TW200912283A - Method and device for measuring chemical reaction rate by use of photo resistor - Google Patents
Method and device for measuring chemical reaction rate by use of photo resistor Download PDFInfo
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- TW200912283A TW200912283A TW096134527A TW96134527A TW200912283A TW 200912283 A TW200912283 A TW 200912283A TW 096134527 A TW096134527 A TW 096134527A TW 96134527 A TW96134527 A TW 96134527A TW 200912283 A TW200912283 A TW 200912283A
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 15
- 238000005259 measurement Methods 0.000 claims abstract description 8
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims description 9
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 34
- 239000000376 reactant Substances 0.000 description 21
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 19
- 235000019345 sodium thiosulphate Nutrition 0.000 description 19
- 230000035484 reaction time Effects 0.000 description 17
- 230000000694 effects Effects 0.000 description 7
- 238000002835 absorbance Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 238000011088 calibration curve Methods 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 230000002596 correlated effect Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 241000238876 Acari Species 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 238000003324 Six Sigma (6σ) Methods 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229960000789 guanidine hydrochloride Drugs 0.000 description 1
- PJJJBBJSCAKJQF-UHFFFAOYSA-N guanidinium chloride Chemical compound [Cl-].NC(N)=[NH2+] PJJJBBJSCAKJQF-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
200912283 九、發明說明： 【發明所屬之技術領域】 本發明係有關一種光敏電阻測定化學反應速率之方法 及裝置，尤指一種於一不受光束干擾之空間中，利用測定 光束之透射量來測定化學反應速率之方法及裝置。 【先前技術】 一般用以測定化學反應之濃度或反應速率之方式，係 利用光束來加以實施，當光束通過一含有懸浮質點的化學 介質時，由於懸浮質點對光的散射作用和選擇性的吸收， 使得透射光的強度減弱，依此特性通常利用濁度測定法這 種光散射測量技術，來測量透過懸浮質點介質的光強度， 以確定懸浮的物質濃度，所用的儀器即為比濁計或分光光 度計。 其原理即光束通過一含有懸浮質點的介質時，以下列 方程式表示，由於懸浮質點對光的散射作用和選擇性的吸 收的能力，導致透射光的強度減弱的現象，造成吸光度(A) 下降；此一特性可利用Lambert-Beer’s law以建立透光度 和懸浮物質濃度之間的關係，其中吸收度與樣品溶液濃度 (c)和光束通過溶液的距離-光徑(b)在適當濃度範圍内成正 比，所以吸收度與濃度或光束通過溶液距離在適當的濃度 範圍内是呈現線性關係。在特定波長下，由於b (光徑）及A (Arrhenius常數）或e (自然對數）皆為常數，故由測定所得 之吸收度可計算溶液之濃度，其可以下列關係式表示： A = k b c ; 其中 5 200912283 的大小、形狀、入射光的 關 κ .濁度係數，其值與粒子 波長、懸浮物和介質的折射率有 b :光徑（cm) c .溶質濃度M: (m〇i/L) 上述關係式也可表示為： A = iogdo/I);其中200912283 IX. Description of the Invention: [Technical Field] The present invention relates to a method and a device for measuring the chemical reaction rate of a photoresistor, and more particularly to a method for measuring the chemical reaction rate in a space free from interference of a light beam. Method and apparatus for chemical reaction rate. [Prior Art] The method generally used to determine the concentration or reaction rate of a chemical reaction is carried out by using a light beam. When the light beam passes through a chemical medium containing suspended particles, the scattering effect and selective absorption of the suspended particles by light To reduce the intensity of the transmitted light. According to this characteristic, the light scattering measurement technique is usually used to measure the light intensity of the medium passing through the suspended point medium to determine the suspended substance concentration. The instrument used is a turbidimeter or Spectrophotometer. The principle is that when the light beam passes through a medium containing suspended particles, it is expressed by the following equation. Due to the scattering effect of the suspended particles on the light and the selective absorption, the intensity of the transmitted light is weakened, resulting in a decrease in the absorbance (A); This property can be exploited by Lambert-Beer's law to establish the