TW200835692A - Process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives - Google Patents

Process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives Download PDF

Info

Publication number
TW200835692A
TW200835692A TW96150437A TW96150437A TW200835692A TW 200835692 A TW200835692 A TW 200835692A TW 96150437 A TW96150437 A TW 96150437A TW 96150437 A TW96150437 A TW 96150437A TW 200835692 A TW200835692 A TW 200835692A
Authority
TW
Taiwan
Prior art keywords
compound
group
substituted
engineering
reactive substituent
Prior art date
Application number
TW96150437A
Other languages
Chinese (zh)
Other versions
TWI414524B (en
Inventor
Tomohiro Unno
Junichi Morita
Shoji Shinomoto
Yoshihide Sugata
Yutaka Ide
Original Assignee
Shionogi & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shionogi & Co filed Critical Shionogi & Co
Publication of TW200835692A publication Critical patent/TW200835692A/en
Application granted granted Critical
Publication of TWI414524B publication Critical patent/TWI414524B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/78Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D213/79Acids; Esters
    • C07D213/803Processes of preparation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/78Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D213/79Acids; Esters
    • C07D213/80Acids; Esters in position 3
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/78Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D213/81Amides; Imides
    • C07D213/82Amides; Imides in position 3
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D221/00Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
    • C07D221/02Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
    • C07D221/04Ortho- or peri-condensed ring systems
    • C07D221/06Ring systems of three rings
    • C07D221/16Ring systems of three rings containing carbocyclic rings other than six-membered
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D227/00Heterocyclic compounds containing rings having one nitrogen atom as the only ring hetero atom, according to more than one of groups C07D203/00 - C07D225/00
    • C07D227/02Heterocyclic compounds containing rings having one nitrogen atom as the only ring hetero atom, according to more than one of groups C07D203/00 - C07D225/00 with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D227/06Heterocyclic compounds containing rings having one nitrogen atom as the only ring hetero atom, according to more than one of groups C07D203/00 - C07D225/00 with only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D227/08Oxygen atoms
    • C07D227/087One doubly-bound oxygen atom in position 2, e.g. lactams
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/12Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)

Abstract

The present invention provides a convenient process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives, which is the important intermediate of 2-pyridone-3-carbamoyl derivative having cannabinoid receptor agonist activity and also provides a convenient process for preparing 2-pyridone-3-carbamoyl derivatives. The present invention provides a process for preparing the compound of of the following formula (II), which consists of following steps: Step A: hydrolyzing a compound of the following formula (I) (wherein, R1 represents an alkyl group that may be substituted by noe-reactiveness substituents etc.; R2 and R3 independently represents an alkyl group etc.; or R2 and R3 may be combined with the adjacent carbon atom to form a cycloalkene), and Step B: adding an alcohol to the hydrolyzate of the compound produced by the Step A to form a crystal of a compound of the following formula (II) (wherein, R1, R2, R3, and R4 are the same meanings as the above-mentioned).

Description

200835692 , 九、發明說明: 【發明所屬之技術領域】 本發明爲有關具有優異類大麻鹼受體激動劑活性之2-吡 啶酮-3-胺甲醯基衍生物及其重要中間體之製法。 【先前技術】 於專利文獻1及2記載2-吡啶酮-3-胺甲醯基衍生物具有 優異類大麻鹼受體激動劑活性,而對過敏性疾病有用。於 專利文獻3記載2-吡啶酮-3-胺甲醯基衍生物具有5-HT4受 ® 體激動劑活性。於專利文獻1〜3記載2-吡啶酮-3-胺甲醯基 衍生物之製造中重要中間體之1-取代-2-吡啶酮-3-羧酸衍 生物之製法及由該中間體製造2-吡啶酮-3-胺甲醯基衍生物 之方法,爲以高反應產率及/或高純度得化合物須改良操作 等。 【專利文獻1】國際公開第02/53543號小冊 【專利文獻2】國際公開第2006/046778號小冊 【專利文獻3】國際公開第2005/073222號小冊 • 【發明內容】 (發明欲解決之課題) 提供具有類大麻鹼受體激動劑活性之2 -吡啶酮-3 -胺甲醯 基衍生物及其重要中間體1-取代-2-吡啶酮-3-羧酸衍生物 之簡便製法。 (解決課題之手段) 本發明者等鑑於以上諸點,反複致力檢討之結果,發現 具有優異類大麻鹼受體激動劑活性之2-吡啶酮-3-胺甲醯基 -6 - 200835692 衍生物及其重要中間體1-取代-2-吡啶酮-3-羧酸衍生物以 簡便而高產率及高純度獲得之製法。 即本發明爲有關: 1)一種化合物之製法,包括如下工程: 工程A :水解如下式(I)化合物:200835692, IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a process for producing a 2-pyridinone-3-aminecarboxamido derivative having excellent cannabinoid receptor agonist activity and an important intermediate thereof. [Prior Art] The 2-pyridone-3-aminocarbazinyl derivatives described in Patent Documents 1 and 2 have excellent cannabinoid receptor agonist activity and are useful for allergic diseases. Patent Document 3 discloses that a 2-pyridone-3-aminecarboxamido derivative has 5-HT4 receptor agonist activity. Patent Document 1 to 3 describes a process for producing a 1-substituted-2-pyridinone-3-carboxylic acid derivative which is an important intermediate in the production of a 2-pyridone-3-amine methyl hydrazino derivative, and is produced from the intermediate. The method of 2-pyridone-3-aminemethanyl derivative is to improve the compound in high reaction yield and/or high purity, and the like. [Patent Document 1] International Publication No. 02/53543 Booklet [Patent Document 2] International Publication No. 2006/046778 Booklet [Patent Document 3] International Publication No. 2005/073222 Booklet [Invention Content] (Invention Problem to be solved) The convenience of providing a 2-pyridone-3-amine carbaryl derivative having a cannabinoid receptor agonist activity and an important intermediate thereof, a 1-substituted-2-pyridone-3-carboxylic acid derivative System of law. (Means for Solving the Problem) In view of the above, the present inventors have found that 2-pyridone-3-aminecarbomethoxy-6-200835692 derivative having excellent cannabinoid receptor agonist activity has been repeatedly evaluated as a result of repeated review. Its important intermediate 1-substituted-2-pyridone-3-carboxylic acid derivative is obtained in a simple, high yield and high purity. That is, the present invention relates to: 1) a process for the preparation of a compound comprising the following works: Engineering A: Hydrolysis of a compound of the following formula (I):

R3 N^O I R1 (式中R1爲可有非反應性取代基取代之烷基、可有非反 應性取代基取代之烯基、或可有非反應性取代基取代之 炔基; R2及R3各自獨立爲院基、院氧院基、或院氧基;或 R2及R3可與鄰接之碳原子一起形成環烯; R4爲氫原子或羥基; R5爲院基)’及 工程B :於工程A生成之式(I)化合物之水解物添加醇, 而得如下式(Π)化合物:R3 N^OI R1 (wherein R1 is an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent; R2 and R3 Each independently is a hospital base, a courtyard oxygen base, or a hospital oxygen; or R2 and R3 may form a cycloolefin together with an adjacent carbon atom; R4 is a hydrogen atom or a hydroxyl group; R5 is a hospital base)' and Engineering B: in engineering A hydrolyzate of the compound of formula (I) produced by A is added with an alcohol, and a compound of the following formula (Π) is obtained:

(式中R1、R2、R3、及R4同前述意義)。 工程A可於酸之存在下或鹼之存在下施行。工程A於鹼 之存在下施行時,也可於以鹼處理後,添加酸。又也可於 工程B中添加酸。 更包括如下示2)〜18): 200835692 2) 如1)記載之製法,其中工程A及工程b係連續施行。 3) 如1)或2)記載之製法,包括: 工程C :將如下式(III)化合物: R1-NH2 (III) (式中R1與1)同意義),與如下式(IV)化合物反應: R2"^rR3 αν) 〇 (式中R2及R3與1)同意義),及 工程D :將於工程C生成之化合物,與如下式(V)化合物 # 反應: R6O^R4 X (V) R5OOC 八 COOR5 (式中R4及R5與1)同意義;R6爲烷基), 而得如下式⑴化合物: R4(wherein R1, R2, R3, and R4 have the same meanings as defined above). Engineering A can be carried out in the presence of an acid or in the presence of a base. When the work A is carried out in the presence of a base, the acid may be added after the treatment with the alkali. Acid can also be added to Project B. Further includes the following 2) ~ 18): 200835692 2) The method described in 1), in which the engineering A and the engineering b are continuously implemented. 3) The preparation method as described in 1) or 2), including: Engineering C: A compound of the following formula (III): R1-NH2 (III) (wherein R1 and 1) have the same meaning, and reacts with a compound of the following formula (IV) : R2"^rR3 αν) 〇 (where R2 and R3 are the same as 1), and Engineering D: a compound to be produced in Engineering C, reacting with Compound # of the following formula (V): R6O^R4 X (V) R5OOC Eight COOR5 (wherein R4 and R5 are the same as in R); R6 is alkyl), and the compound of formula (1) is as follows: R4

R1 (式中R1、R2、R3、R4、及R5與1)同意義)。 4) 如3)記載之製法,其中R6爲C1-C2烷基。 5) 如1)〜4)中任一項記載之製法,其中R5爲C1-C2烷基 6) —種化合物之製法,包括: 工程C :將如下式(III)化合物: r1-nh2 (III) (式中R1與1)同意義),與如下式(IV)化合物反應: r2、R3 ㈣ 〇 (式中R2及R3與1)同意義), 200835692 工程D :將工程C生成之化合物,與如下式(V)化合物反 應: r6o^r4 X (V) F^OOC^^OOR5 (式中R4及R5與1)同意義;R6與3)同意義), 而生成如下式(I)化合物:R1 (wherein R1, R2, R3, R4, and R5 have the same meaning as 1). 4) The process according to 3), wherein R6 is a C1-C2 alkyl group. 5) The process according to any one of 1) to 4, wherein R5 is a C1-C2 alkyl group 6), comprising: engineering C: a compound of the following formula (III): r1-nh2 (III) (wherein R1 and 1) have the same meaning) and react with a compound of the following formula (IV): r2, R3 (iv) 〇 (wherein R2 and R3 are the same as 1), 200835692 Engineering D: a compound produced by Engineering C, Reacts with a compound of the following formula (V): r6o^r4 X (V) F^OOC^^OOR5 (wherein R4 and R5 have the same meaning as in R); R6 has the same meaning as 3), and a compound of the following formula (I) is formed :

R1 (式中R1、R2、R3、R4、及R5與1)同意義), 工程A :將式(I)化合物水解, 工程B :於工程A生成之式(1)化合物之水解物添加醇,而 得如下(II)化合物:R1 (wherein R1, R2, R3, R4, and R5 have the same meaning as 1), Engineering A: Hydrolysis of the compound of formula (I), Engineering B: Addition of alcohol to the hydrolyzate of the compound of formula (1) produced in Engineering A And obtained the following compound (II):

(式中R1、R2、R3、及R4與1)同意義)’ X程E :將所得式(π)化合物與鹵化試藥反應,而生成如下 式(VI)化合物: R4 Ο(wherein R1, R2, R3, and R4 have the same meanings as 1). X Path E: The obtained compound of the formula (π) is reacted with a halogenated reagent to form a compound of the following formula (VI): R4 Ο

R1R1

Hal (VI) (式中R1、R2、R3、及R4與1)同意義;Hal爲鹵原子),及 工程F :將所得式(VI)化合物,與如下式(VII)化合物反應 200835692 /X、^COOR7 (VII) H2N〆、Y〆 (式中R7爲氫原子或院基;Hal (VI) (wherein R1, R2, R3, and R4 have the same meaning as in 1); Hal is a halogen atom), and Engineering F: The resulting compound of the formula (VI) is reacted with a compound of the following formula (VII): 200835692 /X , ^COOR7 (VII) H2N〆, Y〆 (wherein R7 is a hydrogen atom or a hospital base;

X爲可有雜原子介在而可有非反應性取代基取代之伸烷基 、可有雜原子介在而可有非反應性取代基取代之伸烯基、 可有雜原子介在而可有非反應性取代基取代之伸炔基、可 有非反應性取代基取代之環烷二基、可有非反應性取代基 取代之環烯二基、可有非反應性取代基取代之芳二基、可 有非反應性取代基取代之雜芳二基、或可有非反應性取代 基取代之非芳香族雜環二基;及 Y爲單鍵、可有非反應性取代基取代之伸烷基、可有非反 應性取代基取代之伸烯基、或可有非反應性取代基取代之 伸炔基), 必要時予以水解反應,而得如下式(VIII)化合物: R4〇X is an alkylene group which may have a hetero atom and may be substituted with a non-reactive substituent, an alkenyl group which may have a hetero atom and may have a non-reactive substituent, may have a hetero atom, and may have a non-reaction a substituted alkynyl group substituted with a substituent, a cycloalkanediyl group which may be substituted with a non-reactive substituent, a cycloalkenyldiyl group which may be substituted with a non-reactive substituent, an aryldiyl group which may be substituted with a non-reactive substituent, a heteroaryldiyl group which may have a non-reactive substituent, or a non-aromatic heterocyclic diyl group which may have a non-reactive substituent; and an alkyl group which may be a single bond and may have a non-reactive substituent An alkenyl group which may be substituted with a non-reactive substituent or an alkynyl group which may be substituted with a non-reactive substituent, and if necessary, is hydrolyzed to give a compound of the following formula (VIII): R4〇

/X、v,COOR7 Y (VIII) R1 (式中R1、R2、R3、及R4與1)同意義;R7、X、及Y與上 述同意義)。 7) 如6)記載之製法,其特徵爲連續施行工程E及F。 8) 如6)或7)記載之製法,其中Hal爲氯原子。 9) 如6)〜8)中任一項記載之製法,其中R7爲C1-C2烷基。 10) 如6)〜9)中任一項記載之製法,其中X爲伸烷基、環烷 二基、芳二基、雜芳二基、或非芳香族雜環二基。 11) $D 6)〜1〇)中任一項記載之製法,其中γ爲單鍵或伸烷 基。 -10- 200835692 12) 如3)〜11)中任一項記載之製法,其中連續施行工程c、 .D、A、及 B。 13) 如1)〜12)中任一項記載之製法’其中式(11)化合物以結 晶獲得。 14) 如1)~13)中任一項記載之製法,其中爲氫原子。 15) 如1)〜14)中任一項記載之製法,其中f爲C1-C3烷基 或C1-C3院氧基。 16) 如1)〜15)中任一項記載之製法,其中R3爲^卜C3烷基 # 或C1-C3烷氧基C1-C3烷基。 17) 如1)〜15)中任一項記載之製法,其中&2及爲與鄰接 之碳原子一起爲環辛;烯。 1 8)如1)〜1 7)中任一項記載之製法,其中r 1爲可有非反應 性取代基取代之烷基。 1 9)如1) ~ 1 6)及1 8)中任一項記載之製法,其中r 1爲可有非 反應性取代基取代之烷基,R2爲C1-C3烷基,R3爲C1-C3 烷基,R4爲氫原子,及R5爲C1-C2烷基。 ® 20)如1)〜14)及17)〜18)中任一項記載之製法,其中r1爲可 有非反應性取代基取代之烷基,R2及R3爲與鄰接之碳原 子一起爲環辛燒,R4爲氫原子,及R5爲C1-C2院基。 21) 如1)〜20)中任一項記載之製法,其中添加於水解物之醇 爲異丙醇。 22) —種如下式(II)化合物之結晶之製法,其特徵爲於含如 下式(II)化合物之溶液添加醇 -11 - (II) 200835692 R4/X, v, COOR7 Y (VIII) R1 (wherein R1, R2, R3, and R4 have the same meaning as 1); R7, X, and Y have the same meanings as above. 7) The method described in 6), characterized in that the works E and F are continuously performed. 8) The method according to 6) or 7), wherein Hal is a chlorine atom. 9) The process according to any one of 6), wherein R7 is a C1-C2 alkyl group. 10) The process according to any one of 6), wherein X is an alkylene group, a cycloalkanediyl group, an aryldiyl group, a heteroaryldiyl group or a non-aromatic heterocyclic diyl group. 11) The method according to any one of the preceding claims, wherein γ is a single bond or an alkylene group. -10- 200835692 12) The method of any one of 3) to 11), wherein the works c, .D, A, and B are continuously performed. 13) The process according to any one of 1) to 12) wherein the compound of the formula (11) is obtained by crystallization. 14) The method according to any one of 1) to 13) wherein the hydrogen atom is a hydrogen atom. The process of any one of 1) to 14) wherein f is a C1-C3 alkyl group or a C1-C3 alkoxy group. The process according to any one of 1), wherein R3 is a C3 alkyl group or a C1-C3 alkoxy group C1-C3 alkyl group. (17) The process according to any one of 1) to 15, wherein & 2 is a cyclooctene together with an adjacent carbon atom; The process of any one of 1) to 1 7 wherein r 1 is an alkyl group which may be substituted with a non-reactive substituent. The process of any one of 1) to 1 6), wherein r 1 is an alkyl group which may be substituted with a non-reactive substituent, R 2 is a C 1 -C 3 alkyl group, and R 3 is a C 1 -1 C3 alkyl, R4 is a hydrogen atom, and R5 is a C1-C2 alkyl group. The process of any one of 1) to 14), wherein R1 is an alkyl group which may be substituted with a non-reactive substituent, and R2 and R3 are a ring together with an adjacent carbon atom; Xinhua, R4 is a hydrogen atom, and R5 is a C1-C2 yard. The method according to any one of 1 to 20, wherein the alcohol added to the hydrolyzate is isopropanol. 22) A process for the crystallization of a compound of the following formula (II), characterized in that an alcohol is added to a solution containing a compound of the following formula (II): -11 - (II) 200835692 R4

