TW200943003A - Method of manufacturing the substrate - Google Patents
Method of manufacturing the substrateInfo
- Publication number
- TW200943003A TW200943003A TW098104014A TW98104014A TW200943003A TW 200943003 A TW200943003 A TW 200943003A TW 098104014 A TW098104014 A TW 098104014A TW 98104014 A TW98104014 A TW 98104014A TW 200943003 A TW200943003 A TW 200943003A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- manufacturing
- plasma ashing
- ashing treatment
- photoresist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A method of manufacturing a semiconductor substrate is provided. The substrate manufacturing method performs a primary plasma ashing treatment after first heating the substrate on which a photoresist is formed. Then, after decreasing the substrate temperature under the state of atmospheric pressure, a secondary plasma ashing treatment of the substrate is once again performed. This allows chemical bonding changes of the photoresist and the occurrence of popping and the residue to be decreased so as to enhance the yield of products since the temperature of the substrate is decreased for a while under the state of atmospheric pressure during the plasma ashing treatment process.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080013996A KR101049939B1 (en) | 2008-02-15 | 2008-02-15 | Substrate manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200943003A true TW200943003A (en) | 2009-10-16 |
TWI400583B TWI400583B (en) | 2013-07-01 |
Family
ID=41076075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098104014A TWI400583B (en) | 2008-02-15 | 2009-02-09 | Substrate manufacturing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5213741B2 (en) |
KR (1) | KR101049939B1 (en) |
TW (1) | TWI400583B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8825028B2 (en) | 2009-08-25 | 2014-09-02 | Nec Corporation | Caller information displaying method, cellular phone, and non-transitory computer readable medium storing program |
JP6438649B2 (en) * | 2013-12-10 | 2018-12-19 | 株式会社Screenホールディングス | Substrate processing method and substrate processing apparatus |
KR101994895B1 (en) | 2016-09-26 | 2019-07-01 | 에이피시스템 주식회사 | Apparatus for processing substrate |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103119A (en) * | 1990-08-23 | 1992-04-06 | Nec Corp | Resist removing device |
JPH06177088A (en) * | 1992-08-31 | 1994-06-24 | Sony Corp | Method and apparatu for ashing |
JPH0878372A (en) * | 1994-09-01 | 1996-03-22 | Hitachi Ltd | Organic matter removing method and its apparatus |
JP3728165B2 (en) * | 1999-01-28 | 2005-12-21 | キヤノン株式会社 | Ion-implanted photoresist residue processing method and semiconductor device manufacturing method |
KR100379210B1 (en) * | 2002-04-19 | 2003-04-08 | 피.에스.케이.테크(주) | Method for Semiconductor Wafer Ashing |
KR20050071150A (en) * | 2003-12-31 | 2005-07-07 | 동부아남반도체 주식회사 | Method for removing color photoresist |
US20070209200A1 (en) * | 2004-03-31 | 2007-09-13 | Tadahiro Ohmi | Circuit Board, Method Of Manufacturing Circuit Board, And Display Device Having Circuit Board |
JP4587837B2 (en) * | 2005-02-18 | 2010-11-24 | Hoya株式会社 | Gray tone mask manufacturing method and gray tone mask |
KR100710705B1 (en) * | 2005-11-22 | 2007-04-23 | 피에스케이 주식회사 | Method for ashing substrates |
US7749400B2 (en) * | 2005-12-16 | 2010-07-06 | Jason Plumhoff | Method for etching photolithographic substrates |
-
2008
- 2008-02-15 KR KR1020080013996A patent/KR101049939B1/en not_active IP Right Cessation
-
2009
- 2009-02-02 JP JP2009021411A patent/JP5213741B2/en not_active Expired - Fee Related
- 2009-02-09 TW TW098104014A patent/TWI400583B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP5213741B2 (en) | 2013-06-19 |
KR20090088608A (en) | 2009-08-20 |
KR101049939B1 (en) | 2011-07-15 |
TWI400583B (en) | 2013-07-01 |
JP2009194380A (en) | 2009-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |