TW200942631A - Sputtering device and spiutering umbrella stand mask using the same - Google Patents
Sputtering device and spiutering umbrella stand mask using the sameInfo
- Publication number
- TW200942631A TW200942631A TW97112230A TW97112230A TW200942631A TW 200942631 A TW200942631 A TW 200942631A TW 97112230 A TW97112230 A TW 97112230A TW 97112230 A TW97112230 A TW 97112230A TW 200942631 A TW200942631 A TW 200942631A
- Authority
- TW
- Taiwan
- Prior art keywords
- sputtering
- umbrella stand
- mask
- mask member
- umbrella
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
A sputtering device includes a sputtering umbrella stand. The sputtering umbrella stand includes a plurality of through holes. The through holes are configured for receiving the workpieces therein. The sputtering device also includes a sputtering umbrella stand mask which is configured for covering the sputtering umbrella stand. The sputtering umbrella stand mask includes a first mask member and a second mask member. The first mask member is configured for covering the sputtering umbrella stand directly. The first mask member includes a hollow umbrella bracket. The umbrella bracket includes a plurality of supporting axes. The inboard of each supporting axis includes several shelter pieces. The several shelter pieces are configured correspondingly to the through holes of the sputtering umbrella stand. The second mask member is configured for covering the first mask member. The height of the second mask member is not less than that of the first mask member. The sputtering umbrella stand mask can prevent the workpiece to be polluted and overcome the workpiece distortion caused by the high temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW97112230A TWI397596B (en) | 2008-04-03 | 2008-04-03 | Sputtering device and spiutering umbrella stand mask using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW97112230A TWI397596B (en) | 2008-04-03 | 2008-04-03 | Sputtering device and spiutering umbrella stand mask using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200942631A true TW200942631A (en) | 2009-10-16 |
TWI397596B TWI397596B (en) | 2013-06-01 |
Family
ID=44868721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW97112230A TWI397596B (en) | 2008-04-03 | 2008-04-03 | Sputtering device and spiutering umbrella stand mask using the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI397596B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI410512B (en) * | 2010-11-17 | 2013-10-01 | Hon Hai Prec Ind Co Ltd | Sputtering device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI281511B (en) * | 2004-06-24 | 2007-05-21 | Asia Optical Co Inc | Substrate support fixture for vapor deposition coating apparatus |
-
2008
- 2008-04-03 TW TW97112230A patent/TWI397596B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI410512B (en) * | 2010-11-17 | 2013-10-01 | Hon Hai Prec Ind Co Ltd | Sputtering device |
Also Published As
Publication number | Publication date |
---|---|
TWI397596B (en) | 2013-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |