TW200845011A - Systems for complete word line look ahead with efficient data latch assignment in non-volatile memory read operations - Google Patents

Systems for complete word line look ahead with efficient data latch assignment in non-volatile memory read operations Download PDF

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TW200845011A
TW200845011A TW96150645A TW96150645A TW200845011A TW 200845011 A TW200845011 A TW 200845011A TW 96150645 A TW96150645 A TW 96150645A TW 96150645 A TW96150645 A TW 96150645A TW 200845011 A TW200845011 A TW 200845011A
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Taiwan
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data
volatile storage
storage element
state
read
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TW96150645A
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Chinese (zh)
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TWI391934B (en
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Man Lung Mui
Seungpil Lee
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Sandisk Corp
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Priority claimed from US11/617,550 external-priority patent/US7616506B2/en
Priority claimed from US11/617,544 external-priority patent/US7616505B2/en
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5642Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3418Disturbance prevention or evaluation; Refreshing of disturbed memory data

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)

Abstract

Shifts in the apparent charge stored by a charge storage region such as a floating gate in a non-volatile memory cell can occur because of electrical field coupling based on charge stored by adjacent cells. To account for the shift, compensations are applied when reading. When reading a selected word line, the adjacent word line is read first and the data stored in a set of data latches for each bit line. One latch for each bit line stores an indication that the data is from the adjacent word line. The selected word line is then read with compensations based on the different states of the cells on the adjacent word line. Each sense module uses the data from the adjacent word line to select the results of sensing with the appropriate compensation for its bit line. The data from the adjacent word line is overwritten with data from the selected word line at the appropriate time and the indication updated to reflect that the latches store data from the selected word line. The efficient use of the data latches eliminates the need for separate latches to store data from the adjacent word line.

Description

200845011 九、發明說明: 【發明所屬之技術領域】 本揭示内容之具體實施例係關於非揮發記憶體技術。 交叉參照以下申請案,並將其全文以引用的方式併入本 文中:200845011 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The specific embodiments of the present disclosure relate to non-volatile memory technology. Cross-reference the following application and incorporate it in its entirety by reference:

Man Mui等人的名為”在非揮發記憶體讀取操作中以有效 率的資料閂指定使預制字元線完整(Complete Word Line Look Ahead With Efficient Data Latch Assignment in Non-Volatile Memory Read Operations)”之美國專利申請案第 _________號[代理人檔案號碼SAND-01144US0],本案在同 一天申請。 【先前技術】 半導體記憶體裝置已變得愈加流行地用於各種電子裝 置。例如,在蜂巢式電話、數位相機、個人數位助理、行 動計算裝置、非行動計算裝置及其他裝置中均用到非揮發半 導體記憶體。電可抹除可程式化唯讀記憶體(EEPROM)(包 括快閃EEPROM)與電可程式化唯讀記憶體(EPROM)均係最 流行的非揮發半導體記憶體之一。 一快閃記憶體系統之一範例使用NAND結構,其包括在 兩個選擇閘極之間串列配置的多個電晶體。該等串列電晶 體與該等選擇閘極係稱為一 NAND串。圖1係一 NAND串之 一俯視圖。圖2係其一等效電路。圖1及圖2所示之NAND串 包括在一第一選擇閘極12與一第二選擇閘極22之間串列的 四個電晶體10、12、14及16。選擇閘極12將該NAND串連 127827.doc 200845011 接至位元線端子26。選擇閘極22將該NAND串連接至源極 線端子28。選擇閘極12係藉由經由選擇線SGD施加適當電 壓至控制閘極20CG來加以控制。選擇閘極22係藉由經由 選擇線SGS施加適當電壓至控制閘極22CG來加以控制。該 等電晶體10、12、14及16之各電晶體包括一控制閘極與一 浮動閘極,從而形成一記憶體單元之該等閘極元件。例 如’電晶體10包括控制閘極10CG與浮動閘極10FG。電晶 體12包括控制閘極12CG與浮動閘極12FG。電晶體14包括 控制閘極14CG與浮動閘極14FG。電晶體16包括控制閘極 16CG與浮動閘極16FG。控制閘極10CG係連接至字元線 WL3 ’控制閘極12CG係連接至字元線WL2,控制閘極 14CG係連接至字元線wli而控制閘極16Cg係連接至字元 線 WL0。 應注意’儘管圖1及2在該NAND串中顯示四個記憶體單 元,但使用四個電晶體僅作為一範例。一 NAND串可具有 少於四個的記憶體單元或多於四個的記憶體單元。例如, 一些NAND串將會包括8個記憶體單元、16個記憶體單元、 32個記憶體單元等。本文論述不限於在一 nand串内的任 一特定數目記憶體單元。用於一使用一 NAND結構之快閃 七憶體系統的一典型架構將會包括數個NAND串。相關 NAND型快閃記憶體範例及其操作係提供於下列美國專利 案/專利申請案中,其全部内容均以引用形式併入本文·· 美國專利案第5,570,315號、美國專利案第5,774,397號、美 國專利案第6,046,935號、美國專利案第5,386,422號、美國 127827.doc 200845011 專利案第6,456,528號及美國專利申請案第〇9/893,277號(公 告案第US2003/0002348號)。依據具體實施例還可使用除 NAND快閃記憶體外的其他類型非揮發記憶體。此外,一 非傳導介電材料可取代一傳導浮動閘極以一非揮發方式來 儲存電荷。此類單元係說明於Chan等人所著的一論文中, 真正單電晶體氧化物氮化物氧化物Eeprom裝置,,, IEEE電子裝置學報,卷EDL_8,第3號,1987年3月,第% 至95頁,其全部内容係以引用形式併入本文。 當程式化一 EEPROM或快閃記憶體裝置時,一般將一程 式化電壓施加至控制閘極並將位元線接地。注入來自通道 之電子於浮動閘極内。當電子累積於浮動閘極内時,浮動 閘極變成帶負電並記憶體單元之臨限電壓升高,使得記憶 體單兀處於一程式化狀態下。單元之浮動閘極電荷及臨限 電壓可指示一對應於儲存資料之特定狀態。關於程式化之 更多資訊可見諸於2003年5月申請的美國專利申請案第 1〇/379,608號,標題為"自增壓技術”及2〇〇3年7月29曰申請 的美國申請案第10/629,068號,標題為”摘測過程式化記憶 體’’,二者全部内容均以引用形式併入本文。 儲存於一浮動閘極或其他電荷儲存區域上的表觀電荷偏 移可能因為基於相鄰浮動閘極内所儲存電荷的一電場耦合 而發生。此浮動閘極至浮動閘極耦合現象係說明於美國^ 利案第5,867,429號中,其全部内容係以引用形式併入本 文。儘管並非全部如此,但該浮動閘極至浮動閘極耦合現 象在多組不同時間程式化的相鄰記憶體單元之間極顯著地 127827.doc 200845011 例如,可能程式化—第—記憶體單元以添加對應於 夕、、、貝料的一電荷位準至其浮動閘極。隨後,程式化一或 夕個相鄰記憶體單元以添加對應於一組資料的一電荷位二 至其浮動閘極。在程式化該等相鄰記憶體單元之一或多個 =憶體單元之後,讀取自該第—記憶體單元之電荷位準可 =因為在該(等)相鄰記憶體單元上的電荷麵合至該第一記 饫體早元之效應而顯得不同於在程式化其時的電荷位準。Man Mui et al. entitled "Complete Word Line Look Ahead With Efficient Data Latch Assignment in Non-Volatile Memory Read Operations" in "Non-volatile Memory Read Operations" US Patent Application No. _________ [Agent File Number SAND-01144US0], the case was filed on the same day. [Prior Art] Semiconductor memory devices have become more and more popular for use in various electronic devices. For example, non-volatile semiconductor memory is used in cellular phones, digital cameras, personal digital assistants, mobile computing devices, non-mobile computing devices, and other devices. Electrically erasable programmable read only memory (EEPROM) (including flash EEPROM) and electrically programmable read only memory (EPROM) are among the most popular non-volatile semiconductor memories. One example of a flash memory system uses a NAND structure that includes a plurality of transistors arranged in series between two select gates. The series of electrical crystals and the select gates are referred to as a NAND string. Figure 1 is a top plan view of a NAND string. Figure 2 is an equivalent circuit thereof. The NAND string shown in Figures 1 and 2 includes four transistors 10, 12, 14 and 16 arranged in series between a first select gate 12 and a second select gate 22. Select gate 12 connects the NAND string 127827.doc 200845011 to bit line terminal 26. Select gate 22 connects the NAND string to source line terminal 28. The selection gate 12 is controlled by applying an appropriate voltage to the control gate 20CG via the selection line SGD. The selection gate 22 is controlled by applying an appropriate voltage to the control gate 22CG via the selection line SGS. Each of the transistors 10, 12, 14 and 16 includes a control gate and a floating gate to form the gate elements of a memory cell. For example, the transistor 10 includes a control gate 10CG and a floating gate 10FG. The electric crystal 12 includes a control gate 12CG and a floating gate 12FG. The transistor 14 includes a control gate 14CG and a floating gate 14FG. The transistor 16 includes a control gate 16CG and a floating gate 16FG. The control gate 10CG is connected to the word line WL3. The control gate 12CG is connected to the word line WL2, the control gate 14CG is connected to the word line wli, and the control gate 16Cg is connected to the word line WL0. It should be noted that although Figures 1 and 2 show four memory cells in the NAND string, the use of four transistors is only an example. A NAND string can have fewer than four memory cells or more than four memory cells. For example, some NAND strings will include 8 memory cells, 16 memory cells, 32 memory cells, and the like. The discussion herein is not limited to any particular number of memory cells within a nand string. A typical architecture for a flash using a NAND structure will include several NAND strings. An example of a related NAND type flash memory and its operation are provided in the following U.S. Patent/Patent Application, the entire contents of which are hereby incorporated by reference in its entirety, U.S. Patent No. 5,570,315, U.S. Patent No. 5,774,397. U.S. Patent No. 6,046,935, U.S. Patent No. 5,386,422, U.S. Patent No. 127, 827, filed No. PCT No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. Other types of non-volatile memory other than NAND flash memory can also be used in accordance with specific embodiments. In addition, a non-conductive dielectric material can be used to store charge in a non-volatile manner in place of a conductive floating gate. Such a unit is described in a paper by Chan et al., True Single Crystal Oxide Nitride Oeprom Device, IEEE Transactions on Electronics, Vol. EDL_8, No. 3, March 1987, No. To page 95, the entire contents of which are incorporated herein by reference. When programming an EEPROM or flash memory device, a programmed voltage is typically applied to the control gate and the bit line is grounded. The electrons from the channel are injected into the floating gate. When electrons accumulate in the floating gate, the floating gate becomes negatively charged and the threshold voltage of the memory cell rises, causing the memory unit to be in a stylized state. The floating gate charge and threshold voltage of the cell may indicate a particular state corresponding to the stored data. More information on stylization can be found in U.S. Patent Application Serial No. 1/379,608, filed May 2003, entitled "Self-pressurization Technology" and U.S. Application for July 29, 2003. Case No. 10/629,068, entitled "Extracted Processed Memory", both of which are incorporated herein by reference. The apparent charge offset stored on a floating gate or other charge storage region may occur due to an electric field coupling based on the charge stored in the adjacent floating gate. This floating gate-to-floating gate coupling phenomenon is described in U.S. Patent No. 5,867,429, the disclosure of which is incorporated herein by reference. Although not all, the floating gate-to-floating gate coupling phenomenon is extremely significant between sets of adjacent memory cells that are stylized at different times. 127827.doc 200845011 For example, it is possible to stylize the first-memory unit. A charge level corresponding to the eve, the, and the bake material is added to its floating gate. Subsequently, one or adjacent memory cells are programmed to add a charge bit corresponding to a set of data to its floating gate. After stylizing one or more of the adjacent memory cells, the charge level read from the first memory cell can be = because of the charge on the adjacent memory cell The effect of the face-to-face first element is different from the charge level at the time of stylization.

來自相鄰心it體單元之叙合可將讀取自_選定記憶體單元 ^表觀電荷位準偏移一足以引起錯誤讀取儲存資料之數 ° 广者記憶體單元尺寸不斷縮小,預期自然程式化及抹除 臨限電壓分佈會由於短通道效應、更大氧化物厚度/耗合 比變化及更多通道摻雜物波動而增加,從而減少相鄰狀態 之間的可用間隔。減少在字元線之間及在位元線之間的空 間也將會增加㈣浮動閘極該浮_極至浮 動閘極μ合效應係多狀態裝置不斷增長的顧慮,因為該等 允許臨限電麼範圍及該等禁止範圍(在表示不同記憶體狀 態之二不同臨限電壓範圍之間的範圍)較在二進制裝置中 更加狹乍。因此’浮動閘極至浮動閘極搞合可能導致將記 憶體單元從一允許臨限電壓範圍偏移至一禁止範圍。已提 出在讀取操作期間補償浮_合。此外,美國專利申請案 第11/09Μ49號說明一種基於在—鄰近字元線上的一相鄰 °己匕、體單元之狀態來施加不同讀取參考電屢至一選定字元 線之技術。此外,美國專射請案第11/377,972號說明一 127827.doc 200845011 種在讀取一選定記憶體單元時直接施加一補償電壓至一相 鄰記憶體單元以補償來自該相鄰記憶體單元之浮動閘極耦 合之技術。上述二專利申請案全部内容均以引用方式併入 本文。 , 【發明内容】 、 在一非揮發儲存元件内的一電荷儲存區域(例如一浮動 閘極)所儲存之表觀電荷偏移可能會因為基於相鄰單元所 _ 儲存電何的電場耦合而發生。為了解決該偏移,基於相鄰 記憶體單元可能已程式化的不同可能狀態,在讀取時施加 補鉍。當讀取一選定字元線時,先讀取相鄰字元線。將來 自相郇子元線之記憶體單元之資料儲存於用於各位元線的 來組貝料閃內。用於各位元線之—閃儲存該資料係來自相 $子線的-指示。接著讀取該選定字元線。基於該相鄰 子元線上的該等單元之不同可能狀態,在該選定字元線處 進行項取時靶加不同補償。基於用於各位元線的適當補償 釀㈣別選擇_特定感測操作之結果用於該位元線。各位元 :欠感、模、、且使用儲存於該等資料閂内用於該相鄰字元線的 來k擇該適當感測操作之結果。回應該適當感測操 ~使用來自該選定字元線之資料來覆寫來自該相鄰字元 ‘ ㉟H當覆寫該資料時,更新該指示以反映用於該位The rendition from the adjacent heart unit can shift the apparent charge level read from the selected memory unit to a number sufficient to cause erroneous reading of the stored data. The size of the memory unit is continuously reduced, and it is expected to be natural. The stylized and erased threshold voltage distribution will increase due to short channel effects, larger oxide thickness/combination ratio changes, and more channel dopant fluctuations, thereby reducing the available spacing between adjacent states. Reducing the space between the word lines and between the bit lines will also increase. (4) The floating gates of the floating _ pole to the floating gates have a growing multi-state device, because of the permissible allowable threshold. The range of the electrical and the prohibited range (the range between the two different threshold voltage ranges representing different memory states) is more narrow than in the binary device. Therefore, the 'floating gate to floating gate junction may cause the memory cell unit to be shifted from an allowable threshold voltage range to a forbidden range. It has been proposed to compensate for the float during the read operation. In addition, U.S. Patent Application Serial No. 11/09-49 describes a technique for applying different read reference times to a selected word line based on the state of an adjacent cell on a neighboring word line. In addition, U.S. Patent Application Serial No. 11/377,972, a 127,827.doc 200845011, directly applies a compensation voltage to an adjacent memory cell when reading a selected memory cell to compensate for the memory device from the adjacent memory cell. Floating gate coupling technology. The entire contents of the above-identified patent applications are hereby incorporated by reference. SUMMARY OF THE INVENTION The apparent charge offset stored in a charge storage region (eg, a floating gate) in a non-volatile storage element may occur due to the electric field coupling based on the stored energy of the adjacent cells. . To account for this offset, a complement is applied at the time of reading based on the different possible states that adjacent memory cells may have been programmed. When a selected word line is read, the adjacent word line is read first. In the future, the data of the memory unit of the self-phased sub-line is stored in the flash of the group of materials for each element line. For flash memory - flash storage This data is from the - sub-line of the $ sub-line. The selected word line is then read. Based on the different possible states of the cells on the adjacent sub-line, the target is compensated differently when the item is taken at the selected word line. Based on the appropriate compensation for each element line (4) Do not select the result of the specific sensing operation for the bit line. Each element: under-sensing, modulo, and using the data stored in the data latch for the adjacent word line to select the result of the appropriate sensing operation. Respond to appropriate sensing operations - use data from the selected word line to overwrite the adjacent character ‘ 35H when overwriting the material, update the indication to reflect the

元線的該等問規太絲+ I 在儲存來自該選定字元線之資料。因而提 供該等資料閂的一右 ,R 有政率指定,從而最小化投入補償感測 的晶片空間。 ’、體“也例中,非揮發儲存器係藉由回應-要求讀 127827.doc 200845011 取第#揮發儲存元件來讀取一第二非揮發儲存元件、 將頃取自該第二儲存元件之資料儲存於—組資料閃内並儲 存在該等問内的資料係來自該H揮發儲存元件的一第 :指示來加以讀取。接著讀取該第一非揮發儲存元件。執 行針對特疋狀態的複數個感測操作以讀取該第一非揮發 儲存元件。各感測操作對應於可能儲存於用於該第二料 元件之該等閃内的不同資料。㈣應於在該組資料閃内所 儲存之來自該第:非揮㈣存元件之資料的該等感測操作 之…特疋者期間該第_儲存元件傳導且存在該資料係來自 該第一非揮發儲存元件的指示,則使用預定資料來替換在 該組資料閃内的來自該第二儲存元件之資料。若替換來自 該第二儲存it件之資料,則使用在該組資料問内的預 料係來自該Μ -非揮發儲存元件的―第二指示來替換該 一指示。 、以 在另-具體實施例中讀取非揮發儲存器包括將來自—第 二=之-第—組非揮發儲存元件之資料儲存作為用於 一弟-字元線之-第二組非揮發财元件之—讀取操作之 部分。該第-組及該第二組係與複數個位元線通信 該資料包括將用於該第一组 子 ^ 、、且之各儲存兀件的一組資料儲左 於用於-對應位元線的一組資料閃内。使用用 態的複數個感測操作來讀取該第二組。用於該特定狀離的 各感測操作係相關聯於用於該第一組之該 : 組資料閃之各資料閃所儲存的一組潛在資料。對於= 一彳兀線通^的該第二組之一儲存元件是否在 127827.doc -11· 200845011 :^感測操作期間傳導,該衫感測操作係相關聯於在 之儲線之該組貧料問内所儲存之資料。若該第二組 來霜ΙΓ 特定感測操作期間傳導,則使用預定資科 來覆寫用於該第-組之储存元件的該組資料。 各種具體實施例可包括非揮發儲存元件及管理電 等管理電路係與該等儲存元件通信以執行各種所述程序°: 2理電路可包括諸如控制電路(例如包括一狀態機)、列 行解碼器、項取/寫入電路及/或一控制器之元 【實施方式】 '記憶體單元可用於透過操縱單元臨限電Μ來儲存以類比 或數位形式表示的資料。—記憶體單元之可能臨限電壓範 圍可劃分成多個表示不同記憶體狀態的範圍。例如,兩個 臨限電Μ範圍可用於建立兩個記憶體狀態,其係指定邏輯 1及0。-般會建立至少—電壓斷點位準’以便將記憶體單 凡之臨限電堡記憶體視窗分割成兩個範圍。當藉由施加對 應於參考臨限電壓位準之預定、固定電壓(例如讀取參考 電壓)至單元閘極來讀取單元時’係藉由比較傳導電流與 一斷點位準或參考電流來建立其源極/沒極傳導狀態。若 2電流高^參考電流位準,則決定該單元,•接通,,並處於 k輯狀釔若該電流小於該參考電流位準,則決定該單 =截止並處於其他邏輯狀態。在一 NAND型快閃記憶體 範例T,在抹除記憶體單元之後臨限電壓為負數,並定義 為邏輯1。在一程式化操作之後臨限電壓為正數,並定義 為邏輯0。當臨限電壓係負數並藉由向控制閘極施加〇 ¥來 127827.doc -12- 200845011 s 5: Μ取時,δ己憶體單元將會接通以指示正儲存邏輯 1士田臨限電壓係正數並藉由向控制閉極施加〇伏特來嘗試一 項取操作時’㊆憶體單元將不會接通以指示正儲存邏輯 -記憶體單元還可藉由利用兩個以上臨限電壓範圍表示 • 丨同°己L體狀悲來健存多位元數位資料。可將臨限電壓視 ® ^刀成所需記憶體狀態以及用以解析該等個別狀態之多 個電壓斷點位準之數目。例如,若使用四個狀態,則將會 _ 冑四個臨限電壓範圍’其表示四個不同記憶體狀態,該等 記憶體狀態係指定資料值11、10、01及00。在程式化於記 憶體早7L㈣資料與該等單i㉟⑯電壓範圍之間的特定關 係取決於該等記憶體單元所採用之資料編碼方案。例如, 在2003年6月13曰申請的美國專利第6,222,762號及美國專 利申凊案第10/461,244號"用於記憶體系統之循跡單元"說 明用於多狀態快閃記憶體單元之各種資料編碼方案,二者 全部内容均以引用形式併入本文。 鲁 圖3說明NAND串50之一範例性陣列100,例如圖!至2所 示的该等串。沿各行,一位元線27係耦合至用於行之該等 NAND串之位元線選擇閘極之一汲極端子%。沿各列 NAND串,一源極線29可連接Nand串之一區塊之該等源 ' 極線選擇閘極之所有源極端子28。 記憶體單元陣列1〇〇劃分成大量記憶體單元區塊。如快 閃EEPROM系統所共有的,區塊係抹除單位並可稱為一抹 除區塊或實體區塊。各區塊可包括一起抹除的最小數目記 憶體單元。在圖3中,一區塊(例如區塊3 〇)包括連接至_組 127827.doc •13- 200845011 共用字元線WL0至WLi的所有單元。各區塊—般劃分成若 干頁。一頁經常係一最小程式化或讀取單位,但可在一單 一操作中程式化或讀取-頁以上。可將該等個別頁劃分成 多個片段,其組合作為一基本程式化操作一次寫入的最少 數目單元…般將一或多胃資料儲存於一列記憶體單元 内。一頁可儲存一或多個資料區段’資料區段大小一般係 由一主機系統來定義。一區段包括使用者資料與管理資 料。官理資料一般包括根據區段使用者資料已經計算的一 錯誤校正碼(ECC)。控制器的一部分(如下述)在程=化資 料於陣列内時計算ECC,並在從陣列中讀取資料時檢查 ECC。或者,儲存該等ECC及/或其他管理資料在不同於其 所屬之使用者資料之該等頁或甚至不同區塊内。 一使用者資料區段通常係512個位元組,其對應於磁碟 機中常用的區段容量。管理資料一般係額外的16至2〇個位 元組。大量頁形成一區塊,不論何處均係(例如)從8頁直至 32、64或更多頁。在一些具體實施例中,一列ΝΑΝβ串包 含一區塊。 各記憶體單元區塊包括一組形成行之位元線與一組形成 列之字元線。在一具體實施例中,該等位元線係劃分成奇 位元線與偶位元線。沿著一共用字元線並連接至奇位元線 的記憶體單元係在一時間程式化,而沿著一共用字元線並 連接至偶位元線的g己憶體單元係在另一時間程式化(”奇/偶 程式化”)。在另一具體實施例中,記憶體單元係沿用於區 塊内所有位元線的一字元線來加以程式化("全部位元線程 127827.doc -14 - 200845011 式化”)。在其他具體實施例中,該等位元線或區塊可分解 成其他分組(例如左及右,兩個以上分組等)。 圖4^明一記&、體裝置11〇,其具有讀取/寫入電路用於 並行璜取及程式化一記憶體單元頁。記憶體裝置丨丨〇可包 - 括一或多個記憶體晶粒或晶片112。記憶體晶粒112包括一 • 二維記憶體單元陣列100、控制電路120及讀取/寫入電路 130A及130B。在一具體實施例中,各種周邊電路存取記 鲁憶體陣列100係在所示陣列之相對侧上以一對稱方式來加 以實施,使各侧上的存取線及電路密度減半。在其他實施 方案中,可能僅在該陣列之單侧上包括各種周邊電路。該 等讀取/寫入電路130A及130B包括多個感測區塊200,其允 許並行讀取或程式化一記憶體單元頁。記憶體陣列1〇〇可 經由列解碼器140A及140B由字元線以及經由行解碼器 142A及142B由位元線來加以定址。在一典型具體實施例 中,在與一或多個記憶體晶粒j 12相同的記憶體裝置 藝 πο(例如一可移除儲存卡或封裝)内包括一控制器144。係 經由線132在主機與控制器144之間以及經由線134在該控 制器與一或多個記憶體晶粒112之間傳送命令及資料。 控制電路120與該等讀取/寫入電路130A及130B—起協作 ‘ 以在記憶體陣列10〇上執行記憶體操作。控制電路120包括 一狀態機122、一晶片上位址解碼器124及一功率控制模組 126。狀態機122提供晶片級的記憶體操作控制。晶片上位 址解碼器124在主機或一記憶體控制器所使用的位址與該 等解碼器140A、140B、142A及142B所使用的硬體位址之 127827.doc -15- 200845011 間提供一位址介面。功率控制模組126控制在記憶體操作 期間供應至該等字元線及位元線的功率及電壓。These lines of the meta-line + I are storing data from the selected word line. Thus, a right-handed R is provided for the data latches, thereby minimizing the wafer space in which the compensation sensing is applied. In the case of a non-volatile storage device, a second non-volatile storage element is read by a response-required reading of 127827.doc 200845011 to obtain a second non-volatile storage element, which is taken from the second storage element. The data stored in the flash data of the group data and stored in the questions is read from a portion of the H volatile storage element: the reading is followed by reading the first non-volatile storage element. a plurality of sensing operations to read the first non-volatile storage element. Each sensing operation corresponds to a different data that may be stored in the flash for the second material element. (4) The data should be flashed in the group The sensing operation of the sensing device from the data of the first non-volatile (four) storage component during which the first storage element is conducted and the data is indicative of the first non-volatile storage component. Using the predetermined data to replace the data from the second storage element in the flash of the set of data. If the data from the second stored one is replaced, the expected use in the set of data is from the Μ - non-volatile Storage element a second indication to replace the one indication. To read the non-volatile storage in another embodiment comprises storing data from the -second=the-group non-volatile storage element as a - a portion of the word line - the second set of non-volatile components - the read operation. The first group and the second group communicate with a plurality of bit lines. The data includes the first group of sub And a set of data of each storage element is stored in a set of data flashes for the corresponding bit line. The second set is read using a plurality of sensing operations of the state. Each of the sensing operations associated with the first group is associated with a set of potential data stored by each of the data flashes of the group data. For the = one line of the second group Whether the storage element is conducted during the sensing operation, the shirt sensing operation is associated with the information stored in the group of lean materials in the storage line. If the second group comes Frost 传导 During conduction during a specific sensing operation, the predetermined asset is used to overwrite the storage element for the first group The set of data of the various embodiments may include non-volatile storage elements and management circuitry, such as management circuitry, in communication with the storage elements to perform various of the described procedures: The circuitry may include, for example, control circuitry (eg, including a state) [System], column row decoder, item fetch/write circuit and/or a controller element [Embodiment] 'The memory unit can be used to store data represented by analog or digital form through the control unit threshold. The possible threshold voltage range of the memory unit can be divided into a plurality of ranges representing different memory states. For example, two thresholds can be used to establish two memory states, which specify logic 1 and 0. Typically, at least a voltage breakpoint level is established to divide the memory window into two ranges by applying a predetermined, fixed voltage corresponding to the reference threshold voltage level (eg, When the reference voltage is read to the cell gate to read the cell, the source/no-pole conduction state is established by comparing the conduction current with a breakpoint level or reference current. If the current is high and the reference current level is determined, the unit is determined to be turned on, and is in the k-like state. If the current is less than the reference current level, then the single = off and in other logic states is determined. In a NAND flash memory example T, the threshold voltage is negative after erasing the memory cell and is defined as a logic one. The threshold voltage is positive after a stylized operation and is defined as a logic zero. When the threshold voltage is negative and by applying 〇¥ to the control gate 127827.doc -12- 200845011 s 5: When capturing, the δ hex element will be turned on to indicate that the logic 1 is being stored. The voltage is positive and a try is taken by applying a volt to the control closed pole. 'The seven memory cells will not turn on to indicate that the logic is being stored - the memory cell can also be utilized by using more than two threshold voltages. Scope representation • 丨 ° 己 L 体 体 体 健 健 健 健 健 健 健 健 健 健 健 健 健 健The threshold voltage can be viewed as the desired memory state and the number of voltage breakpoint levels used to resolve the individual states. For example, if four states are used, then _ 胄 four threshold voltage ranges 'which represent four different memory states, which specify data values 11, 10, 01, and 00. The specific relationship between the stylized memory 7L(4) data and the voltage range of the single i3516 depends on the data encoding scheme used by the memory cells. For example, U.S. Patent No. 6,222,762, filed on Jun. 13, 2003, and U.S. Patent Application Serial No. 10/461,244 "Tracking Unit for Memory Systems" Description for Multi-State Flash Memory Various data encoding schemes for volume units, both of which are incorporated herein by reference. Lu Figure 3 illustrates an exemplary array 100 of NAND strings 50, such as a map! The strings shown in 2 are shown. Along the rows, a bit line 27 is coupled to one of the bit line select gates of the NAND strings for the row. Along the columns of NAND strings, a source line 29 can be connected to all of the source terminals 28 of the source 'pole selection gates of one of the Nand strings. The memory cell array 1 is divided into a plurality of memory cell blocks. As is common to flash EEPROM systems, a block erase unit can be referred to as an erase block or a physical block. Each block may include a minimum number of memory cells that are erased together. In Figure 3, a block (e.g., block 3 〇) includes all cells connected to the _ group 127827.doc • 13- 200845011 shared word lines WL0 to WLi. Each block is generally divided into several pages. A page is often a minimal stylized or read unit, but can be programmed or read in more than one page in a single operation. The individual pages can be divided into a plurality of segments, the combination of which is stored as a minimum number of cells written once in a basic stylized operation. One or more gastric data is stored in a column of memory cells. A page can store one or more data segments. The data segment size is generally defined by a host system. One section includes user data and management information. The official information generally includes an error correction code (ECC) that has been calculated based on the segment user data. A portion of the controller (as described below) calculates the ECC when the data is being processed in the array and checks the ECC when reading data from the array. Alternatively, the ECC and/or other management materials are stored on such pages or even different blocks from the user data to which they belong. A user data section is typically 512 bytes, which corresponds to the segment capacity commonly used in a disk drive. Management data is typically an additional 16 to 2 bytes. A large number of pages form a block, wherever it is, for example, from 8 pages up to 32, 64 or more pages. In some embodiments, a column of ΝΑΝβ strings contains a block. Each memory cell block includes a set of bit lines forming a row and a set of word lines forming a column. In a specific embodiment, the bit line is divided into odd bit lines and even bit lines. The memory cells along a common word line and connected to the odd bit lines are stylized at one time, while the g-resonant cells along a common word line and connected to the even bit lines are in another Time stylized ("odd/even stylized"). In another embodiment, the memory cells are stylized along a word line for all bit lines within the block ("all bit threads 127827.doc -14 - 200845011"). In other embodiments, the bit lines or blocks may be decomposed into other groups (eg, left and right, more than two groups, etc.). FIG. 4 is a & The / write circuit is used to parallel capture and program a memory unit page. The memory device can include one or more memory dies or wafers 112. The memory die 112 includes a two-dimensional Memory cell array 100, control circuit 120, and read/write circuits 130A and 130B. In one embodiment, various peripheral circuit access memory arrays 100 are symmetrical on opposite sides of the array shown The manner is implemented to halve the access line and circuit density on each side. In other embodiments, various peripheral circuits may be included on only one side of the array. The read/write circuits 130A and 130B A plurality of sensing blocks 200 are included that allow for parallel reading A memory cell page is programmed. The memory array 1 can be addressed by word lines via column decoders 140A and 140B and by bit lines via row decoders 142A and 142B. In a typical embodiment, A controller 144 is included within the same memory device (eg, a removable memory card or package) as the one or more memory dies j 12 . Between the host and controller 144 via line 132 and Commands and data are transferred between the controller and one or more memory dies 112 via line 134. Control circuit 120 cooperates with the read/write circuits 130A and 130B to be in memory array 10 The memory operation is performed on the control circuit 120. The control circuit 120 includes a state machine 122, an on-chip address decoder 124, and a power control module 126. The state machine 122 provides wafer level memory operation control. The on-chip address decoder 124 is on the host. Or an address interface between a memory controller and a hardware address used by the decoders 140A, 140B, 142A, and 142B 127827.doc -15- 200845011. The power control module 126 controls In mind And power supplied to the word line voltage and the bit line of those during operation thereof.

