200946327 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種導光板之製造方法,特別係有關 於一種具有微凹凸透鏡之導光板之製造方法。 【先前技術】 習知導光板之透鏡微結構係以v_Cq式形成於導光 板表面,如中華民國專利第购翻號,其係在該導光板 〇之丨下表面分別建構有呈連績鑛齒溝槽狀之稜鏡微結構 (V-ciit),然稜鏡微結構(v_cut)之製程繁複,生產時間較長 且容易有稜鏡角度方面的公差,使得製造成本提高及困難 •度增加’再者’ V_eut形式之導光板容易產生光干涉紋 .(Moire)現象而導料光板均句度不佳,必須額外設置一層 擴散膜’相對增加生產成本。 【發明内容】 本發明之主要目的係在於提供一種具有微凹凸透鏡 〇 之導光板之製造方法,包含下列步驟:提供一具有—第一 上表面與一第一下表面之第一基材;形成一第一光阻層於 該第一基材之該第一上表面;圖案化該第一光阻層以形成 複數個第一柱狀光阻;進行一第一回銲步驟,以使該些第 一柱狀光阻形成有複數個第一弧狀表面;電鑄一第一金屬 材於該第一基材之該第一上表面,該第一金屬材係具有_ 第表面與一第一表面’該第二表面係朝向該些第—枉狀 光阻之該些第一弧狀表面,以使該第一金屬材之該第二表 ’面形成有複數個弧狀凹部;移除該第一基材及該第—光F且 8 200946327 層’以形成一第一模具;提供一具有一第二上表面與一第 一下表面之第二基材;形成一第二光阻層於該第二基材之 該第二上表面;圖案化該第二光阻層以形成複數個第二柱 狀光阻;進行一第二回銲步驟,以使該些第二柱狀光阻形 成有複數個第二弧狀表面;電鑄一第二金屬材於該第二基 材之該第二上表面,該第二金屬材係覆蓋該些第二柱狀光 阻之該些第二弧狀表面,以形成一具有複數個弧狀凸部之 第二模具;提供一透光基板;以及將該第一模具壓合於該 透光基板之一第一顯露面及該第二模具壓合於該透光基 板之一第二顯露面,以使該透光基板之該第一顯露面形成 有複數個微凸透鏡及該第二顯露面形成有複數個微凹透 鏡。其係利用該第一及第二回銲步驟使得該第一與該第二 模具分別具有該些弧狀凹部及弧狀凸部,以使該透光基板BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a light guide plate, and more particularly to a method of manufacturing a light guide plate having a micro concave-convex lens. [Prior Art] The lens microstructure of the conventional light guide plate is formed on the surface of the light guide plate by v_Cq type. For example, the Republic of China patent purchases the turn number, which is constructed on the lower surface of the light guide plate. The groove-like microstructure (V-ciit), and the micro-structure (v_cut) process is complicated, the production time is long and the tolerance of the angle is easy, which makes the manufacturing cost increase and the difficulty increases. Furthermore, the light guide plate of the V_eut form is prone to light interference (Moire) phenomenon, and the light guide plate has a poor degree of sentence, and an additional diffusion film must be provided to relatively increase the production cost. SUMMARY OF THE INVENTION The main object of the present invention is to provide a method for manufacturing a light guide plate having a micro concave-convex lens, comprising the steps of: providing a first substrate having a first upper surface and a first lower surface; a first photoresist layer on the first upper surface of the first substrate; patterning the first photoresist layer to form a plurality of first columnar photoresists; performing a first reflow step to make the The first columnar photoresist is formed with a plurality of first arcuate surfaces; a first metal material is electroformed on the first upper surface of the first substrate, and the first metal material has a first surface and a first surface The surface of the second surface is oriented toward the first arcuate surfaces of the first 枉-shaped photoresist such that the second surface of the first metal material is formed with a plurality of arcuate recesses; a first substrate and the first light F and 8 200946327 layers 'to form a first mold; a second substrate having a second upper surface and a first lower surface; forming a second photoresist layer The second upper surface of the second substrate; patterning the second photoresist layer to form a plurality a second columnar photoresist; performing a second reflow step such that the second columnar photoresists are formed with a plurality of second arcuate surfaces; and electroforming a second metal material