200908488 用範圍者。 六、 英文發明摘要：（略） 七、 指定代表圖： (一） 本案指定代表圖為：圖（3)。 (二） 本代表圖之元件符號簡單說明： 共光路結構2 雷射光源模組20 雷射光束21 微機電擺動式反射鏡30 鏡面31 中心轴32 二分之一波片（HWP ) 40 偏極分光鏡（PBS ) 50 四分之一波片（QWP ) 60 八、 本案若有化學式時，請揭示最能顯示發明特徵的化 學式：（無） 九、 發明說明： 【發明所屬之技術領域】 本發明係有關一種影像輸出裝置之入射與出射光束共 光路結構，尤指一種將雷射光源模組之雷射光束出射方向 與微機電擺動式反射鏡之鏡面中心軸安排在同一平面並呈 90度夾角，並在雷射光源模組至微機電擺動式反射鏡之間 依序設置一二分之一波片HWP，一偏極分光鏡pBS及一四 分之一波片QWP，藉以使雷射光束能以正向入射於微機電 擺動式反射鏡上，俾能以微機電擺動式反射鏡之中心轴為 200908488 對稱方式而反射掃描出射者。 【先前技術】 本發明所指之影像輸出裝置係包含如雷射投影裳置 (Laser Projector » Laser Projection display device)或雷射掃描裝置（LSU，laser scanning un i t)等應用技術；而一雷射投影裝置之主要作動原理係 利用一雷射光源以產生雷射光束，再利用光掃描構件/裝 置（light scanning element/device )如高速旋轉多面 鏡（Polygon mirror)或微機電擺動式反射鏡（micr〇 electronic mechanic system oscillating mirror ， MEMS oscillating mirror ) ’將該雷射光束掃描至投射 面上以顯示影像（scanning the emitted light beams toward the projection plane to display an image )，而目前雷射投影裝置之應用技術中已包含有 US 4, 979, 030、US 5, 920, 361、US 5, 966, 009、US 6,140,979、US 6,426,781 Bl、US 6,594 090 B2、 US 6, 945 652 B2及日本11-305710等多件專利，其係分 別針對雷射光源產生之光束性質或光掃描構件之結構作出 不同設計，藉以增進雷射投影機之使用效率如增進投影畫 面之品質等；然，就一利用微機電擺動式反射鏡作為光掃 描構件/裝置之習知雷射投影裝置1而言’參照圖1所 示，其雷射光源10發出之入射光束11係以斜向入射於一微 機電擺動式反射鏡12 ’如一個二維（2D ’或bi-axial)之 MEMS擺動式反射鏡’的反射鏡面13上’也就是該入射光束 11並不是沿著反射鏡面13之中心軸14方向入射’使入射光 束11與反射鏡面13之間形成45度或更小之夾角’致掃描形 成之出射光束15也與入射光束11之間形成90度或更大之夾 角，也造成出射光束15無法以反射鏡面13之中心軸14為對 稱方式進行掃描；而上述雷射光源10與微機電擺動式反射 200908488 鏡12之間如此的配置方式及掃描方式勢將影響投影畫面的 品質如至少會造成投影畫面的變形，也相對造成後續之光 學投影鏡片設計的困難度；如圖2所示，可發現該投影畫 面16在垂直與水平方向之不對稱的彎曲彎形（curved horizontal and vertical lines )，雖然可藉調變電子 訊號之方式修正，但相對卻會對投影畫面16的大小作些犧 牲。 又’一雷射掃描裝置（LSU，laser scanning unit)之主要作動原理係利用一光掃描構件/裝置 f) ( light scanning element/device )如高速旋轉多面鏡 (Polygon mirror)或微機電擺動式反射鏡（micr〇 electronic mechanic system oscillating mirror » MEMS oscillating mirror )，將該雷射光束掃描至成像 面（目標面）上；而利用微機電擺動式反射鏡作為光掃描 構件/裝置之雷射掃描裝置已包含US5, 408, 352、 US5,867, 297 > US6,947, 189 > US7, 190,499 > TW M253133、JP 2006-201350、US2006/0033021 等多件專 利’而上述習知技術中’其雷射光束大都是以斜向直接聚 焦入射於旋轉多面鏡或微機電擺動式反射鏡上，或先經由 反射鏡後再以斜向入射微機電擺動式反射鏡；然，雷射光 束經由微機電擺動式反射鏡反射後，其掃描角度與時間的 關係為非線性（non-1 inearity)關係’而且雷射光束以斜 向入射微機電擺動式反射鏡，也會造成出射光束之軸向偏 移，致無法以反射鏡面之中心轴為對稱方式進行掃描（如 圖1所示）；而由於上述轴向偏移會造成光點在微機電擺 動式反射鏡中心軸之左右兩侧之光點大小的不對稱，將造 成掃描之左右兩側的解析度不同。 因此’針對雷射投影裝置或雷射掃描裝置’發展一使 雷射光束能以正向入射於微機電擺動式反射鏡之鏡面上， 200908488 進而使出射光束也能以微機電擺動式反射鏡之中心軸為對 稱方式反射並掃描而出射向外，藉以避免並解決習知技術 以斜向入射於被機電擺動式反射鏡上致造成不對稱方式掃 描出射的缺點及問題’乃為本發明的主要目的；而本發明 之入射與出射光束共光路結構即是針對上述需求而加以設 計者。 【發明内容】 本發明主要目的乃在於提供一種入射與出射光束共光 路結構’供應用於如雷射投影裝置（Laser Projector)或200908488 Use range. VI. Summary of English invention: (omitted) VII. Designated representative map: (1) The representative representative of the case is: Figure (3). (2) Brief description of the symbol of the representative diagram: Common optical path structure 2 Laser light source module 20 Laser beam 21 Microelectromechanical oscillating mirror 30 Mirror 31 Central axis 32 Half wave plate (HWP) 40 Polar Spectroscope (PBS) 50 Quarter-wave plate (QWP) 60 VIII. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) IX. Description of the invention: [Technical field of invention] The invention relates to a common optical path structure of an incident and an exiting beam of an image output device, in particular, a laser beam exiting direction of a laser light source module and a mirror plane central axis of the microelectromechanical oscillating mirror are arranged at the same plane and at 90 degrees. Between the laser light source module and the microelectromechanical oscillating mirror, a half wave plate HWP, a polarizing beam splitter pBS and a quarter wave plate QWP are sequentially arranged to make the laser The beam can be incident on the microelectromechanical oscillating mirror in a forward direction, and the 出 can reflect the illuminator by the symmetry of the central axis of the MEMS oscillating mirror. [Prior Art] The image output device referred to in the present invention includes application technologies such as a Laser Projector (Laser Projection display device) or a laser scanning device (LSU); and a laser The main operating principle of the projection device is to use a laser light source to generate a laser beam, and then use a light scanning element/device such as a high-speed rotating polygon mirror or a micro-electromechanical oscillating mirror (micr) 〇electronic mechanic system oscillating mirror , MEMS oscillating mirror ) 'scanning the emitted light beams toward the projection plane to display an image , and the current application technology of the laser projection device It already includes US 4, 979, 030, US 5, 920, 361, US 5, 966, 009, US 6,140, 979, US 6,426,781 Bl, US 6,594 090 B2, US 6, 945 652 B2 and Japan 11-305710 Patent, which is designed to enhance the beam properties produced by laser sources or the structure of optical scanning components. The use efficiency of the laser projector is such as to improve the quality of the projected picture; etc.; however, in the case of the conventional laser projection apparatus 1 using the microelectromechanical oscillating mirror as the optical scanning member/device, 'refer to FIG. The incident beam 11 emitted by the laser source 10 is obliquely incident on a microelectromechanical oscillating mirror 12' such as a mirror surface 13 of a two-dimensional (2D 'or bi-axial) MEMS oscillating mirror' That is, the incident beam 11 is not incident along the central axis 14 of the mirror surface 13 'to form an angle of 45 degrees or less between the incident beam 11 and the mirror surface 13'. The outgoing beam 15 is also formed by scanning and the incident beam 11 Forming an angle of 90 degrees or more between them also causes the exiting beam 15 to be scanned in a symmetrical manner with respect to the central axis 14 of the mirror surface 13; and between the above-described laser source 10 and the microelectromechanical oscillating reflection 200908488 mirror 12 The configuration mode and scanning mode will affect the quality of the projected image, at least the deformation of the projected image, and the difficulty of designing the subsequent optical projection lens; as shown in Figure 2, it can be found Projection screen 16 in vertical and horizontal directions asymmetric curved shape of the curved (curved horizontal and vertical lines), although variable electrical signals seconded embodiment of the correction, but the relative size of the projection screen 16 but will make some sacrifice. In addition, the main operating principle of a laser scanning unit (LSU) is to use a light scanning element/device such as a high-speed rotating polygon mirror or a micro-electromechanical oscillating reflection. The MEMS oscillating mirror is used to scan the laser beam onto the imaging surface (target surface); and the laser scanning device using the microelectromechanical oscillating mirror as the optical scanning member/device has been Including US 5, 408, 352, US 5, 867, 297 > US 6,947, 189 > US 7, 190, 499 > TW M253133, JP 2006-201350, US 2006/0033021 and the like, and the above-mentioned prior art The laser beam is mostly directly incident on the rotating polygon mirror or the microelectromechanical oscillating mirror in an oblique direction, or is first obliquely incident on the MEMS oscillating mirror via the mirror; however, the laser beam passes through the MEMS After the oscillating mirror reflects, the relationship between the scanning angle and time is a non-1 inearity relationship and the laser beam is obliquely incident on the MEMS oscillating mirror. It also causes the axial shift of the outgoing beam, so that it cannot be scanned symmetrically with the central axis of the mirror surface (as shown in Figure 1); and because of the above axial shift, the spot is caused by the microelectromechanical oscillating mirror The asymmetry of the spot sizes on the left and right sides of