TW201008770A - Release film - Google Patents

Release film Download PDF

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Publication number
TW201008770A
TW201008770A TW098120770A TW98120770A TW201008770A TW 201008770 A TW201008770 A TW 201008770A TW 098120770 A TW098120770 A TW 098120770A TW 98120770 A TW98120770 A TW 98120770A TW 201008770 A TW201008770 A TW 201008770A
Authority
TW
Taiwan
Prior art keywords
film
circuit board
molecular weight
printed circuit
thermal expansion
Prior art date
Application number
TW098120770A
Other languages
Chinese (zh)
Inventor
Minoru Onodera
Kazuyuki Ohmori
Makoto Asano
Original Assignee
Kuraray Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co filed Critical Kuraray Co
Publication of TW201008770A publication Critical patent/TW201008770A/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/027Thermal properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/085Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/18Layered products comprising a layer of metal comprising iron or steel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/281Applying non-metallic protective coatings by means of a preformed insulating foil
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/748Releasability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0141Liquid crystal polymer [LCP]

Abstract

To provide a release film applicable to a wide variety of thermoplastic liquid crystal polymer films. The release film comprises an ultrahigh molecular weight polyolefin film layer and a reinforcement layer which is laminated to the polyolefin film layer. The polyolefin film layer has a molecular orientation ratio (SOR) of not less than 0.95 and less than 1.05 in the longitudinal direction, and a negative value of coefficient of the average thermal expansion in the planar direction; and the reinforcement layer has a positive value of coefficient of the average thermal expansion in the planar direction. Such a release film is used in a hot pressing step of a process for producing a circuit board comprising a thermoplastic liquid crystal polymer film as (i) a base, (ii) a coverlay film, or (iii) both.

Description

201008770 六、發明說明: 相關專利 本專利係主張日本國2008年6月23日所申請之 特願2008 — 163015之優先權,係參考其全部而引用成 爲本申請專利之一部分。 【發明所屬之技術領域】 本發明係關於一種於印刷電路板的熱壓成形時使 用’且耐熱性、離型性、非污染性優異,又易於廢棄 齡 _ 處理之離型薄膜,及使用此離型薄膜之印刷電路板之 製造方法。 【先前技術】 先前,印刷配線基板、彈性配線基板、或多層印 刷電路板等印刷電路板之製造工程中,內存有由形成 光學異向性的熔融相之熱塑性液晶聚合物而成之薄膜 (以下簡稱爲TLCP薄膜)等之鍍銅積層板,係於熱 _ 壓銅箔時,使用離型薄膜。 在撓性印刷電路板之製造工程中,對於已形成電 路之撓性印刷電路板本體,將由TLCP薄膜形成之被 覆層薄膜熱壓,以熱硬化性黏合劑進行熱黏合時,爲 預防被覆層薄膜與熱壓板發生黏合,亦廣泛使用離型 薄膜》 此種離型薄膜係使用於將TLCP薄膜熱熔融時的 熱壓成形之高溫下,須具備耐熱性。 -4- 201008770 例如,專利文獻1揭示一種耐熱性、離型性、非 污染性優異,且易於廢棄處理之離型薄膜。此文獻中 記載將金屬層與具有特定的剪切彈性率之熱塑性薄膜 組合而作爲離型薄膜。此種離型薄膜因其中的熱塑性 薄膜具有特定之剪切彈性率,故熱壓成形時,可預防 因熱塑性薄膜的熱變形所引起之緩衝性降低,對於基 板上的凹凸,亦具有優異之隨動性。 惟,使用此離型薄膜時,依據TLCP薄膜之種類, β 恐有使TLCP薄膜變形而無法使用爲印刷電路板之虞。 先前技術文獻 專利文獻 專利文獻1:國際公開第2008 / 012940號手冊 【發明内容】 發明欲解決之課題 本發明之目的,係提供一種即使使用TLCP薄膜 g 作爲印刷電路板之基材或被覆層薄膜時,亦可適用於 廣泛種類的TLCP薄膜之離型薄膜。 本發明之其他目的,係提供一種不需預先調整 TLCP薄膜的熱膨脹係數,即可極高度地預防發生於印 刷電路板的電路變形之離型薄膜。 又,本發明之其他目的,係提供一種利用此種離 型薄膜,即使將使用TLCP薄膜的印刷電路板於高溫 下熱壓成形時,亦可極高度地預防電路變形之印刷電 路板之製造方法。 201008770 解決課題之手段 本發明者等,鑑於有些TLCP薄膜因熱壓時會引 起變形而無法使用爲印刷電路板,進而探討離型薄 膜。首先,先前之看法係進行熱壓時,因TLCP薄膜 具有正的熱膨脹係數,故形成隨TLCP薄膜而動的離 型薄膜之熱塑性薄膜亦必須具有正的熱膨脹係數。201008770 VI. INSTRUCTIONS: RELATED PARTY This patent claims the priority of Japanese Patent Application No. 2008-1630, filed on Jun. 23, 2008, which is incorporated herein by reference in its entirety. [Technical Field] The present invention relates to a release film which is used in hot press forming of a printed circuit board and which is excellent in heat resistance, release property, non-contamination property, and easy to be discarded, and is used. A method of manufacturing a printed circuit board of a release film. [Prior Art] In the manufacturing process of a printed circuit board such as a printed wiring board, an elastic wiring board, or a multilayer printed circuit board, a film formed of a thermoplastic liquid crystal polymer having an optically anisotropic molten phase is present (hereinafter A copper-clad laminate such as a TLCP film is used as a release film when it is used for hot-press copper foil. In the manufacturing process of a flexible printed circuit board, a coated thin film formed of a TLCP film is heat-pressed to a flexible printed circuit board body in which a circuit has been formed, and is thermally bonded by a thermosetting adhesive to prevent a coating film. Bonding to the hot platen, and the release film is also widely used. This release film is used for heat resistance at the high temperature during hot melt forming of the TLCP film. -4-201008770 For example, Patent Document 1 discloses a release film which is excellent in heat resistance, release property, non-contamination property, and which is easy to dispose of. This document describes a combination of a metal layer and a thermoplastic film having a specific shear modulus as a release film. Since the thermoplastic film of the release film has a specific shear modulus, the cushioning property due to thermal deformation of the thermoplastic film can be prevented during hot press forming, and the unevenness on the substrate is excellent. Motivation. However, when using this release film, depending on the type of the TLCP film, β may be deformed to make it impossible to use it as a printed circuit board. PRIOR ART DOCUMENT PATENT DOCUMENT Patent Document 1: International Publication No. 2008/012940 A SUMMARY OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION An object of the present invention is to provide a substrate or a coating film which is a printed circuit board even if a TLCP film g is used. It can also be applied to a wide range of release films of TLCP films. Another object of the present invention is to provide a release film which can extremely prevent the deformation of a circuit occurring on a printed circuit board without pre-adjusting the thermal expansion coefficient of the TLCP film. Further, another object of the present invention is to provide a printed circuit board capable of preventing circuit deformation extremely high even when a printed circuit board using a TLCP film is hot-pressed at a high temperature by using such a release film. . 201008770 The means for solving the problem The inventors of the present invention have been able to use a printed circuit board because some TLCP films are deformed by hot pressing, and the release film is further examined. First, the previous observation is that when the TLCP film has a positive thermal expansion coefficient during hot pressing, the thermoplastic film forming the release film moving with the TLCP film must also have a positive thermal expansion coefficient.

