201005329 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種液晶顯示面板的基板及其應用與 製造方法’且特別是有關於具有彩色遽光層之液晶顯示面 板的基板及其應用與製造方法。 【先前技術】 隨著資訊、通信產業不斷地推陳出新，帶動了液晶顯 示器（Liquid Crystal Display ; LCD)市場的蓬勃發展。液晶 顯示器具有高晝質、體積小、重量輕、低驅動電壓、與低 消耗功率等優點’因此被廣泛應用於個人數位助理 (Personal Digital Assistant; PDA)、行動電話、攝錄放影機、 筆記型電腦、桌上型顯示器、車用顯示器、及投影電視等 消費性通訊或電子產品。 而液晶顯示器之所以能形成彩色化，主要係藉由彩色 濾光片（Color Filter ; CF)的設置。液晶面板可透過驅動坨 的電壓改變來控制液晶分子的排列狀態，而形成閘門來選 擇背光源光線穿透的與否，並藉由含有紅、綠及藍三色濾 光層的彩色濾光片來形成不同的色光。 請參照第1 ®，其緣示依照習知技術之一種彩色遽光 片基板的剖面不意圖。—般的彩色濾光片基板9〇〇係在透 明玻璃基板910上製作具有黑色矩陣（Blaek matHx)結構的 遮光層⑽，再依序形成具有透光性紅、綠藍三原色的彩 色濾光層930，然後，形成透明的IT〇電極mo來覆蓋於 5 201005329 遮光層920和彩色濾光層930。 然而’由於彩色濾光層93〇的材料特性，一般彩色濾 光片基板900在遮光層92〇(BM)和彩色濾光層93〇的交界 處容易形成角段差901，因而造成彩色濾光層93〇的周圍發 生表面突起的情形，進而容易影響液晶分子的排列狀態， 導致液晶顯示器的顯示品質不佳。 【發明内容】 因此本發明之一方面係在於提供一種液晶顯示面板的 基板及其應用與製造方法，藉以形成多配向區域來擴大顯 示視角’且可增加電極層的表面平坦度，因而可確保顯示 品質。 根據本發明之實施例，本發明之液晶顯示面板的基板 結構可包含有第一濾光層、第二濾光層、電極層、複數個 凸狀結構及缓和層。第二濾光層係與第一濾光層相鄰，且 第一濾光層部分重疊於第一濾光層上而形成重疊區，電極 層形成於第一濾光層及第二濾光層上，凸狀結構形成於電 極層上，緩和層至少形成於重疊區的周圍，其中緩和層之 材料係相同於第二濾光層的材料或凸狀結構的材料。 又’根據本發明之實施例，本發明之液晶顯示面板可 包含有第一基板、第二基板及液晶層。第一基板可包含有 第一濾光層、第二濾光層、電極層、複數個凸狀結構及緩 和層。第二濾光層係與第一濾光層相鄰，且第二濾光層部 为重疊於第一遽光層上而形成一重疊區，電極層形成於第 201005329 • 一濾光層及第二濾光層上，凸狀結構形成於電極層上，緩 和層至少形成於重疊區的周圍，其中缓和層之材料係相同 於第二滤光層的材料或凸狀結構的材料。第二基板係相對 於第一基板，液晶層係設置於第一基板與第二基板之間。 又’根據本發明之實施例，上述液晶顯示面板可應用 於液晶顯示裝置中。 又’根據本發明之實施例，本發明之液晶顯示面板之 基板的製造方法可包含：提供一基板；形成第一濾光層於 ® 此基板上；形成第二濾光層於基板上並部分重疊於第一濾 光層而形成一重疊區；形成一電極層於第一濾光層及第二 濾光層上；以及形成複數個凸狀結構和緩和層於電極層 上’緩和層係至少形成於重疊區的周圍，其中緩和層之材 料係相同於此些凸狀結構的材料》 又’根據本發明之實施例，本發明之液晶顯示面板之 基板的製造方法可包含：提供一基板；形成至少一第一濾 光層於基板上；形成至少一第二濾光層和一緩和層，其令 ❹ 第二濾光層係部分重疊於第一濾光層而形成一重疊區，緩 和層係位於重疊區的周圍，且緩和層之材料係相同於第二 濾光層之材料；形成一電極層於第一濾光層和第二濾光層 上’•以及形成複數個凸狀結構於電極層上。 因此，本發明之液晶顯示面板的基板結構及其應用與 製造方法可擴大顯示視角和增加表面平坦度，以確保顯示 - 品質’且可降低製程複雜度和製程成本。 201005329 . 【實施方式】 為讓本發明之上述和其他目的、特徵、優點與實施例 能更明顯易懂，本說明書將特舉出一系列實施例來加以說 明。但值得注意的是，此些實施例只是用以說明本發明之 實施方式，而非用以限定本發明。 請參照第2圖，其繪示依照本發明之第一實施例之液 晶顯示裝置的剖面示意圖。本實施例之液晶顯示面板100 係設置於一背光模組200的上方，因而可組裝成一液晶顯 參 示裝置(Liquid Crystal Display ; LCD)。其中液晶顯示面板 100可形成多個不同的液晶分子配向區域（Multi Domain)， 以擴大液晶顯示裝置的顯示視角。此背光模組200可為側 光式（Edge Lighting)背光模組或直下式入光（Bottom Lighting)背光模組，其中背光模組200例如可設置光學膜 片組(未繪示），以提升背光效率和準直性，光學膜片組例如 可為：擴散片、棱鏡片、增亮膜（Brightness Enhancement Film; BEF)、反射式增亮膜（Dual Brightness Enhancement 9 Film ; DBEF)、非多層膜式反射偏光片（Diffused Reflective201005329 IX. Description of the Invention: [Technical Field] The present invention relates to a substrate for a liquid crystal display panel and a method of manufacturing and manufacturing the same, and more particularly to a substrate having a liquid crystal display panel having a color light-emitting layer and an application thereof And manufacturing methods. [Prior Art] With the continuous innovation of the information and communication industry, the market for liquid crystal display (LCD) has been booming. The liquid crystal display has the advantages of high quality, small size, light weight, low driving voltage, and low power consumption. Therefore, it is widely used in Personal Digital Assistant (PDA), mobile phones, video recorders, and notes. Consumer communications or electronic products such as computers, desktop displays, automotive displays, and projection televisions. The reason why the liquid crystal display can be colored is mainly by the setting of color filter (CF). The liquid crystal panel can control the arrangement state of the liquid crystal molecules by driving the voltage change of the crucible, and form a gate to select whether the backlight light penetrates or not, and the color filter containing the red, green and blue color filter layers To form different shades of light. Please refer to the 1st, which is not intended to be a cross-sectional view of a color ray substrate according to the prior art. A general color filter substrate 9 is formed on the transparent glass substrate 910 to form a light shielding layer (10) having a black matrix (Blaek matHx) structure, and sequentially forming a color filter layer having three primary colors of translucent red, green and blue. 930, then, a transparent IT 〇 electrode mo is formed to cover the 5 201005329 light shielding layer 920 and the color filter layer 930. However, due to the material characteristics of the color filter layer 93, the color filter substrate 900 generally forms an angular difference 901 at the boundary between the light shielding layer 92 (BM) and the color filter layer 93, thereby causing a color filter layer. The surface protrusion occurs around 93〇, which in turn easily affects the alignment state of the liquid crystal molecules, resulting in poor display quality of the liquid crystal display. SUMMARY OF THE INVENTION Therefore, an aspect of the present invention is to provide a substrate for a liquid crystal display panel, and an application and a manufacturing method thereof, thereby forming a multi-alignment region to enlarge a viewing angle 'and increase the surface flatness of the electrode layer, thereby ensuring display quality. According to an embodiment of the present invention, the substrate structure of the liquid crystal display panel of the present invention may include a first filter layer, a second filter layer, an electrode layer, a plurality of convex structures, and a relaxation layer. The second filter layer is adjacent to the first filter layer, and the first filter layer partially overlaps the first filter layer to form an overlap region, and the electrode layer is formed on the first filter layer and the second filter layer Upper, a convex structure is formed on the electrode layer, and the relaxation layer is formed at least around the overlap region, wherein the material of the relaxation layer is the same as the material of the second filter layer or the material of the convex structure. Further, according to an embodiment of the present invention, the liquid crystal display panel of the present invention may include a first substrate, a second substrate, and a liquid crystal layer. The first substrate may include a first filter layer, a second filter layer, an electrode layer, a plurality of convex structures, and a relaxation layer. The second filter layer is adjacent to the first filter layer, and the second filter layer portion is overlapped on the first light-emitting layer to form an overlap region, and the electrode layer is formed on the 201005329 • a filter layer and On the two filter layers, a convex structure is formed on the electrode layer, and the relaxation layer is formed at least around the overlap region, wherein the material of the relaxation layer is the same as the material of the second filter layer or the material of the convex structure. The second substrate is opposite to the first substrate, and the liquid crystal layer is disposed between the first substrate and the second substrate. Further, according to the embodiment of the present invention, the above liquid crystal display panel can be applied to a liquid crystal display device. According to an embodiment of the present invention, a method of manufacturing a substrate for a liquid crystal display panel of the present invention may include: providing a substrate; forming a first filter layer on the substrate; forming a second filter layer on the substrate and partially Overlapping the first filter layer to form an overlap region; forming an electrode layer on the first filter layer and the second filter layer; and forming a plurality of convex structures and a relaxation layer on the electrode layer to mitigate the layer system The method for manufacturing the substrate of the liquid crystal display panel of the present invention may include: providing a substrate; according to an embodiment of the present invention, the method for manufacturing the substrate of the liquid crystal display panel of the present invention; Forming at least a first filter layer on the substrate; forming at least a second filter layer and a relaxation layer, wherein the second filter layer partially overlaps the first filter layer to form an overlap region, the relaxation layer Is located around the overlap region, and the material of the relaxation layer is the same material as the second filter layer; forming an electrode layer on the first filter layer and the second filter layer and forming a plurality of convex structures Electricity Layer. Therefore, the substrate structure of the liquid crystal display panel of the present invention and its application and manufacturing method can expand the