200928575 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種光罩結構，特別是關於一種具有魚眼 透鏡結構之光罩結構。 【先前技術】 在習知的半導體製程中，一般而言在晶圓上光阻後，經 ❹ 曝光處理，再由顯影液將曝光區的正光阻溶解、洗淨、晾乾， 再經蝕刻去除曝光區的絕緣層，而未曝光區的光阻則不受蝕 ' 刻影響，最後除去剩餘光阻，即可製成設計所需之絕緣層鑄 型影像。而絕緣層之鑄型影像，乃作為下個製程的遮蔽保護 層，亦即作為光罩之使用。 而目前半導體產業發展之趨勢之一便是元件尺寸的縮 微，除了開發新的曝光源外，應用一些特殊方式來輔助原有 的製程，亦可相當程度達到縮小尺寸的目的。除此之外，尋 Q 找新穎的微影技術，以突破光微影技術的極限，也是目前最 重要的課題之一。現今已知改善解析度的方法有下列幾種， 包括有離轴照明（off-axis illumination )、相偏移光罩（ phase shift mask )、鄰近效應修正（optical proximity correction )以及電子束微影束等方法。 【發明内容】 本發明所欲解決之技術問題： 5 200928575 然而，半導體科技所需之製程設備中，包括微影、蝕刻、 擴散、離子植入等步驟，其中又以微影製程最為重要，因為 大部分程序必須重複經過微影製程來完成。而其中微影製程 使用之曝光機其光學系統解析度關乎於所能製造出的線寬 以及精確度，但高階的曝光機其價格非常昂貴，往往需花費 大量成本於採購相關操作機器。且一般之光罩結構，僅能對 應產生一種線寬之標的物。 緣此，本發明之主要目的即是提供一種具有魚眼透鏡結 構之光罩，藉由魚眼透鏡結構之設計，以使光源通過魚眼透 鏡結構後可聚集或發散，以提高光微影技術之微影精度 (L/S=line/ space)。並可藉由魚眼光罩結構之聚集或發散功 能，形成各種不同幾何陣列構形（尖形或筍形等等）之標的 物。並可藉由調整魚眼光罩結構與曝光標的物之間距，以控 制曝光區域之大小。 本發明解決問題之技術手段： 本發明為解決習知技術之問題所採用之技術手段係係 以一玻璃或石英之透明基材，在其底面形成一材質為鉻之阻 光材料層，且該阻光材料層開設有複數個光源透空區，以遮 蔽光線之穿透。並在透明基材之底面或平整表面形成一魚眼 透鏡結構，在其頂面係形成一凸曲面，以形成複數個魚眼透 鏡，且各個凸曲面係--對應於阻光材料層之光源透空區。 魚眼透鏡結構亦可包括有一保護膜，覆蓋魚眼透鏡並具有保 護魚眼透鏡之功能。 6 200928575 本發明對照先前技術之功效： 經由本發明所採用之技術手段，在製作電路板、光濾膜 或液晶螢幕時，以低階曝光機配合利用本發明之魚眼光罩結 構作為一光罩，以使微影精度(L/S=line/space)提高至高階曝 光機等級，而無須花費昂貴成本於採購高階之曝光機，即可 達到高階曝光機之效果。且利用其光源聚集或發散之功能， 可產生之不同幾何陣列構形之標的物，並調整其間距以控制 曝光區域之大小，故其在應用範圍上較為廣泛，在操作上亦 相當簡便。 本發明所採用的具體實施例，將藉由以下之實施例及附 呈圖式作進一步之說明。 【實施方式】 參閱第1圖所示，其係顯示本發明之第一實施例之剖視 圖。如圖所示，本發明魚眼光罩結構100係包括有一透明基 材1、一阻光材料層2及一魚眼透鏡結構3。透明基材1具 有一平整表面10及一底面11，其材質可以為一玻璃或石英。 阻光材料層2形成於透明基材1之底面11，且阻光材 料層2開設有複數個光源透空區20。阻光材料層2之材質可 以為鉻或其他阻光材料，可用以遮蔽光線之穿透。 魚眼透鏡結構3包括有複數個魚眼透鏡31及一保護膜 32。其中魚眼透鏡結構3之各個魚眼透鏡31之底面310係 結合於該透明基材1之平整表面10,而其頂面係形成一凸曲 7 200928575 面311，以形成該魚眼透鏡31，且各個凸曲面311係一一對 應於該阻光材料層2之光源透空區2〇β而魚眼透鏡結構3 之保護膜32係形成在該透明基材丨之平整表面1〇覆蓋 魚眼透鏡31，具有保護魚眼透鏡31之功能。 第2圊至第6圖係顯示本發明之第一實施例之製程示意 圖。如第2圖所*，在透明基材！之底面u之阻光材料層^ 開設有複數個光源透空㊣2〇。且在透明基材丨之平整表面 ❹ ❹ W塗佈有-負型光阻4,且該負型光阻4具有—折射係數 Ν1 〇 如第3圖至第4圖所示’以—紫外線由下而上照射，由 Γ、阻光材料層4之遮蔽作用，使光線照射後，穿透透明基材 亚使負型光阻4可區分為受光線照射之受光部4〇，以及受 f光材料層4之遮蔽而未受光線照射之未受光部41。接著以 ”·’員影液洗去負型光阻4之未受井邱4 之為^ 先邛 僅留下負型光阻4 之又先40。在本實施例中負型 除利用曝光及顯景m介 文部0之形成 先m料，村叫_版印難程形成。 面u) 1之5自=$ 6 ®所示’將保留於透明基材1之平整表 烤作用=4阻4之複數個受光部4〇進行迴烤，經由迴 皆==，鏡31’其中該每-個魚眼透鏡3 凸曲面311。接著再塗佈一俘 魚眼透鏡2及透明基材】之平:表面 =:3覆盖權 複數個魚眼31，i ’以保護形成之 ㈣h 且保歧膜3具有-折射係數犯。 ^第圖，其係顯示本發明之第一杳力/· γ , 應用示意圖。如圖所千. 只苑例之光源聚集 圖所不’在進行半導體之微影投射製程中， 8 200928575200928575 IX. Description of the Invention: [Technical Field] The present invention relates to a reticle structure, and more particularly to a reticle structure having a fisheye lens structure. [Prior Art] In the conventional semiconductor process, after the photoresist on the wafer is generally subjected to 曝光 exposure treatment, the positive photoresist of the exposed region is dissolved, washed, dried, and etched by the developer. The insulating layer of the exposed area, while the photoresist of the unexposed area is not affected by the etch, and finally the remaining photoresist is removed to form an insulating layer mold image required for the design. The mold image of the insulating layer is used as a masking protective layer for the next process, that is, as a mask. One of the current trends in the development of the semiconductor industry is the shrinking of component sizes. In addition to the development of new exposure sources, some special methods