relationship between the transmittance and the concentration of suspended matter, where the absorbance is proportional to the concentration of the sample solution (c) and the distance of the beam through the solution - the optical path (b) is within the appropriate concentration range. It is proportional, so the absorbance is linear with the concentration or distance of the beam passing through the solution within the appropriate concentration range. At a specific wavelength, since b (light path) and A (Arrhenius constant) or e (natural logarithm) are constant, the concentration of the solution can be calculated from the measured absorbance, which can be expressed by the following relationship: A = kbc ; 5 200912283 size, shape, κ turbidity coefficient of incident light, its value and particle wavelength, suspended matter and medium refractive index b: light path (cm) c. solute concentration M: (m〇i /L) The above relationship can also be expressed as: A = iogdo / I);
1〇:為入射光通過純溶劑之光強度 I:為透射光通過混濁樣品之光強"度 在刀析别先以A對已知懸浮物質的濃度^作圖即可 ^寻檢量線’隨即可在不同條件下根據所測得的吸收度換 舁出懸序物質的濃度；^同時考慮時間因*，在足夠量的 反應物濃度範圍内，單位時間内所產生的產物量與時間是 呈現-線性關係，此即為反應速率之初速率(Ιη_κ_。 假設此化學反應之反應物為£及？，反應所產生之產物為 EF，則在反應開始後產物EF的濃度會從零開始上升，反 應物E及F的 >辰度會開始下降直到反應物用盡或達到動態 平衡時，反應才慢慢停頓，其反應式為：1〇: the light intensity of the incident light passing through the pure solvent I: the light intensity of the transmitted light passing through the turbid sample. The degree is plotted in the knife and the concentration of the known suspended matter is plotted. 'The concentration of the suspended material can be exchanged according to the measured absorbance under different conditions; ^ Considering the time factor*, the amount and time of product produced per unit time within a sufficient range of reactant concentration Is a presentation-linear relationship, which is the initial rate of reaction rate (Ιη_κ_. Assuming that the reactants of this chemical reaction are £ and ?, and the product produced by the reaction is EF, the concentration of the product EF will start from zero after the start of the reaction. Ascending, the °rees of the reactants E and F will begin to decrease until the reactants are used up or reach a dynamic equilibrium, and the reaction slowly stops. The reaction formula is:
E2 + F2 —> 2EF 在單位時間内（ΔΙ)的反應速率（v)可表示為： ν = -Δ[Ε2]/(Δί) = -A[F2]/(At) = A[EF]/(At) (反應式1) 所以反應速率通常與反應物濃度有關，反應物濃度愈 高則反應速率愈快；其關係可用下列關係式表示： 200912283 V = K[E2][F2] (反應式2) K:速率常數，其隨溫度而變化，可以Arrhenius方程 式表示為： K = Ae'Ea/RT A: Arrhenius 常數 e:自然對數（2.718·..)E2 + F2 —> The reaction rate (v) of 2EF in unit time (ΔΙ) can be expressed as: ν = -Δ[Ε2]/(Δί) = -A[F2]/(At) = A[EF] /(At) (Reaction 1) Therefore, the reaction rate is usually related to the concentration of the reactant. The higher the concentration of the reactant, the faster the reaction rate; the relationship can be expressed by the following relationship: 200912283 V = K[E2][F2] (Reaction Equation 2) K: Rate constant, which varies with temperature and can be expressed by the Arrhenius equation: K = Ae'Ea/RT A: Arrhenius constant e: natural logarithm (2.718·..)
Ea:反應活化能（J/mol) R:莫耳氣體常數8.3143 J/(K.mol) τ:絕對溫度 综合反應式1及反應式2兩式則可得： V = -Δ[Ε2]/(Δ〇 = K[E2][F2] (反應式3) 上述，即為單位時間内的化學反應速率，其中即可得 知反應速率與時間倒數成正比，因此，可以内建有時間參 數的分光光度計進行偵測，而進一步應用於比濁計或分光 光度計。 然而，習知以比濁計或分光光度計來測定化學反應之 式’比濁計或分光光度計之靈敏度卻不足，且其所測得之 測定值亦不穩定，而易造成測定誤差。 【發明内容】 本發明之首要目的，在於解決上述的問題而提供一種 光敏電阻測定化學反應速率之方法及裝置，其係藉由光敏 電阻來作光束測定、並利用發光二極體為光源，且光敏電 200912283 阻同時連接電源及電表，以此設為整體可測定化學溶液濃 度之反應速率，其靈敏度高且測定值穩定不易造成誤差， 可達到測得精確之化學反應值。 為達前述之目的，本發明係供於一不受光束干擾之由 間中進行測定，該裝置包括： 工 一透光容器，供容置待測定之化學物質； 一光源，設於該透光容器一側，以提供光束照射該 光容器； f 以供 一光敏電阻，設於該透光容器相反該光源一側 接收該光源透射經該透光容器之光束； -電表’電性連接該光敏電阻，俾供接收該 之電阻值。 电p且 本創作之上述及其他目的與優點，不難從下迷 實施例之詳細說明與附圖中，獲得深入了解；當然，選用 作在某些另件上，或另件之安排上容許有所不同，彳曰本劊 用之實施例，則於本說明書中，予以詳細闡述，=所選 中展示其構造。 ϋ _ 【實施方式】 本案之實施例，請參閱第丄圖至第5圖，圖中 均為本創作所選用之實施例，在此僅供說明之用，於7'、者 申請上並不拘限於此種結構。 < 專利 本實施例提供一種光敏電阻測定化學反應速率 ，詳見第1圖，其係供於一不受光線干擾之空間中，置 定，該裝置包括：一透光容器1、一光源2、一 订剛 匕敢電p且 8 200912283 3、及一電表4，其中： 該透光容器（Cell) 1，供容置待測定之化學物質，圖中 以一方形之透光容器為例，而該光源2係設於該透光容器 1一侧，以提供光束照射該透光容器1，該光源2係可比 一般白光燈或鹵素燈更光亮，本實施例中，以一可發出白 色光之發光二極體（Light-Emitting Diode; LED)為例，且發Ea: reaction activation energy (J/mol) R: molar gas constant 8.3143 J/(K.mol) τ: absolute temperature combined reaction formula 1 and reaction formula 2 can be obtained: V = -Δ[Ε2]/ (Δ〇= K[E2][F2] (Reaction formula 3) The above is the chemical reaction rate per unit time, wherein it can be known that the reaction rate is proportional to the reciprocal of time, and therefore, the time parameter can be built in. The spectrophotometer is used for detection, and is further applied to a turbidimeter or a spectrophotometer. However, it is conventionally known that a turbidimeter or a spectrophotometer is used to measure a chemical reaction, and the sensitivity of a turbidimeter or a spectrophotometer is insufficient. The measured value is also unstable, and is easy to cause measurement error. SUMMARY OF THE INVENTION The primary object of the present invention is to solve the above problems and provide a method and a device for measuring the chemical reaction rate of a photoresistor. The photoreceptor is used for beam measurement, and the light-emitting diode is used as the light source, and the photo-electricity circuit 200912283 is connected to the power source and the electric meter at the same time, thereby setting the reaction rate of the chemical solution concentration as a whole, and the sensitivity is high and the measured value is stable. Cause The error can be used to determine the exact chemical reaction value. For the purpose of the foregoing, the present invention is for the measurement of the medium without interference of the light beam, and the device comprises: a light-transmissive container for the capacity to be determined a light source disposed on a side of the light-transmissive container to provide a light beam to illuminate the light container; f for providing a photoresistor disposed on the side of the light-transmitting container opposite to the light source to receive the light source transmitted through the light-transmitting The light beam of the container is electrically connected to the photoresistor for receiving the resistance value. The above and other objects and advantages of the present invention are not difficult to be described in the detailed description of the embodiments below. Get an in-depth understanding; of course, the choices are allowed to be different on some of the components, or the arrangement of the other parts. The examples used in this manual are explained in detail in this manual, = selected in the display The structure is as follows: 实施 _ [Embodiment] For the embodiment of the present case, please refer to the figures to the fifth figure, which are the examples selected for this creation, which are for illustrative purposes only, and apply at 7'. Not limited to The present embodiment provides a photoresistor for measuring the chemical reaction rate. For details, see FIG. 1 , which is provided in a space free from light interference. The device includes: a light-transmissive container 1. A light source 2, a set of 匕 匕 电 且 且 且 8 200912283 3, and an electric meter 4, wherein: the light-transmissive container (Cell) 1, for the chemical substance to be measured, a square transparent container For example, the light source 2 is disposed on the side of the light-transmitting container 1 to provide a light beam to illuminate the light-transmitting container 1. The light source 2 can be brighter than a general white light or a halogen light. In this embodiment, Light-Emitting Diode (LED) is used as an example, and
光一極體並電性連接一電源裝置5，以供應發光二極體所 需之電源。 s亥光敏電阻3 (Light-Dependent Resistor)，其對光反應 鼓敏而可用於可見光範圍之探測，其係設於該透光容器1 相反該光源2 —側，以供接收該光源2透射經該透光容器 1之光束，光敏電阻值之電阻值會隨入射光的強弱（即光 子的夕春）而產生變化’且該光敏電阻3之材料係可利用 硫化鎘（CdS)製成。 、/亥電表4，其係電性連接該光敏電阻3，俾供接收該 ，敏電阻3之電阻值所產生之變化，而可進—步測得光束 ^射經該透光㈣1之變化，而於本實施例以-三用電表 為例。 目mi案巾&使袈置於測定時，能不受到光線之干擾， 貝^利祕透光容器1:光源2、光敏電阻3,整組設置於 二：：界光線之一隔絕容器6内，以確保測定中不受光 綠之干擾。 以#寺土先混口待剩定之化學物於透光容器1 ’再 先源2之光束投射於該透光容器1，且鎌電阻3並以 200912283 對應於該光源9ι、_The light source is electrically connected to a power supply unit 5 to supply a power source required for the light emitting diode. Light-Dependent Resistor 3, which is sensitive to light reaction and can be used for detecting visible light range, is disposed on the side of the light-transmitting container 1 opposite to the light source 2 for receiving the light source 2 The light beam of the light-transmitting container 1 has a resistance value that varies with the intensity of the incident light (ie, the photon of the photon) and the material of the photoresistor 3 can be made of cadmium sulfide (CdS). / / Hai meter 4, which is electrically connected to the photoresistor 3, for receiving the change of the resistance value of the varistor 3, and the change of the beam ^ through the light transmission (four) 1 can be measured step by step, In this embodiment, a three-meter power meter is taken as an example. When the mites are placed in the measurement, they can be free from the interference of light, and the light source container 2: the light source 2, the photoresistor 3, and the whole group is disposed in the second:: one of the boundary light is insulated from the container 6 To ensure that the measurement is not disturbed by light green. The light of the pre-source 2 in the light-transmissive container 1 ′ is again projected to the light-transmissive container 1 by the sputum, and the 镰 resistor 3 corresponds to the light source 9 ι, _200912283
之光束，用以測定該 ’又，本案之實施例 内，並以電表4連接 六σι/且 則可藉由光束透過透光容器1時，經由透光 谷内化學物之化學反應過程中所產生之濃度變化，而 阻隔光源2提供之光束的透射量，得知光敏電阻3測得之 電阻值文化’而得纟1i化學物之化學變化之相關應用值。 ^本發明之技術手段係利用以硫化鎘（CdS)為材料的 光敏電阻，以白光發光二極體為光源，將光敏電阻連接電 源及二用電表以組裝成可測定溶液濃度之裝置，建立電阻 值對已知懸浮物質的濃度作圖所得之檢量線，隨即可在不 同條件下根據所測得的電阻值換算出懸浮物質的濃度，亦 即可以藉由測量未知濃度的電阻值和檢量線做内插法便可 以求得濃度’依據電阻值大小，即可用於判斷溶液中特定 產物的量。 進一步實驗，以驗證光敏電阻來測定液體濃度之成 效’如下分別以五個實驗說明之··其中，第一實驗例·· 其是將0.5 Μ的硫代硫酸鈉(Na2S205)和1 Μ鹽酸(HC1) 分別加熱至40°C後，再將兩者同時混合於前述透光容器 (Cell)中，且隔絕光線之干擾，並同時紀錄光敏電阻自 混合化學物時所測得之電阻值，一直到電阻值沒有大幅度 的變化後，也紀錄化學反應最後的電阻值，重複此試驗三 次’並取其平均值；其結果如下表： 200912283 硫代硫酸鈉 電阻初值 電阻末值 電阻初值 電阻末值 電阻初值 電阻末值 '--- 電限平均 濃度(Μ) 1 1 2 2 3 3 (Χ10Κ) 0.5 0.9 30 1.2 32 0.9 32 ---—^ 30.33 其結果顯示因化學反應所產生之產物，並造成產物遮 蔽光束的效應出現，導致光敏電阻電阻值的上升，由此判 斷，其可用於溶液濃度之測量。 第二實驗例：即重複上述第一實驗例之試驗，其係以 固定鹽酸濃度為1M及溫度40°C下作用之條件，只改變硫 代硫酸鈉的濃度為0.3 Μ、0.1 Μ、0.05 Μ、0.03 Μ，且， 反學反應進行中，再分別記錄電阻值的變化，並重複此試 驗三次而取其平均值；可得結果如下表： 硫代硫酸鈉 電阻初值 電阻末值 電阻初值 電阻末值 電阻初值 電阻末值 電阻平均 濃度（Μ) 1 1 2 2 3 3 (Χ10Κ) 0.3 0.9 27 0.9 25.2 0.9 26 25.16 0.1 0.9 14 0.9 17 0.9 17 15.1 0.05 0.9 8 0.9 8.6 0.9 8.6 7.5 0.03 0.9 6 0.9 6 0.9 6 5.1 其結果顯示因反應物濃度的不同造成產物產生的量上 的差異，其遮蔽光的效應不同，導致光敏電阻電阻值的變 化出現差異性，將電阻值和硫代硫酸納漢度作圖’則可得 到一條檢量線，如第2圖所示，結果顯示此一差異性與反 11 200912283 應物濃度呈現線性關係，由此結果判斷此一裝置所測得之 電阻值變化可用於溶液濃度之測量。 第三實驗例：係將鹽酸(HC1)濃度固定為1 Μ，改變硫 代硫酸鈉（Na2S205)的濃度為0.03~0.5Μ，以觀測其反應速 率（以時間倒數1/Τ表示，其與反應速率成正比）和反應 物濃度的關係；測定不同濃度之硫代硫酸鈉完全反應完時 的電阻變化值及其反應完成所需時間，重複試驗三次並計 算其平均反應時間及其反應速率，其結果如下表·. 硫代硫酸鈉 濃度（Μ) 反應時間1 (S) 反應時間2 (S) 反應時間3 ⑻ 平均反應時 間⑻ 1/Τ 電阻變化平 均值 0.5 56.46 46 48 50.15 0.020 30.33 0.3 69 78 84.64 77.21 0.013 25.16 0.1 13.2 145 177.6 145.26 0.007 15.1 0.05 192 213.5 213.4 206.3 0.005 7.5 0.03 288.9 273.9 265.9 276.26 0.004 5.1 此外，再將前述反應速率與硫代硫酸鈉的濃度作圖， 則可得到第3圖，其呈現很好的線性關係，代表利用光敏 電阻液體濃度測量裝置可以得到很準確的反應時間，反應 物硫代硫酸鈉濃度與反應速率呈正向的線性關係，即與反 應時間的倒數呈正向的線性關係；由於鹽酸濃度維持恆 定，在足夠量的鹽酸濃度條件下，隨著硫代硫酸鈉濃度的 增加，產物硫的濃度也隨之增加，所以硫代硫酸鈉濃度亦 12 200912283 阻平均值呈正向的線性關係’代表反應速率與電 十岣值呈正相關。 