圖5係一個別感測區塊2⑽之一方塊圖,該區塊係劃分成 一核心部分(稱為一感測模組210)與一共用部分22〇。在一 具體實施例中,存在用於各位元線的一單獨感測模組21〇 與用於一組多個感測模組21〇的一共用部分22〇。在一範例 中,一感測區塊將包括一共用部分22〇與八個感測模組 210在群組内的各感測模組將經由一資料匯流排2〇6與 相關聯共用部分進行通信。如需詳情,請參閱2〇〇4年12月 29曰申請的美國專利申請案第11/〇26,536號,標題,,共用感 測放大器集處理之非揮發記憶體及方法",其全部内容係 以引用方式併入本文。 感測模組210包含感測電路2〇4,其決定在一連接位元線 中的-傳導電流是否高於或低於m臨限位準。感測模 = 210還包括__位元、㈣2()2,其係用於在連接位元線上設 定一電壓條件。例如,鎖存於位元線閂202内的一預定狀 態將會導致將連接位元線㈣至—指定程式化禁止之狀態 (例如Vdd)。 組資料閂214與一耦 共用部分220包括一處理器212 合於該組f❹1 214與資料匯流排134之間的1/0介面、216。 ^理$212執行計算。例如’其功能之—係決定儲存於被 之測記憶體單元内的f料並將所決定資料儲存於該組資料 :内。該組資料閃214係用於儲存在一讀取 處 ㈣2所衫之資料位元。其還用於儲存在_程式^作 127827.doc -16· 200845011 期間從資料匯流排1 34匯入的資料位元。所匯入的資料位 元表示試圖程式化於記憶體内的寫入資料。1/〇介面216在 資料閂214與資料匯流排134之間提供一介面。 在讀取或感測期間,系統操作由圖4之狀態機122控制, 該狀態機控制經由字元線向已定址單元供應不同的控制閘 極電壓。隨著其逐步遍歷對應於記憶體所支援之各種記憶 體狀態的各種預定義控制閘極電壓,感測模組21〇將在該Figure 5 is a block diagram of a different sensing block 2 (10) divided into a core portion (referred to as a sensing module 210) and a shared portion 22A. In one embodiment, there is a separate sensing module 21 for each bit line and a common portion 22 for a plurality of sensing modules 21A. In an example, a sensing block includes a shared portion 22 and eight sensing modules 210. The sensing modules in the group will be connected to the associated shared portion via a data bus 2〇6. Communication. For more information, please refer to U.S. Patent Application Serial No. 11/26,536, filed December 29, 2014, title, "Non-volatile memory and method for shared sense amplifier set processing", This is incorporated herein by reference. The sensing module 210 includes a sensing circuit 2〇4 that determines whether the conduction current in a connected bit line is above or below the m threshold level. Sensing mode = 210 also includes __bit, (4) 2()2, which is used to set a voltage condition on the connected bit line. For example, a predetermined state latched in the bit line latch 202 will cause the connected bit line (4) to - to specify a stabilizing state (e.g., Vdd). The group data latch 214 and a coupling portion 220 include a processor 212 coupled to the 1/0 interface, 216 between the set of ports 214 and the data bus 134. ^ $212 performs the calculation. For example, 'the function' is to determine the material stored in the memory unit to be tested and store the determined data in the group data. This group of data flash 214 is used to store the data bits of the two shirts in one reading. It is also used to store data bits imported from the data bus 134 during the program 127827.doc -16· 200845011. The data bits that are imported represent the data that is attempted to be programmed into the memory. The 1/〇 interface 216 provides an interface between the data latch 214 and the data bus 134. During reading or sensing, system operation is controlled by state machine 122 of Figure 4, which controls the supply of different control gate voltages to the addressed cells via word lines. As it progressively traverses various predefined control gate voltages corresponding to the various memory states supported by the memory, the sensing module 21 will

些電壓之一電壓下跳脫並經由匯流排206從感測放大器21〇 向處理器212提供一輸出。此時,處理器212藉由考慮該感 測杈組之該(等)跳脫事件以及關於經由輸入線2〇8從該狀態 機施加之控制閘極電壓之資訊來決定所產生的記憶體狀 態。接著其為該記憶體狀態來計算一二進制編碼並將該等 產生資料位元儲存於資料問214内。在該核心部分之另一 具體實施例中,位元㈣2()2服務於雙重任務,同時作為 一用於鎖存感測模組210之輸出的閂並還如上述作為一位 元線閂。 資料閂堆疊214包含對應於該感測模組的一資料閂堆 璺。在-具體實施例中’每一感測模組存在一組資料 問,使得各位元線均相關聯於其自身的資_組。在各記 憶體單元内支援兩個位元資料之—具體實施例中,各位元 線存在三個資料問。在該等單元儲存三個位元資料時可使 用四個資料閃等。在一些實施方案(但非必要)中,該等資 料閃係實施為—移位暫存器,使得將儲存於其内的並行資 枓轉換成用於資料匯流排134的串列資料,反之亦然。對 127827.doc -17· 200845011 應於讀取/寫入今柊鱗时一 -起以来成區塊的所有資料問可以鍵結在 形成一區塊移位暫存器,使 入或輸出-資料區塊。特定言…取:由串列傳运來輸 適使得其資料門*項取/寫入模組庫係調 、’],,且之各貧料閂將資料依序移入/移出誃次 料匯流排,如同其係用於整個讀取/寫 5κ ^ 存器之部分。 “固-取’寫入區塊之-移位暫 般!月况下,平行操作一頁的記憶體單元。因此,—對 2數目的感測模組21G係平行操作的。在—具體實施例 卜 頁控制器(未顯示)方便地提供控制及時序信號至該 等平行操作感測模組。如需關於感測放大器⑽及其㈣ 之詳情,請參閱2005年4月5曰申請的美國專射請案序列 號11\〇99,133,標題為”非揮發記憶體之讀取操作期間的輕 合補償”’其全部内容係以引用形式併入本文。關於非揮 叙儲存裝置之各種具體實施例之結構及/或操作之額外資 訊可見諸於(1) 2004年3月25日申請的美國專利申請公告案 第2004/0057287號,'’減小源極線偏壓誤差之非揮發記憶 體及方法”,(2) 2004年6月10日公佈的美國專利申請公告 案第2004/0109357號,”改良感測之非揮發記憶體及方法,,: (3) 2004年12月16曰申請的美國專利申請案第11/〇15,199 號’標題為”用於低壓操作之改良記憶體感測電路及方法", 發明人Raul-Adrian Cernea ; (4) 2005年4月5日申請的美國 專利申請案11/099,133,標題為”在非揮發記憶體之讀取操 作期間的耦合補償’’,發明人Jian Chen ;及(5) 2005年12月 28曰申請的美國專利申請案第11/321,953號,標題為”用於 127827.doc -18 - 200845011 非揮發記憶體之參考感測放大器,,,發明人Siu Lung以抓 與Raul-Adrian Cemea。緊接上面所列專利文件之所有五 個專利文件全部内容均以引用形式併入本文。One of the voltages trips off and provides an output from the sense amplifier 21 to the processor 212 via the bus 206. At this time, the processor 212 determines the generated memory state by considering the (equivalent) trip event of the sensing group and the information about the control gate voltage applied from the state machine via the input line 2〇8. . It then calculates a binary code for the memory state and stores the generated data bits in the data query 214. In another embodiment of the core portion, bit (4) 2() 2 serves a dual task while acting as a latch for latching the output of sensing module 210 and also as a bit line latch as described above. The data latch stack 214 includes a data latch stack corresponding to the sensing module. In a particular embodiment, each sensing module has a set of data queries such that each of the meta-lines are associated with its own resource group. Two bit data are supported in each memory unit - in the specific embodiment, there are three data points for each bit line. Four data flashes can be used when storing three bit data in these units. In some embodiments, but not necessarily, the data flash is implemented as a shift register such that parallel assets stored therein are converted to serial data for data bus 134, and vice versa. Of course. 127827.doc -17· 200845011 should read/write all the data of the block from the beginning of the current scale. You can bind to form a block shift register, make or output - data Block. Specific words...take: by serial transport to make its data door* item fetch/write module library tune, '], and each of the poor material latches move data in/out out of the secondary material bus As if it were used for the entire read/write 5⁄4 memory. "Solid-fetch" write block-shift temporarily! In the case of month, parallel operation of one page of memory cells. Therefore, - 2 pairs of sensing modules 21G are operated in parallel. A page controller (not shown) conveniently provides control and timing signals to the parallel operational sensing modules. For details on the sense amplifiers (10) and (iv), please refer to the US application filed April 5, 2005. The specific application serial number 11\〇99,133, entitled "Light-compensation compensation during the reading operation of non-volatile memory", is hereby incorporated by reference in its entirety. Additional information on the structure and/or operation of the specific embodiments can be found in (1) U.S. Patent Application Publication No. 2004/0057287, filed on March 25, 2004, which is incorporated herein by reference. "Memory and Methods", (2) US Patent Application Publication No. 2004/0109357, published June 10, 2004, "Improved Sensing Nonvolatile Memory and Methods,: (3) December 16, 2004美国 US Patent Application No. 11/15, 199 "Improved memory sensing circuit and method for low voltage operation", inventor Raul-Adrian Cernea; (4) U.S. Patent Application Serial No. 11/099,133, filed on Apr. 5, 2005, entitled "In Non-volatile Memory Coupling compensation during the reading operation of the body, 'Inventor Jian Chen; and (5) US Patent Application No. 11/321,953, filed December 28, 2005, entitled "for 127827.doc - 18 - 200845011 Reference sense amplifier for non-volatile memory, inventor Siu Lung to catch with Raul-Adrian Cemea. All five patent documents of the patent documents listed above are hereby incorporated by reference in their entirety.

在一成功程式化程序結束時,該等記憶體單元之臨限電 壓適當時應處於用於已程式化記憶體單元的一或多個臨限 電壓分佈範圍内或用於已抹除記憶體單元的—臨限電壓: 佈範圍内。圖6說明在每個記憶體單元儲存兩位元資料時 用於一記憶體群組的臨限電壓分佈。圖6顯示用於抹除記 ,體單元的—第—臨限電壓分佈_用於已程式化記憶體 單元的三個臨限電壓分佈A、B&c。在一具體實施例中, E分佈中的臨限電壓係負數而在A、B&C分佈中的臨限 壓係正數。 圖6之各不同臨限電壓範圍對應於該組資料位元之預定 值。程式化於記憶體單元内的資料與單元臨限電壓位準之 間的特定關取決於該等單元所採用之資料編碼方案。在一 具體實施例中,資料值係使用一格雷碼(gray c〇de)而指定 至臨限電壓範圍,使得若一浮動閘極之臨限電壓錯誤偏移 至其相鄰實體狀態,則只會影響一位元。但在其他具體實 %例中’並不使用格雷編碼。一範例指定"丨丨„至臨限電壓 範圍E(狀態E),”10”至臨限電壓範圍a(狀態A),”〇〇”至臨 限電壓範圍B(狀態B)而,,0Γ,至臨限電壓範圍c(狀態C)。儘 官圖6顯示四狀態,但依據本揭示案之具體實施例還可與 其他二進制或多狀態結構一起使用,包括該等包括多於或 少於四個狀態的結構。 127827.doc -19· 200845011At the end of a successful stylized program, the threshold voltage of the memory cells should be within one or more threshold voltage distributions for the programmed memory cells or for the erased memory cells. - Threshold voltage: within the cloth range. Figure 6 illustrates the threshold voltage distribution for a memory group as each memory cell stores two bits of data. Figure 6 shows the -thic voltage distribution for the erased cell, the three threshold voltage distributions A, B&c for the programmed memory cells. In a specific embodiment, the threshold voltage in the E distribution is negative and the threshold pressure in the A, B & C distribution is positive. The different threshold voltage ranges of Figure 6 correspond to predetermined values for the set of data bits. The specific relationship between the data programmed into the memory unit and the cell threshold voltage level depends on the data encoding scheme used by the units. In one embodiment, the data value is assigned to the threshold voltage range using a Gray code (gray c〇de) such that if the threshold voltage of a floating gate is incorrectly offset to its neighboring entity state, then only Will affect one yuan. However, in other concrete examples, Gray coding is not used. An example specifies "丨丨 to the threshold voltage range E (state E), "10" to the threshold voltage range a (state A), "〇〇" to the threshold voltage range B (state B), 0Γ, to the threshold voltage range c (state C). The four states are shown in Figure 6, but specific embodiments in accordance with the present disclosure may also be used with other binary or multi-state structures, including more or less Structure in four states. 127827.doc -19· 200845011

圖6顯示用於從記憶體單元讀取資料的三個讀取參考電 壓Vra、Vrb及Vrc。藉由測試一給定記憶體單元之臨限電 壓是否超過或低於Vra、Vrb及Vrc,系統可決定該記憶體 單元所處之狀態。若一記憶體單元由於將vra施加至其控 制閘極而傳導,則該記憶體單元處於狀態E。若一記憶體 單元在Vrb及Vrc下傳導而在Vra下不傳導,則該記憶體單 元處於狀態A。若該記憶體單元在Vrc下傳導而在Vra及Vrb 下不傳導,則該記憶體單元處於狀態B。若記憶體單元在 Vra、Vrb或Vre下均不傳導,則該記憶體單元處於狀態c。 圖6還顯示三個驗證參考電壓Vva、Vvb及Vvc。當程式化 圮憶體單元至狀態A時,系統測試該等記憶體單元是否具 有一大於或等於Vva之臨限電壓。當程式化記憶體單元至 狀態B時,系統測試該等記憶體單元是否具有一大於或等 於Vvb之臨限電壓。當程式化記憶體單元至狀態c時,系 統測試該等記憶體單元是否具有一大於或等於Vvc之臨限 電壓。藉助非限制性範例方式,在一具體實施例中,Figure 6 shows three read reference voltages Vra, Vrb and Vrc for reading data from a memory cell. By testing whether the threshold voltage of a given memory cell is above or below Vra, Vrb, and Vrc, the system can determine the state of the memory cell. If a memory cell is conducted by applying vra to its control gate, the memory cell is in state E. If a memory cell conducts under Vrb and Vrc and does not conduct under Vra, then the memory cell is in state A. If the memory cell conducts under Vrc and does not conduct under Vra and Vrb, then the memory cell is in state B. If the memory cell is not conducting under Vra, Vrb or Vre, then the memory cell is in state c. Figure 6 also shows three verification reference voltages Vva, Vvb and Vvc. When staging the memory cells to state A, the system tests whether the memory cells have a threshold voltage greater than or equal to Vva. When the memory cells are programmed to state B, the system tests whether the memory cells have a threshold voltage greater than or equal to Vvb. When the memory cells are programmed to state c, the system tests whether the memory cells have a threshold voltage greater than or equal to Vvc. By way of non-limiting example, in a specific embodiment,

Vra=0.0 V、Vr㈣·35 v、Vrc=2 6 v、Vva=(K5 v、Vra=0.0 V, Vr (four)·35 v, Vrc=2 6 v, Vva=(K5 v,

Vvb=1.9 V及 Vvc=3.3 V。 θ 6還描ϋ王序列程式化技術。在全序列程式化中, 記憶體單元係從抹除狀態Ε直接程式化至該等程式化狀態 A Β或C之任一者。可先抹除一群欲程式化記憶體單元, 使得所有記憶體單元均處於抹除狀態£。接著將—系列程 式化電壓脈衝施加至該等選定記憶體單元之該等控制閑極 以將該等記憶體單元直接程式化成狀態A、B或C。在一些 127827.doc 200845011 記憶體單元正從狀態E程式化至狀態A時,其他記憶體單 元正從狀態E程式化至狀態b及/或從狀態E至狀態C。 圖7說明一種兩遍程式化多狀態記憶體單元之技術之一 範例’該等多狀態記憶體單元儲存二不同頁資料:一下頁 與一上頁。描述四個狀態。對於狀態E,兩頁均儲存一 1 。對於狀態A,下頁儲存一 〇而上頁儲存一丨。對於狀態 B,二頁均儲存"0”。對於狀態C,下頁儲存i而上頁儲存Vvb = 1.9 V and Vvc = 3.3 V. θ 6 also describes the king sequence stylization technique. In full sequence stylization, the memory unit is directly programmed from the erase state to any of the stylized states A or C. A group of memory cells can be erased first, so that all memory cells are erased. A series of programmable voltage pulses are then applied to the control idlers of the selected memory cells to program the memory cells directly into states A, B or C. In some 127827.doc 200845011 memory cells are being programmed from state E to state A, other memory cells are being programmed from state E to state b and/or from state E to state C. Figure 7 illustrates an example of a technique for two-pass stylized multi-state memory cells. The multi-state memory cells store two different pages of data: a page and an upper page. Describe four states. For state E, both pages store a 1 . For state A, the next page stores one and the previous page stores one. For state B, both pages store "0". For state C, the next page stores i and the previous page stores

〇。ia管各狀態係已指定特定位元模式,但可能會指定不 同的位元模式。 在第一遍程式化中,單元臨限電壓位準係根據欲程式化 於下邏輯頁内的位元來加以設定的。若該位元係一邏輯 ”1”,則因為由於更早些抹除而其正處於適當狀態,故不 改變臨限電壓。然而,若欲程式化的位元係一邏輯"0", 則單元臨限位準增加至狀態A,#箭頭25〇所示。從而結束 第一遍程式化。 隹一弟二遇程式化 丁 …思生m平你很揼欲程式 化於上邏輯頁内的位元來加以設定。若上邏輯頁位元儲存 -邏輯卜則不發生任何程式化,由於取決於下頁位元之 程式化,該單it處㈣等狀態£或A之_,二狀態均搭載 上頁位1。右上頁位元欲成為—邏輯q,則偏移臨限電 壓。若第一遍導致單元保持於抹 、 丁竹π诼除狀恶E下,則在第二遍 中’程式化該单元,使得臨限雷厭 一 使侍L限電壓增加至狀態c内,如箭 頭254所不。右早元由於第一搶兹士儿 ” ^ 式化已程式化至狀態A, 則在弟一遍中進一步程式化該記 餒早疋,使臨限電壓增 127827.doc -21 - 200845011 加至狀態B,如箭頭252所示。第二遍結果係用以將單元程 式化成指定為上頁儲存一邏輯"〇"的狀態而不改變下頁資 料。 圖8Α至8C揭示一種程式化非揮發記憶體之程序,其藉 . 由任一特定記憶體單元在相對於一特定頁寫入該特定記憶 . 體單兀之刖,先針對先前頁寫入相鄰記憶體單元來減小浮 動閘極至浮動閘極耦合。此技術可在本文中稱為最後第一 • 模式(LM)程式化。在圖8Α至8C之範例中,使用四個資料 狀態,各單元每記憶單元儲存兩位元資料。抹除狀態㈣ 存資料11,狀態A儲存資料01,狀態B儲存資料1〇,而狀 態C儲存資料〇〇。還可使用其他資料至實體資料狀態編 碼。各記憶體單元儲存二邏輯資料頁之一部分。出於參考 目的,該些頁係稱為上頁與下頁,但可給予其他標註。狀 態A係編碼以儲存位元〇用於上頁並儲存位元丨用於下頁, 狀態B係編碼以儲存位元丨用於上頁並儲存位元〇用於下 ® 頁,而狀態C係編碼以儲存位元〇用於二頁。在一字元線 WLn處記憶體單元之下頁資料係在如圖8八所示的一第一步 驟中加以程式化而帛㈣等單元之上頁係如圖8C所示在一 第一步驟中加以程式化。若下頁資料欲保留資料丨用於一 單疋,則在第一步驟期間該單元之臨限電壓仍處於狀態 E若下頁資料欲程式化至〇,則記憶體單元之臨限電壓升 咼至狀態B.。狀態B’係一中間狀態B,其具有一低於Vv_ 驗證位準Vvb*。 在一具體實施例中,在程式化記憶體單元下頁資料之 127827.doc -22- 200845011 後將會相對於其下頁來程式化在相鄰字元線WLn+〗處的 相鄰兄憶體單元。例如,在目!至3中WL2處記憶體單元之 下頁可在WL1處記憶體單元之下頁之後再加以程式化。若 程式化記憶體單元12之後記憶體單元1〇之臨限電壓從狀態 . E升咼至狀態B’,則浮動閘極耦合可能會升高記憶體單元 - 12之表觀臨限電壓。對WLn處記憶體單元的累積耦合效應 將會加寬用於該等單元之臨限電壓之表觀臨限電壓分佈, • 如圖8B所示。表觀臨限電壓分佈加寬可在程式化感興趣字 元線上頁時加以矯正,如圖8C所示。 圖8C描述程式化WLn處單元上頁之程序。若一記憶體單 元處於抹除狀恝E而其上頁位欲保持在丨,則該記憶體單元 仍處於狀態E。若該記憶體單元處於狀態£而其上頁資料欲 程式化至0,則該記憶體單元之臨限電壓會升高至用於狀 悲A之範圍内。若記憶體單元曾在一中間臨限電壓分佈b, 内而其上頁資料欲保持丨,則會程式化記憶體單元至最終 • 狀恶B。若記憶體單元在一中間臨限電壓分佈b,内而其上 頁資料欲變成資料〇 ,則記憶體單元臨限電壓會升高至用 於狀態C之範圍内。圖8八至8€:所示之程序會減小浮動閘極 耦合,因為僅相鄰記憶體單元之上頁程式化會影響一給定 5己k體單兀之表觀臨限電壓。此技術之一替代性狀態編碼 範例係在上頁資料係1時從中間狀態B,移動至狀態c,並在 上頁資料係〇時移動至狀態B。儘管圖8人至扣提供關於四 個資料狀態與兩個資料頁的一範例,但該等概念可適用於 具有多於或少於四個狀態及不同頁數的實施方案。 127827.doc -23- 200845011 圖9係-時序圖,其描述在—讀取或驗證程序疊代期間 一非揮發記憶體系統之㈣信號行為。圖9之程序之各聶 代表示用^各單元記憶體的—單—感測操作。錢等記憶 體早“糸二進制記憶體單元’則可執行圖9之程序一次。 若該等記憶體單元係具有四個狀態(例如e、A、B及。的 多狀態記憶體單元’則可針料記憶體單元執行圖9之程 序三次(三個感測操作)等。 、-般而言’在該㈣取及驗證操作期間,選定字元線係 連接至-讀取參考電壓Vegr,其位準係指定用於各讀取及 驗也操4乍,以便決定相_記憶單元之一心艮電壓是否已到 達此位準》在施加字元線電壓之後,測量記憶體單元之傳 導電流,以決定是否回應施加至該字元線之電壓來接通記 憶體單元。若測量出該傳導電流大於一特定值,則假定記 憶體單元接通且施加至該字元線之電壓大於該記憶體單元 之臨限電壓。若測量出該傳導電流不大於該特定值,則假 定該記憶體單元不接通且施加至該字元線之電壓不大於該 記憶體單元之臨限電壓。 存在許多方法以在一讀取或驗證操作期間測量一記憶體 單元之傳導電流。在一範例中,一記憶體單元之傳導電流 係根據感測放大器中的一專用電容器的放電速率來加以測 量。在另一範例中,選定記憶體單元之傳導電流允許(或 不允許)包括該記憶體單元的NAND串釋放位元線電荷。在 一段時間之後測量位元線上的電荷以查看其是否已放電。 圖 9 顯示 # 5虎 SGD、wl—unsel。WLn+1、wxn、SGS、 127827.doc -24 - 200845011Hey. Each state of the ia tube has been assigned a specific bit pattern, but different bit patterns may be specified. In the first pass of the stylization, the unit threshold voltage level is set according to the bit to be programmed in the lower logical page. If the bit is a logic "1", the threshold voltage is not changed because it is in an appropriate state due to an earlier erase. However, if the stylized bit is a logical "0", then the unit threshold is increased to state A, #arrow 25〇. This ends the first pass of stylization.隹一弟二二遇 Stylized Ding...Thinking m flat You are very eager to program the bits in the upper logical page to set. If the upper logical page bit is stored - the logical block does not have any stylization. Since it depends on the stylization of the next page bit, the single state (four) and other states or the _ of the A state, the second state is loaded with the upper page bit 1. The bit on the upper right page is to be - logical q, then offset the threshold voltage. If the first pass causes the unit to remain in the wipe, the 诼 诼 诼 状 恶 , , , , , , ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' Arrow 254 does not. As the first early squad has been programmed to state A, the program is further stylized in the first time, so that the threshold voltage is increased by 127827.doc -21 - 200845011. B, as indicated by arrow 252. The second pass is used to program the unit into a state designated to store a logical "〇" on the previous page without changing the next page. Figures 8A through 8C disclose a stylized non-volatile The program of the memory, by which any particular memory unit writes the specific memory relative to a specific page. First, the adjacent memory unit is written for the previous page to reduce the floating gate. To floating gate coupling. This technique can be referred to herein as the last first mode (LM) stylization. In the examples of Figures 8A through 8C, four data states are used, each cell storing two bits of data per memory cell. Erase status (4) Save data 11, status A stores data 01, status B stores data 1〇, and status C stores data. Other data can also be used to entity data status encoding. Each memory unit stores two logical data pages. Part of it. For reference purposes, the pages are referred to as the upper and lower pages, but other annotations may be given. State A is encoded to store the bits for the upper page and the storage is used for the next page, and state B is encoded. The storage bit 丨 is used for the upper page and the storage element 储存 is used for the lower page, and the state C is coded for storing the bit 〇 for the two pages. At the word line WLn, the page data under the memory unit is The first page in the first step shown in Fig. 8 is programmed, and the upper page of the unit is programmed in a first step as shown in Fig. 8C. If the next page of information is to retain data, it is used for one. Single-turn, the threshold voltage of the unit is still in the state E during the first step. If the next page of data is to be programmed to 〇, the threshold voltage of the memory unit is raised to the state B. The state B' is a middle State B, which has a lower than Vv_ verify level Vvb*. In one embodiment, after the 127827.doc -22-200845011 on the next page of the stylized memory unit, it will be stylized relative to its next page. An adjacent sibling cell at the adjacent word line WLn+. For example, at WL2 in the target! The page below the body unit can be programmed after the page below the memory unit at WL1. If the threshold voltage of the memory unit 1 after the memory unit 12 is programmed from state E to state B', then The floating gate coupling may increase the apparent threshold voltage of the memory cell - 12. The cumulative coupling effect on the memory cell at WLn will broaden the apparent threshold voltage distribution for the threshold voltage of the cells. • As shown in Figure 8B, the apparent threshold voltage distribution broadening can be corrected when stylizing pages on the word line of interest, as shown in Figure 8C. Figure 8C depicts the procedure for staging the upper page of the unit at WLn. A memory cell is in erased state E and its upper page bit is intended to remain at 丨, then the memory cell is still in state E. If the memory cell is in the state £ and its previous page data is to be programmed to zero, then the threshold voltage of the memory cell will rise to within the range of the case A. If the memory unit has a threshold voltage distribution b in the middle and the previous page data is to remain 丨, the memory unit will be programmed to the final shape. If the memory cell is in a middle threshold voltage distribution b and its upper page data is to become data 〇, the memory cell threshold voltage will rise to within the range of state C. Figure 8-8 to 8€: The program shown reduces the floating gate coupling because only the page stylization on the adjacent memory cells affects the apparent threshold voltage of a given 5 kb body. An alternative state coding example of this technique moves from intermediate state B to state c on the previous page dataset 1 and moves to state B on the previous page data system. Although Figure 8 provides an example of four data states and two data pages, the concepts are applicable to embodiments having more or less than four states and different page counts. 127827.doc -23- 200845011 Figure 9 is a timing diagram depicting (iv) signal behavior of a non-volatile memory system during a read or verify program iteration. Each of the processes of the program of Fig. 9 represents a single-sensing operation using the memory of each unit. If the memory such as money is “糸 binary memory unit”, the program of Figure 9 can be executed once. If the memory unit has four states (for example, multi-state memory cells of e, A, B, and . The pin memory unit performs the procedure of FIG. 9 three times (three sensing operations), etc., and generally, during the (four) fetch and verify operation, the selected word line is connected to the read reference voltage Vegr, which The level is specified for each read and test operation to determine whether the phase voltage of one of the phase memory cells has reached this level. After applying the word line voltage, the conduction current of the memory cell is measured to Determining whether to respond to a voltage applied to the word line to turn on the memory cell. If the measured conduction current is greater than a specific value, it is assumed that the memory cell is turned on and the voltage applied to the word line is greater than the memory cell The threshold voltage. If the measured conduction current is not greater than the specific value, it is assumed that the memory unit is not turned on and the voltage applied to the word line is not greater than the threshold voltage of the memory unit. There are many methods to The conduction current of a memory cell is measured during a read or verify operation. In one example, the conduction current of a memory cell is measured according to the discharge rate of a dedicated capacitor in the sense amplifier. In another example The conduction current of the selected memory cell allows (or does not allow) the NAND string including the memory cell to release the bit line charge. The charge on the bit line is measured after a period of time to see if it has been discharged. Figure 9 shows #5 Tiger SGD, wl-unsel. WLn+1, wxn, SGS, 127827.doc -24 - 200845011

Selected BL、BLCLAMP及 Source在 Vss(大約 〇伏特)開始。 SGD係汲極侧選擇閘極之閘極選擇線。SGS係源極側選擇 閘極之閘極選擇線。WLn係選擇用於讀取/驗證之字元 線。WLn+Ι係WLn汲極側相鄰字元線之未選定字元線。 WL_unsel表示除該汲極側相鄰字元線外的其他未選定字元 線。Selected BL係選擇用於讀取/驗證之位元線。Source係 用於該等記憶體單元之源極線(參見圖3)。BLCLAMP係一 類比信號,其在從該感測放大器充電時設定該位元線之 在時間tl,SGD升高至Vdd(例如大約3.5伏特),該等未 選定字元線(WL_unsel)升高至VREAD(例如大約5.5伏特), 該汲極侧相鄰字元線(WLn+Ι)升高至VREADX,該選定字元 線WLn升高至用於一讀取操作的Vcgr(例如Vra、Vrb或Vrc) 或用於一驗證操作的一驗證位準(例如Vva、Vvb或Vvc), 而BLCLAMP升高至一預充電電壓以預充電選定位元線 Selected BL (例如至大約0.7 V)。該些電壓Vread及VreadX 用作傳遞電壓,因為其引起該等未選定記憶體單元接通 (無論實體狀態或臨限狀態)並用作傳遞閘極。 在時間t2,BLCLAMP降低至Vss,故NAND串可控制位 元線。同樣在時間t2,源極側選擇閘極由於SGS (B)升高 至Vdd而接通。此點提供一用以消散位元線上電荷的路 徑。若選擇用於讀取之記憶體單元之臨限電壓大於Vcgr或 施加至選定字元線WLn之驗證位準,則該選定記憶體單元 不會接通且位元線不會放電,如信號線260所示。若選擇 127827.doc -25· 200845011 用於讀取之記憶體單元之臨限電壓小於Vcgr或小於施加至 選定字元線WLn之驗證位準,則選定用於讀界之記憶體單 元會接通(傳導)且位元線電壓會消散,如信號線262所示。 在時間t2之後及在時間t3之前的某時間點(由特定實施方 案來決定),感測放大器會決定位元線是否已消耗一足夠 數量。在t2與t3之間,BLCLAMP升高以使該感測放大器測 量所評估的BL電壓,然後降低。在時間〇,該等所示信號Selected BL, BLCLAMP, and Source start at Vss (approximately volts). The SGD system selects the gate selection line of the gate on the drain side. The source side of the SGS system selects the gate selection line of the gate. WLn selects the word line for reading/verification. WLn+ is the unselected word line of the adjacent word line of the WLn汲 side. WL_unsel indicates other unselected word lines other than the adjacent character line on the bungee side. Selected BL is the bit line selected for reading/verification. Source is the source line for these memory cells (see Figure 3). BLCLAMP is an analog signal that sets the bit line at time t1 when charging from the sense amplifier, SGD rises to Vdd (eg, approximately 3.5 volts), and the unselected word lines (WL_unsel) rise to VREAD (eg, approximately 5.5 volts), the drain side adjacent word line (WLn+Ι) is raised to VREADX, and the selected word line WLn is raised to Vcgr for a read operation (eg, Vra, Vrb, or Vrc) or a verify level (eg, Vva, Vvb, or Vvc) for a verify operation, and BLCLAMP is raised to a precharge voltage to precharge the selected bit line Selected BL (eg, to approximately 0.7 V). The voltages Vread and VreadX are used as transfer voltages because they cause the unselected memory cells to be turned "on" (either physical or threshold) and used as pass gates. At time t2, BLCLAMP is reduced to Vss, so the NAND string can control the bit line. Also at time t2, the source side selection gate is turned on due to the rise of SGS (B) to Vdd. This point provides a path for dissipating the charge on the bit line. If the threshold voltage of the memory cell for reading is greater than Vcgr or the verify level applied to the selected word line WLn, the selected memory cell will not be turned on and the bit line will not be discharged, such as a signal line. 260 is shown. If the threshold voltage of 127827.doc -25· 200845011 for reading the memory cell is less than Vcgr or less than the verify level applied to the selected word line WLn, the memory cell selected for reading will be turned on. (Conditional) and the bit line voltage will dissipate as indicated by signal line 262. After time t2 and at some point prior to time t3 (as determined by the particular implementation), the sense amplifier determines if the bit line has consumed a sufficient amount. Between t2 and t3, BLCLAMP rises to cause the sense amplifier to measure the evaluated BL voltage and then decrease. At time 〇, the signals shown

將會降低至Vss(或用於待命或回復之另一值)。應注意,在 其他具體實施例中,可改變一些信號之時序(例如偏移施 加至相鄰者之仏號)。如需進一步詳情,包括解釋藉由在 感測放大器内一專用電容器的放電速率來測量一單元傳導 電流,參見Nima Mokhlesi的美國專利申請案序列號 11/377,972 ’標題為’’用於在非揮發儲存器上執行讀取操作 之具耦合補償系統",其全部内容係以引用形式併入本 文0Will be reduced to Vss (or another value for standby or reply). It should be noted that in other embodiments, the timing of some of the signals may be changed (e.g., the offset is applied to the apostrophe of the neighbor). For further details, including an explanation of the conduction current of a unit by means of a discharge rate of a dedicated capacitor in the sense amplifier, see U.S. Patent Application Serial No. 11/377,972, to the name of N. Coupling compensation system for performing read operations on the storage", the entire contents of which are incorporated herein by reference.

如先前所述’在讀取操作期間,浮動閘極麵合可能會弓I 起錯誤。儲存在—記憶體單元之浮動閘極上之電荷可i因 為與儲存在-相鄰記憶體單元之浮動閘極或其他電荷 區(例如介電電荷儲存區)之電荷相關聯的電_合而❹ :表觀偏移。儘管理論上來自-記憶體陣列内任-記憶^ 單元之浮動閘極上電荷的I 1 · 記憶體單元之浮動閘::至該陣列内任-其他 ^ 1極,但該效應對於相鄰記憶體單 耆而値付關主。相鄰記憶體單元可能包括在相 體早兀、在相同字元線上的相鄰記憶體單 127827.doc -26 - 200845011As previously described, the floating gate face may be erroneous during a read operation. The charge stored on the floating gate of the memory cell can be due to the charge associated with the charge stored in the floating gate or other charge region of the adjacent memory cell (eg, a dielectric charge storage region). : Apparent offset. Although theoretically derived from the floating gate of the I 1 · memory cell of the charge on the floating gate of the - memory cell in the memory array: to any other - 1 pole in the array, the effect is for adjacent memory Single and pay for the Lord. Adjacent memory cells may be included in adjacent memory cells on the same word line as the phase 127827.doc -26 - 200845011

合而有效地耦合至該目標記憶體單元,從 於一相鄰記憶體單元 部分將會透過電場耦 ’從而造成該目標記 憶體單元之臨限電壓之一表觀偏移。在程式化之後,一記 憶體單元之表觀臨限電壓可在程式化之後偏移至一程度, 使得在希望程式化記憶體狀態下預期用於—記憶體單:的 施加讀取參考電壓下,其不會接通與截止(傳導)。Coupled effectively to the target memory cell, an adjacent memory cell portion will pass through the electric field coupling to cause an apparent shift in the threshold voltage of the target memory cell. After stylization, the apparent threshold voltage of a memory cell can be shifted to a degree after stylization, so that it is expected to be used for the read-only reference voltage of the memory bank in the desired memory state. , it will not turn on and off (conduction).

元線(WL1、WL2、WL3等)依序進行程式化,使得在完成 前面字元線(WLn)程式化(將該等字元線之各單元置於其最 終狀態)之後,將至少一資料頁程式化於一相鄰字元線 (WLn+1)内。此程式化模式由於浮動閘極耦合而造成程式 化後記憶體單元的一臨限電壓表觀偏移。對於除了 — NAND串之最後字元線外的每一欲程式化字元線,在完成 感興趣字元線之程式化之後會程式化一相鄰字元線。添加 至相鄰、稍後程式化字元線上之記憶體單元之浮動閘極之 負電荷會升高感興趣字元線上的記憶體單元之表觀臨限電 壓。程式化還可開始於與汲極側選擇閘極相鄰之字元線並 127827.doc •27- 200845011 依次向源極側選擇閘極推進。在此情況下,浮動閘極搞合 可能類似地影響記憶體單元之表觀臨限電壓。 圖ίο圖形解釋浮動閘極耦合之概念。圖10描述在相同 NAND串上的相鄰浮動閘極302與304。浮動閘極M2及3〇4 位於NAND通道/基板306上方,該NAND通道/基板具有源 極/汲極區308、3 10及312。在浮動閘極302上方的係連接 至字元線WLn的控制閘極314。在浮動閘極3〇4上方的係連 接至字元線WLn+Ι的控制閘極316。在一些情況下,該等 控制閘極形成該等字元線,而在其他情況下,單獨形成該 等字元並接著連接至該等控制閘極。儘管浮動閘極3〇2可 月匕文到來自多個其他浮動閘極之耦合的影響,但對於簡 化’圖10僅顯示來自一相鄰記憶體單元之效應。圖1〇顯示 三個耗合分量,其係從浮動閘極斯相鄰者提供至該浮動 間極·· H、以及Cr°分量rl係相鄰浮動閘極(302盘3〇4)之 間的搞合比,並作為該等相鄰浮動閘極之電容除以浮動閘 極3 02至其周圍所有盆他雷 卜 男八他電極之所有電容性耦合之和來加 以計异。分量r2係相鄰浮動M ▲ $木3 02與沒極侧相鄰控制閘 極3 16之間的耦合比,並作 > _ 並作為汗動閘極302與控制閘極316 之電谷除以洋動閘極3 〇2至复月 — /、周圍所有其他電極之所右雷 谷性竊合之和來加以計算。八旦 栳&、办私 刀里^係控制閘極耦合比率並 作為?于動閘極304與:i:斟座—〇 ”對應控制閘極316之 動閘極搬至其周圍所有 〗的u除以汙 加以計算。 八電極之所有電容耦合之和來 圖11顯示在程式化—列 氐體早元(例如WLn)之相鄰列 127827.doc -28- 200845011 (WLn+l)之前(實曲線)與之後(虛曲線)該列記憶體單元之表 觀臨限電壓分佈。各分佈係由於添加負電荷至相鄰字元線 之該等記憶體單元之浮動閘極而加寬。因為浮動閘極耦 合,在WLn+Ι上的一稍後程式化記憶體單元之負電荷將會 升高在連接至相同位元線之WLn上的一記憶體單元之表觀 臨限電壓。分佈320及322分別表示在程式化相鄰字元線 WLn+Ι之前及之後在狀態A下的一選定字元線WLn之單 元。分佈324及326分別表示在程式化WLn+Ι之前及之後在 狀態B下的WLn之單元。分佈328及330分別表示在程式化 WLn+Ι之後在狀態C下的WLn之單元。因為該等分佈被加 寬,故可能錯誤地讀取記憶體單元為在一相鄰狀態下。在 各分佈上端的記憶體單元可能具有在一對應讀取比較點上 方之一表觀臨限電壓。例如,在施加參考電壓Vrb時,程 式化至狀態A之特定記憶體單元可能因為其表觀臨限電壓 偏移而無法充分傳導。該些單元可能錯誤地讀取為在狀態 B,從而引起讀取錯誤。該稍後程式化單元還可影響連接 至不同位元線之WLn記憶體單元(諸如連接至相鄰位元線 之該等記憶體單元)的表觀臨限電壓。 圖12圖形描述可用於解決圖11所示之一些臨限電壓表觀 偏移之一讀取技術。當讀取在字元線WLn上的資料時,還 可讀取字元線WLn+Ι之資料且若在字元線WLn+Ι上的資料 已干擾在WLn上的資料,則用於WLn之讀取程序可補償該 干擾。可決定在字元線WLn+Ι處該等記憶體單元之狀態或 電荷位準,以便選擇適當讀取參考電壓用於讀取字元線 127827.doc -29- 200845011 WLn之個別記憶體單元。 描述基於字元線WLn+1處一相鄰記憶體單元之狀態來讀 取WLn的個別讀取參考電壓。一般而言,可使用至正規讀 取參考電壓Vra、Vrb、Vrc之不同偏移(例如〇 V、ο,〗v、 0·2 V、0·3 V)。在不同偏移下的感測結果係作為在一相鄰 字元線上的一記憶體單元之狀態的一函數來加以選擇。在 字元線WLn處的該等記憶體單元係使用包括該等不同偏移 的該等不同讀取參考電壓之各讀取參考電壓來加以感測。 對於一給定記憶體單元,在該等讀取參考電壓之一適當者 下的感測結果可基於在字元線冒^+丨處的一相鄰記憶體單 元之狀態來加以選擇。 當讀取字元線WLn+Ι時,可使用該等讀取參考電壓 Vra Vrb及Vrc。在其他具體實施例中,可在WLn+i處施 加不同的讀取參考電壓。在一些具體實施例中,用於 WLn+Ι的讀取操作決定在WLn+1處所儲存的實際資料。在 其他具體實施财,用於WLn+1之讀取操作僅決定該些單 兀之電荷位準’該等電荷位準可能精確或可能不精確地反 映在WLn+Ι處所儲存的資料。在一些具體實施例中,用於 頃取WLn+Ι之該等位準及/或位準數目可能並不與用於讀 取WLn之該等位準及/或位準數目完全相同。在一些實施 方案中’洋動閘極臨限值之某近似值可能足以用於·校 正目的。在—具體實施例中,在WLn+Ι處的讀取結果可儲 存於在各位元線處的問214内,以在讀取心時使用。 感興趣字元線WLn係在正規讀取參考電壓位準、Vrb 127827.doc •30- 200845011 及Vrc下來加以讀取,不補償任何耦合效應。將在該等正 規參考位準下的讀取結果儲存於過去決定WLn+Ι處相鄰單 元處於狀態E之記憶體單元之位元線的該等閂内。對於其 他位元線,忽略資料。使用該等讀取參考電壓之一第一組 偏移來在字元線WLn處執行另一讀取操作。例如,該讀取 程序可使用 Vral (Vra+0.1 V)、Vrbl (Vrb+0.1 V)及 Vrcl (Vrc+0.1 V)。儲存使用該些參考值之結果用於冒1^+1處相 鄰記憶體單元處於狀態A之記憶體單元之位元線内。忽略 用於其他位元線之資料。使用讀取參考位準Vra2 (Vra+0.2 V)、Vrb2 (Vrb + 0.2 V)及Vrc2 (Vrc+0.2 V),在一第二組偏 移下再次讀取字元線WLn。儲存該等結果用於用於WLn+1 處相鄰單元處於狀態B之記憶體單元之位元線之閂内。忽 略用於其他位元線之資料。使用參考位準Vra3 (Vra+0.3 V)、Vi*b3 (Vrb+0.3 V)及 Vrc3 (Vrc+0.3 V),在一第三組偏 移下,對字元線WLn執行一最終讀取。儲存該等結果用於 在WLn+Ι處相鄰單元處於狀態C之記憶體單元之該等位元 線。在一些具體實施例方案中,因為在狀態E與狀態A之 間的更大自然邊界,在Vra不使用任何偏移。此類具體實 施例如圖12所示,其中在狀態A位準下描述一單一讀取參 考電壓Vra。其他具體實施例還可使用用於此位準之偏 移。圖12之程序可用於復原資料或用作一初始讀取程序。 該等正規讀取參考電壓之不同偏移可選擇作為在相鄰字 元線上一記憶體單元之狀態之一函數。例如,一組偏移值 可包括一 0 V偏移,其對應於在狀態E的一相鄰單元、一 127827.doc -31 - 200845011 0.1 V偏移,其對應於在狀態A的一相鄰單元、一〇2 V偏 移,其對應於在狀態B的一相鄰單元、及—〇3 v偏移,其 對應於在狀態d相鄰單元。該等偏移值會依據實施方 案而變化。在-具體實施例中,該等偏移值等於由於一相 鄰單元程式化至-對應狀態所產生之表觀臨限電壓偏移數 量。例如,0.3 V可表示在程式化WLn之後將在乳⑷的一 相鄰單元程式化至狀態C時在WLn的—單元的表觀臨限 壓偏移。該等偏移值不-㈣於每—參考電壓均相同。例 如,用於該Vrb參考電壓之該等偏移值可能係〇 v、〇丨v、 〇·2 V及G.3 V’而用於該Vre參考電壓之該等偏移可能係〇 V、0.15 V、0.25 V及〇.35 V。此外,偏移增量不一定對於 每-狀態均相同。例如,在一具體實施例中的一組偏移可 分別包括0 V、(Μ V、0.3 V及0.4 v用於在狀態E、A、B及 C之相鄰單元。 另一種用以補償浮動閘極耦合之技術提供補償相鄰一選 定記憶體單元之一記憶體單元,以便減小該相鄰記憶體單 兀在該選定記憶體單元上的耦合效應。一此類具體實施例 包括在驗證程序期間設定稍後施加相鄰記憶體單元補償之 所而條件。在此類具體實施例中,將施加至WLn+〗之傳遞 電壓(又稱為vREAD)從施加至各其他選定字元線的一典型值 (例如)6 V減小至(例如)3 V。比較在程式化/驗證操作之驗 證階段期間所使用之電壓,該補償由在WLn上執行的讀取 操作期間施加一更高電壓至WLn+1所組成。該補償可包括 全化/差里· △VreadIEVreaM在讀取WLn期間的 127827.doc -32- 200845011 WLn+l)]-[VREAD(在驗證WLn期間的WLn+l)]}。在驗證期 間使用一較低VREAD值的優點在於,允許稍後在讀取操作 期間施加合理的V READ 值,同時維持所需AV READ ° 若非在 驗證期間使用小於正常VREAD值的值,允許施加足夠 AVread的在讀取期間的必要Vread值將會係(例如)6 + 3 =9 V,其將會係一可能引起讀取干擾條件的較大電壓。此類 稍後補償設定的一範例在圖9中描述為施加VREADX至汲極 侧相鄰字元線,同時其他未選定字元線接收VREAD。一般 情況下,所有未選定字元線均會接收VREAD。在圖9之具體 實施例中,除了汲極侧相鄰者外,所有未選定字元線均會 接收VreAD ’同時〉及極側相鄰者均會接收VreAdX。 對於從源極側至汲極侧程式化記憶體單元之驗證程序, (在一具體實施例中)保證在寫入字元線WLn時,在字元線 WLn+Ι上的所有記憶體單元均處於抹除狀態(例如狀態 E)(應注意:此對於全序列係真實的,但對於LM非如此。 請參閱上述解釋)。字元線WLn+Ι將會接收一電壓位準 VreadX ,其中VreadX=VreadLA(E)(如下述)。在一具體實 施例中,VreadLA(E)等於3.7 V。在另一具體實施例中, VreadX=Vread。在其他具體實施例中’遷可使用其他值。 在不同實施方案中,可基於裝置特性、實驗及/或模擬來 決定不同VreadLA(E)或VREADX值。 在一具體實施例中,所需補償AVread之數量可根據如下 來計算: 127827.doc -33- 200845011 AVread = (AVTn +1)---- 1 + r2 + (rl)(Cr)The meta-lines (WL1, WL2, WL3, etc.) are sequentially programmed such that at least one data is obtained after the previous word line (WLn) is programmed (the cells of the word lines are placed in their final state) The page is stylized within an adjacent word line (WLn+1). This stylized mode causes an apparent voltage shift of the memory cell after the staging due to the floating gate coupling. For each character line to be programmed except for the last word line of the NAND string, an adjacent word line is programmed after completion of the stylization of the word line of interest. The negative charge added to the floating gate of the memory cell on the adjacent, later stylized word line increases the apparent threshold voltage of the memory cell on the word line of interest. Stylization can also begin with the word line adjacent to the gate on the drain side and 127827.doc •27- 200845011 Select the gate advance to the source side in turn. In this case, the floating gates may similarly affect the apparent threshold voltage of the memory cells. Figure ίο graphics explain the concept of floating gate coupling. Figure 10 depicts adjacent floating gates 302 and 304 on the same NAND string. Floating gates M2 and 3〇4 are located above NAND channel/substrate 306 having source/drain regions 308, 3 10 and 312. The system above the floating gate 302 is connected to the control gate 314 of the word line WLn. Connected above the floating gate 3〇4 is connected to the control gate 316 of the word line WLn+1. In some cases, the control gates form the word lines, and in other cases, the characters are formed separately and then connected to the control gates. Although the floating gate 3〇2 can affect the coupling from a plurality of other floating gates, the effect from a neighboring memory cell is shown for simplicity. Figure 1A shows three consumable components, which are provided from the floating gates neighbors to the floating interpoles ··H, and the Cr° component rl is between the adjacent floating gates (302 discs 3〇4) The ratio is calculated as the sum of the capacitances of the adjacent floating gates divided by the sum of all capacitive couplings of the floating gates 03 to all of the pots and their electrodes around them. The component r2 is the coupling ratio between the adjacent floating M ▲ $木3 02 and the non-polar side adjacent control gate 3 16 , and is used as the > _ and as the sweat gate 302 and the control gate 316 Calculated by the sum of the right-handed thumps of the oceanic gate 3 〇 2 to the moon - /, all other electrodes around.八 栳 amp &, private knife ^ system control gate coupling ratio and as? The sum of the capacitive couplings of the eight electrodes and the :i: 斟座-〇" corresponding to the control gate 316 are moved to the surrounding u and are divided by the dirt. The sum of all the capacitive couplings of the eight electrodes is shown in Figure 11. Stylized—the adjacent column of the column memory element (eg WLn) 127827.doc -28- 200845011 (WLn+l) before (solid curve) and after (dashed curve) the apparent threshold voltage of the column memory cell Distribution. Each distribution is widened by the addition of a negative charge to the floating gates of the memory cells of adjacent word lines. Because of the floating gate coupling, a later stylized memory cell on WLn+Ι The negative charge will raise the apparent threshold voltage of a memory cell connected to WLn of the same bit line. Distributions 320 and 322 represent the state before and after the stylized adjacent word line WLn+Ι, respectively. A unit of selected character line WLn under A. Distributions 324 and 326 represent the units of WLn in state B before and after stylized WLn+1, respectively. Distributions 328 and 330 represent after stylized WLn+Ι, respectively. The unit of WLn in state C. Because the distribution is widened, it may be erroneously Taking the memory unit in an adjacent state, the memory unit at the upper end of each distribution may have an apparent threshold voltage above a corresponding read comparison point. For example, when the reference voltage Vrb is applied, it is programmed to The particular memory cell of state A may not be sufficiently conductive due to its apparent threshold voltage offset. These cells may be erroneously read as being in state B, causing a read error. The later stylized unit may also affect Apparent threshold voltages connected to WLn memory cells of different bit lines, such as those connected to adjacent bit lines. Figure 12 is a graphical depiction of some of the threshold voltages shown in Figure 11. One of the apparent offset reading techniques. When reading the data on the word line WLn, the data of the word line WLn+Ι can also be read and if the data on the word line WLn+Ι has interfered with The data on WLn is used by the WLn read program to compensate for the interference. The state or charge level of the memory cells at the word line WLn+Ι can be determined to select the appropriate read reference voltage for reading. Take the word line 127827.doc -29- 200845 011 WLn individual memory cell. Describes the individual read reference voltage of WLn read based on the state of an adjacent memory cell at word line WLn+1. In general, the normal read reference voltage Vra, Different offsets of Vrb and Vrc (for example, 〇V, ο, νv, 0·2 V, 0·3 V). The sensing results at different offsets are used as a memory on an adjacent word line. The functions of the cells are selected as a function of the state of the cells. The memory cells at the word line WLn are sensed using respective read reference voltages of the different read reference voltages including the different offsets. For a given memory cell, the result of sensing at one of the read reference voltages can be selected based on the state of an adjacent memory cell at the word line. The read reference voltages Vra Vrb and Vrc can be used when reading the word line WLn+1. In other embodiments, different read reference voltages can be applied at WLn+i. In some embodiments, the read operation for WLn+1 determines the actual data stored at WLn+1. In other implementations, the read operation for WLn+1 only determines the charge level of the individual's. These charge levels may or may not accurately reflect the data stored at WLn+Ι. In some embodiments, the number of levels and/or levels used to take WLn+Ι may not be exactly the same as the number of levels and/or levels used to read WLn. In some embodiments, an approximation of the oceanic threshold may be sufficient for correction purposes. In a particular embodiment, the read result at WLn+Ι can be stored in question 214 at each bit line for use in reading the heart. The interest word line WLn is read at the normal read reference voltage level, Vrb 127827.doc • 30- 200845011 and Vrc, without compensating for any coupling effects. The read results at the normal reference levels are stored in the latches that have previously determined that the adjacent cells in WLn+Ι are in the bit line of the memory cell of state E. For other bit lines, the data is ignored. Another read operation is performed at word line WLn using one of the read reference voltages, the first set of offsets. For example, the reader can use Vral (Vra+0.1 V), Vrbl (Vrb+0.1 V), and Vrcl (Vrc+0.1 V). The result of storing the reference values is used to store the bit line of the memory cell in which the adjacent memory cell is in state A at 1^+1. Ignore data for other bit lines. The word line WLn is read again under a second set of offsets using the read reference levels Vra2 (Vra+0.2 V), Vrb2 (Vrb + 0.2 V), and Vrc2 (Vrc+0.2 V). The results are stored for use in the latch of the bit line of the memory cell where the adjacent cell at WLn+1 is in state B. Ignore the information used for other bit lines. Using the reference levels Vra3 (Vra+0.3 V), Vi*b3 (Vrb+0.3 V), and Vrc3 (Vrc+0.3 V), a final read is performed on the word line WLn under a third set of offsets. The results are stored for the bit line of the memory cell where the adjacent cell is in state C at WLn+Ι. In some embodiments, no offset is used at Vra because of the greater natural boundary between state E and state A. Such a specific implementation is shown, for example, in Figure 12, in which a single read reference voltage Vra is described under state A level. Other embodiments may also use offsets for this level. The program of Figure 12 can be used to restore data or as an initial read program. The different offsets of the normal read reference voltages can be selected as a function of the state of a memory cell on adjacent word lines. For example, a set of offset values may include a 0 V offset, which corresponds to an adjacent unit in state E, a 127827.doc -31 - 200845011 0.1 V offset, which corresponds to an adjacent in state A The cell, a 2 V offset, which corresponds to an adjacent cell in state B, and a -3 v offset, which corresponds to a neighboring cell in state d. These offset values will vary depending on the implementation. In a particular embodiment, the offset values are equal to the number of apparent threshold voltage offsets resulting from the stylization of a neighboring unit to a corresponding state. For example, 0.3 V may represent the apparent threshold voltage offset of the cell at WLn when a neighboring cell of milk (4) is programmed to state C after staging WLn. The offset values are not - (4) and the reference voltages are the same. For example, the offset values for the Vrb reference voltage may be 〇v, 〇丨v, 〇·2 V, and G.3 V', and the offsets for the Vre reference voltage may be 〇V, 0.15 V, 0.25 V, and 〇.35 V. In addition, the offset increments are not necessarily the same for every - state. For example, a set of offsets in a particular embodiment may include 0 V, (Μ V, 0.3 V, and 0.4 v for adjacent cells in states E, A, B, and C. The other is used to compensate for floating The gate coupling technique provides for compensating for a memory cell adjacent to a selected memory cell to reduce the coupling effect of the adjacent memory cell on the selected memory cell. One such embodiment includes verification The condition for applying the adjacent memory cell compensation later is set during the program. In such a specific embodiment, the transfer voltage (also referred to as vREAD) applied to WLn+ is applied from one of the other selected word lines. A typical value (for example) 6 V is reduced to, for example, 3 V. The voltage used during the verification phase of the stylization/verification operation is compared, which is applied by a higher voltage during the read operation performed on WLn. WLn+1 consists of. This compensation can include full/difference ΔVreadIEVreaM during reading WLn 127827.doc -32- 200845011 WLn+l)]-[VREAD (WLn+l during verification of WLn)] }. The advantage of using a lower VREAD value during verification is that it allows a reasonable V READ value to be applied later during the read operation while maintaining the desired AV READ °. If not using a value less than the normal VREAD value during verification, allow enough The necessary Vread value for AVread during reading will be, for example, 6 + 3 = 9 V, which will be a large voltage that may cause read disturb conditions. An example of such a later compensation setting is depicted in Figure 9 as applying VREADX to the drain side adjacent word line while other unselected word lines receive VREAD. In general, all unselected word lines will receive VREAD. In the particular embodiment of Figure 9, all unselected word lines will receive VreAD ' except for the neighbors on the drain side, while the neighbors on the extreme side will receive VreAdX. For the verification procedure from the source side to the drain side stylized memory cell, (in one embodiment) it is guaranteed that all memory cells on the word line WLn+Ι are written when the word line WLn is written. In erased state (eg state E) (note: this is true for the full sequence, but not for LM. See above for explanation). The word line WLn+1 will receive a voltage level VreadX, where VreadX = VreadLA(E) (as described below). In a specific embodiment, VreadLA(E) is equal to 3.7V. In another embodiment, VreadX = Vread. Other values may be used in other embodiments. In various embodiments, different VreadLA(E) or VREADX values can be determined based on device characteristics, experimentation, and/or simulation. In a specific embodiment, the amount of compensation AVread required can be calculated as follows: 127827.doc -33- 200845011 AVread = (AVTn +1)---- 1 + r2 + (rl)(Cr)