I R1 (式中R1、R2、R3、及R4爲1)同意義)。 上述溶液中溶劑可爲由芳香族烴類(例如甲苯、二甲苯) 、脂肪族羧酸酯類(例如乙酸乙酯、乙酸甲酯、乙酸丁醋) 、醚類(例如乙醚、四氫呋喃)、酮類(例如丙酮、丁酮)、 Ν,Ν-二甲基乙醯胺、N-甲基吡咯啶酮、及水選擇之溶劑、I R1 (wherein R1, R2, R3, and R4 are 1) have the same meaning). The solvent in the above solution may be an aromatic hydrocarbon (for example, toluene, xylene), an aliphatic carboxylic acid ester (for example, ethyl acetate, methyl acetate, butyl acetate), an ether (for example, diethyl ether, tetrahydrofuran), and a ketone. Classes (eg acetone, methyl ethyl ketone), hydrazine, hydrazine-dimethyl acetamide, N-methyl pyrrolidone, and water-selective solvents,

單獨或混合使用。 23)如22)記載之製法醇爲異丙醇。 又本發明也包含以下之(1)〜(19): (1)一種式(X)化合物之製法,包括 工程Aa :水解如下式(IX)化合物:Used alone or in combination. 23) The process alcohol as described in 22) is isopropanol. Further, the present invention also includes the following (1) to (19): (1) A process for producing a compound of the formula (X), comprising the process Aa: hydrolyzing a compound of the following formula (IX):

(式中Rla爲可有非反應性取代基取代之烷基、可有非反應 性取代基取代之烯基、或可有非反應性取代基取代之炔基 R2a及R3a各自獨立爲烷基、烷氧基烷基、或烷氧基;或 R2a及R3a可與鄰接之碳原子一起形成環烯; R4a爲氫原子或羥基; R5a爲烷基),及 工程Ba:於工程Aa生成之式(IX)化合物之水解物添加醇 ,而生成如下式(X)化合物之結晶: -12- 200835692(wherein Rla is an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent, R2a and R3a are each independently an alkyl group, An alkoxyalkyl group, or an alkoxy group; or R2a and R3a may form a cycloolefin together with an adjacent carbon atom; R4a is a hydrogen atom or a hydroxyl group; R5a is an alkyl group), and engineering Ba: a formula formed in the engineering Aa ( IX) The hydrolyzate of the compound is added with an alcohol to form a crystal of the compound of the following formula (X): -12- 200835692

(式中Rla、R2a、R3a、及R4a與上述同意義)。 工程Aa可於酸之存在下或鹼之存在下施行。工程Aa於 鹼之存在下施行時,以鹼處理後,添加酸。 (2) 如(1)記載之製法,其中工程Aa及工程Ba連續施行。 (3) 如(1)或(2)記載之製法,包括: 工程Ca :令如下式(XI)化合物.: R1a-NH2 (XI) (式中Rla與(1)同意義),與如下式(χπ)化合物反應: R2a^YR 0QI) (式中1^及1^與(1)同意義),及 工程Da :令工程Ca生成之化合物,與如下式(XIII)化合物 反應:(wherein Rla, R2a, R3a, and R4a have the same meanings as described above). Engineering Aa can be carried out in the presence of an acid or in the presence of a base. When the work Aa is carried out in the presence of a base, an acid is added after the treatment with a base. (2) The manufacturing method described in (1), in which the engineering Aa and the engineering Ba are continuously applied. (3) The method described in (1) or (2), including: Engineering Ca: a compound of the following formula (XI): R1a-NH2 (XI) (wherein Rla and (1) have the same meaning), and the following formula (χπ) Compound Reaction: R2a^YR 0QI) (wherein 1^ and 1^ have the same meaning as (1)), and Engineering Da: a compound produced by engineering Ca, which reacts with a compound of the following formula (XIII):

(XIII) (式中R4a及R5a與(1)同意義;R6爲烷基),而生成如下式 (IX)化合物:(XIII) (wherein R4a and R5a have the same meaning as (1); R6 is an alkyl group), and a compound of the following formula (IX) is produced:

(式中 Rla、R2a、R R4a、及11“與(1)同意義)。(wherein Rla, R2a, R R4a, and 11 have the same meaning as (1)).

Ca、Da、Aa、及 Ba 之 (4)如(3) g己載之製法,其中以工程 順序連續施行。 -13- 200835692 (5) 如(3)或(4)g己載之製法,其中尺“爲C1_C2烷基。 (6) 如(1)〜(5)中任一項記載之製法,其中R5a爲。卜C2烷基 〇 (7) —種化合物之製法,包括: 工程Ca :令如下式(XI)化合物: R1a-NH2 (XI) (式中Ria與(1)同意義),與如下式(ΧΠ)化合物反應: R2a^YR3a ㈣ (式中R2a及R3a與(1)同意義),而生成如下式(ΧΠΙ)化合物Ca, Da, Aa, and Ba (4) The method of (3) g, which is carried out continuously in engineering order. -13- 200835692 (5) The method of (3) or (4)g, wherein the ruler is "C1_C2 alkyl. (6) The method described in any one of (1) to (5), wherein R5a The method for preparing a compound of C2 alkyl hydrazine (7), comprising: engineering Ca: a compound of the following formula (XI): R1a-NH2 (XI) (wherein Ria has the same meaning as (1)), and the following formula (ΧΠ) compound reaction: R2a^YR3a (4) (wherein R2a and R3a have the same meaning as (1)), and a compound of the following formula (ΧΠΙ) is formed

(XIII) (式.中11“及R5a與(1)同意義;尺“與㈠)同意義)、 工程Da :令工程Ca所得化合物,與如下式(IX)化合物反 應:(XIII) (Formula 11" and R5a have the same meaning as (1); ruler "with (a))), Project Da: a compound obtained by engineering Ca, which reacts with a compound of the following formula (IX):

(式中 Rla ' R?a、R3a、R“、及 與(1)同意義)、 Π:程Aa:令所得式(Ιχ)化合物水解, 工程Ba:於工程Aa生成之式(IX)化合物之水解物添加醇 ’而得如下式(X)化合物: R4a(wherein Rla 'R?a, R3a, R", and (1) have the same meaning), Π: Process Aa: Hydrolysis of the obtained compound (Ιχ), Engineering Ba: Compound of formula (IX) produced in Engineering Aa The hydrolyzate is added with an alcohol' to obtain a compound of the following formula (X): R4a

f^A^COOH -14- 200835692 (式中Rla、R2a、R3a、及R4a與⑴同意義)、 工程Ea :所得式(X)化合物與鹵化試藥反應,而生成如下 式(XIV)化合物:F^A^COOH -14- 200835692 (wherein Rla, R2a, R3a, and R4a have the same meaning as (1)), and Engineering Ea: the obtained compound of the formula (X) is reacted with a halogenated reagent to form a compound of the following formula (XIV):

(式中Rla、R2a、R3a、及&“與(1)同意義;Hala爲鹵原子), 及 工程Fa :所得式(XIV)化合物,與如下式(XV)化合物反應(wherein Rla, R2a, R3a, and & "the same meaning as (1); Hala is a halogen atom), and Process Fa: a compound of the formula (XIV) obtained, which is reacted with a compound of the following formula (XV)

(式中R7a爲氫原子或烷基;(wherein R7a is a hydrogen atom or an alkyl group;

Xa爲可有雜原子介在而可有非反應性取代基取代之伸烷基 、可有雜原子介在而可有非反應性取代基取代之伸烯基、 可有雜原子介在而可有非反應性取代基取代之伸炔基、可 有非反應性取代基取代之環烷二基、可有非反應性取代基 取代之環烯二基、可有非反應性取代基取代之芳二基、可 有非反應性取代基取代之雜芳二基、或可有非反應性取代 基取代之非芳香族雜環二基;Xa is an alkylene group which may have a hetero atom-substituted and may have a non-reactive substituent, an alkenyl group which may have a hetero atom and may have a non-reactive substituent, may have a hetero atom, and may have a non-reaction a substituted alkynyl group substituted with a substituent, a cycloalkanediyl group which may be substituted with a non-reactive substituent, a cycloalkenyldiyl group which may be substituted with a non-reactive substituent, an aryldiyl group which may be substituted with a non-reactive substituent, a heteroaryldiyl group which may have a non-reactive substituent or a non-aromatic heterocyclic diyl group which may have a non-reactive substituent;

Ya爲單鍵、可有非反應性取代基取代之伸烷基、可有非反 應性取代基取代之伸烯基、或可有非反應性取代基取代之 伸炔基),必要時予以水解反應, 來製造如下式(XVI)化合物: -15- (XVI) 200835692 R4a〇Ya is a single bond, an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent), and if necessary, hydrolyzed Reaction to produce a compound of the following formula (XVI): -15- (XVI) 200835692 R4a〇

xa、Ya,C00R7 與上述同意義)。 (8)如(7)記載之製法,其中工程Ca、Da、Aa、及Ba連續 施行。 (9) 如(7) 載之製法’其中工程E a及F a連續施行。Xa, Ya, C00R7 have the same meaning as above). (8) The method according to (7), wherein the works Ca, Da, Aa, and Ba are continuously performed. (9) As in (7), the production method 'where Ea and F a are continuously applied.