惟,進一步考量此觀點,實際上以複數層而構成 之離型薄膜,將具有正的熱膨脹係數之熱塑性薄膜與 ® 具有正的熱膨脹係數之金屬層組合後,會升高TLCP 薄膜之熱膨脹係數,依據TLCP薄膜之種類,源自熱 塑性薄膜的熱膨脹之應力,將傳至TLCP薄膜,結果 導致TLCP薄膜發生變形。 其次,針對爲預防此種TLCP薄膜的變形之有效 手段進行探討,發現藉由將具有負的熱膨脹係數之超 高分子量聚烯烴薄膜與具有正的熱膨脹係數之補強層 組合,製得之離型薄膜不僅離型性及對厚度方向之緩 © 衝性優異,即使於爲進行熱壓之溫度範圍內,亦可有 效地預防源自熱膨脹之應力傳至TLCP薄膜,結果發 現一種可適用於廣泛種類的TLCP薄膜之離型薄膜而 完成本發明。 亦即,本發明係一種於使用由形成光學異向性的 熔融相之熱塑性液晶聚合物而成之薄膜作爲(i)基 材、(Π)被覆層薄膜或(ΠΟ基材及被覆層薄膜二者 之印刷電路板之製造步驟中,進行熱壓成形時而使用 201008770 之離型薄膜, 上述離型薄膜係將超高分子量聚烯烴薄膜層和補 強層重叠而裝備, 上述超高分子量聚烯烴薄膜層,於薄膜的長方向 之分子配向度SOR爲0.95以上且低於1.05之範圍, 又薄膜的平面方向的熱膨脹係數之平均爲負値, 上述補強層於補強層的平面方向的熱膨脹係數之 平均爲正値之離型薄膜。 上述超髙分子量聚烯烴薄膜層,其平面方向的熱 膨脹係數之平均(MUP ),可爲-lxlO_6cm/cm/°C以 下,而上述補強層的平面方向的熱膨脹係數之平均 (MRE),可爲 lxl(T6 至 30xl(T6cm/cm/°C 之範圍內。 又,構成超高分子量聚烯烴薄膜層之超高分子量 聚烯烴,通常其黏度平均分子量大多爲1〇〇萬以上。 離型薄膜中,超高分子量聚烯烴薄膜層的平面方 向的熱膨脹係數之平均(MUP),與補強層的平面方向 的熱膨脹係數之平均(MRE)之平均(Μτ),亦可爲負 値。 可適當地設定各層之厚度,例如超高分子量聚烯 烴薄膜層之厚度(A),可爲30~200/zm左右,補強層 之厚度(B),可爲10〜100#m左右,而補強層之厚度 (B)對超高分子量聚烯烴薄膜層之厚度(A)之比(B) / (A),可爲 60/40~10/90 左右。 本發明更包括一種印刷電路板之製法,其係藉由 201008770 使用由形成光學異向性的熔融相之熱塑性液晶聚合物 而成之薄膜作爲(i)基材、(ii)被覆層薄膜或(iii) 基材及被覆層薄膜二者,並熱壓成形而製造印刷電路 板之方法, 其中在熱壓成形時,係使補強層連接於壓熱板而 配置如申請專利範圍第1至7項中任一項之離型薄膜。 例如,熱壓成形溫度亦可選自比熱塑性液晶聚合 _ 物之熔點低1 5 °C的溫度以上,且比熔點高1 5 °C的溫度 參 以下之範圍內(例如250-320°C左右)。 本發明亦包括以此製造方法製得之印刷電路板。 本發明亦包括一種關於積層用材料之發明,其係以由 形成爲形成印刷電路板、被覆層薄膜、或基材及被覆 層薄膜二者之光學異向性的熔融相之熱塑性液晶聚合 物所成之薄膜,和 放置於上述電路板和上述被覆層薄膜之上下,使 _ 上述印刷電路板和上述被覆層薄膜被夾著,且與補強 層的平面方向的熱膨脹係數之平均爲正値之補強層組 合’構成離型薄膜之超高分子量聚烯烴薄膜, 而構成,係一種夾於壓熱板間,爲進行熱壓成形 •之積層用材料,此積層材料中,上述超高分子量聚烯 烴薄膜層’於薄膜的長方向之分子配向度S OR爲0.9 5 以上,且低於1.05之範圍,又薄膜的平面方向之熱膨 脹係數之平均爲負値。 201008770 本發明說明書中,平面方向的熱膨脹係數之平 均,係指在薄膜等的平面方向的機械軸方向(以下簡 稱爲MD方向)之熱·膨脹係數與直交於機械軸方向之 方向(以下簡稱爲TD方向)的熱膨脹係數之和再除 以2之平均値。 發明效果 依據本發明,因將熱膨脹係數爲負値之超高分子 量聚烯烴薄膜層與熱膨脹係數爲正値之補強層組合而 形成離型薄膜,故適用於廣泛種類之TLCP薄膜,亦 可降低印刷電路板因熱壓成形而發生之變形。 藉由將超高分子量聚烯烴薄膜層與補強層之熱膨 脹係數調整成特定之値,不需預先調整TLCP薄膜的 熱膨脹係數,即可極高度地預防發生於印刷電路板之 電路變形。 【實施方式】 進行發明之形態 〔離型薄膜〕 本發明之離型薄膜,係TLCP薄膜(亦即,由形 成光學異向性的熔融相之熱塑性液晶聚合物而成之薄 膜)作爲(i)基材、(U)被覆層薄膜或(iii)基材 及被覆層薄膜二者之印刷電路板之製造步驟中,進行 熱壓成形時而使用,離型薄膜係將超高分子量聚烯烴 薄膜層和至少1種類以上之補強層以積層狀態而裝 備。 .201008770 (超高分子量聚烯烴薄膜) 超高分子量聚烯烴薄膜,於薄膜的長方向之分子 配向度SOR爲0.95以上且低於1.05之範圍,又薄膜 的平面方向的熱膨脹係數之平均爲負値。 超高分子量聚烯烴薄膜之薄膜的長方向之分子配 向度SOR若爲0.95以上且低於1.05之範圍,則可維 持分子之配向狀態爲同向性,可預防熱壓時或之後的 冷卻時,印刷電路板因薄膜的異向性而發生不均勻的 ® 傾斜或變形。若爲高密度配線或薄電路板時,SOR宜 爲0.98至1 .03之範圍內。 爲預防印刷電路板的電路之變形或電路板整體之 傾斜,超高分子量聚烯烴薄膜的平面方向的熱膨脹係 數之平均(MUP)必須爲負値,宜爲一 lxl(T 6cm/ cm /°C 以下,更宜爲一500xl(T6~ - 10x10 — 6cm/cm/°C 左右,尤宜一400xl0_6 〜-30xlO_6cm/cm/°C 左右。 因印刷電路板的熱膨脹係數爲正値(例如18xl(T6cm ❹ / cm/ °C左右),熱壓時由於平面方向的應力,而使 熱膨脹側易變形。然而,使構成離型薄膜之超髙分子 量聚烯烴薄膜的熱膨脹係數爲負値,藉由使因平面方 向的應力而於熱收縮側發生變形之力作用,可使發生 於熱壓時的積層體整體之熱膨脹緩和。 超高分子量聚烯烴薄膜之厚度,宜爲3 0〜20 0 m 之範圍,尤宜30〜180ym之範圍內。若薄膜過厚,則 起因於此薄膜的負値的熱膨脹係數之熱收縮力將增 -10- 201008770 加,有使印刷電路板往收縮方向傾斜之虞。若薄膜過 薄,則接近於設置在印刷電路板上的電路之厚度,因 離型薄膜該有的緩衝性不足且流動性不足,有對於液 晶聚合物薄膜之密合性降低之虞。 超高分子量聚烯烴薄膜之製造方法,係具有規定 的s OR及熱膨脹係數即可,無特別之限制,可利用各 種方法來製造。例如此類的超高分子量聚烯烴薄膜, 係可藉由將具有規定的特性黏度之超高分子量聚烯烴 ® 吹塑成形而製得。 進行吹塑成形時,宜使用一種於萘烷溶劑中以135 °C測得之特性黏度〔7?〕爲5dl / g以上,宜爲7dl / g '以上,尤宜8~25dl/g之超高分子量聚烯烴。 若特性黏度低於5dl / g,則拉伸強度、衝擊強度 等機械強度不足。又因熔融黏度低,於螺旋塑模中, 易發生因超高分子量聚烯烴的熔融物和模蕊之共繞行 所引起的彎曲,或模蕊的彎曲所引發之偏離,不易製 © 得均与的薄膜,其成形性差。特性黏度〔7?〕之上限 無特別之限制,惟若超過25 dl / g,則熔融黏度過高, 擠壓成形性差》 超高分子量聚烯烴的黏度平均分子量爲100萬以 上,宜爲200萬〜700萬左右,尤宜300萬~600萬左右。 爲算出黏度平均分子量所需之特性粘度數之測定方 法,係依據nS K7367 — 3 : 1999而測定。 超高分子量聚烯烴在熱壓成形溫度之剪切彈性 -11-However, further consideration of this point of view, in fact, a release film composed of a plurality of layers, a thermoplastic film having a positive thermal expansion coefficient combined with a metal layer having a positive thermal expansion coefficient will increase the thermal expansion coefficient of the TLCP film. Depending on the type of TLCP film, the stress of thermal expansion from the thermoplastic film will be transferred to the TLCP film, resulting in deformation of the TLCP film. Secondly, in order to explore an effective means for preventing the deformation of such a TLCP film, it was found that the release film was obtained by combining an ultrahigh molecular weight polyolefin film having a negative thermal expansion coefficient with a reinforcing layer having a positive thermal expansion coefficient. Not only the release property and the thickness direction are excellent, but even in the temperature range in which hot pressing is performed, the stress derived from thermal expansion can be effectively prevented from being transmitted to the TLCP film, and as a result, it is found to be applicable to a wide variety of types. The release film of the TLCP film completes the present invention. That is, the present invention is a film obtained by using a thermoplastic liquid crystal polymer which forms an optically anisotropic molten phase as (i) a substrate, a (Π) coating film or a (ruthenium substrate and a coating film 2) In the manufacturing process of the printed circuit board, a release film of 201008770 is used for hot press forming, and the release film is provided by superposing an ultrahigh molecular weight polyolefin film layer and a reinforcing layer, the ultrahigh molecular weight polyolefin film. In the layer, the molecular orientation SOR in the longitudinal direction of the film is in the range of 0.95 or more and less than 1.05, and the average thermal expansion coefficient of the film in the plane direction is negative 値, and the average thermal expansion coefficient of the reinforcing layer in the planar direction of the reinforcing layer is The release film of the above-mentioned ultrafine molecular weight polyolefin film layer, the average coefficient of thermal expansion coefficient (MUP) in the plane direction may be -1x10_cmcm/cm/°C or less, and the thermal expansion coefficient of the above-mentioned reinforcing layer in the planar direction The average (MRE) can be lxl (T6 to 30xl (T6cm/cm/°C). Further, the ultrahigh molecular weight polyolefin constituting the ultrahigh molecular weight polyolefin film layer The viscosity average molecular weight is mostly more than 10,000. In the release film, the average thermal expansion coefficient (MUP) of the ultrahigh molecular weight polyolefin film layer in the planar direction and the average thermal expansion coefficient (MRE) of the reinforcing layer in the planar direction. The average (Μτ) may also be negative 値. The thickness of each layer may be appropriately set, for example, the thickness (A) of the ultrahigh molecular weight polyolefin film layer may be about 30 to 200/zm, and the thickness of the reinforcing layer (B) , may be about 10 to 100 #m, and the thickness of the reinforcing layer (B) to the thickness (A) of the ultrahigh molecular weight polyolefin film layer (B) / (A) may be 60/40 to 10/90 The present invention further includes a method of manufacturing a printed circuit board by using a film formed of a thermoplastic liquid crystal polymer forming an optically anisotropic molten phase by (2010) a substrate, (ii) a coating film. Or (iii) a method of manufacturing a printed circuit board by hot pressing and forming a substrate and a coating film, wherein the thermosetting layer is joined to the hot plate at the time of hot press forming, as in the first to the patent application scope Release film of any of the seven items. For example, hot pressing The shape temperature may be selected from a temperature lower than a melting point of the thermoplastic liquid crystal polymer by 15 ° C or higher, and a temperature higher than the melting point by 15 ° C (for example, about 250 to 320 ° C). Also included is a printed circuit board produced by the manufacturing method. The present invention also includes an invention relating to a material for lamination, which is formed by forming a printed circuit board, a coating film, or a substrate and a coating film. a film formed by the optically anisotropic melt phase of the thermoplastic liquid crystal polymer, and placed on the circuit board and the coating film, so that the printed circuit board and the coating film are sandwiched, and the reinforcing layer is The average thermal expansion coefficient in the planar direction is a positive reinforcing layer combination 'the ultrahigh molecular weight polyolefin film constituting the release film, and is composed of a laminate material sandwiched between the hot plates for hot press forming. In the laminated material, the molecular orientation S OR of the ultrahigh molecular weight polyolefin film layer in the long direction of the film is 0.9 5 or more, and is less than 1.05, and the plane of the film The average expansion of the thermal expansion coefficient is negative Zhi. 201008770 In the present specification, the average of the thermal expansion coefficients in the planar direction is the thermal expansion coefficient in the direction of the machine axis in the plane direction of the film or the like (hereinafter simply referred to as the MD direction) and the direction orthogonal to the mechanical axis direction (hereinafter referred to as The sum of the coefficients of thermal expansion in the TD direction is divided by the average 値 of 2. Advantageous Effects of Invention According to the present invention, a super-high molecular weight polyolefin film layer having a thermal expansion coefficient of negative enthalpy and a reinforcing layer having a positive thermal expansion coefficient are combined to form a release film, so that it can be applied to a wide variety of TLCP films, and can also be reduced in printing. The board is deformed by hot press forming. By adjusting the thermal expansion coefficient of the ultrahigh molecular weight polyolefin film layer and the reinforcing layer to a specific level, the circuit deformation of the printed circuit board can be extremely prevented without pre-adjusting the thermal expansion coefficient of the TLCP film. [Embodiment] Form for carrying out the invention [release film] The release film of the present invention is a TLCP film (that is, a film formed of a thermoplastic liquid crystal polymer forming an optically anisotropic molten phase) as (i) In the manufacturing step of a printed circuit board of a substrate, a (U) coating film, or (iii) a substrate and a coating film, the film is used for hot press forming, and the release film is an ultrahigh molecular weight polyolefin film layer. And at least one type of reinforcing layer is equipped in a laminated state. .201008770 (Ultra High Molecular Weight Polyolefin Film) The ultrahigh molecular weight polyolefin film has a molecular orientation SOR of 0.95 or more and less than 1.05 in the long direction of the film, and the average thermal expansion coefficient of the film in the plane direction is negative. . When the molecular orientation SOR of the film of the ultrahigh molecular weight polyolefin film in the long direction is in the range of 0.95 or more and less than 1.05, the alignment state of the molecules can be maintained to be the same, and the cooling can be prevented during or after the hot pressing. Printed circuit boards are unevenly tilted or deformed due to the anisotropy of the film. For high-density wiring or thin boards, the SOR should be in the range of 0.98 to 1.03. In order to prevent the deformation of the circuit of the printed circuit board or the inclination of the whole circuit board, the average (MUP) of the coefficient of thermal expansion of the ultrahigh molecular weight polyolefin film in the plane direction must be negative 値, preferably 1 lx (T 6 cm / cm / ° C Hereinafter, it is more preferably a 500xl (T6~ - 10x10-6cm/cm/°C or so, especially about 400xl0_6~-30xlO_6cm/cm/°C. Since the thermal expansion coefficient of the printed circuit board is positive (for example, 18xl (T6cm) ❹ / cm / °C or so), the thermal expansion side is easily deformed due to the stress in the plane direction during hot pressing. However, the thermal expansion coefficient of the ultra-molecular weight polyolefin film constituting the release film is negative, by causing The force of deformation in the plane direction and the deformation on the heat-shrinking side can relax the thermal expansion of the entire laminated body which occurs during hot pressing. The thickness of the ultrahigh molecular weight polyolefin film is preferably in the range of 30 to 20 0 m. Especially in the range of 30 to 180 ym. If the film is too thick, the thermal contraction force of the thermal expansion coefficient of the negative enthalpy of the film will increase by -10-08708770, and the printed circuit board may be inclined in the contraction direction. If the film is too thin, it will be connected. In the thickness of the circuit provided on the printed circuit board, the cushioning property of the release film is insufficient and the fluidity is insufficient, and the adhesion to the liquid crystal polymer film is lowered. The method for producing the ultrahigh molecular weight polyolefin film The method has a predetermined s OR and a coefficient of thermal expansion, and is not particularly limited and can be produced by various methods. For example, such an ultrahigh molecular weight polyolefin film can be obtained by an ultrahigh molecular weight having a prescribed intrinsic viscosity. Polyolefin® is produced by blow molding. When performing blow molding, it is preferable to use a characteristic viscosity [7?] measured at 135 °C in a decalin solvent to be 5 dl / g or more, preferably 7 dl / g ' or more. Ultra-high molecular weight polyolefin of 8~25dl/g, especially if the intrinsic viscosity is less than 5dl / g, the mechanical strength such as tensile strength and impact strength is insufficient, and because of the low melt viscosity, it is easy to occur in the spiral mold. Due to the bending caused by the co-circumference of the melt and the core of the ultrahigh molecular weight polyolefin, or the deviation caused by the bending of the mold core, it is difficult to produce a uniform film, and the formability is poor. The intrinsic viscosity [7?] Upper limit There is no particular limitation, but if it exceeds 25 dl / g, the melt viscosity is too high, and the extrusion formability is poor. The viscosity average molecular weight of the ultrahigh molecular weight polyolefin is 1,000,000 or more, preferably about 2 million to 7 million, especially 300. 10,000 to 6 million. The method for determining the intrinsic viscosity required to calculate the viscosity average molecular weight is determined according to nS K7367-3: 1999. Shear elasticity of ultrahigh molecular weight polyolefin at hot press forming temperature-11-

