TW200921882A - Fiexible wiring board for tape carrier package - Google Patents

Fiexible wiring board for tape carrier package Download PDF

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Publication number
TW200921882A
TW200921882A TW097125270A TW97125270A TW200921882A TW 200921882 A TW200921882 A TW 200921882A TW 097125270 A TW097125270 A TW 097125270A TW 97125270 A TW97125270 A TW 97125270A TW 200921882 A TW200921882 A TW 200921882A
Authority
TW
Taiwan
Prior art keywords
resin
circuit board
porous
package
flexible circuit
Prior art date
Application number
TW097125270A
Other languages
Chinese (zh)
Inventor
Ryoichi Takasawa
Yukinori Kohama
Masahiro Naiki
Original Assignee
Ube Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries filed Critical Ube Industries
Publication of TW200921882A publication Critical patent/TW200921882A/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/4985Flexible insulating substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D73/00Packages comprising articles attached to cards, sheets or webs
    • B65D73/02Articles, e.g. small electrical components, attached to webs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49572Lead-frames or other flat leads consisting of thin flexible metallic tape with or without a film carrier
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/189Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10621Components characterised by their electrical contacts
    • H05K2201/10674Flip chip

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Wire Bonding (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A flexible wiring board for a tape carrier package with reduced tackiness and a tape carrier package formed by using the flexible wiring board is disclosed. The flexible wiring board for a tape carrier package has an insulating film 1, a wiring pattern 3 formed on a surface of the insulating film, and an overcoat layer 9 containing a resin cured material and a porous fine particle, and protecting at least a region of said wiring pattern.

Description

200921882 九、發明說明: 【發明所屬之技術領域】 體。層送:有= 性成之黏性減低的輸送“裝體: 沾电路板’及使用此撓性電路板軸之輪送膠帶封裝體。 【先前技術】 輸送膠帶封裝體,係將半導體晶片等 ^ Tape Aut〇mated Bond.ng^ 方式搭載在輸送膠帶封裝體用撓性電 ( pQn im)專 電路圖案之中除了内引線或外引後耸車 ^有電路圖案在 絕緣性之表覆層保護。卜引線4連接部以外的表面,藉由電 表覆層,較佳為使用聚胺g旨樹脂組成物 j物、聚酸亞胺系樹脂組成物等形成。專文專^ 之中,揭示以聚胺醋樹脂組成物作為认1專利文獻2 揭示以聚《醯亞胺樹脂組成物作為G f f :勿’ f利文f 3 揭示以改晳Μ醢π 乍為表覆用組成物,專利文獻5 胺樹脂組成物作為表覆用組成物。 撓性ίϊ:晶零件,通常連續搭載於輪送膠帶封裝體用 二=要ί'ί:使r送膠帶封裝體用挽性電路板從捲繞 輸送膠帶封裝體用撓性電路柄本 或光硬化性樹脂組成物“^ti由將熱硬化性 表面黏著性誠古、一化而七成’但是時常因為表覆層 直接捲&7),會有若將輸送膠帶封裝體用撓性電路板 直接棬繞在捲軸,則重疊部分合 肢⑺仇丨王电吩低 +因此…般而言, 【專利文獻1】日本特開平U — 6·號公報 200921882 【專利文獻2】日本特開2〇〇7_39673號公報 【專利文獻3】日本特開平11-125GG號公報 【專利文獻4】日本特開綱―21腿號 【專利文獻5】日本特開2〇〇6_3〇7183號公 【專利文獻6】曰本特開2〇〇2一1518〇9號公 [專利文獻7】日本特開2〇〇6一63297號公報 【專利文獻8】日本制謂—13眶號公報 【發明内容】 (發明欲解決之問題) 赤太最^於輸送膠帶封I體職性電路板捲轴捲繞,為了降低 成本,要求不使用PET臈等剝離膜之捲軸捲鋅。 士 了爷低 送膠帶封裝體用撓性電路基板、 、:者,虽形成輸 销脂_錢㈣‘了 如若為熱硬化,則於較低溫、較短日卑門 4易更化(例 得到之輸送料封賴峨性t於崎形’會有 高)的Μ。另^路板之黏性常會變高(黏着性變 紐之黏性升 變差:==ί低之輸:帶封裝 板/及使祕撓性電路 (解決問題之方式) 本發明係關於以下事項。 1. -種輸达膠帶封裝體用撓性電路板,特於. 包含: 、 絕緣膜; 電路圖案,形成於該絕緣膜之表面.及 案之ί 5!部Ϊ “"曰硬化物與多孔性微粒,且保護前述電路圖 200921882 2.如上述1.之輸送膠帶 覆層之黏性,滿足於14Q。^體職性魏板,其巾,前述表 亞胺之條件。 黏附於SUS且於啊不黏附於^ 3 ·如上述1 ·或2 ·之輪*这卿^ 述多孔性微粒,相對於前用撓严電路板,其中,前 質量份之比例。 匕物10〇質量份,含有Q. 1〜5〇 4. 如上述1.〜3.中任 其中,前述多孔性微粒之平膠帶封裝體賴性電路板, 存在多數。 *表覆層之厚度方向之中心部起,在表面 5. 如上述1.〜4中权 _ ,中’前述多孔性微粒之平封裝體用撓性電路板, 2〇〇mVg以上。 纟粒故為30_以下且比表面積為 6. 如上述1.〜5巾/工 ^ 其中,前述多孔性微粒之细—孔1容^^膠 = 封裝體用撓性電路板, K 5101^3-, 姆月旨、聚輕财狀;聚㈣奶旨、雜胺酿亞胺 至少1種樹脂之硬=树日及改貝聚醯亞卿旨所構成之群組中 讥如上述〗〜Q /;〜、.,工外線加熱處理而硬化者。 极,# / ..中任—項之輸送膠帶封裳體用雷& 係不隔__而進行捲軸捲繞。 謂队I·生電路 蹲帶^/用帶封裝體,使用上述L〜10.中任-項之輪送 了放體用撓性電路板所形成。 铷k 12‘ —種表覆用硬化性樹脂組成物,特徵在於:含有多孔性微 200921882 物之表面之較==後’較不存在前述多孔性微粒時,硬化 顯示其中,硬化後, 黏性。 於60 c不黏附於聚醯亞胺之條件之 f更化性樹脂,包含擇自物,其中,前 依照本發明,可提供黏性減低 ^,及使用其所形成之輸送膠帶封裝體體用撓性電路 膠帶封裝體用撓性電路板進杆媒金 /、、、'°果,可削減將輸送 膠帶封裝體用撓性電路板之製造步^ f剝離膜、提升於輸送 帶封裝體職㈣路基板之絲^之輪H及提升於輪送膠 【實施方式】 (實施發明之最佳形能) 又,於日本特開於善沒有效果。 ίΐttJJ^ f «^(Pyrethr01f) ^ ^ ΪΙ J之乳化矽凝膠的印刷電路板用 /、川4。轴心、避 酚絕緣層(基材)等剛性印刷電 疋二係關於紙-苯 封裝體用接性電路基板之雜改^關於輸送膠帶 號公報(專散獻7),從/有Ζί之LT销2m〜63297 之樹脂組成物形成絕緣性樹脂膜,;2内= 里低^率化劑者 良。又,於曰本特開_號公報=獻 200921882 無:,抑制無機多孔體之吸濕·吸水性 無關於輸_帶封裝^彳性概域物,但是, 依此方式,利用多孔性 性改良。、 首先,參照圖式,i明’太旅'-表復層之黏性為以往未知的。 本發明之觀膠帶解S本=之撓性電路板構造。圖1顯示 示圖1之H,線^ 表例的部分概略俯視圖,圖2顯 層2,黏著有電路圖宰?刀^々圖。於絕緣膜1之表面藉由黏著劑 如,將彎_狹縫‘===元細_内引線 外引線3b。於内彳丨唆\ + 、、而σ卩形成有用以與其他零件連接之 曲的狹缝5橫==^’3\凸塊丄連接半導體晶U。於將彎 樹脂層8 ’再者,形,,形成有保護用之挽性 線3a或外引線3b之^外的固主案3 ^區域之除了形成有前述内引 而保護電路圖案。又,盘内引繞ζ ’形成有表覆層(阻谭層)9 體密封樹錢密封細之7,以半導 孔)1卜測試接墊(電路圖案)3c^衣體立而’设有穿孔洞(扣鏈齒輪 又,本發明之輸送膠帶封裝體, v 圖1、2中,顯示彎曲的狹缝在2處二二圖:l 示具體例。 以在1處形成或在多處形成。又堇:曲曲的狹縫可 圖案之單面(背面)有撓性樹脂層覆曲=狹縫橫切之電路 面,可以雙面均以撓性繼層覆I* “ ’可以補在單側表 圖3顯示利用C0F技術之輪送牒册私壯减, 圖,圖4顯示圖3之B-B,、線之概略體代表構造概略俯視 黏著有電路隨13。於電路緣膜12之表面, 之内引線13a、用以與其他零連接半導體晶片 藉由凸塊14連接半導體晶片15。形成有敗内引線13a ’ 了形成有前述内引線13a或外弓丨線之區域之除 成有表覆層(阻焊層)16而保護電路J之H卜的主要表面,形 之半導體晶片15,藉由底填材17路密圖封^又;^引線伽連接 才保道。於封裝體端,設置有 200921882 穿孔f f鏈齒輪孔)18、測試接墊(電路圖荦)13c 本發明中,輪送膠帶封裝體用撓 電路板,其中,在輸送膠帶封 ’指一具撓性的 零件或保護此等電子零件用之^. ^導體晶 >;等電子 絕緣膜之表面形成有電路圖案,前^路^專形成前之),且 絕緣性之表覆層保護。亦即,之至少-部分利用電 及提供於輸送膠帶封裳體用者膠帶封裝體中者, .板’,要Ϊ有黏Ϊ劑層或撓性樹脂ίίίίΓ體職性電路 之具一對穿孔洞(扣鍵齒輪孔)之^才U成在排列於兩端部 达膠帶封裝體用撓性電路板 _、士 °安!步驟’將輸 體晶片等電子零件之安I 二^續取出,進行半導 錫處理等而形成輸送膠帶之讀,視需要,經焊 膠帶封衰體用撓性電路板,經安中,不僅供給之輸送 捲繞到捲轴、时採祕朗^ ^之輸轉帶封裝體亦 本發較 度大且介電正切小,耐熱 '目、=,、'彖Μ,較佳由絕緣破壞強 品性,熱收縮率小且對於2 二t性及具適度剛性,具耐藥 構成之膜。較佳為料族^,性優異之耐熱性聚合物 芳香族聚酯膜,尤其芳香族方香族聚醯胺醯亞胺膜、 宇部興產(股)公w女膜。具體而言,較佳例有: 可用等。又,較佳 仏。銅箱可為壓延銅箱亦 t金屬如銅fl或㈣等為 使用2〜10〇_者。又路^銅治。電路圖案之厚度較佳為 2〇-300,m,^fBlF^^5〇〇^ 5^500,,, 田系巴緣膜與電路圖案有時 m尤其約2〇〜侧卵者。 豐層。黏著劑層,較佳為 =㈢,但是有時隔著黏著劑層 錢雌者力、絕緣可錄、耐熱性及耐 200921882 -藥品性優異,且硬化後翹曲小、平面性 ^ ;^ΐ^2° 20#8200 ' #86〇° 又,於™方式之輸送膠之厚度者。 之絕緣可靠性、宓人柯、基材之捃合性良好,且硬化後 性優異,即使將.;:的狹縫部I:耐:品性良好、翹曲小而平面 利用之具柔軟性或可撓性之f不生剝離或斷裂,能充分 言,例如聚胺士心 对私組成物形成為佳。具體而 胺樹脂組成物;二亞胺聚_«亞 部興產(股)公司製聚醯亞胺 體而言,例如宇200921882 IX. Description of the invention: [Technical field to which the invention pertains] Body. Layer delivery: a conveyor with a reduced adhesiveness "Package: Dip board" and a wheeled tape package using the flexible circuit board shaft. [Prior Art] Transfer tape package, semiconductor wafer, etc. ^ Tape Aut〇mated Bond.ng^ is mounted on the flexible circuit (pQn im) circuit pattern for the conveyor tape package, except for the inner lead or the external lead, and the circuit pattern is protected by the insulation coating. The surface other than the connection portion of the lead 4 is formed of a resin composition, a resin composition j, a polyamic imine resin composition, or the like, which is formed by a surface coating, and is disclosed in a special article. The composition of the amine vinegar resin is disclosed as Patent Document 2, which discloses that the composition of the polyimine resin is used as a composition for the modification of Μ醢π 乍 as a surface coating composition, Patent Document 5 Amine The resin composition is used as a surface coating composition. Flexibility: Crystal parts are usually continuously mounted on a wheeled tape package. Two=Yes: The r-feed tape package is transported from a winding tape by a pull-up circuit board. Flexible circuit handle or photocurable resin composition for package" ^ti consists of a thermosetting surface adhesive that is sturdy and sturdy, but often because of the direct coating of the surface coating & 7), if the conveyor tape package is wound directly on the reel with a flexible circuit board In the case of the overlapping part of the limbs (7), the vengeance of the vengeful king is as follows: [Patent Document 1] Japanese Laid-Open Patent Publication No. H-6-A No. 200921882 [Patent Document 2] Japanese Patent Laid-Open No. Hei 2-7-39673 [Patent Document 3] Japanese Patent Laid-Open Publication No. Hei 11-125GG (Patent Document 4) Japanese Patent Laid-Open No. 21-leg No. [Patent Document 5] Japanese Patent Laid-Open Publication No. Hei 2-6 No. 7183 [Patent Document 6] [Patent Document 7] Japanese Laid-Open Patent Publication No. H06-63297 [Patent Document 8] Japanese Patent Publication No. 13 No. [Abstract] (Problems to be Solved by the Invention) Chitai is the most popular in the transport tape sealing I body circuit board reel winding, in order to reduce the cost, it is required not to use a PET film such as a peeling film roll. In the case of the flexible circuit board for the low-transmission tape package, the customer has formed a sales and marketing grease _ money (four)'. If it is thermally hardened, it is easier to change at a lower temperature and a shorter time. The conveying material seals the 峨 峨 于 于 于 崎 崎 崎 崎 崎 崎 崎 崎 崎. The viscosity of the other board will often become higher (the adhesion of the adhesive becomes worse): == ί low loss: with the package board / and the flexible circuit (the way to solve the problem) The present invention relates to the following 1. A flexible circuit board for the transmission tape package, special. Contains: , insulating film; circuit pattern, formed on the surface of the insulating film. And the case ί 5! Department Ϊ "" 曰 hardening And porous particles, and protect the above circuit diagram 200921882 2. The adhesion of the coating tape coating as described above 1. Satisfy the condition of 14Q. ^ Body, Wei, the towel, the conditions of the above surface imine. Adhered to SUS And ah does not stick to ^ 3 · such as the above 1 · or 2 · wheel * This is a description of the porous particles, compared to the front of the flexible circuit board, where the ratio of the former mass parts. In the above-mentioned 1. to 3., the above-mentioned porous microchips have a large number of flat tape package-based circuit boards. *The center portion of the thickness direction of the surface coating layer is On the surface 5. As in the above 1.~4, the flexible circuit board for the flat package of the above-mentioned porous fine particles, 2" mVg or more. The granules are 30_ or less and the specific surface area is 6. 1. The above-mentioned 1.~5 towel/work^ wherein the porous microparticles are fine-hole 1 容胶 = flexible circuit board for the package, K 5101^3-, 姆月之,聚轻财状; poly (4) milk, heteroamine, and at least one kind of resin, hard = tree day and group of 贝 醯 卿 卿 卿 卿The above 〗 〖Q /; ~,., the external line heat treatment and hardened. Extreme, # / .. 中任 - Item of the conveyor belt sealing body with the thunder & The team I and the circuit board are equipped with a package, and the flexible circuit board for the release body is used by using the above-mentioned L to 10. The 铷k 12'-type surface-coated hardenable resin The composition is characterized in that: when the surface of the porous micro-200921882 is relatively == after 'there is no such porous fine particle, the hardening shows that after hardening, the viscosity is sticky. The 60 c does not adhere to the polyimine. The conditional f-modifying resin comprises a selected material, wherein, according to the present invention, the viscosity is reduced, and the flexibility of the transporting tape package body formed by using the same is provided. The circuit board package uses a flexible circuit board to feed the gold material, and the '° fruit, which can reduce the manufacturing process of the flexible circuit board for transporting the tape package, and lift the film on the conveyor belt package. The wire H of the substrate and the lifting of the wheel are carried out. [Embodiment] (The best shape energy for implementing the invention) Also, there is no effect in Japan. ίΐttJJ^ f «^(Pyrethr01f) ^ ^ ΪΙ J Emulsified tantalum gel for printed circuit boards /, Kawasaki 4. Axis, phenol-resistant insulating layer (substrate), etc. Rigid printing electric system for the paper-benzene package for the circuit board substrate No. 7 (Special Dissemination 7), an insulating resin film is formed from a resin composition of LT pin 2m to 63297, and 2 is a low-rate agent. In addition, the 吸 特 特 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ . First of all, referring to the figure, the stickiness of the 'Tai Brigade'-surface layer is unknown. The tape of the present invention solves the structure of the flexible circuit board of S =. Figure 1 shows a schematic top view of the H of Figure 1, the line ^ example, and Figure 2 shows the layer 2, with the circuit diagram stuck? Knife ^ 々 map. On the surface of the insulating film 1, an adhesive, for example, a bent_slit '=== yuan thin_ inner lead outer lead 3b. In the inner 彳丨唆 \ + , and σ 卩 forms a slit 5 which is useful for connecting with other parts, the horizontal direction ==^'3\bump 丄 connects the semiconductor crystal U. Further, in the case where the bent resin layer 8' is formed, the solid metal 3* region in which the protective lead wire 3a or the outer lead 3b is formed is formed in addition to the inner lead to protect the circuit pattern. In addition, the inside of the disk is surrounded by ζ 'formed with a surface coating (resistance tan layer) 9 body seal tree money seal fine 7, with semi-conductive holes) 1 test pad (circuit pattern) 3c ^ clothing body and set There are perforated holes (deduction gears, in addition, the conveyor tape package of the present invention, v in Figs. 1, 2, showing curved slits at two places and two figures: l shows a specific example. To form at one place or in multiple places Forming: 堇: The slit of the curved pattern can be patterned on one side (back) with flexible resin layer covering = slit cross-cutting circuit surface, which can be double-sided with flexible layer covering I* "' can make up In the single-side table, Figure 3 shows the use of the C0F technology, and the figure shows that Figure BB shows the BB of Figure 3. The outline of the line represents the structure of the top view of the adhesive with the circuit along with 13. The circuit edge film 12 a surface, an inner lead 13a for connecting the semiconductor wafer 15 to the other zero-connected semiconductor wafer by the bump 14. The formed inner lead 13a' is formed by dividing the inner lead 13a or the outer bow line The surface layer (solder resist layer) 16 protects the main surface of the circuit J, and the semiconductor wafer 15 is formed by the underfill material 17 The dense picture seal ^ is again; ^ lead gamma connection is guaranteed. At the package end, there is 200921882 perforated ff chain gear hole) 18, test pad (circuit diagram 荦) 13c In the present invention, the flexible tape package for the wheeled package a board in which a conductive tape seal is used to refer to a flexible part or to protect such electronic parts. ^. Conductor crystals;; etc. The surface of the electronic insulating film is formed with a circuit pattern, and the front surface is formed before the formation And the insulating cover is protected. That is, at least part of the electricity is used and provided in the tape for sealing the user's tape, the plate is to have a layer of adhesive or scratch Resin ίίίί Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ The electronic components such as wafers are removed, and semi-conductive tin treatment is performed to form a transfer tape. If necessary, the flexible circuit board for the aging body is sealed by the solder tape, and the winding is not only supplied by the medium. Go to the reel, pick the secret lang ^ ^ the transfer belt package is also the same And the dielectric tangential small, heat-resistant 'mesh, =, ' 彖Μ, preferably by the insulation damage strong, heat shrinkage rate is small and for the two t-type and moderately rigid, resistant film composed. The heat-resistant polymer aromatic polyester film excellent in the material group, in particular, the aromatic scented polyami oxime imide film, the Ube sei product, and the like. Specifically, preferred examples Yes: Available, etc. Also, it is better. The copper box can be a rolled copper box or a metal such as copper fl or (four), etc. It is used for 2~10〇_. The road is copper. The thickness of the circuit pattern is preferably 2 〇-300, m, ^fBlF^^5〇〇^ 5^500,,, The field of the film and circuit pattern sometimes m is especially about 2 〇 ~ side eggs. Rich layer. The adhesive layer is preferably = (3), but sometimes the female is separated by an adhesive layer, the insulation is recordable, the heat resistance and the resistance to 200921882 are excellent, and the warpage is small after the hardening, and the flatness is ^; ^2° 20#8200 ' #86〇° Also, the thickness of the transfer glue in the TM mode. Insulation reliability, good adhesion to the substrate, good adhesion to the substrate, and excellent after hardening, even if the slit portion I: is resistant to: good quality, small warpage, softness of the flat surface, or The flexible f does not peel or break, and it is sufficient to say that, for example, the polyamine core is preferably formed on the private composition. Specifically, the amine resin composition; the diimine poly _ «Asian Ministry of Industry and Technology Co., Ltd.

FS^IOOL。又,_性料炉爲乳烷树知、、、且成物所構成之UPICOAT -,再更佳約5〜5G_之厚度輕5 «,尤佳1〜100 表覆層(阻焊層),為將包含 空間的電路圖案區域之表面覆#==之=與電路圖案間之 月ΐ刷等方法塗布,接著以乾燥:較佳為,以 腊級成物形成。表覆層,要她、、、=而、=硬化之硬化性樹 電路圖案之密合性良好、具優 ^_面,優異、與絕緣膜或 耐錫侵入性、耐藥品性、耐溶 如。J耐熱性、耐鍍性、 :彎曲性(即使彎曲亦不生剝離或以、、 荨)具良好密合性等各特性。 ;山封树月曰(尚包含底填材 於未安i半導體〒二狀態,則可為存在 子在於女衣有電子尽件後之「輸送膠帶封農體」 200921882 ίΐ黏J時1為問題之黏性為目的, 能之「輪误狀^要係存在於未安裝半導體晶片等電子零件之妝 1〜50« (關於材料於後述)。 為1〜100M,更佳為約 晶片i:底導體晶片後用於保護半導體 太恭ΒΒ ±限疋仁通吊使用裱氧糸樹脂組成物。 言,至i包含撓性Γ板,表覆層就填充劑而 表覆層表面黏性之作性,具減低 各特性予以維持或改良。 減低此且將作為表覆層要求之 中心;面覆層麟科’較佳為從 面多數存在較佳。子二界面起,表 形成表覆:匕 /且作為表覆層所二例降低而使黏性減低, 即不特別 且能使對表覆層要求之其』 仏有時絕心降ί 更佳,約二二上〇.001〜30,,更佳為〇. 005〜L,又 較層厚平均粒杈’較佳為較表覆層之層厚小,更佳為 使用非多孔性微粒但多量使用,或使用场子,有可能能改 12 200921882 之機械強度ΐ 各,低(例如表覆層 多孔性微粒,以對於开或白化),因此不能使用。 ,質上不具活性之材料=覆===咖旨 矽、玻璃、氧化鋁、啡Z:卜卜夕礼I生u粒之材%,例如氧化 矽酸鈣等矽酸鹽、磷酸鈣、= 銘等金f氫編^ (哪〇1⑻等鎂㈣鹽碳峡等碳酸鹽、海泡石 胺甲酸乙酯樹脂、幾丁聚播f丙細5樹脂、聚醯亞胺樹脂、 酸纖維樹脂等,及該等之複^體曰。、聚石夕氧烧樹脂、石烟橡膠、乙 组成物之流動性,故為較ί。又,多,ΐί當控制樹脂 親水性理想使用,但苴声而婉 性4粒,其表面能以維持 化處ίΐ者,只要能唯持、多別咕工、凡馬|劑或鈦偶聯劑等予以疏水 若在多孔性又,本發明中, 化學反應,因此不佳。·降低,或者與樹脂成分產生 本發明中,多孔性微粒以ΒΕΤ法 200-1000mVg 250^1〇〇〇mvt Ϊίίί!# ' ^ 或料配置在表騎絲 為,。再者,多孔性微粒之細孔容積,換算為以文果= -13-1之精製亞麻仁油法測定的吸油量 S \5101 ,l/g,更佳為0· 3〜加仏者,能在表覆声之^ ^ 〇.lml/g〜 分布$易位在表覆層表面,減低黏性之效曰果高^<更南密度 本备明中,多孔性微粒以多孔性氧化石夕尤佳ϋ 具理想的比表面積或細孔容積(吸油量)。換 氣化石夕, =丧在表覆層之表面層以更高密度“,或 ft層表面。Χ,樹脂組成物之硬化步驟或輸度 之女衣穩定,不會對於絕緣性能等造成不利旦彡㉚f帶封裝體 心曰,不使表覆 13 200921882 層之機械的特性等降低。亦 之特性良好,故尤佳。 f之減低效果大且作為表覆層 多孔性微粒尤其多孔性氧化矽,相 時,硬化物(表覆層)^相1 乂於不存在多孔性微粒 覆層之表面硬度提升同時表面硬度提升。若表 受傷性亦提升,L ;提減低同樣,操作容易,耐 造步驟的生產性,及輸送谬帶封裝之製 中的輸送性。 I缸往冤路基板之安裝步驟 又 以 更高密度ίίίίϊΐΐ其多孔構造,在表覆層之表面層容易 層全體成為啦而使對絲覆層i求之撓性 多孔匕石夕,例如:Fuji—Silysia化FS^IOOL. In addition, the _ material furnace is a UPICOAT-made of the lactane tree, and the composition is more preferably about 5 to 5G_ thickness 5 «, especially good 1 to 100 surface coating (solder layer) In order to apply a method such as covering the surface of the circuit pattern region including the space with the mask of the circuit pattern, and then drying, it is preferably formed of a wax-grade product. The surface coating layer requires her, ,, =, and = hardened hardening trees. The circuit pattern has good adhesion, excellent surface quality, excellent insulation properties with insulating film or tin resistance, chemical resistance, and solvent resistance. J heat resistance, plating resistance, bending property (no peeling or bending, even if it is bent) has good adhesion and other characteristics. ; 山封树月曰 (still contains the bottom filler in the state of the second semiconductor, but the existence of the child in the women's clothing has the electronic delivery of the "transport tape sealing agricultural body" 200921882 ΐ ΐ sticky J when 1 is a problem For the purpose of the stickiness, it is possible to apply the makeup to the electronic components such as semiconductor wafers without the mounting of the semiconductor parts 1 to 50« (the material will be described later). It is 1 to 100 M, more preferably about the wafer i: the bottom After the conductor wafer is used to protect the semiconductor, it is too respectful. The 裱 裱 通 吊 裱 裱 裱 裱 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 包含 。 It can be maintained or improved by reducing the characteristics. It will be reduced as a center of the surface coating requirements; the surface coating of Linke is better than the majority of the surface. From the second interface, the surface is formed: 匕/ And as the two cases of the surface coating are reduced, the viscosity is reduced, that is, it is not particularly special and can make the surface coating requirements 仏 仏 绝 绝 绝 绝 更 更 更 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 001 More preferably, 005~L, and the average thickness of the layer is preferably smaller than the thickness of the surface layer, and more preferably Using non-porous particles, but using a large amount, or using a field, it is possible to change the mechanical strength of each of the 12, 2009,882, 低 each, low (for example, the surface of the porous particles, for the opening or whitening), so can not be used. Active material = cover === 咖 矽, glass, alumina, brown Z: Bu Bu Xi Li I raw u grain material%, such as calcium citrate such as calcium citrate, calcium phosphate, = Ming, etc. Hydrogen knitting ^ (〇1(8) and other magnesium (tetra) salt carbon gorge and other carbonates, sepiolite urethane resin, chitosan f-propyl 5 resin, polyimine resin, acid fiber resin, etc., and these The complex liquid body, the poly-stone oxygen burning resin, the stone smoke rubber, and the composition of the B are fluid, so it is more ί. More, ΐί is ideal for controlling the hydrophilicity of the resin, but it is squeaky and sturdy. Granules, whose surface energy can be maintained at the same time, as long as they can only be used, and many other workmanships, such as horses, agents, or titanium coupling agents, are hydrophobic. In the case of porosity, in the present invention, chemical reactions are therefore poor. · Reduce, or with the resin component produced in the present invention, the porous microparticles are 200-1000 mVg 250 ^ 1 ΒΕΤ 〇〇mvt Ϊίίί!# ' ^ Or the material is placed on the table, and the pore volume of the porous particles is converted to the oil absorption S measured by the refined linseed oil method of Wenguo = -13-1. \5101, l/g, more preferably 0·3~Twisting, can be in the surface of the ^^ 〇.lml/g~ distribution $ translocation on the surface of the surface coating, reducing the viscosity of the effect is high ^<More Southern Density In this book, the porous particles are made of porous oxidized stone, which has an ideal specific surface area or pore volume (oil absorption). Ventilation fossils, = mourning on the surface of the surface coating The layer has a higher density ", or the surface of the ft layer. Χ, the hardening step of the resin composition or the female clothing of the transmission is stable, and does not cause adverse effects on the insulating properties, etc., without causing the surface of the package. 200921882 The properties of the layers of the machine are reduced. It is also good because it has good characteristics. The reduction effect of f is large and is used as a surface coating. Porous particles, especially porous yttrium oxide, phase, hardened material (surface coating), phase 1 乂 in the absence of porous fine particles, the surface hardness is increased and the surface hardness is improved. If the injury is also improved, L; the same reduction, the ease of operation, the productivity of the manufacturing process, and the transportability of the conveyor belt. The mounting step of the I-cylinder to the circuit board is further denser to the porous structure, and the surface layer of the surface layer is easily formed as a whole, and the flexible coating of the silk coating layer is obtained, for example, Fuji. —Silysia

Syl〇Ph〇blc、Syl〇sphere、德山(股)公司製 T〇kus^ 〔應】、旭硝子Sl—tech(股)公司製Sunsphere、M S GEL、 Sunlovely、水澤化學工業(股)公司製㈣业 該產 可考量為商標。 /寻產口口名 本發明中,多孔性微粒包含於硬化性樹脂組成物中,用 覆層形成。硬化性樹脂組成物中,多孔性微粒之含量 : 脂固體成分100質量份為0.^50質量份,較佳為0.U質_1 伤’更佳為0. 2〜30質量份。若含量超過5〇質量份,則麵曲增大, 或機械的強度尤其伸長性消失,彎曲時發生剝離或裂痕,或發生 白化,故不佳。又,若小於〇· 1質量份,則改良黏性之效果小。 本發明中,形成表覆層之硬化性樹脂組成物,不特別限定。 上述含多孔性微粒為必要,除此以外,可使用表覆(阻焊)用通常 使用的硬化性樹脂組成物。該硬化性樹脂組成物,可為熱硬化性 亦可為光硬化性,亦可為兼具熱硬化性及光硬化性的樹脂組成 物。熱硬化性樹脂組成物,例如:引用明示視為本說明書—部分 14 200921882 ΐ該成物、或㈣輯亞麟脂組成物 ί硬化成分。光硬化性樹驗成物中== 希酸鹽(酯)或甲基丙婦酸鹽(醋)等感光性ί 士2ΐΐ叙明之表覆層之硬化性樹脂組成物,係以網版印刷等 n細厚之細^後使硬化者,通常為溶液組成物。, f 中二樹脂固體成分濃度較佳為使用約2g〜8g質量%之 浴液組成物,其溶液黏度,不特別限定, 玄2 5^100〇Pa - s 1〇M〇〇Pa . s , !6〇〇 =:等的作業性或溶液物性、得到之硬化絕緣膜之“ 溶液組成物之溶劑,較佳為: 含氮系溶劑、例如N,N-二甲基乙酿胺、N,N—二乙基乙酿胺、 N,N —一曱基曱醯胺、n,N—二乙基甲醯胺、N〜甲基一2 —吡咯啶 酮、1’3 —二曱基一2 —咪唑啶酮、N—曱基己内醯胺等; 含硫原子溶劑、例如二甲基亞颯、二乙基亞石風、二甲基石風、 二乙基砜、六曱基磺醯胺等; 含氧溶劑’例如苯酚系溶劑之甲酚、苯酚、二曱苯酚等; 一乙二醇二曱基醚(diglyme)系溶劑之二乙二醇二甲基_ (diglyme)、三乙二醇二曱基驗(triglyme)、四乙二醇二曱基喊 (tetraglyme)等; 土 酮系溶劑之丙I同、苯乙酮、苯丙g同、環己酉同、里佛爾 醚系溶劑之乙二醇、二口弯烷、四氫呋喃等; …、 内酯系溶劑之r 一丁内酯等。 尤其,較佳可使用N—曱基一2 —吼〇各咬_、n, N —二甲基亞 砜、Ν,Ν—二曱基甲醯胺、N,N —二乙基曱醯胺、N,N —二曱基^酿 胺、N,N—二乙基乙醯胺、τ 一丁内酯、三乙二醇二甲基喊等。 又’硬化性樹脂組成物可含與通常之表覆用硬化性樹脂組成 15 200921882 劑、防錄劑或離子捕捉劑等热枚者色顏料等顏料、消泡劑或塗平 約1〜100_之厚产、^田,_之厚度約0.5〜200_,尤复 約別〜21〇t,較佳;^〇〇用〜、.=。=等印刷並塗布,接著, 6〇分鐘進行加熱處理,或H12Q分鐘,較佳約1〜 化形成。加熱處理除了;^;、、、f」要以加熱進行後硬化而硬 ,:等加熱。 加…益’加熱以外,亦可使用遠紅外線 表覆層,將電路圖案問$ 彈性係數為約10〜1200μρ 良好地填埋,且於25〇C之起始 充分水平的電絕緣性(:,==1Q〜1麵❿之撓性,且具 佳為10¾ •⑽以上)通於\0體c積電阻為_ •⑽以上,較 起曲小、平面_、触。更佳為, 劑性)、耐鑛性、錫ί入久、甲乙綱之耐溶 且能減低黏性。 表覆層具如别所述之良好各特性 ’ 本發明之輸送膠帶封裝體用择极± * ‘ _不黏附於sus 生電路板’表覆層之黏性,於 性,可由^、s 1 0〇不摘於聚醯亞胺較佳。像此種特 I擇多孔性粒子之特性、量而滿心 ,發明之輸送膠帶封裝體用撓性電路板,尤 聚;; ⑽物聚 ★:㈣者。其結果為,麵良 16 200921882 性減低之輸送 及使用此撓性電路板形成之輪送帶封裝體用撓性電路板 剝離膜捲繞在捲軸。又,使 ^ 、袁體。其結果,能不隔著 路板而安裝之輪送膠帶封裴俨,^二之輪送膠帶封裝體用撓性電 再者,本發明之輸送膠帶封^ ’田ϋ不隔著剝離膜而捲繞捲軸。 塗布硬化性樹脂組成物並硬^ 路板中,形成表覆層時, 遠紅外線照射的加熱處理尊简:^韃易地採用利用短時間之 性。再者,本發明之輪送膠^ 驟,因此能提升生產 之安裝步驟時之輪送性 (實施例) 不限步_本發明。又 ’本發明 以下各例中,測定、評價以如下方法進杆。 [與SUS之耐黏性(熱硬化)] 將表覆層用組成物塗布於丰 (UPILEX35SGA),於8(rc進行H于產製聚酿亞胺膜 行90分鐘加熱處理,形成/产^ ^加,處理’接著於_進 用之膻揭太# +办〇 / 度約〇 # m厚之評價用膜。將該評價 用之膜樣本裁成見2. 5cm、長度5cm,製作樣本 面朝上放置於加埶至14〇〇C之埶;, '以7 义月美 4曰r‘、、、 4U L之熱板,於其上放置SUS製錘(底面積 cm f里500g)30秒’於提起時,未黏附時,定為〇( 〇 : 未_ 時定為 x(bad)。 [與聚醯亞胺之耐黏性(熱硬化)] 將表覆層用組成物塗布於宇部興產製聚醯亞胺膜 (ILEX35SGA),並於8(TC加熱處理3〇分鐘,接著於i2(Tc加熱 处理90分鐘,形成厚度約i〇Mm厚之評價用膜。將該評價用之膜 樣本裁切成寬2· 5cm、長度5cm,製作樣本。將該樣本以塗膜面朝 上放置於加熱至6(TC之熱板,於其上重疊宇部興產製聚醯亞胺膜 (UPILEX35SGA面積lcmx5cm),再以跑分量之銅負重30秒後, 17 200921882 未黏,於》亞賴時定為〇(gQQd),細時定為x(bad)。 [與SUS之耐黏性(遠紅外線硬化)] 層用組成物塗布於宇部興產製聚醯亞胺膜 m厚之評價用膜。將該評價用之 旦口=,於其上放置sus製鍾(底面積2_cm Ϊ Jx(bj)。ν,θ起時’未黏附時,定為〇(g〇〇d),黏附時,定 [與聚醯亞胺之耐黏性(遠紅外線硬化)] 物塗布於宇部興產製聚酿亞胺膜 报占a in吏用砥紅外硬化裝置於16〇°C加熱處理10分鐘, 2'予、厚之評價㈣。將該評價用之膜樣本裁切成寬Syl〇Ph〇blc, Syl〇sphere, T〇kus^[:], Asahi Glass Sl-tech (share) company Sunsphere, MS GEL, Sunlovely, Mizusawa Chemical Industry Co., Ltd. (4) This product can be considered as a trademark. / Name of the mouth to be found In the present invention, the porous fine particles are contained in the curable resin composition and formed of a coating layer. 2〜30质量份。 The hardening resin composition, the content of the porous microparticles: 100 parts by mass of the fat solid component is 0. ^ 50 parts by mass, preferably 0. U quality _1 injury 'more preferably 0. 2~30 parts by mass. When the content exceeds 5 parts by mass, the surface curvature increases, or the mechanical strength, particularly the elongation, disappears, and peeling or cracking occurs during bending, or whitening occurs, which is not preferable. Moreover, if it is less than 〇·1 part by mass, the effect of improving the viscosity is small. In the present invention, the curable resin composition forming the surface layer is not particularly limited. In addition to the above-mentioned porous fine particles, a curable resin composition which is generally used for surface coating (solder resistance) can be used. The curable resin composition may be thermosetting or photocurable, or may be a resin composition having both thermosetting properties and photocurability. The thermosetting resin composition, for example, is exemplified as the present specification - part 14 200921882 ΐ the product, or (4) the linalt composition ί hardening component. Photocurable tree test substance == Photoacid (ester) or methyl acetoacetate (vinegar), etc. Photosensitive ΐΐ ΐΐ ΐΐ ΐΐ 之 之 之 之 之 之 之 之 之 之 之 硬化 硬化 硬化 硬化 硬化 硬化 硬化 硬化 硬化 硬化 硬化n fine and fine ^ after hardening, usually a solution composition. The concentration of the solid content of the resin in the f is preferably from about 2 g to 8 g% by mass of the bath composition, and the solution viscosity thereof is not particularly limited. Xuan 2 5 ^ 100 〇 Pa - s 1 〇 M 〇〇 Pa . s , !6〇〇=: workability or solution property, and the solvent of the solution composition obtained by the hardened insulating film, preferably: a nitrogen-containing solvent such as N,N-dimethyletheneamine, N, N-Diethylethylamine, N,N-monodecylamine, n,N-diethylformamide, N-methyl-2-pyrrolidone, 1'3-dimercapto-one 2 - imidazolidinone, N-decyl caprolactam, etc.; solvent containing sulfur atom, such as dimethyl hydrazine, diethyl sorbite, dimethyl stone, diethyl sulfone, hexamethylene sulfonate Amidoxime or the like; an oxygen-containing solvent, such as a phenolic solvent, cresol, phenol, dinonylphenol, etc.; a glycol diglyme-based solvent, diethylene glycol dimethyl _ (diglyme), three Triglyme, tetraglyme, tetraglyme, etc.; ketone-based solvent, acetophenone, phenylpropanol, hexamethylene ketone, rivierol Ether solvent, ethylene glycol, Oral bentane, tetrahydrofuran, etc.;, lactone-based solvent, r-butyrolactone, etc. In particular, it is preferred to use N-fluorenyl- 2 - hydrazine, n, N-dimethyl sulfoxide, Ν, Ν-dimercaptomethylamine, N,N-diethyl decylamine, N,N-dimercaptoamine, N,N-diethylacetamide, τ-butyrolactone, Triethylene glycol dimethyl group or the like. Further, the 'curable resin composition may contain a pigment such as a hot-melt pigment such as a coating agent, an anti-recording agent or an ion trapping agent, which is composed of a conventional curable resin. Foaming agent or coating is about 1~100_ thick, ^ field, _ thickness is about 0.5~200_, especially about ~21〇t, preferably; ^〇〇 printing with ~,.=.= etc. The coating is followed by heat treatment for 6 minutes or H12Q minutes, preferably about 1 to 1. The heat treatment is performed by heating, hardening, and the like. In addition to heating, it is also possible to use a far-infrared surface coating to make the circuit pattern Q elastic coefficient of about 10~1200μρ well buried, and a sufficient level of electrical insulation at the beginning of 25〇C (:, ==1Q~1 The flexibility of the surface is good, and it is preferably 103⁄4 • (10) or more. The resistance of the product is _ • (10) or more, which is smaller than the curve, plane _, and touch. More preferably, it is a chemical agent, it is resistant to minerals, it is long-lasting, and it is resistant to dissolution and can reduce viscosity. The surface coating has good characteristics as described above. The carrier tape of the present invention has a viscosity of a coating layer of ±* ' _ not adhered to the surface layer of the sus raw circuit board, and can be used by ^, s 1 0〇 is not taken from polyimine. Such a special type of porous particles is used to select the characteristics and quantity of the porous particles, and the flexible circuit board for a conveyor tape package of the invention is particularly concentrated; (10) Polymerization ★: (4). As a result, the transfer of the surface-reducing 16 200921882 and the use of the flexible circuit board to form a flexible circuit board using a flexible circuit board release film are wound around the reel. Also, make ^, Yuan body. As a result, it is possible to seal the wheel by the tape which is attached without the road plate, and the flexible tape for the tape package of the second to the second, and the transfer tape of the present invention is not separated by the release film. Winding the reel. When the curable resin composition is applied and the surface layer is formed in the hard board, the heat treatment of the far-infrared ray irradiation is simple: it is easy to use for a short period of time. Further, the wheeling of the present invention can improve the rotatory property in the mounting step of production (embodiment). Further, in the following examples of the present invention, the measurement and evaluation were carried out by the following method. [Resistance to SUS (thermosetting)] The composition for the surface coating is applied to abundance (UPILEX35SGA), and heat treatment is carried out at 8 (rc for H production in a poly-imine film for 90 minutes to form/produce ^ ^加,处理' Followed by _ Intake 膻 太 太 + + + + + + + + + + m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m Place it upside down to 14〇〇C;, 'With 7 义月美4曰r',, 4U L hot plate, place SUS hammer on it (500g in bottom area cm f) 30 When the second is not lifted, it is set to 〇 when it is not adhered ( 〇: it is x (bad) when it is not _. [Adhesion resistance with polyimine (thermosetting)] Coating the surface coating composition Ube Industries Co., Ltd. produced a polyimine film (ILEX35SGA) and heat treated at 8 (TC for 3 minutes, followed by i2 (Tc heat treatment for 90 minutes to form a film for evaluation of thickness about i〇Mm thick. The film sample was cut into a width of 2.5 cm and a length of 5 cm to prepare a sample. The sample was placed with the coating film facing up on a hot plate heated to 6 (TC), and the polyimine film of Ube Industries was superimposed thereon. (UPILEX35SGA area lc Mx5cm), after the weight of the copper component of the running component for 30 seconds, 17 200921882 is not sticky, it is set to 〇 (gQQd) in the time of Yalai, and x (bad) in fine time. [Adhesion resistance with SUS (far infrared) Hardening)] The layer composition was applied to the film for evaluation of the thickness of the polytheneimine film made by Ube Industries Co., Ltd. The evaluation was used for the opening of the mouth, and the SUS clock was placed thereon (bottom area 2_cm Ϊ Jx(bj) When ν, θ starts, when it is not adhered, it is determined to be 〇(g〇〇d). When it is adhered, it is determined to be [adhesive with polyimine (far-infrared hardening)]. The imine film reported a in 吏 heat treatment at 16 ° C for 10 minutes, and the evaluation of 2' and thickness (4). The film sample for evaluation was cut into a width.

至foV二L⑽’ f作樣ί。將該樣本以塗膜面朝上放置於加熱 , R、、、^,於/'上重疊宇部興產製聚醯亞胺膜(UPILEX35SGA Ξ ^ %分量之銅負重3Q秒後,未黏附於聚酿亞 月女膜日守疋為〇(go〇d),黏附時定為χ(_。 兑 [表面硬度] 電解㈣之光澤面塗布表覆層用組成物,於 約:^鐘,接著於12(rc加熱處_分鐘,形成厚度 如歸7_°將_價用被膜以JIS κ 5600—5一4 劃痕硬度(鉛筆法)進行評價。 ^ [起始彈性係數] 將硬= 厚分鐘’接著於12吖加熱處理90分鐘, 之片狀試料,裁切成寬⑽、長度 _、失頭間距心5【行=。5_、十娜 [焊錫耐熱性] 、 於厚度35//m之電解銅箱之光澤面塗布表覆層用組成物,於 200921882 Z加熱處理30分鐘,接著於i耽加熱處理 價用之厚度約1G,之膜。於評價用之膜上塗布 ▼成^ riiiiMot:11 ;SUNFLUX SF~270)^5 C之ΜΙα 1G秒。觀察之後樣本狀g, 為〇(g〇〇d),膨脹、炫解時以x(bad)表示。1貝料生一市時疋 [翹•曲] „ !;ΐπΐ;ί!^δ^^Μ(υρι™5δ^ 物丄於80 〇加熱處理30分鐘,接著於12叱加熱處㈣〇分鐘成 =約10〃m狀評彻膜。賴聚輕胺上硬化觸用膜 成5Cmx5cm,於4角之高度平均小於lmm時定為 於1_時以x(bad)表示。 於4 以下,說明各例使用之化合物、環氧樹脂、硬 材及多孔性微粒。 凡具 [四羧酸] 2, 3’ 3 ,4’ 一聯苯四羧酸二酐(宇部興產(股)公司製) [二胺化合物] 異佛爾酮二胺(和光純藥(股)公司製)To foV two L (10)' f to work ί. The sample was placed on the coated surface with the surface facing up on the heating, R, , , ^, on the /' overlap on the U-imide production of the polyimide film (UPILEX35SGA Ξ ^% of the copper weight of 3Q seconds, not adhered to the poly The yoghurt is made of 亚 〇 (go〇d), and it is set as χ (_. against [surface hardness] electrolysis (4). 12 (rc heating at _min, forming a thickness such as 7_°, the _ price is evaluated by JIS κ 5600-5-4 scratch hardness (pencil method). ^ [Initial elastic coefficient] will be hard = thick minute ' Then, it was heat-treated at 12 Torr for 90 minutes, and the sheet sample was cut into a width (10), a length _, a head gap 5 (row = .5_, tena [solder heat resistance], and an electrolytic thickness of 35//m). The surface of the copper case coated with the surface coating layer was heat-treated at 200921882 Z for 30 minutes, and then heated to a thickness of about 1 G for the film. The film for evaluation was coated with ▼ riiii Mot: 11 ; SUNFLUX SF~270)^5 C ΜΙα 1G seconds. After observation, the sample shape g is 〇(g〇〇d), and the expansion and the illusion are represented by x(bad). City time 疋[翘•曲] „ !;ΐπΐ; ί!^δ^^Μ(υριTM5δ^ 丄 〇 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 80 〇 〇 〇 〇 〇 30 30 30 30 30 30 30 30 30 30 The film was etched into a film, and the hardened touch film was made 5Cmx5cm. When the height of the four corners was less than 1mm, it was determined by x(bad) when it was 1_. The compound used in each case was explained below. Epoxy resin, hard material, and porous fine particles. [tetracarboxylic acid] 2, 3' 3 , 4'-biphenyltetracarboxylic dianhydride (manufactured by Ube Industries, Ltd.) [Diamine compound] Fulcone diamine (made by Wako Pure Chemical Co., Ltd.)