的產Ϊ結果顯示鹽酸與硫代硫酸鈉的化學反應造成產物硫 度條件’導致其遮蔽光的效應出現’而在足夠量的鹽酸濃 拼下，隨著硫代硫酸鈉濃度的增加，產物硫的濃度也 2二加，因此光敏電阻之電阻值即持續上升，此一電阻 、支化^均值即與反應物濃度及反應速率呈現正相關。 第四實驗例：其係以固定硫代硫酸鈉的濃度為〇 5 μ ’而改變鹽酸濃度為G ()5~lM ’以觀測其反應速率（以時 間倒數1/T表示，其與反應速率成正比）和反應物濃度的 關係/則疋不同濃度之鹽酸完全反應完時的電阻變化值及 其反應完成所需時間，重複試驗三次並計算其平均反應時 間及其反應速率，其結果如下表： i.The light beam is used to determine the 'again, in the embodiment of the present invention, and is connected to the six-sigma 1 by the electric meter 4, and can be generated by the chemical reaction process of the chemical in the light-transmitting valley when the light beam is transmitted through the light-transmitting container 1. The concentration changes, and the transmission amount of the light beam provided by the light source 2 is blocked, and the resistance value culture measured by the photoresistor 3 is known, and the relevant application value of the chemical change of the chemical is obtained. The technical means of the invention utilizes a photoresistor made of cadmium sulfide (CdS) as a light source, a white light emitting diode as a light source, a photosensitive resistor connected to a power source and a dual-meter to assemble a device capable of measuring a solution concentration, and establishing A calibration curve obtained by plotting the resistance value against the concentration of a known suspended substance, and then the concentration of the suspended substance can be converted according to the measured resistance value under different conditions, that is, by measuring the resistance value of the unknown concentration and detecting The interpolation method can be used to determine the concentration according to the resistance value, which can be used to determine the amount of a specific product in the solution. Further experiments to verify the effectiveness of the photoresist to determine the liquid concentration are as follows in five experiments. The first experimental example is 0.5 Μ sodium thiosulfate (Na2S205) and 1 guanidine hydrochloride ( After heating to 40 ° C, respectively, the two are simultaneously mixed in the above-mentioned light-transmissive container (Cell), and the interference of the light is isolated, and the resistance value measured by the photoresistor from the mixed chemical is recorded at the same time. After the resistance value has not changed greatly, the last resistance value of the chemical reaction is also recorded. The test is repeated three times and the average value is taken; the results are as follows: 200912283 Sodium thiosulfate resistance initial value resistance value resistance initial resistance The final value of the initial value of the final value of the resistance is '--- The average concentration of the electric limit (Μ) 1 1 2 2 3 3 (Χ10Κ) 0.5 0.9 30 1.2 32 0.9 32 ---—^ 30.33 The result is shown by the chemical reaction. The product, and the effect of causing the product to obscure the beam, results in an increase in the resistance value of the photoresistor, from which it can be judged that it can be used for the measurement of the solution concentration. The second experimental example: the experiment of the first experimental example described above was repeated, and the concentration of the sodium thiosulfate was changed to 0.3 Μ, 0.1 Μ, 0.05 以 under the conditions of a fixed hydrochloric acid concentration of 1 M and a temperature of 40 ° C. 0.03 Μ, and, during the anti-study reaction, record the change of resistance value separately, and repeat the test three times to take the average value; the results are as follows: Sodium thiosulfate resistance initial value resistance end value resistance initial value Resistance end value resistance initial value resistance end value resistance average concentration (Μ) 1 1 2 2 3 3 (Χ10Κ) 0.3 0.9 27 0.9 25.2 0.9 26 25.16 0.1 0.9 14 0.9 17 0.9 17 15.1 0.05 0.9 8 0.9 8.6 0.9 