to the second substrate The second upper surface covers the second arcuate surfaces of the second columnar photoresists to form a second mold having a plurality of arcuate protrusions; providing a transparent substrate And pressing the first mold to the first exposed surface of the transparent substrate and the second mold to the second exposed surface of the transparent substrate to enable the first exposure of the transparent substrate A plurality of micro convex lenses are formed on the surface, and a plurality of micro concave lenses are formed on the second exposed surface. The first and second reflow steps are used to make the first and second molds respectively have the arcuate concave portions and the arcuate convex portions to make the transparent substrate
【實施方式】[Embodiment]
110’該第一基材110係具有一第 透鏡之導光板之製造方法,其係 驟11及2A圖,提供一第一基材 有一第一上表面111與一第一下 200946327 表面112 ’在本實施例中,該第一基材丨丨〇之材質係可選 自於石夕基板或玻璃基板;請參閱步驟12及2B圖,形成一 第一光阻層120於該第一基材11()之該第一上表面m; 請參閱步驟13及2C圖,圖案化該第一光阻層120以形成 複數個第一柱狀光阻121 ;請參閱步驟14及2d圖,進行 一第一回銲(refl〇w)步驟,以使該些第一柱狀光阻121形 成有複數個第一弧狀表面CS 1,在本實施例中,該第一回 〇 知步驟之回辉時間係介於2〜6小時,該第一回銲步驟之 回銲溫度係介於175〜300。(:;請參閱步驟15及2E圖,濺 鑛形成一第一種子層130( first seed layer)於該些第一柱 狀光阻121之該些第一弧狀表面csi上,該第一種子層 130之材質係可選自於金、銀、銅及鋁等可導電之金屬材; 請參閱步驟16及2F圖,電鑄一第一金屬材140於該第一 基材110之該第一上表面111,該第一金屬材14〇係具有 一第一表面141與一第二表面142,該第二表面142係朝 Ο 向該些第一柱狀光阻121之該些第一弧狀表面CS1,以使 該第一金屬材140之該第二表面142形成有複數個弧狀凹 部143 ’較佳地,由於在電鑷該第一金屬材14〇於該第一 基材110之該第一上表面111之步驟前,係已先濺鍍形成 s玄第一種子層130於該些第一柱狀光阻121之該些第一孤 狀表面CS1上,可增加該第一金屬材丨4〇於該第一基材 110之該第一上表面m之附著力;請參閱步驟17及 圖’移除該第一基材110及該第一光阻層12〇,以形成一 第一模具Ml’該第一模具Ml係為具有該些娘狀凹部143 10 200946327 之。亥第金屬材14〇;請參閱步驟18及211圖,提供一第 一基材15〇,該第二基材15〇係具有一第二上表面151與 第一下表面152,在本實施例中,該第二基材15〇之材 質係可選自於矽基板或玻璃基板;請參閱步驟丨9及21圖, 形成一第二光阻層16〇於該第二基材15〇之該第二上表面 151 ;請參閱步驟20及2J圖’圖案化該第二光阻層16〇 以形成複數個第二柱狀光阻丨6丨;請參閱步驟2丨及2K圖, 〇 進行—第二回銲步驟,以使該些第二柱狀光阻161形成有 複數個第二弧狀表面CS2,在該第二回銲步驟中,該第二 回銲步驟之回銲時間係介於2〜6小時,該第二回銲步驟 之回銲溫度係介於175〜30(TC ;請參閱步驟22及2]L圖, 濺鑛形成一第二種子層170 ( second seed layer )於該些第 二柱狀光阻161之該些第二弧狀表面CS2上,該第二種子 層170之材質係可選自於金、銀、銅及銘等可導電之金屬 材;請參閱步驟23及2M圖,電鑄一第二金屬材1 8〇於該 〇 第二基材150之該第二上表面151’該第二金屬材丨8〇係 覆蓋該些第二柱狀光阻161之該些第二弧狀表面CS2,以 形成一第二模具M2,該第二模具M2係具有複數個弧狀凸 部181,其中該第一金屬材140之厚度係大於該第二金屬 材1 8 0 ’在本實施例中,該第二模具M2係為具有該些弧 狀凸部181之該第二金屬材180,較佳地,由於在電鑄該 第二金屬材180於該第二基材150之該第二上表面151之 步驟前,係已先濺鍍形成該第二種子層170於該些第二枉 狀光阻161之該些第二孤狀表面CS2上’可增加該第二金 200946327 屬材180於該第二基材150之該第二上表面151之附著 力;請參閱步驟24及2N圖,提供一透光基板210,該透 光基板210係具有一第一顯露面211及一第二顯露面 2 12 ’在本實施例中,該透光基板2 10之材質係可選自於 玻璃或高透光性高分子材料;請參閱步驟25及20圖,將 該第一模具Ml壓合於該透光基板210之該第一顯露面 211及將該第二模具]vi2壓合於該透光基板210之該第二 0 顯露面212 ’在本實施例中,由於該第二模具M2係設置 於該第二基材15〇之該第二上表面151,因此壓合該第二 模具M2於該透光基板21〇之該第二顯露面212時,係利 用壓合該第二基材i 50於該透光基板21〇之該第二顯露面 212以使該第二模具M2壓合於該透光基板21〇之該第二 顯露面212;請參閲第3圖’以使該透光基板21〇之該第 一顯露面211形成有複數個微凸透鏡213及該第二顯露面 212形成有複數個微凹透鏡214,以形成一具有微凹凸透 © 鏡之導光板200,在本實施例中,該些微凹透鏡214與該 些微凸透鏡213之直徑係介於1 8402至22 613微米(μιη) 之間,該些微凹透鏡214與該些微凸透鏡213之中心厚度 (center thickness)係介於!.2至34微米(μη〇之間,該 些微凹透鏡214與該些微凸透鏡213之間距係介於至 1mm之間。本發明係利用該第一回銲步驟及該第二回銲步 驟使得該第一模具M1與該第二模具M2分別具有該些弧 狀凹部143及該些弧狀凸部181,以使該透光基板21〇之 該第一顯露面211形成有該些微凸透鏡2ί3及該第二顯露 12 200946327 面212形成有該些微凹透鏡214,以形成該具有微凹凸透 鏡之導光板200,具有製程簡便之功效,且該具有微凹凸 透鏡之導光板200之該些微凸透鏡213及該些微凹透鏡 214可將穿透該具有微凹凸透鏡之導光板2⑻之光線均勻 散射,省略擴散膜之設置,達到降低成本之功效。 本發明之保護範圍當視後附之申請專利範圍所界定 者為準,任何熟知此項技藝者,在不脫離本發明之精神和 〇 範圍内所作之任何變化與修改,均屬於本發明之保護範 圍。 【圖式簡單說明】 第 1 圊:.依據本發明之一具體實施例,一種具有微 凹凸透鏡之導光板之製造方法之流程圖。 第2A至20圖:依據本發明之一具體實施例,該具有微凹 凸透鏡之導光板之製造方法之載面示意 圖。 〇 第3 圖:依據本發明之一具體實施例,該具有微凹 凸透鏡之導光板之截面示意圖。 