are applied to assist the original process, and the size reduction can be achieved to a considerable extent. In addition, finding new lithography technology to break through the limits of photolithography is one of the most important topics. There are several methods known to improve resolution today, including off-axis illumination, phase shift mask, optical proximity correction, and electron beam lithography. And other methods. SUMMARY OF THE INVENTION The technical problem to be solved by the present invention is: 5 200928575 However, in the process equipment required for semiconductor technology, including lithography, etching, diffusion, ion implantation and the like, the lithography process is most important because Most of the program must be repeated through the lithography process. The optical system resolution of the exposure machine used in the lithography process is related to the line width and accuracy that can be produced, but the high-end exposure machine is very expensive and often costs a lot of money to purchase related operating machines. And the general reticle structure can only correspond to the object of a line width. Accordingly, the main object of the present invention is to provide a photomask having a fisheye lens structure, which is designed by a fisheye lens structure so that the light source can be collected or dispersed after passing through the fisheye lens structure to improve photolithography. The lithography accuracy (L/S=line/space). The objects of various geometric array configurations (pointed or bamboo shoots, etc.) can be formed by the accumulation or divergence of the fisheye reticle structure. The size of the exposed area can be controlled by adjusting the distance between the fisheye mask structure and the exposure target. Technical Solution for Solving the Problems of the Invention: The technical means adopted by the present invention to solve the problems of the prior art is to use a transparent substrate of glass or quartz to form a layer of light-blocking material made of chromium on the bottom surface thereof, and The light blocking material layer is provided with a plurality of light source transparent areas to shield the penetration of light. And forming a fisheye lens structure on the bottom surface or the flat surface of the transparent substrate, forming a convex curved surface on the top surface thereof to form a plurality of fisheye lenses, and each convex curved surface system--corresponding to the light source of the light blocking material layer Through the air. The fisheye lens structure may also include a protective film covering the fisheye lens and having the function of protecting the fisheye lens. 6 200928575 The present invention compares the effects of the prior art: through the technical means adopted by the present invention, in the production of a circuit board, a light filter film or a liquid crystal screen, a low-order exposure machine is used in conjunction with the fisheye reticle structure of the present invention as a mask. In order to improve the lithography accuracy (L/S=line/space) to the high-order exposure machine level, the high-order exposure machine can be achieved without expensive cost for purchasing high-end