201002837 九、發明說明： , 【發明所屬之技術領域】 . 本發明涉及一種用於鑛膜之光學鍍膜裝置。 【先前技術】 目前，光學薄膜廣泛應用於光學儀器，如感測器、半 導體雷射、干涉儀、眼鏡以及光纖通訊元件等很多領域。 光學薄膜通常係通過干涉作用而達到其預期效果，即在光 學元件或獨立基板上鍍上一層或多層介電質膜或金屬膜來 改變光波傳輸特性。 目前，光學薄膜製作通常以物理蒸鍍法為主，該方法 為將鍍材由固態轉化為氣態或離子態，氣態或離子態之鍍 材由蒸鍍源穿越空間，抵達基板表面，材料抵達基板表面 後，將沉積而逐漸形成薄膜，從而完成基板上鏡片之鍍膜。 在先前的光學鍍膜設備中，通常會使用如圖i中的真 空鍍膜裝置1，該真空鍍臈裝置丄包括真空鍍膜室2、轉動 軸3、基板承載架4及蒸鍍源5。基板承載架4及蒸鍍源5 均在所述真空鍍膜室2内。所述轉動轴3安裝於所述真空 鍍膜室2頂部，所述基板承載架4用螺絲固定於轉動軸3 上’所述基板承載架4上裝有複數塊基板6，所述基板6 载有鏡片7。所述蒸鍍源5固定於所述真空鍍膜室2底部， 虽給鏡片7鍍膜時，所述蒸鍍源5將鍍材M向所述基板承 載架4上之鏡片7進行蒸鍍。 ^然而蒸鍍時，由於所述基板承載架4及所述真空鍍膜 至2内壁之間存在間隙η，蒸發之鍍材μ會通過該間隙η 7 201002837 進入到所述基板承載架4之背面4續在空間，污染位於所 :述基板承載架4背面4a上鏡片7之表面，影響鏡片7鍵膜 . 品質。 【發明内容】 有雲於此，有必要提供一種防止污染，提高鍵膜品質 之光學鍍膜裝置。 一種光學鍍膜裝置，其包括真空鍍膜室、轉動軸、基 $承載架及蒸鑛源’所述基板承載架與所述轉動轴連接並 設置於所述真空鍍膜室頂部，所述蒸錢源設置於所述真空 鑛膜室底部，-個滑槽環繞所述真空鑛膜室内壁設置，基 板承載架外邊緣延伸一環形凸緣，該環形凸緣伸入所述滑 槽内。 本發明所提供之光學鍍膜裝置，由於基板承載架外邊 緣延伸出一環形凸緣，並伸入真空鍍膜室内壁上凹槽内， 隔離了基板承載架正反面之空間，所以有效防止鍵膜過程 中、，鍍材污染基板承載架背面鏡片表面之情況發生，從而 改善鏡片鍍膜品質。 【實施方式】 下面將結合附圖對本發明實施方式作進一步之詳細描 述。 请參閱圖2’本發明第一實施方式提供了 一種光學鍍臈 枣置100該光學鍵膜裝置1〇〇包括真空鍍膜室⑶、轉動 轴20、基板承載架30及蒸鍍源4〇。 所述真空鍍膜室10内壁13上設置有環繞所述内壁13 201002837 之滑槽14。本實施方式係在所述内壁13上直接加工出一個 . 凹槽。 . 所述蒸鍍源40固定於所述真空鍍膜室10底部12。所 述轉動軸20安裝於所述真空鍍膜室10頂部11，所述基板 承載架30與所述轉動軸20固定連接。本實施方式中採用 螺絲將所述基板承載架30連接於所述轉動軸20上。所述 基板承載架30上裝有複數塊基板60，所述基板60載有鏡 片70。所述基板承載架30具有第一表面31及環形凸緣33。 所述第一表面31與所述蒸鍍源40相對。所述環形凸緣33 由所述基板承載架30外緣延伸形成。所述環形凸緣33上 安裝有滑動件50。所述滑動件50可以係滾輪、滚珠或滾動 軸承，本實施方式中，採用八個滚輪對稱安裝於所述環形 凸緣33上。所述滑動件50可以在所述滑槽14内滑動。本 實施方式中，所述環形凸緣33及所述滑動件50均伸入所 述滑槽14内。所述滑動件50不但避免了所述環形凸緣33 與所述滑槽14之間之直接摩擦，而且使得基板承載架30 轉動時更加平穩。可以理解，所述環形凸緣33上也可以不 安裝滑動件50,而是與所述滑槽14之間採用不直接接觸方 式，留有一間隙。 請參閱圖3,本發明第二實施方式提供之光學鍍膜裝置 200與第一實施方式提供之光學鍍膜裝置100基本相同，其 * 不同之處在於：一個環形滑軌160固定於真空鍍膜室110 内壁113上，所述環形滑執160環繞所述真空鍍膜室110 内壁113。所述環形滑執160可以與所述内壁113 —體成 201002837 型’也可以採用與所述内壁113分離之結構，然後利用機 械，化學方式安裳到所述_ 113上。本實施方式中，所 述環形滑執160與所述內辟彳彳1 p m 叮&円壁113如用一體成型製成。滑槽 114形成於環形純⑽h本實施方式中，在所述環形滑 軌160上加工出滑槽；Q4。璜花？几g „ 曰4裱形凸緣U3及滑動件150均伸 入所述滑槽114内。 本發明所提供之光學鑛膜裝置，由於基板承載架外邊 緣延伸出—環形凸緣，並伸人真空鑛膜室内壁上凹种内， 隔離了基板承載架正反面之空間，所以有效防止鑛膜過程 中’鍍材污染基板承载架背面鏡片表面之情況發生，從而 改善鏡片鍍膜品質。 綜上所述’本發明確已符合發明專利之要件，遂依法 ，出專利巾請。惟，以上所述者僅為本發明之較佳實施方 式，自不能以此限制本案之申請專利範。舉凡熟悉本案 技藝之人士援依本發明之精神所作之等效修飾或變化，皆 應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 圖1為先前技術提供之光學鍍膜裝置示意圖； 圖；圖2為本發明第—實施方式提供之光學_裝置示意 圖3為本發明第二實施方式提供之光學錢膜裝置示意 圖0 【主要元件符號說明】 光學鍍膜裝置1、1〇〇、200真空鍍膜室2、1〇、11〇 201002837 頂部 11 底部 12 内壁 13 、 113 滑槽 14 、 114 形滑執 160 轉動軸 3、20 基板承載架 4、30 第一表面 31 環形凸緣 33 ' 133 背面 4a 蒸鐘源 5、40 滑動件 50 > 150 基板 6 ' 60 鏡片 7 > 70 11201002837 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to an optical coating device for a mineral film. [Prior Art] Currently, optical films are widely used in optical instruments such as sensors, semiconductor lasers, interferometers, glasses, and optical fiber communication components. Optical films generally achieve their desired effects by interference by plating one or more dielectric films or metal films on optical components or separate substrates to alter the optical transmission characteristics. At present, the optical film is usually produced by physical vapor deposition. The method is to convert the plate material from a solid state to a gaseous state or an ionic state. The gas or ionic plate material passes through the space from the vapor deposition source to reach the surface of the substrate, and the material reaches the substrate. After the surface, a thin film is formed by deposition to complete the coating of the lens on the