其中ΔνΤη+l係在程式化/驗證WLn時間與當前時間之間 的汲極侧相鄰記憶體單元之臨限電壓變化。AVTn+l及1*1 係此方法所減輕之字元線至字元線寄生編合之根本原因。 AV RE AD係用以抵制此效應之補償。 圖13係說明此類補償技術之一實施方案之一流程圖。圖 1 3所示之程序適用於上面相對於圖6所述之全序列程式 化,其中一邏輯頁之二位元係儲存於各單元内並一起讀取 並報告。圖13還可用以讀取依據圖7或圖8 A至8C之技術所 儲存之二資料頁。在步驟350,執行一用於相鄰字元線 WLn+1之讀取操作。此操作可包括施加正規讀取參考電壓 Vra、Vrb及Vrc至相鄰字元線。當讀取WLn+Ι時其他具體 實施例可使用不同參考電壓。使用在不同位準下的感測結 果來決定儲存於WLn+Ι處各單元内的資料。在步驟352處 儲存該等結果。 在步驟354,針對感興趣字元線WLn,執行一讀取操 作。此操作可包括使用VreadX=VreadLA(C)(圖9)來執行圖 9之程序。在一具體實施例中,VreadLA(C)=Vread。因 而,所有未選定字元線(參見圖9之WL—unsel及WLn+Ι)均 接收VREAD。此點提供最大補償,由於補償係藉由在讀取 操作期間現在用於WLn+Ι上之VREAD值與在程式化/驗證之 驗證階段期間更早些所使用之VREAD值之間的差異來加以 決定。補償值compC可按如下決定:compC=VREADLA(C)- 127827.doc -34- 200845011Where ΔνΤη+l is the threshold voltage change of the adjacent memory cells on the drain side between the WLn time and the current time. AVTn+l and 1*1 are the root causes of the parasitic compilation of the word line to word line reduced by this method. AV RE AD is used to counteract the compensation of this effect. Figure 13 is a flow chart illustrating one of the embodiments of such a compensation technique. The program shown in Fig. 13 is applicable to the full sequence programming described above with respect to Fig. 6, in which the two bits of a logical page are stored in each unit and read and reported together. Figure 13 can also be used to read two pages of data stored in accordance with the techniques of Figure 7 or Figures 8 through 8C. At step 350, a read operation for the adjacent word line WLn+1 is performed. This operation may include applying regular read reference voltages Vra, Vrb, and Vrc to adjacent word lines. Other embodiments may use different reference voltages when reading WLn+Ι. Sensing results at different levels are used to determine the data stored in each unit at WLn+Ι. The results are stored at step 352. At step 354, a read operation is performed for the word line of interest WLn. This operation may include performing the procedure of Figure 9 using VreadX = VreadLA (C) (Figure 9). In a specific embodiment, VreadLA(C) = Vread. Therefore, all unselected word lines (see WL-unsel and WLn+Ι in Figure 9) receive VREAD. This point provides maximum compensation because the compensation is due to the difference between the VREAD value currently used for WLn+Ι during the read operation and the VREAD value used earlier during the verification phase of the stylization/verification. Decide. The compensation value compC can be determined as follows: compC=VREADLA(C)- 127827.doc -34- 200845011

VreadP=5.5-3=2.5 V,其中VREADp係在程式化/驗證期間所 使用的VREAD值。步驟354之該等結果係在步驟356儲存於 WLn+Ι處相鄰單元過去決定處於狀態C(在步驟350)之記憶 體單元之位元線之資料閂内。因此,最大補償CompC係用 . 於其汲極側相鄰者由於從狀態E程式化至狀態C而經歷最高 臨限電壓變化之單元。應注意,該些沒極側相鄰者在WLn 之程式化/驗證期間過去處於狀態E,但現在處於狀態c。 φ 在所有情形下所需補償的係在WLn寫入時間與WLn當前讀 取時間之間所經歷的WLn+1上没極側相鄰者狀態變化。對 於其他汲極側相鄰者目前未偵測到處於狀態C之位元線, 忽略在WLn+1上使用VreadLA(C)之此WLn讀取之資料。 在步驟358,在汲極側相鄰字元線WLn+Ι接收VreadLA(B) (VreadX=VreadLA(B))時’針對WLn執行一讀取操作;其中 比較VreadLA(C) ’ VreadLA(B)值更靠近在程式化驗證期間 所使用的VREADp。遞送一適用於汲極側相鄰者現處於狀態B _ 之單元的更小補償。一補償範例係compB=VREADLA(;B)-VreadP = 5.5-3 = 2.5 V, where VREADp is the VREAD value used during stylization/verification. The results of step 354 are stored in the data latch of the bit line of the memory cell of state C (at step 350) that was previously stored at WLn+Ι in step 356. Therefore, the maximum compensation CompC is used for units whose top-side neighbors experience the highest threshold voltage change due to staging from state E to state C. It should be noted that these immersed neighbors were in state E during the stylization/verification of WLn, but are now in state c. The required compensation for φ in all cases is the change in the state of the infinite-side neighbor on the WLn+1 experienced between the WLn write time and the current read time of WLn. For the other bungee side neighbors, the bit line in state C is not currently detected, and the data read by this WLn using VreadLA(C) on WLn+1 is ignored. At step 358, a read operation is performed for WLn when the drain side adjacent word line WLn+1 receives VreadLA(B) (VreadX=VreadLA(B)); wherein VreadLA(C) 'VreadLA(B) is compared The value is closer to the VREADp used during stylized verification. Delivering a smaller compensation for the unit on the bungee side that is now in state B_. A compensation example is compB=VREADLA(;B)-

VreadP=4.9-3 = 1.9 V。因而 ’ VreadLA(B)與 VREADp 相差 compB。在步驟360,儲存步驟358之該等結果用於在 WLn+1處相鄰記憶體單元處於狀態B之記憶體單元之位元 ^ 線。忽略用於其他位元線之資料。 在步驟362,針對字元線WLn+Ι接收VreadLA(A)之WLn 執行一讀取程序。(VreadX=VreadLA(A)),其中比較 VreadLA(B),VreadLA(A)值更靠近在程式化期間所使用 之VREADp。遞送一適用於汲極側相鄰者現處於狀態A之單 127827.doc -35- 200845011 元的更小補償數量。一補償數量範例係compA=VREADLA(A)-VreadP=4.3-3=1_3 V。因而 ’ VreadLA(A)與 VreadP 相差 compA。在步驟364,儲存步驟362之該等結果用於在 WLn+Ι處相鄰記憶體單元處於狀態A之記憶體單元之位元 線。忽略用於其他位元線之資料。 在步驟366,針對字元線WLn+Ι接收VreadLA(E) (VreadX=VreadLA(E))之WLn執行一讀取程序,其中 VreadLA(E)與在程式化期間所使用之VREADp值相等。此不 遞送任何適合於汲極側相鄰者現在處於狀態E之單元之補 償,由於其係在程式化/驗證時間。此補償數量係 compE=VREADLA(E)-VREADp=3-3 = 0.0 V。在步驟 368,儲存 步驟366之該等結果用於在WLn+Ι處相鄰記憶體單元處於 狀態E之記憶體單元之位元線。忽略用於其他位元線之資 料。在圖13之程序期間,相鄰位元線將會接收四個電壓。 然而,讀取中的WLn之各選定記憶體單元僅在一對應於其 在WLn+Ι處相鄰單元之狀態的適當電壓下感測時利用或選 擇該等結果。在不同實施方案中,可基於裝置特性、實驗 及/或模擬來決定不同VreadLA(C)、VreadLA(B)、 ^^人〇1^(八)及\^八〇1^八(£)值。如需關於圖13之技術之更多 資訊,請參閱Nima Mokhlesi的美國專利申請案第 1 1/384,057號,標題為”具耦合補償之非揮發儲存器之讀取 操作",其全部内容係以引用形式併入本文。 在關於上述技術二者所述之非揮發記憶體讀取操作期間 補償浮動閘極耦合效應要求在一選定字元線WLn讀取操作 127827.doc -36 - 200845011 期間存取讀取ό 丄上 貝取自一相鄰字元線WLn+1之資料。本質上,讀 料.、、、電路(例如13〇A、130B)需要在決定WLn内儲存資 广』門存取字70線WLn+i資料。此可能向記憶體設計者 T挑戰’特別係在嘗試最小化專用於一特定補償技術 曰曰片二間時。考量具有儲存兩個位元資料之記憶體單元 A 。己1"體裝置。若來自相鄰字元線WLn+Ι之資料在選定VreadP=4.9-3 = 1.9 V. Thus 'VreadLA(B) differs from VREADp by compB. In step 360, the results of the storage step 358 are used for the bit line of the memory cell where the adjacent memory cell is in state B at WLn+1. Ignore data for other bit lines. At step 362, a read procedure is performed for WLn of word line WLn+1 receiving VreadLA(A). (VreadX = VreadLA(A)), where VreadLA(B) is compared, the VreadLA(A) value is closer to the VREADp used during the stylization. Deliver a smaller amount of compensation for the 汲 127827.doc -35- 200845011 yuan for the neighbors on the bungee side. An example of the amount of compensation is compA=VREADLA(A)-VreadP=4.3-3=1_3 V. Thus 'VreadLA(A) differs from VreadP by compA. In step 364, the results of the storage step 362 are used for the bit line of the memory cell where the adjacent memory cells are in state A at WLn+Ι. Ignore data for other bit lines. At step 366, a read routine is executed for WLn that receives VreadLA(E) (VreadX = VreadLA(E)) for word line WLn+1, where VreadLA(E) is equal to the VREADp value used during stylization. This does not deliver any compensation that is suitable for the unit on the bungee side that is now in state E, since it is tied to the stylization/verification time. The number of compensations is compE=VREADLA(E)-VREADp=3-3 = 0.0 V. In step 368, the results of the storage step 366 are used for the bit line of the memory cell where the adjacent memory cells are in state E at WLn+Ι. Ignore the information used for other bit lines. During the procedure of Figure 13, adjacent bit lines will receive four voltages. However, each selected memory cell of the WLn being read utilizes or selects the results only when sensing at an appropriate voltage corresponding to the state of its adjacent cell at WLn+Ι. In various embodiments, different VreadLA(C), VreadLA(B), ^^人〇1^(eight), and \^八〇1^八(£) values may be determined based on device characteristics, experiments, and/or simulations. . For more information on the technique of Figure 13, please refer to U.S. Patent Application Serial No. 1 1/384,057 to Nima Mokhlesi, entitled "Read Operation of Non-volatile Storage with Coupling Compensation", the entire contents of which is This is incorporated herein by reference. Compensating the floating gate coupling effect during non-volatile memory read operations described in relation to both of the above techniques requires that a selected word line WLn be read during operation 127827.doc -36 - 200845011 Take reading ό 丄 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上Take the word 70 line WLn+i data. This may challenge the memory designer T's especially when trying to minimize the use of a specific compensation technology chip. Consider the memory unit that stores two bits of data. A. 1" body device. If the data from the adjacent word line WLn+Ι is selected