(10) 如(7)〜(9)中任一項記載之製法,其中Hala爲氯原子。 (11) 如(7)〜(10)中任一項記載之製法,其中爲C1-C2烷 基。 (12)如(7)〜(11)中任一項記載之製法,其中Xa爲伸烷基、 環烷二基、芳二基、雜芳二基、或非芳香族雜環二基。 (1 3)如(7)〜(1 2)中任一項記載之製法,其中 γa爲單鍵或伸 烷基。 (14) 如(1)〜(13)中任一項記載之製法,其中ya爲氫原子。 (15) 如(1)〜(14)中任一項記載之製法,其中爲C1-C2烷 基或C1-C2烷氧基。 (16)如(1)〜(15)中任一項記載之製法,其中R3a爲cn-C3烷 基或C1-C2烷氧基C1-C2烷基。 (17)如(1)~(14)中任一項記載之製法,其中及R3a爲與鄰 接之碳原子一起爲環辛烯。 (1 8)如(1)〜(1 7)中任一項記載之製法,其中r 1 a爲可有非反 應性取代基取代之烷基。 (1 9)如(1)〜(1 8)中任一項記載之製法,其中添加於水解物之 -16- 200835692 醇爲異丙醇。 以下說明各用語之意義。各用語爲本說明書中以統一之 意義使用’單獨使用時,或與其他用語組合使用時,也以 同一意義使用。 本說明書中,「雜原子」爲氧原子、硫原子、氮原子。 本說明書中,「鹵原子」爲氟原子、氯原子、溴原子、 碘原子。 本說明書中,「烷基」包含碳原子數1〜8之直鏈或分枝 # 鏈之1價烴基。例如甲基、乙基、正丙基、異丙基、正丁 基、異丁基、第二丁基、第三丁基、正戊基、異戊基、新 戊 基 、正己 基、異己基 、正庚 基、正辛基 等。 宜爲C1-C6 烷 基 。特指 定碳數時, 指具有 其數範圍之 碳數 之 「烷 基 j R1 及 η 「烷基」以 C1-C6烷基較佳。 R2 及 R2a之 「烷基」以 C1-C4 烷基較佳, 更以 C1 -C3 烷 基 較 佳 、C1-C2烷基最佳 〇 R3 及 R3a之 「烷基」以 C1-C4烷基較佳。 R5 及 R5a之 「烷基」以 C1-C4 烷基較佳, 更以 C1 -C3 烷 基 較 佳 〇 R6 及 R6a之 「烷基」以 C1-C4 院基較佳, 更以 C1 -C2 烷 基 較 佳 〇 本 說 明書中 ’ 「院氧基院基」 爲於上述^ 烷基 J 之不 同 碳 原 子 有下述 「院氧基」 1個或 2個取代之基。 例 如甲 氧 甲 基 乙氧甲 基、正丙氧甲基、 異丙氧甲基 [、正 丁 氧甲 基 -17- .200835692 2-甲氧乙基、2-乙氧乙基、2-正丙氧乙基' 1-異丙氧乙基 、丨-正丁氧乙基、3 -甲氧丙基、3 -乙氧丙基、3 -正丙氧丙 基、2-異丙氧丙基、2-正丁氧丙基等。宜爲C1-C4烷氧基 C1-C4烷基。更宜爲C1-C2烷氧基C1-C2烷基。特指定碳 數時,指具有其數範圍之碳數之「烷氧基烷基」。 R2及R2a之「烷氧基烷基」以C1-C4烷氧基C1-C4烷基較 佳,更以C1-C2烷氧基C1-C2烷基較佳。 R3及R3a之「烷氧基烷基」以C1-C4烷氧基C1-C4烷基較 • 佳,更以C1-C2烷氧基C1-C2烷基較佳。 本說明書中,「燒基」爲包含碳原子數2〜8個,而有1 個或2個以上雙鍵之直鏈或分枝鏈之1價之烴基。例如乙 烯基、烯丙基、1-丙烯基、2-丁烯基、2-戊烯基、2-己烯 基、2-庚烯基、2-辛烯基等。宜爲C2-C6烯基。特指定碳 數時,指具有其數範圍之碳數之「烯基」。 R1及Rla2「烯基」以C2-C6烯基較佳。 0 本說明書中,「炔基」爲包含碳原子數2〜8個,而有工 個或2個以上三鍵之直鏈或分枝鏈之1價烴基。例如乙炔 基、1-丙炔基、2-丙炔基、2-丁炔基、2-戊炔基、2-己炔基 、2-庚炔基、2-辛炔基等。宜爲C2-C6炔基。特指定碳數 時’指具有其數範圍之碳數之「烯基」。 R1及Rla之「炔基」以C2-C6炔基較佳。 本說明書中,「環烷基」包含碳原子數爲3〜8個之環烷 基。例如環丙基、環丁基、環戊基、環己基、環庚基、環 半基。宜爲C 3 - C 6環院基。特指定碳數時,指具有其數範 -18- 200835692 圍之碳數之「環烷基」。 本說明書中,「環烯基」包含碳原子數爲3〜8個之環烯 基。例如環丙烯基、環丁烯基、環戊烯基、環己烯基、環 庚烯基、環辛烯基。宜爲C 3-C6環烯基。特指定碳數時, 指具有其數範圍之碳數之「環烯基」。 本說明書中,「R2及R3可與鄰接之碳原子一起形成環烯 」之「環烯」爲R2鄰接之碳原子與R3鄰接之碳原子之間 有1個雙鍵之5〜10員環之環烯。例如環戊烯、環己烯、 # 環庚烯、環辛烯、環 烯、及環癸烯。宜爲C5-C8環烯。 更宜爲環辛烯。特指定碳數時,指具有其數範圍之碳數之 「環烯基」。 本說明書中,「1122及R3a可與鄰接之碳原子一起形成環 烯」之「環烯」爲只於&23鄰接之碳原子與R3a鄰接之碳原 子之間有1個雙鍵之5〜1 0員環之環烯。例如環戊烯、環 己烯、環庚烯、環辛烯、環 烯、及環癸烯。宜爲C5-C8 環烯。更宜爲環辛烯。特指定碳數時,指具有其數範圍之 ® 碳數之「環烯基」。 本說明書中,「烷氧基」爲於氧原子有上述「烷基」1 個取代之基。例如甲氧基、乙氧基、正丙氧基、異丙氧基 、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、正戊 氧基、異戊氧基、2-戊氧基、3-戊氧基、正己氧基、異己 氧基、2-己氧基、3-己氧基、正庚氧基、正辛氧基等。宜 爲C1-C6烷氧基。更宜爲C1-C4烷氧基。特指定碳數時, 指具有其數範圍之碳數之「烷氧基」。 -19- 200835692 R2及R2a之「烷氧基」以(M-C4烷氧基較佳,更以CL· C2烷氧基較佳。 R3及R3a之「烷氧基」以CM-C4烷氧基較佳。 本說明書中,「烯氧基」爲於氧原子有上述「烯基」1 個取代之基。例如乙烯氧基、烯丙氧基、卜丙烯氧基、2-丁烯氧基、2 -戊烯氧基、2 -己烯氧基、2 -庚烯氧基、2 -辛 烯氧基等。宜爲C2_C6烯氧基。更宜爲C2-C4烯氧基。特 指定碳數時,指具有其數範圍之碳數之「烯氧基」。 9 本說明書中,「炔氧基」爲於氧原子有上述「烯基」1 個取代之基。例如乙炔氧基、1-丙炔氧基、2-丙炔氧基、 2-丁炔氧基、2-戊炔氧基、2-己炔氧基、2-庚炔氧基、2-辛 炔氧基等。宜爲C2-C6炔氧基。更宜爲C2-C4炔氧基。特 指定碳數時,指具有其數範圍之碳數之「炔氧基」。 本說明書中,「環烷氧基」爲於氧原子有上述「環烷基 」1個取代之基。例如環丙氧基、環丁氧基、環戊氧基、 環己氧基、環庚氧基、環辛氧基。宜爲C3-C6環烷氧基。 ® 特指定碳數時,指具有其數範圍之碳數之「環烷氧基」。 本說明書中,「烷硫基」爲於硫原子有上述「烷基」1 個取代之基。例如甲硫基、乙硫基、正丙硫基、異丙硫基 、正丁硫基、異丁硫基、第二丁硫基、第三丁硫基、正戊 硫基、異戊硫基、2-戊硫基、3-戊硫基、正己硫基、異己 硫基、2-己硫基、3-己硫基、正庚硫基、正辛硫基等。宜 爲C1-C6烷硫基。更宜爲C1-C4烷硫基。特指定碳數時’ 指具有其數範圍之碳數之「烷硫基」。 -20- 200835692 本說明書中,「烯硫基」爲於硫原子有上述「烯基」1 個取代之基。例如乙烯硫基、烯丙硫基、1 -丙烯硫基、2-丁烯硫基、2-戊烯硫基、2-己烯硫基、2-庚烯硫基、2-辛 烯硫基等。宜爲C2-C6烯硫基。更宜爲C2-C4烯硫基。特 指定碳數時,指具有其數範圍之碳數之「烯硫基」。 本說明書中,「炔硫基」爲於硫原子有上述「炔基」1 個取代之基。例如乙炔硫基、1-丙炔硫基、2-丙炔硫基、 2 -丁炔硫基、2 -戊炔硫基、2 -己炔硫基、2 -庚炔硫基、2 -辛 • 炔硫基等。宜爲C2-C6炔硫基。更宜爲C2-C4炔硫基。特 指定碳數時,指具有其數範圍之碳數之「炔硫基」。 本說明書中,「環烷硫基」爲於硫原子有上述「環烷基 」1個取代之基。例如環丙硫基、環丁硫基、環戊硫基、 環己硫基、環庚硫基、環辛硫基。宜爲C3-C6環烷硫基。 特指定碳數時,指具有其數範圍之碳數之「環烷硫基」。 本說明書中,「伸烷基」爲碳數1〜10之直鏈狀或分枝狀 之伸烷基。例如亞甲基、1 -甲基亞甲基、1,卜二甲基亞甲 Φ 基、伸乙基、1-甲基伸乙基、卜乙基伸乙基、1,卜二甲基伸 乙基、1,2-二甲基伸乙基、1,卜二乙基伸乙基、1,2_二乙基 伸乙基、1-乙基-2-甲基伸乙基、三亞甲基、丨-甲基三亞甲 基、2-甲基三亞甲基、1,1-二甲基三亞甲基、I,2-二甲基三 亞甲基、2,2-二甲基三亞甲基、卜乙基三亞甲基、2-乙基三 亞甲基、1,1-二乙基三亞甲基、1,2-二乙基三亞甲基、2,2-二乙基三亞甲基、2-乙基-2-甲基三亞甲基、四亞甲基、^ 甲基四亞甲基、2-甲基四亞甲基、M-二甲基四亞甲基、 •21 - 200835692 1,2-二甲基四亞甲基、2,2-二甲基四亞甲基、2,2-二-正丙基 三亞甲基、1-異丁基伸乙基、1-(2,2-二甲基丙基)亞甲基、 1-第三丁基伸乙基、1-異丁基三亞甲基等。特指定碳數時 ,指具有其數範圍之碳數之「伸烷基」。 本說明書中,「可有雜原子介在而可有非反應性取代基 取代之伸烷基」爲下述「可有非反應性取代基取代之伸烷 基」之伸烷基之亞甲基部分可有上述「雜原子」於無鄰接 之1處或2處取代之基。「可有雜原子介在之伸烷基」可 爲例如亞甲基、1_甲基亞甲基、1,1-二甲基亞甲基、伸乞 基、1 -甲基伸乙基、1-乙基伸乙基、1,1 — _'甲基伸乙基、 1,2-二甲基伸乙基、1,1-二乙基伸乙基、l,2-二乙基伸乙基 、1-乙基-2-甲基伸乙基、三亞甲基、1-甲基三亞甲基、2-甲基三亞甲基、1,1-二甲基三亞甲基、1,2-二甲基三亞甲基 、2,2-二甲基三亞甲基、1-乙基三亞甲基、2-乙基三亞甲基 、1,1-二乙基三亞甲基、1,2-二乙基三亞甲基、2,2-二乙基 三亞甲基、2-乙基-2-甲基三亞甲基、四亞甲基、1-甲基四 亞甲基、2-甲基四亞甲基、1,1-二甲基四亞甲基、1,2-二甲 基四亞甲基、2,2-二甲基四亞甲基、2,2-二-正丙基三亞甲 基、1-異丁基伸乙基、1-(2,2-二甲基丙基)亞甲基、1-第三 丁基伸乙基、1-異丁基三亞甲基、亞甲氧亞甲基、亞甲硫 亞甲基、亞甲基(N-甲胺基)亞甲基、伸乙氧亞甲基、伸乙 硫亞甲基、伸乙基(N-甲胺基)亞甲基、亞甲氧伸乙基、亞 甲硫伸乙基、亞甲基(N-甲胺基)伸乙基、三亞甲氧亞甲基 、三亞甲氧伸乙基、三亞甲氧三亞甲基、1-異丁基亞甲氧 -22- 200835692 亞甲基、1-(2,2-二甲基丙基)亞甲氧亞甲基、1-第三丁基亞 甲氧亞甲基、1-異丁基伸乙氧亞甲基、卜異丁基亞甲氧伸 乙基等。特指定碳數時,指具有其數範圍之碳數之「可有 雜原子介在之伸院基」。 本說明書中,「伸烯基」爲碳數2〜10之直鏈狀或分枝狀 之伸烯基。例如伸乙烯基、1 -甲基伸乙烯基、1 -乙基伸乙 烯基、1,2-二甲基伸乙烯基、1,2-二乙基伸乙烯基、丨_乙 基-2 -甲基伸乙燃基、伸丙燒基、甲基-2-伸丙儲基、2 -甲 ® 基-2-伸丙烯基、ι,κ二甲基-2-伸丙烯基、1,2-二甲基-2-伸 丙烯基、1-乙基-2-伸丙燃基、2 -乙基-2-伸丙嫌基、1,1·二 乙基-2-伸丙烯基、l,2-二乙基-2-伸丙烯基、1-伸丁烯基、 2-伸丁烯基' 1-甲基-2-伸丁烯基、2 -甲基-2-伸丁烯基、 1,1-二甲基-2-伸丁烯基、ι,2-二甲基-2-伸丁烯基、1-異丁 基伸乙烯基、1-(2,2-二甲基丙基)-2-伸丙烯基、1-第三丁 基-2-伸丙烯基、1-異丁基伸丙烯基等。特指定碳數時, ^ 指具有其數範圍之碳數之「伸烯基」。 「可有雜原子介在而可有非反應性取代基取代之伸烯基 」爲下述「可有非反應性取代基取代之伸烯基」之伸烷基 之亞甲基部分可有上述「雜原子」於無鄰接之1處或2處 取代之基。「可有雜原子介在之伸烯基」可爲例如伸乙烯 基、1-甲基伸乙烯基、丨_乙基伸乙烯基、i,2_二甲基伸乙烯 基、1,2·二乙基伸乙烯基、乙基-2 -甲基伸乙烯基、伸丙 烯基、1-甲基-2-伸丙烯基、2-甲基-2-伸丙烯基、1,卜二甲 基-2-伸丙烯基、ι,2-二甲基-2-伸丙烯基、1-乙基-2-伸丙烯 -23- 200835692 基、2-乙基-2-伸丙烯基、1,卜二乙基-2-伸丙烯基、1,2-二 乙基-2-伸丙烯基、1-伸丁烯基、2-伸丁烯基、1-甲基-2-伸 丁烯基、2 -甲基-2-伸丁烯基、1,1-二甲基-2-伸丁烯基、 1,2-二甲基-2-伸丁烯基、1-異丁基伸乙烯基、l-(2,2-二甲 基丙基)-2 -伸丙烯基、1-第三丁基-2-伸丙烯基、1-異丁基-2-伸丙烯基、1-甲基-2-伸丁烯氧亞甲基、1-異丁基-2-伸丁 烯氧亞甲基、1-(2,2-二甲基丙基)-2-伸丁烯氧亞甲基、1-第 三丁基-2-伸丁烯氧亞甲基等。特指定碳數時,指具有其數 # 範圍之碳數之「可有雜原子介在之伸烯基」。 本說明書中,「伸炔基」爲碳數2〜10之直鏈狀或分枝狀 之伸炔基。例如伸乙炔基、伸丙炔基、1 -甲基-2-伸丙炔基 、1-乙基-2-伸丙炔基、伸丁炔基、1-甲基-2-伸丁炔基、2-甲基-3-伸丁炔基、1,1-二甲基-2_伸丁炔基、1,2-二甲基- 3-伸丁炔基、2,2 -二甲基-3-伸丁炔基、1-異丁基伸乙炔基、 1-(2,2-二甲基丙基)-伸丙炔基、1-第三丁基-伸丙炔基、1_ 異丁基-伸丙炔基等。特指定碳數時,指具有其數範圍之碳 • 數之「伸炔基」。 本說明書中,「可有雜原子介在而可有非反應性取代基 取代之伸炔基」爲下述「可有非反應性取代基取代之伸炔 基」之伸烷基之亞甲基部分可有上述「雜原子」於無鄰接 之1處或2處取代之基。「可有雜原子介在之伸炔基」可 爲例如伸乙炔基、伸丙炔基、1-甲基-2-伸丙炔基、1-乙基-2 -伸丙炔基、伸丁炔基、1 -甲基-2 -伸丁炔基、2 -甲基-3 -伸 丁炔基、1,1 -二甲基-2 -伸丁炔基、1,2 -二甲基-3 -伸丁炔基 •24- 200835692 、2,2-二甲基-3-伸丁炔基、1-異丁基伸乙炔基、丨-以々-二 甲基丙基)-伸丙炔基、1-第三丁基-伸丙炔基、1-異丁基-伸 丙炔基、卜甲基-2-伸丁炔氧亞甲基、1-異丁基-2-伸丁炔氧 亞甲基、1-(2,2·二甲基丙基)-2-伸丁炔氧亞甲基、1-第三丁 基-2-伸丁炔氧亞甲基等。特指定碳數時,指具有其數範圍 之碳數之「可有雜原子介在之伸炔基」。 本說明書中,「芳基」包含單環狀或稠合環狀芳香族烴 。此可與前述「環烷基」、前述「環烯基」、後述「非芳 香族雜環基」於所有可能之位置稠合。芳基爲單環及稠合 環之任何情形,也可於所有可能之位置結合。例如苯基、 卜萘基、2-萘基、蒽基、四氫萘基、ι,3-苯并二噚茂基、 1,4-苯并二噚烷基等。宜爲苯基、i_萘基、2_萘基。更宜爲 苯基。 本說明書中,「雜芳基」爲環内含任意選自氧、硫或氮 之1個以上原子之5〜6員芳香環。此可與前述「環烷基」 、前述「芳基」、後述「非芳香族雜環基」、或其他雜芳 基於所有可能之位置稠合。雜芳基爲單環及稠合環之任何 情形,也可於所有可能之位置結合。例如吡咯基(例如1 _ 吡咯基、2-吡咯基、3-吡咯基)、呋喃基(例如2-呋喃基、 3-呋喃基)、噻吩基(例如2-噻吩基、3-噻吩基)、咪唑基(例 如2 -咪哩基、4 -咪唑基)、吡唑基(例如1 -吡唑基、3 ·吡唑 基)、異噻唑基(例如3 -異噻唑基)、異噚唑基(例如3 -異曙 唑基)、曙唑基(例如2-噚唑基)、噻唑基(例如2-噻唑基)、 吡啶基(例如2_吡啶基、3-吡啶基、4-吡啶基)、吡阱基(例 -25- 200835692 如2-吡哄基)、嘧啶基(例如2-嘧啶基、4-嘧啶基)、嗒畊基 (例如3-嗒哄基)、四唑基(例如1H-四唑基)、噚二唑基(例 如1,3,4 -噚二唑基)、噻二唑基(例如1,3,4 -噻二唑基)、吲 阱基(例如2-吲畊基、6-吲阱基)、異吲哚基(例如2-異吲哚 基)、吲哚基(例如1-吲哚基、2-吲哚基、3-吲哚基)、吲唑 基(例如3-吲唑基)、嘌呤基(例如8-嘌呤基)、喹畊基(例如 2-喹哄基)、異喹啉基(例如3-異喹啉基)、喹啉基(例如2-喹啉基、5-喹啉基)、呔哄基(例如1-呔畊基)、萘啶基(例 如2-萘啶基)、喹喏喃基(例如2-喹喏喃基)、喹唑啉基(例 如2-喹唑啉基)、哮啉基(例如3-哮啉基)、喋啶基(例如2-喋啶基)、咔唑基(例如.2-咔唑基、4-咔唑基)、啡啶基(例 如2-啡啶基、3-啡啶基)、吖啶基(例如1-吖啶基、2-吖啶 基)、二苯并呋喃基(例如1-二苯并呋喃基、2 -二苯并呋喃 基)、苯并咪唑基(例如2-苯并咪唑基)、苯并異噚唑基(例 如3-苯并異噚唑基)、苯并噚唑基(例如2-苯并噚唑基)、苯 并噚二唑基(例如4-苯并噚二唑基)、苯并異噻唑基(例如3-苯并異噻唑基)、苯并噻唑基(例如2-苯并噻唑基)、苯并呋 喃基(例如3-苯并呋喃基)、苯并噻吩基(例如2-苯并噻吩基 )、二苯并噻吩基(例如2-二苯并噻吩基)、苯并二曙茂基( 例如1,3-苯并二噚茂基)等。 本說明書中,「非芳香族雜環基」爲環内含1個以上氮 原子,更可含氧原子及/或硫原子之3〜12員非芳香族雜環 基。例如吡咯啶基、吡咯啉基、咪唑啶基、咪唑啉基、吡 唑啶基、吡唑啉基、哌啶基、二氫吡啶基、四氫吡啶基、 -26 - 200835692 哌阱基、二氫吡哄基、四氫吡畊基、二氫嘧啶基、四氫嘧 啶基、全氫嘧啶基等。 本說明書中,「芳氧基」爲氧原子有前述「芳基」1個 取代之基。例如苯氧基、萘氧基等。 本說明書中,「芳硫基」爲於硫原子有前述「芳基」1 個取代之基。例如苯硫基、萘硫基等。 本說明書中,「雜芳氧基」爲於氧原子有前述「雜芳基 」1個取代之基。例如吡咯氧基、呋喃氧基、噻吩氧基、 ® 咪唑氧基、吡唑氧基、異噻唑氧基、異噚唑氧基、噚唑氧 基、噻唑氧基、吡啶氧基、吡阱氧基、嘧啶氧基、嗒畊氧 基、四唑氧基、噚二唑氧基、噻二唑氧基、吲阱氧基、異 吲哚氧基、吲哚氧基、吲唑氧基、嘌呤氧基、喹畊氧基、 異喹啉氧基、喹啉氧基、呔阱氧基、萘啶氧基、喹喏喃氧 基、喹唑啉氧基、哮啉氧基、喋啶氧基、咔唑氧基、啡啶 氧基、吖啶氧基、二苯并呋喃氧基、苯并咪唑氧基、苯并 異Dfn坐氧基、苯并噚哩氧基、苯并吗二唑氧基、苯并異噻 ® 唑氧基、苯并噻唑氧基、苯并呋喃氧基、苯并噻吩氧基、 二苯并噻吩氧基、苯并二噚茂氧基等。宜爲呋喃氧基、噻 吩氧基、咪唑氧基、吡唑氧基、異噻唑氧基、異噚唑氧基 、曙唑氧基、噻唑氧基、吡啶氧基、吡阱氧基、嘧啶氧基 、嗒畊氧基等。 本說明書中,「雜芳硫基」爲於硫原子有前述「雜芳基 」1個取代之基。例如吡咯硫基、呋喃硫基、噻吩硫基、 咪唑硫基、吡唑硫基、異噻唑硫基、異噚唑硫基、Df嗤硫 -27- 200835692 基、噻唑硫基、吡啶硫基、吡阱硫基、嘧啶硫基、嗒阱硫 基、四唑硫基、噚二唑硫基、噻二唑硫基、吲阱硫基、異 吲哚硫基、吲哚硫基、吲唑硫基、嘌呤硫基、喹畊硫基、 異喹啉硫基、喹啉硫基、呔畊硫基、萘啶硫基、喹喏喃硫 基、喹唑啉硫基、哮啉硫基、喋啶硫基、咔唑硫基、啡啶 硫基、吖啶硫基、二苯并呋喃硫基、苯并咪唑硫基、苯并 異噚唑硫基、苯并噚唑硫基、苯并曙二唑硫基、苯并異噻 唑硫基、苯并噻唑硫基、苯并呋喃硫基、苯并噻吩硫基、 • 二苯并噻吩硫基、苯并二Df茂硫基等。宜爲呋喃硫基、噻 吩硫基、咪唑硫基、吡唑硫基、異噻唑硫基、異噚唑硫基 、噚唑硫基、噻唑硫基、吡啶硫基、吡阱硫基、嘧啶硫基 、嗒阱硫基等。 本說明書中,「環烷二基」爲上述「環烷基」更有1個 鍵結之基。例如環戊烷二基、環己烷二基、環辛烷二基等 〇 本說明書中,「環烯二基」爲上述「環烯基」更有1個 ® 鍵結之基。例如1-環戊烯二基、1-環己烯二基、1-環辛烯 二基等。 本說明書中,「芳二基」爲上述「芳基」更有1個鍵結 之基。例如苯、萘二基等。 本說明書中,「雜芳二基」爲上述「雜芳基」更有1個 鍵結之基。例如吡咯二基、呋喃二基、噻吩二基、吡唑二 基、咪唑二基、異噻唑二基、異噚唑二基、噚唑二基、噻 唑二基、吡啶二基、嘧啶二基、嗒畊二基、噚二唑二基、 -28-(10) The process according to any one of (7) to (9) wherein Hala is a chlorine atom. (11) The process according to any one of (7) to (10) wherein it is a C1-C2 alkyl group. (12) The process according to any one of (7) to (11) wherein Xa is an alkylene group, a cycloalkanediyl group, an aryldiyl group, a heteroaryldiyl group or a non-aromatic heterocyclic diyl group. The process of any one of (7) to (1), wherein γa is a single bond or an alkylene group. (14) The method according to any one of (1) to (13) wherein ya is a hydrogen atom. (15) The process according to any one of (1) to (14) wherein it is a C1-C2 alkyl group or a C1-C2 alkoxy group. (16) The process according to any one of (1) to (15) wherein R3a is a cn-C3 alkyl group or a C1-C2 alkoxy C1-C2 alkyl group. (17) The process according to any one of (1) to (14) wherein R3a is cyclooctene together with an adjacent carbon atom. The process of any one of (1) to (17), wherein r 1 a is an alkyl group which may be substituted with a non-reactive substituent. (1) The process according to any one of (1) to (18) wherein the alcohol added to the hydrolyzate is -16-200835692 and the alcohol is isopropanol. The meaning of each term is explained below. The terms used in this specification in a uniform sense are used in the same sense when used alone or in combination with other terms. In the present specification, the "hetero atom" is an oxygen atom, a sulfur atom or a nitrogen atom. In the present specification, the "halogen atom" is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. In the present specification, the "alkyl group" includes a linear or branched 1-chain hydrocarbon group having 1 to 8 carbon atoms. For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, t-butyl, n-pentyl, isopentyl, neopentyl, n-hexyl, isohexyl , n-heptyl, n-octyl and so on. It is preferably a C1-C6 alkyl group. When a specific carbon number is specified, it is preferred that the "alkyl group j R1 and η "alkyl group" having a carbon number in the range thereof are preferably a C1-C6 alkyl group. The "alkyl group" of R2 and R2a is preferably a C1-C4 alkyl group, more preferably a C1-C3 alkyl group, a C1-C2 alkyl group is preferably 〇R3, and an "alkyl group" of R3a is a C1-C4 alkyl group. good. The "alkyl group" of R5 and R5a is preferably a C1-C4 alkyl group, more preferably a C1-C3 alkyl group, and the "alkyl group" of R6 and R6a is preferably a C1-C4 group, more preferably a C1-C2 alkane. Preferably, in the present specification, the "household oxygen base" is one or two substituents of the following "household oxygen" in the different carbon atoms of the above alkyl group. For example, methoxymethylethoxymethyl, n-propoxymethyl, isopropoxymethyl [, n-butoxymethyl-17-.200835692 2-methoxyethyl, 2-ethoxyethyl, 2-positive Propoxyethyl ' 1-isopropoxyethyl, 丨-n-butoxyethyl, 3-methoxypropyl, 3-ethoxypropyl, 3-n-propoxypropyl, 2-isopropyloxypropyl , 2-n-butoxypropyl and the like. It is preferably a C1-C4 alkoxy group C1-C4 alkyl group. More preferably, it is a C1-C2 alkoxy C1-C2 alkyl group. When a specific carbon number is specified, it means an "alkoxyalkyl group" having a carbon number in the range of the number. The "alkoxyalkyl group" of R2 and R2a is preferably a C1-C4 alkoxy C1-C4 alkyl group, more preferably a C1-C2 alkoxy C1-C2 alkyl group. The "alkoxyalkyl group" of R3 and R3a is preferably a C1-C4 alkoxy C1-C4 alkyl group, more preferably a C1-C2 alkoxy C1-C2 alkyl group. In the present specification, the "alkyl group" is a monovalent hydrocarbon group containing a linear or branched chain having 2 to 8 carbon atoms and having one or two or more double bonds. For example, vinyl, allyl, 1-propenyl, 2-butenyl, 2-pentenyl, 2-hexenyl, 2-heptenyl, 2-octenyl and the like. It is preferably a C2-C6 alkenyl group. When a specific carbon number is specified, it means an "alkenyl group" having a carbon number in its range. R1 and Rla2 "alkenyl" are preferably C2-C6 alkenyl. In the present specification, the "alkynyl group" is a monovalent hydrocarbon group containing a linear or branched chain having 2 to 8 carbon atoms and having two or more triple bonds. For example, ethynyl, 1-propynyl, 2-propynyl, 2-butynyl, 2-pentynyl, 2-hexynyl, 2-heptynyl, 2-octynyl and the like. It is preferably a C2-C6 alkynyl group. When a specific carbon number is specified, 'the number refers to an "alkenyl group" having a carbon number in the range of the number. The "alkynyl group" of R1 and Rla is preferably a C2-C6 alkynyl group. In the present specification, "cycloalkyl group" includes a cycloalkyl group having 3 to 8 carbon atoms. For example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclohetero. It should be a C 3 - C 6 ring yard base. When a specific carbon number is specified, it means a "cycloalkyl group" having a carbon number of -18-200835692. In the present specification, "cycloalkenyl group" includes a cycloalkyl group having 3 to 8 carbon atoms. For example, cyclopropenyl, cyclobutenyl, cyclopentenyl, cyclohexenyl, cycloheptenyl, cyclooctenyl. It is preferably a C 3-C6 cycloalkenyl group. When a specific carbon number is specified, it means a "cycloalkenyl group" having a carbon number in the range of the number. In the present specification, the "cycloolefin" in which "R2 and R3 may form a cyclic olefin together with an adjacent carbon atom" is a 5- to 10-member ring having a double bond between a carbon atom adjacent to R2 and a carbon atom adjacent to R3. Cycloolefin. For example, cyclopentene, cyclohexene, #cycloheptene, cyclooctene, cycloolefin, and cyclodecene. It is preferably a C5-C8 cyclic olefin. More preferably cyclooctene. When a specific carbon number is specified, it means a "cycloalkenyl group" having a carbon number in the range of the number. In the present specification, the "cycloolefin" in which "1122 and R3a may form a cyclic olefin together with an adjacent carbon atom" is a single bond having a double bond between a carbon atom adjacent to the & 23 and a carbon atom adjacent to R3a. 10 ring ring of cycloolefin. For example, cyclopentene, cyclohexene, cycloheptene, cyclooctene, cycloolefin, and cyclodecene. It is preferably a C5-C8 cycloolefin. More preferably cyclooctene. When a specific carbon number is specified, it means a "cycloalkenyl group" having a carbon number in the range of ® . In the present specification, the "alkoxy group" is a group having one substituent of the above-mentioned "alkyl group" in the oxygen atom. For example, methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, second butoxy, tert-butoxy, n-pentyloxy, isopentyloxy 2-pentyloxy, 3-pentyloxy, n-hexyloxy, isohexyloxy, 2-hexyloxy, 3-hexyloxy, n-heptyloxy, n-octyloxy and the like. It is preferably a C1-C6 alkoxy group. More preferably, it is a C1-C4 alkoxy group. When a specific carbon number is specified, it means an "alkoxy group" having a carbon number in the range of the number. -19- 200835692 The "alkoxy group" of R2 and R2a is preferably (M-C4 alkoxy group, more preferably CL. C2 alkoxy group. "Alkoxy group" of R3 and R3a is CM-C4 alkoxy group. In the present specification, the "alkenyloxy group" is a group having one substituent of the above "alkenyl group" in the oxygen atom. For example, a vinyloxy group, an allyloxy group, a propyleneoxy group, a 2-butenyloxy group. 