8.6 7.5 0.03 0.9 6 0.9 6 0.9 6 5.1 The results show that the difference in the amount of product produced due to the difference in the concentration of the reactants, the effect of shielding light is different, resulting in a difference in the resistance value of the photoresistor, the resistance value and the sodium thiosulfate Handu's drawing 'can obtain a calibration curve, as shown in Figure 2, the results show that this difference has a linear relationship with the concentration of the anti-11 200912283, and the result is determined by the resistance measured by this device. It is used to measure changes in the concentration of the solution. The third experimental example: the concentration of hydrochloric acid (HC1) was fixed to 1 Μ, and the concentration of sodium thiosulfate (Na2S205) was changed to 0.03~0.5Μ to observe the reaction rate (represented by the reciprocal of time 1/Τ, which reacted with the reaction). The relationship between the rate and the concentration of the reactants; determining the resistance change value at the completion of the complete reaction of different concentrations of sodium thiosulfate and the time required for the completion of the reaction, repeating the test three times and calculating the average reaction time and the reaction rate thereof, The results are shown below. Sodium thiosulfate concentration (Μ) Reaction time 1 (S) Reaction time 2 (S) Reaction time 3 (8) Average reaction time (8) 1/Τ Average value of resistance change 0.5 56.46 46 48 50.15 0.020 30.33 0.3 69 78 84.64 77.21 0.013 25.16 0.1 13.2 145 177.6 145.26 0.007 15.1 0.05 192 213.5 213.4 206.3 0.005 7.5 0.03 288.9 273.9 265.9 276.26 0.004 5.1 In addition, by plotting the aforementioned reaction rate with the concentration of sodium thiosulfate, Figure 3 is obtained. A very good linear relationship is presented, which means that a very accurate reaction time can be obtained by using a photoresistor liquid concentration measuring device, and the concentration of the reaction sodium thiosulfate is The rate should be in a positive linear relationship, that is, a linear relationship with the reciprocal of the reaction time; since the concentration of hydrochloric acid is kept constant, the concentration of sulfur in the product increases with the concentration of sodium thiosulfate at a sufficient amount of hydrochloric acid. With the increase, so the concentration of sodium thiosulfate is also 12 200912283. The mean value of the resistance is positive. The representative reaction rate is positively correlated with the electric delta value. The results of calving showed that the chemical reaction between hydrochloric acid and sodium thiosulfate caused the product sulfurity condition to 'cause its shadowing effect to appear'. Under a sufficient amount of hydrochloric acid, the product sulfur increased with the concentration of sodium thiosulfate. The concentration of the photoresistor is also increased by 2, so the resistance value of the photoresistor continues to rise, and this resistance and branching mean value are positively correlated with the reactant concentration and the reaction rate. The fourth experimental example: the concentration of fixed sodium thiosulfate is 〇 5 μ ' and the concentration of hydrochloric acid is changed to G () 5 ~ lM ' to observe the reaction rate (represented by the time reciprocal 1 / T, and the reaction rate It is proportional to the concentration of the reactants. Then, the resistance change value of the different concentrations of hydrochloric acid after completion of the reaction and the time required for the completion of the reaction are repeated three times and the average reaction time and the reaction rate are calculated. The results are shown in the following table. : i.