=線WUl讀取操作期間可用’-設計者可選擇包括足夠 貝料門以便在一讀取操作期間將來自字元線|!^+1及字 元士 WLn之資料同時儲存於選定字元線處。若各記憶 -單元儲存兩位元資料,則每一位元線必需四個資料閂。 兩個資料閃可儲存來自字元線WLn+1的兩位元資料而另兩 個資㈣可儲存來自字元線WLn的兩位元資料。類似地, 三個額外問可用於三位元裝置,四個額外閃用於四個位元 裝置等。冑管此技術較有&,但針對每單元儲麵位元數 目在各位7L線處添加資料暫存器可能由於空間限制而在一 些實施方案中無法接受。 圖14係說明一種依據一具體實施例讀取一選定字元線 WLn之方法之-流程圖。此範例係針對每單元儲存兩位元 資料之一四狀態裝置而呈現。在狀態A位準(在狀態£與八 之間)、狀態B位準(在狀態A與B之間)及狀態c位準(在狀態 B與C之間)執行各記憶體單元之感測。在各位準感測時提 供補償以說明在隨後程式化字元線翟!^+1處該等相鄰記憶 體單元之四個潛在狀態之各狀態。 為了為各記憶體單元選擇適當感測操作結果,在感測 127827.doc -37 - 200845011 WLn處對應單元時,儲存關於字元線WLn+l上相鄰記憶體 單元之^ 5孔用於各位元線。用於位元線之處理器將會使用 該資訊來選擇該等適當感測操作結果。用於各位元線的資 料閂組負責儲存讀取自選定字元線之一記憶體單元之資 料。用於各位元線的相同資料閂組還將會儲存關於相鄰該 選定子兀線之字元線之一記憶體單元的資訊。用於各位元 線的額外資料閂作為一旗標操作,儲存一關於該等資料 • 閂疋否正在儲存用於該選定字元線或該相鄰字元線之資料 之指示。 因而,圖14中的技術有效率地利用用於各位元線的該等 資料閃,使得不必使用一額外組問來儲存來自相鄰字元線 WLn=之資料。在圖14之範例中,該等記憶體單元儲存兩 位兀貧料,故使用三個資料閂。圖14呈現一範例性具體實 施例。應明白,該等揭示原理可延伸至每單元具有:同數 目位元(例如3、4或更多)的實施方案。一般而言,各位元 • 線所需的資料閃數目等於各個別記憶體單元所儲存之位元 數目多一。為了識別目前儲存資料起源之目的,利用_ = 一額外閂。 在圖14中,標註DL0及Du之二資料閃係用於各位元線 • 以儲存讀取自對應位元線之記憶體單元之資料。一標註 DL2之弟二資料問係用以儲存旅# — , 诚仔旗钻,其指不目前儲存於 資料閃D L 〇及D L1内的資料是否對應於來自選定字元線 WLn之資料或該資料疋否對應於來自相鄰該選定字元線之 字元線WLn+1之資料。 127827.doc -38· 200845011 在步驟400,該讀取操作開始於讀取相鄰字元線 WLn+Ι。可在三個正常參考位準Vra、Vrb及Vrc下讀取該 相鄰字元線,如圖12所示。在一具體實施例中在讀取 WLn+Ι時不施加任何補償。在步驟402決定該相鄰字元線 之該等記憶體單元之資料值。在步驟404,將字元線 WLn+1處各位元線之記憶體單元的資料值儲存於位元線的 一組對應資料閂DL0及DL1内。在步驟406,將用於各位元 線的第三資料閃DL2設定至邏輯0以指示在資料閃DL0及 DL1内的資料對應於來自WLn+Ι處一記憶體單元的資料。 在步驟408至422,針對該選定字元線WLn執行在狀態A 位準(在狀態E與A之間)的一群組子讀取。在步驟408的第 一子讀取不提供任何補償用以解決浮動閘極耦合。例如, 若利用圖12所示之一偏移讀取參考電壓補償技術,則步驟 408可包括施加讀取參考電壓Vra至選定字元線而不使用一 偏移。若利用圖13所示之一補償技術,則在WLn處感測時將 在WLn程式化驗證期間施加至WLn+Ι之相同讀取傳遞電壓 VreadP 再次施加至 WLn+Ι。例如’可將 VreadLA(E)=VreadP 施加至WLn+1,將VREAD施加至各剩餘未選定字元線,並 將Vra施加選定字元線WLn。 在步驟410,各位元線之處理器決定是否要更新用於該 位元線之該等資料閂。對於在步驟408之子讀取期間選定 字元線之記憶體單元不傳導的位元線,處理器不改變儲存 於該等資料閂内的任何值。對於記憶體單元傳導的位元 線,處理器決定資料閂DL0及DL1是否目前儲存對應於狀 127827.doc -39- 200845011 態E之資料。例如,若使用圖6之資料指定,則處理器決定 該等閃是否正同時儲存一邏輯1。若該等問並未正儲存邏 輯11,則該處理器不改變在該等資料閂内的該等值。若二 閂正在儲存11,則該處理器決定第三資料閂DL2是否正在 儲存一邏輯〇。一邏輯0指示閂DL0及DL1正儲存來自 WLn+1之資料且應被覆寫。在一具體實施例中,該處理器 可先檢查閃DL2且在DL2正儲存一邏輯0時僅檢查閃DL0及 DL1。若對於一傳導記憶體單元滿足二條件,則將DL0及 DL1設定至用於抹除狀態的預定資料值。將第三資料閂 DL2設定至1以指示DL0及DL1現在正儲存資料用於資料線 WLn。在DL2内的一邏輯1排除在隨後子讀取期間覆寫閂 DL0及 DL1。 在步驟412,執行另一狀態A子讀取。此時,施加一補 償,其對應於程式化至狀態A的WLn+1處相鄰記憶體單 元。例如,可使用包括圖12所示之一 Vra偏移之Vral。在 另一具體實施例中,可將VreadLA(A)施加至WLn+1而將 Vra施加至WLn。 在各位元線處的處理器執行另一邏輯序列以決定是否要 更新用於具有一傳導記憶體單元之位元線之閂。若DL0及 DL1並未儲存用於狀態A之資料(例如10),則不採取任何動 作。若其正儲存,則處理器決定DL2是否正儲存一 0以指 示目前儲存WLn+Ι資料。若將DL設定至0,則處理器使用 用於狀態E之資料來覆寫DL0及DL1。該處理器將DL2設定 至1以指示該等閂現在儲存來自WLn之資料。 127827.doc -40- 200845011 在步驟416,在WLn執行一狀態A子讀取,同時施加基於 程式化至狀態B的WLn+1處單元的一補償。對於傳導記憶 體單元,對應位元線處理器決定DL0及DL1是否正儲存對 應於狀態B之資料(例如00)。若否,則不採取任何動作。 若是,則該處理器決定DL2是否正儲存邏輯0。若否,.則 不採取任何進一步動作。若DL2係設定至0,則使用用於 狀態E之預定資料來覆寫DL0及DL1並將DL2設定至1以指 0 示該等閂正在儲存來自WLn之資料。 在步驟420,執行在狀態A位準的一最終子讀取。施加基 於處於狀態C的WLn+Ι處相鄰單元的一補償。對於傳導記 憶體單元,對應位元線處理器決定該等閂是否正儲存用於 狀態1之資料(例如01)。若DL2係設定至2,則不採取任何 動作。若DL2係設定至0,則處理器決定DL2是否正儲存 0。若否,則不採取任何進一步動作。若是,則該處理器 使用用於狀態E之預定資料來覆寫DL0及DL1並將DL2設定 • 至1。 在步驟424至444,針對字元線WLn,執行在狀態B位準 的一子讀取序列。在步驟424的一初始子讀取不提供任何 ^ 浮動閘極耦合補償。此子讀取結果可適用於該等在WLn+Ι處 - 相鄰單元處於抹除狀態E的單元。步驟424可包括施加Vrb至 WLn,同時施加一 VREAD值至WLn+Ι,該值等於在用於WLn 之程式化驗證期間所使用之值(例如VreadLA(E)=VreadP)。 對於傳導記憶體單元,對應處理器決定用於位元線之DL0 及DL1是否正儲存用於狀態E之資料。此步驟檢查以決定 127827.doc • 41 200845011 在WLn感測的電流是否係應為該單元儲存資料之電流。若 DL0及DL1不對應於狀態E,貝不採取任何動作。若DL0及 DL1對於狀態E匹配,則處理器決定DL2正儲存邏輯0以指 示在DL0及DL1内的資料係用於WLn+Ι而不用於選定字元 線WLn。若DL2係設定至1,則該處理器不覆寫在DL0及 DL1内的資料。邏輯1指示該DL0及DL1資料係來自WLn, 因而不應加以覆寫。若DL2係設定至0,則在步驟426,該 處理器使用用於目前組子讀取的資料來覆寫在DL0及DL1 内的資料。在此情況下,該處理器將DL0及DL1設定至狀 態A資料(例如10)。該處理器還將DL2設定至1以指示DL0 及DL1現在正儲存來自選定字元線WLn之資料且不應在 WLn處的隨後子讀取期間加以覆寫。 在步驟428,在字元線WLn處執行一狀態B子讀取,同時 基於在WLn+Ι處處於狀態A之相鄰單元來施加一補償。在 一具體實施例中,將Vrbl施加至WLn。在另一具體實施例 中,將Vrb施加至WLn,同時將VreadLA(A)施加至 WLn+Ι。對於傳導記憶體單元,用於對應位元線之處理器 決定DL0及DL1是否正儲存用於狀態A之資料。若否,則不 採取任何動作。若是,則該處理器決定DL2是否正儲存邏 輯0。若否,則不對該位元線採取任何進一步動作。若 是,則該處理器使用對應於狀態A之資料來覆寫在DL0及 DL1内的資料。該處理器還將DL2設定至邏輯1。 在步驟432,讀取WLn,同時施加一補償用於在WLn+1 處的一相鄰單元處於狀態B之記憶體單元。若一記憶體單 127827.doc -42- 200845011 元傳導,則用於對應位元線之處理器決定用於該位元線之 DL0及DL1是否正共用狀態B資料(例如00)。若是,則該處 理器決定在DL0及DL2内的資料是否來自WLn (DL2=1)或 WLn+1 (DL2=0)。若該資料係來自WLn+1,則該處理器使 用用於狀態A之預定資料來覆寫DL0及DL1。該處理器還將 DL2設定至邏輯1。若不滿足任一條件,則該處理器不會 改變DL0至D12之内容。 • 在步驟436,在字元線WLn處執行一狀態B子讀取,同時 基於處於狀態C的WLn+Ι處相鄰單元來施加一補償。對於 傳導記憶體單元,處理器決定DL0及DL1是否正儲存用於 狀態C之資料(例如〇 1)。若否,則不採取任何動作。若 是,則該處理器決定DL2是否正儲存邏輯〇。若否’則不 採取任何動作。若是,則該處理器使用用於狀態A之資料 來覆寫在DL0及DL1内的資料並將DL2設定至邏輯1。 步驟440至456在狀態C讀取參考電壓位準下執行一組子 馨讀取。在步驟440執行一第一子讀取,其不包括任何浮動 閘極耦合補償。在一具體實施例中,可將Vrc施加WLn, 同時將VreadLA(E)施加至WXn+1。對於傳導記憶體單元’ ’ 對應位元線處理器決定閂DL0及DL1是否儲存用於狀態E之 * 資料。若否,則在該位元線處不採取任何動作。若是,則 該處理器決定DL2是否正儲存邏輯〇。若否,則由於該等 資料閂共用用於WLn之資料,故不會改變該等資料閃。若 DL2係設定至〇,則對應處理器使用對應於狀態B之資料 (例如00)來覆寫在DL0及DL1内的資料。該處理器還將DL2 127827.doc -43- 200845011 設定至1以指示DL0及DL1正儲存WLn資料。 在步驟444,執行一狀態C子讀取,同時施加基於處於狀 態A之相鄰單元的一補償。可在WLn施加Vrcl或將 VreadLA(A)施加至WLn+1 ’同時在WLn+1施加Vrc。對於 傳導單元,位元線處理器決定DL0及DL1是否正儲存用於 狀態A之資料。若否,則不採取任何動作。若是,則該處 理器決定DL2是否正儲存邏輯0。若否,則不採取任何動 0 作。若是,則該處理器使用用於狀態B之資料來覆寫閂 DL0及DL1並將DL2設定至邏輯1。 在步驟448,執行一狀態C子讀取,同時施加一補償用於 程式化至狀態B之相鄰單元。可將Vrc2施加至WLn或將 VreadLA(B)施加至WLn+1 ’同時在WLn施加Vrc。對於傳 導單元,處理器決定DL0及DL1是否正儲存用於狀態B之資 料。若否,則該等資料閂不受干擾。若其正儲存用於狀態 B之資料,則處理器決定DL2是否正儲存邏輯0。若否,則 •不更新該等閂。若是,則該處理器使用用於狀態B之預定 資料來覆寫在DL0及DL1内的資料。該處理器還使用一 1來 覆寫在DL2内的資料以指示在DL0及DL1内的資料現在對 ^ 應於字元線WLn。 ‘ 在步驟452,執行一最終狀態C子讀取,同時施加一補償 用於處於狀態C的WLn+Ι處相鄰記憶體單元。在一具體實 施例中,將Vix3施加至WLn以實行補償。在另一具體實施 例中,將Vrc施加至WLn,同時將VreadLA(C)施加至 WLn+Ι 〇對於傳導單元,處理器決定DL0及DL1是否正儲 127827.doc -44 - 200845011 存用於狀態c之資料。若否,刖 否則不採取任何動作。若是, 則該處理器決❹以否正儲存u否,則不採取任 何動作。若是’則使用用於狀態B之資料來覆寫DL〇及DL1 並將DL2設定至1。 —^驟456執仃-最終邏輯序列。該等位元線處理器決 疋疋否將用於任—位元線的第三資料問肌沒定至〇。任 ☆仍在DL2内儲存〇的位元線在WLn處記憶體單元在任一狀= Line WUl can be used during read operation '- Designer can choose to include enough shell gates to store data from word line |!^+1 and word WLn simultaneously in the selected word line during a read operation At the office. If each memory-unit stores two-dimensional data, each data line requires four data latches. Two data flashes can store two-dimensional data from the word line WLn+1 and the other two resources (4) can store two-dimensional data from the word line WLn. Similarly, three additional questions can be used for a three-bit device, four additional flashes for a four-bit device, and the like. Although this technique is more &amplitude, adding a data register to each 7L line for each unit of storage area number may be unacceptable in some embodiments due to space limitations. Figure 14 is a flow chart showing a method of reading a selected word line WLn in accordance with an embodiment. This example is presented for each unit storing a four-state device of two-dimensional data. Performing sensing of each memory cell at state A level (between states £ and 八), state B level (between states A and B), and state c level (between states B and C) . Compensation is provided during each quasi-sensing to account for the states of the four potential states of the adjacent memory cells at the subsequent stylized character line 翟!^+1. In order to select an appropriate sensing operation result for each memory unit, when the corresponding unit at 127827.doc -37 - 200845011 WLn is sensed, the 5 holes for the adjacent memory cells on the word line WLn+1 are stored for each bit. Yuan line. The processor for the bit line will use this information to select the appropriate sensing operation results. The data latch group for each element line is responsible for storing the data read from one of the memory cells of the selected word line. The same data latch group for each of the meta-lines will also store information about one of the memory cells of the character line adjacent to the selected sub-line. The additional data latch for each bit line operates as a flag, storing an information about the data. • The latch is storing an indication of the data for the selected word line or the adjacent word line. Thus, the technique of Figure 14 efficiently utilizes such data flashes for bit lines such that it is not necessary to use an additional set of questions to store data from adjacent word lines WLn =. In the example of Figure 14, the memory cells store two poor materials, so three data latches are used. Figure 14 presents an exemplary embodiment. It should be understood that the principles of the disclosure may be extended to embodiments in which each unit has the same number of bits (e.g., 3, 4 or more). In general, the number of data flashes required for each line is equal to one more number of bits stored in each memory unit. To identify the origin of the current stored data, use _ = an extra latch. In Fig. 14, data flash codes DL0 and Du are used for each bit line. • The data of the memory cells read from the corresponding bit lines are stored. A data sheet labeled DL2 is used to store the travel # — , 诚仔旗钻, which refers to whether the data currently stored in the data flash DL 〇 and D L1 corresponds to the data from the selected word line WLn or The data 对应 corresponds to the data from the character line WLn+1 adjacent to the selected word line. 127827.doc -38· 200845011 At step 400, the read operation begins by reading adjacent word line WLn+Ι. The adjacent word line can be read at three normal reference levels Vra, Vrb, and Vrc, as shown in FIG. In a particular embodiment, no compensation is applied when reading WLn+Ι. At step 402, the data values of the memory cells of the adjacent word line are determined. At step 404, the data values of the memory cells of the bit lines at word line WLn+1 are stored in a set of corresponding data latches DL0 and DL1 of the bit line. At step 406, the third data flash DL2 for each bit line is set to logic 0 to indicate that the data in data flashes DL0 and DL1 corresponds to data from a memory cell at WLn+Ι. At steps 408 through 422, a set of sub-reads at state A level (between states E and A) is performed for the selected word line WLn. The first sub-read at step 408 does not provide any compensation to account for the floating gate coupling. For example, if one uses the offset read reference voltage compensation technique illustrated in Figure 12, step 408 can include applying a read reference voltage Vra to the selected word line without using an offset. If one of the compensation techniques shown in Fig. 13 is used, the same read transfer voltage VreadP applied to WLn + 在 during WLn stylization verification is applied again to WLn + 感 at the time of sensing at WLn. For example, 'VreadLA(E) = VreadP can be applied to WLn+1, VREAD can be applied to each of the remaining unselected word lines, and Vra is applied to the selected word line WLn. At step 410, the processor of each bit line determines whether to update the data latch for the bit line. The processor does not change any of the values stored in the data latch for the bit line that is not conductive by the memory cells of the selected word line during the sub-read of step 408. For the bit line of the memory cell conduction, the processor determines whether the data latches DL0 and DL1 currently store data corresponding to the state 127827.doc -39- 200845011 state E. For example, if the data specified in Figure 6 is used, the processor determines if the flash is simultaneously storing a logic one. If the questions are not storing logic 11, then the processor does not change the value in the data latch. If the second latch is storing 11, the processor determines if the third data latch DL2 is storing a logical volume. A logic 0 indicates that latches DL0 and DL1 are storing data from WLn+1 and should be overwritten. In one embodiment, the processor may first check for flash DL2 and only check flash DL0 and DL1 when DL2 is storing a logic zero. If two conditions are satisfied for a conductive memory cell, DL0 and DL1 are set to predetermined data values for the erase state. The third data latch DL2 is set to 1 to indicate that DL0 and DL1 are now storing data for the data line WLn. A logic 1 within DL2 excludes overwriting latches DL0 and DL1 during subsequent sub-reads. At step 412, another state A sub-read is performed. At this time, a compensation is applied which corresponds to the adjacent memory cell at WLn+1 stylized to state A. For example, Vral including a Vra offset as shown in Fig. 12 can be used. In another embodiment, VreadLA(A) can be applied to WLn+1 and Vra can be applied to WLn. The processor at each bit line performs another logic sequence to decide whether to update the latch for the bit line having a conductive memory cell. If DL0 and DL1 do not store data for state A (for example, 10), no action is taken. If it is being stored, the processor determines if DL2 is storing a 0 to indicate that the WLn+ data is currently stored. If DL is set to 0, the processor overwrites DL0 and DL1 with the data for state E. The processor sets DL2 to 1 to indicate that the latches now store data from WLn. 127827.doc -40- 200845011 At step 416, a state A sub-read is performed at WLn, while a compensation based on the unit at WLn+1 stylized to state B is applied. For a conductive memory cell, the corresponding bit line processor determines whether DL0 and DL1 are storing data corresponding to state B (e.g., 00). If no, no action is taken. If so, the processor determines if DL2 is storing a logic zero. If no, no further action is taken. If DL2 is set to 0, the predetermined data for state E is used to overwrite DL0 and DL1 and DL2 is set to 1 to indicate that the latch is storing data from WLn. At step 420, a final sub-read at level A is performed. A compensation based on adjacent cells at WLn+Ι in state C is applied. For conductive memory cells, the corresponding bit line processor determines whether the latch is storing data for state 1 (e.g., 01). If the DL2 is set to 2, no action is taken. If DL2 is set to 0, the processor determines if DL2 is storing 0. If no, no further action is taken. If so, the processor overwrites DL0 and DL1 with the predetermined data for state E and sets DL2 to 1. At steps 424 through 444, for the word line WLn, a sub-read sequence at the state B level is performed. An initial sub-read at step 424 does not provide any ^ floating gate coupling compensation. This sub-reading result can be applied to the units at WLn+Ι - the neighboring unit is in the erased state E. Step 424 can include applying Vrb to WLn while applying a VREAD value to WLn+1, which is equal to the value used during the stylized verification for WLn (eg, VreadLA(E) = VreadP). For a conductive memory cell, the corresponding processor determines whether DL0 and DL1 for the bit line are storing data for state E. This step checks to determine 127827.doc • 41 200845011 The current sensed at WLn is the current that should be stored in the unit. If DL0 and DL1 do not correspond to state E, Bay does not take any action. If DL0 and DL1 match for state E, the processor determines that DL2 is storing a logic 0 to indicate that the data in DL0 and DL1 is for WLn+Ι and not for selected word line WLn. If DL2 is set to 1, the processor does not overwrite the data in DL0 and DL1. Logic 1 indicates that the DL0 and DL1 data are from WLn and should not be overwritten. If DL2 is set to 0, then at step 426, the processor overwrites the data in DL0 and DL1 with the data for the current group read. In this case, the processor sets DL0 and DL1 to the status A data (e.g., 10). The processor also sets DL2 to 1 to indicate that DL0 and DL1 are now storing data from the selected word line WLn and should not be overwritten during subsequent sub-reads at WLn. At step 428, a state B sub-read is performed at word line WLn while a compensation is applied based on the neighboring cells in state A at WLn+Ι. In a specific embodiment, Vrbl is applied to WLn. In another embodiment, Vrb is applied to WLn while VreadLA(A) is applied to WLn+Ι. For a conductive memory cell, the processor for the corresponding bit line determines whether DL0 and DL1 are storing data for state A. If no, no action is taken. If so, the processor determines if DL2 is storing logic 0. If not, no further action is taken on the bit line. If so, the processor overwrites the data in DL0 and DL1 with the data corresponding to state A. The processor also sets DL2 to logic 1. At step 432, WLn is read while a compensation is applied for the memory cells for an adjacent cell at WLn+1 to be in state B. If a memory bank 127827.doc -42- 200845011 is transmitted, the processor for the corresponding bit line determines whether DL0 and DL1 for the bit line are sharing state B data (for example, 00). If so, the processor determines if the data in DL0 and DL2 is from WLn (DL2 = 1) or WLn + 1 (DL2 = 0). If the data is from WLn+1, the processor overwrites DL0 and DL1 with the predetermined material for state A. The processor also sets DL2 to logic 1. If any of the conditions are not met, the processor does not change the contents of DL0 to D12. • At step 436, a state B sub-read is performed at word line WLn while a compensation is applied based on adjacent cells at WLn+Ι of state C. For a conductive memory cell, the processor determines if DL0 and DL1 are storing data for state C (e.g., 〇 1). If no, no action is taken. If so, the processor determines if DL2 is storing logic. If no, no action is taken. If so, the processor overwrites the data in DL0 and DL1 and sets DL2 to logic 1 using the data for state A. Steps 440 through 456 perform a set of sub-reads at state C read reference voltage levels. A first sub-read is performed at step 440, which does not include any floating gate coupling compensation. In a specific embodiment, Vrc can be applied to Vrc while VreadLA(E) is applied to WXn+1. The corresponding bit line processor for the conductive memory unit '' determines whether the latches DL0 and DL1 store the * data for the state E. If not, no action is taken at the bit line. If so, the processor determines if DL2 is storing logical buffers. If not, since the data latches share the data for WLn, they will not change. If DL2 is set to 〇, the corresponding processor overwrites the data in DL0 and DL1 with the data corresponding to state B (for example, 00). The processor also sets DL2 127827.doc -43 - 200845011 to 1 to indicate that DL0 and DL1 are storing WLn data. At step 444, a state C sub-read is performed while applying a compensation based on the neighboring cells in state A. Vrc can be applied at WLn or VreadLA(A) can be applied to WLn+1' while Vrc is applied at WLn+1. For the conduction unit, the bit line processor determines whether DL0 and DL1 are storing data for state A. If no, no action is taken. If so, the processor determines if DL2 is storing a logic 0. If no, no action is taken. If so, the processor overwrites latches DL0 and DL1 and sets DL2 to logic 1 using the data for state B. At step 448, a state C sub-read is performed while a compensation is applied to the neighboring cells for stylization to state B. Vrc2 can be applied to WLn or VreadLA(B) can be applied to WLn+1' while Vrc is applied at WLn. For the pilot unit, the processor determines if DL0 and DL1 are storing the data for state B. If not, the data latches are not disturbed. If it is storing data for state B, the processor determines if DL2 is storing a logic zero. If no, then • do not update the latches. If so, the processor overwrites the data in DL0 and DL1 with the predetermined data for state B. The processor also uses a 1 to overwrite the data in DL2 to indicate that the data in DL0 and DL1 is now on the word line WLn. ‘ At step 452, a final state C sub-read is performed while applying a compensation for adjacent memory cells at WLn+Ι in state C. In a specific embodiment, Vix3 is applied to WLn to effect compensation. In another embodiment, Vrc is applied to WLn while VreadLA(C) is applied to WLn+Ι. For the conduction unit, the processor determines whether DL0 and DL1 are being stored. 127827.doc -44 - 200845011 c information. If no, 刖 otherwise no action is taken. If so, the processor decides whether to store u or not, and does not take any action. If yes, then use the data for state B to overwrite DL〇 and DL1 and set DL2 to 1. - ^ 456 仃 - the final logical sequence. The bit line processor decides whether or not the third data for the any-bit line is not fixed. ☆ ☆ The bit line that is still stored in DL2 is in any shape at WLn

〜'位準下的任一子讀取期間不傳導。據此,該些記憶體單 元處於最高程式化狀態(即狀態。下。用於該些位元線的 該等處理器將DU)及如^定至用於狀態以資料(例如邏 輯01)並接著將DL2設定至1以指示該等„現在正儲存用於 WLn的資料。 圖14A至14B呈現在狀態a位準下進行讀取時使用補償之 一具體實施例。在另—具體實施例巾,如先前關於圖⑵斤 述,由於在抹除狀態與狀態A之間的自然發生邊界,在狀 態A位準下不使用任何補償。 圖15A至15C描述依據一具體實施例之一表格,其說明 用於一讀取操作之資料閂指定。行502提出各種操作或子 讀取’其係作為用於選定字元線WLn之讀取操作之部分而 執行。行504列出資料暫存器DL0-DL2,以及對於在行5〇2 内的各各別操作,由位元線處理器回應對應操作所執行之 邏輯。行506、508、510及5 12提出在各操作之後該等資料 門所儲存之資料值。在用於WLn處各子讀取的各行頂部列 出狀態E、狀態A、狀態B或狀態C。狀態E(行506)表示一 127827.doc -45- 200845011 位元線剛好在行502内對應操作之前在其資料閂組内儲存 用於WLn+1之狀態E資料(DL2=0)。狀態A表示一位元線剛 好在行502内對應操作之前在其資料閂組内儲存用於 WLn+Ι之狀態A資料(DL2=0)。狀態B表示一位元線剛好在 行502内對應操作之前在其資料問組内儲存用於WLn+Ι之 狀態B資料(DL2 = 0)。狀態C表示一位元線剛好在行502内 對應操作之前在其資料閂組内儲存用於WLn+Ι之狀態C資 料(DL2==0)。各位元線之第三資料閂DL2假定剛好在WLn 處在行502内的操作之前設定至0。因為不更新在WLn處操 作之前在DL2内儲存一邏輯1的位元線(已儲存WLn資料), 故為了解釋清楚起見,未顯示用以表示該些位元線之額外 行。 在行502所列出的第一操作或子讀取係用於相鄰字元線 WLn+Ι的一讀取操作。對於在WLn+Ι的讀取,在行506至 5 12頂部的狀態表示讀取自WLn+Ι處單元的狀態。若在 WLn+Ι處位元線之記憶體單元處於狀態£下,貝)】如行506内 所示,DL0及DL1係設定至11。若在WLn+Ι處記憶體單元 處於狀態A下,則如行508内所示,DL0及DL1係設定至 10。若在WLn+Ι處記憶體單元處於狀態B下,則如行5 10内 所示,DL0及DL1係設定至00。若一位元線之記憶體單元 處於狀態C下,則如行512内所示,DL0及DL1係設定至 01。在每一情況下,DL2係設定至0以指示在該等閂内的 資料係來自WLn+Ι。可使用其他資料編碼。 在狀態A位準的一組子讀取開始在WLn處的操作。在行 127827.doc •46- 200845011 5 02内的第二列操作係用於選定字元線的在狀態A位準下的 第一子讀取。在狀態A位準下執行該第一子讀取A(E)且不 施加任何浮動閘極耦合補償。因而,該讀取A(E)子讀取可 適用於在WLn+Ι處一單元處於狀態E之位元線。在行504内 提出用於決定是否在讀取A(E)子讀取之後為一特定位元線 更新DL0及DL1之該等條件或邏輯。若用於該位元線的在 WLn處單元傳導,DL2係先前設定至0且DL0至DL1係先前 設定至11,則更新用於該位元線的該等資料閂。在該讀取 A(E)操作之前在DL0至DL1内儲存狀態E並使DL2設定至0 之一位元線滿足資料鎖存準則。若在WLn的記憶體單元傳 導,則為該些位元線更新DL0及DL1。緊接該讀取A(E)子 讀取的在行506至5 12内的該等值顯示可在狀態A位準下執 行該第一子讀取之後加以儲存的各種資料閂資料。更新具 有一傳導單元並先前儲存WLn+Ι狀態E資料之位元線的該 等資料閂。DL0至DL1保留11並將DL2設定至1。此點如行 5 06内所示。如行508至512内所示之所有具有狀態A、狀態 B或狀態C WLn+Ι資料之位元線繼續儲存相同資料。所有 具有一不傳導單元之位元線均保持原樣,如同該等已儲存 WLn資料之位元線(DL2 = 1,未顯示)。 下一子讀取讀取A(A)係一狀態A位準子讀取,其施加基 於一處於狀態A之相鄰記憶體單元的一補償。在行504内的 邏輯指示若在WLn的單元傳導,DL2係先前設定至0並DL0 至DL1係先前設定至10,則應更新該等資料閂。在讀取 A(A)操作之前儲存用於WLn+1之狀態A資料的位元線滿足 127827.doc -47· 200845011 資料閂準則。行508表示一位元線剛好在子讀取之前儲存 用於WLn+Ι的狀態A資料。在用於此類位元線之該等閃内 的資料係更新以在DL0至DL1内儲存11用於狀態E。還將 DL2没疋至;[以指示DL0及DL1正儲存WLn資料。不改變問 資料設定至用於WLn+Ι之狀態E、狀態B或狀態C之位元 線’如行506、510或512内所示。 下一子讀取係讀取A(B)。此子讀取提供基於處於狀態b 的WLn+Ι處相鄰記憶體單元的一補償。若單元傳導,dl〇 至DL1係先前儲存〇〇且DL2係先前設定至〇,則更新用於一 位元線的該等資料閂。儲存用於WLn+1之狀態B資料的位 元線滿足資料閃準則並在其在WLn具有一傳導單元時加以 更新,如行510内所示。閂DL〇及〇1^係更新至11α表示狀 悲Ε資料並將DL2設定至1。不更新在子讀取之前儲存用於 WLn+Ι之狀態Ε、狀態Α或狀態C之位元線。 在狀態A位準的最後子讀取係讀取A(c),其提供基於在 WLn+Ι的一相鄰單元處於狀態c的一補償。將會為該等具 有一傳導單元且其閃先前在DL0至DL·内儲存〇1並在DL2内 儲存一 0之位元線更新該等資料閂。用於目前具有此資料 組態之位元線的該等閂係更新以在dlo至dl 1内储存丨j並 在一DL2内儲存一!,如行512内所示。不更新儲存用於 WLn+Ι之狀態E、狀態A或狀態B之位元線,如行5〇6、 及510内所示。 在狀態B位準的一組子讀取開始於不施加任何補償的讀 取B(E)子讀取。更新用於具有一傳導單元且目前在DL0至 127827.doc -48- 200845011 DL1内儲存邏輯1並在DL2内儲存邏輯0之位元線的該等 閂。對於該等位元線,其對應於設定至狀態Ε之WLn+Ι閂 資料組,DLO至DL1係設定至10且DL2係設定至1。此點如 行506内所示。對於該等具有一不傳導單元之位元線,不 . 更新設定至狀態A、狀態B或狀態C之資料閂,如行508、 510及512内所示。 該讀取B(A)子讀取施加基於在wLn+1的一相鄰記憶體單 _ 元處於狀態A的一補償。在此子讀取期間的邏輯更新用於 具有一傳導單元且目前在問DL0至DL1内儲存1〇並在DL2 内儲存一 0之位元線的該等資料閂。用於該些位元線之該 專寅料閃係更新以在閃DL0至DL1内儲存1〇並在DL2内儲 存一邏輯1,如行5〇8内所示。不更新儲存用於狀態E、狀 態A或狀悲B之WLn+Ι資料之位元線,如行5〇6、510及512 内所示。同樣地,不更新具有一不傳導單元或DL2=1之位 元線。 ⑩ 該讀取B(B)子讀取施加基於在WLn+Ι的一相鄰記憶體單 兀處於狀態B的一補償。在此子讀取期間的邏輯更新用於 具有傳導單元且目前在閃DL0至DL1内儲存〇〇並在DL2 内儲存〇之位元線的該等資料閂。用於該些位元線之該 - 等資料閃係更新以在閃DL0至DL1内儲存1〇並在DL2内儲 存一邏輯1,如行510内所示。不更新在該子讀取之前儲存 用於狀態E、狀態a或狀態以饥州資料之位元線,如行 5〇6、508及512内所示。不更新具有一不傳導單元或 DL2=1之位元線。 127827.doc -49- 200845011 該讀取B(C)子讀取施加基於在WLn+1的一相鄰記憶體 單元處於狀態C的一補償。更新用於具有一傳導單元且目 前在DL0至DL1内儲存邏輯01並在DL2内儲存邏輯〇之位元 線的該等資料閂。用於該些位元線之該等資料閂係更新以 在DL0至DL2内儲存10並在DL2内儲存邏輯1。不更新儲存 用於狀態E、狀態A或狀態C之WLn+Ι資料之位元線,如行 5 06、508及510内所示。不更新具有一不傳導單元或 DL2=2之位元線。 在狀態C位準的一組子讀取開始於一讀取c(E)子讀取, 不施加任何補償。若一位元線在感測期間具有一傳導單 元’則用於該位元線的處理器決定該等位元線閃是否目前 正在DL0至DL1内儲存11並在DL2内儲存〇。若是,則該處 理器將用於該位元線之該等閂更新至行5〇6内所示之資 料。DL0至DL1係設定至00且DL2係設定至1。對於該等具 有一不傳導單元或一傳導但目前保持用於狀態A、B或c之 資料(行508至512)之位元線,不更新該等閂。同樣地,不 更新具有DL2設定至1之位元線,由於其已儲存貨[11資料。 該項取C(A)子謂取施加基於在WLn+1的一相鄰記惊體 單元處於狀態A的一補償。用於具有一傳導單元之位元線 的該等處理器決定該等位元線閂是否正在dL0至DL1内儲 存10並在DL2内儲存0。若是,則該處理器更新該等閃, 如行508内所示。DL0至DL1係更新至〇〇且]〇1^係更新至邏 輯1。不更新具有一不傳導單元或一傳導但目前不保持狀 態E、狀態B或狀態CiWLn+1資料之位元線,如行5〇6、 127827.doc -50- 200845011 510及512所示。不更新具有DL2=1之位元線。 該讀取C(B)子讀取施加基於在處於狀態b之WLn+Ι的一 相鄰記憶體單元的一補償。檢查用於具有一傳導單元之位 元線的該等閂以決定其是否正在DL0至DL1内儲存〇〇並在 DL2内儲存邏輯0。如行510内所示更新用於該些位元線的 該等閃以在DL0至DL1内儲存〇〇並在DL2内儲存1。不更新 具有一不傳導單元之位元線。不更新目前儲存用於WLn+ i 之狀恶E、A或C之位元線。不更新具有dl2= 1之位元線。 讀取C(C)子讀取施加基於在處於狀態c之WLn+Ι的一相 鄰記憶體單元的一補償。檢查用於傳導位元線的該等問以 決定其是否正在DL0至DL1内儲存〇1並在DL2内儲存〇。若 是,則如行512内所示更新其以在dl〇至DL1内儲存〇1並在 DL2内儲存邏輯1。不更新具有一不傳導單元之位元線。 不更新DL2設定至1或儲存用於wLn+1之狀態E、A或B資料 之位元線。 行504指定在完成該等子讀取組之後執行的一最後組邏 輯。若在狀態C位準的最後子讀取之後DL2正儲存一邏輯〇 用於任一位元線,則在該等子讀取之任一子讀取期間用於 該位元線的在WLn處記憶體單元不傳導。因而,將該單元 程式化成狀態C。與該位元線相關聯之處理器將會設定 DL0及1>1^至01,表示用於狀態c之資料。該處理器將用於 該些位元線的第三資料閂DL2設定至i以指示DL〇至DL1現 在正儲存用於WLn的資料。 圖16係在依據一具體實施例之一讀取操作期間一記憶體 127827.doc -51- 200845011 系統之各種信號之一時序圖。描述施加至一選定字元線 WLn、一相鄰未選定字源線WLn+l及各剩餘未選定字元線 的該等信號。還描述一選通信號,其起始感測模組進行感 測。用於WLn之讀取操作之第一部分包括讀取相鄰字元線 WLn+l。將該選定字元線升高至傳遞電壓VREAD,使得其 上的所有記憶體單元均作為傳遞閘極來運作。藉由施加適 當讀取參考電壓Vcgr來讀取相鄰字元線。圖16說明一範例 性四狀態裝置,故使用三個讀取參考電壓Vra、Vrb及 Vrc。在Vra下傳導的單元處於狀態E下。在Vrb下傳導的單 元處於狀態A下。在Vrc下傳導但在Vra或Vrb下不傳導的單 元處於狀態B下。而且在該等電壓之任一電壓不傳導的單 元處於狀態C下。針對各對應位元線,將用於WLn+l處記 憶體單元之該等資料值儲存於資料閂DL0及DL1内。將一 第三資料閂DL2設定至0以指示該資料係用於WLn+l。 在選定字元線處的實際子讀取在讀取相鄰字元線之後開 始。先在狀態A參考電壓位準執行一組子讀取。在各子讀 取過程中將狀態A讀取電壓Vr a施加至選定字元線。將一第 一讀取傳導電壓VreadLA(E)施加至用於一第一子讀取的相 鄰字元線WLn+l。該第一讀取傳遞電壓不提供基於浮動閘 極耦合的任何補償。此子讀取之該等結果儲存用於在相鄰 字元線WLn+l之一相鄰單元處於狀態E的WLn處傳導記憶 體單元的狀態E資料。回應一傳導記憶體單元,位元線處 理器決定閂DL0及DL1是否正儲存對應於子讀取補償位準 狀態E之資料(例如11)。若是,該處理器檢查DL2以決定在 127827.doc -52- 200845011 DL0及DL1内的資料是否用於WLn+l。若是,貝|J該處理器 將使用用於狀態E之資料來覆寫DL0及DL1並將DL2設定至 1以指示DL0及DL1現在正儲存用於WLn+Ι之資料且在隨後 子讀取期間不應被覆寫。 接著將一第二讀取傳遞電壓VreadLA(A)施加相鄰位元 線,同時繼續將Vra施加至WLn。此時對於傳導單元,對 應位元線處理器檢查以決定閂DL0及DL1是否正儲存用於 狀態A之資料以及DL2是否正儲存一 〇。若滿足二條件,則 該處理器使用用於狀態E之資料來覆寫DL0及DL1資料並將 DL2設定至1。 接著施加一第三讀取傳遞電壓VreadLA(B)及第四讀取傳 遞電壓VreadLA(C)。在施加各讀取傳遞電壓期間重複上面 所勾畫及還關於圖13所勾畫之該等步驟。 該第一組子讀取在結合Vra施加VreadLA(C)之後結束。 第二組子讀取開始於施加第二讀取參考電壓Vrb至選定字 元線。由於在Vra位準的傳導單元係藉由在DL2内設定旗標 而鎖定以免覆寫資料閂,故在Vrb位準的傳導單元指示處 於狀態A的單元。 執行一第一子讀取,同時不施加任何補償至相鄰字元線 WLn+Ι。對應於處於狀態E的相鄰單元,施加 VreadLA(E)。對於對應位元線資料閂正儲存用於狀態E之 資料的傳導記憶體單元,在DL2係設定至〇時,使用狀態A 來覆寫該等資料Μ。若DL2係設定至1或DL0及DL1正儲存 用於另一狀態的資料,則不採取任何動作。接著藉由施加 127827.doc -53- 200845011Do not conduct during any read period under ~' level. Accordingly, the memory cells are in the highest stylized state (ie, the state. The processors for the bit lines will be DU) and the data is used for the state (eg, logic 01). DL2 is then set to 1 to indicate that the data is now being stored for WLn. Figures 14A through 14B present one embodiment of the use of compensation when reading at state a. In another embodiment As previously described with respect to Figure (2), no compensation is used at State A level due to the naturally occurring boundary between the erased state and State A. Figures 15A through 15C depict a table in accordance with an embodiment. The data latch designation for a read operation is illustrated. Row 502 proposes various operations or sub-reads that are performed as part of the read operation for the selected word line WLn. Row 504 lists the data register DL0. - DL2, and for each individual operation within row 5 〇 2, the bit line processor responds to the logic executed by the corresponding operation. Lines 506, 508, 510, and 5 12 present the data gates after each operation Stored data values. Used for sub-reading at WLn State E, State A, State B, or State C is listed at the top of each row. State E (row 506) represents a 127827.doc -45- 200845011 bit line stored in its data latch group just prior to the corresponding operation in row 502. State E data (DL2 = 0) at WLn+1. State A indicates that a bit line stores state A data for WLn + 在 in its data latch group just before the corresponding operation in row 502 (DL2 = 0) State B indicates that a bit line stores state B data for WLn+Ι in its data group just before the corresponding operation in row 502 (DL2 = 0). State C indicates that one bit line is just in row 502. The state C data for WLn+Ι is stored in its data latch group before the operation (DL2==0). The third data latch DL2 of each bit line is assumed to be set to 0 just before the operation in line 502 at WLn. Since the byte line of the logic 1 is stored in the DL2 before the operation at WLn is not updated (the WLn data has been stored), additional lines for indicating the bit lines are not displayed for clarity of explanation. The first operation or sub-read listed by 502 is for a read operation of the adjacent word line WLn+1. The reading of WLn+Ι, the state at the top of lines 506 to 5 12 indicates the state of the cell read from WLn+Ι. If the memory cell of the bit line at WLn+Ι is in the state £, As shown in row 506, DL0 and DL1 are set to 11. If the memory cell is in state A at WLn+Ι, then as shown in row 508, DL0 and DL1 are set to 10. If at WLn+Ι When the memory cell is in state B, as shown in row 5 10, DL0 and DL1 are set to 00. If the memory cell of a bit line is in state C, then as shown in row 512, DL0 and DL1 are set to 01. In each case, the DL2 is set to 0 to indicate that the data within the latches is from WLn+Ι. Other data encodings can be used. A set of sub-reads at state A level begins the operation at WLn. The second column of operations in line 127827.doc • 46- 200845011 5 02 is used for the first sub-read of the selected word line under the state A level. The first sub-read A(E) is executed at state A and no floating gate coupling compensation is applied. Thus, the read A(E) sub-read can be applied to a bit line where the cell is in state E at WLn+Ι. The conditions or logic for deciding whether to update DL0 and DL1 for a particular bit line after reading the A(E) sub-read are presented in row 504. If the cell conduction at WLn for the bit line is previously set to 0 and DL0 to DL1 were previously set to 11, the data latches for that bit line are updated. The state E is stored in DL0 to DL1 and the bit line is set to 0 by DL0 to DL1 before the read A(E) operation satisfies the data latching criterion. If the memory cells of WLn are transmitted, DL0 and DL1 are updated for the bit lines. The values in rows 506 through 5 12 read immediately following the read A(E) sub-display show various data latch data that can be stored after the first sub-read can be performed at state A. These data latches are updated with a bit line that has a conducting unit and previously stores the WLn+Ι state E data. DL0 to DL1 retain 11 and set DL2 to 1. This is shown in line 5 06. All of the bit lines having state A, state B, or state C WLn+1 data as shown in rows 508 through 512 continue to store the same data. All bit lines with a non-conducting cell remain intact, as are the bit lines of the stored WLn data (DL2 = 1, not shown). The next sub-read reads A(A) is a state A-bit read that applies a compensation based on an adjacent memory cell in state A. The logic within row 504 indicates that if the DL2 is previously set to 0, and DL0 to DL1 were previously set to 10, then the data latch should be updated. The bit line storing the state A data for WLn+1 before the A(A) operation is read satisfies the 127827.doc -47·200845011 data latch criterion. Line 508 indicates that a bit line stores state A data for WLn+Ι just prior to sub-reading. The data in the flash for such bit lines is updated to store 11 for status E in DL0 through DL1. Also DL2 will not be reached; [indicating that DL0 and DL1 are storing WLn data. The bit line set to state E, state B or state C for WLn+Ι is not changed as shown in row 506, 510 or 512. The next sub-reading system reads A(B). This sub-read provides a compensation based on the adjacent memory cells at WLn+Ι in state b. If the cell conducts, dl〇 to DL1 is previously stored, and DL2 is previously set to 〇, then the data latches for a bit line are updated. The bit line storing the state B data for WLn+1 satisfies the data flash criterion and is updated as it has a conduction unit at WLn, as shown in row 510. The latches DL〇 and 〇1^ are updated to 11α to indicate the sadness data and set DL2 to 1. The bit line for the state Ε, state Α or state C of WLn+Ι is stored before the sub-read. The last sub-reading at state A reads A(c), which provides a compensation based on an adjacent cell at WLn+Ι in state c. The data latches will be updated for those bit cells that have a conducting cell and that have previously stored 〇1 in DL0 to DL· and stored a bit line in DL2. These latches are updated for bit lines currently configured with this profile to store 丨j in dlo to dl 1 and store one in DL2! As shown in line 512. The bit lines for state E, state A, or state B for WLn+Ι are not updated, as shown in rows 5〇6, and 510. A set of sub-reads at state B level begins with a read B(E) sub-read without applying any compensation. The latches are updated for bit lines that have a conduction unit and currently store logic 1 in DL0 to 127827.doc -48 - 200845011 DL1 and store logic 0 in DL2. For the bit line, which corresponds to the WLn+Ι latch data set set to state ,, DLO to DL1 are set to 10 and DL2 is set to 1. This is shown in line 506. For such bit lines having a non-conducting unit, the data latches set to state A, state B, or state C are not updated, as shown in rows 508, 510, and 512. The read B(A) sub-read applies a compensation based on a neighboring memory cell at wLn+1 in state A. The logic update during this sub-read is used for the data latches that have a conducting cell and are currently storing 1 DL in DL0 through DL1 and storing a 0 bit line in DL2. The dedicated strobe update for the bit lines stores 1 闪 in flashes DL0 through DL1 and a logic 1 in DL2, as shown in row 5〇8. The bit lines storing the WLn+ data for state E, state A, or sorrow B are not updated as shown in rows 5, 6, 510, and 512. Similarly, bit lines having a non-conducting unit or DL2 = 1 are not updated. 10 The read B(B) sub-read applies a compensation based on an adjacent memory cell at WLn+Ι in state B. The logic update during this sub-read is used for the data latches that have conductive cells and are currently stored in flashes DL0 through DL1 and store the bit lines in the DL2. The data flash is updated for the bit lines to store 1 闪 in flashes DL0 through DL1 and a logic 1 in DL2, as shown in row 510. Bit lines for state E, state a, or state with hungry data are not updated prior to the sub-read, as shown in rows 5, 6, 508, and 512. Bit lines having a non-conducting unit or DL2=1 are not updated. 127827.doc -49- 200845011 The read B(C) sub-read applies a compensation based on an adjacent memory cell at WLn+1 in state C. The data latches for a bit line having a conduction unit and currently storing logic 01 in DL0 to DL1 and storing logic 在 in DL2 are updated. The data latches for the bit lines are updated to store 10 in DL0 through DL2 and store logic 1 in DL2. The bit lines for the WLn+ data stored in state E, state A, or state C are not updated, as shown in lines 5 06, 508, and 510. A bit line having a non-conducting unit or DL2=2 is not updated. A set of sub-reads at state C level begins with a read c(E) sub-read without any compensation being applied. If a bit line has a conducting cell during sensing, the processor for that bit line determines whether the bit line flash is currently storing 11 in DL0 through DL1 and storing it in DL2. If so, the processor updates the latches for the bit line to the data shown in row 5-6. DL0 to DL1 are set to 00 and DL2 is set to 1. The latches are not updated for those bit lines that have a non-conducting unit or a conduction but are currently held for status A, B or c (lines 508 to 512). Similarly, the bit line having the DL2 setting of 1 is not updated since it has stored goods [11 data. The C(A) sub-predicate applies a compensation based on a neighboring stun-like unit at WLn+1 in state A. The processors for the bit lines having a conducting unit determine whether the bit line latches are storing 10 in dL0 through DL1 and storing 0 in DL2. If so, the processor updates the flash as shown in row 508. DL0 to DL1 are updated to 〇〇 and 〇1^ is updated to Logic 1. Bit lines having a non-conducting unit or a conduction but not currently maintaining state E, state B, or state CiWLn+1 data are not updated, as shown in lines 5〇6, 127827.doc-50-200845011 510 and 512. Bit lines with DL2=1 are not updated. The read C(B) sub-read applies a compensation based on an adjacent memory cell at WLn + 状态 in state b. The latches for the bit lines having a conducting cell are checked to determine if they are storing DL in DL0 through DL1 and store a logic 0 in DL2. The flashes for the bit lines are updated as shown in row 510 to store 〇〇 in DL0 through DL1 and store 1 in DL2. Bit lines with a non-conducting unit are not updated. The bit lines currently stored for WLn+ i, E, A or C, are not updated. Bit lines with dl2=1 are not updated. The read C(C) sub-read applies a compensation based on an adjacent memory cell at WLn+Ι in state c. The questions for the conductive bit lines are checked to determine if they are storing 〇1 in DL0 to DL1 and storing 〇 in DL2. If so, it is updated as shown in row 512 to store 〇1 in dl〇 to DL1 and to store logic 1 in DL2. Bit lines with a non-conducting unit are not updated. The DL2 setting is not updated to 1 or the bit line for the state E, A or B data of wLn+1 is stored. Row 504 specifies a final set of logic that is executed after the completion of the sub-read groups. If DL2 is storing a logic 〇 for any bit line after the last sub-read of state C level, then at WLn for that bit line during any sub-read of the sub-reads The memory unit is not conducting. Thus, the unit is programmed into state C. The processor associated with the bit line will set DL0 and 1 > 1^ to 01 to indicate the data for state c. The processor sets the third data latch DL2 for the bit lines to i to indicate that DL 〇 to DL1 are currently storing data for WLn. Figure 16 is a timing diagram of various signals of a memory 127827.doc - 51 - 200845011 system during a read operation in accordance with an embodiment. The signals applied to a selected word line WLn, an adjacent unselected word source line WLn+1, and each of the remaining unselected word lines are described. A strobe signal is also described, the initial sensing module sensing. The first portion of the read operation for WLn includes reading the adjacent word line WLn+1. The selected word line is raised to the transfer voltage VREAD such that all of the memory cells on it operate as a transfer gate. The adjacent word line is read by applying an appropriate read reference voltage Vcgr. Figure 16 illustrates an exemplary four-state device, so three read reference voltages Vra, Vrb, and Vrc are used. The unit conducting under Vra is in state E. The unit conducting under Vrb is in state A. Units that conduct under Vrc but do not conduct under Vra or Vrb are in state B. Also, cells that are not conducting at any of these voltages are in state C. The data values for the memory cells at WLn+1 are stored in the data latches DL0 and DL1 for each corresponding bit line. A third data latch DL2 is set to 0 to indicate that the data is for WLn+1. The actual sub-read at the selected word line begins after reading the adjacent word line. A set of sub-reads is first performed at the state A reference voltage level. The state A read voltage Vr a is applied to the selected word line during each sub-reading process. A first read conduction voltage VreadLA(E) is applied to the adjacent word line WLn+1 for a first sub-read. This first read transfer voltage does not provide any compensation based on floating gate coupling. The results of this sub-read store store state E data for conducting memory cells at WLn where one of the adjacent word lines WLn+1 is in state E. In response to a conductive memory cell, the bit line processor determines whether the latches DL0 and DL1 are storing data corresponding to the sub-read compensation level state E (e.g., 11). If so, the processor checks DL2 to determine if the data in 127827.doc -52- 200845011 DL0 and DL1 is for WLn+1. If so, the processor will overwrite DL0 and DL1 with the data for state E and set DL2 to 1 to indicate that DL0 and DL1 are now storing data for WLn+Ι and during subsequent sub-reads. Should not be overwritten. A second read transfer voltage VreadLA(A) is then applied to the adjacent bit line while Vra is continuously applied to WLn. At this point for the conduction unit, the corresponding bit line processor checks to determine if the latches DL0 and DL1 are storing data for state A and whether DL2 is storing one. If the two conditions are met, the processor overwrites the DL0 and DL1 data and sets DL2 to 1 using the data for state E. A third read transfer voltage VreadLA (B) and a fourth read transfer voltage VreadLA (C) are then applied. The steps outlined above and also outlined with respect to Figure 13 are repeated during the application of each of the read transfer voltages. This first set of sub-reads ends after VreadLA(C) is applied in conjunction with Vra. The second set of sub-reads begins by applying a second read reference voltage Vrb to the selected word line. Since the conduction unit at the Vra level is locked from overwriting the data latch by setting a flag in DL2, the conduction unit at the Vrb level indicates the unit at state A. A first sub-read is performed without applying any compensation to the adjacent word line WLn+Ι. Corresponding to the adjacent cells in state E, VreadLA(E) is applied. For the corresponding bit line data latch, the conductive memory unit for storing the data for the state E is used, and when the DL2 system is set to 〇, the state A is overwritten with the state A. If DL2 is set to 1 or DL0 and DL1 are storing data for another status, no action is taken. Then by applying 127827.doc -53- 200845011

VreadLA(A)至相鄰字元線來執行在狀態B位準的第二子讀 取。使用用於DL0及DL1設定至狀態A且DL2設定至1之傳 導記憶體單元的狀態A資料來覆寫在dl〇&du内的資料。 藉由施加讀取傳遞電壓VreadLA(b)及VreadLA(c)來執行二 “ 額外子讀取。如圖13及圖14A至14B内所述來重複該等邏 輯步驟。 在狀態c位準執行一最後組子讀取。將狀態€讀取參考 φ 電壓VrC^加至選定字元線。依序再次施加該等四個讀取 傳遞電壓至相鄰字元線。各位元線處理器執行先前所勾晝 之邏輯步驟以在適當時更新該等閂並切換該第三資料閂以 指示儲存WLn資料之時間。 各感測模組進行感測開始於在圖丨6底部所描述之選通信 號。當在WLn+l讀取時在各參考位準Vra、乂吐及乂代處使 用一單一選通。當在WLn處進行感測時,使用二選通用於 在各位準的第一子讀取並使用一單一選通用於三個剩餘子 i 讀取之各子讀取。 在項取操作期間時常使用兩個選通以最小化由於源極線 内電Μ所引起之源極電壓錯誤。源極線具有一有限接地電 阻。讀取/寫入電路13〇八、13〇β在一記憶體單元頁上同時 操作。各6己憶ϋ單元之傳導電流透過位元線從感測模組流 入記憶體單元之沒極並從源極流出,之後穿過一源極線至 接地。當使用一共用源極線並連接至某外部襯墊時,一有 限電阻仍處於一記憶體單元之源極電極與該襯墊之間,即 更在使用孟屬▼來降低源極線電阻時。當一有限電阻存在 127827.doc -54- 200845011 於一記憶體單元之源極電極與接地襯墊之間時,在該電阻 上的電壓降等於所有單元之總傳導電流與該有限電阻之乘 積。此點可能會引起感測錯誤。 一種用以減少錯誤之方法時常藉由多遍感測來完成。各 遍有助於使用高於-給定劃分值之傳導電流來識別並關閉 該等記憶體單元。依此方式,隨後遍感測將會更少受源極 線偏壓影響’由於已經關閉更高電流單元。在一具體實施 例中’具有-傳導電流超過該劃分點之記憶體單元係藉由 將其位元線之汲極電壓設定至接地(例如藉由在位元線閂 202内設定一適當值)來加以關閉。因為移除該等高電流單 元,故實現更精確地感測該等剩餘單元。 當在WLn+Ι處讀取時,在各位準使用一單一選通,由於 在決定相鄰者電荷位準或狀態資訊時讀取精度不甚關鍵。 使用兩個選通用於在各位元的第一子讀取,但僅使用一選 通用於在相同位準的各剩餘子讀取。圖16所示之該等兩個 選通對應於所述的兩遍感測。在該第一子讀取期間傳導的 記憶體單兀將其位元線設定至接地用於在該位準的剩餘子 讀取,以減少由於源極線偏壓所引起之電壓降。在該第一 子讀取期間關閉該些記憶體單元之後,可使用單遍感測 (一選通)用於在相同位準下的剩餘子讀取。因為在該第一 子讀取期間已關閉的該等單元減少該源極線偏壓電壓降, 故仍獲付精確感測。此表示一技術改良,其可使用在 WLn+Ι的一第一 VREAD值來將各不同參考電壓位準施加至 選定字元線,並使用在WLn+1處的不同乂以❹值來重複。 127827.doc -55- 200845011 ^為此類技術如此依序遞增在選定字元線處所施加之電 1故可能需要在各子讀取處的兩遍感測。如當前所揭示 之早遍感測將會使用更少能量並改良效能時間。 圖17係用於—斜靡於^同1 〇 μ —、 ^、圖12所不補償之具體實施例之一時 *圖。如同先前技術’先藉由施加υ選定字元線並 牙過該等三個讀取參考電壓Vra、來讀取相鄰字 疋線針對各位線,將來自相鄰字元線脱订+1之資料儲VreadLA(A) to the adjacent word line to perform a second sub-read at the state B level. The data in dl〇&du is overwritten using the state A data for the DL0 and DL1 set to state A and the DL2 set to 1 transfer memory cell. Two "extra sub-reads are performed by applying read transfer voltages VreadLA(b) and VreadLA(c). These logic steps are repeated as described in Figure 13 and Figures 14A-14B. The last group read. Add the state € read reference φ voltage VrC^ to the selected word line. The four read transfer voltages are applied again to the adjacent word lines in sequence. The bit line processors execute the previous A logical step of ticking to update the latches as appropriate and switching the third data latch to indicate when the WLn data is stored. Each sensing module performs sensing beginning with the strobe signal described at the bottom of FIG. A single gating is used at each reference level Vra, vomit and deuterium when reading at WLn+1. When sensing at WLn, the second gating is used for the first sub-read in each bit. A single strobe is used for each sub-read of the three remaining sub-i readings. Two strobes are often used during the item fetch operation to minimize source voltage errors due to galvanic current in the source line. The pole line has a limited grounding resistance. The read/write circuit is 13〇13, 13〇β Simultaneous operation on the memory unit page. The conduction current of each of the 6 memory cells flows from the sensing module into the non-polarity of the memory unit and flows out from the source, and then passes through a source line to the ground. When a common source line is used and connected to an external pad, a finite resistance is still between the source electrode of a memory cell and the pad, that is, when the source line resistance is reduced by using the genus ▼. When a finite resistance exists between 127827.doc -54- 200845011 between the source electrode of a memory cell and the ground pad, the voltage drop across the resistor is equal to the product of the total conduction current of all cells and the finite resistance. This may cause a sensing error. A method to reduce errors is often done by multi-pass sensing. Each pass helps to identify and turn off the memory using a conduction current higher than - a given division value. In this way, subsequent pass sensing will be less affected by the source line bias 'because the higher current cell has been turned off. In a particular embodiment, the memory cell has a conduction current that exceeds the dividing point. borrow It is turned off by setting the drain voltage of its bit line to ground (for example, by setting an appropriate value in the bit line latch 202). Since the high current units are removed, more accurate sensing is achieved. Wait for the remaining cells. When reading at WLn+Ι, a single strobe is used in each of the bits, because the reading accuracy is not critical when determining the neighbor's charge level or state information. Use two strobes for The first sub-read of each element is read, but only one strobe is used for reading at each of the remaining sub-levels. The two strobes shown in Figure 16 correspond to the two-pass sensing described. The memory cell that is conducted during the first sub-reading sets its bit line to ground for the remaining sub-reads at that level to reduce the voltage drop due to the source line bias. After turning off the memory cells during a sub-read, a single pass sensing (one gating) can be used for the remaining sub-reads at the same level. Since the cells that were turned off during the first sub-reading reduce the source line bias voltage drop, accurate sensing is still being paid. This represents a technical improvement that can use a first VREAD value at WLn+Ι to apply different reference voltage levels to the selected word line and repeat with a different value at WLn+1. 127827.doc -55- 200845011 ^ For such techniques to sequentially increase the power applied at the selected word line, then two passes of sensing at each sub-read may be required. Early pass sensing as currently disclosed will use less energy and improve performance time. Figure 17 is a diagram for the case of -1 〇 μ -, ^, one of the specific embodiments not compensated in Figure 12. As in the prior art, the adjacent word line is read for the bit lines by applying the selected word line and the three read reference voltages Vra are read, and the adjacent word lines are unbounded by +1. Data storage

存於該等貝料問内並將該第三資料問至q以指示該資 料係用於字元線WLn+Ι。 在貝取w亥相^子元線之《灸,開始用於選定字元線之 :等子⑼取、、且。針對遠第—組子讀取之各子讀取,將該相 球子几線升高至VREAD ’使得其上的記憶體單元作為傳遞 閘極而操h還將各其他未選定字元線升高至ν_,故 其記憶體單元作為傳遞閘極而操作。該選定字元線具有施 加用於該弟狀態位準的不同讀取參考電壓。施加一第一 項取參考電壓Vra,其不包括基於在WLn+1處一相鄰記憶 體單元狀態的任何補償。儲存在此位準的感測結果用於在 WLn+Ι處相鄰記憶體單元處於抹除狀態丑之記憶體單元。 對於在靶加Vra下傳導的單元,對應處理器決定資料閂DL〇 及DL1疋否正儲存用於狀態E之資料。若是,則該處理器 檢查DL2是否正儲存〇以指示在1^〇及1)]^1内的資料係用於 WLn+Ι。若滿足二條件,則該處理器使用用於目前子讀取 組的資料來覆寫在DL0及DL1内的資料。在狀態A位準子讀 取’該處理器設定該等閂等於狀態E資料(例如11)。對於 127827.doc -56 - 200845011 所有其他位元線,不採取任何動作。對於該等剩餘讀取參 考電壓之各讀取參考電壓,重複該些步驟。Vral對應於處 於狀態A的相鄰記憶體單元,Vra2對應於處於狀態B的相 鄰記憶體單元,而Vra3對應於處於狀態C的相鄰記憶體單 元。用於各位元線之該等處理器執行邏輯步驟序列以決定 是否應覆寫該等資料閂。若要覆寫資料,則對應處理器使 用用於狀態E之資料來覆寫該資料並將第三資料閂設定至1 以指示該等閂現在儲存用於字元線WLn之資料。 在圖17之具體實施例中,在狀態A位準(以及在以下所述 狀態B及狀態C位準)的各子讀取期間使用兩個選通用於感 測。因為增加在一特定位準各組子讀取期間施加至選定字 元線之電壓用於各隨後子讀取,故使用兩個選通感測。 在針對選定字元線WLn執行該等狀態A位準子讀取之各 子讀取之後,執行在狀態B位準下的一第二組子讀取。再 次將相鄰字元線升高至V READ以作為一傳遞閘極運作’各 其他未選定字元線亦如此。將該第一狀態B讀取參考電壓 施加至字元線WLn。該第一讀取參考電壓不補償浮動閘極 耦合。據此,使DL0及DL1設定至狀態E值且使DL2設定至 0以指示其正儲存WLn+Ι資料之位元更新其資料閂。對於 該些位元線,將DL0及DL1設定至用於狀態A之值(例如10) 並將DL2設定至1以指示其現在正儲存用於WLn之資料。在 剩餘狀態B讀取位準Virbl、Vrb2及Vrb3重複此程序。 在狀態C位準執行一最後組子讀取。將VREAD施加至相鄰 字元線WLn+Ι。依序施加狀態B讀取參考電壓Vrc、Vrcl、 127827.doc -57- 200845011It is stored in the shells and asks the third data to q to indicate that the data is for the word line WLn+Ι. In the beetle, the "Muzhi", the moxibustion, began to be used for the selected character line: the equator (9) took, and. For each sub-read of the far-group read, the phase of the phase ball is raised to VREAD 'so that the memory cell on it acts as the transfer gate and h also raises the other unselected word lines. Up to ν_, its memory cell operates as a transfer gate. The selected word line has a different read reference voltage applied for the state level. A first term reference voltage Vra is applied which does not include any compensation based on the state of an adjacent memory cell at WLn+1. The sensed results stored at this level are used in the memory cell where the adjacent memory cells are in the erased state at WLn+Ι. For units that conduct under the target plus Vra, the corresponding processor determines whether the data latches DL〇 and DL1 are storing data for state E. If so, the processor checks if DL2 is being stored to indicate that the data in 1^〇 and 1)]^1 is for WLn+Ι. If the two conditions are met, the processor overwrites the data in DL0 and DL1 with the data for the current sub-read group. Read in state A. The processor sets the latches to be equal to the status E data (e.g., 11). For all other bit lines of 127827.doc -56 - 200845011, no action is taken. These steps are repeated for each of the read reference voltages of the remaining read reference voltages. Vral corresponds to an adjacent memory cell in state A, Vra2 corresponds to an adjacent memory cell in state B, and Vra3 corresponds to an adjacent memory cell in state C. The processors for each of the meta-wires perform a sequence of logical steps to determine whether the data latches should be overwritten. To overwrite the data, the corresponding processor overwrites the data with the data for state E and sets the third data latch to 1 to indicate that the latch now stores the data for word line WLn. In the particular embodiment of Figure 17, two gates are used for sensing during each sub-read of state A level (and at state B and state C levels described below). Two gating sensings are used because the voltage applied to the selected word line during each particular group of sub-reads is increased for each subsequent sub-read. A second set of sub-reads at state B level is performed after each sub-read of the state A-level sub-reads is performed for the selected word line WLn. The adjacent word line is again raised to V READ to operate as a pass gate', as are other unselected word lines. The first state B read reference voltage is applied to the word line WLn. The first read reference voltage does not compensate for floating gate coupling. Accordingly, DL0 and DL1 are set to the state E value and DL2 is set to 0 to indicate that it is storing the WLn+1 data bit to update its data latch. For these bit lines, DL0 and DL1 are set to the value for state A (eg 10) and DL2 is set to 1 to indicate that it is now storing data for WLn. This procedure is repeated in the remaining state B reading levels Virbl, Vrb2 and Vrb3. A final group sub-read is performed at state C level. VREAD is applied to the adjacent word line WLn+Ι. The state B is sequentially applied to read the reference voltages Vrc, Vrcl, 127827.doc -57- 200845011

Vrc2及Vrc3並使用該等感測結果來覆寫用於適當位元線之 該等資料閂值,如已經說明的。 關於圖14至17所述之方法係關於全序列程式化來呈現, 其中儲存一邏輯頁之二位元來儲存圖6所示之各記憶體單 元。依據圖7所示之一上及下頁技術所程式化之資料還可 在一類似感測序列及資料閂組態來加以讀取。 可讀取相鄰字元線WLn+Ι並將用於各位元線之資料儲存 於暫存器DLO及DL1内(假定2位元裝置)。若為選定字元線 讀取下頁,則只需在狀態A(例如Vra)與狀態C(例如Vrc)參 考位準下進行讀取。圖14A至14B之步驟408至420可在選 定字元線處執行,隨後執行步驟440至454。由於該讀取操 作僅決定一位元資料用於該選定字元線之各單元,故需要 一單一資料閂來儲存來自WLn之資料。例如,可將下頁資 料儲存於DL0内。步驟408至420將被修改以回應在基於來 自WLn+Ι之資料的用於該位元線之適當感測操作期間的一 傳導單元將DL0設定至邏輯1。當如先前所述儲存WLn資料 時,將DL2設定至邏輯1。步驟440至454將被修改以回應 在基於來自WLn+Ι之資料的用於該位元線之適當感測操作 期間的一傳導單元將DL0設定至邏輯0。對於在狀態A及狀 態C位準子讀取期間具有一不傳導單元之位元線,將DL0 設定至邏輯並將DL2設定至邏輯1。Vrc2 and Vrc3 use these sensing results to overwrite the data latch values for the appropriate bit lines, as already explained. The method described with respect to Figures 14 through 17 is presented in terms of full sequence stylization in which two bits of a logical page are stored to store the memory cells shown in Figure 6. The data programmed according to the techniques of the upper and lower pages shown in Figure 7 can also be read in a similar sensing sequence and data latch configuration. The adjacent word line WLn+Ι can be read and the data for each bit line is stored in the registers DLO and DL1 (assuming a 2-bit device). If the next page is read for the selected word line, then only the status A (eg, Vra) and status C (eg, Vrc) reference levels are read. Steps 408 through 420 of Figures 14A through 14B can be performed at selected word lines, followed by steps 440 through 454. Since the read operation only determines one bit of metadata for each cell of the selected word line, a single data latch is required to store the data from WLn. For example, the next page of information can be stored in DL0. Steps 408 through 420 will be modified to respond to setting a DL0 to logic 1 by a conducting unit during an appropriate sensing operation for the bit line based on data from WLn+1. When the WLn data is stored as previously described, DL2 is set to logic 1. Steps 440 through 454 will be modified to respond to setting a DL0 to logic 0 by a conducting unit during a suitable sensing operation for the bit line based on data from WLn+1. For a bit line having a non-conducting cell during state A and state C-bit read, set DL0 to logic and DL2 to logic 1.