the central axis will cause different resolutions on the left and right sides of the scan. Therefore, 'for laser projection devices or laser scanning devices', a laser beam can be incident on the mirror surface of the microelectromechanical oscillating mirror in the forward direction, and 200908488 can also make the outgoing beam also be a microelectromechanical oscillating mirror. The central axis is reflected and scanned in a symmetrical manner and exits outwards, in order to avoid and solve the disadvantages and problems of the prior art that obliquely incident on the electromechanical oscillating mirror causes asymmetric scanning and exiting. Purpose; and the incident and outgoing beam common optical path structure of the present invention is designed for the above requirements. SUMMARY OF THE INVENTION A primary object of the present invention is to provide a common optical path structure for incident and outgoing beams that is supplied for use in, for example, a Laser Projector or
雷射掃描裝置LSUClaser scanning unit)之影像輸出裝置 上，其係使一雷射光源模組所發出之雷射光束的出射方向 與一微機電擺動式反射鏡之鏡面中心軸設置在同一平面上 並呈90度夾角，且從該雷射光束的出射方向至微機電擺動 式反射鏡之間依序設置一個二分之一波片（HWP， Half-Wave Plate )，一個偏極分光鏡（PBS， Polarization Beam Splitter)，及一個四分之一波片 (QWP，Quarter-Wave Plate)，使一般佔有約 99°/。P-偏 極光之雷射光束先經由該二分之一波片HWp轉換成s_偏極 光，使其可經由該偏極分光鏡PBS反射，再經由該四分之 一波片QWP轉換成左旋圓偏極光，再以沿鏡面中心轴之正 向入射於微機電擺動式反射鏡之鏡面上，而經由該微機電 擺動式反射鏡以其中心軸對稱方式反射並掃描形成右旋圓 偏極光之出射光束，再經由該四分之一波片Qwp轉換成p_ 偏極光，使其可穿透該偏極分光鏡pBS而出射向外輸出以 影ίϊΐΐΐ 象動作’藉以使經由微機電擺動式反射 ο、之出射光束忐以微機電擺動式反射鏡之中心軸為對 二ί:避免並解決習知技術以斜向入射於 上致造成不對稱方式掃描出射的缺點 及問崎，俾有浙提昇掃财面或成㈣ 200908488 簡化後續之光學投影鏡片或光學掃描鏡片的設計，而提昇 該影像輸出裝置之使用效率及應用範圍者。The image output device of the laser scanning device LSUClaser scanning unit is configured such that the outgoing direction of the laser beam emitted by a laser light source module is disposed on the same plane as the mirror center axis of a micro electromechanical oscillating mirror and At an angle of 90 degrees, a half-wave plate (HWP, Half-Wave Plate) and a polarized beam splitter (PBS) are sequentially arranged from the exit direction of the laser beam to the microelectromechanical oscillating mirror. Polarization Beam Splitter), and a quarter-wave plate (QWP, Quarter-Wave Plate), typically occupy approximately 99°/. The P-polar laser beam is first converted into s_polarized light via the half-wave plate HWp, so that it can be reflected by the polarizing beam splitter PBS, and then converted into a left-handed rotation via the quarter-wave plate QWP. The circularly polarized light is incident on the mirror surface of the microelectromechanical oscillating mirror along the positive direction of the central axis of the mirror, and is reflected and scanned by the microelectromechanical oscillating mirror in a central axis symmetry manner to form a right-handed circularly polarized light. The outgoing beam is then converted into p_polarized light via the quarter-wave plate Qwp so that it can pass through the polarizing beam splitter pBS and exit to the external output to cause an image motion to oscillate via micro-electromechanical oscillation. The exit beam 忐 is centered on the central axis of the microelectromechanical oscillating mirror: avoids and solves the shortcomings of the conventional technique of causing an asymmetric way of scanning out and obliquely incident on the upper side, and asks for a lift. Finance or Success (4) 200908488 Simplify the design of subsequent optical projection lenses or optical scanning lenses to enhance the efficiency and application range of the image output device.