exposure machines. Moreover, by using the function of collecting or diverging the light source, the object of different geometric array configurations can be generated, and the spacing thereof is adjusted to control the size of the exposed area, so that the application range is wider and the operation is relatively simple. The specific embodiments of the present invention will be further described by the following examples and the accompanying drawings. [Embodiment] Referring to Fig. 1, there is shown a cross-sectional view showing a first embodiment of the present invention. As shown, the fisheye reticle structure 100 of the present invention comprises a transparent substrate 1, a layer of light blocking material 2 and a fisheye lens structure 3. The transparent substrate 1 has a flat surface 10 and a bottom surface 11, which may be made of glass or quartz. The light blocking material layer 2 is formed on the bottom surface 11 of the transparent substrate 1, and the light blocking material layer 2 is provided with a plurality of light source transparent regions 20. The material of the light blocking material layer 2 may be chrome or other light blocking material, which can be used to shield the penetration of light. The fisheye lens structure 3 includes a plurality of fisheye lenses 31 and a protective film 32. The bottom surface 310 of each fisheye lens 31 of the fisheye lens structure 3 is bonded to the flat surface 10 of the transparent substrate 1, and the top surface thereof is formed with a convex curve 7 200928575 surface 311 to form the fisheye lens 31. And each convex curved surface 311 is one-to-one corresponding to the light source transparent area 2 〇β of the light blocking material layer 2, and the protective film 32 of the fisheye lens structure 3 is formed on the flat surface of the transparent substrate 〇1 〇 covering the fisheye The lens 31 has a function of protecting the fisheye lens 31. 2 to 6 are schematic views showing a process of the first embodiment of the present invention. As shown in Figure 2, on a transparent substrate! The light-blocking material layer of the bottom surface u is provided with a plurality of light sources that are transparent. And the flat surface of the transparent substrate ❹ ❹ W is coated with a negative-type photoresist 4, and the negative-type photoresist 4 has a refractive index Ν1, as shown in FIGS. 3 to 4 The bottom-up illumination is shielded by the enamel and the light-blocking material layer 4, and after the light is irradiated, the transparent substrate is penetrated to make the negative-type photoresist 4 distinguishable into the light-receiving portion 4〇 illuminated by the light, and the f-light is received. The unreceived portion 41 of the material layer 4 that is shielded from light. Then, the negative-type photoresist 4 is washed away by the "········································ The formation of the m-text section 0 is the first m material, and the village is called _printing difficult to form. The surface u) 1 of 5 from =$ 6 ® 'will remain on the transparent substrate 1 flat table baking effect = 4 resistance 4 of the plurality of light-receiving portions 4 〇 are bake-backed, through the return ==, the mirror 31', wherein