201008770 率,係可選自5xl04~lxl07Pa之廣範圍,宜j xl06Pa,更宜爲 lxl05~5xl05Pa 左右(例如, 上,且低於 5xl05Pa),尤宜 lxl〇5~3xl05Pai 彈性率係依據動態黏彈性測定而測得,可藉 電流計而測定。 超高分子量聚烯烴,例如超高分子量聚 超高分子量聚丙烯等,其中,宜使用超高分 烯。超高分子量聚乙烯係包含乙烯爲重複單 烯之外,亦可包含其他共聚成份。其他共聚 丙烯、1— 丁烯、1一己烯、1 一辛烯、4 -甲 烯等碳數2〜20之α —烯烴等;丙烯酸甲酯、 酯、丙烯酸丁酯、丙烯酸2—乙基己酯、丙 酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲 丁酯、甲基丙烯酸2 —乙基己酯、甲基丙烯 等—不飽和羧酸酯;丙烯腈、甲基丙舞 醛、甲基丙烯醛、乙烯基乙基醚、苯乙烯、 酯等。此類共聚成份,係可單獨使用或組合 而使用。此類共聚成份中,宜爲α —烯烴。 量聚乙烯,係含有上述重複單位99.5mol% i 有99.8mol%以上。 超高分子量聚烯烴中,可依需求配合無 材、或纖維、造核劑、離型劑、抗氧化劑(抗 熱安定劑等》其係可單獨使用或2種以上併 上述無機塡充劑無特別之限制,例如碌 隱 1x105~5 1 X 1 05 以 Ξ右。剪切 由黏彈性 乙稀、或 子量聚乙 .位,除乙 :成份例如 基—1 —戊 丙烯酸乙 烯酸環己 基丙烯酸 酸環己酯 自腈、丙烯 乙酸乙烯 • 2種以上 超高分子 认上,宜含 ;機塡充 老化劑)、 :用。 丨酸鈣、氧 -12- 201008770 化鈦、雲母、滑石、硫酸鋇、氧化鋁、氧化矽、水白 錯礦等層狀複水合物等。 上述纖維無特別之限制,例如玻璃纖維、碳纖維、 硼纖維、碳化矽纖維、氧化鋁纖維等無機纖維;芳香 族聚醯胺等有機纖維等。 上述抗氧化劑無特別之限制,例如1,3,5 -三甲基 —2,4,6 —參(3,5_二第三丁基一4 —羥苄基)苯、3,9 -雙{2— [3- (3—第三丁基-4-羥基一 5—甲基苯 ® 基)—丙醯氧]-1,1-二甲基乙基}-2,4,8,10 —四氧雜 螺[5,5]十一烷等受阻苯酚系抗氧化劑等。 上述熱安定劑無特別之限制,例如磷酸參(2,4 -二第三丁基苯酯)、磷酸三月桂基酯、磷酸2 -第三丁 基—α —(3—第三丁基—4 —羥苯基)—對異丙苯酯、 雙(對壬基苯酯)、3,3’一硫二丙酸二肉豆蔻基酯、3,3’ _硫二丙酸二硬脂基酯、四(3 —月桂基硫丙酸)季戊 四醇酯、3,3’一硫二丙酸雙十三烷基酯等。 © 使用此類之超高分子量聚烯烴,以既知或慣用之 方法來進行吹塑成形,可製得具有用於本發明的規定 的SOR和熱膨脹係數之超高分子量聚烯烴薄膜。又, 製得之薄膜除具有規定之S OR和熱膨脹係數,亦可導 入三次元之交聯’提升聚合時的聚合物之聚合度,或 可於聚合後進行電子射線交聯等後處理。超高分子量 聚烯烴薄膜係可以單層而使用,亦可爲複數層結構, 更可依需求以由不同材質形成之薄膜來進行複數層 -13- .201008770 化。 (補強層) 補強層係於補強層的平面方向的熱膨脹係數之平 均必須爲正値,例如,宜爲lxl(T6〜30x10— 6cm/cm/ °C之範圍內。 若熱膨脹係數爲負値,與超高分子量聚烯烴薄膜 的負値的熱膨脹係數之合成和,會使熱收縮程度增 加,而使印刷電路板往收縮方向傾斜。另一方面,若 ^ 熱膨脹係數過高,則印刷電路板相反地往膨脹方向傾 斜。 補強層宜具有耐熱性。藉由熱熔融將由液晶聚合 物而成之被覆層薄膜黏合於印刷電路板時,積層溫度 必須高,一般爲26(TC以上。因此,適用於補強板之材 料,係少發生氧化劣化之金屬箔,例如使用鋁箔、不 鏽鋼箔。其它材料,宜爲熱硬化性樹脂之聚醯亞胺薄 膜等。此類材料係可單獨使用,亦可倂用2種以上。 ® 又,補強層係可以單層而使用,亦可爲複數層結構,更 可依需求以由不同材質形成之薄膜來進行複數層化。 補強層之厚度宜爲1〇~1 〇〇 Mm之範圍內,尤宜 20~50//m之範圍內。補強層若過厚,平面方向的熱膨 脹係數爲正値之影響增大,而抵銷超高分子量聚烯烴 薄膜的負値的熱膨脹係數之影響,而使印刷電路板傾 斜。而若補強層過薄,超高分子量聚烯烴薄膜的負値 的熱膨脹係數之影響增大,使得印刷電路板傾斜。 -14-201008770 rate, can be selected from a wide range of 5xl04~lxl07Pa, preferably j xl06Pa, more preferably lxl05~5xl05Pa (for example, above, and below 5xl05Pa), especially lxl〇5~3xl05Pai elastic rate based on dynamic viscoelasticity It can be measured by measurement and can be measured by an ammeter. Ultrahigh molecular weight polyolefins such as ultrahigh molecular weight poly ultrahigh molecular weight polypropylenes and the like, among which ultrahigh olefins are preferably used. The ultrahigh molecular weight polyethylene may contain ethylene as a repeating monoolefin, and may also contain other copolymerization components. Other copolypropylene, 1-butene, 1-hexene, 1-octene, 4-methylene, etc., carbon 2 to 20, etc.; methyl acrylate, ester, butyl acrylate, 2-ethylhexyl acrylate Ester, propyl ester, methyl methacrylate, ethyl methacrylate, methyl butyl acrylate, 2-ethylhexyl methacrylate, methacrylic acid, etc. - unsaturated carboxylic acid ester; acrylonitrile, methyl propyl aldehyde , methacrolein, vinyl ethyl ether, styrene, ester, and the like. Such copolymerized components can be used singly or in combination. Among such copolymer components, α-olefin is preferred. The amount of polyethylene contained 99.5 mol% of the above repeating unit and 99.8 mol% or more. In the ultrahigh molecular weight polyolefin, it can be blended with no materials, fibers, nucleating agents, release agents, antioxidants (anti-heat stabilizers, etc.) according to requirements, and can be used alone or in combination of two or more kinds of inorganic chelating agents. Special restrictions, such as Lu Yin 1x105~5 1 X 1 05 to Ξ right. Shearing by viscoelastic ethene, or sub-quantity, in addition to B: Ingredients such as keic-penta-acrylic acid cyclohexyl acrylate Acid cyclohexyl ester from nitrile, propylene vinyl acetate • more than two kinds of ultra-high molecular weight, should be included; machine aging agent), : use. Calcium citrate, oxygen -12- 201008770 Titanium, mica, talc, barium sulfate, alumina, cerium oxide, water white mineralization and other layered complexes. The fibers are not particularly limited, and are, for example, inorganic fibers such as glass fibers, carbon fibers, boron fibers, strontium carbide fibers, and alumina fibers; and organic fibers such as aromatic polyamines. The above antioxidant is not particularly limited, and is, for example, 1,3,5-trimethyl-2,4,6-parade (3,5-di-t-butyl- 4-hydroxybenzyl)benzene, 3,9-double {2-(3-(3-t-butyl-4-hydroxy-5-methylphenyl))-propionyloxy]-1,1-dimethylethyl}-2,4,8,10 - A hindered phenolic antioxidant such as tetraoxaspiro[5,5]undecane. The above thermal stabilizer is not particularly limited, and is, for example, phosphoric acid (2,4-di-t-butylphenyl ester), trilauryl phosphate, 2-tert-butyl-phosphate-α-(3-t-butyl-phosphate- 4-hydroxyphenyl)-p-isopropylphenyl ester, bis(p-decylphenyl ester), 3,3'-dithiodipropionate dimyristyl ester, 3,3'-thiodipropionate distearyl Ester, pentaerythritol tetrakis(3-laurylthiopropionate), ditridecyl 3,3'-dithiodipropionate, and the like. Using such an ultrahigh molecular weight polyolefin, blow molding is carried out by a known or customary method, and an ultrahigh molecular weight polyolefin film having the specified SOR and thermal expansion coefficient used in the present invention can be obtained. Further, the obtained film may have a predetermined S OR and a coefficient of thermal expansion, and may also introduce a three-dimensional cross-linking degree to enhance the degree of polymerization of the polymer during polymerization, or may be subjected to post-treatment such as electron beam crosslinking after polymerization. The ultrahigh molecular weight polyolefin film can be used in a single layer or in a plurality of layers, and a plurality of layers formed of different materials can be used as needed to carry out a plurality of layers -13-201008770. (Reinforcing layer) The average coefficient of thermal expansion of the reinforcing layer in the plane direction of the reinforcing layer must be positive, for example, preferably lxl (in the range of T6 to 30x10-6 cm/cm/°C. If the coefficient of thermal expansion is negative, The combination of the thermal expansion coefficient of the negative enthalpy of the ultrahigh molecular weight polyolefin film increases the degree of thermal shrinkage and tilts the printed circuit board in the contraction direction. On the other hand, if the coefficient of thermal expansion is too high, the printed circuit board is reversed. The ground layer is inclined in the direction of expansion. The reinforcing layer preferably has heat resistance. When the coating film made of the liquid crystal polymer is bonded to the printed circuit board by heat fusion, the build-up temperature must be high, generally 26 (TC or more. Therefore, it is suitable for The material of the reinforcing plate is a metal foil which is less oxidatively degraded, for example, an aluminum foil or a stainless steel foil is used, and other materials are preferably a polyimide film of a thermosetting resin, etc. These materials may be used alone or in combination. Two or more. ® In addition, the reinforcing layer can be used in a single layer, or in a multiple layer structure, and can be multi-layered by a film formed of different materials according to requirements. The thickness of the layer should be in the range of 1 〇~1 〇〇Mm, especially in the range of 20~50//m. If the reinforcing layer is too thick, the coefficient of thermal expansion in the plane direction is increased by the effect of positive enthalpy. The influence of the thermal expansion coefficient of the negative enthalpy of the ultrahigh molecular weight polyolefin film causes the printed circuit board to be inclined. If the reinforcing layer is too thin, the influence of the thermal expansion coefficient of the negative enthalpy of the ultrahigh molecular weight polyolefin film is increased, so that the printed circuit board Tilt. -14-