本發明另一目的乃在於提供一種影像輸出裝置之入射 與出射光束共光路結構，其係將上述共光路結構中所使用 之一個二分之一波片HWP，一個偏極分光鏡PBS及一個四 分之一波片QWP作光學膠合，使其形成一類似平玻璃的結 構體’並使其當作微機電擺動式反射鏡封裝時所使用之保 護兼隔離用平玻璃’使本發明由一二分之一波片HWP、一 偏極分光鏡PBS及一四分之一波片QWP構成之共光路結構 進一步與一微機電擺動式反射鏡組成一模組，藉以使本發 明之入射與出射光束共光路結構達成模纽化效果而增進本 發明之使用效率。 【實施方式】 為使本發明更加明確詳實’茲列舉較佳實施例並配合 下列圖示’將本發明之結構及其技術特徵詳述如後： 本發明之入射與出射光束共光路結構係供應用於如雷 射投影裝置（Laser Projector)或雷射掃描裝置 LSU(laser scanning unit)之影像輸出裝^，而一雷射 投影裝置或-雷射掃描裝置-般都彻报多相關構件組成 =達成其使用功能，以-單色雷射投影裝置為例說明， 其相關構件-般即包含有外殼體、電源裝置、雷射驅動器 (LD Driver )、微機電系統驅動器（MEMS D )、 數位信號處理引擎（DSP Engine )、單色/ 射光源 模組（LD Module )、微機電擺動式光掃插構件（mems oscillatory light scanning eleinent)等，而# 彩色 ，射投影裝置則在雷射光賴組與微機電擺構 件之間可能尚須設置前期反射鏡組；而雷射掃描 su ^雷射投影*置〆樣也是湘歸相關構件 成其 使用功能；因此’本發明所揭露之入射與出射$束共光路 200908488 :局構==:=¾ 機電擺動式反射鏡之間，並非矣、應，於雷射光源模組及微 影裝置或雷射掃描襄置就只限定之雷射投 ===鏡二相關構件而已，= 及 明’仍應落於本發明六申請專利範^擇、心以使用本發 參照圖3所示，北你士益ηη 構之光路示意圖，本發明之二i = 光路結 射亚^田向外輸出以進行投影或掃描成像等^ 本發明之入射與出射光束共光路結構2， ί:機模組20所發出雷射光束21之出射方向i 鏡30之鏡面31之中心軸32設在同-平Another object of the present invention is to provide an incident and outgoing beam common optical path structure of an image output device, which is a one-half wave plate HWP used in the common light path structure, a polarized beam splitter PBS and a fourth One-two-wave plate QWP is optically bonded to form a flat glass-like structure and is used as a protective and isolated flat glass for the microelectromechanical oscillating mirror package. The common optical path structure composed of a partial wave plate HWP, a polarization mirror PBS and a quarter wave plate QWP is further combined with a microelectromechanical oscillating mirror to form a module for the incident and outgoing beams of the present invention. The common optical path structure achieves a modulating effect and enhances the use efficiency of the present invention. [Embodiment] In order to make the present invention more clear and detailed, the present invention will be described in detail with reference to the following drawings. The structure of the present invention and its technical features are as follows: The incident and outgoing beam common optical path structure of the present invention is supplied. For image output devices such as Laser Projector or Laser Scanning Unit (LSU), a laser projection device or laser scanning device is used to report the composition of multiple related components. To achieve its use function, the monochrome laser projection device is taken as an example. The related components generally include an outer casing, a power supply device, a laser driver (LD Driver), a microelectromechanical system driver (MEMS D), and a digital signal. Processing engine (DSP Engine), monochrome / ray module (LD Module), MEMS oscillatory light scanning eleinent, etc., and # color, projecting device in the laser light The front mirror group may still need to be set between the MEMS pendulum members; and the laser scanning su ^ laser projection * is also the function of the relevant components of the Xianggui; therefore, 'this hair The exposed incident and exiting beams are common to the optical path of the system. The structure is ==:=3⁄4. Between the electromechanical oscillating mirrors, it is not the case, the laser source module and the lithography device or the laser scanning device are only The limited laser shot === mirror two related components only, = and Ming' should still fall within the six patent application of the present invention, the heart to use the present invention as shown in Figure 3, North Youshiyi ηη Schematic, the second invention i = optical path junction subfield output outward for projection or scanning imaging, etc. ^ The incident and outgoing beam common optical path structure 2 of the present invention, ί: the laser beam 21 emitted by the machine module 20 The central axis 32 of the mirror 31 of the exit mirror i is set in the same plane