L 雙^一羧基一4 —胺基苯基)曱烷(4, 4, 二羧基苯基甲燒)(和歌山精化(股)公司製) [具1個醇性羥基之單胺] 3 —胺基丙醇(和光純藥(股)公司製) [含反應性極性基之二醇] 2’ 2 —雙(备甲基)丙酸(廣榮perstorp(股)公司公司製) [聚碳酸醋二醇] Kuraray P〇iyol c —2〇15((股)公司 Kuraray 製,平均 2000) 里 [二異氰酸酯化合物] ω—雙(3~~胺基丙基)聚二曱基矽氧烷(胺基當量46 越化學工業(股)公司製) 八15 二胺基一3, 3’ 19 200921882 4, 4’ 一二苯基甲烷二異氰酸酯(日本聚胺酯工業(股)公司 製) 、 [有機溶劑] 7 —丁内S旨(和光純樂(股)公司製) [環氧樹脂]L bis-carboxy- 4-aminophenyl decane (4, 4, dicarboxyphenyl ketone) (manufactured by Wakayama Seiki Co., Ltd.) [monoamine with one alcoholic hydroxyl group] 3 — Aminopropanol (manufactured by Wako Pure Chemical Co., Ltd.) [Reactive polar group-containing diol] 2' 2 - bis(methyl)propionic acid (Guangrong Perstorp Co., Ltd.) [Polycarbonate Alcohol diol] Kuraray P〇iyol c — 2〇15 (manufactured by Kuraray Co., Ltd., average 2000) [Diisocyanate compound] ω-bis(3~~aminopropyl)polydidecyloxane Amine equivalent: 46, manufactured by Chemical Industry Co., Ltd.) 八15 Diamino- 3, 3' 19 200921882 4, 4'-diphenylmethane diisocyanate (manufactured by Japan Polyurethane Industry Co., Ltd.), [Organic solvent ] 7 —Dinger S ((Huangchun Lele Co., Ltd.) [Epoxy resin]

Epolead2021P( Daicel化學工業(股)公司製) Epicoat828EL(Japan 印oxy resin (股)公司製、環氧當量: 184〜194) [嵌段異氰酸酯]Epolead2021P (manufactured by Daicel Chemical Industry Co., Ltd.) Epicoat828EL (manufactured by Japan oxy resin Co., Ltd., epoxy equivalent: 184~194) [Block isocyanate]

Takenate B830(三井武田化學(股)公司製、NC〇(wt%) : 7. 0 duranateME20 —B80S(旭化成化學(股)公司製、NC〇(wt%): 5.8) [硬化觸媒] DBU(Aldrich(股)公司製、1,8 —二氮雜雙環[5, 4, 0]—7 —十 一烯)Takenate B830 (manufactured by Mitsui Takeda Chemical Co., Ltd., NC〇 (wt%): 7. 0 duranateME20 - B80S (assembled by Asahi Kasei Chemicals Co., Ltd., NC〇 (wt%): 5.8) [hardening catalyst] DBU ( Aldrich Co., Ltd., 1,8-diazabicyclo[5,4,0]-7-undecene

Curezol2E4MZ(四國化成工業(股)公司製、2~乙基一4一曱基 口米σ坐) [充填材]Curezol2E4MZ (manufactured by Shikoku Chemical Industry Co., Ltd., 2~ethyl-1-4 曱 base mouth σ sit) [filling material]

Aerosi 1130(日本Aerosil公司製比表面積(BET法): 130m2/g)Aerosi 1130 (specific surface area (BET method) manufactured by Japan Aerosil Co., Ltd.: 130m2/g)

AerosilR972(日本Aerosil公司製比表面積(BET法): 110m2/g) [苯酚樹脂] 苯酚•曱MmH—1(明和化成(股)公司製) [多孔性微粒]Aerosil R972 (Specific surface area (BET method) manufactured by Japan Aerosil Co., Ltd.: 110 m2/g) [Phenol resin] Phenol·曱MmH-1 (manufactured by Mingwa Chemical Co., Ltd.) [Porous particles]

SylophobiclQO(疏水性氧化矽凝膠FujKiiysia化學(股) 公司製雷射法平均粒梭2.7/im比表面積(BET法):300m2/g 吸油量:240ml/100g)SylophobiclQO (hydrophobic cerium oxide gel FujKiiysia Chemical Co., Ltd.) Laser method average granules 2.7 / im specific surface area (BET method): 300m2 / g oil absorption: 240ml / 100g)

Fuji-Silysia 化學(股)公 S il y s i a31 OP (親水性氧化秒凝膠 20 200921882 2.7#m 比表面積(BET 法):300in2/g 司製雷射法平均粒徑 吸油量:310mV100g)Fuji-Silysia Chemicals (S) il y s i a31 OP (Hydrophilic oxidized second gel 20 200921882 2.7#m Specific surface area (BET method): 300in2/g Average laser size by the system) Oil absorption: 310mV100g)

Fuji-Silysia 化學(股)公 比表面積(BET法)·· 700m2/gFuji-Silysia Chemical (Share) Common Surface Area (BET Method)·· 700m2/g

Silysia710(親水性氧化石夕凝膠 司製雷射法平均粒徑 吸油量:100ml/100g) [參考例醇性羥基末端醯亞胺寡聚物溶液之製造 於具備氮氣導入管、Dean-Stark容器、冷卻管之容量5公升 ^玻璃製可分離燒瓶中,加人2,3,3’,4, _聯苯四羧酸二野 ijmg(5莫耳)、乙醇507g(11莫耳)及7 一丁内酯2〇92g,於氮氣 鼠圍下於90 C擾拌1小時。接著,加入3 —胺基丙醇37_莫耳)、 異佛爾g同二胺426g(2.5莫耳),於氮氣氛圍下,於i2(rc加數2 小時、180尺加熱2小時,將酿亞胺化反應產生之水藉由對於反應 液中吹入线而除去。該雜錢末端輕胺絲物溶液,固 成分50. 3%。 [芩考例2]聚碳酸酯改質聚醯亞胺樹脂溶液之製造 於具備氮氣導入管之容量5公升之玻璃製燒中,加入KuraraySilysia 710 (Hydrophilic Oxidized Oxide Electroplating System, Laser Method, Average Particle Size, Oil Absorption: 100 ml/100 g) [Reference Example Alcoholic Hydroxy-Terminal Iminoimine Oligomer Solution Manufactured with a Nitrogen Introduction Tube, Dean-Stark Container , the capacity of the cooling tube is 5 liters ^ glass separable flask, adding 2,3,3',4, _biphenyltetracarboxylic acid di wild ijmg (5 m), ethanol 507 g (11 m) and 7 2-butyrolactone 2〇92g was scrambled at 90 C for 1 hour under a nitrogen mouse. Next, 3 -Aminopropanol 37_mol), 4.6 g (2.5 m) of isophorol and the same diamine were added, and under nitrogen atmosphere, i2 (rc plus 2 hours, 180 ft heating for 2 hours, The sufficiency of the polyamidization reaction is carried out by the blowing of the wire into the reaction liquid. The imine resin solution was produced in a glass-fired product having a capacity of 5 liters of a nitrogen gas introduction tube, and was added to Kuraray.