display viewing angle and increase the surface flatness to ensure display-quality' and reduce process complexity and process cost. The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; It is to be understood that the embodiments are merely illustrative of the invention and are not intended to limit the invention. Referring to Figure 2, there is shown a cross-sectional view of a liquid crystal display device in accordance with a first embodiment of the present invention. The liquid crystal display panel 100 of the present embodiment is disposed above a backlight module 200, and thus can be assembled into a liquid crystal display device (LCD). The liquid crystal display panel 100 can form a plurality of different liquid crystal molecular alignment regions (Multi Domain) to expand the display viewing angle of the liquid crystal display device. The backlight module 200 can be an edge illumination backlight module or a Bottom Lighting backlight module. The backlight module 200 can be provided with an optical film group (not shown) for example. For backlight efficiency and collimation, the optical film set can be, for example, a diffusion sheet, a prism sheet, a brightness enhancement film (BEF), a reflective brightness enhancement film (Dual Brightness Enhancement 9 Film; DBEF), a non-multilayer film. Reflective polarizer (Diffused Reflective)
Polarizer Film ; DRPF)或上述之任意組合。而背光模組200 之光源（未繪示）例如為：冷陰極螢光燈管（Cold Cathode Fluorescent Lamp ; CCFL)、熱陰極榮光燈（Hot Cathode Fluorescent Lamp ; HCFL)、發光二極體（Light-Emitting Diode ; LED)、有機發光二極體（Organic Light Emitting - Diode ; OLED)或電激發光片（Electro-Luminescence ; EL)， 用以提供背光源至液晶顯示面板100中。 8 201005329 如第2圖所示’本實施之液晶顯示面板1〇〇可包含有 第一基板110、第二基板120、液晶層130、第一偏光片140 及第二偏光片150。第一基板no和第二基板12〇係相對地 設置，液晶層130係形成於第一基板11()和第二基板120 之間，第一偏光片140係設置第一基板11〇的一側，並相 對於液晶層13 0(亦即為第一基板no的出光側），第二偏光 片150係設置第二基板120的一侧，並相對於液晶層丨3〇(亦 即為第二基板120的入光側）。第二基板12〇可設有複數個 畢動元件（未繪示），例如：薄膜電晶體（Thin_Film Transistor ; TFT)，因而形成TFT陣列基板’以驅動液晶層 130中之液晶分子（未繪示）的扭轉，因而在液晶層13〇中形 成複數個晝素。 請參照第3圖，其繪示依照本發明之第一實施例之彩 色濾光片基板的刮面示意圖。第一基板11〇可包含有透光 基板111、第一濾光層112、第二濾光層113、電極層114、 間隔單元（Photo SpaCer)li5、複數個凸狀結構 (Pn>truSi〇n)116及緩和層117。透光基板U1例如為：玻璃 基板或可撓性透光基板，其具有複數個像素區1〇]^本實施 例中第一濾光層112係為遮光層，其形成於透光基板m 上，並可形成遮光矩陣（Light Shielding Matrix)結構，用以 分隔不同顏色的濾光層，而增加色彩的對比性。在本實施 例中，此些像素區ιοί可藉由第一濾光層112之遮光矩陣 結構來區隔。第—濾、錢112㈣料例如為：金屬（例如 鉻）、石墨或樹脂型材料。第二濾光層113例如係以具有透 201005329 光性的彩色光阻材料所形成，其形成像素區1G1上且位 於第；慮光層112所形成之遮光矩陣中，且第二遽光層113 較佳具有紅色縣層、綠色遽光層及藍㈣光層，以任意 組成不同的光色。值得注意的是，當第二濾光^ 113形成 於第一渡光層112所形成之遮光矩陣中時，第二濾光層u3 主要部分係相鄰於第一濾光層112，而在像素區1〇1之周圍 (亦即重疊區）’部分第二據光層113係覆蓋於於第一渡光層 112上形成一重疊區，因而造成第二濾光層ιΐ3在像素區 之周圍的表面高度容易高於在像素區101中間區域的 表面高度，亦即第二濾光層113在像素區1〇1之周圍容易 形成角段差102的情形。 如第3圖所示，本實施例之電極層114係形成於第二 濾光層113和第一濾光層Π2上，用以形成一共同電極 (Common Electrode)’藉以與第二基板120上的畫素電極（未 缯'示）形成電場而控制液晶分子旋轉。電極層U4係以具有 導電性和透光性的材料所製成，例如：IT〇、IZ〇、AZ〇、 GZO、TCO或ZnO。本實施例之間隔單元115係設置於電 極層U4上’用以控制第一基板110和第二基板12〇之間 的間隙（Cell Gap)，間隔單元115的材料例如為：矽、高分 子材料或光阻材料，其可例如呈球形或柱形。 如第3圖所示，本實施例之凸狀結構丨16係形成於電 極層114上’且分別位於每一像素區101，用以在每—像素 區HH中形成多液晶分子配向區域（Multi Domain)，以擴大 顯示視角，其中在每一像素區101中的凸狀結構116例如 201005329 可呈v字形排列。凸狀結構116之材料例如係選自透明光 阻材料，以及環氧樹脂（Epoxy)系或壓克力樹脂（AcryHc)系 等局分子材料。 請參照第4A圖和第4C圖，其繪示依照本發明第一實 施例之基板結構的部分刮面圖。本實施例之緩和層117係 至少形成於每一像素區101的周圍，用以增加像素區1〇1 上的表面平坦度。在本實施例中，緩和層117之材料係相 同於凸狀結構116之材料，且緩和層117可與凸狀結構116 同時形成於電極層114上。緩和層117可至少覆蓋於重疊 區的角段差102處，以緩和角段差102所造成的表面高度 奴差，因而増加像素區1 〇丨上的表面平坦度以減少角段 差102對液晶分子配向的影響’確保顯示品質。其中緩和 層Π7可減少角段差102在像素區ι〇1的周圍的表面接觸 角Θ (如第3圖所示）至45度以下，亦即緩和層117在像素 區101上之表面的接觸角0係實質小45度。 請參照第5圖及第6A圖至第6G圖，第5圖係繪示依 照本發明第一實施例之基板結構的製造方法流程圖，第6A 圖至第6G圖係繪示依照本發明第一實施例之基板結構的 製程剖面圖。當製造本實施例之基板（第一基板110)結構 時’首先’如第6A圖所示，提供透光基板111(步驟301)。 接著’如第6B圖所示，形成第一濾光層112於透光基板 111上（步驟302)，例如先形成一遮光材料層118於透光基 板111上（如第6B圖所示），接著，如第6C圖所示，藉由 例如微影技術來圖案化此遮光材料層118,因而形成第一濾 201005329 光層112。接著，如第6D圖所示，分別形成第二濾光層113 於像素區101上（步驟303)，其中不同顏色的第二濾光層 113(例如紅色、綠色及藍色濾光層）係分別依序地形成於不 同的像素區101中並部分重疊於第一濾光層112上。接著， 如第6E圖所示，形成電極層114於濾光層（第一濾光層112 和第二濾光層113)上（步驟304)。接著，形成凸狀結構116 和缓和層117於電極層114上（步驟305)。當形成凸狀結構 116和緩和層117時，如第6F圖所示，可先形成一透明材 料層119於電極層114上，接著，如第6G圖所示，藉由例 如微影技術來圖案化此透明材料層119，以形成凸狀結構 116和緩和層117 »然後，形成間隔單元（未繪示）於電極層 114上（步驟306)，因而形成本實施例之第一基板11〇。在 本實施例’間隔單元可形成於像素區1 〇 1之間，亦即位於 第一濾光層112上。 因此’本實施例之緩和層117可增加像素區ι〇1上的 表面平坦度，以確保顯示品質。且由於緩和層117係與凸 狀結構116同時形成，因而可降低製程複雜度（減少製程步 驟）和製程成本。 请參照第7圖，其繪示依照本發明之第二實施例之基 板結構的刳面示意圖。