將反應速率與鹽酸的濃度作圖’詳如第4圖，可以發 現鹽酸濃度和反應速率也呈現線性關係；在足夠量的辟代 硫酸鈉濃度條件下，隨著鹽酸濃度增加，所生成琉的含量 13 200912283 亦隨之增加，反應速率增加，其遮蔽光的效應也增加，所 以電阻變化值亦隨之增加。 其結果顯示利用光敏電阻液體濃度測量裝置可以得到 很準確的反應時間，反應物鹽酸濃度與反應速率呈正向的 線性關係，即與反應時間的倒數呈正向的線性關係；產物 硫的濃度也隨之增加，因此光敏電阻之電阻值即持續上The reaction rate is plotted against the concentration of hydrochloric acid. As detailed in Figure 4, it can be found that the concentration of hydrochloric acid and the reaction rate also have a linear relationship. Under a sufficient amount of sodium sulfate, the concentration of hydrochloric acid increases. The content of 13 200912283 also increases, the reaction rate increases, and the effect of shielding light increases, so the resistance change value also increases. The results show that a very accurate reaction time can be obtained by using the photoresistor liquid concentration measuring device. The hydrochloric acid concentration of the reactant has a positive linear relationship with the reaction rate, that is, a linear relationship with the reciprocal of the reaction time; the concentration of the product sulfur is also followed. Increase, so the resistance value of the photoresistor continues
升，此一電阻變化平均值即與反應物濃度及反應速率呈 正相關。 第五實驗例：其係以固定硫代硫酸鈉濃度為0.5 M， 鹽酸濃度則固定為1M，使反應在30~60。(：等不同溫声 下進行，測疋反應進行達到一定電阻值所需的時間，以 測反應速率（以時間倒數1/τ表示，其與反應速率成正比 )與反應溫度之間的關係，測定固定濃度的反應物硫代硫 酸鈉及鹽酸在反應達到一定電阻值時的所需時間，重複試 驗三次並計算其平均反應時間及其反應速率，其結果如^ 表： 、口下l, the average value of this resistance change is positively correlated with the reactant concentration and reaction rate. The fifth experimental example: the concentration of fixed sodium thiosulfate is 0.5 M, and the concentration of hydrochloric acid is fixed at 1 M, so that the reaction is between 30 and 60. (: Wait for different temperature sounds, measure the time required for the reaction to reach a certain resistance value, to measure the relationship between the reaction rate (represented by the time reciprocal 1/τ, which is proportional to the reaction rate) and the reaction temperature, Determine the time required for the fixed concentration of the reactant sodium thiosulfate and hydrochloric acid to reach a certain resistance value, repeat the test three times and calculate the average reaction time and its reaction rate. The results are as follows:
反應溫度 (0〇 反應時間一 ⑻ --------- 反應時間二 (S) 反應時間三 ⑻ 反應時間平 均⑻ 1/Τ 30 50.0 50.0 57.9 52.6 0.02 40 27.0 30.1 32.2 29.8 0.03 50 15.5 15.6 17.1 16.1 ---— 0.06 60 9.6 10.7 12.7 11.0 0.09 電Ρ且值（X) 200912283 將反應速率與反應溫度作圖，如第5圖，可以發現反 應速率和反應溫度之間也呈現線性_ ;奴夠量的反應 物濃度條件下，隨著反應溫度的增加，所生成產物硫的濃 度亦隨之增加，亦即反錢率增加，其輕光的效應也增 加，所以電阻值增加的速率較快，所需時間較短。 其結果顯示利用光敏電阻液體濃度測量裝置在不同反 ，溫度下可以得雜準柄反應時間，在足夠量的反應物 濃度條件下，反應速率與反應溫度之⑽正向的線性關係。 本發明之彻以硫傾（CdS)為材料的光敏電阻及 以白光發光二極體為光源，將光敏電阻連接電源及三用電 表所組裝成的光敏電阻溶液濃度測量裝置用於測定化學反 應速率；在提供鹽酸或硫代硫酸鈉其中一種反應物足夠的 /辰度下，隨著另一種反應物濃度的增加，反應速率亦隨之 增加，而電阻變化平均值亦隨之增加；反之，即可由建立 電阻變化平均值對已知反應物濃度作圖所得之檢量線，隨 即可在不同條件下根據所測得的電阻變化平均值換算出反 應物的濃度或推算出其反應速率；亦即可以藉由測量未知 反應物漠度的電阻變化平均值和檢量線做内插法便可以求 得反應物濃度及反應速率；相同的，在已知反應物濃度條 件下’隨著反應溫度的增加，其達到一定電阻變化值的時 間愈短’反應速率愈快，亦可建立反應溫度與反應速率之 間的關係。 綜觀上述，利用光敏電阻來作光束測定、並利用發光 二極體為光源，且光敏電阻並連接電源及電表，以此設為 15 200912283 整體可測定化學溶液濃度之反應速率，其靈敏度高且測定 值穩定不易造成誤差，可達到測得精確之化學反應值。 如上所揭示之實施例是用以說明本創作，而非用以拘 限本創作，故舉凡數值之變更或等效元件之替換等仍應隸 屬本創作之範疇’且由以上詳細說明，可使熟知本項技藝 者得以明瞭本創作確實可達成前述目的，均已符合專利法 之規定’爰提出專利申請。 【圖式簡單說明】 第1圖係本發明之測定裝置示意圖，說明透光容器、 光源、及光敏電阻之位置關係； 第2圖係本發明第二實驗例之檢量圖； 第3圖係本發明第三實驗例之硫代硫酸鈉的反應速率 圖； 第4圖係本發明第四實驗例之鹽酸的濃度的反應速率 圖； 第5圖係本發明第五實驗例之反應速率與反應溫度比 較圖。 