201008770 本發明之離型薄膜係上述超高分子量聚烧 與補強層以積層狀態重合。不僅以重合型態, 其整體化。超高分子量聚烯烴薄膜和補強層, 由各一枚而構成,惟亦可使用由複數枚重叠而 例如離型薄膜中,考量離型薄膜整體之熱 數時,超高分子量聚烯烴薄膜層中的平面方向 脹係數之平均(MUP)與補強層的平面方向的 係數之平均(MRE)之平均値(MT)亦可爲負 爲一lxl0_ 6~ — 200xl0_ 6cm/ cm/ °C 左右,尤宜— —150xl0_6cm / cm/°C 左右。 離型薄膜中,補強層之厚度(B)對超高 聚烯烴薄膜層之厚度(A)之比(B) / (A), 應形成各層的熱膨脹係數而適當地設定,惟拉 個熱膨脹係數之正負,而呈現離型性及密合13 點,例如,(B) / (A)宜爲 60/40~10/90 5 5 / 45 - 1 5 / 85 ° 使用於本發明的離型薄膜之超高分子量赛 膜之表面,宜具有平滑性,惟亦可具有操作两 動性、防黏連性等。爲去除熱壓成形時之空秦 至少於單面設計壓紋樣式。 又,亦可於超高分子量聚烯烴薄膜層的f 補強層側的表面,塗布矽離型劑等離型劑,公 型性。 〔印刷電路板之製造方法〕 ί烴薄膜 亦可使 一般係 '成者。 f膨脹係 I的熱膨 熱膨脹 値,宜 5x10— 6〜 分子量 係可因 i抵銷各 ;之觀 ,尤宜 €烯烴薄 ί需之滑 I,亦可 ί面側之 I提高離 -15- 201008770 本發明的印刷電路板之製造方法中,使用TLCP 薄膜作爲(i)基材、(ii)被覆層薄膜或(Hi)基材 及被覆層薄膜二者,並熱壓成形而製造印刷電路板 時,配置上述離型薄膜使補強層連接於壓熱板。 (TLCP薄膜)201008770 The release film of the present invention is characterized in that the above-mentioned ultrahigh molecular weight poly-fired and reinforcing layer overlaps in a laminated state. Not only in the form of coincidence, it is integrated. The ultrahigh molecular weight polyolefin film and the reinforcing layer are composed of one piece, but may be used in a super high molecular weight polyolefin film layer when a plurality of overlapping films are used, for example, in a release film, considering the heat number of the entire release film. The average 値(MT) of the average of the plane expansion coefficient (MUP) and the coefficient of the plane direction of the reinforcing layer (MRE) may also be negative as a lxl0_6~-200xl0_6cm/cm/°C, particularly suitable. — —150xl0_6cm / cm / °C or so. In the release film, the ratio of the thickness (B) of the reinforcing layer to the thickness (A) of the ultrahigh polyolefin film layer (B) / (A) should be appropriately set to form the thermal expansion coefficient of each layer, but the coefficient of thermal expansion is drawn. Positive and negative, showing release and adhesion 13 points, for example, (B) / (A) is preferably 60/40~10/90 5 5 / 45 - 1 5 / 85 ° used in the release film of the present invention The surface of the ultra-high molecular weight film should have smoothness, but it can also have two-acting operation and anti-adhesion. In order to remove the air-moulding, the embossing pattern is designed at least on one side. Further, a release agent such as a release agent may be applied to the surface of the ultra-high molecular weight polyolefin film layer on the side of the f-reinforcing layer to have a male form. [Manufacturing method of printed circuit board] The hydrocarbon film can also be made into a general system. f Thermal expansion 値 of the expansion system I, preferably 5x10-6~ The molecular weight can be offset by i; the view is particularly suitable for the olefin thin, the need to slide I, or the side of the I side to improve -15- 201008770 In the method of manufacturing a printed circuit board according to the present invention, a TLCP film is used as the (i) substrate, (ii) a coating film, or a (Hi) substrate and a coating film, and is formed by hot press forming to produce a printed circuit board. When the release film is disposed, the reinforcing layer is connected to the hot plate. (TLCP film)

本發明中,使用爲印刷電路板之基材或被覆層薄 膜之熱塑性液晶聚合物薄膜之原料,無特別之限制, 其具體例係如下所示(1 )〜(4 )所分類之化合物,及 由其衍生物而衍生之既知的熱向性液晶聚酯及熱向性 液晶聚酯醯胺。惟,爲製造形成光學異向性的熔融相 而得之聚合物,各原料化合物之組合,係有其適當之 範圍。 (1)芳香族或脂肪族二羥化合物(參考第1表之代表 例) (第1表) 芳讎或脂臟二羥基化合物之代表例之化學結構式 (X係氫原子或鹵原子、低級烷基、苯基等基)In the present invention, the raw material of the thermoplastic liquid crystal polymer film which is the substrate of the printed circuit board or the film of the coating layer is not particularly limited, and specific examples thereof are the compounds classified in the following (1) to (4), and Known thermotropic liquid crystal polyesters derived from derivatives thereof and thermally conductive liquid crystal polyester decylamines. However, in order to produce a polymer obtained by forming an optically anisotropic molten phase, a combination of each raw material compound has an appropriate range. (1) Aromatic or aliphatic dihydroxy compounds (refer to the representative example of Table 1) (Table 1) Chemical structural formula of a representative example of an aromatic hydrazine or a fatty dihydroxy compound (X-based hydrogen atom or halogen atom, low-grade Alkyl, phenyl, etc.)

XX

H0~〇~^〇~0H (γ 係-〇---ch2---s -等基)H0~〇~^〇~0H (γ-〇---ch2---s-etc)

HO ((¾) nOH (n爲2〜12之整數) -16- 201008770 (2)芳香族或脂肪族二羧酸(參考第2表之代表例) (第2表)HO ((3⁄4) nOH (n is an integer of 2 to 12) -16- 201008770 (2) Aromatic or aliphatic dicarboxylic acid (refer to the representative example of Table 2) (Table 2)

芳香族或脂肪族二羧酸之代表例之化學結構式 HOOC-^^-COOHChemical structural formula of a representative example of an aromatic or aliphatic dicarboxylic acid HOOC-^^-COOH

H00C 聊-Η00ί:~Ο"£^Ο~α)0ΗH00C Chat-Η00ί:~Ο"£^Ο~α)0Η

HOOC(CH2)nCOOH (η 爲 2〜12 之整數) (3 )芳香族或脂肪族羥基羧酸(參考第3表之代表例) (第3表) 芳香族或脂肪族羥基羧酸之代表例之化學結構式HOOC(CH2)nCOOH (η is an integer of 2 to 12) (3) Aromatic or aliphatic hydroxycarboxylic acid (refer to the representative example of Table 3) (Table 3) Representative examples of aromatic or aliphatic hydroxycarboxylic acid Chemical structure

ϊ〇-〇〇-ε〇〇Η Η0.ϊ〇-〇〇-ε〇〇Η Η0.