Polyol C—2015N 600g(0. 3 莫耳)、4,4,—二苯基曱烷二異氰酸 188g(0. 75莫耳)及7 一丁内酯535g,於氮氣氛圍下,於卯它 攪拌3&小時。接著,加入2, 2-雙(4-經曱基)丙酸40. 2g(0. 3莫 ,)'麥考例1合成之醇性羥基末端醯亞胺寡聚物溶液499g(〇. 3 莫耳)、r 一丁内酯100g,於8〇t:攪拌10小時。得到之改質聚醢 亞胺樹脂溶液,為聚合物固體成分濃度55重量%、黏度256pa · s 之溶液。(對數黏度β inh為〇. 230) [參考例3]聚醯亞胺聚矽氧烷樹脂溶液之製造 於容量500ml之玻璃製燒瓶,加入2,3,3,,4,一聯苯四羧酸 二酐47.1^(0.16莫耳)、溶劑之三乙二醇二曱基醚(triglyme)(以 下,有時簡稱為TG。)l〇〇g,於氮氣氛圍下,在8〇。〇加熱攪拌。 加入α, ω—雙(3—胺基丙基)聚二甲基矽氧烷(胺基當量 460)125. lg(〇. 136 莫耳)、TG40g,於 18〇t:加熱攪拌 60 分鐘。再 21 200921882 者反f?液,力以Γ缓基—4〜胺基苯基)曱罐 於臟加熱搜拌Γ=^(0.024莫耳)及啊, 反應溶液,聚合物固體成分濃度。得到==亞^夕氧烧 亞胺化率實質為100%。 里Q 200之/奋液。醯 [實施例1 ] r、、容3璃二例2得到之聚碳酸酯改質聚酿亞胺樹 相^於聚碳酸§旨改質聚醯亞胺樹脂⑽質量份,加入 %乳树月日(Ep〇lead2021P)l〇皙旦乂八 山机 ^ ί k (takenateB830)20質量份、栌俨| ,又異亂酸酯 B80S)30質量份、苯酉分樹脂H —f 2X = ^ S旨— # ^ Curezol2E4MZ 0. 5 ^ ^ ^ 〇BU °' 5 f * 份,均勺撸牲、曰入$ X —881及7—丁内醋60質量 再就填充劑而言,添加7質量份 就多孔性微粒而言’添加多孔性ί化石夕 亞ίΓ後’細3支輥捏合,彳姉《酸醋改 將該組成物以熱硬化或遠紅外線硬化, 形成^疋尽度之則賈用膜,評價與sus面及聚醯 面硬度、起始彈性係數、焊錫耐熱性、聽曲。 W表 [實施例2〜6] 财3粒’添加表1記載之純性氧切,除此以外 ,、貫施例1同樣進仃,得到表覆層馳 中,參考例3得到之聚酿亞胺石夕氧烧樹脂溶液 量份、硬化觸媒2圆·2質量 ΐ i: e ^均_、混合。再添加作為填充劑之23 貝里知Aer〇sl1130、作為多孔性微粒之多孔性 矽 (Silysia31〇P)l〇質量份’混合後,使用3支輕捏合,得到表覆層 22 200921882 用組成物。該表覆層用組成物與實施例1同樣評價。該等結果如 表1所示。 ' [比較例1 ] 片不添加多孔性氧化矽,與實施例1同樣地配合,得聚碳酸酯 聚亞胺組成物。對於此表覆層用組成物,與實施例1同樣 S平價。S亥等結果示於表i。該組成物以熱硬化或遠紅外線硬 之膜,不能滿足與SUS面及聚醯亞胺之耐黏性。 [比較例2] 氧烷性氧化矽,與實施例3同樣配合,得聚醯亞胺矽 ϊίϊϊ 關於此表覆剌組成物,與實施例1同樣評^ 用膜,。不d。雜成物以熱硬化或遠紅外線硬化得到之呼價 編絲輕叙耐雜。 多孔性微粒’除添加表1記 對於^__路基^g 能滿足 200921882 實施 例1 聚合物 參考 例2 (質量份) 100 多礼粒子 SyiophobiclOO (質量份) 2 Silysia310P (質量份) — Silysia710 (質量份) 評償結果 與SUS面之对黏性(熱硬 化) 實施 例2 參考 例2 ΠοΓ 實施 實施 實施 實施 實施 比較 比較 比較 例3 例4 例5 例6 例7 例1 例2 例3 參考 參4 參考 參考 參考 參考 參考 參考 例2 例2 例2 例2 例3 例2 例3 例2 100 100 100 100 100 100 100 100 - 70 5 10 - 10 20 與聚醯亞胺之耐黏性(熱硬 化) 與SUS面之耐黏性(遠紅外 線硬化) 與聚酿亞胺之对黏性(遠紅 外線硬化) 表面硬度 起始彈性係數(MPa) 坪錫耐熱性 勉曲 ΗΤϊο~ 2Η 320 2Η 450Polyol C—2015N 600g (0.3 mol), 4,4,-diphenyldecane diisocyanate 188g (0.75 mol) and 7-butyrolactone 535g under nitrogen atmosphere It is stirred for 3 & hours. Next, 2,2-bis(4-pyridyl)propionic acid 40. 2g (0.3 mol,) 'Mike test 1 synthesized alcoholic hydroxy-terminal quinone imine oligomer solution 499g (〇. 3 Mole), r-butyrolactone 100 g, stirred at 8 Torr: 10 hours. The modified polyimine resin solution obtained was a solution having a polymer solid concentration of 55 wt% and a viscosity of 256 Pa·s. (Logarithmic viscosity β inh is 〇. 230) [Reference Example 3] Polyimine polyoxymethane resin solution was prepared in a glass flask of 500 ml capacity, and 2,3,3,4,4-biphenyltetracarboxylate was added. The acid dianhydride 47.1 (0.16 mol) and the solvent triglyme (hereinafter sometimes abbreviated as TG) l〇〇g were placed under a nitrogen atmosphere at 8 Torr. 〇 Heat and stir. α, ω-bis(3-aminopropyl)polydimethyloxane (amine equivalent 460) 125. lg (〇.136 mol), TG 40 g, at 18 °t: heating and stirring for 60 minutes. Then 21 200921882 anti-f liquid, force to relieve the base -4 ~ aminophenyl) crucible can be mixed with dirty heating = ^ (0.024 m) and ah, reaction solution, polymer solids concentration. Obtained == sub- oxime oxygenation The imidization rate is substantially 100%. In the Q 200 / Fen liquid.醯[Example 1] r, 容三璃2 Example 2 obtained polycarbonate modified polyamidene tree phase in polycarbonate § modified poly phthalimide resin (10) parts by mass, added % milk tree month Day (Ep〇lead2021P) l〇皙旦乂八山机^ ί k (takenateB830) 20 parts by mass, 栌俨|, and isoamyl ester B80S) 30 parts by mass, benzoquinone resin H-f 2X = ^ S Purpose — # ^ Curezol2E4MZ 0. 5 ^ ^ ^ 〇BU °' 5 f * parts, all scooped, smashed into $ X - 881 and 7 - vinegar 60 mass and then added 7 parts by mass for the filler In the case of porous microparticles, 'additional porosity ί 化 夕 夕 夕 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' Membrane, evaluation and sus surface and polysilicon surface hardness, initial elastic modulus, solder heat resistance, and listening. In the W table [Examples 2 to 6], the pure particles of the above-mentioned Example 1 were added in the same manner as in the above, and the coating was carried out in the same manner as in Example 1, and the obtained powder was obtained in Reference Example 3. The amount of the imine stone oxygen burning resin solution, the hardening catalyst 2 round · 2 mass ΐ i: e ^ average _, mixed. Further, as a filler, 23 mericle Aer〇sl1130, porous yttrium (Silysia 31 〇 P) as a porous fine particle, and a mixture of three parts were used, and three kinds of light kneading were used to obtain a coating layer 22 200921882. . The composition for the surface coating layer was evaluated in the same manner as in Example 1. These results are shown in Table 1. [Comparative Example 1] The sheet was blended in the same manner as in Example 1 without adding porous cerium oxide to obtain a polycarbonate polyimide composition. The composition for the surface coating layer was the same as that of Example 1. The results such as S Hai are shown in Table i. The composition is hard-hardened or far-infrared hard film, and cannot satisfy the adhesion resistance to the SUS surface and the polyimide. [Comparative Example 2] Oxygenated cerium oxide was obtained in the same manner as in Example 3 to obtain a polyimide composition. The film composition was evaluated in the same manner as in Example 1 on the composition of the present invention. Not d. The price of the hybrid is obtained by heat hardening or far infrared ray hardening. Porous microparticles 'except for the addition of Table 1 for ^__ road base ^g can meet 200921882 Example 1 Polymer Reference Example 2 (parts by mass) 100 Multi-grain particles SyniophobiclOO (parts by mass) 2 Silysia 310P (parts by mass) - Silysia710 (mass份) The result of the evaluation and the adhesion of the SUS surface (thermosetting) Example 2 Reference Example 2 ΠοΓ Implementation Implementation Implementation Comparison Comparison Comparative Example 3 Example 4 Example 5 Example 6 Example 7 Example 1 Case 2 Example 3 Reference Reference 4 Reference Reference Reference Reference Example 2 Example 2 Example 2 Example 2 Example 3 Example 2 Example 3 Example 2 100 100 100 100 100 100 100 100 - 70 5 10 - 10 20 Adhesion resistance with polyimine (thermosetting) Adhesion resistance to SUS surface (far infrared ray hardening) and viscous viscosity of polystyrene (far infrared ray hardening) Surface hardness initial elastic modulus (MPa) Ping tin heat resistance 勉 ~ ~ ~ ~ ~ ~ ~ Η Η 2 2