對於上頁讀取,只需在狀態B參考位準(例如Vrb)下進行 讀取。需要一單一閂來儲存上頁資料。例如,可將資料儲 存於DL0或DL1内。可在讀取WLn+Ι之後執行圖14A至14B 127827.doc -58 - 200845011 之步驟424至438用於選Μ元線,從而將資料儲存於問 DL0及脱内,並將DL2設定至〇。若一記憶體單元在狀態 B位準下的適當子讀取期間傳導,則可將阳設定至邏輯丄 並將⑽設定至邏輯卜若該記憶體單元在該等狀態B子讀 取之任-者期間不傳導,則將DL〇設定至〇用於該位元線 並將DL1設定至1。 可類似地併人該等補償及資料閃指定以讀取依據圖_ 8C所述之技術所程式化之資料。#讀取依據圖^至^之 程序所程式化之資料時,在程式化待決記憶料元之上頁 時應校正由於程式化相鄰單元之下頁所引起的來自浮動閘 極搞合的任-擾動。因,匕’當試圖補償來自相鄰單元之浮 動閘極麵合時,該程序之一具體實施例僅需考量由於程式 化相鄰單元之上頁所引起之輕合效應…程序因此可讀^ 用於相鄰字元線的上頁資料。若*程式化相鄰字元線之上 頁,則可讀取考量頁而不補償浮動閘極耦合。若程序化相 鄰字70線之上頁,則將使用一些浮動間極輕合補償來讀取 考量頁。在-些具體實施例中,針對相鄰字元線所執:之 讀取操作導致決定在相鄰字元線上的電荷位 確或可能補確地反映其上㈣存的資料。而且,庫注音 :讀取的選定字元線(即WLn)可能自身僅具有下頁資料: 下未曹程式化整個區塊時此情況可能會發生。在此情形 下,始終保證在WLn+丨上的該等單元仍然抹除,因此沒有 任何耦合效應仍困擾WLn單元。此意味荖,τ雨 /又 +乾要任何補 償’使得-上頁仍需程式化之字元線之下頁讀取可照常進 127827.doc -59· 200845011 行而不需要任何補償技術。 ▲在一具體實施例中,一實施圖8八至8(:之程式化程序之 記憶體陣列將保留一組記憶體單元來儲存一或多個旗標。 例如’可使用-行記憶體單元來儲存旗標,其指示各別列 記«單元之下頁是否已經程式化,並可使用另一行記憶 體單元來儲存旗標,其指示用於各別列記憶體單元之上頁 疋否已絲式化。在—些具體實施例中,可使用冗餘單元 =存該旗標之副本。藉由檢查適#旗標,可衫用於相 鄰字元線之上頁是否已經程式化。關於此類旗標及程式化 程式之更多 '細節可見諸於㈣伽等人的美國專利專利案第 6’657’891说’用於儲存多值資料之半導體記憶體裝置”, 其全部内容係以引用形式併入本文。 圖18說明一用於讀取一相鄰字元線(例如没極側相鄰 WLn+Ι)之上頁貝料之程序之一具體實施例。在步驟⑼〇, 將”貝取參考電壓Vix施加至與讀取頁相關聯之字元線。在 ,驟602,感測該等位元線。在步驟_,將步驟6〇2之該 等結果儲存於適當閃内。在步驟606,系統檢查指示相關 %於項取頁之上頁程式化的旗標。在一具體實施例中,在 不。又疋該旗軚時,儲存該旗標的記憶體單元將會儲存狀態 E二貝料且在5又疋該旗標時儲存狀態c資料。因此,當在步 驟602感测特定記憶體單元時,若該記憶體單元傳導(接 通)’則該A憶體單元不错存處於狀態c的資料,且不設定 該旗標。若該記情靜II - w體早疋不傳導,則在步驟606假定該記 憶體指示上頁已經藉4 只、、二%式化。可使用其他用於儲存一旗標之 127827.doc 200845011 構件,例如藉由在一位元組資料内儲存該旗標。 若未曾設定該旗標(步驟608),則圖18之程序中止,總 結出上頁未曾程式化。可在WLn執行一不使用耦合補償的 標準讀取料。若此WLn讀取下胃資料,則在狀gB位準 (例如Vrb)下進行感測足以決定下頁資料。若讀取上頁資 料,則在狀態A(例如Vra)、狀態b(例如Vrb)及狀態c位準 (例如Vrc)下執行感測。 若已經設定該旗標(步驟608),則假定已經程式化上頁 且在步驟612將電壓Vrb施加相關聯於讀取頁之字元線。在 步驟614’如上述感測該等位元線。在步驟616,將步驟 614之該等結果儲存於適當問内。在步驟618,將電壓— 施加至相關聯於讀取頁之字元線。在步驟620,感測該等 位元線。在步驟622’將步驟62G之該等結果儲存於適當閃 内。在步驟624,處理器212基於三個感測步驟6〇2、^及 6二之該等結果來決定正在讀取該等記憶體單元之各記憶 體單元所儲存之資料值。在步驟626,將在步驟624決定的 該等資料值儲存於適當資料_。在步驟咖,處理器说 使用取決㈣選特枝態編碼之熟知簡單邏輯技術來決定 上頁及下Η料值。例如,對於_至8(:所述之編碼, 下頁資料係W (當在Vrb下進行讀取時所儲存的值補 而上頁資料係Vra*〇R (Vrb AND v 實施例中使用已經說明的類似技衍以/I在一替代性具體 後储存資料。 A独技細在各個別感測操作之 在一具體實施财,_之程序包括施至汲極側 127827.doc •61- 200845011 相鄰字元線。因此,對於圖18之程度,VREADX=VREAD。在 圖22之程序之另一具體實施例中’ VreadX=VreadL A(E) 〇 只需在讀取依據圖8A至8C之技術所程式化之單元時補 償由於程式化WLn+Ι之上頁所引起之浮動閘極耦合。在一 具體實施例中,可將來自WLn+Ι之完全資料儲存於該等閂 内(例如儲存於DL0及DL2内的二位元)。若WLn+1的一單 元處於狀態E或狀態B,則在讀取WLn處一相鄰單元時不使 用任何補償。若該單元處於狀態A或狀態C,則可施加一 補償。 因為只需提供一補償或不提供一補償,故在一具體實施 例中儲存一單一位元資料用於WLn+Ι。圖19提供一流程 圖,其解釋用以執行決定是否要使用一偏移用於要求一閂 儲存WLn+Ι資料之一特定位元線的步驟。第一步驟係在字 元線上使用Vra來執行一讀取程序。第二步驟係使用Vrb執 行一讀取。當在Vra下進行讀取時,在記憶體單元處於狀 態E時一閂儲存一 1而在記憶體單元處於狀態A、B或C時儲 存一 0。當在Vrb下進行讀取時,該閂將會儲存一 1用於狀 態E及A,並儲存一 0用於狀態B及C。圖19之第三步驟包括 在來自第二步驟之翻轉結果與來自步驟1之結果上執行一 XOR運算。在第四步驟,在字元線上使用Vix執行一讀 取。一閂儲存一 1用於狀態E、A及B,並儲存一 0用於狀態 C。在第五步驟中,藉由一邏輯AND運算來操作步驟4及步 驟3之該等結果。應注意,步驟1、2及4可作為圖18之部分 來加以執行。圖19之步驟3及5可藉由專用硬體或藉由處理 127827.doc -62- 200845011 器212來加以執行。在不需要任何補償時將步驟5之結果儲 存於一儲存1之閂内且在需要補償時儲存於一儲存0之閂 内。因而,對於該等具有在WLn+Ι上相鄰記憶體單元處於 A或C狀態之在WLn上讀取的單元,將需要一補償。此方 案僅要求一閂來決定是否要校正WLn。 在讀取並儲存來自WLn+Ι之資訊之後,讀取選定字元線 WLn。若讀取頁係下頁,則執行圖20。若正讀取上頁,則 執行圖21。圖20及21關於一僅儲存一位元資料以指示是否 應基於WLn+Ι在WLn使用一補償之範例。其他具體實施例 可儲存完全WLn+1資料。在圖20及21中,使用DL0來指示 在WLn的對應單元處於狀態E/B (DL=0)或狀態A/C (DL0=1)。在DL0=1時使用一補償且在DL0 = 0時不使用任何 補償。 可藉由在狀態B參考位準下進行讀取來決定使用圖8A至 8C所示之資料編碼方案所儲存之下頁資料。在步驟650執 行一第一子讀取而不施加任何補償。具有一傳導記憶體單 元之位元線之該等處理器檢查以決定DL0是否正儲存邏輯 0。此指示在WLn+Ι處的相鄰單元處於狀態E或狀態B,因 而在讀取WLn DL1時不需要任何補償。若DL0係設定至 0,則該處理器檢查DL1以查看其是否係設定至0,指示 DL0正儲存WLn+Ι資料。若DL0及DL1二者係設定至1,則 該處理器將DL0設定至邏輯1。該處理器還將DL1設定至邏 輯1以指示DL0正儲存用於WLn之資料。 在步驟654,執行另一 WLn狀態B位準子讀取,同時施加 127827.doc -63- 200845011 一浮動閘極耦合補償。若在補償子讀取期間一位元線之記 憶體單元傳導,且正在DL0内儲存一邏輯1且在DL1内儲存 邏輯0,則在步驟656該處理器將DL0設定至0並將DL1設定 至邏輯2。此指示該等閂現在正儲存用於WLn的邏輯0下頁 資料。 在步驟658,決定任一位元線是否正在DL1内儲存邏輯 0。此指示對應記憶體單元在各子讀取時不傳導。對於該 些位元線,DL0保留在邏輯0並將DL1設定至1以指示該等 閂正儲存用於WLn的邏輯0下頁資料。 若讀取頁係上頁,則執行圖21之方法。需要在狀態A、 狀態B及狀態C參考位準下執行讀取以決定用於字元線之 上頁資料。用於各位元線之DL0將儲存用於上頁之資料, 但DL1可能儲存上頁資料而一第三閂DL2用以儲存該旗 標。在步驟700,針對WLn執行在狀態A位準下的一無補償 子讀取。若一位元線之記憶體單元傳導,DL0係目前設定 至邏輯0且DL1係目前設定至邏輯0,則在步驟702,處理 器將DL0設定至邏輯1並將DL1設定至邏輯1。在步驟704, 在WLn執行一補償子讀取。若一位元線之記憶體單元傳 導,DL0係目前設定至邏輯1且DL1係目前設定至邏輯0, 則在步驟706,處理器將DL0設定至邏輯1並將DL1設定至 邏輯1。 在步驟708,針對WLn執行在狀態B位準下的一無補償子 讀取。若一位元線之記憶體單元傳導,DL0係目前設定至 邏輯0且DL1係目前設定至邏輯0,則在步驟710,處理器 127827.doc -64- 200845011 將DL0設定至邏輯〇並將DL1設定至邏輯1。在步驟712,在 WLn執行一補償子讀取。若一位元線之記憶體單元傳導, DL0係目前設定至邏輯1且DL1係目前設定至邏輯〇,則在 步驟714,處理器將DL0設定至邏輯0並將DL1設定至邏輯 在步驟716,針對WLn執行在狀態B位準下的一無補償子 讀取。若一位元線之記憶體單元傳導,DL0係目前設定至 邏輯0且DL1係目前設定至邏輯〇,則在步驟71 8,處理器 將DL0設定至邏輯1並將DL1設定至邏輯1。在步驟720,針 對WLn執行在狀態b位準下的一補償子讀取。若一位元線 之記憶體單元傳導,DL0係目前設定至邏輯1且DL1係目前 設定至邏輯0,則在步驟722,處理器將DL0設定至邏輯1 並將DL 1設定至邏輯1。 對於在各子讀取期間具有一非傳導記憶體單元之位元線 (在DL1内仍儲存邏輯0),該記憶體單元處於狀態c。因 而,在步驟724,將DL0設定至邏輯設定至邏輯 1 ° 圖22係說明-用於在系統不需要麵合來自—相鄰字元線 之浮動閘極至浮動閘極補償時讀取考量字元線之資料之程 序之一具體實施例的一流程圖。圖22可回應相鄰字元線之 上頁未曾程式化的-決定(圖18之步驟61〇)來加以執行。在 步驟750 ’決該讀取是否用於相關聯於考量字元線之上 頁或下頁。若該讀取係用於下頁,則在步驟754,將電壓 Vrb施加至相關聯於讀取頁之字元線。在步驟…,感測該 127827.doc •65- 200845011 等位兀線。在步驟758,將感測步驟756之該等結果儲存於 適畲問内。在步驟76〇,檢查旗標以決定該頁是否包含上 頁資料。若不存在任何旗標,則任一當前資料將處於中間 狀態B且Vrb係要使用的不正確比較電壓。該程序在步驟 762繼繽。在步驟762,將Vra施加至字元線並在步驟764重 新感測該等位元線。在步驟766,儲存該結果。在步驟 768(在步驟766或假如設定旗標步驟76〇之後),處理器 φ 決定要儲存的一資料值。在一具體實施例中,當讀取下頁 時,若記憶體單元回應將Vrb(或Vra)施加至字元線而接 通,則下頁資料係”1”。否則,下頁資料係”〇"。 若決定頁位元址對應於下頁(步驟75〇),則在步驟752執 行一上頁躓取程序。在一具體實施例中,步驟752之上頁 讀取程序包括圖18所述之相同方法。圖18包括讀取旗標及 所有三個狀態,由於可能出於讀取或另外原因而定址一未 寫入上頁。 • 在一具體實施例中,圖22之程序包括施加▽以心至汲極側 相鄰字元線。因此,對於圖22之程序,VREADX=VREAD。在 圖22之程序之另一具體實施例中,vreadX=vreadLA(E)。 前述詳細說明目的在於例示及說明。其並不希望包攬無 - 遺、或將本發明限於所揭示的精確形式。在以上教導的啟 發下,可有許多修改及變更。選擇所述具體實施例係為了 能最佳解釋本發明之原理及其實際應用,因而使習知此項 技術者能夠採用各種具體實施例及各種適合所構思特定用 途的修改來最佳地利用本發明。希望由隨附申請專利範圍 127827.doc -66 - 200845011 來界定本發明之範疇。 【圖式簡單說明】 圖1係一 NAND串之俯視圖。 圖2係圖1之NAND串之一等效電路圖。 圖3係一 NAND快閃記憶體單元陣列之一方塊圖。 圖4係一非揮發記憶體系統之一方塊圖。 圖5係一感測區塊之一具體實施例之一方塊圖。For the previous page read, simply read at the Status B reference level (eg Vrb). A single latch is required to store the previous page. For example, data can be stored in DL0 or DL1. Steps 424 to 438 of Figs. 14A to 14B 127827.doc - 58 - 200845011 can be performed after reading WLn + 用于 for selecting the Μ element line, thereby storing the data in the DL0 and DN, and setting DL2 to 〇. If a memory cell is conducted during the appropriate sub-reading of the state B level, then the positivity can be set to logic 丄 and (10) can be set to logic if the memory cell is read in the state B sub- If it is not conducted during the period, set DL〇 to 位 for the bit line and set DL1 to 1. The compensation and data flashing can be similarly performed to read the data stylized according to the technique described in FIG. 8C. #When reading the data programmed according to the program of ^^^^, the page above the stylized pending memory cell should be corrected for the floating gate due to the page below the stylized adjacent cell. Any-disturbance. Because, when trying to compensate for the floating gate face from an adjacent unit, one embodiment of the program only needs to consider the effect of the lightness caused by the page on the stylized adjacent unit... The program is therefore readable ^ Used for the previous page of adjacent word lines. If *programs the page above the adjacent word line, the page can be read without compensating for the floating gate coupling. If the page above the 70 lines of the adjacent word is programmed, some of the inter-floating offset compensation will be used to read the consideration page. In some embodiments, the read operation for adjacent word lines results in determining whether the charge on the adjacent word line does or may complementfully reflect the data stored thereon. Moreover, the library phonetic: the selected character line (ie WLn) read may have its own data on the next page: This may happen when the entire block is not programmed. In this case, it is always guaranteed that the cells on WLn+丨 are still erased, so there is no coupling effect that still plagues the WLn cells. This means that τ / / 又 又 又 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 ▲ In one embodiment, a memory array implementing the programming of Figures 8-8 (the stylized program will retain a set of memory cells to store one or more flags. For example, a usable-line memory cell To store a flag indicating whether the page below the unit has been programmed, and another row of memory cells can be used to store the flag, indicating whether the page for the column memory unit is on the screen. In some embodiments, a redundant unit = a copy of the flag can be used. By checking the appropriate flag, it can be used to program whether the page above the adjacent word line has been programmed. More details of such flags and stylized programs can be found in (4) U.S. Patent No. 6'657'891 to Gam et al., "Semiconductor Memory Device for Storing Multivalued Data", the entire contents of which are This is incorporated herein by reference. Figure 18 illustrates a specific embodiment of a procedure for reading a sheet of material above an adjacent word line (e.g., adjacent WLn + 没 on the opposite side). In step (9), Applying a "buck reference voltage Vix" to the character associated with the read page At step 602, the bit line is sensed. In step _, the results of step 6 〇 2 are stored in the appropriate flash. In step 606, the system checks the relevant % of the item on the page. In a specific embodiment, when the flag is not present, the memory unit storing the flag will store the state E and the state c information is stored when the flag is 5 and the flag is stored. Therefore, when the specific memory unit is sensed in step 602, if the memory unit conducts (turns on) 'the A memory unit is good in the data of the state c, and the flag is not set. If the sedative II-w body does not conduct early, then it is assumed in step 606 that the memory indicates that the previous page has been borrowed by 4, and 2%. Other 127827.doc 200845011 components for storing a flag may be used, for example By storing the flag in a tuple data. If the flag has not been set (step 608), the procedure of Figure 18 is aborted, summarizing that the previous page has not been programmed. A coupling compensation can be performed at WLn. Standard reading material. If the WLn reads the lower stomach data, it is in the gB level (example) Sensing under Vrb) is sufficient to determine the next page of data. If the previous page is read, sensing is performed in state A (eg, Vra), state b (eg, Vrb), and state c level (eg, Vrc). The flag has been set (step 608), assuming that the upper page has been programmed and the voltage Vrb is applied to the word line associated with the read page at step 612. The bit line is sensed as described above at step 614'. The results of step 614 are stored in the appropriate question at step 616. At step 618, the voltage is applied to the word line associated with the read page. At step 620, the bit line is sensed. Step 622' stores the results of step 62G in a suitable flash. At step 624, processor 212 determines that the memory is being read based on the results of the three sensing steps 6〇2, ^, and 6 The value of the data stored in each memory unit of the unit. At step 626, the data values determined at step 624 are stored in the appropriate data_. In the step coffee, the processor says to use the well-known simple logic technique depending on the (4) special mode encoding to determine the upper and lower data values. For example, for _ to 8 (: the encoding, the next page is W (the value stored when reading under Vrb complements the previous page data system Vra*〇R (Vrb AND v is already used in the embodiment) The similar technique described is based on /I in an alternative specific storage of data. A unique skills in the individual sensing operations in a specific implementation, _ procedures include application to the bungee side 127827.doc • 61- 200845011 Adjacent word lines. Thus, for the extent of Figure 18, VREADX = VREAD. In another embodiment of the procedure of Figure 22, 'VreadX = VreadL A(E) 〇 only needs to be read according to Figures 8A through 8C The technique-programmed unit time compensates for floating gate coupling due to the upper page of the stylized WLn+Ι. In a specific embodiment, full data from WLn+Ι can be stored in the latch (eg, storage) Two bits in DL0 and DL2. If a cell of WLn+1 is in state E or state B, no compensation is used when reading an adjacent cell at WLn. If the cell is in state A or state C , a compensation can be applied. Because only one compensation is provided or not provided, In the example, a single bit of data is stored for WLn+Ι. Figure 19 provides a flow diagram that is interpreted to perform a decision whether or not to use an offset for requiring a latch to store a particular bit line of WLn+Ι data. Step 1. The first step is to use Vra to perform a read procedure on the word line. The second step is to perform a read using Vrb. When reading under Vra, a latch is stored when the memory unit is in state E. 1 and store a 0 when the memory unit is in state A, B or C. When reading under Vrb, the latch will store a 1 for states E and A, and store a 0 for state B. And C. The third step of Figure 19 includes performing an XOR operation on the result of the flip from the second step and the result from step 1. In the fourth step, a read is performed using Vix on the word line. 1 for states E, A, and B, and storing a 0 for state C. In the fifth step, the results of steps 4 and 3 are operated by a logical AND operation. It should be noted that steps 1, 2 And 4 can be implemented as part of Figure 18. Steps 3 and 5 of Figure 19 can be dedicated The body is executed by processing 127827.doc -62 - 200845011 212. The result of step 5 is stored in a latch of storage 1 when no compensation is required and is stored in a latch of storage 0 when compensation is required. Thus, for those cells having WLn read on adjacent memory cells on WLn+, the A/C state will require a compensation. This scheme requires only a latch to determine if WLn is to be corrected. After reading and storing the information from WLn+Ι, the selected word line WLn is read. If the next page of the page is read, Figure 20 is executed. If the previous page is being read, Figure 21 is executed. Figures 20 and 21 relate to an example in which only one meta-data is stored to indicate whether a compensation should be used at WLn based on WLn+Ι. Other embodiments may store full WLn+1 data. In Figs. 20 and 21, DL0 is used to indicate that the corresponding unit at WLn is in state E/B (DL = 0) or state A/C (DL0 = 1). A compensation is used when DL0 = 1 and no compensation is used when DL0 = 0. The page data stored using the data encoding scheme shown in Figs. 8A through 8C can be determined by reading at the state B reference level. A first sub-read is performed at step 650 without applying any compensation. The processor checks with a bit line of a conductive memory cell to determine if DL0 is storing a logic 0. This indicates that the adjacent cell at WLn+Ι is in state E or state B, so no compensation is required when reading WLn DL1. If DL0 is set to 0, the processor checks DL1 to see if it is set to 0, indicating that DL0 is storing WLn+Ι data. If both DL0 and DL1 are set to 1, the processor sets DL0 to logic 1. The processor also sets DL1 to logic 1 to indicate that DL0 is storing data for WLn. At step 654, another WLn state B level read is performed while a floating gate coupling compensation of 127827.doc -63 - 200845011 is applied. If the memory cell of one bit line is conducting during the compensator read and a logic 1 is being stored in DL0 and a logic 0 is being stored in DL1, then at step 656 the processor sets DL0 to 0 and sets DL1 to Logic 2. This indicates that the latches are now storing the logical 0 next page data for WLn. At step 658, it is determined whether any of the bit lines are storing a logic 0 in DL1. This indication corresponds to the memory unit not being conducted at each sub-read. For these bit lines, DL0 remains at logic 0 and DL1 is set to 1 to indicate that the latch is storing the logical 0 next page data for WLn. If the page is read on the page, the method of FIG. 21 is performed. A read is required under the Status A, State B, and Status C reference levels to determine the upper page data for the word line. The DL0 for each bit line will store the data for the previous page, but DL1 may store the previous page and a third latch DL2 for storing the flag. At step 700, a non-compensated sub-read at state A level is performed for WLn. If a bit line memory cell is conducting, DL0 is currently set to logic 0 and DL1 is currently set to logic 0, then in step 702, the processor sets DL0 to logic 1 and DL1 to logic 1. At step 704, a compensator read is performed at WLn. If a memory cell of a bit line is transmitted, DL0 is currently set to logic 1 and DL1 is currently set to logic 0, then in step 706, the processor sets DL0 to logic 1 and DL1 to logic 1. At step 708, a no-compensated sub-read at state B level is performed for WLn. If the memory cell of one bit line is conducted, the DL0 system is currently set to logic 0 and the DL1 system is currently set to logic 0, then in step 710, the processor 127827.doc -64-200845011 sets DL0 to logic 〇 and DL1 Set to logic 1. At step 712, a compensator read is performed at WLn. If the memory cell of one bit line is conducting, the DL0 system is currently set to logic 1 and the DL1 system is currently set to logic 〇, then in step 714, the processor sets DL0 to logic 0 and DL1 to logic at step 716. A no-compensated sub-read at state B level is performed for WLn. If the memory cell of one bit line is conduction, DL0 is currently set to logic 0 and DL1 is currently set to logic 〇, then in step 71, the processor sets DL0 to logic 1 and DL1 to logic 1. At step 720, a compensator read at state b is performed for WLn. If the memory cell of a bit line is conductive, DL0 is currently set to logic 1 and DL1 is currently set to logic 0, then in step 722, the processor sets DL0 to logic 1 and DL 1 to logic 1. For a bit line having a non-conductive memory cell during each sub-read (the logic 0 is still stored in DL1), the memory cell is in state c. Thus, at step 724, DL0 is set to logic set to logic 1 °. Figure 22 is a description - used to read a check word when the system does not need to face the floating gate to floating gate compensation from the adjacent word line. A flowchart of a specific embodiment of the data of the meta-line. Figure 22 can be executed in response to the unsynchronized decision of the previous page of adjacent word lines (step 61 of Figure 18). At step 750' it is determined whether the read is for the associated page above or below the associated word line. If the read is for the next page, then at step 754, voltage Vrb is applied to the word line associated with the read page. In the step..., sense the 127827.doc •65- 200845011 equipotential 兀 line. At step 758, the results of the sensing step 756 are stored in the appropriate query. At step 76, the flag is checked to determine if the page contains the previous page. If there are no flags, then any current data will be in intermediate state B and Vrb is the incorrect comparison voltage to be used. The program proceeds in step 762. At step 762, Vra is applied to the word line and the bit line is re-sensed at step 764. At step 766, the result is stored. At step 768 (at step 766 or if flag step 76 is set), processor φ determines a data value to store. In one embodiment, when the next page is read, if the memory unit responds by applying Vrb (or Vra) to the word line, the next page is "1". Otherwise, the next page of data is "〇". If it is determined that the page bit address corresponds to the next page (step 75A), then a page capture process is performed in step 752. In a specific embodiment, step 752 The page reading procedure includes the same method as described in Figure 18. Figure 18 includes the read flag and all three states, since one may be addressed for reading or another reason, not written to the upper page. The procedure of Figure 22 includes applying a chirp to the left side adjacent word line. Thus, for the procedure of Figure 22, VREADX = VREAD. In another embodiment of the procedure of Figure 22, vreadX = vreadLA ( The above detailed description is intended to be illustrative and not restrictive, and the invention is not intended to be The embodiments are intended to best explain the principles of the invention and the application of the invention, and the embodiments of the invention can With Patent Application No. 127827.doc -66 - 200845011 to define the scope of the present invention. [Simplified Schematic] Fig. 1 is a top view of a NAND string. Fig. 2 is an equivalent circuit diagram of a NAND string of Fig. 1. Fig. 3 is a A block diagram of a NAND flash memory cell array. Figure 4 is a block diagram of a non-volatile memory system. Figure 5 is a block diagram of one embodiment of a sensing block.