U 呈9G度夾角，且從#射光_組2G或其雷射光束21 至梃機電擺動式反射鏡30之間依序設置—_ 波片 (Polarization Beam Splitter) 50及一四分之一你片 QWP (Quarter_Wave Plate) 6〇 ’其中，該二 二 g之主要功用係用以將人射光束二正交方向之偏 Ϊΐ:作相位上7"的延遲，也就是可將卜偏極光轉換成3-而S-偏極光則轉換成P—偏極光；該偏極分光鏡 (PBS ) 50之主要功用係用以分離由雷射二極體出射之雷 射光束的P-偏極光與S-偏極光成分，如圖6所示，當一雷 ，光束入射偏極分光鏡（PBS ) 50時，雷射光束的p_偏極 光可牙透’而S-偏極光則被反射；該四分之一波片 200908488 (QWP ) 60之主要功用係用以將入射光束二正交方向之偏 極光成分作相位上π/2的延遲，即可將入射的線性偏極光 轉換成圓偏極光’也就是可將Ρ-偏極光轉換成右旋圓偏極 光，而s_偏極光則轉換成左旋圓偏極光。 又該二分之一波片（HWP ) 40、偏極分光鏡（PBS ) 50及四分之一波片（QWP ) 60係依序設置於從雷射光源模 組20或其雷射光束21至微機電擺動式反射鏡3〇之間，如圖 3所示’其中，該二分之一波片（HWP ) 40係設置於雷射U is at an angle of 9G, and is arranged from #射光_组2G or its laser beam 21 to 梃electromechanical oscillating mirror 30--Polarization Beam Splitter 50 and one-quarter of your film QWP (Quarter_Wave Plate) 6〇', the main function of the two or two g is used to bias the human beam in two orthogonal directions: the delay of 7" in phase, that is, the polarization of the polar light can be converted into 3 - S-polarized light is converted into P-polarized light; the main function of the polarized beam splitter (PBS) 50 is to separate the P-polarized light and the S-bias of the laser beam emitted by the laser diode. The auroral component, as shown in Fig. 6, when a lightning beam is incident on a polarizing beam splitter (PBS) 50, the p_polar light of the laser beam is permeable to the tooth and the S-polarized light is reflected; The main function of a wave plate 200908488 (QWP) 60 is to convert the incident polar polarized light into a circularly polarized light by making the polarization of the incident beam in two orthogonal directions as a phase π/2 delay. The Ρ-polarized light can be converted into a right-handed circularly polarized light, and the s_polarized light is converted into a left-handed circularly polarized aurora. Further, the half wave plate (HWP) 40, the polarized beam splitter (PBS) 50, and the quarter wave plate (QWP) 60 are sequentially disposed on the slave laser source module 20 or its laser beam 21 Between the microelectromechanical oscillating mirrors 3〇, as shown in FIG. 3, wherein the half wave plate (HWP) 40 is disposed on the laser
光源模組20所發出雷射光束21之出射方向上並與其出射方 向正交，使雷射光束21正交入射該二分之一波片（HWP) 40 ;再而該後續排列之偏極分光鏡（pbs ) 50係設置於該 雷射光束21之出射方向與微機電擺動式反射鏡30之鏡面31 之中心軸32呈90度夾角處’並與雷射光束21之出射方向呈 45度相交’也就是偏極分光鏡（PBS ) 50與二分之一波片 (HWP ) 40之間呈45度相交’使雷射光束21正交入射該二 分之一波片（HWP) 40後可以45度入射角入射該偏極分光 鏡（PBS ) 5 0 ;最後該後續排列之四分之一波片（Qwp ) 60係設置於與由偏極分光鏡（PBS ) 50呈45度出射角反射 之雷射光束正父之位置處’也就疋四分之一波片（QWP ) 60與偏極分光鏡（PBS ) 50之間呈45度相交，也就是與微 機電擺動式反射鏡30之鏡面31之中心輛32正交或平行於微 機電擺動式反射鏡30之鏡面31 (擺動前或其平衡位置）'， 使由偏極分光鏡（PBS ) 50呈45度出射角^射之雷射光 以正交（正向）入射該微機電擺動式反射鏡3〇之鏡面31 上’也就是沿鏡面31之中心軸32入射該微機電擺動式反射 鏡30之鏡面31。 ㈣5「般而言’】由雷Hi射J雷射光束為線性偏 極先（linear polanzed light) ’ 其中同時 光及S-偏極光’但二者所佔的比例不同，—般為？偏極 200908488 光.S-偏極光= 100: 1，也就是由雷射二極體出射之雷射 光束幾乎為P-偏極光。 請同時參照圖3、4所示，其中該圖4係本發明入射 與出射光束共光路結構中之入射光路示意圖，也就是由雷 =光源模組20發出之雷射光束21入射於微機電擺動式反射 見30之光路示意圖，該雷射光束21，其包含約99%之p一偏 ，光，以正向入射該二分之一波片（Hwp ) 4〇時，可藉該 之一波片（HWP ) 40之特性而轉換成3_偏極光之雷射 ，該偏極光之雷射光束21a再以45度入射角入 〇 $偏極分光鏡（PBS ) 50時，可藉該偏極分光鏡（PBS ) 5〇之特性而以45度出射角反射；該S—偏極光之雷射光束 21a再以正向入射該四分之一波片（Qwp )⑼時，可藉該 =分之一波片（QWP) 60之特性而轉換成左旋圓偏極光之 锫射光束21b ;該左旋圓偏極光之雷射光束2ib再以正 向，也就是沿鏡面31中心軸32方向，入射於微機電擺動式 反射鏡30之鏡面31上。 請同時參照圖3、5所示，其中該圖5係本發明入射 ，出射光束共光路結構中之出射光路示意圖，也就是雷射 , ，束由微機電擺動式反射鏡30出射之光路示意圖，由於左 v 紋圓偏極光之雷射光束21b係以正向，也就是沿鏡面31中 心軸32方向，入射於微機電擺動式反射鏡3〇之鏡面31上， 因，可經由該微機電擺動式反射鏡30之鏡面31反射而形成 右旋圓偏極光之雷射光束21c，並以其中心軸32對稱方式 反射並向外掃描；該右旋圓偏極光之雷射光束21c再入射 該四分之一波片（QWP ) 60時，可藉該四分之一波片 (QWP ) 60之特性而轉換成P-偏極光之雷射光束2id，該 P:偏極光之雷射光束21d再入射偏極分光鏡（pbs ) 50 ^*，可藉該偏極分光鏡（PBS ) 50之特性而穿透該偏極分 光鏡（PBS ) 50，使該P-偏極光之雷射光束21d出射向外 200908488 影裝置而言)或掃料像動作(就 藉上述結構，使入射雷射光束21 ( N 也就是沿鏡面31之中心軸32方向，入射於=以正向， 射鏡3〇之鏡面31上，而由微機電擺動電擺動式反 2描’進而使掃描出射之雷射光鏡，行反射 電擺動式反射鏡30之中心軸32為對稱 ^ )此以微機 外，藉以避免並解決習知技術以並掃描而出 質^=提==7投影二= 描至成像面時能增進成像品質，且有=裝置而§，在掃 使用效率及應用範圍者。/而如昇該影像輸出裝置之 射鏡面31與動式反射鏡30的光學反 擺動式反射鏡30之鏡面31外方被J常在封裝時會在微 濩兼隔離作用；鑒此， j覆一平玻璃以達成保 構2所使用之-個係射與出射光束共光路結 光鏡（PB”50及：二；巧，）40, -個偏極分 合，使該三者共同組成—疋片（QH^P) 60作光學膠 ，並使該共光路紝構破鴇狀的共光路結構體 裝用之保護i隔離用以機=動式反射鏡_ 一波片（i/iFP) 4〇、一 使本發明由一二分之 一波月（w) 60共同(m)舰一四分之 微機電擺動式反射鏡3=士之共光路結構體70進一步可與 裝成一共光路模組80，藉以増進 11 200908488 本發明之使用效率。 又上述共光路結構體70或共光路模組8〇的組合設計並 非是限制的，實際製造時可視使用或製程的需要，使^分 之一波片（HWP ) 40、偏極分光鏡（PBS ) 5〇及四分之二 波片（QWP ) 60三者之間作不同的組合設計，如在二分之 一波片（HWP ) 40、偏極分光鏡（pBS ) 5〇及四分之二波 片（QWP ) 60三者中選擇其中二者如二分之一波片 4 (HWP ) 40及偏極分光鏡（PBS ) 50膠合成一體，而使四 分之一波片（QWP) 60另與微機電擺動式反射鏡3〇封震成 (' 一體，也就是使共光路結構體70及共光路模組8〇以另一種 不同的組合方式形成兩個分開的模組，此也是本發明—種 可行的組合設計。 