以下僅就本實施例與第一實施例之 相異處進行說明，關於相似處在此不再贅述。相較於第一 實施例’第二實施例之第-基板11Ga可未另設有遮光層。 此時’此些濾光層可包含不同顏色的第一濾光I 1〇3(例如 為红色濾光層）和第二濾光層104(例如為綠色遮光層），且 12 201005329 第一濾光層103和第-、请止麻， 像素區101之間，而报忐 用一 ^ 一基 形成一重疊區，因而第一濾光層103 和第一濾光層104之間的番屋加、 《間的4疊部分可用时隔每-像素區 ’以形成遮光矩陣而取代如第—實施韻述遮光層之設 置此時’第一濾光層1〇3和第二濾光層ι〇4之間的重疊 部刀亦可⑯造成在像素1 1G1周圍的角段差⑽情形因 而第二實施例之緩和層117a可形成於每—像素區ι〇ι的周 圍’並覆蓋於角段差1G2處’以增加像素區 101上的表面 平坦度。其中緩和層117a之材料係相同於凸狀結構116之 材料’且緩和層117a可與凸狀結構116同時形成於電極層 114 上。 請參照第8圖及第9A圖至第9G圖，第8圖係繪示依 照本發明第二實施例之基板結構的製造方法流程圖，第9 A 圖至第9G圖係繪示依照本發明第三實施例之基板結構的 製程剖面圖。以下僅就本實施例與第二實施例之相異處進 行說明，關於相似處在此不再贅述。相較於第二實施例， 第三實施例之第一基板ll〇b的緩和層i17b材料係相同於 此些據光層之其中至少一者，此時，此些濾光層可包含不 同顏色的第一濾光層103b、第二濾光層104b及第三濾光層 l〇5b’且每相鄰二濾光層係部分重疊於每相鄰二像素區101 之間而形成一重疊區，以分隔每一像素區1〇1。值得注意的 是’在一些實施例中，此些濾光層可未設有第三濾光層 105b。緩和層U7b的材料例如係相同於第二濾光層l〇4b 的材料，且緩和層117b和第二濾光層104b係同時形成。 13 201005329 其中第二濾光層l〇4b之材料可為藍色光阻材料，以減少第 二滤光層104b對其他濾光層的影響 在本實施例中，當製造基板（第一基板11〇)結構時，首 先，如第9A圖所示，提供透光基板111(步驟401卜接著， 如第9B圖所示，形成第一濾光層1〇讣和第三濾光層1〇讣 於透光基板111上（步驟402)，接著’形成第二濾光層1〇仆 和緩和層117b(步驟403)，其中第二濾光層⑺扑係位於第 一濾光層103b和第三濾光層105b之間，緩和層U7b係位 於每一像素區101的周圍，並覆蓋於角段差1〇2處。當形 成第二濾光層104b和緩和層U7b時，如第9C圖所示例 如可先形成一第二濾光材料層119b於透光基板m、第一 濾光層103 b及第三濾光層1051)上，接著，如第9〇圖所 示，藉由例如微影技術來圖案化此第二濾光材料層U9b， 以形成第二濾光層l〇4b和緩和層117b。然不限於此，亦可 利用光罩（未繪示）來直接沉積第二濾光材料層U9b於電極 層114上，以形成第二據光層i〇4b和緩和層ii7b。接著， 如第9E圖所示，形成電極層114於濾光層（第一濾光層 W3b、第二濾光層104b及第三濾光層1〇外)上（步驟4〇4)。 接著，如第9F圖所示，形成凸狀結構116於電極層ιΐ4上 (步驟405)。然後，如第9G圖所示，形成間隔單元115於Polarizer Film; DRPF) or any combination of the above. The light source (not shown) of the backlight module 200 is, for example, a Cold Cathode Fluorescent Lamp (CCFL), a Hot Cathode Fluorescent Lamp (HCFL), and a Light Emitting Diode (Light- Emitting Diode; LED), Organic Light Emitting Diode (OLED) or Electro-Luminescence (EL) for providing a backlight to the liquid crystal display panel 100. 8 201005329 As shown in Fig. 2, the liquid crystal display panel 1 of the present embodiment may include a first substrate 110, a second substrate 120, a liquid crystal layer 130, a first polarizer 140, and a second polarizer 150. The first substrate no and the second substrate 12 are disposed opposite to each other, the liquid crystal layer 130 is formed between the first substrate 11 () and the second substrate 120, and the first polarizer 140 is disposed on the side of the first substrate 11 And the second polarizer 150 is disposed on one side of the second substrate 120 with respect to the liquid crystal layer 130 (ie, the light exiting side of the first substrate no), and is opposite to the liquid crystal layer 〇3〇 (ie, the second side) The light incident side of the substrate 120). The second substrate 12A may be provided with a plurality of switching elements (not shown), such as a thin film transistor (TFT), thereby forming a TFT array substrate ' to drive liquid crystal molecules in the liquid crystal layer 130 (not shown) The twisting thus forms a plurality of halogens in the liquid crystal layer 13A. Referring to Figure 3, there is shown a schematic view of a shaving surface of a color filter substrate in accordance with a first embodiment of the present invention. The first substrate 11A may include a transparent substrate 111, a first filter layer 112, a second filter layer 113, an electrode layer 114, a spacer unit (Photo SpaCer) li5, and a plurality of convex structures (Pn>truSi〇n 116 and the relaxation layer 117. The transparent substrate U1 is, for example, a glass substrate or a flexible transparent substrate having a plurality of pixel regions. The first filter layer 112 is a light shielding layer formed on the transparent substrate m. And can form a Light Shielding Matrix structure to separate the filter layers of different colors to increase the contrast of colors. In this embodiment, the pixel regions ιοί may be separated by a light shielding matrix structure of the first filter layer 112. The first filter, the money 112 (four) material is, for example, a metal (e.g., chromium), graphite or resin type material. The second filter layer 113 is formed, for example, by a color photoresist material having a light transmittance of 201005329, which is formed on the pixel region 1G1 and located in the light-shielding matrix formed by the light-receiving layer 112, and the second light-emitting layer 113 