圖6描述一組範例性臨限電壓分佈舆一全序列程式化浐 序。 圖7描述一組範例性臨限電壓分佈與一上頁/下頁浐弋化 程序。 圖8A至8C描述一組範例性臨限電壓與一兩遍程式化寿。 序。 圖9係解釋在讀取/驗證操作期間特定信號行為的一時序 圖。 圖10係說明在兩個相鄰記憶體單元之間電容性輕合的一 方塊圖。 圖11係說明浮動閘極輕合效應的一組範例性臨限電壓八 佈。 圖12係說明可依據一具體實施例使用之一浮動閑極搞合 耦合技術的一組範例性臨限電壓分佈。 圖13係說明可依據一具體實施例使用的一浮動間極耗合 耦合技術之一流程圖。 圖14A至14B描述在一具體實施例中一種用於讀取非揮 127827.doc -67- 200845011 發儲存器,同時補償浮動閘極耦合之方法之一流程圖。 圖!5A至15C描述在一具體實施例中說明在—讀取操作 期間一資料閂指定的一表格。 圖16係說日月在-具體實施财用於執行—讀取操作之各 種電壓信號之一時序圖。 讀取操作之各 相鄰字元線之 圖17係說明在一具體實施例中用於執行一 種電壓信號之一時序圖。Figure 6 depicts a set of exemplary threshold voltage distributions, a full sequence stylized sequence. Figure 7 depicts a set of exemplary threshold voltage distributions and an upper/lower page deuteration procedure. Figures 8A through 8C depict a set of exemplary threshold voltages and one or two programming runs. sequence. Figure 9 is a timing diagram illustrating the behavior of a particular signal during a read/verify operation. Figure 10 is a block diagram showing the capacitive coupling between two adjacent memory cells. Figure 11 is a set of exemplary threshold voltages for a floating gate light-sinking effect. Figure 12 illustrates an exemplary set of threshold voltage distributions that may be used in accordance with one embodiment using a floating idler coupling technique. Figure 13 is a flow chart showing one of the floating interpole coupling coupling techniques that can be used in accordance with an embodiment. Figures 14A through 14B illustrate a flow chart of a method for reading a non-volatile 127827.doc-67-200845011 hair storage device while compensating for floating gate coupling in a particular embodiment. Figure! 5A through 15C describe a table for specifying a data latch during a read operation in a specific embodiment. Fig. 16 is a timing chart showing one of various voltage signals for the execution-read operation of the sun and the moon. Figure 17 of each adjacent word line of a read operation illustrates a timing diagram for performing a voltage signal in a particular embodiment.

圖18係說明依據一具體實施例之一讀取一 方法之一流程圖。 士圖19係說明用於提供一關於是否在基於相鄰字元線資料 讀取一特定位元線時應使用一補償之指 貝^ 、心技術的一表 格0 圖20係在一具體實施例中一用於從一 一 k疋子7L線讀取下 頁資料,包括浮動閘極耦合補償之一流程圖。 圖21係在一具體實施例中用於從一選 、疋子線讀取下頁 資料’包括浮動閘極耦合補償之一流程圖。 圖22係依據一具體實施例用於讀取一選定空_ & <疋子7L線而不提 供補償之一流程圖。 【主要元件符號說明】 10 電晶體 10 C G 控制閘極 10FG 浮動閘極 12 第一選擇閘極/電晶體 12CG 控制閘極 127827.doc •68- 200845011Figure 18 is a flow chart illustrating one of the methods of reading in accordance with one embodiment. Figure 19 is a diagram for providing a table 0 of whether or not to use a compensation when reading a particular bit line based on adjacent word line data. Figure 20 is a specific embodiment. The first one is used to read the next page data from the 7K line of the one-kilometer, including one of the flowcharts of the floating gate coupling compensation. Figure 21 is a flow diagram of a method for reading the next page data from a select, dice line, including floating gate coupling compensation, in a particular embodiment. Figure 22 is a flow diagram for reading a selected empty _ &< 疋 7L line without providing compensation in accordance with an embodiment. [Main component symbol description] 10 Transistor 10 C G Control gate 10FG Floating gate 12 First selection gate/transistor 12CG Control gate 127827.doc •68- 200845011

12FG 浮動閘極 14 電晶體 14CG 控制閘極 14FG 浮動閘極 16 電晶體 16CG 控制閘極 16FG 浮動閘極 20CG 控制閘極 22 第二選擇閘極 22CG 控制閘極 26 位元線端子/汲極端子 27 位元線 28 源極線端子 29 源極線 30 區塊 50 NAND 串 100 二維記憶體單元陣列 110 記憶體裝置 112 記憶體晶粒 120 控制電路 122 狀態機 124 晶片上位址解碼器 126 功率控制模組 130A 讀取/寫入電路 127827.doc -69- 20084501112FG Floating Gate 14 Transistor 14CG Control Gate 14FG Floating Gate 16 Transistor 16CG Control Gate 16FG Floating Gate 20CG Control Gate 22 Second Select Gate 22CG Control Gate 26 Bit Line Terminal / 汲 Terminal 27 Bit Line 28 Source Line Terminal 29 Source Line 30 Block 50 NAND String 100 Two-Dimensional Memory Cell Array 110 Memory Device 112 Memory Die 120 Control Circuit 122 State Machine 124 On-Chip Address Decoder 126 Power Control Mode Group 130A read/write circuit 127827.doc -69- 200845011

130B 讀取/寫入電路 132 線 134 線 140A 列解碼器 140B 列解碼器 142A 行解碼器 142B 行解碼器 144 控制器 200 感測區塊 202 位元線閂 204 感測電路 206 資料匯流排 208 輸入線 210 感測模組 212 處理器 214 資料閂 216 I/O介面 220 共用部分 302 相鄰浮動閘極 304 相鄰浮動閘極 306 NAND通道/基板 308 源極/沒極區 310 源極/ >及極區 312 源極/ >及極區 127827.doc -70- 200845011 314 控制閘極 316 汲極側相鄰控制閘極 320 分佈 322 分佈 324 分佈 326 分佈 328 分佈 330 分佈 127827.doc -71-130B read/write circuit 132 line 134 line 140A column decoder 140B column decoder 142A line decoder 142B line decoder 144 controller 200 sensing block 202 bit line latch 204 sensing circuit 206 data bus 208 input Line 210 Sensing Module 212 Processor 214 Data Latch 216 I/O Interface 220 Common Portion 302 Adjacent Floating Gate 304 Adjacent Floating Gate 306 NAND Channel/Substrate 308 Source/Polar Region 310 Source /gt Polar Region 312 Source /gt; and Polar Region 127827.doc -70- 200845011 314 Control Gate 316 Bungary Side Adjacent Control Gate 320 Distribution 322 Distribution 324 Distribution 326 Distribution 328 Distribution 330 Distribution 127827.doc -71-

Claims (1)

200845011 十、申請專利範圍·· 1. 一種非揮發記憶體系統,其包含: 一第一非揮發儲存元件; -第二非揮發儲存元件,其相鄰該第—非揮發儲存元 件; -位元線’其係與該第—非揮發儲存元件及該第二非 揮發儲存元件通信; 一組資料閂,其係相關聯於該位元線; 管理電路,其係與該第一非揮發儲存元件、該第二非 揮發儲存元件、綠元線及該組資料卩-Ιϋ信,該管理電 路回應-要求ff取㈣—非揮發儲存元件之要求,將來 自:第二非揮發儲存元件之資料與一第一指示儲存於該 組負料問内’該管理雷敗4 ^理電路針對-特定狀態執行複數個感 =作以讀=該第—非揮發儲存元件,若在對應於該組 貝’問内目刖所儲存之該資料的該等感測操作之-特定 :期間該第一非揮發儲存元件係傳導且若該第一指示存 在於理電路使㈣於 :預定資料來替換在該組資料閃内的該資料,若來自該 :一非揮發儲存元件之該資料被替換,則該管理電路使 用該預定賴㈣自㈣—非揮㈣存 示來替換該第一指示。 们弟一才曰 、月求項1之非揮發記憶體系統,其中該管理電路藉由 乂下針對該特疋狀態來執行該複數個感測操作: 藉由施加一第—讀取參考電壓至該第一非揮發儲存元 127827.doc 200845011 件同時施加一第一傳遞電壓至該第二非揮發儲存元件來 執行一第一感測操作,該第一傳遞電壓對應於該第二非 揮發儲存元件可能儲存的一第一組資料;以及 藉由施加該第一讀取參考電壓至該第一非揮發儲存元 件同時施加一第二傳遞電壓至該第二非揮發儲存元= ’ 執行一第二感測操作,該第二傳遞電壓對應於該第二非 揮發儲存元件可能儲存的一第二組資料。 φ 3·如請求項2之非揮發記憶體系統,其中·· 若在程式化該第一非揮發儲存元件之後該第二非揮發 t存=件係程式化至一第一狀態,則該第一感測操作補 償該第一非揮發儲存元件之一臨限電壓表觀增加;以及 右在程式化該第一非揮發儲存元件之後該第二非揮發 儲存元件係程式化至一第二狀態,則該第二感測操作補 ^該第一非揮發儲存元件之一臨限電壓表觀增加。 4·如請求項1之非揮發記憶體系統,其中: • 該弟及第一非揮發儲存元件係能夠處於八個資料狀 態之一的多位準儲存元件; 可能儲存於該組資料閂内的該不同資料包括對應於該 八個資料狀態的八組個別資料; ‘ 該管理電路藉由執行對應於該八個資料狀態的八個感 測操作來執行該複數個感測操作,各感測操作在基於該 第一非揮發儲存元件之一潛在資料狀態來感測該第一非 揮發儲存元件時提供一不同數量的補償。 5·如請求項4之非揮發記憶體系統,其中該組資料閂包含 127827.doc 200845011 四個資料网; 、,來自该第二非揮發儲存元件之該資料係儲存於三個資 料門内且該指示係儲存於一單一資料閂内; 该吕理電路藉由使用該預定資料來覆寫該三個資料問 來替換該資料; 、 广官理電路藉由覆寫儲存於該單一資料閂内的該第一 指示來使用該第二指示替換該第一指示。 、 '員1之非揮發記憶體系統,其中該管理電路藉由 、下針對該特定狀態執行該複數個感測操作··200845011 X. Patent Application Range 1. A non-volatile memory system comprising: a first non-volatile storage element; - a second non-volatile storage element adjacent to the first non-volatile storage element; - a bit a line 'in communication with the first non-volatile storage element and the second non-volatile storage element; a set of data latches associated with the bit line; a management circuit coupled to the first non-volatile storage element The second non-volatile storage element, the green line and the group of data, the management circuit responds - requires ff to take (four) - the requirement of the non-volatile storage element, and the information from the second non-volatile storage element A first indication is stored in the group of negative materials. The management is performed in a specific state for a specific state = for reading = the first - non-volatile storage element, if corresponding to the group of shells The specific operation of the sensing operation of the data stored in the directory: during the period: the first non-volatile storage element is conducted and if the first indication is present in the circuit (4): the predetermined data is replaced in the group Information flash The information within the source, if the data from the non-volatile storage element is replaced, the management circuit replaces the first indication with the predetermined (four) from (four)-non-swipe (four) listing. A non-volatile memory system of the present invention, wherein the management circuit performs the plurality of sensing operations by means of the underlying state: by applying a first-read reference voltage to The first non-volatile storage element 127827.doc 200845011 simultaneously applies a first transfer voltage to the second non-volatile storage element to perform a first sensing operation, the first transfer voltage corresponding to the second non-volatile storage element a first set of data that may be stored; and applying a second read voltage to the first non-volatile storage element while applying a second transfer voltage to the second non-volatile storage element = 'performing a second sense The second transfer voltage corresponds to a second set of data that the second non-volatile storage element may store. Φ 3· The non-volatile memory system of claim 2, wherein: if the second non-volatile storage element is programmed to a first state after the first non-volatile storage element is programmed, the a sensing operation compensates for an apparent increase in threshold voltage of the first non-volatile storage element; and the second non-volatile storage element is programmed to a second state after the first non-volatile storage element is programmed Then, the second sensing operation complements the threshold voltage of one of the first non-volatile storage elements. 4. The non-volatile memory system of claim 1, wherein: • the brother and the first non-volatile storage element are multi-level storage elements capable of being in one of eight data states; possibly stored in the data latch of the group The different data includes eight sets of individual data corresponding to the eight data states; 'the management circuit performs the plurality of sensing operations by performing eight sensing operations corresponding to the eight data states, each sensing operation A different amount of compensation is provided when sensing the first non-volatile storage element based on a potential data state of the first non-volatile storage element. 5. The non-volatile memory system of claim 4, wherein the data latch comprises 127827.doc 200845011 four data networks; and the data from the second non-volatile storage component is stored in three data gates and the The indication is stored in a single data latch; the logic circuit replaces the data by using the predetermined data to overwrite the three data queries; and the Guangguan circuit is overwritten by the single data latch The first indication to replace the first indication with the second indication. The non-volatile memory system of member 1, wherein the management circuit performs the plurality of sensing operations for the specific state by using :由施加_第_讀取參考電壓至該第—非揮發儲存元 ^ —執行第一感测操作,該第一讀取參考電壓對應於 ㈣二I:揮發儲存元件可能儲存的一第一組資料,·:及 精由知加一第二讀取參考電壓至該第-非揮發儲存元 件:執仃一第二感測操作,該第二讀取參考電壓對應於 该第二非揮發儲存元件可能儲存的一第二組資料。 如請求項1之非揮發記憶體系統,其中: 該:理電路針對一不同狀態執行複數個感測操作以讀 取該弟非揮發儲存元件,用於該不同狀態的各感測操 =對應於可能儲存於帛於該第三非揮㈣存元件之該組 資料閂内的該不同資料; 2在針對該特定狀態之該等感測操作之該特定者期間 該弟一:揮發儲存元件不傳導,則在對應於目前儲存於 用於該第_非揮發儲存S件之該組資料問内之該資料的 用於4不同狀悲之該等感測操作之_特定者期間該第一 127827.doc 200845011 非揮發儲存元件係傳導時,該管理電路使用不同預定資 8. 料來替換來自該第二非揮發健存元件之該資料。、 如請求項1之非揮發記憶體系統,其中該管理電路: 針對一不同狀態來執行複數個感測操作以讀取該第— 2發館存元件,用於該不同狀態的各感測操作係相關 儲存於用於該第二非揮發儲存元件之該組資料 閂内的該不同資料;Performing a first sensing operation by applying a ___read reference voltage to the first non-volatile storage element, the first read reference voltage corresponding to (four) two I: a first group that may be stored by the volatile storage element Data, and: and a second read reference voltage is applied to the first non-volatile storage element: a second sensing operation is performed, the second read reference voltage corresponding to the second non-volatile storage element A second set of data that may be stored. The non-volatile memory system of claim 1, wherein: the processing circuit performs a plurality of sensing operations for a different state to read the non-volatile storage element, and each sensing operation for the different state corresponds to The different data that may be stored in the set of data latches of the third non-swollen (four) storage element; 2 during the particular one of the sensing operations for the particular state, the first one: the volatile storage element is not conductive And the first 127827 during the _specific period of the sensing operation for the 4 different sorrows corresponding to the data currently stored in the set of data for the _non-volatile storage S piece. Doc 200845011 When the non-volatile storage element is conductive, the management circuit replaces the data from the second non-volatile storage element with a different predetermined material. The non-volatile memory system of claim 1, wherein the management circuit: performs a plurality of sensing operations for a different state to read the second transmitting component for each sensing operation of the different state Corresponding to the different information stored in the set of data latches for the second non-volatile storage element; 決定在用於該不同狀態之該複數個感測操作之一第— 感測操作期間該第一非揮發儲存元件是否傳導; 決定該組資料問是否正鍺存該第二指示,· 回應決定該第-非揮發健存元件是否傳導且該組資料 =疋否正儲存該第二指示,在該組資料問内維持來自該 第二非揮發儲存元件的該資料。 9·如請求項1之非揮發記憶體系統,其中·· 匕當存在該資料係來自該第二非揮發儲存元件之該第一 曰示夺該第#揮發儲存元件在該等感測操作之一第 I感測操作期間傳導,該第—感測操作不㈣於在該組 貧料閂内目前所儲存的該資料;以及 在該第一感測操作之後,該管理電路在該組資料閃内 維持來自該該第二非揮發儲存元件之該資料。 10·如請求項1之非揮發記憶體系統,其中: 該第一非揮發儲存元件係連接至一第—字元線; 該=二非揮發儲存元件係連接至一第二字元線;以及 該貝料係來自該第二非揮發儲存元件的該指示係該資 127827.doc 200845011 料係來自該第二字元線的一指示。 u•如請求項1之非揮發記憶體系統,其中: 該第及第二非揮發儲存元件係第一及第二n AND快 閃記憶體單元。 - I2· 一種讀取非揮發儲存器之方法,其包含·· 回應一要求讀取一第一非揮發儲存元件之請求來讀取 弟一非揮發儲存元件; • 在一組資料閂内儲存讀取來自該第二非揮發儲存元件 的資料; 儲存在該組資料閃内的該資料係來自該第二非揮發儲 存元件的一第一指示; 針對一特定狀態執行複數個感測操作以讀取該第一非 揮發儲存元件,各感測操作對應於可能儲存於用於該第 二非揮發儲存元件之該組資料閂内的不同資料; 若在對應於來自該第二非揮發儲存元件之儲存於該組 • 貝料閂内之該資料的該等感測操作之一特定者期間該第 一非揮發儲#元件係傳導且若在m相内存在該資 料係來自該第二非揮發儲存元件的該指示,則使用用於 該特定狀態之預定資料來替換在該組資㈣内來自該第 - 二非揮發儲存元件的該資料;以及 右替換來自該第二非揮發儲存元件的該資料,則使用 在該組資料問内的該狀資料係來自該第—非揮發儲存 元件的一第二指示來替換該第一指示。 13·如請求項12之方法’其中針對該特定狀態執行該複數個 127827.doc 200845011 感測操作,其包含: *…土土欲禾一非揮發儲存元 件同時施加-第一傳遞電壓至該第二非揮發儲存 執行一第一感測操作’該第-傳遞電壓對應於可能由該 第二非揮發儲存元件儲存的_第一組資料;以及 ^ 稭由施加該第-讀取參考電壓至該第—非揮發儲存元 件同時施加一第二傳遞電壓至該第二非揮發儲:元::Determining whether the first non-volatile storage element is conducting during one of the plurality of sensing operations for the different states; determining whether the group of data is storing the second indication, and responding to the decision Whether the first non-volatile storage element is conductive and the set of data = whether the second indication is being stored, the data from the second non-volatile storage element is maintained in the set of data. 9. The non-volatile memory system of claim 1, wherein the data is present from the second non-volatile storage element and the first volatile material is in the sensing operation. Conducted during a first sensing operation, the first sensing operation not (d) the data currently stored in the set of lean latches; and after the first sensing operation, the management circuit flashes in the set of data The material from the second non-volatile storage element is maintained internally. 10. The non-volatile memory system of claim 1, wherein: the first non-volatile storage element is coupled to a first word line; the = two non-volatile storage element is coupled to a second word line; The indication of the shell material from the second non-volatile storage element is an indication from the second character line of the 127827.doc 200845011. U. The non-volatile memory system of claim 1, wherein: the first and second non-volatile storage elements are first and second n AND flash memory cells. - I2. A method of reading a non-volatile memory, comprising: responding to a request to read a first non-volatile storage element to read a non-volatile storage element; • storing a read in a set of data latches Taking data from the second non-volatile storage element; the data stored in the set of data flashes is a first indication from the second non-volatile storage element; performing a plurality of sensing operations for reading in a particular state The first non-volatile storage element, each sensing operation corresponding to a different material that may be stored in the set of data latches for the second non-volatile storage element; if corresponding to storage from the second non-volatile storage element The first non-volatile storage element is conducted during a particular one of the sensing operations of the data in the set of materials; and if the data is present in the m-phase from the second non-volatile storage element The indication of replacing the data from the second non-volatile storage element in the group (4) with the predetermined material for the particular state; and the right replacement from the second non-volatile material The data storage element, is used within the set of Q data from the shape data of the first line - indicating a second nonvolatile storage element to replace the first indication. 13. The method of claim 12, wherein the plurality of 127827.doc 200845011 sensing operations are performed for the particular state, comprising: *...a non-volatile storage element simultaneously applying - a first transfer voltage to the first The second non-volatile storage performs a first sensing operation 'the first transfer voltage corresponds to the first set of data that may be stored by the second non-volatile storage element; and the straw is applied to the first read reference voltage The first non-volatile storage element simultaneously applies a second transfer voltage to the second non-volatile storage: element:: 執行ϋ測操作,該第二傳遞電壓對應於該第二非 揮發儲存元件可能儲存的一第二組資料。 14·如請求項13之方法,其中: 若在程式化該第-非揮發儲存元件之後該第二非揮發 儲存元件被程式化至一第一狀態,則該第一感測操作補 償該第-非揮發儲存元件之—臨限電壓表觀增加;以及 若在程式化該第一非揮發儲存元件之後該第二非揮發 儲存元件被程式化至一第二狀態,則該第二感測操作補 償該第一非揮發儲存元件之一臨限電壓表觀增加。 15·如請求項12之方法,其中·· “弟及弟一非揮發儲存元件係能夠處於八個資斜肤 態之-的多位準儲存元件; 貝則 可能儲存於該組資料閂内的該不同資料包括對應於該 八個資料狀態的八組個別資料; 該執行複數個感測操作包含執行對應於該八個資料狀 恶的八個感測操作,各感測操作在基於該第二非揮發儲 存元件之/曰在資料狀態來感測該第一非揮發儲存元件 127827.doc 200845011 時提供一不同數量的補償。 16.如明求項15之方法,其中該組資料問包含四個資料閃; 來自該第二非揮發儲存元件之該資料係儲存於三個資 料閂内並該指示係儲存於一單一資料閂内; 、 該替換該資料使用該預定資料來覆寫該三個資料問; 該使用一第二指示來替換該第一指示覆寫儲存於該單 一資料閂内的該第一指示。 f 17·如請求項12之方法,苴中 感測操作包含:〃中針對該特定狀態執行該複數個 :由施加一第一讀取參考電壓至該第一非揮發儲存元 :執::第-感測操作’該第—讀取參考電壓對應於 ^二非揮發儲存元件可能儲存的-第-組資料;以及 错由施加-第二讀取參考電壓至該第一非揮發儲存 =執:::第二感測操作,該第二讀取參考電壓對應於 一非揮發儲存元件可能儲存的-第二組資料。 18·如請求項12之方法,其進一步包含: 針對一不同狀態執行複數個感測操作以讀取該第一 揮發儲存元件,用於該不同㈣的各_操作 儲存於用於該第二_發储存元件之該組㈣ 不同資料; 』門的該 若在用於該特定狀態之該等感測操作之該特 該第-非揮發儲存元件係不料,則在對應於目此儲二 於用於該第二非揮發儲存元件之該組資料_^= 子 的用於該不同狀態之該等感測操作之—特定者_ =第 127827.doc 200845011 -非揮發儲存元件係傳導時,使料同預定資料來替換 來自該第二非揮發儲存元件之該資料。 19.如請求項12之方法,其進一步包含: 、十對不同狀恶執行複數個感測操作以讀取該第一非 揮發儲存元件,用於該不同狀態的各感測操作係相關聯 ;可儲存於用於該第二非揮發儲存元件之該組資料問内 的該不同資料;Performing a speculative operation, the second transfer voltage corresponds to a second set of data that the second non-volatile storage element may store. 14. The method of claim 13, wherein: if the second non-volatile storage element is programmed to a first state after the staging of the first non-volatile storage element, the first sensing operation compensates for the first The non-volatile storage element has an apparent increase in threshold voltage; and if the second non-volatile storage element is programmed to a second state after the first non-volatile storage element is programmed, the second sensing operation compensates One of the first non-volatile storage elements has an apparent voltage increase. 15. The method of claim 12, wherein: "the younger brother and the non-volatile storage component are capable of being in a plurality of quasi-storage elements of eight slanting skin states; the shell may be stored in the set of data latches. The different data includes eight sets of individual data corresponding to the eight data states; the performing the plurality of sensing operations includes performing eight sensing operations corresponding to the eight data states, each sensing operation being based on the second The non-volatile storage element provides a different amount of compensation in the data state to sense the first non-volatile storage element 127827.doc 200845011. 16. The method of claim 15, wherein the set of data includes four Data flashing; the data from the second non-volatile storage element is stored in three data latches and the instructions are stored in a single data latch; and the replacement data uses the predetermined data to overwrite the three data The second indication is used to replace the first indication to overwrite the first indication stored in the single data latch. f 17. The method of claim 12, wherein the sensing operation comprises: Performing the plurality of the specific states: applying a first read reference voltage to the first non-volatile storage element: performing:: a first-sensing operation 'the first-reading reference voltage corresponding to the second non-volatile storage The component may store - the first group of data; and the error by the application - the second read reference voltage to the first nonvolatile storage = hold::: second sensing operation, the second read reference voltage corresponds to a non The second set of data may be stored by the volatile storage element. 18. The method of claim 12, further comprising: performing a plurality of sensing operations for a different state to read the first volatile storage element for the difference (4) Each of the operations is stored in the set of (4) different materials for the second storage element; the "the non-volatile storage element of the door if the sensing operation is used for the particular state" Unexpectedly, in the case of the sensing operations for the different states of the set of data _^= for the second non-volatile storage element, the specific one is _ 127827.doc 200845011 - Non-volatile storage element is conductive The material is replaced with the predetermined data to replace the data from the second non-volatile storage element. 19. The method of claim 12, further comprising: performing a plurality of sensing operations on the ten different pairs to read the first a non-volatile storage element associated with each sensing operation of the different states; the different data stored in the set of data for the second non-volatile storage element; 决…於該不同狀態之該複數個感測操作之一第一 感測操作期間該第-非揮發儲存元件是否傳導; 決定該組資料問是否正儲存該第二指示; =應心該第-非揮發儲存元件是否傳導且該組資料 第疋=儲存該第二指示,在該組資料閃内維持來自該 弟一非揮發儲存元件的該資料。 2〇·如請求項12之方法,其中·· 當:在該資料係來自該第二非揮發儲存元件之該第一 -係= :::發:_在該等感一 ^ 内目前所儲存的該轉残應於在該組資料問 該方法進一步包含為 料問維持來自師: 測操作之後,在該組資 以^弟一非揮發儲存元件之該資料。 127827.docDetermining whether the first non-volatile storage element is conducted during the first sensing operation of the plurality of sensing operations in the different states; determining whether the group information is storing the second indication; Whether the non-volatile storage element is conductive and the set of data 疋=stores the second indication, maintaining the data from the non-volatile storage element in the set of data flashes. 2. The method of claim 12, wherein: when: the data is from the second non-volatile storage element, the first-system = ::: hair: _ is currently stored in the sense The transfer of the fault should be made in the group of information that the method further includes maintaining the information from the teacher: after the test operation, the data in the group is a non-volatile storage element. 127827.doc
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