又該微機電擺動式反射鏡30可隨雷射投影裝置或雷射 知描裝置之不同而設計成不同型態，如針對雷射投影裝、 置，可利用一個二維擺動之微機電擺動式反射鏡（2D MEMS oscillating mirror )構成，而該二維擺動之微機 電擺動式反射鏡係利用微機電（MEMS，micro electronic mechanical system )之技術製作而成，也就是内、外兩 鏡面的擺動方向是不同的，一以X軸擺動另一以γ轴擺 動’使雷射光束可掃描至投影面上並顯示出X-Y軸之投影 晝面；而如針對雷射掃描裝置，則可利用一個一維擺動之 微機電擺動式反射鏡（ID MEMS oscillating mirror)構 成丄又該微機電擺動式反射鏡係配合同步訊號以與雷射驅 動器（LD Driver )作同步動作。 >又=對彩色雷射投影裝置而言， 該三色（R紅光/G綠 ，/B藍光）雷射光源模組20可發出三道單色（R紅光/G綠 光光）雷射光束21，而該三道單色雷射光束21可先經 過一刚期反射鏡組，也就是在雷射光源模組2〇與二分之一 波片HWP40 (或共光路結構體7〇或模組8〇)之間另設置一 12 200908488 刖期反射鏡組 之雷射光束21可=^紅光/G綠光/B藍光）各別出射 片HWP40 (或此=匯整成I一光束後再入射於二分之一波 描；而該前‘3 = ^70或模組80)以進行反射及掃 縮小佈局所佔以安排各單色光路，藉以有效 化。 何積，有利於使彩色雷射投影裝置小型 是說明性的述的較佳實施例’對本發明而言僅 發明權利要求J的：u專業技術人員理解’在本 變，修改，甚神範圍内可對其進行許多改 内。 至4效變更’但都將落人本發明的保護範圍 【圖式簡單說明】 ® 1 #, S 4 圖3 圖。 圖4 圖。 圖5 擺動式反置其雷射光束以斜向入射微機電 圖。^所不雷射投妓置之掃描投影晝面立體示意 :係本發日狀射與出射Μ共光路結構之光路示意 •係圖3中人射於微機電_式反射鏡之光路示意 圖。·係® 3 t由微機電助歧射鏡㈣之光路示意 ^ 6 :係本發明人射與出射光束共祕結構中雷射 射一偏極分光鏡PBS之光路示意圖。 束 ，二供本發明入射與出射光束共光路結構與微機電擺動式 反射鏡組成一模組之結構示意圖。 【主要元件符號說明】 入射與出射光束共光路結構2 雷射光源模組20 13 200908488 雷射光束21、21a、21b、21c、21d 微機電擺動式反射鏡30 鏡面31 中心軸32 二分之一波片 HWP ( Half-Wave Plate ) 40 偏極分光鏡 PBS (Polarization Beam Splitter) 50 四分之一波片 QWP (Quarter-Wave Plate) 60 共光路結構體70 共光路模組80 14The exiting direction of the laser beam 21 emitted by the light source module 20 is orthogonal to the exit direction thereof, so that the laser beam 21 is orthogonally incident on the half wave plate (HWP) 40; and then the subsequent arrangement of the polarization splitting The mirror (pbs) 50 is disposed at an angle of 90 degrees between the exit direction of the laser beam 21 and the central axis 32 of the mirror surface 31 of the microelectromechanical oscillating mirror 30 and intersects the exit direction of the laser beam 21 at 45 degrees. 'That is, the polarized beam splitter (PBS) 50 intersects the half-wave plate (HWP) 40 at 45 degrees'. The laser beam 21 can be orthogonally incident on the half-wave plate (HWP) 40. The 45-degree incident angle is incident on the polarized beam splitter (PBS) 5 0; finally, the subsequent array of quarter-wave plates (Qwp) 60 is set at an angle of 45 degrees from the polarized beam splitter (PBS) 50. At the position of the positive beam of the laser beam, 'the quarter wave plate (QWP) 60 and the polarized beam splitter (PBS) 50 intersect at 45 degrees, that is, with the microelectromechanical oscillating mirror 30. The center 32 of the mirror 31 is orthogonal or parallel to the mirror 31 of the microelectromechanical oscillating mirror 30 (before swinging or its equilibrium position), The polarizing beam splitter (PBS) 50 is at a 45-degree angle of exit. The laser beam is incident on the mirror surface 31 of the microelectromechanical oscillating mirror 3 正交 orthogonally (forward), that is, incident along the central axis 32 of the mirror 31. The mirror 31 of the microelectromechanical oscillating mirror 30. (4) 5 "Generally speaking"] Ray Ray J beam is a linear polanzed light 'both simultaneous light and S-polarized light' but the proportion of the two is different, generally 200908488 Light.S-polarized light = 100: 1, that is, the laser beam emitted by the laser diode is almost P-polarized light. Please refer to Figures 3 and 4 at the same time, wherein Figure 4 is the incident of the present invention. A schematic diagram of an incident optical path in a common optical path structure with an outgoing beam, that is, a schematic diagram of a laser beam 21 emitted by a lightning source module 20 incident on a microelectromechanical oscillating reflection see 30, the laser beam 21 comprising about 99 When p is a partial shift, the light is converted into a 3_polar laser by the characteristics of the one-wave plate (HWP) 40 when the half-wave plate (Hwp) is positively incident. When the polarized light beam 21a of the polarized light is