substrate. In the prior art optical coating apparatus, a vacuum coating apparatus 1 as shown in Fig. i is generally used, and the vacuum plating apparatus 丄 includes a vacuum coating chamber 2, a rotating shaft 3, a substrate carrier 4, and an evaporation source 5. The substrate carrier 4 and the vapor deposition source 5 are both in the vacuum coating chamber 2. The rotating shaft 3 is mounted on the top of the vacuum coating chamber 2, and the substrate carrier 4 is fixed to the rotating shaft 3 by screws. The substrate carrier 4 is mounted with a plurality of substrates 6, and the substrate 6 carries Lens 7. The vapor deposition source 5 is fixed to the bottom of the vacuum coating chamber 2, and when the lens 7 is coated, the vapor deposition source 5 vapor-deposits the plating material M onto the lens 7 on the substrate carrier 4. ^ However, during evaporation, since the substrate yoke 4 and the vacuum coating to the inner wall of the 2 have a gap η, the evaporated plating material μ enters the back surface of the substrate carrier 4 through the gap η 7 201002837 Continued in the space, the pollution is located on the surface of the lens 7 on the back surface 4a of the substrate carrier 4, affecting the lens 7 bond film. Quality. SUMMARY OF THE INVENTION In view of this, it is necessary to provide an optical coating apparatus that prevents contamination and improves the quality of the bonding film. An optical coating device comprising a vacuum coating chamber, a rotating shaft, a base carrier and a steam source. The substrate carrier is connected to the rotating shaft and disposed on the top of the vacuum coating chamber. At the bottom of the vacuum film chamber, a sliding groove is disposed around the inner wall of the vacuum ore film, and an outer edge of the substrate carrier extends an annular flange, and the annular flange extends into the sliding groove. The optical coating device provided by the invention has an annular flange extending from the outer edge of the substrate carrier and protrudes into the groove on the inner wall of the vacuum coating film to isolate the space on the front and back sides of the substrate carrier, thereby effectively preventing the key film process. In the middle, the plating material contaminates the surface of the back surface of the substrate carrier, thereby improving the quality of the lens coating. [Embodiment] Hereinafter, embodiments of the present invention will be further described in detail with reference to the accompanying drawings. Referring to Fig. 2', a first embodiment of the present invention provides an optical plating apparatus 100. The optical bonding film apparatus 1 includes a vacuum coating chamber (3), a rotating shaft 20, a substrate carrier 30, and an evaporation source. The inner wall 13 of the vacuum coating chamber 10 is provided with a sliding groove 14 surrounding the inner wall 13 201002837. In the present embodiment, a groove is directly formed on the inner wall 13. The evaporation source 40 is fixed to the bottom portion 12 of the vacuum coating chamber 10. The rotating shaft 20 is mounted to the top portion 11 of the vacuum coating chamber 10, and the substrate carrier 30 is fixedly coupled to the rotating shaft 20. In the present embodiment, the substrate carrier 30 is attached to the rotating shaft 20 by screws. A plurality