each of the fisheye lenses 3 has a convex curved surface 311. Then, a captive fish lens 2 and a transparent substrate are coated. Flat: surface =: 3 covers a plurality of fish eyes 31, i 'is formed by protection (4) h and the conformal film 3 has a refractive index. ^ Figure, which shows the first force / γ of the present invention, Application diagram. As shown in the figure. The source of the light source is not included in the semiconductor lithography projection process, 8 200928575
可在基材5之表面5〇上塗佈_光阻層以作為一半導 f才料。在本應關中，魚㈣鏡Μ之折射純N1大於保 。膜3之折射係數Ν2時，以魚眼光罩結構⑽作為一光罩。 再以以《源L由上而下投射，其中該光源l可以是一采 燈、雷射源或X光源。當光源L投射至魚眼光罩結構1〇〇 之,、、、艮透鏡'、、。構3時，其中光源L係由魚眼透鏡結構3之备 眼透鏡31通過，經由魚眼透鏡之凸曲面3U，可改縣 源L之行進方向並經由調整魚眼光罩結構⑽與半導體材料 之間距以控制光源聚集之區域大小，可提高微影投射製程之 精度® 第8圖係顯示本發明之第一實施例之光源發散應用示 意圖。在本應用例中，亦可將第7圖中之魚眼光罩結構1〇〇 上下倒置，同樣可應用於半導體之微影投射製程，如第8圖 所示，其結構組成之圖號標示與第7圖相同，容不再贊述。 其係以-光源L由上而下投射至魚眼光罩結構·，當光源 L由魚眼透鏡結構3之魚眼透鏡31入射通過，、經由魚眼透 鏡31之凸曲面311後，再由保護膜3出射，由於保護膜3 之折射係數N2小於魚眼透鏡31之折射係數.m，可改變光 源L之行進方向並經由調整魚眼光罩結構⑽與半導體材料 之間距以控制光源L發散之區域大小。 參閱第9圖所示，其係顯示本發明之第二實施例之剖視 圖。如圖所示，第二實施例與第—實施例結構組成相似，是 故以相同圖號標示。其中魚眼光罩結構⑽a之魚眼透鏡結 構3包括有一保護膜32及一魚眼透鏡光學膜層刊。保護膜 9 200928575 32具有一底面320與一頂面321，其底面320結合於透明基 材1之平整表面10,而其頂面321形成有複數個凹曲面322, 該各個凹曲面322係一 一對應於阻光材料層2之光源透空區 2〇 °魚眼透鏡光學膜層33係形成在保護膜32之頂面321， 並在保護膜32之各個凹曲面322位置形成魚眼透鏡31a。 參閱第10圖所示，其係顯示本發明之第三實施例之剖 視圖。如圖所示，第三實施例與第二實施例之結構組成相 ❹ 同，是故以相同圖號標示。其中與第二實施例不同之處在 於，魚眼光罩結構100b之魚眼透鏡結構3係經由其魚眼透 鏡光學膜層33之底面330結合於透明基材丨之平整表面 . 10’而其頂面331形成有複數個凸曲面311，各個凸曲面311 係 對應於阻光材料層2之光源透空區20，以形成該魚眼 透鏡31a。而魚眼透鏡結構3更包括有一保護膜32，形成在 魚眼透鏡光學膜層33之頂面331。 參閱第11圖所示，其係顯示本發明之第四實施例之剖 © 視圖。如圖所示，第四實施例與第三實施例之結構組成相 同，是故以相同圖號標示。其中不同之處在於魚眼光罩結構 100c之魚眼透鏡結構3係經由魚眼透鏡光學膜層33之頂面 331結合於透明基材丨之底面u之阻光材料層2上，而其底 面330形成有複數個凸曲面311，該各個凸曲面係__ 對應於該阻光材料層2之光源透空區2〇,以形成魚眼透鏡 31a而魚眼透鏡結構3更包括有一保護膜32，形成在魚眼 透鏡光學膜層33之底面330。 參閱第12圖所示，其係、顯示本發明之第五實施例之剖 200928575 視圖。如圖所示，第五實施例與第四實施例之結構組成相 同，是故以相同圖號標示。其中與第四實施例不同之處在於 魚眼光罩結構100d之魚眼透鏡結構3係經由保護膜32之頂 面321結合於透明基材1之底面11之阻光材料層2上，而 魚眼透鏡光學膜層33係形成在保護膜32之底面320，並在 保護膜32之各個凹曲面322位置形成魚眼透鏡31a。 參閱第13圖所示，其係顯示本發明之第六實施例之剖 視圖。如圖所示，第六實施例與前述實施例之結構組成相 同，是故以相同圖號標示。其中不同之處在於魚眼光罩結構 100e之魚眼透鏡結構3係經由其保護膜32之底面320結合 於透明基材1之平整表面10，且魚眼透鏡光學膜層33係形 成於該保護膜32之頂面321。魚眼透鏡光學膜層33之魚眼 透鏡31b係分別在魚眼透鏡光學膜層33之底面330及頂面 331具有一對應於阻光材料層2之光源透空區20之凸曲面 322,並於該魚眼透鏡光學膜層33之頂面331結合另一保護 膜32。 參閱第14圖所示，其係顯示本發明之第七實施例之剖 視圖。如圖所示，第七實施例與第六實施例之結構組成相 同，是故以相同圖號標示。其中本實施例之魚眼光罩結構 100e結構組成與第六實施例相同，不同之處在於魚眼光罩結 構100e之魚眼透鏡結構3係經由其保護膜32之頂面321結 合於透明基材1之底面11之阻光材料層2上，其餘部分與 第六實施例相同，容不再贅述。 本發明之第二實施例至第七實施例之製程係可經由與 11 200928575 第-實施例相同之作法，係利用曝光、顯影、迴烤、加伴護 =步驟，先形成—魚眼透鏡結構3後，再將魚眼透鏡結構 3剝離^並將魚眼透鏡結構3貼覆於基材ι之頂面ι〇或底 之種種不合方式’以形成如第二實施例至第七實施例 7種種不同〜而其應用例與第一實施例相同，請參閱第 —8 ® ’分別可具有聚集光源與發散光源 之不同應用 例，故容不再贅述。A photoresist layer may be applied on the surface 5 of the substrate 5 as a half-conducting material. In this aspect, the refraction pure N1 of the fish (4) mirror is greater than the guarantee. When the refractive index of the film 3 is Ν2, the fisheye reticle structure (10) is used as a reticle. Further, the source L is projected from top to bottom, wherein the light source l may be a light source, a laser source or an X light source. When the light source L is projected to the fisheye reticle structure 1, 艮 lens ', , . In the case of the structure 3, the light source L is passed by the eye lens 31 of the fisheye lens structure 3. The convex curved surface 