\\ />-c〇〇H (4)芳香族二胺、芳香族羥基胺或芳香族胺基羧酸(參 考第4表之代表例) (第4表) 芳香族二胺' 芳香族羥基胺或芳香族胺基羧酸之代表例之化學結構式\\ />-c〇〇H (4) Aromatic diamine, aromatic hydroxylamine or aromatic aminocarboxylic acid (refer to the representative example of Table 4) (Table 4) Aromatic diamine 'aromatic Chemical structural formula of a representative example of a hydroxylamine or an aromatic aminocarboxylic acid

I^N-^-COOH -17- 201008770 由此類原料化合物而製得之液晶闻分子之代表 例,係如含有第5表所示的結構單位之共聚物。 (第5表) 熱塑性液晶聚合物之代表例 共聚物 共聚物 ❹I^N-^-COOH -17- 201008770 A representative example of the liquid crystal sensitizing molecule obtained by such a raw material compound is a copolymer containing a structural unit shown in Table 5. (Table 5) Representative examples of thermoplastic liquid crystal polymers Copolymers Copolymers ❹

.共聚物 )~0~c 共聚物 ~o~〇-〇-°~0~γ_〇-〇- 共聚物 參 (Υ 係、_〇---ch2---s —等基) 使用於本發明之熱塑性液晶聚合物,爲具有薄膜 所預期之耐熱性及加工性,宜具有約200~約400°c之 範圍內,尤宜約25 0〜約3 5 0°C的範圍內之熔點,惟從 薄膜製造之觀點’具有較低熔點者,易於進行製造。 本發明中,上述液晶聚合物薄膜係將熱塑性液晶 聚合物擠壓成形而製得。可使用任一種擠壓成形法來 -18 · .201008770 進行,惟既知之T塑模製膜延伸法、吹塑法等,於工 業上較有助益。亦可使用將已製膜的薄膜與載持薄膜 之層壓塑料體延伸而製得之薄膜。特別是層壓塑料體 延伸法或吹塑法,不僅於薄膜之機械軸方向(以下簡 稱爲MD方向),與其直交之方向(以下簡稱爲TD方 向)亦被施予應力,因此,可製得在MD方向與TD 方向的機械性質及熱性質達平衡之薄膜。 使用本發明的離型薄膜時,不論TLCP薄膜的熱. ® 膨脹係數之變化,可使用各種TLCP薄膜爲基材或被 覆層薄膜。亦即,TLCP薄膜之熱膨脹係數,經過熱壓 成形前和成形後,可幾乎相同,亦可有變化。特別是 使用本發明的離型薄膜,而TLCP薄膜的熱膨脹係數 在熱壓成形前和成形後,發生大變化時(例如熱壓成 形後之熱膨脹係數(Ha)和熱壓成形前之熱膨脹係數 (Hb)之差爲 l〇~50xl(T6cm/cm/°C 左右,宜爲 20~40 xl(T6cm/cm/°C,可預防電路基板之變形。 9 本發明中所使用之熱塑性液晶聚合物薄膜,係可 爲任一厚度,包括2mm以下的板狀或片狀者。惟,使 用一種以熱塑性液晶聚合物薄膜爲電絕緣層之鍍銅層 壓板作爲印刷電路板時,其薄膜之膜厚度宜爲20~ 150 之範圍內,尤宜20〜50;am之範圍內。 若薄膜的厚度過薄時,因薄膜的剛性或強度變 小’將電子零件實裝於製得的印刷電路板時,因加壓 而變形,且配線的位置精度惡化,而成爲不良影響因 -19- 201008770 素。 個人電腦等的主電路板之電絕緣層,係可使用上 述熱塑性液晶聚合物薄膜和其他電絕緣性材料,例如 與玻璃布基材之複合體。又,熱塑性液晶聚合物薄膜 中,亦可配合滑劑、抗氧化劑等添加劑。 例如,印刷電路板係可以上述TLCP薄膜爲基材, 以相對於此TLCP薄膜爲既知或慣用之方法,來形成 以銅等導電體所形成之電路層而製造。此類印刷電路 琴板’例如撓性印刷電路板 '多層印刷電路板等。 使用TLCP薄膜爲被覆層薄膜時,係可藉由熱壓 成形來進行被覆層薄膜與印刷電路板之黏合。此時, 依需求可於被覆層薄膜與印刷電路板之間,使用環氧 樹脂等熱硬化樹脂,之後亦可進行熱壓成形。 本發明中,加壓成形溫度係可依據構成TLCP薄 膜的熱塑性液晶聚合物之種類而選擇適當之溫度,例 如成形溫度係可選自比熱塑性液晶聚合物的熔點低 Φ 15°C之溫度以上,且比熔點高15°C之溫度以下之範 圍。例如此類之成形溫度係可選自25 0~ 3 2 0 °C (宜爲 260~310°C )之範圍內。 熱壓成形時,係可使構成本發明的離型薄膜之補 強層側接觸於壓熱板,使超高分子量聚烯烴薄膜層側 接觸於印刷電路板之電路面或被覆層薄膜面而使用。 〔印刷電路板〕 使用本發明的離型薄膜而製得之印刷電路板,可 -20- 201008770 極其高度地預防因熱壓成形所引起之電路變形,具有 高密度之配線時,或爲薄的電路板,不受電路變形引 起的傾斜之影響,可有效地被利用》 例如,測定熱壓前後的電路板上的電路間之距離 之電路基板變形率爲0.01-0.06%左右,宜爲0.05%以 下。 〔積層用材料〕 本發明中,亦可流通爲上述TLCP薄膜和上述超 ® 高分子量聚烯烴薄膜所構成之積層用材料。此時, TLCP薄膜係爲形成印刷電路板、被覆層薄膜、或基材 及被覆層薄膜二者而使用,上述超高分子量聚烯烴薄 膜係與放置於上述電路板和上述被覆層薄膜之上下, 使上述印刷電路板和上述被覆層薄膜被夾著之補強層 組合而使用。 實施例 以下,以實施例更詳細地說明本發明,惟,本發 Φ 明不受限於本實施例。實施例中的各種物性係以下述 之方法而求得。 (分子配向度 SOR) 分子配向度 SOR ( Segment Orientation Ratio)係 表示分子配向的程度之指標,不同於先前的MOR (Molecular Orientation Ratio),係考量物體的厚度之 値。此分子配向度SOR係以下述般而算出。 首先,在既知的微波分子配向度測定機中,將液 -21- 201008770 晶聚合物薄膜插入微波共振導波管中,使薄膜面垂直 於微波之進行方向,測定透過此薄膜之微波之電場強 度(微波透過強度)。 接著,依據此測定値,由下式而算出m値(稱爲 折射率)。 m = ( Ζο / Δ z ) x C 1— v max / v o ) 惟,Zo爲裝置定數,Λζ爲平均厚度,v max係 使微波之振動數變化時,具有最大的微波透過強度之 β 振動數,νο係平均厚度爲零時(亦即無物體時),具 有最大微波透過強度之振動數。 其次,相對於微波的振動方向之物體的旋轉角爲 0°時,亦即,使微波的振動方向與物體的分子呈最佳 配向之方向,與具有最小微波透過強度的方向相符時 之m値爲m。,旋轉角爲90°時之m値爲m9。,分子配 向度SOR係由me / mo。而算出。 (熱膨脹係數 cm/ cm/ °C ) Ο 熱膨脹係數α係指從室溫至薄膜的熱變形溫度附 近爲止,以一定升溫速度而加熱時,其膨脹率除以溫 度差之係數,如下述般而算出。 首先,使用既知之熱機械分析裝置,將切成長方 形的薄膜之一端固定,於另一端施予拉伸之荷重,測 定以一定升溫速度而加熱時之膨脹量。薄膜的拉伸的 荷重方向之長度爲mm),加熱時的薄膜之長度爲 L! ( mm),溫度爲T2 ( °C ),室溫爲Ti ( °C ),熱膨脹 -22- 201008770 係數α係可由下式而算出。 « = C( Li- L〇) / ( T2- TO) / L〇 (xl0_6cm/cm / °C ) 又,本發明中,L〇= 20mm,T2 = 150T:,1= 25°C, 拉伸荷重爲1 g。 (剪切彈性率 Pa) 使用黏彈性電流計(TAInstrumentJapan公司製, AR2000),以升溫速度4°C /分,周波數1Hz,傾斜〇.1 ® %,正應力爲5N之條件來測定。 (被覆層薄膜之變形性) 積層後的印刷電路板上之被覆層薄膜之外觀,係 依據以下之基準而評價。 〇:被覆層薄膜上完全無變形、破裂、皺紋等不良現 象。 △:被覆層薄膜上無變形、破裂等不良現象,惟有輕 微皺紋。 Ο X:被覆層薄膜上有變形、破裂、皺紋等不良現象。 (離型性) 積層後,將離型薄膜從印刷電路板剝離之容易 度,係依據以下之基準而評價。 良好:熱壓成形後,可簡單地將離型薄膜從印刷電路 板剝離,且剝離後之印刷電路板不會變形。 不良:熱壓成形後,不易將離型薄膜從印刷電路板剝 離,且剝離後之印刷電路板會變形。 -23- 201008770 熱率 以分 ’ 百 離之 距値 之之 間分 路化 電變 上離 板距 > 路的 %)電後 的 率後壓 化前熱 變壓除 寸熱離 尺定距 路測的 電 後 ( 壓 而計算。 (TLCP薄膜之熔點°C ) 使用微差掃描熱量計,觀察薄膜之熱變化。亦即, 將TLCP薄膜以10°C /分之速度升溫,使之完全熔融 後,將熔融物以l〇°C /分之速度急速冷卻至50°C,再 ® 度以1 0°C /分之速度升溫時,記錄所出現的吸熱波峰 之位置以爲溶點。 (實施例1 ) 將使用作爲超高分子量聚烯烴薄膜層的分子配向 度SOR爲1.01、熱膨張係數的平均爲—221.5xl0_6cm /cm/°C、及於熱壓積層溫度的剪切彈性率爲1.5x l〇5Pa之超高分子量聚乙烯薄片(作新工業(股)製, 「Saxin newlight film innovate」,厚度 50从 m),與使 ϋ 用作爲補強層的熱膨脹係數的平均爲23xl(T6Cm/cm /°C之鋁箔(東洋鋁(股)製,單亮面型,厚度50/zm) 相疊,而構成離型薄膜。 於對羥基苯甲酸與6 -羥基- 2 -萘酸之共聚物 (對羥基苯甲酸單元和6_羥基-2 —萘酸單元之莫 耳比:73 / 27 ),將熔點爲280°C之熱塑性液晶聚合物 熔融擠壓,邊控制縱向與橫向之延伸比,同時以吹塑 薄膜成形法製得膜厚度50//m、熔點爲280°C之薄膜。 -24- .201008770 進一步將製得之薄膜放置於260°C之熱風乾燥機中3 小時,藉由熱處理可製得熔點爲290°C之薄膜。以此 薄膜爲基礎薄膜,將厚度18/zm之銅箔放置於基礎薄 膜上下,維持於加壓溫度290°C、加壓壓力4MPa、加 壓時間60分鐘後,冷卻至1 00°C並於開放加壓壓力之 條件下製得鍍銅層壓板。又,依據印刷配線的IPC B - 25之評價圖形而進行電路加工,以此爲印刷電路 板。 ® 於對羥基苯甲酸與6—羥基一 2—萘酸之共聚物 (對羥基苯甲酸單元和6—羥基_2-萘酸單元之莫 耳比:73 / 27 ),將熔點爲280°C之熱塑性液晶聚合物 熔融擠壓,邊控制縱向與橫向之延伸比,同時以吹塑 成形法製得膜厚度25 A m、熔點爲28 0°C之薄膜。於此 薄膜上,隨意地開5處直徑20mm之穿孔,使用此爲 被覆層薄膜。 (撓性印刷電路板之作成) Φ 上述依離型薄膜、被覆層薄膜、印刷電路板、離 型薄膜之順序相叠而成者,以此爲1單位,將10單位 設置於熱壓板上,維持於加壓溫度280 °C、加壓壓力 2MPa、加壓時間60分鐘後,冷卻至100°C並於開放加 壓壓力之條件下,真空加壓成形後,剝開離型薄膜而 製得撓性印刷電路板。離型薄膜之離型性及撓性印刷 電路板之電路尺寸變化率,係如第6表所示。 (實施例2) -25- 201008770 除將使用作爲超高分子量聚烯烴薄膜層的分子配 向度SOR爲1.02、熱膨脹係數的平均爲一 85.4xl(T0cm / cm/ °C、及於熱壓積層溫度的剪切彈性率爲1.5 X 105P a之超高分子量聚乙烯薄片(作新工業(股)製, 「Saxinnewlight film innovate」,厚度 30;um),與使 用作爲補強層的熱膨脹係數的平均爲27xl(T6cm/cm /°C之聚醯亞胺薄膜(東麗《Du Pont(股)製,「Kapton Η」,厚度25#m)相叠,而構成離型薄膜之外,和實 ® 施例1相同的作法而製得撓性印刷電路板。離型薄膜 之離型性及撓性印刷電路板之電路尺寸變化率,係如 第6表所示。 (實施例3) 除補強層係使用熱膨脹係數的平均爲16xl(T6Cm / cm/ °C之鋁箔(JFE鋼業(股)製,「SUS304H」,厚 度50/im),作爲離型薄膜之構成材料之外,和實施例 1相同的作法而製得撓性印刷電路板。離型薄膜之離 ® 型性及撓性印刷電路板之電路尺寸變化率,係如第6 表所示。 (實施例4) 除將使用於實施例1的薄片3枚重疊成150 之厚度而作爲超高分子量聚烯烴薄膜層之外,和實施 例1相同的作法而製得撓性印刷電路板。離型薄膜之 離型性及撓性印刷電路板之電路尺寸變化率,係如第 6表所示》 -26- 201008770 (比較例1 ) 除使用分子配向度S OR爲1.20、熱膨脹係數的平 均爲27 0xl(T6cm/cm/°C、及於熱壓積層溫度的剪切 彈性率爲lxl05Pa之高密度聚乙烯薄片(大倉工業(股) 製,厚度100/zm)來取代超高分子量聚烯烴薄膜層而 構成離型薄膜之外,和實施例1相同的作法而製得撓 性印刷電路板。離型薄膜之離型性及撓性印刷電路板 之電路尺寸變化率,係如第6表所示。 ® (比較例2) 除使用分子配向度SOR爲1.00,熱膨脹係數的平 均爲100xl(T6cm/cm/°C,及於熱壓積層溫度的剪切 彈性率爲lxl 08Pa之氟樹脂薄片(日東電工(股)製, 「NITOFLON」,厚度100"m)來取代超高分子量聚 烯烴薄膜層而構成離型薄膜之外,和實施例2相同的 作法而製得撓性印刷電路板。離型薄膜之離型性及撓 性印刷電路板之電路尺寸變化率,係如第6表所示。 • (比較例3) 除超高分子量聚烯烴薄膜層係使用分子配向度 SOR爲1.00、熱膨脹係數的平均爲295xl0_6cm/cm /°C、及於熱壓積層溫度的剪切彈性率爲2xl06Pa之 超高分子量聚乙烯薄片(淀川 Hu-Tech (股)製, 「UPE」,厚度100/zm)而構成離型薄膜之外,和實 施例1相同的作法而製得撓性印刷電路板。離型薄膜 之離型性及撓性印刷電路板之電路尺寸變化率,係如 -27- .201008770 第6表所示。 (比較例4) 除僅以分子配向度SOR爲1.00、熱膨脹係數的 均爲295xlO_6cm/cm/°C及於熱壓積層溫度的剪 彈性率爲2xl06Pa之超高分子量聚乙烯薄片(淀 1111-丁6«;11(股)製,「1;?丑」,厚度1〇〇以111)來形成 型薄片之外,和實施例1相同的作法而製得撓性印 電路板。離型薄膜之離型性及撓性印刷電路板之電 ® 尺寸變化率,係如第6表所示。 (比較例5) 除補強層係使用熱膨脹係數的平均爲- 5xl(T6 / cm/ °C之液晶聚合物薄膜(Kuraray(股)製,「FA 厚度50//m),作爲離型薄膜之構成材料之外,和實 例1相同的作法而製得撓性印刷電路板。離型薄膜 離型性及撓性印刷電路板之電路尺寸變化率,係如 6表所示。 參 平 切 川 離 刷 路 cm 」1 施 之 第 -28- 201008770 參e (嗽9濉) 比較例 超高分子量聚乙烯 8 1-H s Τ -221.5 1.5xl05 LCP r- I 1 κη 1 X 良好 0.30 寸 1.00 〇 Ό CS 沄 m vn CN 2xl06 m I 1 1 1 X 良好 0.20 CO γ2 1.00 I 〇 OJ CO m a 2xl06 s cn cs CO <N <3 良好 0.10 CN 氟樹脂 ______ J 8 »—Η 1.00 8 p Η 8 8 lxlO8 聚醯亞胺 X 良好 0.30 > 高密度 聚乙烯j § S 寸 g o CS 1x10s s cn cs CO <N X 不良 0.25 實施例 寸 超高分子量聚乙烯 g r~H ι_ _Η s 寸 -221.5 1.5x10s s s m cs 〇 良好 0.01 m r-Η s 寸 -221.5 1.5x10s 不銹鋼 VO VO V〇 〇 良好 0.02 1.02 oq τ o H — 85.4 1.5x10s 聚醯亞胺 CN 〇 良好 0.03 Γ· < «'w s 寸 -221.5 1.5x10s m CN 〇 良好 S 〇 樹脂 i 1 厚度 (Aim) SOR Q S 平均 /-N Ph SwX » Φ BtoL έπ τΠΤ\ 材質 厚度 ("m) 1 e 平均 被覆層薄膜變形 離型性 電路尺寸變化率(%) 分子配向度 熱膨脹係數 (xl0~6cm/ cm /°C) 熱膨脹係數 H o a T° /°C) 概 鼷 _ m 4Π< 狸 m 逾 -6ζ- .201008770 如第6表所示般,實施例1及實施例2中,因將具有 特定的熱膨脹係數之樹脂層和補強層組合,故即使進行熱 壓成形’電路尺寸變化率低,可提升熱壓成形前後的電路 基板之尺寸安定性。又,補強層之材質爲不銹鋼時(實施 例3 )’或超高分子量聚烯烴薄膜層之厚度變厚時(實施例 4),可更進一步提升電路尺寸變化率。 使用實施例1〜4之離型薄膜時,可進行對於被覆層薄 膜不發生任何變形之熱壓。因此,對於具有開口部位之被 0 覆層薄膜,使用上述實施例之離型薄膜時,可有效地預防 被覆層薄膜之開口部位在熱壓後發生變形。 另一方面,比較例1〜5中,因熱壓成形引起的電路尺 寸變化率比實施例中的更高,即使電路尺寸無變化時,其 變化率亦爲實施例1及2的3倍以上,亦會發生實施例4 的10倍以上之電路尺寸變化。又,使用比較例1~5之離型 薄膜時,於熱壓後,對於被覆層薄膜,發生輕微的皺紋、 變形、破裂、皴摺等不良形態。 φ 【圖式簡單說明】 無。 【主要元件符號說明】 無。 -30-.Copolymer)~0~c Copolymer ~o~〇-〇-°~0~γ_〇-〇- Copolymer ginseng (Υ, _〇---ch2---s — etc.) The thermoplastic liquid crystal polymer of the present invention preferably has a heat resistance and processability expected from the film, and preferably has a melting point in the range of about 200 to about 400 ° C, particularly preferably in the range of about 25 0 to about 350 ° C. However, from the viewpoint of film manufacturing, it has a lower melting point and is easy to manufacture. In the present invention, the liquid crystal polymer film is obtained by extrusion molding a thermoplastic liquid crystal polymer. It can be carried out by any one of the extrusion molding methods -18 · .201008770, but it is known that the T-die film stretching method and the blow molding method are industrially helpful. A film obtained by stretching a film formed film and a laminated plastic body carrying the film may also be used. In particular, the laminated plastic body stretching method or the blow molding method is applied not only to the mechanical axis direction of the film (hereinafter referred to as the MD direction) but also to the direction orthogonal thereto (hereinafter referred to as the TD direction), so that it can be obtained. A film that balances the mechanical properties and thermal properties in the MD and TD directions. When the release film of the present invention is used, various TLCP films can be used as the substrate or the coated film regardless of the change in the thermal expansion coefficient of the TLCP film. That is, the thermal expansion coefficient of the TLCP film may be almost the same or may vary before and after the hot press forming. In particular, the release film of the present invention is used, and the thermal expansion coefficient of the TLCP film is greatly changed before and after the hot press forming (for example, the coefficient of thermal expansion (Ha) after hot press forming and the coefficient of thermal expansion before hot press forming ( The difference between Hb) is l〇~50xl (about T6cm/cm/°C, preferably 20~40 xl (T6cm/cm/°C, which can prevent deformation of the circuit substrate. 