of substrates 60 are mounted on the substrate carrier 30, and the substrate 60 carries a lens 70. The substrate carrier 30 has a first surface 31 and an annular flange 33. The first surface 31 is opposite to the evaporation source 40. The annular flange 33 is formed by an outer edge of the substrate carrier 30. A slider 50 is mounted on the annular flange 33. The slider 50 may be a roller, a ball or a rolling bearing. In the present embodiment, eight rollers are symmetrically mounted on the annular flange 33. The slider 50 is slidable within the chute 14. In the embodiment, the annular flange 33 and the sliding member 50 extend into the sliding slot 14. The slider 50 not only avoids direct friction between the annular flange 33 and the chute 14, but also makes the substrate carrier 30 more stable when rotated. It can be understood that the annular flange 33 may not be mounted with the sliding member 50, but may be in a non-direct contact manner with the sliding groove 14, leaving a gap. Referring to FIG. 3, the optical coating device 200 provided by the second embodiment of the present invention is substantially the same as the optical coating device 100 provided by the first embodiment, and the difference is that an annular sliding rail 160 is fixed to the inner wall of the vacuum coating chamber 110. 113, the annular slip 160 surrounds the inner wall 113 of the vacuum coating chamber 110. The annular slide 160 may be integrally formed with the inner wall 113 as a 201002837 type or may be separated from the inner wall 113 and then mechanically and chemically applied to the _113. In the present embodiment, the annular sliding handle 160 is formed integrally with the inner wall 113 1 p m 叮 & 円 円 wall 113. The chute 114 is formed in the annular pure (10) h embodiment, and a chute is formed on the annular rail 160; Q4.璜花? A plurality of g-shaped flanges U3 and sliding members 150 extend into the sliding slot 114. The optical mineral film device provided by the present invention extends from the outer edge of the substrate carrier to the annular flange and extends The inside of the inner wall of the vacuum ore film isolates the space between the front and back of the substrate carrier, so it effectively prevents the plating material from contaminating the surface of the back surface of the substrate carrier, thereby improving the quality of the lens coating. The invention has indeed met the requirements of the invention patent, and the patent is issued according to the law. However, the above is only a preferred embodiment of the invention, and it is not possible to limit the patent application of the case. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the present invention are intended to be included in the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of an optical coating apparatus provided by the prior art; FIG. The optical device shown in the first embodiment of the present invention is a schematic diagram of an optical money film device according to a second embodiment of the present invention. Coating device 1, 1〇〇, 200 vacuum coating chamber 2, 1〇, 11〇201002837 Top 11 Bottom 12 Inner wall 13, 113 Chute 14, 114 Slip 160 Rotating shaft 3, 20 Substrate carrier 4, 30 First Surface 31 annular flange 33' 133 back 4a steam source 5, 40 slide 50 > 150 substrate 6 ' 60 lens 7 > 70 11