2 -pentenyloxy, 2-hexenyloxy, 2-heptenyloxy, 2-octeneoxy, etc. Preferably, it is a C2_C6 alkenyloxy group, more preferably a C2-C4 alkenyloxy group. In the present specification, the "alkenyloxy group" has a carbon number in the range of the number. In the present specification, the "alkynyloxy group" is a group having one substituent of the above-mentioned "alkenyl group" in the oxygen atom. For example, acetyleneoxy group, 1 - propynyloxy, 2-propynyloxy, 2-butynyloxy, 2-pentynyloxy, 2-hexynyloxy, 2-heptynyloxy, 2-octynyloxy, etc. It is preferably a C2-C6 alkynyloxy group. More preferably, it is a C2-C4 alkynyloxy group. When a carbon number is specified, it means an "alkynyloxy group" having a carbon number in the range of the number. In the present specification, "cycloalkoxy" is The oxygen atom has one substituent of the above "cycloalkyl group", for example, a cyclopropoxy group or a cyclobutoxy group. , cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, cyclooctyloxy. It is preferably a C3-C6 cycloalkoxy. When a specific carbon number is specified, it refers to a "cycloalkane" having a carbon number in its range. In the present specification, the "alkylthio group" is a group having one substituent of the above "alkyl group" in the sulfur atom. For example, a methylthio group, an ethylthio group, a n-propylthio group, an isopropylthio group, a n-butyl group. Sulfur, isobutylthio, second butylthio, tert-butylthio, n-pentylthio, isopentylthio, 2-pentylthio, 3-pentylthio, n-hexylthio, isohexylthio, 2-hexylthio, 3-hexylthio, n-heptylthio, n-octylthio, etc., preferably a C1-C6 alkylthio group, more preferably a C1-C4 alkylthio group. The "alkylthio group" of the carbon number in the range of -20-200835692 In the present specification, the "alkenylthio group" is a group having one substituent of the above "alkenyl group" in the sulfur atom. For example, an ethylenethio group or an allyl sulfide. Base, 1-propenylthio, 2-butenylthio, 2-pentenylthio, 2-hexenylthio, 2-heptenethio, 2-octenethio, etc., preferably C2-C6 olefin Sulfur-based. More preferably C2-C4 alkylthio. When the carbon number is specified, it has a range The "alkenylthio group" of the carbon number. In the present specification, the "alkynylthio group" is a group having one substituent of the above "alkynyl group" in the sulfur atom. For example, acetylenethio group, 1-propynylthio group, 2-propene group An alkynylthio group, a 2-butynylthio group, a 2-pentynylthio group, a 2-hexynylthio group, a 2-heptynylthio group, a 2-octyl-alkynylthio group, etc., preferably a C2-C6 alkynylthio group. More preferably, it is a C2-C4 alkynylthio group. When the carbon number is specified, it means an "alkynylthio group" having a carbon number in the range of the number. In the present specification, the "cycloalkylthio group" has the above-mentioned "cycloalkane" in the sulfur atom. A substituted group such as a cyclopropylthio group, a cyclobutylthio group, a cyclopentylthio group, a cyclohexylthio group, a cycloheptylthio group or a cyclooctylthio group. It is preferably a C3-C6 cycloalkylthio group. When a specific carbon number is specified, it means a "cycloalkylthio group" having a carbon number in the range of the number. In the present specification, "alkylene group" is a linear or branched alkyl group having 1 to 10 carbon atoms. For example, methylene, 1-methylmethylene, 1, dimethyldimethylmethylene, ethyl, 1-methylethyl, ethylidene, 1, dimethyl 1,1,2-dimethylexylethyl, 1,diethylethylidene, 1,2-diethylexylethyl, 1-ethyl-2-methylethylidene, trimethylene, anthracene -methyltrimethylene, 2-methyltrimethylene, 1,1-dimethyltrimethylene, I,2-dimethyltrimethylene, 2,2-dimethyltrimethylene, Buethyl Sanya Methyl, 2-ethyltrimethylene, 1,1-diethyltrimethylene, 1,2-diethyltrimethylene, 2,2-diethyltrimethylene, 2-ethyl-2 -methyltrimethylene, tetramethylene, ^methyltetramethylene, 2-methyltetramethylene, M-dimethyltetramethylene, • 21 - 200835692 1,2-dimethyl Tetramethylene, 2,2-dimethyltetramethylene, 2,2-di-n-propyltrimethylene, 1-isobutylexeneethyl, 1-(2,2-dimethylpropyl Methylene, 1-tert-butylethyl, 1-isobutyltrimethylene, and the like. When a specific carbon number is specified, it means an "alkyl group" having a carbon number in the range of the number. In the present specification, the "alkylene group which may have a hetero atom and may have a non-reactive substituent substituted" is a methylene moiety of an alkylene group which may have a non-reactive substituent substituted alkyl group. There may be a group in which the above "hetero atom" is substituted at one or two positions adjacent to each other. The "alkyl group may have a hetero atom" may be, for example, a methylene group, a 1-methylmethylene group, a 1,1-dimethylmethylene group, a fluorenyl group, a 1-methyl-ethyl group, and 1 -ethylethyl, 1,1 - _'methylethyl, 1,2-dimethylethyl, 1,1-diethylethyl, 1,2-diethylethyl, 1 -ethyl-2-methylethyl, trimethylene, 1-methyltrimethylene, 2-methyltrimethylene, 1,1-dimethyltrimethylene, 1,2-dimethyl Trimethylene, 2,2-dimethyltrimethylene, 1-ethyltrimethylene, 2-ethyltrimethylene, 1,1-diethyltrimethylene, 1,2-diethyltriazine Methyl, 2,2-diethyltrimethylene, 2-ethyl-2-methyltrimethylene, tetramethylene, 1-methyltetramethylene, 2-methyltetramethylene, 1,1-dimethyltetramethylene, 1,2-dimethyltetramethylene, 2,2-dimethyltetramethylene, 2,2-di-n-propyltrimethylene, 1 -isobutylexeneethyl, 1-(2,2-dimethylpropyl)methylene, 1-tert-butylethyl, 1-isobutyltrimethylene, methyleneoxymethylene, sub Methylthiomethylene, methylene (N-methylamino) methylene Ethylene oxide, ethylene thiomethylene, ethyl (N-methylamino) methylene, methylene oxide ethyl, methylene sulfide ethyl, methylene (N-methylamine) Base) Ethyl, Trimethylene, Trimethylene, Trimethylene, 1-isobutylmethyleneoxy-22-200835692 Methylene, 1-(2,2- Dimethyl propyl) methyleneoxymethylene, 1-tert-butylmethyleneoxymethylene, 1-isobutyl ethoxymethylene, acetonyl methoxymethylene and the like. When the carbon number is specified, it means that there is a carbon number in the range of the number of carbon atoms. In the present specification, "alkenyl group" is a linear or branched alkenyl group having 2 to 10 carbon atoms. For example, vinyl, 1-methylvinyl, 1-ethylvinyl, 1,2-dimethylvinyl, 1,2-diethylvinyl, 丨-ethyl-2-methyl Ethylene, propyl, methyl-2-propanyl, 2-methylamino-2-propenyl, ι, κ-dimethyl-2-propenyl, 1,2-di Methyl-2-extended propylene, 1-ethyl-2-propanyl, 2-ethyl-2-propenyl, 1,1,diethyl-2-exetylene, l,2 -diethyl-2-extended propylene, 1-butenyl, 2-butenyl' 1-methyl-2-exenbutyl, 2-methyl-2-exenbutyl, 1 , 1-dimethyl-2-butenyl, i,2-dimethyl-2-butenyl, 1-isobutylvinyl, 1-(2,2-dimethylpropyl) -2-Extended propylene group, 1-tert-butyl-2-propenyl group, 1-isobutyl propylene group, and the like. When a carbon number is specified, ^ means an "alkenyl group" having a carbon number in the range of its number. "Extend alkenyl group which may be substituted with a hetero atom and may have a non-reactive substituent" is a methylene moiety of an alkylene group which may be substituted with an alkene group which may be substituted with a non-reactive substituent. A hetero atom is substituted at one or two of the adjacent positions. "Alkenyl groups may be present in the presence of a hetero atom", such as vinyl, 1-methylvinyl, 丨-ethyl, vinyl, i, 2, dimethyl, vinyl, 1,2, 2 Base vinyl, ethyl-2-methylmethyl, propylene, 1-methyl-2-propenyl, 2-methyl-2-propenyl, 1, dimethyl-2- Propylene, i,2-dimethyl-2-exetylene, 1-ethyl-2-Exetylene-23-200835692, 2-ethyl-2-extended propylene, 1, diethyl -2-Extended propylene, 1,2-diethyl-2-exetylene, 1-exenbutenyl, 2-extenylbutene, 1-methyl-2-exetylene, 2-methyl Base-2-exenbutyl, 1,1-dimethyl-2-butenyl, 1,2-dimethyl-2-butenyl, 1-isobutylvinyl, l-( 2,2-Dimethylpropyl)-2-propenyl, 1-tert-butyl-2-propenyl, 1-isobutyl-2-propenyl, 1-methyl-2-stretch Butenoxymethylene, 1-isobutyl-2-cyclobutoxymethyl, 1-(2,2-dimethylpropyl)-2-butenoxymethyl, 1- Tributyl-2-butenyloxymethylene and the like. When the carbon number is specified, it means that there is a carbon number in the range of #, "the hetero atom may be present in the alkenyl group." In the present specification, the "alkenyl group" is a linear or branched alkynyl group having a carbon number of 2 to 10. For example, ethynyl, propynyl, 1-methyl-2-propynyl, 1-ethyl-2-propankynyl, butynyl, 1-methyl-2-butenyl , 2-methyl-3-butenyl, 1,1-dimethyl-2-butynyl, 1,2-dimethyl-3-butenyl, 2,2-dimethyl 3--3-butynyl, 1-isobutyl ethynyl, 1-(2,2-dimethylpropyl)-propargynyl, 1-tert-butyl-propenyl, 1-isobutyl Base-extended propynyl and the like. When a specific carbon number is specified, it means an "alkenyl group" having a carbon number in its range. In the present specification, the "extended alkynyl group which may be substituted with a hetero atom and may have a non-reactive substituent" is a methylene moiety of an alkyl group which may be substituted with an alkynyl group which may be substituted with a non-reactive substituent. There may be a group in which the above "hetero atom" is substituted at one or two positions adjacent to each other. "A heteroacetylene-containing alkynyl group" may be, for example, an ethynyl group, a propynyl group, a 1-methyl-2-propankyne group, a 1-ethyl-2-propankyne group, a butyne group. 1, 1-methyl-2-butenyl, 2-methyl-3-butenyl, 1,1-dimethyl-2-butenyl, 1,2-dimethyl-3 - extended butynyl group 24 - 200835692, 2,2-dimethyl-3-butenyl, 1-isobutyl ethynyl, fluorenyl-dimethyl propyl)-propargynyl, 1-tert-butyl-proparginyl, 1-isobutyl-propenyl, b-methyl-2-butenoxymethyl, 1-isobutyl-2-butenoxyoxymethylene , 1-(2,2·dimethylpropyl)-2-butenyloxymethylene, 1-tert-butyl-2-butenyloxymethylene, and the like. When a specific carbon number is specified, it means that "the number of carbon atoms in the range of the number may be a hetero atom." In the present specification, "aryl" includes a monocyclic or fused cyclic aromatic hydrocarbon. This may be fused to the above-mentioned "cycloalkyl group", the above-mentioned "cycloalkenyl group", and the "non-aromatic heterocyclic group" described later at all possible positions. Any of the aryl groups are monocyclic and fused, and may be combined at all possible positions. For example, phenyl, naphthyl, 2-naphthyl, anthracenyl, tetrahydronaphthyl, iota, 3-benzodioxanyl, 1,4-benzodioxanyl, and the like. It is preferably a phenyl group, an i-naphthyl group or a 2-naphthyl group. More preferably phenyl. In the present specification, the "heteroaryl group" is a 5- to 6-membered aromatic ring containing at least one atom selected from the group consisting of oxygen, sulfur or nitrogen. This may be fused to the above-mentioned "cycloalkyl group", the above-mentioned "aryl group", the "non-aromatic heterocyclic group" described later, or other heteroaryl groups based on all possible positions. Any of the heteroaryl groups are monocyclic and fused, and may be combined at all possible positions. For example, pyrrolyl (eg, 1 -pyrrolyl, 2-pyrrolyl, 3-pyrrolyl), furyl (eg, 2-furyl, 3-furyl), thienyl (eg, 2-thienyl, 3-thienyl) , imidazolyl (eg 2-amidino, 4-imidazolyl), pyrazolyl (eg 1-pyrazolyl, 3 ·pyrazolyl), isothiazolyl (eg 3-isothiazolyl), isoxazole (eg, 3-isoxazolyl), oxazolyl (eg 2-oxazolyl), thiazolyl (eg 2-thiazolyl), pyridyl (eg 2-pyridyl, 3-pyridyl, 4-pyridine) Base), pyridinyl (Example-25-200835692 such as 2-pyridyl), pyrimidinyl (eg 2-pyrimidinyl, 4-pyrimidinyl), hydrazine (eg 3-mercapto), tetrazolyl (eg 1H-tetrazolyl), oxadiazolyl (eg 1,3,4-oxadiazolyl), thiadiazolyl (eg 1,3,4-thiadiazolyl), oxime-based (eg eg 2-吲-till, 6-fluorene-based, iso-decyl (eg 2-isodecyl), fluorenyl (eg 1-mercapto, 2-mercapto, 3-mercapto) , carbazolyl (eg 3-oxazolyl), fluorenyl (eg 8-decyl), quinacyl (eg 2-quinolyl), isoquinolinyl (eg 3-isoquinolinyl), quinolinyl (eg 2-quinolinyl, 5-quinolinyl), sulfhydryl (eg 1-indole) a naphthyridinyl group (e.g., 2-naphthyridinyl), a quinoxalyl group (e.g., 2-quinoxalyl), a quinazolinyl group (e.g., 2-quinazolinyl), a porphyrin group (e.g., 3- Carbolinyl), acridinyl (eg 2-oxaridinyl), oxazolyl (eg. 2-oxazolyl, 4-oxazolyl), morphinyl (eg 2-cylindinyl, 3-morphine) Pyridyl), acridinyl (eg 1-oxaridinyl, 2-acridinyl), dibenzofuranyl (eg 1-dibenzofuranyl, 2-dibenzofuranyl), benzimidazolyl (eg 2-benzimidazolyl), benzisoxazolyl (eg 3-benzoisoxazolyl), benzoxazolyl (eg 2-benzoxazolyl), benzoxadiazole (eg 4-benzoxadioxazolyl), benzisothiazolyl (eg 3-benzoisothiazolyl), benzothiazolyl (eg 2-benzothiazolyl), benzofuranyl (eg 3- Benzofuranyl), benzothienyl (eg 2-benzothienyl), dibenzothiophenyl (eg 2-diphenyl) And thienyl), benzodioxyl (for example, 1,3-benzodioxyl) and the like. In the present specification, the "non-aromatic heterocyclic group" is a 3 to 12 member non-aromatic heterocyclic group containing one or more nitrogen atoms in the ring and more preferably an oxygen atom and/or a sulfur atom. For example, pyrrolidinyl, pyrrolinyl, imidazolidinyl, imidazolinyl, pyrazolyl, pyrazolinyl, piperidinyl, dihydropyridyl, tetrahydropyridyl, -26 - 200835692 piperazine, two Hydropyridinyl, tetrahydropyridinyl, dihydropyrimidinyl, tetrahydropyrimidinyl, perhydropyrimidinyl and the like. In the present specification, the "aryloxy group" is a group in which an oxygen atom has one substituent of the above "aryl group". For example, phenoxy, naphthyloxy and the like. In the present specification, the "arylthio group" is a group having one substituent of the above-mentioned "aryl group" in the sulfur atom. For example, phenylthio, naphthylthio, and the like. In the present specification, the "heteroaryloxy group" is a group having one substituent of the above-mentioned "heteroaryl group" in the oxygen atom. For example, pyrroloxy, furanoxy, thienyloxy, ® imidazolyloxy, pyrazolyloxy, isothiazolyloxy, isoxazolyloxy, oxazolyloxy, thiazolyloxy, pyridyloxy, pyridyloxy , pyrimidinyloxy, oxonyloxy, tetrazolyloxy, oxadiazolyloxy, thiadiazolyloxy, oximeoxy, isodecyloxy, decyloxy, oxazolyloxy, hydrazine Oxy, quinoline, isoquinolinyloxy, quinolinyloxy, oxime oxy, naphthyridinyloxy, quinoxalyloxy, quinazolinyloxy, porphyrinoxy, acridineoxy , oxazolyloxy, phenanthryloxy, acridineoxy, dibenzofuranyloxy, benzimidazolyloxy, benzoiso Dfn, benzooxy, benzoxazolyloxy Base, benzisothiazolyloxy, benzothiazolyloxy, benzofuranyloxy, benzothienyloxy, dibenzothiophenoxy, benzodioxyloxy, and the like. Suitable as furanoxy, thienyloxy, imidazolyloxy, pyrazolyloxy, isothiazolyloxy, isoxazolyloxy, oxazolyloxy, thiazolyloxy, pyridyloxy, pyrenyloxy, pyrimidineoxy Base, argon, etc. In the present specification, the "heteroarylthio group" is a group in which one of the above-mentioned "heteroaryl groups" is substituted with a sulfur atom. For example, pyrrolylthio, furanthio, thiophenothionyl, imidazolyl, pyrazolyl, isothiazolthio, isoxazolylthio, Dfsulfuryl-27-200835692, thiazolylthio, pyridylthio, Pyridylthio, pyrimidinylthio, sulfonium thio, tetrazolylthio, oxadiazolethio, thiadiazolethio, sulfonium thio, isodecylthio, sulfonylthio, oxazolidine Base, sulfhydryl, quinacinyl, isoquinolinylthio, quinolinethio, hydrazine, naphthyridinyl, quinoxalyl, quinazolinethio, porphyrinthio, anthracene Alkylthio, oxazolidine, phenothiathio, acridinethio, dibenzofuranthio, benzimidazolylthio, benzisoxazolethio, benzoxazolethio, benzopyrene A oxazolylthio group, a benzisothiazolylthio group, a benzothiazolethio group, a benzofuranthio group, a benzothiophenethio group, a dibenzothiophenethio group, a benzodi Df thiol group, or the like. It is preferably furanthio, thiophenethio, imidazolyl, pyrazolyl, isothiazolthio, isoxazolethio, oxazolidine, thiazolidine, pyridylthio, pyridylthio, pyrimidine sulfur Base, sulfhydryl thiol and the like. In the present specification, "cycloalkanediyl" is a group having one more bond to the above "cycloalkyl group". For example, a cyclopentanediyl group, a cyclohexanediyl group, a cyclooctanediyl group, etc. In the present specification, the "cycloalkenyldiyl group" is a group having one of the above-mentioned "cycloalkenyl groups". For example, 1-cyclopentenediyl, 1-cyclohexenediyl, 1-cyclooctenediyl, and the like. In the present specification, the "aryldiyl group" is a group having one more bond to the above "aryl group". For example, benzene, naphthalene diyl, and the like. In the present specification, the "heteroaryldiyl group" has one bond group of the above "heteroaryl group". For example, pyrrole diyl, furandiyl, thiophenediyl, pyrazolediyl, imidazolyl, isothiazolidine, isoxazolediyl, carbazolediyl, thiazolidine, pyridyldiyl, pyrimidinediyl, Sorghum diyl, oxadiazole diyl, -28-