9) Thermoplastic liquid crystal polymer used in the present invention. The film may be of any thickness, including a plate shape or a sheet shape of 2 mm or less. However, when a copper plated laminate having a thermoplastic liquid crystal polymer film as an electrically insulating layer is used as a printed circuit board, the film thickness of the film is used. It should be in the range of 20 to 150, especially in the range of 20 to 50; am. If the thickness of the film is too thin, the rigidity or strength of the film becomes small. When the electronic component is mounted on the printed circuit board. It is deformed by pressurization, and the positional accuracy of the wiring is deteriorated, which is an adverse effect. -19- 201008770. The electrical insulating layer of the main circuit board such as a personal computer can use the above thermoplastic liquid crystal polymer film and other electrical insulation. Material, for example A composite of a glass cloth substrate. Further, in the thermoplastic liquid crystal polymer film, an additive such as a lubricant or an antioxidant may be blended. For example, a printed circuit board may be a substrate of the above TLCP film, and is known as a TLCP film. Or a conventional method for forming a circuit layer formed of a conductor such as copper. Such a printed circuit board such as a flexible printed circuit board, a multilayer printed circuit board, etc. When a TLCP film is used as a coating film, The coating film and the printed circuit board can be bonded by hot press forming. In this case, a thermosetting resin such as an epoxy resin can be used between the coating film and the printed circuit board, and then hot pressing can be performed between the coating film and the printed circuit board. In the present invention, the press forming temperature may be selected according to the kind of the thermoplastic liquid crystal polymer constituting the TLCP film, and the forming temperature may be selected from a temperature lower than the melting point of the thermoplastic liquid crystal polymer by 15 ° C. The above range is lower than the melting point by a temperature of 15 ° C. For example, the forming temperature of such a type may be selected from the range of 25 0 to 30 ° C (preferably 260 to 310 ° C). In the hot press forming, the reinforcing layer side constituting the release film of the present invention is brought into contact with the hot plate, and the ultrahigh molecular weight polyolefin film layer side is brought into contact with the circuit surface or the coated film surface of the printed circuit board. [Printed circuit board] The printed circuit board obtained by using the release film of the present invention can be extremely highly prevented from deformation of the circuit due to hot press forming, and has a high density wiring, or The thin circuit board can be effectively utilized without being affected by the tilt caused by the deformation of the circuit. For example, the deformation rate of the circuit substrate for measuring the distance between the circuits on the circuit board before and after the hot pressing is about 0.01-0.06%, preferably Less than 0.05%. [Material for lamination] In the present invention, a material for lamination which is composed of the above TLCP film and the above-mentioned super ® high molecular weight polyolefin film may be passed. In this case, the TLCP film is used to form a printed circuit board, a coating film, or a substrate and a coating film, and the ultrahigh molecular weight polyolefin film is placed on the circuit board and the coating film. The printed circuit board and the reinforcing layer sandwiched by the coating film are used in combination. EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited by the examples. The various physical properties in the examples were determined by the following methods. (Molecular Orientation SOR) SOR (Segment Orientation Ratio) is an index indicating the degree of molecular alignment. Unlike the previous MOR (Molecular Orientation Ratio), it considers the thickness of an object. This molecular orientation SOR is calculated as follows. First, in the known microwave molecular aligning machine, the liquid-21-201008770 crystalline polymer film is inserted into the microwave resonant waveguide, so that the film surface is perpendicular to the direction of the microwave, and the electric field strength of the microwave passing through the film is measured. (Microwave transmission intensity). Next, based on this measurement, m値 (referred to as a refractive index) was calculated from the following formula. m = ( Ζο / Δ z ) x C 1— v max / vo ) However, Zo is the device constant, Λζ is the average thickness, and v max is the β vibration with the largest microwave transmission intensity when the vibration number of the microwave is changed. The number, νο is the number of vibrations with the maximum microwave transmission intensity when the average thickness is zero (that is, when there is no object). Secondly, when the rotation angle of the object with respect to the vibration direction of the microwave is 0°, that is, the direction in which the vibration direction of the microwave is optimally aligned with the molecules of the object, and the direction with the minimum microwave transmission intensity is m値Is m. When the rotation angle is 90°, m値 is m9. The molecular orientation SOR is composed of me / mo. And calculate. (coefficient of thermal expansion cm/cm/°C) Ο The coefficient of thermal expansion α refers to the coefficient of expansion divided by the temperature difference when heated at a constant temperature rise rate from room temperature to the vicinity of the heat distortion temperature of the film, as follows. Calculated. First, one of the ends of the cut-away film was fixed by using a known thermomechanical analysis device, and the tensile load was applied to the other end, and the amount of expansion at a certain temperature increase rate was measured. The length of the tensile direction of the film is mm), the length of the film when heated is L! (mm), the temperature is T2 (°C), the room temperature is Ti (°C), and the thermal expansion -22- 201008770 coefficient α It can be calculated by the following formula. « = C( Li- L〇) / ( T2- TO) / L〇 (xl0_6cm/cm / °C) Further, in the present invention, L〇 = 20mm, T2 = 150T:, 1 = 25°C, stretching The load is 1 g. (Shear modulus Pa) A viscoelastic galvanometer (AR2000, manufactured by TA Instruments Japan) was used to measure at a temperature increase rate of 4 ° C /min, a number of cycles of 1 Hz, a tilt of 1.1 ® %, and a normal stress of 5 N. (Deformability of coating film) The appearance of the coating film on the printed circuit board after lamination was evaluated based on the following criteria. 〇: The coating film has no defects such as deformation, cracking and wrinkles. △: There is no problem such as deformation or cracking on the coating film, and only slight wrinkles are observed. Ο X: There are defects such as deformation, cracking, and wrinkles on the coating film. (Releasability) The ease of peeling off the release film from the printed circuit board after lamination was evaluated based on the following criteria. Good: After hot press forming, the release film can be simply peeled off from the printed circuit board, and the printed circuit board after peeling is not deformed. Poor: After hot press forming, it is difficult to peel off the release film from the printed circuit board, and the printed circuit board after peeling will be deformed. -23- 201008770 The heat rate is divided into two parts: the distance between the distances and the distance between the boards and the distance between the boards. The percentage of the roads. After the rate of electricity, the pressure is changed before the pressure is changed. After the electric test of the road test (calculated by pressure. (The melting point of the TLCP film °C), the thermal change of the film is observed using a differential scanning calorimeter. That is, the TLCP film is heated at a rate of 10 ° C / min to make it completely After melting, the melt was rapidly cooled to 50 ° C at a rate of 10 ° C /min, and when the temperature was increased at a rate of 10 ° C /min, the position of the endothermic peak appeared as a melting point. Example 1) The molecular orientation SOR of the ultrahigh molecular weight polyolefin film layer was 1.01, the average thermal expansion coefficient was -221.5 x 10 cm / cm / ° C, and the shear modulus at the hot laminate temperature was 1.5. Xl〇5Pa ultra-high molecular weight polyethylene sheet (made of New Industry Co., Ltd., "Saxin new light film innovate", thickness 50 from m), and the average coefficient of thermal expansion of ϋ used as a reinforcing layer is 23xl (T6Cm/cm) / °C aluminum foil (made by Toyo Aluminum Co., Ltd., single bright type, thickness 50/zm) Forming a release film. Copolymer of p-hydroxybenzoic acid with 6-hydroxy-2-naphthoic acid (mole ratio of p-hydroxybenzoic acid unit and 6-hydroxy-2-naphthoic acid unit: 73 / 27), melting point The thermoplastic liquid crystal polymer of 280 ° C is melt-extruded, and the elongation ratio of the longitudinal direction and the transverse direction is controlled, and a film having a film thickness of 50 / / m and a melting point of 280 ° C is obtained by a blown film forming method. -24 - .201008770 Further, the obtained film was placed in a hot air dryer at 260 ° C for 3 hours, and a film having a melting point of 290 ° C was obtained by heat treatment. With this film as a base film, a copper foil having a thickness of 18 / zm was placed thereon. The base film was maintained at a pressurization temperature of 290 ° C, a pressurization pressure of 4 MPa, a pressurization time of 60 minutes, and then cooled to 100 ° C to obtain a copper-plated laminate under an open pressurization pressure. The printed circuit board is processed by IPC B-25 and printed as a printed circuit board. ® Copolymer of p-hydroxybenzoic acid with 6-hydroxy-2-naphthoic acid (p-hydroxybenzoic acid unit and 6-hydroxyl group) Mohr ratio of _2-naphthoic acid unit: 73 / 27 ), thermoplastic with melting point of 280 ° C The liquid crystal polymer is melt-extruded, and the longitudinal and lateral extension ratios are controlled, and a film having a film thickness of 25 Å and a melting point of 280 ° C is obtained by blow molding. On this film, five diameters are randomly opened. 20mm perforation, using this as a coating film. (Creation of flexible printed circuit board) Φ The above-mentioned release film, coating film, printed circuit board, and release film are stacked in this order. Unit, 10 units are set on the hot plate, maintained at a pressurization temperature of 280 ° C, a pressurization pressure of 2 MPa, a pressurization time of 60 minutes, and then cooled to 100 ° C under the conditions of open pressurization pressure, vacuum addition After press forming, the release film is peeled off to obtain a flexible printed circuit board. The release property of the release film and the circuit dimensional change rate of the flexible printed circuit board are shown in Table 6. (Example 2) -25- 201008770 The molecular orientation SOR of the ultrahigh molecular weight polyolefin film layer was 1.02, and the average thermal expansion coefficient was 85.4xl (T0cm / cm / °C, and the temperature of the hot laminate layer). An ultrahigh molecular weight polyethylene sheet having a shear modulus of 1.5 X 105 Pa (for "new industry", "Saxinnewlight film innovate", thickness 30; um), and an average of 27 x 1 for the coefficient of thermal expansion used as a reinforcing layer (T6cm/cm / °C polyimide film (Don Pont "Kapton", "25" thick), which forms a release film, and the real example A flexible printed circuit board is obtained in the same manner. The release property of the release film and the circuit dimensional change rate of the flexible printed circuit board are shown in Table 6. (Example 3) In addition to the reinforcing layer system The average thermal expansion coefficient is 16xl (aluminum foil of T6Cm / cm / °C ("SUS304H", thickness: 50/im), which is the same as that of the first embodiment except for the constituent material of the release film. A flexible printed circuit board is produced by the method. The release film is separated from the type and the flexible printed circuit The circuit dimensional change rate of the panel is as shown in Table 6. (Example 4) Except that the sheet used in Example 1 was laminated to a thickness of 150 to be an ultrahigh molecular weight polyolefin film layer, and A flexible printed circuit board was produced in the same manner as in Example 1. The release property of the release film and the circuit dimensional change rate of the flexible printed circuit board were as shown in Table 6 -26-201008770 (Comparative Example 1) In addition to the high-density polyethylene sheet using a molecular orientation S OR of 1.20, an average thermal expansion coefficient of 27 0xl (T6cm/cm/°C, and a shear modulus at a thermocomposite temperature of 1x10Pa) (Dazura Industry Co., Ltd.) A flexible printed circuit board was produced in the same manner as in Example 1 except that the ultrahigh molecular weight polyolefin film layer was replaced by a super high molecular weight polyolefin film layer to form a release film. Release property and flexibility of the release film. The circuit dimensional change rate of the printed circuit board is shown in Table 6. ® (Comparative Example 2) The average thermal expansion coefficient is 100xl (T6cm/cm/°C, and hot pressing, except that the molecular orientation SOR is 1.00. The fluorinated resin sheet with a shear modulus of laminating temperature of lxl 08Pa (Nitto Denko A flexible printed circuit board was produced in the same manner as in Example 2 except that "NITOFLON", thickness 100 "m) was used instead of the ultrahigh molecular weight polyolefin film layer to form a release film. The release ratio and the circuit size change rate of the flexible printed circuit board are shown in Table 6. • (Comparative Example 3) The ultrahigh molecular weight polyolefin film layer was used with a molecular orientation SOR of 1.00 and a thermal expansion coefficient. An ultra-high molecular weight polyethylene sheet (manufactured by Yodogawa Hu-Tech Co., Ltd., "UPE", thickness 100/zm) having an average shear modulus of 2x10 6 Pa at a thermocomposite temperature of 295 x 10 0 6 cm / cm / ° C A flexible printed circuit board was produced in the same manner as in Example 1 except for the release film. The release property of the release film and the circuit size change rate of the flexible printed circuit board are as shown in Table 6 of -27-.201008770. (Comparative Example 4) An ultrahigh molecular weight polyethylene sheet having a molecular orientation degree SOR of 1.00, a thermal expansion coefficient of 295 x 10 6 cm/cm/° C. and a shear modulus of 2x106 Pa at a thermocompression layer temperature. A flexible printed circuit board was produced in the same manner as in Example 1 except that the film was formed by a film of "1" and "11". The release properties of the release film and the electrical ® dimensional change rate of the flexible printed circuit board are shown in Table 6. (Comparative Example 5) A liquid crystal polymer film (manufactured by Kuraray Co., Ltd., "FA thickness 50//m") having an average thermal expansion coefficient of -5xl ("FA thickness 50/m") was used as the release film. In addition to the constituent materials, a flexible printed circuit board was produced in the same manner as in Example 1. The release film release property and the circuit dimensional change rate of the flexible printed circuit board were as shown in Table 6. Road cm ”1 shi -28- 201008770 参e (嗽9濉) Comparative example ultra high molecular weight polyethylene 8 1-H s Τ -221.5 1.5xl05 LCP r- I 1 κη 1 X Good 0.30 inch 1.00 〇Ό CS沄m vn CN 2xl06 m I 1 1 1 X Good 0.20 CO γ2 1.00 I 〇OJ CO ma 2xl06 s cn cs CO <N <3 Good 0.10 CN Fluoro Resin ______ J 8 »—Η 1.00 8 p Η 8 8 lxlO8 Polyimine X Good 0.30 > High Density Polyethylene j § S inch go CS 1x10s s cn cs CO <NX Bad 0.25 Example Inch Ultra High Molecular Weight Polyethylene gr~H ι_ _Η s inch-221.5 1.5x10s ssm Cs 〇 good 0.01 m r-Η s inch-221.5 1.5x10s stainless steel VO VO V〇〇 good 0.02 1.02 Oq τ o H — 85.4 1.5x10s Polyimine CN 〇 Good 0.03 Γ· < «'ws inch-221.5 1.5x10s m CN 〇Good S 〇 resin i 1 Thickness (Aim) SOR QS Average /-N Ph SwX » Φ BtoL έπ τΠΤ\ Material thickness ("m) 1 e Average coating film deformation release circuit size change rate (%) Molecular alignment degree thermal expansion coefficient (xl0~6cm/cm /°C) Thermal expansion coefficient H oa T° /°C) Overview _ m 4Π<Beet m -6ζ-.201008770 As shown in Table 6, in Example 1 and Example 2, a combination of a resin layer having a specific thermal expansion coefficient and a reinforcing layer is used. Therefore, even if hot press forming is performed, the circuit size change rate is low, and the dimensional stability of the circuit board before and after hot press forming can be improved. Further, when the material of the reinforcing layer is stainless steel (Example 3)' or when the thickness of the ultrahigh molecular weight polyolefin film layer is increased (Example 4), the circuit dimensional change rate can be further improved. When the release film of Examples 1 to 4 was used, it was possible to carry out hot pressing without any deformation of the coating film. Therefore, when the release film of the above embodiment is used for the 0-coated film having the opening portion, it is possible to effectively prevent the opening portion of the coating film from being deformed after hot pressing. On the other hand, in Comparative Examples 1 to 5, the rate of change in circuit size due to hot press forming was higher than that in the examples, and the rate of change was three times or more that of Examples 1 and 2 even when the circuit size did not change. A circuit size change of 10 times or more of Embodiment 4 may also occur. Further, when the release film of Comparative Examples 1 to 5 was used, after the hot pressing, slight defects such as wrinkles, deformation, cracking, and collapse were caused to the coating film. φ [Simple description of the diagram] None. [Main component symbol description] None. -30-

Claims (1)

201008770 七、申請專利範圍·· 1. 一種離型薄膜,其係於使用由形成光學異向性的熔融相 之熱塑性液晶聚合物而成之薄膜作爲(〇基材、(π)被 覆層薄膜或(iii)基材及被覆層薄膜二者之印刷電路板 之製造步驟中,進行熱壓成形時而使用之離型薄膜, 該離型薄膜係將超高分子量聚烯烴薄膜層和補強層重 疊而裝備, 該超高分子量聚烯烴薄膜層,於薄膜的長方向之分子 φ 配向度SOR爲0.95以上且低於1.05之範圍,又薄膜的 平面方向的熱膨脹係數之平均爲負値, 該補強層於補強層的平面方向的熱膨脹係數之平均爲 正値。 2. 如申請專利範圍第1項之離型薄膜,其中超高分子量聚 烯烴薄膜層,於平面方向的熱膨脹係數之平均(MUP), 爲一1x10— 6cm/ cm/ °C 以下。 3. 如申請專利範圍第1或2項之離型薄膜,其中構成超高 g 分子量聚烯烴薄膜層之超高分子量聚烯烴,係黏度平均 分子量100萬以上。 4. 如申請專利範圍第1至3項中任一項之離型薄膜,其中補 強層於平面方向的熱膨脹係數之平均(MRE),爲lxl(T f 至 30xl(T6cm/cm/°C 之範圍內。 5. 如申請專利範圍第1至4項中任一項之離型薄膜,其中 超高分子量聚烯烴薄膜層之厚度(A)爲30至200/zm。 6. 如申請專利範圍第1至5項中任一項之離型薄膜,其中 補強層之厚度(B)爲10至l〇〇gm。 -31- 201008770 7. 如申請專利範圍第1至6項中任一項之離型薄膜,其中 補強層之厚度(B)對超高分子量聚烯烴薄膜層之厚度 (A)之比,(B) / (A),爲 60 / 40 至 10/90。 8. —種印刷電路板之製法,其係藉由使用由形成光學異向 性的熔融相之熱塑性液晶聚合物而成之薄膜作爲(i)基 材、(Π)被覆層薄膜或(iii)基材及被覆層薄膜二者, 並熱壓成形而製造印刷電路板之方法, 其中在熱壓成形時,係使補強層連接於壓熱板而配置 ® 如申請專利範圍第1至7項中任一項之離型薄膜。 9 _如申請專利範圍第8項之印刷電路板之製法,其中熱壓 成形係於選自比形成光學異向性的熔融相之熱塑性液晶 聚合物的熔點低1 5 t之溫度以上,且比熔點高1 5 °C之溫 度以下之範圍的溫度下進行。 1 0·如申請專利範圍第8或9項之印刷電路板之製法,其中 熱壓成形之溫度爲250至320 °C。 1 1 種印刷電路板,其係以如申請專利範圍第8至1 0項中 ® 任一項之方法而製造》 12.—種積層用材料,其係以由形成爲形成印刷電路板、被 覆層薄膜、或基材及被覆層薄膜二者之光學異向性的熔 融相之熱塑性液晶聚合物所成之薄膜,和 放置於該電路板和該被覆層薄膜之上下,使該印刷電 路板和該被覆層薄膜被夾著,且與補強層的平面方向的 熱膨脹係數之平均爲正値之補強層組合,構成離型薄膜 之超高分子量聚烯烴薄膜, 而構成’係一種夾於壓熱板間,爲進行熱壓成形之積 -32- 201008770 層用材料, 此超高分子量聚烯烴薄膜 配向度SOR爲0.95以上, 的平面方向之熱膨脹係數之 層,於薄膜的長方向之分子 且低於1.05之範圍,又薄膜 平均爲負値。201008770 VII. Patent Application Range·· 1. A release film which is a film obtained by using a thermoplastic liquid crystal polymer which forms an optically anisotropic molten phase as a (ruthenium substrate, (π) coating film or (iii) in the manufacturing step of the printed circuit board of both the substrate and the cover film, a release film which is used in the hot press forming, wherein the release film overlaps the ultrahigh molecular weight polyolefin film layer and the reinforcing layer The ultrahigh molecular weight polyolefin film layer has a molecular φ orientation SOR of 0.95 or more and less than 1.05 in the longitudinal direction of the film, and the average thermal expansion coefficient of the film in the plane direction is negative 値, and the reinforcing layer is The average coefficient of thermal expansion of the reinforcing layer in the planar direction is positive. 2. The release film according to claim 1, wherein the ultrahigh molecular weight polyolefin film layer has an average coefficient of thermal expansion (MUP) in the plane direction. A 1x10-6 cm/cm/°C or less. 3. The release film of claim 1 or 2, wherein the ultrahigh molecular weight polyolefin film constituting the ultrahigh molecular weight polyolefin film layer The viscosity average molecular weight is more than 1 million. 4. The release film according to any one of claims 1 to 3, wherein the average coefficient of thermal expansion (MRE) of the reinforcing layer in the plane direction is lxl (T f to The release film of any one of claims 1 to 4, wherein the ultrahigh molecular weight polyolefin film layer has a thickness (A) of 30 to 200/. The release film according to any one of claims 1 to 5, wherein the thickness (B) of the reinforcing layer is 10 to 10 gm. -31 - 201008770 7. The release film of any one of the six, wherein the ratio of the thickness of the reinforcing layer (B) to the thickness (A) of the ultrahigh molecular weight polyolefin film layer, (B) / (A), is 60 / 40 to 10 /90. 8. A method of manufacturing a printed circuit board by using a film formed of a thermoplastic liquid crystal polymer forming an optically anisotropic molten phase as (i) a substrate, a (Π) coating film or (iii) a method of manufacturing a printed circuit board by hot press forming of both a substrate and a cover film, wherein in hot press forming, The reinforcing layer is attached to the hot plate and is configured as a release film according to any one of claims 1 to 7. 9 _ The method of manufacturing a printed circuit board according to claim 8 wherein the hot press forming is performed It is selected from a temperature lower than the melting point of the thermoplastic liquid crystal polymer forming the optical phase of the optically anisotropic melting phase by a temperature of 15 volts or more and a temperature lower than the melting point by a temperature of 15 ° C. The method of manufacturing a printed circuit board according to Item 8 or 9, wherein the hot press forming temperature is 250 to 320 °C. A printed circuit board manufactured by the method of any one of claims 8 to 10 of the patent application. 12. A material for lamination, which is formed into a printed circuit board and covered. a thin film, or a film of a thermoplastic liquid crystal polymer having an optically anisotropic melt phase of both the substrate and the cover film, and placed on the circuit board and the cover film to make the printed circuit board and The coating film is sandwiched and combined with a reinforcing layer having a uniform thermal expansion coefficient in the planar direction of the reinforcing layer to form an ultrahigh molecular weight polyolefin film of the release film, and the composition is a type of sandwiched hot plate. In order to carry out the hot press forming product -32-201008770 layer material, the ultrahigh molecular weight polyolefin film has an orientation SOR of 0.95 or more, and the layer of thermal expansion coefficient in the plane direction is molecules in the longitudinal direction of the film and is lower than In the range of 1.05, the film is also negatively averaged. 參 -33- 201008770 四、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: Μ 〇 參 五、本案若有化學式時,請揭示最能顯示發明特徵的化 學式:Reference -33- 201008770 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: Μ 参 五 5. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention:
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KR102399713B1 (en) * 2016-12-16 2022-05-19 도레이 필름 카코우 가부시키가이샤 Release film and protective film
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US9363890B2 (en) 2010-12-27 2016-06-07 Kuraray Co., Ltd. Circuit board and method of manufacturing same
CN103270818B (en) * 2010-12-27 2016-08-17 株式会社可乐丽 Circuit substrate and manufacture method thereof
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US10244619B2 (en) 2010-12-27 2019-03-26 Kurarau Co., Ltd. Circuit board
CN105934104B (en) * 2010-12-27 2019-04-23 株式会社可乐丽 Circuit substrate and its manufacturing method
US10653001B2 (en) 2010-12-27 2020-05-12 Kuraray Co., Ltd. Release material

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