表面處理劑组成物來處理銅落 ^面的步驟。在比較性實例6中製備的銅fl以下稱為比較 个生樣品6。 評估實例4-1 : iL離強 使用ASTM D-638指定的方法量測樣品至β及比 較性樣品6 _㈣度。橫料料Μ —且樣品的 201008952 寬度為5 mm。使用instron 8516進行量測。量測的結果如 下面的表4所示。 <表4> 剝離強度[kgf/cm] 實例37 (樣品16) 1.60 實例38 (樣品17) 1.35 實例39 (樣品18) 1.98 實例40 (樣品19) 1.57 比較性實例6 (比較性樣品6) 0.38 如表4所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品6,使用包含矽烷基 化合物之表面處理劑組成物製備之樣品16至19於聚醯亞 胺薄膜及銅箱之間具有大幅增加的剝離強度。 g估實例4-2 :防潮性測試 於50 °C、相對濕度80 %在恆溫溼器HIRAYANA PC-R7中儲存樣品16至19進行7天,樣品16至19的變 色明顯。7天後,樣品16至19的顏色沒有改變。 如上所述,相比於PCB上沒有使用表面處理劑組成 物或是使用包含一般石夕院基化合物之表面處理劑組成物, 使用包含本發明之矽烷基化合物之銅箔用表面處理劑組成 物製備的PCB具有提高的剝離強度。—厂 33 201008952 /opu 雖然本發明已以實施例揭露如上,然其並非用以限定 本發明,任何所屬技術領域中具有通常知識者,在不脫離 本發明之精神和範圍内,當可作些許之更動與潤飾,故本 發明之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 無。 【主要元件符號說明】 無。^) 〇 1) A copper box treated with a surface treatment composition and sprayed with a knife. J was subjected to 3Q minutes, (10) minutes, and 1Q minutes at 60t under a nitrogen atmosphere for Ϊ = 祺, therefore, a copper box comparative example 6 prepared by concentrating the following samples 16 to ... in Examples 37 to 4 was prepared. The copper H coated on the (i) quinone imine film was prepared in the same manner as in the example except that the surface treatment composition was omitted to treat the copper surface. The copper fl prepared in Comparative Example 6 is hereinafter referred to as Comparative Biosample 6. Evaluation Example 4-1: iL Detachment The sample was measured to the β and the comparative sample 6 _(four) degrees using the method specified in ASTM D-638. The cross-feed Μ—and the sample's 201008952 width is 5 mm. Measurements were performed using an instron 8516. The results of the measurements are shown in Table 4 below. <Table 4> Peel strength [kgf/cm] Example 37 (Sample 16) 1.60 Example 38 (Sample 17) 1.35 Example 39 (Sample 18) 1.98 Example 40 (Sample 19) 1.57 Comparative Example 6 (Comparative Sample 6) 0.38 As shown in Table 4, samples 16 to 19 prepared using a surface treatment composition containing a decyl compound were compared to Comparative Sample 6 prepared without using a surface treatment composition, according to an embodiment of the present invention. There is a substantial increase in peel strength between the yttrium imide film and the copper box. g. Example 4-2: Moisture resistance test Samples 16 to 19 were stored in a thermostatic humidifier HIRAYANA PC-R7 at 50 ° C and a relative humidity of 80% for 7 days, and the samples 16 to 19 were significantly changed. After 7 days, the colors of samples 16 to 19 did not change. As described above, the surface treatment composition for copper foil containing the decyl compound of the present invention is used as compared with the case where the surface treatment composition is not used on the PCB or the surface treatment composition containing the general ceramide compound is used. The prepared PCB has improved peel strength. The present invention has been disclosed in the above embodiments, but it is not intended to limit the invention, and any one of ordinary skill in The scope of protection of the present invention is defined by the scope of the appended claims. [Simple description of the diagram] None. [Main component symbol description] None.
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KR101298998B1 (en) * | 2009-07-29 | 2013-08-26 | 한국화학연구원 | Surface treatment agent composition, method for preparing the same, copper foil for flexible printed circuit board, and flexible copper clad laminate |
JP5855363B2 (en) * | 2011-06-15 | 2016-02-09 | 株式会社Adeka | Organosilicon compound and electroless plating pretreatment method using the organosilicon compound |
KR102310660B1 (en) * | 2017-04-28 | 2021-10-07 | 미쓰이 가가쿠 가부시키가이샤 | Substrate laminate and method for manufacturing substrate laminate |
CN109433270B (en) * | 2018-10-10 | 2021-05-14 | 万华化学集团股份有限公司 | Catalyst for preparing isooctanoic acid by oxidizing isooctaldehyde, preparation method thereof and method for preparing isooctanoic acid |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4689422A (en) * | 1985-12-27 | 1987-08-25 | Texaco Inc. | Novel ligand catalyst systems formed by reaction of carbonyl compounds with organosilicon compounds |
TW326423B (en) * | 1993-08-06 | 1998-02-11 | Gould Inc | Metallic foil with adhesion promoting layer |
-
2008
- 2008-07-18 KR KR1020080070080A patent/KR20100009262A/en not_active Application Discontinuation
-
2009
- 2009-07-16 WO PCT/KR2009/003913 patent/WO2010008213A2/en active Application Filing
- 2009-07-16 TW TW098124124A patent/TWI387599B/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114829457A (en) * | 2019-10-23 | 2022-07-29 | 胡网加成股份有限公司 | Polysiloxane copolymer, method for preparing the same, and resin composition comprising the same |
CN114829457B (en) * | 2019-10-23 | 2024-05-03 | 胡网加成股份有限公司 | Polysiloxane copolymer, method of preparing the same, and resin composition including the same |
Also Published As
Publication number | Publication date |
---|---|
WO2010008213A2 (en) | 2010-01-21 |
TWI387599B (en) | 2013-03-01 |
KR20100009262A (en) | 2010-01-27 |
WO2010008213A9 (en) | 2010-07-22 |
WO2010008213A3 (en) | 2010-05-14 |
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