200835692 噻二唑二基、吲阱二基、異吲哚二基、吲昭 基、嘌呤二基、喹畊二基、異喹啉二基、g 二基、萘π定二基、喹η若喃二基、喹u坐啉二基 喋啶二基、咔唑二基、啡啶二基、吖η定二3 一基、本并卩亏Π坐酬一^基、苯并曙D坐卩定嗣一 3 基、苯并異噚唑二基' 苯并噚唑二基、苯并 苯并異噻唑二基、苯并噻唑二基、苯并呋_ 吩二基、二苯并噻吩二基、苯并二噚烷二基 本說明書中’ 「非芳香族雜環二基」爲 雜環基」更有1個鍵結之基。例如吡咯啶 基、咪唑啶二基、咪唑啉二基、吡唑啶二 、哌啶二基、二氫吡啶二基、四氫吡啶二 二氫吡啶二基、四氫吡啶二基、二氫嘧啶 二基、全氫嘧啶二基、四氫呋喃二基、四 甲基吡咯啶二基、四氫吡喃二基、N -甲基 本說明書中,「可有非反應性取代基取# 反應性取代基可爲三鹵甲基、可有由取代基 代基1〜2個取代之環烷基、可有由取代基群 基1〜2個取代之環烯基、可有由取代基群】 1〜2個取代之烷氧基、可有由取代基群a 1〜2個取代之環烷氧基、可有由取代基群Σ 1〜2個取代之烷硫基、可有由取代基群a 1〜2個取代之環烷硫基、可有由取代基群( 二基、吲唑二 啉二基、呔阱 、哮琳二基、 、二苯并呋喃 、苯并咪唑二 噚二唑二基、 二基、苯并噻 等。 述「非芳香族 :基、吡咯啉二 :、卩比嗤琳一基 ;、哌畊二基、 .基、四氫嘧啶 ,噻吩二基、N-:氫吡啶二基等 丨之院基」中非 群A選擇之取 A選擇之取代 丨選擇之取代基 選擇之取代基 i選擇之取代基 選擇之取代基 :選擇之取代基 -29- 200835692 1〜3個取代之芳基、可有由取代基群C選擇之取代基1〜3 個取代之雜芳基、可有由取代基群C選擇之取代基丨〜3個 取代之芳氧基、可有由取代基群C選擇之取代基1〜3個取 代之雜芳氧基、可有由取代基群C選擇之取代基1〜3個取 代之芳硫基、可有由取代基群C選擇之取代基1〜3個取代 之雜芳硫基、N -吡咯啶基、N -哌啶基、N -嗎啉基等,而可 有1〜2個取代。 取代基群A : C1-C4烷基、三鹵甲基、ChC4烷氧基、 • C1-C4烷硫基、可有由取代基群C選擇之取代基卜3個取 代之苯基、可有由取代基群C選擇之取代基1〜3個取代之 苯氧基、雜芳基。 取代基群B:三鹵甲基、C1-C4烷氧基、C1-C4烷硫基、 可有由取代基群C選擇之取代基1〜3個取代之苯基、可有 由取代基群C選擇之取代基1〜3個取代之苯氧基、雜芳基 〇 取代基群C ··鹵原子、C1-C4烷基、三鹵甲基、C1-C4烷 ® 氧基、C1-C4烷硫基、可有由取代基群C選擇之取代基 1〜3個取代之苯基、可有由取代基群C選擇之取代基1〜3 個取代之苯氧基、雜芳基。 本說明書中,「可有非反應性取代基取代之烯基」、^ 可有非反應性取代基取代之炔基」、「可有非反應性取代 基取代之伸烷基」、「可有非反應性取代基取代之伸烯基 」、「可有非反應性取代基取代之伸炔基」中非反應性取 代基可爲三鹵甲基、可有由上述取代基群A選擇之取代基 -30- 200835692 1〜2個取代之環烷基、可有由上述取代基群a選擇之取代 基1〜2個取代之環烯基、可有由上述取代基群C選擇之取 代基1〜3個取代之芳基、可有由上述取代基群C選擇之取 代基1〜3個取代之雜芳基等,而可有1〜2個取代。 本說明書中,「可有非反應性取代基取代之環烷二基」 、「可有非反應性取代基取代之環烯二基」中非反應性取 代基可爲可有由上述取代基群B選擇之取代基1〜2個取代 之烷基、三鹵甲基、可有由上述取代基群A選擇之取代基 1〜2個取代之環烷基、可有由上述取代基群A選擇之取代 基1〜2個取代之環烯基、可有由上述取代基群C選擇之取 代基1〜3個取代之芳基、可有由上述取代基群C選擇之取 代基1〜3個取代之雜芳基等,而可有1〜2個取代。 本說明書中,「可有非反應性取代基取代之芳二基」、 「可有非反應性取代基取代之雜芳二基」、及「可有非反 應性取代基取代之非芳香族雜環二基」中取代基可爲鹵原 子、可有由上述取代基群B選擇之取代基1〜2個取代之烷 基、三鹵甲基、可有由上述取代基群A選擇之取代基1〜2 個取代之環烷基、可有由上述取代基群B選擇之取代基 1〜2個取代之烷氧基、可有由上述取代基群A選擇之取代 基1〜2個取代之環烷氧基、可有由上述取代基群B選擇之 取代基1〜2個取代之烷硫基、可有由上述取代基群A選擇 之取代基1〜2個取代之環烷硫基、可有由上述取代基群C 選擇之取代基1〜3個取代之芳基、可有由上述取代基群C 選擇之取代基1〜3個取代之雜芳基、可有由上述取代基群 -31 - 200835692 C選擇之取代基1〜3個取代之芳氧基、可有由上述取代基 群C選擇之取代基1〜3個取代之雜芳氧基、可有由上述取 代基群C選擇之取代基1~3個取代之芳硫基、可有由上述 取代基群C選擇之取代基1〜3個取代之雜芳硫基等,而可 有1〜2個取代。 本說明書中,「非反應性取代基」爲前述工程A〜F之任 一工程之反應中不起反應之取代基。例如上述取代基。 本說明書中,「式(I)化合物之水解物」爲式(II)化合物 或其羧酸之金屬鹽(金屬爲鈉、鉀、或鋰)。 本說明書中,「式(IX)化合物之水解物」爲式(X)化合物或 其羧酸之金屬鹽(金屬爲鈉、鉀、或鋰)° 本說明書中,「水解」包含酸性條件下之水解及鹼性條 件下之水解。於鹼性條件下水解時’也可添加酸。 本說明書中,「於水解物添加醇」包含:1)水解後,將 反應溶液以有機溶劑萃取,於其有機層添加醇之場合,2) 水解後,於反應溶液加有機溶劑來分液,而於其水層添加 醇之場合,3)水解後,於反應溶液加酸,以有機溶劑萃取 ,於其有機層添加醇之場合,4)水解後,於反應溶液加酸 ,加有機溶劑來分液,於其水層添加醇之場合,5)水解後 ,反應溶液以有機溶劑萃取,於其有機層添加醇及酸之場 合,6)水解後,於反應溶液加有機溶劑來分液,於其水層 添加醇及酸之場合。必要時,也可將溶液濃縮及/或稀釋。 本說明書中,「將工程A及B連續而反應」爲於工程a 之反應後生成之化合物不單離而供其次之工程B使用。 -32 - 200835692 本說明書中,「將工程人&及3&連續而反應」爲於工程 Aa之反應後生成之化合物不單離而供其次之工程Ba使用 〇 本說明書中,「將工程c、D、A、及B連續而反應」爲 於工程C、D及A之反應後生成之化合物不單離而供其次 之工程D、A、及B使用。 本說明書中,「將工程Ca、Da、Aa、及Ba連續而反應 」爲於各工程Ca、Da及Aa之反應後生成之化合物不單離 而供其次之各工程Da、Aa、及Ba使用。 本說明書中,「將工程E及F連續而反應」爲於工程E 之反應後生成之化合物不單離而供其次之工程F使用。 「將工程Ea及Fa連續而反應」爲於工程Ea之反應後 生成之化合物不單離而供其次之工程Fa使用。 式(I)、(II)、(III)、(IV)、(V)、(VI)、(VII)、及(VIII)所 示化合物之 R1〜R7、X、Y、及Hal之適宜之取代基群以 (la)〜(lib)表示。以這些之可能組合之化合物較佳。 R1以(la)可有非反應性取代基取代之烷基、可有非反應性 取代基取代之烯基、或可有非反應性取代基取代之炔基較 佳’更以(lb)可有非反應性取代基取代之烷基較佳,更以 (Ic)可有由取代基群d選擇之1〜2個取代基取代之烷基最 佳。 取代基群D:三氟甲基、C1-C4烷氧基、C5-C6環烷基、 有鹵原子1〜2個取代之苯基、及N-嗎啉基。 R2以(Id)烷基、烷氧基烷基、或烷氧基較佳,更以(Ie)烷 -33- 200835692 基或烷氧基較佳,更以(If)CM-C3烷基最佳。 R3以(Ig)烷基、烷氧基烷基、或烷氧基較佳,更以(Ih)烷 基或院氧基院基較佳,更以(Ii)Cl-C3院基最佳。 或R2及R3可與鄰接之碳原子一起形成(Ij)有1個雙鍵之 5〜10員環之環烯,更以(Ik)環辛烯較佳。 R4以(II)氫原子或羥基較佳,更以(Im)氫原子較佳。 R5以(In)烷基較佳,更以(l〇)Cl-C2烷基較佳。 R6以(Ip)烷基較佳,更以(Iq)Cl-C2烷基較佳。200835692 Thiadiazole diyl, hydrazine diyl, isoindole diyl, fluorenyl, fluorenyl, quinolon diyl, isoquinolinyl, g diyl, naphthalene π-diyl, quinine Eryl, quinolinyldiyl acridinediyl, carbazolediyl, phenanthryldiyl, 吖η定二三基基,本卩卩卩Π付一^基基,苯苯曙D卩嗣3-yl, benzoisoxazolediyl benzoxazole diyl, benzobenzoisoxazole diyl, benzothiazolediyl, benzofuranyl, dibenzothiophenediyl, In the basic specification of benzodioxane II, the "non-aromatic heterocyclic diradical" is a heterocyclic group and has one more bonded group. For example, pyrrolidinyl, imidazolidinyl, imidazolinyl, pyrazolidine, piperidinyl, dihydropyridinediyl, tetrahydropyridinedihydropyridinyl, tetrahydropyridinediyl, dihydropyrimidine Dibasic, perhydropyrimidinyl, tetrahydrofuranyl, tetramethylpyrrolidinyl, tetrahydropyranyl, N-methyl, "In the specification," may have a non-reactive substituent. a trihalomethyl group, a cycloalkyl group which may have 1 to 2 substituents substituted by a substituent group, a cycloalkenyl group which may have 1 to 2 substituent groups substituted by a substituent group, may have a group of substituents 1 to 2 a substituted alkoxy group, which may have a cycloalkoxy group substituted by a substituent group a 1 to 2, an alkylthio group which may have 1 to 2 substituent groups substituted by a substituent group, may have a substituent group a 1 ~2 substituted cycloalkylthio groups, may have a group of substituents (diyl, carbazolyldiyl, anthracene, rosindiyl, dibenzofuran, benzimidazole dioxadiazolediyl) , dibasic, benzothiazide, etc.. "Non-aromatic: phenyl, pyrroline II: 卩 嗤 嗤 一 ;;; piperidine diyl, ., tetrahydropyrimidine, thiophenediyl, N-: hydrogen Alkyl group of pyridinediyl group is selected from the group A. The substitution of A is selected. The substituent selected is the substituent selected. The substituent selected is the substituent selected: the substituent -29-200835692 1~3 a substituted aryl group, which may have a substituent selected from the substituent group C, 1 to 3 substituted heteroaryl groups, a substituent group selected from the substituent group C, 3 to 3 substituted aryloxy groups, and may have 1 to 3 substituted heteroaryloxy groups selected from the substituent group C, 1 to 3 substituted arylthio groups which may be selected from the substituent group C, may be selected from the substituent group C The substituent has 1 to 3 substituted heteroarylthio groups, N-pyrrolidinyl group, N-piperidinyl group, N-morpholinyl group and the like, and may have 1 to 2 substituents. Substituent group A: C1-C4 alkane a group, a trihalomethyl group, a ChC4 alkoxy group, a C1-C4 alkylthio group, a phenyl group which may be substituted with a substituent selected from the substituent group C, and a substituent which may be selected from the substituent group C. 1 to 3 substituted phenoxy groups, heteroaryl groups. Substituent group B: trihalomethyl group, C1-C4 alkoxy group, C1-C4 alkylthio group, may have substituent 1 selected from substituent group C ~3 replacements a phenyl group which may have a substituent selected from the substituent group C, 1 to 3 substituted phenoxy groups, a heteroaryl fluorene substituent group C ··a halogen atom, a C1-C4 alkyl group, a trihalomethyl group, C1- a C4 alkoxy group, a C1-C4 alkylthio group, a phenyl group which may have 1 to 3 substituents selected from the substituent group C, and 1 to 3 substituents which may be selected by the substituent group C Phenoxy group, heteroaryl group. In the present specification, "alkenyl group which may be substituted with a non-reactive substituent", "alkynyl group which may be substituted with a non-reactive substituent", "may be substituted with a non-reactive substituent" The non-reactive substituent in the alkyl group, the "alkenyl group which may be substituted with a non-reactive substituent", and the "alkynyl group which may have a non-reactive substituent may be a trihalomethyl group, may have The substituent selected in the above substituent group A is a substituted cycloalkyl group having 1 to 2 substituents selected from the substituent group a, and may be substituted by the above. The group 1 to 3 substituted aryl groups selected by the group C may have 1 to 3 substituted heteroaryl groups selected from the substituent group C, and may have 1 to 2 substitutions. In the present specification, the non-reactive substituent in the "cycloalkanediyl group which may have a non-reactive substituent may be substituted" or "the cycloalkenyl diyl group which may have a non-reactive substituent may be" may have a substituent group B selected substituents 1 to 2 substituted alkyl groups, trihalomethyl groups, may have a substituent selected from the above substituent group A, 1 to 2 substituted cycloalkyl groups, may be selected from the above substituent group A The substituent 1 to 2 substituted cycloalkenyl groups may have 1 to 3 substituted aryl groups selected from the substituent group C, and may have 1 to 3 substituents selected from the above substituent group C Instead of a heteroaryl group or the like, there may be 1 to 2 substitutions. In the present specification, "an aryldiyl group which may have a non-reactive substituent substituted", "a heteroaryldiyl group which may have a non-reactive substituent substituted", and "a non-aromatic miscellaneous which may be substituted with a non-reactive substituent" The substituent in the cyclodiyl group may be a halogen atom, an alkyl group which may have 1 to 2 substituents selected from the substituent group B, a trihalomethyl group, and a substituent which may be selected from the above substituent group A 1 to 2 substituted cycloalkyl groups, 1 to 2 substituted alkoxy groups which may be selected from the above substituent group B, and 1 to 2 substituents which may be selected from the above substituent group A The cycloalkoxy group may have 1 to 2 substituted alkylthio groups selected from the substituent group B, and 1 to 2 substituted cycloalkylthio groups which may be selected from the substituent group A, There may be a substituent of 1 to 3 substituents selected from the above substituent group C, a heteroaryl group which may have 1 to 3 substituents selected from the substituent group C, and may have a substituent group -31 - 200835692 C selected substituents 1 to 3 substituted aryloxy groups, may have substituents 1 to 3 selected from the above substituent group C a substituted heteroaryloxy group, an arylthio group substituted with 1 to 3 substituents selected from the above substituent group C, and 1 to 3 substituted heteroaromatic sulfurs which may be selected from the above substituent group C Base, etc., and can have 1 to 2 substitutions. In the present specification, the "non-reactive substituent" is a substituent which does not react in the reaction of any of the above-mentioned items A to F. For example, the above substituents. In the present specification, the "hydrolyzate of the compound of the formula (I)" is a compound of the formula (II) or a metal salt of a carboxylic acid thereof (the metal is sodium, potassium or lithium). In the present specification, the "hydrolyzate of the compound of the formula (IX)" is a compound of the formula (X) or a metal salt thereof (the metal is sodium, potassium or lithium). In the present specification, "hydrolysis" includes acidic conditions. Hydrolysis and hydrolysis under alkaline conditions. When hydrolyzed under alkaline conditions, an acid may also be added. In the present specification, the "addition of alcohol to the hydrolyzate" includes: 1) after the hydrolysis, the reaction solution is extracted with an organic solvent, and when an alcohol is added to the organic layer, 2) after hydrolysis, an organic solvent is added to the reaction solution to separate the solution. In the case where alcohol is added to the water layer, 3) after hydrolysis, acid is added to the reaction solution, and extraction is carried out with an organic solvent, and when an alcohol is added to the organic layer, 4) after hydrolysis, an acid is added to the reaction solution, and an organic solvent is added thereto. When liquid is added to the water layer, 5) after hydrolysis, the reaction solution is extracted with an organic solvent, and when an alcohol and an acid are added to the organic layer, 6) after hydrolysis, an organic solvent is added to the reaction solution to separate the liquid. Where alcohol and acid are added to the water layer. The solution may also be concentrated and/or diluted if necessary. In the present specification, "the process A and B are continuously reacted" is a compound which is produced after the reaction of the work a, and is not used for the next work B. -32 - 200835692 In this manual, "Complete and React" of Engineers & and 3& Continuously reacts to the compound produced after the reaction of Project Aa, and the second project is used. In this manual, "Engineering c, D, A, and B are continuously reacted. The compounds formed after the reaction of Engineering C, D, and A are not separated and are used in the next projects D, A, and B. In the present specification, "the process of continuously reacting Ca, Da, Aa, and Ba" is a compound which is produced after the reaction of each of Ca, Da, and Aa, and is used for the next projects Da, Aa, and Ba. In the present specification, "the process E and F are continuously reacted" is a compound which is produced after the reaction of the process E, and is not used for the next project F. "Continuously reacting Ea and Fa in the project" is a compound produced after the reaction of Project Ea and is not used separately for the next project Fa. Suitable for R1 to R7, X, Y, and Hal of the compounds of the formulae (I), (II), (III), (IV), (V), (VI), (VII), and (VIII) The substituent group is represented by (la) to (lib). Compounds which are possible combinations of these are preferred. R1 is preferably (la) an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent. The alkyl group substituted with a non-reactive substituent is preferred, and the alkyl group substituted with 1 to 2 substituents selected from the group of substituents d (Ic) is most preferred. Substituent group D: trifluoromethyl, C1-C4 alkoxy, C5-C6 cycloalkyl, phenyl substituted with 1 to 2 halogen atoms, and N-morpholinyl. R2 is preferably an alkyl group of (Id), an alkoxyalkyl group or an alkoxy group, more preferably an alkyl group of (Ie)-33-200835692 or an alkoxy group, and more preferably an (If) CM-C3 alkyl group. good. R3 is preferably an (Ig) alkyl group, an alkoxyalkyl group or an alkoxy group, more preferably an (Ih) alkyl group or an alkoxy group, and more preferably an (Ii) Cl-C3 group. Or R2 and R3 may form (Ij) a cycloolefin having 5 to 10 member rings of one double bond together with an adjacent carbon atom, and more preferably (Ik) cyclooctene. R4 is preferably a (II) hydrogen atom or a hydroxyl group, more preferably an (Im) hydrogen atom. R5 is preferably an (In) alkyl group, more preferably a (l) Cl-C2 alkyl group. R6 is preferably (Ip) alkyl, more preferably (Iq) Cl-C2 alkyl.

R7以(Ir)氫原子或烷基較佳,更以(IS)C1-C2烷基較佳。 X以(It)可有雜原子介在而可有非反應性取代基取代之伸 烷基、可有雜原子介在而可有非反應性取代基取代之伸烯 基、可有雜原子介在而可有非反應性取代基取代之伸炔基 、可有非反應性取代基取代之環烷二基、可有非反應性取 代基取代之環烯二基、可有非反應性取代基取代之芳二基 、可有非反應性取代基取代之雜芳二基、或可有非反應性 取代基取代之非芳香族雜環二基較佳,更以(IU)可有雜原 子介在而可有非反應性取代基取代之伸烷基、可有非反應 性取代基取代之環烷二基、可有非反應性取代基取代之芳 二基、可有非反應性取代基取代之雜芳二基、或可有非反 應性取代基取代之非芳香族雜環二基較佳,更以(Iv)環烷 二基、芳二基、可有鹵原子取代之雜芳二基、或四氫吡喃 二基最佳。 Y以(Iw)單鍵、可有非反應性取代基取代之伸烷基、可 有非反應性取代基取代之伸烯基、或可有非反應性取代基 -34- 200835692 取代之伸炔基較佳,更以(lx)單鍵或伸烷基較佳,更以(Iy) 單鍵或(Iz)Cl-C2伸烷基最佳。R7 is preferably an (Ir) hydrogen atom or an alkyl group, more preferably an (IS) C1-C2 alkyl group. X may have an alkyl group which may have a hetero atom or may have a non-reactive substituent, an alkenyl group which may have a hetero atom and may have a non-reactive substituent, and may have a hetero atom. An alkynyl group substituted with a non-reactive substituent, a cycloalkanediyl group which may be substituted with a non-reactive substituent, a cycloalkenyldiyl group which may be substituted with a non-reactive substituent, and a aryl group which may be substituted with a non-reactive substituent a diradical, a heteroaryldiyl group which may be substituted with a non-reactive substituent, or a non-aromatic heterocyclic diradical which may be substituted with a non-reactive substituent, and may have a hetero atom (IU) a non-reactive substituent-substituted alkylene group, a cycloalkanediyl group which may be substituted with a non-reactive substituent, an aryldiyl group which may be substituted with a non-reactive substituent, or a heteroaromatic group which may be substituted with a non-reactive substituent a non-aromatic heterocyclic diyl group which may be substituted with a non-reactive substituent, preferably a (Iv) cycloalkanediyl group, an aryldiyl group, a heteroaryldiyl group which may have a halogen atom, or a tetrahydro group The pyranyl group is optimal. Y is an (Iw) single bond, an alkylene group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkyne which may have a non-reactive substituent-34-200835692 Preferably, the group is preferably a (lx) single bond or an alkylene group, and more preferably an (Iy) single bond or an (Iz)Cl-C2 alkylene group.

Hal以(Ila)鹵原子較佳,更以(lib)氯原子較佳。 又式(XI)、(X)、(XI)、(XII)、(XIII)、(XIV)、(XV)、及 (XVI)所示化合物之Rla〜R7a、Xa、Ya、及Hala之適宜之取 代基群以(Iaa)〜(Ilba)表示。以這些之可能組合之化合物較 佳。Hal is preferably a (Ila) halogen atom, and more preferably a (lib) chlorine atom. Further suitable for Rla~R7a, Xa, Ya, and Hala of the compounds of formula (XI), (X), (XI), (XII), (XIII), (XIV), (XV), and (XVI) The substituent group is represented by (Iaa) to (Ilba). Compounds which are possible combinations of these are preferred.

Rla以(Iaa)可有非反應性取代基取代之烷基、可有非反應 性取代基取代之烯基、或可有非反應性取代基取代之炔基 較佳,更以(Iba)可有非反應性取代基取代之烷基較佳,更 以(lea)可有由取代基群D選擇之1〜2個取代基取代之烷基 最佳。 取代基群Da :三氟甲基、C1-C4烷氧基、C5-C6環烷基、 以鹵原子1~2個取代之苯基、及N-嗎啉基。 R2a以(Ida)烷基、烷氧基烷基、或烷氧基較佳,更以(lea) 烷基或烷氧基較佳,更以(Ifa)Cl-C2烷基最佳。 R3a以(Iga)烷基、烷氧基烷基、或烷氧基較佳,更以(Iha) 烷基或烷氧基烷基較佳,更以(Iia)Cl-C3烷基最佳。 或1123及R3a可與鄰接之碳原子一起形成(I」a)有1個雙鍵 之5〜10員環之環烯,更以(Ika)環辛烯較佳。 尺“以(Ila)氫原子或羥基較佳,更以(Ima)氫原子較佳。 R5aW(Ina)烷基較佳,更以(Ioa)Cl-C2烷基較佳。 R6aU(Ipa)烷基較佳,更以(Iqa)Cl-C2烷基較佳。 R7a U(Ira)氫原子或院基較佳,更以(Isa)Cl-C2院基較佳 -35- 200835692Rla is preferably an alkyl group which may have a non-reactive substituent substituted with (Iaa), an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent, and more preferably (Iba) The alkyl group substituted with a non-reactive substituent is preferred, and the alkyl group which may be substituted with 1 to 2 substituents selected from the substituent group D is most preferred. The substituent group Da is a trifluoromethyl group, a C1-C4 alkoxy group, a C5-C6 cycloalkyl group, a phenyl group substituted with 1 to 2 halogen atoms, and an N-morpholinyl group. R2a is preferably (Ida)alkyl, alkoxyalkyl or alkoxy, more preferably (lea)alkyl or alkoxy, more preferably (Ifa)Cl-C2 alkyl. R3a is preferably (Iga)alkyl, alkoxyalkyl or alkoxy, more preferably (Iha)alkyl or alkoxyalkyl, more preferably (Iia)Cl-C3 alkyl. Alternatively, 1123 and R3a may form (I" a) a cycloolefin having 5 to 10 membered rings having one double bond, and more preferably (Ika) cyclooctene. Preferably, the "Ila" hydrogen atom or the hydroxyl group is more preferably an (Ima) hydrogen atom. The R5aW(Ina) alkyl group is preferably a further (Ioa)Cl-C2 alkyl group. R6aU(Ipa) alkane Preferably, the (Iqa)Cl-C2 alkyl group is preferred. The R7a U(Ira) hydrogen atom or the hospital base is preferred, and the (Isa)Cl-C2 hospital base is preferred -35- 200835692

Xa以(Ita)可有雜原子介在而可有非反應性取代基取代之 伸烷基、可有雜原子介在而可有非反應性取代基取代之伸 烯基、可有雜原子介在而可有非反應性取代基取代之伸炔 基、可有非反應性取代基取代之環烷二基、可有非反應性 取代基取代之環烯二基、可有非反應性取代基取代之芳二 基、可有非反應性取代基取代之雜芳二基、或可有非反應 性取代基取代之非方香族雜環二基較佳,更以(Iua)可有雜 原子介在而可有非反應性取代基取代之伸烷基、可有非反 應性取代基取代之環烷二基、可有非反應性取代基取代之 芳二基、可有非反應性取代基取代之雜芳二基、或可有非 反應性取代基取代之非芳香族雜環二基較佳,更以(Iva)環 烷二基、芳二基、可有鹵原子取代之雜芳二基、或四氫吡 喃二基最佳。Xa may have an alkylene group which may have a hetero atom or may have a non-reactive substituent, and may have a hetero atom, may have a non-reactive substituent, and may have a hetero atom. An alkynyl group substituted with a non-reactive substituent, a cycloalkanediyl group which may be substituted with a non-reactive substituent, a cycloalkenyldiyl group which may be substituted with a non-reactive substituent, and a aryl group which may be substituted with a non-reactive substituent a diaryl group, a heteroaryldiyl group which may be substituted with a non-reactive substituent, or a non-fragrance heterocyclic diyl group which may be substituted with a non-reactive substituent, and may have a hetero atom (Iua) An alkyl group substituted with a non-reactive substituent, a cycloalkanediyl group which may be substituted with a non-reactive substituent, an aryldiyl group which may be substituted with a non-reactive substituent, or a heteroaryl group which may be substituted with a non-reactive substituent The diradical or non-aromatic heterocyclic diradical which may be substituted with a non-reactive substituent is preferably an (Iva) cycloalkanediyl group, an aryldiyl group, a heteroaryldiyl group which may have a halogen atom, or Hydropyrandiyl is most preferred.

Ya以(Iwa)單鍵、可有非反應性取代基取代之伸烷基、可 有非反應性取代基取代之伸烯基、或可有非反應性取代基 取代之伸炔基較佳,更以(Ixa)單鍵或伸烷基較佳,更以 (Iya)單鍵或(Iza)Cl-C2伸烷基最佳。Ya is preferably a (Iwa) single bond, an alkylene group which may be substituted with a non-reactive substituent, an extended alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent. Further, it is preferably an (Ixa) single bond or an alkylene group, and more preferably an (Iya) single bond or an (Iza)Cl-C2 alkylene group.

Hala以(Ilaa)鹵原子較佳,更以(Ilba)氯原子較佳。 (發明之效果) 作爲具有優異之類大麻鹼受體激動劑作用之2-吡啶酮-3-胺甲醯基衍生物及其重要中間體以簡便而高產率及高純度 獲得之製法有用。 【實施方式】 -36- 200835692 (實施發明之最佳形態】 本發明化合物可用如下示任一方法來合成。式(1)、(Π)、 (III)、(IV)、(V)、(VI)、(VII)、及(VIII)所示化合物中,具 有不對稱中心時,包括消旋體及/或光學活性體。 又式(I)、(II)、(III)、(IV)、(V)、(VI)、(VII)、及 VIII)所示化合物於各工程中也可以適切之鹽或溶劑合物之Hala is preferably a (Ilaa) halogen atom, more preferably an (Ilba) chlorine atom. (Effects of the Invention) The 2-pyridone-3-aminocarbamoyl derivative having an excellent action as a cannabinoid receptor agonist and an important intermediate thereof are useful in a simple, high-yield, high-purity preparation method. [Embodiment] -36-200835692 (Best Mode for Carrying Out the Invention) The compound of the present invention can be synthesized by any of the following methods: Formula (1), (Π), (III), (IV), (V), In the compounds represented by VI), (VII), and (VIII), when they have an asymmetric center, they include a racemate and/or an optically active body. Further, formula (I), (II), (III), (IV) The compounds shown in (V), (VI), (VII), and VIII) may also be suitable for salt or solvate in each project.

形態存在。R2^YR3 0 (IV) r1-nh2 (III)工程cForm exists. R2^YR3 0 (IV) r1-nh2 (III) Engineering c

R4 (Ο R4R4 (Ο R4

(VI) (II)(VI) (II)