【主要元件符號說明】 11 提供一第一基材 12 形成一第一光阻層於該第一基材 13 圖案化該第一光阻層以形成複數個第—柱狀光且 14 進行一第一回銲步驟’ 15濺鍍形成一第一種子層於該些第一柱狀光阻之該些 第一弧狀表面上 13 200946327 16 17 18 19 20 21 22 電鑄一第一金屬材於該第一基材 移除該第一基材及該第一光阻層 提供一第二基材 形成—第二光阻層於該第二基材 以形成一第一模具 圖案化該第二《阻層以形成複數個第二柱狀光阻 進行一第二回銲步驟The first substrate 110 is a method for manufacturing a light guide plate having a first lens, which is provided in steps 11 and 2A, and provides a first substrate having a first upper surface 111 and a first lower 200946327 surface 112' In this embodiment, the material of the first substrate 可 can be selected from the stone substrate or the glass substrate; please refer to steps 12 and 2B to form a first photoresist layer 120 on the first substrate 11 (1) the first upper surface m; refer to steps 13 and 2C, patterning the first photoresist layer 120 to form a plurality of first columnar photoresists 121; see steps 14 and 2d for a a reflow process (refl〇w), so that the first columnar photoresists 121 are formed with a plurality of first arcuate surfaces CS1. In this embodiment, the rejuvenation time of the first recursive step is The system is between 2 and 6 hours, and the reflow temperature of the first reflow step is between 175 and 300. (:; see steps 15 and 2E, the first seed layer is formed on the first arcuate surfaces csi of the first columnar photoresists 121, the first seed The material of the layer 130 may be selected from electrically conductive metal materials such as gold, silver, copper and aluminum; please refer to steps 16 and 2F to electroform a first metal material 140 on the first substrate 110. The first surface 141 has a first surface 141 and a second surface 142, and the second surface 142 is opposite to the first arcs of the first columnar photoresists 121. The surface CS1 is such that the second surface 142 of the first metal material 140 is formed with a plurality of arcuate recesses 143'. Preferably, the first metal material 14 is disposed on the first substrate 110. Before the step of the first upper surface 111, the first seed layer 130 is first sputtered to form the first seed layer 130 on the first singular surface CS1 of the first columnar photoresist 121, and the first metal material may be added. The adhesion of the first upper surface m of the first substrate 110; please refer to step 17 and FIG. 2 to remove the first substrate 110 and the first photoresist layer 12 To form a first mold M1', the first mold M1 is formed with the matte recesses 143 10 200946327. The first metal material 14 〇; see steps 18 and 211, providing a first substrate 15 〇, The second substrate 15 has a second upper surface 151 and a first lower surface 152. In this embodiment, the second substrate 15 is made of a material selected from the substrate or the glass substrate; Steps 9 and 21 form a second photoresist layer 16 on the second upper surface 151 of the second substrate 15; please refer to steps 20 and 2J to pattern the second photoresist layer 16 To form a plurality of second columnar photoresists 丨6丨; please refer to steps 2丨 and 2K, 〇 perform a second reflow step, so that the second columnar photoresists 161 are formed with a plurality of second arcs a surface CS2, in the second reflow step, the reflow time of the second reflow step is between 2 and 6 hours, and the reflow temperature of the second reflow step is between 175 and 30 (TC; Referring to steps 22 and 2], the second seed layer is formed on the second arcuate surface of the second columnar photoresist 161. The material of the second seed layer 170 may be selected from the conductive metal materials such as gold, silver, copper, and the like on the CS2; please refer to steps 23 and 2M, and electroform a second metal material. The second upper surface 151 ′ of the second substrate 150 covers the second curved surfaces CS2 of the second columnar photoresists 161 to form a second mold M2 . The second mold M2 has a plurality of arcuate protrusions 181, wherein the thickness of the first metal material 140 is greater than the second metal material 180°. In this embodiment, the second mold M2 has The second metal material 180 of the arcuate protrusions 181 is preferably prior to the step of electroforming the second metal material 180 on the second upper surface 151 of the second substrate 150. Sputtering the second seed layer 170 on the second singular surfaces CS2 of the second ridges 161 to increase the second gold 200946327 genus 180 to the second substrate 150 Adhesion of the upper surface 151; referring to steps 24 and 2N, a transparent substrate 210 is provided, the transparent substrate 210 having a first exposed surface 211 and a first In the present embodiment, the material of the transparent substrate 2 10 may be selected from glass or a highly transparent polymer material; please refer to steps 25 and 20 to press the first mold M1 The first exposed surface 211 of the transparent substrate 210 and the second 0 exposed surface 212' of the transparent substrate 210 are pressed in the embodiment, due to the second mold The M2 is disposed on the second upper surface 151 of the second substrate 15 , so that when the second mold M2 is pressed against the second exposed surface 212 of the transparent substrate 21 , the second is pressed The substrate i 50 is disposed on the second exposed surface 212 of the transparent substrate 21 to press the second mold M2 to the second exposed surface 212 of the transparent substrate 21; see FIG. 3 The first exposed surface 211 of the transparent substrate 21 is formed with a plurality of micro convex lenses 213 and the second exposed surface 212 is formed with a plurality of micro concave lenses 214 to form a light guide plate 200 having a micro concave and convex mirror. In this embodiment, the diameters of the micro concave lenses 214 and the micro convex lenses 213 are between 18402 and 22 613 micrometers (μιη). The slightly concave lens system 214 between the central thickness (center thickness) of the micro lens 213! Between 2 and 34 μm (μη〇, the distance between the micro concave lens 214 and the micro convex lens 213 is between 1 mm. The present invention utilizes the first reflow step and the second reflow step to make the first The mold M1 and the second mold M2 respectively have the arcuate concave portions 143 and the arcuate convex portions 181, so that the first convex surface 21 of the transparent substrate 21 is formed with the micro convex lenses 2ί3 and the first The second exposure 12 200946327 surface 212 is formed with the micro concave lens 214 to form the light guide plate 200 having the micro concave and convex lens, which has the advantages of simple process, and the micro convex