2Η ^290^ 〇 〇 〇 X X 〇 〇 〇 〇 X X 〇 〇 〇 〇 X X 〇 〇 〇 〇 X X 〇 2H 2H 2B Η 3Β — 320 950 470 210 400 — 〇 0 〇 〇 〇 0 〇 〇 〇 〇 〇 X (產業利用性) 依照本發明 佤照冬發明,能提供黏性減低之輪送膠帶封婊地士牧 板,及使用此撓性電路板形成之輸送封撓性電路 減將輸送膠帶封裝翻撓性電路板行其結果’能削 送膠帶難體贼㈣職板之絲㈣及提升輸 【圖式簡單說明】 代表例之部分概略俯 圖1顯示本發明之輸送膠帶封裝I#之 24 200921882 視圖。 圖2顯示圖1之A —A’線之部分剖面圖。 圖3顯示本發明之輸送膠帶封裝體之另一代表例的部分概略 俯視圖。 圖4顯示圖3之B — B’線之部分剖面圖。 【主要元件符號說明】 1 絕緣膜 2 黏著劑層 3 電路圖案 3a 内引線(電路圖案) 3b 外引線(電路圖案) 3c 測試接墊(電路圖案) 4 元件孔 5 彎曲的狹缝 6 凸塊 7 半導體晶片 8 撓性樹脂層 9 表覆層(阻焊層) 10 半導體密封樹脂 11 穿孔洞(扣鏈齒輪孔) 12 絕緣膜 13 電路圖案 13a 内引線(電路圖案) 13b 外引線(電路圖案) 13c 測試接墊(電路圖案) 14 凸塊 15 半導體晶片 16 表覆層(阻焊層) 25 200921882 17 底填劑 18 穿孔洞(扣鏈齒輪孔)2Η ^290^ 〇〇〇 XX 〇〇〇〇 XX 〇〇〇〇 XX 〇〇〇〇 〇 H 2H 2H 2B Η 3Β — 320 950 470 210 400 — 〇0 〇〇〇0 〇〇〇〇〇X (Industry The utility model relates to the invention according to the invention, which can provide a crucible tape for sealing the crusted tape, and a conveying sealing circuit formed by using the flexible circuit board, and the conveying tape packaging flexible circuit The result of the board is 'can be used to cut the tape difficult thief (four) the board of the board (four) and the lifting of the line [four-dimensional description] representative part of the outline Figure 1 shows the transport tape package I # 24 of the present invention 200921882 view. Fig. 2 is a partial cross-sectional view showing the line A - A' of Fig. 1. Fig. 3 is a partially schematic plan view showing another representative example of the transfer tape package of the present invention. Fig. 4 is a partial cross-sectional view showing the line B - B' of Fig. 3. [Main component symbol description] 1 Insulating film 2 Adhesive layer 3 Circuit pattern 3a Inner lead (circuit pattern) 3b Outer lead (circuit pattern) 3c Test pad (circuit pattern) 4 Component hole 5 Curved slit 6 Bump 7 Semiconductor wafer 8 Flexible resin layer 9 Surface coating layer (solder resist layer) 10 Semiconductor sealing resin 11 Perforated hole (chain gear hole) 12 Insulating film 13 Circuit pattern 13a Inner lead (circuit pattern) 13b Outer lead (circuit pattern) 13c Test Pad (Circuit Pattern) 14 Bump 15 Semiconductor Wafer 16 Cover Layer (solder Mask) 25 200921882 17 Underfill 18 Perforated Hole (Buckle Gear Hole)

Claims (1)

200921882 十、申請專利範圍: 1. 一種輸送膠帶封裝體用撓性電路 其特徵為包含: ’ 絕緣膜; 電路圖案’形成於該絕緣膜之表面. 表覆層’包含樹脂硬化物與多料 f 案之至少一部分。 口生嘁叔,且保護前述電路圖 2. 如申請專利範圍第1項之於 册 其中,該表覆層之黏性,滿足在14=私:封展體用撓性電路板, 黏附於聚醯亞胺之條件。 不·^附於SUS,且在不 3. 如申請專利範圍第1項之耠 .其中,該多孔性微粒,相對於前述體用撓性電路板, 0.1〜50質量份之比例。 《㈣硬化物_質量份,含有 4. 如申請專利範圍第1項之私、¥咖撒 其中, 、輪送胗页封裝體用撓性電路板, 該多孔性微粒之平均粒顿該表覆層之厚 多數該多孔性微粒,從表覆層之厚度方向之中:‘表面存在 其中,該多孔性平1均帶封裝體用撓性電路板, 200mVg以上。 辽為3〇/ζηι以下且比表面積為 6.如申請專利範圍第1項 其令,該多孔性微粒之細孔容積⑦體用雜電路板, 之精製亞麻仁油法之吸油量為Q、]ml々以上 5101-13-1 其中y膠帶封裝體用挽性電路板, 聚醯亞胺術 27 200921882 種樹脂之硬化物。 9.如巾請專利顧第丨項之輸送膠帶封裝翻撓 ” t,該樹脂硬化物係經遠紅外線加熱處理而硬化者。 板, 10·如申請專利範圍第!項之輸送膠帶封裝 其中,係不隔著剝離膜而進行捲轴捲繞。 生電路板, Π·-種輸送膠帶封裝體’使用申請專 帶封裝體用撓性電路板所形成。 固罘1項之輪送膠 12. —種表覆用硬化性樹脂組成物,豆 化性樹脂,且硬化後,比前孔性 化物之表面之黏性較為減低。 1夕札性Μ拉時,硬 13. 如申請專利範圍第12項之 中’硬化後,呈現於贿不_ 脂組成物,其 亞胺之條件之黏性。 娜於60 C不购於聚酿 14. 如申請專利範圍第a項 中,前述硬化性樹脂,包含擇覆用更化性樹脂組成物,其 脂、聚酿亞胺錢垸樹脂及改質=細旨樹脂、聚自I胺酿亞胺樹 種樹脂。 織及⑽麵樹脂所構柄中至少! 十一、圖式:200921882 X. Patent application scope: 1. A flexible circuit for a conveyor tape package, characterized in that: 'an insulating film; a circuit pattern' is formed on the surface of the insulating film. The surface coating layer contains a resin hardened material and a plurality of materials f At least part of the case. The mouth is uncle, and protects the above circuit. Figure 2. As claimed in the first paragraph of the patent application, the viscosity of the cover of the watch meets the requirements of the flexible circuit board in the 14: private: sealed body, adhered to the poly The conditions of the imine. It is not attached to SUS, and is not in the range of 0.1 to 50 parts by mass of the porous flexible circuit board. "(4) Hardened material_parts by mass, containing 4. The private circuit of the first application of the patent scope, the coffee machine, the flexible circuit board for the turntable package, the average particle size of the porous particles Most of the porous fine particles are in the thickness direction of the surface layer: 'The surface is present, and the porous flat 1 is provided with a flexible circuit board for a package, 200 mVg or more. Liao is 3〇/ζηι and has a specific surface area of 6. As claimed in the first paragraph of the patent application, the pore volume of the porous microparticles is 7, and the oil absorption of the refined linseed oil method is Q. ]ml々 above 5101-13-1 where the y tape package uses a pull-up circuit board, polyimine 27 272121 resin hardened. 9. If the towel is covered by the patented Gu Diyu, the transfer tape is slanted. t. The cured resin is hardened by far-infrared heat treatment. Plate, 10· The reel winding is carried out without the release film. The green circuit board, the 输送--type transfer tape package 'is formed using a flexible circuit board for the application of the package. - The surface is coated with a curable resin composition, a soy-forming resin, and after curing, the viscosity of the surface of the pre-porous compound is reduced. 1 When the stagnation is pulled, the hard 13 is as claimed. Among the items, 'hardened, it is presented in the brittle _ fat composition, the viscosity of its imine conditions. Na is not purchased in the 60 C. 14. As in the scope of patent application, the aforementioned hardening resin, It contains a modified resin composition, a fat, a styrene resin, a modified resin, a polyether-based imide resin, and at least one of the handles of the woven and (10) surface resin. XI. Schema:
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