further incident at a 45 degree angle of incidence (PBS) 50, it can be reflected by a 45 degree exit angle by the characteristic of the polarized beam splitter (PBS) 5; When the S-polar laser beam 21a is incident on the quarter-wave plate (Qwp) (9) in the forward direction, the wave plate of the sub-wave can be borrowed. QWP) The characteristic of the 60 is converted into a left-handed circularly polarized beam of light 21b; the left-handed circularly polarized laser beam 2ib is incident on the microelectromechanical oscillating reflection in the forward direction, that is, along the central axis 32 of the mirror 31. The mirror 31 of the mirror 30 is shown in Fig. 3 and Fig. 5, wherein Fig. 5 is a schematic diagram of the exiting optical path in the incident, outgoing beam common beam path structure of the present invention, that is, laser, and the beam is oscillating by microelectromechanical The optical path of the mirror 30 is emitted, and the laser beam 21b of the left v-circular apolar light is incident on the mirror surface 31 of the microelectromechanical oscillating mirror 3 in the forward direction, that is, in the direction of the central axis 32 of the mirror 31. Therefore, the laser beam 21c of the right-handed circularly polarized light can be reflected by the mirror surface 31 of the microelectromechanical oscillating mirror 30, and is reflected symmetrically by the central axis 32 thereof and scanned outward; the right-handed circular apolar light When the laser beam 21c is incident on the quarter wave plate (QWP) 60, it can be converted into a P-polar laser beam 2id by the characteristics of the quarter wave plate (QWP) 60. Polarized laser beam 21d re-incident polarized beam splitter (pbs) 5 0 ^*, the polarized beam splitter (PBS) 50 can be used to penetrate the polarized beam splitter (PBS) 50, and the P-polarized laser beam 21d is emitted to the outward 200908488 image device) Or sweeping the image action (by the above structure, the incident laser beam 21 (N is also in the direction of the central axis 32 of the mirror 31, incident on the mirror surface 31 of the mirror 3 ,, and by the microelectromechanical The oscillating electric oscillating type 2' is further made to scan the exiting laser beam, and the central axis 32 of the line reflecting electric oscillating mirror 30 is symmetrical ^), which is used outside the microcomputer to avoid and solve the conventional technique and scan out Quality ^=提==7 Projection 2=Improve the image quality when drawing to the imaging surface, and there are = device and §, in the use efficiency and application range. / If the mirror surface 31 of the image output device and the mirror 31 of the optical anti-oscillation mirror 30 of the movable mirror 30 are externally sealed by J, they will be in isolation and isolation; A flat glass to achieve the use of the structure 2 - a line of radiation and the exit beam of the common light path junction mirror (PB "50 and: two; Qiao,) 40, a partial polarization, so that the three together - The film (QH^P) 60 is used as an optical glue, and the common optical path structure of the common optical path structure is used for protection i isolation for the machine = moving mirror _ one wave plate (i/iFP) 4 〇 一 一 一 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本The combination of the above-mentioned common light path structure 70 or the common light path module 8 is not limited, and may be used in actual manufacturing or in the process of manufacturing. Different combinations between wave plate (HWP) 40, polarized beam splitter (PBS) 5〇 and quarter-wave plate (QWP) 60 For example, one of the two-wave plate (HWP) 40, the polarized beam splitter (pBS) 5〇, and the two-quarter wave plate (QWP) 60 is selected as the two-wave plate 4 (HWP) 40 and polarized beam splitter (PBS) 50 glue integrated into one, and the