lens 213 of the light guide plate 200 having the micro concave and convex lens and the micro concave lens 214, the light passing through the light guide plate 2 (8) having the micro concave-convex lens can be uniformly scattered, and the arrangement of the diffusion film is omitted, thereby reducing the cost. The scope of protection of the present invention is determined by the scope of the appended patent application. Any changes and modifications made by those skilled in the art without departing from the spirit and scope of the invention are within the scope of the invention.圊: A flow chart of a method of manufacturing a light guide plate having a micro concave-convex lens according to an embodiment of the present invention. 2A to 20: a light guide plate having a micro concave-convex lens according to an embodiment of the present invention FIG. 3 is a schematic cross-sectional view of a light guide plate having a micro concave-convex lens according to an embodiment of the present invention. [Description of Main Components] 11 Providing a first substrate 12 to form a The first photoresist layer is patterned on the first substrate 13 to form a plurality of first columnar lights and 14 is subjected to a first reflow step '15 sputtering to form a first seed layer. On the first curved surfaces of the first columnar photoresists 13 200946327 16 17 18 19 20 21 22 electroforming a first metal material to remove the first substrate and the first light on the first substrate The resist layer provides a second substrate to form a second photoresist layer on the second substrate to form a first mold to pattern the second "resist layer to form a plurality of second columnar photoresists for a second back Welding step
濺鍍形成-第二種子層於該些第二柱狀光阻之該些 第一弧狀表面上 23 24 電鳞一第二金屬材於該第二基材 提供-透光基板,該透光基板係具有一第一顯露面及 一第二顯露面Sputtering forming a second seed layer on the first arcuate surfaces of the second columnar photoresists 23 24 to form a second metal material on the second substrate to provide a light transmissive substrate, the light transmission The substrate has a first exposed surface and a second exposed surface
25將該第一模具壓合於該透光基板之該第一顯露面及 該第二模具壓合於該透光基板之該第二顯露面 110第一基材 120第一光阻層 140第一金屬材 143弧狀凹部 152第二下表面 170第二種子層 200具有微凹凸透鏡之導光板 210透光基板 211第一顯露面 213微凸透鏡 214微凹透鏡 D 直徑 M2 第二模具 ill第一上表面 121第一柱狀光阻 Ml第一表面 150第二基材 160第二光阻層 180第二金屬材 h 中心厚度 CS1第—弧狀表面 112第一下表面 130第一種子層 142第二表面 151第二上表面 1 6 1第二柱狀光阻 1 8 1弧狀凸部 2 1 2第二顯露面Pressing the first mold to the first exposed surface of the transparent substrate and the second mold to the second exposed surface 110 of the transparent substrate, the first substrate 120, the first photoresist layer 140 a metal material 143 arcuate recess 152 second lower surface 170 second seed layer 200 with micro concave and convex lens light guide plate 210 light transmissive substrate 211 first exposed surface 213 micro convex lens 214 micro concave lens D diameter M2 second mold ill first Surface 121 first columnar photoresist M1 first surface 150 second substrate 160 second photoresist layer 180 second metal material h center thickness CS1 first arcuate surface 112 first lower surface 130 first seed layer 142 second Surface 151 second upper surface 1 6 1 second columnar photoresist 1 8 1 arcuate convex portion 2 1 2 second exposed surface
Ml 第一模具 CS2第一弧狀表面 14Ml first mold CS2 first curved surface 14