3U of the fisheye lens can change the traveling direction of the county source L and adjust the fisheye mask structure (10) and the semiconductor material. The pitch is to control the size of the area where the light source is concentrated, and the precision of the lithography projection process can be improved. Fig. 8 is a schematic view showing the light source divergence application of the first embodiment of the present invention. In this application example, the fisheye reticle structure of FIG. 7 can also be inverted upside down, and can also be applied to a semiconductor lithography projection process. As shown in FIG. 8, the structure of the structure is marked with Figure 7 is the same, and the content is no longer praised. It is projected from the top to the bottom of the light source L to the fisheye reticle structure. When the light source L is incident through the fisheye lens 31 of the fisheye lens structure 3, it is protected by the convex curved surface 311 of the fisheye lens 31. The film 3 is emitted. Since the refractive index N2 of the protective film 3 is smaller than the refractive index .m of the fisheye lens 31, the traveling direction of the light source L can be changed and the area where the light source L is diverged can be controlled by adjusting the distance between the fisheye mask structure (10) and the semiconductor material. size. Referring to Figure 9, there is shown a cross-sectional view of a second embodiment of the present invention. As shown in the figure, the second embodiment is similar in composition to the first embodiment, and is therefore designated by the same reference numerals. The fisheye lens structure 3 of the fisheye reticle structure (10)a includes a protective film 32 and a fisheye lens optical film layer. The protective film 9 200928575 32 has a bottom surface 320 and a top surface 321 whose bottom surface 320 is bonded to the flat surface 10 of the transparent substrate 1 and the top surface 321 is formed with a plurality of concave curved surfaces 322 which are one by one. The light source transparent region 2 corresponding to the light blocking material layer 2 is formed on the top surface 321 of the protective film 32, and the fisheye lens 31a is formed at each concave curved surface 322 of the protective film 32. Referring to Fig. 10, there is shown a cross-sectional view of a third embodiment of the present invention. As shown in the figure, the third embodiment is identical to the second embodiment in that it has the same reference numerals. The difference from the second embodiment is that the fisheye lens structure 3 of the fisheye reticle structure 100b is bonded to the flat surface of the transparent substrate via the bottom surface 330 of the fisheye lens optical film layer 33. The face 331 is formed with a plurality of convex curved surfaces 311, each of which corresponds to the light source transparent region 20 of the light blocking material layer 2 to form the fisheye lens 31a. The fisheye lens structure 3 further includes a protective film 32 formed on the top surface 331 of the fisheye lens optical film layer 33. Referring to Fig. 11, there is shown a cross-sectional view of a fourth embodiment of the present