It preferably has a red county layer, a green light layer and a blue (four) light layer, and has different light colors. It should be noted that when the second filter 113 is formed in the light-shielding matrix formed by the first light-receiving layer 112, the main portion of the second filter layer u3 is adjacent to the first filter layer 112, and is in the pixel. A portion of the second light-receiving layer 113 covering the first light-receiving layer 112 forms an overlap region, thereby causing the second filter layer ι 3 to be around the pixel region. The surface height is easily higher than the surface height in the intermediate portion of the pixel region 101, that is, the case where the second filter layer 113 easily forms the angular difference 102 around the pixel region 1〇1. As shown in FIG. 3, the electrode layer 114 of the present embodiment is formed on the second filter layer 113 and the first filter layer Π2 for forming a common electrode (to be combined with the second substrate 120). The pixel electrode (not shown) forms an electric field to control the rotation of the liquid crystal molecules. The electrode layer U4 is made of a material having conductivity and light transmittance, for example, IT〇, IZ〇, AZ〇, GZO, TCO or ZnO. The spacer unit 115 of the embodiment is disposed on the electrode layer U4 to control a gap (Cell Gap) between the first substrate 110 and the second substrate 12, and the material of the spacer unit 115 is, for example, germanium or polymer material. Or a photoresist material, which may for example be spherical or cylindrical. As shown in FIG. 3, the convex structures 丨16 of the present embodiment are formed on the electrode layer 114 and are respectively located in each of the pixel regions 101 for forming a plurality of liquid crystal molecular alignment regions in each of the pixel regions HH (Multi Domain) to enlarge the display angle of view, wherein the convex structures 116 in each of the pixel regions 101, for example, 201005329, may be arranged in a v-shape. The material of the convex structure 116 is selected, for example, from a transparent photoresist material, and a host molecular material such as an epoxy resin (Acry Hc) or an acrylic resin (AcryHc). Referring to Figures 4A and 4C, a partial plan view of a substrate structure in accordance with a first embodiment of the present invention is shown. The relaxation layer 117 of this embodiment is formed at least around each of the pixel regions 101 for increasing the surface flatness on the pixel region 1〇1. In the present embodiment, the material of the relaxation layer 117 is the same as that of the convex structure 116, and the relaxation layer 117 can be formed on the electrode layer 114 simultaneously with the convex structure 116. The relaxation layer 117 may cover at least the angular difference 102 of the overlap region to alleviate the surface height difference caused by the angular difference 102, thereby increasing the surface flatness on the pixel region 1 to reduce the alignment of the liquid crystal molecules by the angular difference 102. Affect 'ensure display quality. Wherein the relaxation layer Π7 can reduce the surface contact angle Θ (as shown in FIG. 3) of the angular difference 102 around the pixel region ι1 to 45 degrees or less, that is, the contact angle of the surface of the relaxation layer 117 on the pixel region 101. The 0 system is substantially 45 degrees smaller. 5 and 6A to 6G, FIG. 5 is a flow chart showing a method of manufacturing a substrate structure according to a first embodiment of the present invention, and FIGS. 6A to 6G are diagrams according to the present invention. A process cross-sectional view of a substrate structure of an embodiment. When the structure of the substrate (first substrate 110) of the present embodiment is manufactured, 'first' as shown in Fig. 6A, the light-transmitting substrate 111 is provided (step 301). Then, as shown in FIG. 6B, the first filter layer 112 is formed on the transparent substrate 111 (step 302), for example, a light shielding material layer 118 is formed on the transparent substrate 111 (as shown in FIG. 6B). Next, as shown in FIG. 6C, the light