【主要元件符號說明】 (本發明部分） 光源2 電表4 隔絕容器6 透光容器1 光敏電阻3 電源5Reaction temperature (0〇 reaction time one (8) --------- reaction time two (S) reaction time three (8) reaction time average (8) 1 / Τ 30 50.0 50.0 57.9 52.6 0.02 40 27.0 30.1 32.2 29.8 0.03 50 15.5 15.6 17.1 16.1 ---- 0.06 60 9.6 10.7 12.7 11.0 0.09 Electric enthalpy and value (X) 200912283 The reaction rate is plotted against the reaction temperature. As shown in Figure 5, it can be found that the reaction rate and the reaction temperature also appear linear _; Under the condition of sufficient reactant concentration, as the reaction temperature increases, the concentration of sulfur produced increases, that is, the anti-money rate increases, and the effect of light light increases, so the resistance value increases faster. The time required is shorter. The result shows that the photo-resistance liquid concentration measuring device can obtain the reaction time of the pseudo-handle under different reaction temperatures, and the reaction rate and the reaction temperature are positive (10) under a sufficient amount of the reactant concentration. The linear relationship of the present invention is based on the use of a sulfur-dip (CdS)-based photoresistor and a white light-emitting diode as a light source, and the photosensitive resistor is connected to a power source and a three-meter electric meter. The concentration measuring device is used to determine the chemical reaction rate; when one of the reactants of hydrochloric acid or sodium thiosulfate is provided, the reaction rate increases as the concentration of the other reactant increases, and the average change in resistance The value is also increased; conversely, the calibration curve obtained by plotting the average value of the resistance change to the known reactant concentration can be used to convert the concentration of the reactant according to the average value of the measured resistance change under different conditions. Or to calculate the reaction rate; that is, the reactant concentration and the reaction rate can be obtained by interpolating the average value of the resistance change of the unknown reaction inversion and the calibration curve; the same, in the known reactant Under the concentration condition, the shorter the reaction time reaches the certain resistance change value, the faster the reaction rate is, and the relationship between the reaction temperature and the reaction rate can be established. And using the light-emitting diode as a light source, and the photoresistor is connected to the power source and the electric meter, thereby setting 15 200912283 overall measurable chemistry The reaction rate of the liquid concentration, the sensitivity is high, and the measured value is stable, which is not easy to cause an error, and the accurate chemical reaction value can be achieved. The embodiment disclosed above is used to illustrate the creation, and is not intended to limit the creation. Changes in numerical values or substitution of equivalent elements are still subject to the scope of this creation' and are described in detail above, so that those skilled in the art will be able to understand that the present invention can achieve the above-mentioned objectives and are in compliance with the provisions of the Patent Law.爰Proposed patent application. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a measuring device of the present invention, illustrating a positional relationship between a light-transmitting container, a light source, and a photoresistor; and FIG. 2 is a calibration chart of a second experimental example of the present invention. Fig. 3 is a graph showing the reaction rate of sodium thiosulfate in the third experimental example of the present invention; Fig. 4 is a graph showing the reaction rate of the concentration of hydrochloric acid in the fourth experimental example of the present invention; and Fig. 5 is a fifth experimental example of the present invention. The reaction rate is compared with the reaction temperature. [Description of main components] (Invention part) Light source 2 Electric meter 4 Isolated container 6 Light-transmissive container 1 Photo-resistor 3 Power supply 5
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