invention. As shown in the figure, the fourth embodiment is identical in structure to the third embodiment, and is therefore designated by the same reference numerals. The difference is that the fisheye lens structure 3 of the fisheye reticle structure 100c is bonded to the light blocking material layer 2 of the bottom surface u of the transparent substrate via the top surface 331 of the fisheye lens optical film layer 33, and the bottom surface 330 thereof. Forming a plurality of convex curved surfaces 311 corresponding to the light source transparent area 2〇 of the light blocking material layer 2 to form the fisheye lens 31a, and the fisheye lens structure 3 further includes a protective film 32. The bottom surface 330 of the fisheye lens optical film layer 33 is formed. Referring to Fig. 12, there is shown a view of a section 200928575 of the fifth embodiment of the present invention. As shown in the figure, the fifth embodiment is identical in structure to the fourth embodiment, and is therefore designated by the same reference numerals. The difference from the fourth embodiment is that the fisheye lens structure 3 of the fisheye reticle structure 100d is bonded to the light-blocking material layer 2 of the bottom surface 11 of the transparent substrate 1 via the top surface 321 of the protective film 32, and the fisheye The lens optical film layer 33 is formed on the bottom surface 320 of the protective film 32, and a fisheye lens 31a is formed at each concave curved surface 322 of the protective film 32. Referring to Fig. 13, there is shown a cross-sectional view of a sixth embodiment of the present invention. As shown in the figure, the sixth embodiment is identical in structure to the foregoing embodiment, and is therefore designated by the same reference numerals. The difference is that the fisheye lens structure 3 of the fisheye reticle structure 100e is bonded to the flat surface 10 of the transparent substrate 1 via the bottom surface 320 of the protective film 32, and the fisheye lens optical film layer 33 is formed on the protective film. The top surface of 32 is 321 . The fisheye lens 31b of the fisheye lens optical film layer 33 has a convex curved surface 322 corresponding to the light source transparent region 20 of the light blocking material layer 2 on the bottom surface 330 and the top surface 331 of the fisheye lens optical film layer 33, respectively. The other protective film 32 is bonded to the top surface 331 of the fisheye lens optical film layer 33. Referring to Fig. 14, there is shown a cross-sectional view of a seventh embodiment of the present invention. As shown in the figure, the seventh embodiment is identical in structure to the sixth embodiment, and is therefore designated by the same reference numerals. The fisheye reticle structure 100e of the present embodiment has the same structural composition as the sixth embodiment, except that the fisheye lens structure 3 of the fisheye reticle structure 100e is bonded to the transparent substrate 1 via the top surface 321 of the protective film 32. The remaining portion of the bottom surface 11 of the light-blocking material layer 2 is the same as that of the sixth embodiment, and will not be described again. The