shielding material layer 118 is patterned by, for example, lithography, thereby forming the first filter 201005329 optical layer 112. Next, as shown in FIG. 6D, a second filter layer 113 is formed on the pixel region 101 (step 303), wherein the second filter layer 113 of different colors (for example, red, green, and blue filter layers) is They are sequentially formed in different pixel regions 101 and partially overlapped on the first filter layer 112. Next, as shown in FIG. 6E, the electrode layer 114 is formed on the filter layer (the first filter layer 112 and the second filter layer 113) (step 304). Next, a convex structure 116 and a relaxation layer 117 are formed on the electrode layer 114 (step 305). When the convex structure 116 and the relaxation layer 117 are formed, as shown in FIG. 6F, a transparent material layer 119 may be formed on the electrode layer 114, and then, as shown in FIG. 6G, patterned by, for example, lithography. The transparent material layer 119 is formed to form the convex structure 116 and the relaxation layer 117 » and then a spacer unit (not shown) is formed on the electrode layer 114 (step 306), thereby forming the first substrate 11A of the present embodiment. In the present embodiment, the spacer unit may be formed between the pixel regions 1 〇 1 , that is, on the first filter layer 112. Therefore, the relaxation layer 117 of the present embodiment can increase the surface flatness on the pixel region ι1 to ensure display quality. Moreover, since the relaxation layer 117 is formed simultaneously with the convex structure 116, the process complexity (reduction in process steps) and process cost can be reduced. Referring to Figure 7, there is shown a schematic cross-sectional view of a substrate structure in accordance with a second embodiment of the present invention. Only the differences between the embodiment and the first embodiment will be described below, and the details are not described herein again. The light shielding layer may not be additionally provided as compared with the first substrate 11Ga of the second embodiment of the first embodiment. At this time, the filter layers may include first filters I 1 〇 3 (for example, red filter layers) and second filter layers 104 (for example, green light-shielding layers) of different colors, and 12 201005329 first filter The light layer 103 and the first, and the numb, between the pixel regions 101, and the first substrate is formed with an overlap region, so that the first filter layer 103 and the first filter layer 104 are between The "four-stack portion can be separated by the per-pixel region" to form a light-shielding matrix instead of the arrangement of the light-shielding layer as described above. At this time, the first filter layer 1〇3 and the second filter layer ι4 The overlap between the knives 16 can also cause a difference in the angular section (10) around the pixel 1 1G1. Thus, the mitigating layer 117a of the second embodiment can be formed around each pixel region ι〇ι and cover the angular difference 1G2. To increase the surface flatness on the pixel region 101. The material of the relaxation layer 117a is the same as the material of the convex structure 116, and the relaxation layer 117a can be formed on the electrode layer 114 simultaneously with the convex structure 116. Please refer to FIG. 8 and FIGS. 9A to 9G. FIG. 8 is a flow chart showing a method for manufacturing a substrate structure according to a second embodiment of the present invention, and FIGS. 9A to 9G are diagrams according to the present invention. A process sectional view of the substrate structure of the third embodiment. In the following, only the differences between the embodiment and the second embodiment will be described, and the similarities will not be described herein. Compared with the second embodiment, the material of the relaxation layer i17b of the first substrate 11b of the third embodiment is the same as at least one of the light-receiving layers. In this case, the filter layers may contain different colors. The first filter layer 103b, the second filter layer 104b and the third filter layer 10b' and each adjacent two filter layers partially overlap each adjacent pixel region 101 to form an overlap region To separate each pixel area by 1〇1. It is noted that in some embodiments, such filter layers may not be provided with a third filter layer 105b. The material of the relaxation layer U7b is, for example, the same material as the second filter layer 10b, and the relaxation layer 117b and the second filter layer 104b are simultaneously formed. 13 201005329 wherein the material of the second filter layer 10b can be a blue photoresist material to reduce the influence of the second filter layer 104b on other filter layers. In this embodiment, when the substrate is fabricated (the first substrate 11〇) When the structure is first, as shown in FIG. 9A, the light-transmitting substrate 111 is provided (step 401, and then, as shown in FIG. 9B, the first filter layer 1 and the third filter layer 1 are formed. On the transparent substrate 111 (step 402), then 'forming the second filter layer 1 and the buffer layer 117b (step 403), wherein the second filter layer (7) is located in the first filter layer 103b and the third filter Between the light layers 105b, the relaxation layer U7b is located around each of the pixel regions 101 and covers the corner difference 1〇2. When the second filter layer 104b and the relaxation layer U7b are formed, as shown in FIG. 9C, for example A second filter material layer 119b may be formed on the transparent substrate m, the first filter layer 103b, and the third filter layer 1051), and then, as shown in FIG. 9, by, for example, lithography The second filter material layer U9b is patterned to form a second filter layer 104b and a relaxation layer 117b. However, it is not limited thereto, and the second filter material layer U9b may be directly deposited on the electrode layer 114 by using a photomask (not shown) to form the second light-receiving layer i〇4b and the relaxation layer ii7b. Next, as shown in Fig. 9E, the electrode layer 114 is formed on the filter layer (the first filter layer W3b, the second filter layer 104b, and the third filter layer 1) (step 4〇4). Next, as shown in Fig. 9F, a convex structure 116 is formed on the electrode layer ι 4 (step 405). Then, as shown in FIG. 9G, the spacer unit 115 is formed.
電極層114上（步驟406)，因而形成第三實施例之第一基板 110b。 A 請參照第10圖，其繪示依照本發明之第四實施例之基 板結構的剖面示意圖。以下僅就本實施例與第—實施例之 14 201005329 相異處進行說明，關於相似處在此不再贅述。相較於第一 實施例’第四實施例之第一基板11 〇c的緩和層〗丨7c係完 全覆蓋於每一像素區101上，以增加像素區101上的表面 平坦度，且缓和層117c之材料係相同於凸狀結構116之材 料，緩和層117c可與凸狀結構ι16同時形成於電極層114 上。當形成凸狀結構116和緩和層ii7c時，可藉由例如微 影技術和灰階光罩來圖案化此透明材料119,以同時形成凸 狀結構116和緩和層117c。 由上述本發明的實施例可知，本發明之液晶顯示面板 的基板結構及其應用與製造方法可增加像素區上的表面平 坦度，以碟保顯示品質，且可避免增加製程複雜度和製程 成本。 雖然本發明已以實施例揭露如上，然其並非用以限定 本發明，任何熟習此技藝者，在不脫離本發明之精神和範 園内，當可作各種之更動與潤飾，因此本發明之保護範圍 當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 為讓本發明之上述和其他目的、特徵、優點與實施例 能更明顯易懂’所附圖式之詳細說明如下： 第1圖係繪示依照習知技術之一種彩色濾光片基板的 剖面示意圖。 第2圖係繪示依照本發明之第一實施例之液晶顯示裝 置的剖面示意圖。 15 201005329 第3圖係緣示依照本發明之第一實施例之彩色遽光片 基板的剖面示意圖。 第从圖和f 4C圖係緣示依照本發明之第一實施例之 基板結構的部分剖面圖。 第5圖係繪不依照本發明之第一實施例之基板結構的 製造方法流程圖。 第6A圖至第6G圖係繪示依照本發明第一實施例之基 板結構的製程剖面圖。 參 第7圖係繪示依照本發明之第二實施例之基板結構的 剖面示意圖。 第8圖係繪示依照本發明第三實施例之基板結構的製 造方法流程圖。 第9A圖至第9G圖係鳍·示依照本發明第三實施例之基 板結構的製程剖面圖。 第10圖係繪示依照本發明之第四實施例之基板結構的 剖面示意圖β 【主要元件符號說明】 100 :液晶顯示面板 像素區 103b :第一濾光層 104b :第二濾光層 101 103 104 110 102 :角段差 105b :第三濾光層 110a、110b、110c :第一基板 透光基板 112 :第一濾光層 111 201005329The electrode layer 114 is over (step 406), thus forming the first substrate 110b of the third embodiment. A. Referring to Figure 10, there is shown a cross-sectional view of a substrate structure in accordance with a fourth embodiment of the present invention. In the following, only the difference between the present embodiment and the first embodiment of the present invention is explained. The similarities are not described herein again. The relaxation layer 丨7c of the first substrate 11 〇c of the fourth embodiment is completely covered on each of the pixel regions 101 to increase the surface flatness on the pixel region 101, and the mitigating layer. The material of 117c is the same as the material of the convex structure 116, and the relaxation layer 117c can be formed on the electrode layer 114 simultaneously with the convex structure ι16. When the convex structure 116 and the relaxation layer ii7c are formed, the transparent material 119 can be patterned by, for example, a lithography technique and a gray scale mask to simultaneously form the convex structure 116 and the relaxation layer 117c. It can be seen from the embodiments of the present invention that the substrate structure of the liquid crystal display panel of the present invention and the application and manufacturing method thereof can increase the surface flatness on the pixel area, thereby ensuring the quality of the display and avoiding the increase of process complexity and process cost. . The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any one skilled in the art can make various modifications and retouchings without departing from the spirit and scope of the present invention. This is subject to the definition of the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; A schematic cross-sectional view of a filter substrate. Figure 2 is a cross-sectional view showing a liquid crystal display device in accordance with a first embodiment of the present invention. 15 201005329 Fig. 3 is a schematic cross-sectional view showing a color light-emitting sheet substrate according to a first embodiment of the present invention. The cross-sectional view and the f 4C diagram show a partial cross-sectional view of a substrate structure in accordance with a first embodiment of the present invention. Fig. 5 is a flow chart showing a manufacturing method of the substrate structure not according to the first embodiment of the present invention. 6A to 6G are cross-sectional views showing the process of the substrate structure in accordance with the first embodiment of the present invention. Fig. 7 is a cross-sectional view showing the structure of a substrate in accordance with a second embodiment of the present invention. Figure 8 is a flow chart showing a method of manufacturing a substrate structure in accordance with a third embodiment of the present invention. Figs. 9A to 9G are fins showing a process sectional view of a substrate structure according to a third embodiment of the present invention. Figure 10 is a cross-sectional view showing the structure of a substrate in accordance with a fourth embodiment of the present invention. [Main element symbol description] 100: Liquid crystal display panel pixel region 103b: First filter layer 104b: Second filter layer 101 103 104 110 102 : angular step difference 105b: third filter layer 110a, 110b, 110c: first substrate transparent substrate 112: first filter layer 111 201005329
113 : 第二濾光層 114 :電極層 115 ： 間隔單元 116 :凸狀結構 117、 117a、117b、117c : 緩和層 118 ： 遮光材料層 119 :透明材料層 119b :第二濾光材料層 120 ： 第二基板 130 :液晶層 140 ： 第一偏光片 150 :第二偏光片 200 ： 背光模組 301 ： 提供透光基板 302 303 304 305 306 401 形成第一濾光層於透光基板上 形成第二濾光層於像素區上 形成電極層於遮光層和濾光層上 形成凸狀結構和緩和層於電極層上 形成間隔單元於電極層上 提供透光基板113: second filter layer 114: electrode layer 115: spacer unit 116: convex structure 117, 117a, 117b, 117c: relaxation layer 118: light shielding material layer 119: transparent material layer 119b: second filter material layer 120: The second substrate 130: the liquid crystal layer 140: the first polarizer 150: the second polarizer 200: the backlight module 301: providing the transparent substrate 302 303 304 305 306 401 forming the first filter layer to form a second on the transparent substrate The filter layer forms an electrode layer on the pixel region to form a convex structure on the light shielding layer and the filter layer, and a relaxation layer forms a spacer unit on the electrode layer to provide a transparent substrate on the electrode layer.
402 403 404 405 406 900 910 930 形成第一濾光層和第三濾光層於透光基板上 形成第二渡光層和緩和層 形成電極層於濾光層上 形成凸狀結構於電極層上 形成間隔單元於電極層上 彩色遽光片基板 玻璃基板 彩色濾光層 901 :角段差 920 :遮光層 940 : ITO 電極 17402 403 404 405 406 900 910 930 forming a first filter layer and a third filter layer to form a second light-passing layer and a relaxation layer on the light-transmitting substrate to form an electrode layer on the filter layer to form a convex structure on the electrode layer Forming a spacer unit on the electrode layer, a color light-emitting sheet substrate, a glass substrate, a color filter layer 901: an angular difference 920: a light-shielding layer 940: an ITO electrode 17