quarter wave plate (QWP) 60 is additionally combined with the micro-electromechanical oscillating mirror 3 ('integrated, that is, The optical path structure 70 and the common light path module 8 形成 form two separate modules in a different combination, which is also a feasible combination design of the present invention. The micro electromechanical oscillating mirror 30 can also follow the laser. The projection device or the laser scanning device is designed to be different in shape, for example, for a laser projection device, and can be constructed by using a two-dimensional oscillating mirror (2D MEMS oscillating mirror), and the second The oscillating mirror of the oscillating oscillating mirror is made by the technology of MEMS (micro electronic mechanical system), that is, the oscillating directions of the inner and outer mirrors are different, one is oscillated by the X axis and the other is γ. Axis swing' enables the laser beam to be scanned onto the projection surface The projection surface of the XY axis is displayed; and for the laser scanning device, a one-dimensional oscillating mirror (ID MEMS oscillating mirror) can be used to form the 微 and the microelectromechanical oscillating mirror is coupled with the synchronization. The signal is synchronized with the laser driver (LD Driver). In addition, for a color laser projection device, the three-color (R red/G green, /B blue) laser light source module 20 can be issued. Three monochromatic (R red/G green) laser beams 21, and the three monochromatic laser beams 21 may first pass through a rigid mirror group, that is, in the laser source module 2 Another 12-wavelength plate HWP40 (or common optical path structure 7〇 or module 8〇) is additionally provided with a 12 200908488 雷 period mirror group of laser beam 21 = ^ red light / G green light / B blue light ) the respective exit sheet HWP40 (or this = merge into a beam of I and then incident on the half-wave trace; and the front '3 = ^70 or module 80) for the reflection and sweep reduction layout The monochromatic light path is arranged to be effective. What is advantageous in making the color laser projection apparatus small is a preferred embodiment of the description. For the present invention, only the invention of claim J is made: u, the skilled person understands that 'in this variation, modification, within the scope of the gods Many modifications can be made to it. To the effect of 4 effects, but all will fall within the scope of protection of the present invention [Simple description of the diagram] ® 1 #, S 4 Figure 3 Figure. Figure 4 Figure. Figure 5. The oscillating inverted laser beam is obliquely incident on the MEMS diagram. ^ Stereoscopic display of the scanning projection of the laser projection device: The light path of the common light path structure of the present day and the exiting light is shown in Fig. 3. The light path of the human electro-mechanical mirror is shown in Fig. 3. The system® 3 t is illustrated by the optical path of the microelectromechanical assisted spectroscope (4). ^ 6 : is a schematic diagram of the optical path of the laser and a polarized beam splitter PBS in the common structure of the injecting and outgoing beams of the present invention. The beam and the second embodiment of the present invention provide a schematic diagram of a module formed by the common optical path structure of the incident and outgoing beams and the microelectromechanical oscillating mirror. [Main component symbol description] Incident and exit beam common optical path structure 2 Laser light source module 20 13 200908488 Laser beam 21, 21a, 21b, 21c, 21d Micro electromechanical oscillating mirror 30 Mirror 31 Central axis 32 One-half Wavelet HWP (Half-Wave Plate) 40 Polarization Beam Splitter 50 Quarter-Wave Plate 60 Common Optical Path Structure 70 Common Light Path Module 80 14