process of the second embodiment to the seventh embodiment of the present invention can be formed by the same method as that of the embodiment of the invention of the invention of the present invention by the exposure, development, back-bake, and escort=steps to form the fisheye lens structure. After 3, the fisheye lens structure 3 is peeled off and the fisheye lens structure 3 is attached to the top surface ι of the substrate ι or the bottom of the substrate to form the second embodiment to the seventh embodiment. The application examples are the same as those in the first embodiment. Please refer to the different application examples of the condensed light source and the divergent light source, respectively, and therefore will not be described again.
、上之實鈿例可知，本發明所提供之魚眼光罩結構確 :產業上之利用價值，故本發明#已符合於專利之要件。惟 =上之敘述僅為本發明之較佳實施例說明，凡精於此項技藝 s可依據上述之說明而作其它種種之改良，惟這些改變仍 於本發明 <發_神及以下所界定之專利範圍中。 【圖式簡單說明】 第1圖係顯示本發明之第一實施例之剖視圖； ❹=圖至第6圖係顯示本發明之第—實施例之製程示意圖； # 7圖係顯不本發明之第—實施例之光源聚集應用示意圖； =8圖係顯7F本發明之第—實施例之光源發散應用示意圖； f9圖係顯示本發明之第五實施例之刮視圖； 第10圖係、顯示本發明之第六實施例之剖視圖； 第11圖係顯不本發明之第七實施例之剖視圖； f 12圖係顯示本發明之第八實施例之剖視圖； 第13圖係顯示本發明之第九實施例之剖視圖； 第14圖係顯示本發明之第十實施例之剖視圖。 12 200928575 【主要元件符號說明】 100、100a、100b、100c、魚眼光罩結構 100d 、 100e 、 100fAs can be seen from the above examples, the fisheye reticle structure provided by the present invention is indeed industrially useful, so the present invention # has met the requirements of the patent. The description of the above description is only for the preferred embodiment of the present invention, and all the improvements can be made according to the above description, but these changes are still in the present invention. Within the scope of the defined patent. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a first embodiment of the present invention; ❹ = Fig. 6 to Fig. 6 is a schematic view showing a process of the first embodiment of the present invention; A schematic diagram of a light source gathering application of the first embodiment; a schematic diagram of a light source diverging application of the first embodiment of the present invention; a f9 drawing showing a scraping view of the fifth embodiment of the present invention; Sectional view of a sixth embodiment of the present invention; Fig. 11 is a cross-sectional view showing a seventh embodiment of the present invention; Fig. 12 is a cross-sectional view showing an eighth embodiment of the present invention; and Fig. 13 is a view showing the first embodiment of the present invention. Fig. 14 is a cross-sectional view showing a tenth embodiment of the present invention. 12 200928575 [Explanation of main component symbols] 100, 100a, 100b, 100c, fisheye reticle structure 100d, 100e, 100f
10 11 > 310 ' 320 > 330 2 20 3 31 311 32 321 、 331 322 33 4 40 41 5 5010 11 > 310 ' 320 > 330 2 20 3 31 311 32 321 , 331 322 33 4 40 41 5 50
51 L 透明基材 平整表面 底面 阻光材料層 光源透空區 魚眼透鏡結構 魚眼透鏡 凸曲面 保護膜 頂面 凹曲面 魚眼透鏡光學膜層 負型光阻 受光部 未受光部 基材 表面 光阻層 光源 1351 L transparent substrate flat surface bottom surface block material layer light source permeable area fisheye lens structure fisheye lens convex surface protection film top concave surface fisheye lens optical film layer negative photoresist light receiving portion unreceived substrate surface resist Layer light source 13