(式中R1、R2、R3、R4、及R5與1)同意義;R6與3)同意義 ;R7、X、Y、及Hal與6)同思義) 工程C爲式(IV)化合物與式(ΠΙ)化合物脫水縮合之工程 -37· 200835692 本工程可於無溶劑或溶劑中施行。 式(III)化合物對式(IV)化合物可用0.1〜1莫耳當量,宜爲 0.35〜0.85莫耳當量。R2及R3不與鄰接之碳原子一起時, 更宜用0.35〜0.55莫耳當量。又R2及R3爲與鄰接之碳原子 一起形成環烯時,更宜用0.65〜0.85莫耳當量。 反應溶劑可爲甲苯、二甲苯、氯苯、或這些之混合溶劑 ,宜爲甲苯。 反應時間爲3 0分〜4 8小時,宜爲3 0分〜1 0小時施行。 • 反應溫度爲50°C〜反應溶劑回流溫度,宜爲l〇〇°C〜反應 溶劑回流溫度施行。 必要時,對式(IV)化合物可用乙酸0·05〜0.10莫耳當量用 〇 工程C之反應終了後,反應液可就此或必要時濃縮而供 工程D使用。脫水縮合之目的化合物也可用一般精製方法 來單離而供工程D使用。 工程D爲工程C所得化合物與式(V)化合物閉環而生成 • 式(I)化合物之工程。 本工程爲無溶劑或溶劑中施行。 式(V)化合物對式(IV)化合物用0.3〜1.2莫耳當量,宜用 0.5~ 1.0莫耳當量。R2及R3不與鄰接之碳原子一起時,更 宜用0.55〜0.75莫耳當量.。又R2及R3爲與鄰接之碳原子一 起形成環烯時,更宜用0.85〜1.05莫耳當量。 反應溶劑爲甲苯、二甲苯、氯苯、或用這些之混合溶劑 ,宜用甲苯。 38· 200835692 反應時間爲3 0分〜4 8小時,宜爲3 〇分〜i 6小時。 反應溫度爲50°C〜反應溶劑回流溫度,宜爲1〇〇它〜反應 溶劑回流溫度。 工程D之反應終了後,反應液就此用於工程a、或必要 時可濃縮而用於工程A。式(I)化合物也可依一般方法萃取 及單離精製而用於工程A。 工程A爲將工程D所得式⑴化合物水解,而生成式⑴ 化合物之水解物之工程。 於酸性條件下水解時,水解後,於反應液添加醇’以有 機溶劑萃取。又也可反應液以有機溶劑萃取後,於有機層 添加醇。 於鹼性條件下水解時,水解後,可於反應液添加酸作成酸 性後,於反應液加醇,以有機溶劑萃取。又也可於反應液 添加酸作成酸性後,以有機溶劑萃取後,於有機層添加醇 。又水解物溶解於有機層時,也可反應液以有機溶劑萃取 後,於有機層添加醇及酸。 水解後,反應液可就此用於次一工程,或必要時濃縮而用 於次一工程。 有機溶劑以乙酸乙酯、甲苯較佳。 A)於酸性條件下水解時,酸對式⑴化合物用0.25〜1()莫耳 當量,宜用1〜3莫耳當量。 酸可用鹽酸或硫酸。反應溶劑、反應時間、反應溫度、結 晶之析出時間、結晶之析出溫度等可與以下記載之於鹼性 條件下水解之場合同樣使用。 -39- 200835692 B)鹼性條件下水解時,鹼對式(I)化合物可用0·25〜3莫耳 當量,宜用0.8〜2.5莫耳當量,更宜用1.2〜2莫耳當量。 驗可爲氫氧化鈉、氫氧化鉀、或氫氧化鋰,宜爲氫氧化鈉 。鹼可以固體或水溶液使用。 反應溶劑可爲醇(甲醇、乙醇、正丙醇、或異丙醇)/水或 甲苯/醇(甲醇、乙醇、正丙醇、或異丙醇)/水之混合溶劑 之混合溶劑,宜爲甲苯/甲醇/水或甲醇/水。 反應時間爲0.25〜8小時,宜爲0.5〜2小時。 Φ 反應溫度爲10°C〜70°C,宜爲20°C〜60。。。 水解終了後,必要時反應液可以甲苯洗淨,得式(I)化合 物之水解物溶解之層(水層或有機層)。 於反應液或式(I)化合物之水解物溶解之層所加之酸可爲鹽 酸或硫酸,宜爲硫酸。 工程B爲於工程A生成之式(I)化合物之水解物添加醇, 而生成式(II)化合物之結晶之工程。 添加之醇可爲甲醇、乙醇、正丙醇、異丙醇、或這些之 ® 混合溶劑,宜爲異丙醇。 結晶可以0.25〜12小時,宜以0.25〜2小時析出。 結晶可於-10°C〜25°C,宜於-5°C〜5°C析出。 工程C、D、及A可不單離而連續施行。 工程E爲將式(II)化合物以鹵化劑反應、生成式(VI)化合 物之工程。 鹵化劑可對式(II)化合物用 0.5〜2莫耳當量,宜用 0.8〜1.5莫耳當量。 -40- 200835692 反應溶劑可爲甲苯、四氫呋喃、N,N_:甲基甲醯胺、N_ 甲基吡咯啶酮、或這些之混合溶劑,宜爲甲苯/N-甲基吡咯 啶酮或四氫呋喃/N,N-二甲基甲醯胺之混合溶劑。 反應時間爲0 · 2 5〜1 2小時,宜爲〇 · 2 5〜2小時。 反應溫度爲1 0 °C〜5 0 X:,宜爲2 0 °C〜3 0。 工4之反應終了後’反應液可就此或必要時濃縮,而用 於工程F。 工程F爲式(VI)化合物與式(VII)化合物或其酸鹽於鹼之 ® 存在下反應而生成式(VIII)化合物之工程。 式(vii)化合物或其酸鹽可對式(VI)化合物用〇·5〜2莫耳 當量,宜用0.8〜1.5莫耳當量。 酸鹽可爲鹽酸鹽、氫溴酸鹽、或硫酸鹽,宜爲鹽酸鹽。 驗可封式(VI)化合物用〇·5〜2莫耳當量,宜用〇·8〜1 5莫耳 當量。 反應溶劑可爲甲苯、四氫呋喃、Ν,Ν -二甲基甲醒胺、ν 甲基吡咯啶酮、或這些之混合溶劑,宜爲甲苯/Ν_甲基卩比略 ® 啶酮或四氫呋喃/Ν,Ν-二甲基甲醯胺之混合溶劑。 反應時間爲0.2 5〜1 2小時,宜爲〇 · 2 5〜2小時。 反應溫度爲l〇°C〜50°C,宜爲20°C〜30。 R7爲氫原子之場合,可於工程F之反應終了後,析$ p 晶。必要時加醇而析出結晶,可用甲醇、乙醇、1 ^ 呀 正丙醇、 異丙醇、或這些之混合溶劑,宜爲異丙醇。 結晶可以0·25〜12小時,宜以0.25〜2小時析出。 結晶可以-l〇°C〜25°C,宜以-5°C〜5°C析出。 -41 - •200835692 R7爲烷基之場合,可與工程A同樣,於酸性條件下或鹼 之存在下水解,得R7爲氫原子之式(VIII)化合物。 必要時可與工程B同樣,加醇來析出結晶,可用甲醇、 乙醇、正丙醇、異丙醇、或這些之混合溶劑,宜用異丙醇 〇 結晶可以0 · 2 5〜1 2小時,宜以〇. 2 5〜2小時析出。 結晶可以-1(TC〜25°C,宜以-5°C〜5°C析出。 本說明書中,「溶劑合物」包含例如與有機溶劑之溶劑 合物、水合物等。形成與有機溶劑之溶劑合物時,可與任 意數之有機溶劑分子配位。形成水合物時,可與任意數之 水分子配位。以水合物較佳。 本說明書中,「式(I)、(II)、(III)、(IV)、(V)、(VI)、 (VII)、及(VIII)化合物之鹽」可爲例如式(I)、(11)、(111)、 (IV)、(V)、(VI)、(VII)、及(VIII)化合物與鹼金屬(鋰、鈉 、鉀等)、鹼土類金屬(鎂、鈣等)、銨、有機鹼及胺基酸之 鹽、或無機酸(鹽酸、氫溴酸、磷酸、硫酸等)、及有機酸( 乙酸、檸檬酸、馬來酸、富馬酸、苯磺酸、對甲苯磺酸等) 之鹽。這些鹽可依通常施行之方法形成。 上述之製法生成之式(II)及式(VIII)化合物之結晶可依粉 末X線解析而得X線繞射圖案。 該結晶於上述製造工程之施行上或以式(VIII)化合物爲 有效成分之醫藥組成物之製造上容易操作,且因高純度故 醫藥組成物之製造上有用之結晶。 至於式(II)及式(VIII)化合物之結晶,如後述實施例1〜20 -42- 200835692 中X線繞射圖案所示(X線繞射測定條件:管球CuKa線 、管電壓40Kv、管電流40mA或50mA、dsin θ =η λ (η爲整 數、d爲面間隔(單位:A )、0爲繞射角(單位:度)))。 這些結晶依各繞射角或面間隔之値作爲特徵。 以下舉實施例及試驗例更詳細說明本發明,但本發明不 受這些限定。 實施例中,使用如下簡稱。(wherein R1, R2, R3, R4, and R5 are the same as 1); R6 is the same as 3); R7, X, Y, and Hal are the same as 6). Engineering C is a compound of formula (IV) Dehydration condensation of a compound of the formula (ΠΙ) -37· 200835692 This work can be carried out in the absence of a solvent or a solvent. The compound of the formula (III) may be used in an amount of 0.1 to 1 mol equivalent, preferably 0.35 to 0.85 mol equivalent, to the compound of the formula (IV). When R2 and R3 are not together with adjacent carbon atoms, it is more preferred to use 0.35 to 0.55 molar equivalents. Further, when R2 and R3 form a cycloolefin together with an adjacent carbon atom, it is more preferably used in an amount of 0.65 to 0.85 mol equivalent. The reaction solvent may be toluene, xylene, chlorobenzene, or a mixed solvent of these, and is preferably toluene. The reaction time is from 30 minutes to 48 hours, preferably from 30 minutes to 10 hours. • The reaction temperature is from 50 ° C to the reflux temperature of the reaction solvent, preferably from 10 ° C to the reflux temperature of the reaction solvent. If necessary, the compound of the formula (IV) can be used in the reaction of the reaction C with acetic acid of 0.05 to 0.10 molar equivalent. After the reaction of the reaction C, the reaction liquid can be used for this purpose or concentrated for use in the work D. The target compound for dehydration condensation can also be used in the engineering D for general separation. Engineering D is a process in which a compound of the formula C is closed with a compound of the formula (V) to form a compound of the formula (I). This work is carried out in the absence of solvent or solvent. The compound of the formula (V) is used in an amount of from 0.3 to 1.2 mol equivalents to the compound of the formula (IV), preferably from 0.5 to 1.0 mol equivalent. When R2 and R3 are not together with adjacent carbon atoms, it is preferred to use 0.55 to 0.75 mole equivalents. Further, when R2 and R3 form a cycloolefin together with an adjacent carbon atom, it is more preferably used in an amount of from 0.85 to 1.05 mol. The reaction solvent is toluene, xylene, chlorobenzene, or a mixed solvent of these, and toluene is preferably used. 38· 200835692 The reaction time is 30 minutes to 4 8 hours, preferably 3 minutes ~ i 6 hours. The reaction temperature is from 50 ° C to the reflux temperature of the reaction solvent, preferably from 1 Torr to the reflux temperature of the solvent. After the end of the reaction of the work D, the reaction liquid is used for the work a, or if necessary, it can be concentrated for use in the work A. The compound of the formula (I) can also be used in the engineering A by extraction according to a general method and by single purification. Process A is a process for hydrolyzing a compound of the formula (1) obtained in Process D to form a hydrolyzate of the compound of the formula (1). When hydrolyzed under acidic conditions, after hydrolysis, the alcohol was added to the reaction mixture to extract with an organic solvent. Alternatively, the reaction liquid may be extracted with an organic solvent, and then an alcohol may be added to the organic layer. When the hydrolysis is carried out under alkaline conditions, after the hydrolysis, an acid may be added to the reaction solution to form an acidity, and then the alcohol is added to the reaction solution, followed by extraction with an organic solvent. Further, after adding an acid to the reaction liquid to make it acidic, it is extracted with an organic solvent, and then an alcohol is added to the organic layer. Further, when the hydrolyzate is dissolved in the organic layer, the reaction solution may be extracted with an organic solvent, and then an alcohol and an acid may be added to the organic layer. After hydrolysis, the reaction solution can be used for the next project or, if necessary, concentrated for the next project. The organic solvent is preferably ethyl acetate or toluene. A) When hydrolyzed under acidic conditions, the acid is preferably used in an amount of from 0.25 to 1 (1 mol) to the compound of the formula (1), preferably from 1 to 3 mol equivalents. The acid can be hydrochloric acid or sulfuric acid. The reaction solvent, the reaction time, the reaction temperature, the precipitation time of the crystal, the precipitation temperature of the crystal, and the like can be used in the same manner as in the case of the hydrolysis described below under alkaline conditions. -39- 200835692 B) In the hydrolysis under alkaline conditions, the base may be used in the compound of the formula (I) in an amount of from 0. 25 to 3 mol equivalents, preferably from 0.8 to 2.5 mol equivalents, more preferably from 1.2 to 2 mol equivalents. The test may be sodium hydroxide, potassium hydroxide or lithium hydroxide, preferably sodium hydroxide. The base can be used as a solid or as an aqueous solution. The reaction solvent may be a mixed solvent of an alcohol (methanol, ethanol, n-propanol, or isopropanol) / water or a mixed solvent of toluene / alcohol (methanol, ethanol, n-propanol, or isopropanol) / water, preferably Toluene/methanol/water or methanol/water. The reaction time is 0.25 to 8 hours, preferably 0.5 to 2 hours. Φ The reaction temperature is from 10 ° C to 70 ° C, preferably from 20 ° C to 60 ° C. . . After the completion of the hydrolysis, if necessary, the reaction liquid may be washed with toluene to obtain a layer (aqueous layer or organic layer) in which the hydrolyzate of the compound of the formula (I) is dissolved. The acid to be added to the layer in which the reaction liquid or the hydrolyzate of the compound of the formula (I) is dissolved may be hydrochloric acid or sulfuric acid, preferably sulfuric acid. Engineering B is an engineering in which an alcohol is added to the hydrolyzate of the compound of the formula (I) produced in Engineering A to form a crystal of the compound of the formula (II). The added alcohol may be methanol, ethanol, n-propanol, isopropanol, or a mixed solvent of these, preferably isopropanol. The crystallization can be 0.25 to 12 hours, preferably 0.25 to 2 hours. The crystals may be precipitated at -10 ° C to 25 ° C, preferably at -5 ° C to 5 ° C. Works C, D, and A can be continuously implemented without leaving. Engineering E is a process in which a compound of the formula (II) is reacted with a halogenating agent to form a compound of the formula (VI). The halogenating agent may be used in the compound of the formula (II) in an amount of from 0.5 to 2 mol equivalents, preferably from 0.8 to 1.5 mol equivalents. -40- 200835692 The reaction solvent may be toluene, tetrahydrofuran, N, N_: methylformamide, N-methylpyrrolidone, or a mixed solvent thereof, and is preferably toluene/N-methylpyrrolidone or tetrahydrofuran/N. , a mixed solvent of N-dimethylformamide. The reaction time is 0 · 2 5~1 2 hours, preferably 〇 · 2 5~2 hours. The reaction temperature is 10 ° C ~ 5 0 X:, preferably 20 ° C ~ 3 0. After the end of the reaction of the work 4, the reaction liquid can be concentrated or concentrated as necessary for use in Engineering F. Engineering F is the engineering of a compound of formula (VIII) and a compound of formula (VII) or an acid salt thereof in the presence of a base of the base to form a compound of formula (VIII). The compound of the formula (vii) or its acid salt may be used in the compound of the formula (VI) in an amount of from 5 to 2 moles, preferably from 0.8 to 1.5 moles. The acid salt can be a hydrochloride, a hydrobromide or a sulfate, preferably a hydrochloride. The compound of the formula (VI) can be used in an amount of 〜 5 to 2 molar equivalents, preferably 〇 8 to 15 moles. The reaction solvent may be toluene, tetrahydrofuran, hydrazine, hydrazine-dimethylmethylamide, νmethylpyrrolidone, or a mixed solvent thereof, and is preferably toluene/hydrazine-methyl hydrazide® pyridine or tetrahydrofuran/oxime. , a mixed solvent of hydrazine-dimethylformamide. The reaction time is 0.2 5 to 1 2 hours, preferably 〇 · 2 5 to 2 hours. The reaction temperature is from 10 ° C to 50 ° C, preferably from 20 ° C to 30 ° C. When R7 is a hydrogen atom, the $p crystal can be analyzed after the end of the reaction of the engineering F. If necessary, alcohol is added to precipitate crystals, and methanol, ethanol, 1 ^ y-n-propanol, isopropanol, or a mixed solvent of these may be used, and it is preferably isopropyl alcohol. The crystallization can be from 0 to 25 to 12 hours, preferably from 0.25 to 2 hours. The crystallization may be -1 ° C to 25 ° C, preferably -5 ° C to 5 ° C. -41 - •200835692 When R7 is an alkyl group, it can be hydrolyzed under acidic conditions or in the presence of a base in the same manner as in Engineering A to obtain a compound of the formula (VIII) wherein R7 is a hydrogen atom. If necessary, in the same manner as in Engineering B, alcohol may be added to precipitate crystals, and methanol, ethanol, n-propanol, isopropanol, or a mixed solvent of these may be used, and it is preferred to use isopropyl alcohol crystallization to be 0 · 2 5 to 1 2 hours. It should be precipitated by 〇. 2 5~2 hours. The crystal may be -1 (TC~25 ° C, preferably -5 ° C to 5 ° C. In the present specification, the "solvate" includes, for example, a solvate with an organic solvent, a hydrate, etc., and an organic solvent. In the case of a solvate, it can be coordinated with any number of organic solvent molecules. When a hydrate is formed, it can be coordinated with any number of water molecules. It is preferred to use a hydrate. In the present specification, "Formula (I), (II) And (III), (IV), (V), (VI), (VII), and (VIII) a salt of a compound may be, for example, the formula (I), (11), (111), (IV), (V), (VI), (VII), and (VIII) compounds and alkali metals (lithium, sodium, potassium, etc.), alkaline earth metals (magnesium, calcium, etc.), ammonium, organic bases and amino acids, Or salts of inorganic acids (hydrochloric acid, hydrobromic acid, phosphoric acid, sulfuric acid, etc.) and organic acids (acetic acid, citric acid, maleic acid, fumaric acid, benzenesulfonic acid, p-toluenesulfonic acid, etc.). It is usually formed by the method of the above. The crystal of the compound of the formula (II) and the formula (VIII) produced by the above-mentioned production method can be obtained by X-ray analysis of the powder to obtain an X-ray diffraction pattern. It is easy to handle the manufacture of a pharmaceutical composition having the compound of the formula (VIII) as an active ingredient, and is useful for the production of a pharmaceutical composition due to high purity. As for the compound of the formula (II) and the formula (VIII) Crystallization is shown by the X-ray diffraction pattern in Examples 1 to 20 -42 to 200835692 described later (X-ray diffraction measurement conditions: tube ball CuKa line, tube voltage 40 Kv, tube current 40 mA or 50 mA, dsin θ = η λ ( η is an integer, d is a plane spacing (unit: A), and 0 is a diffraction angle (unit: degree)). These crystals are characterized by the respective diffraction angles or surface intervals. The following examples and test examples are further described. The present invention will be described in detail, but the present invention is not limited thereto. In the examples, the following abbreviations are used.

Me :甲基 Et :乙基 DMF : N,N-二甲基甲醯胺 THF :四氫呋-喃 DMSO :二甲亞颯 TMS :四甲基矽烷 (實施例) 實施例1化合物(ΙΙ-a)之合成Me: methyl Et: ethyl DMF: N,N-dimethylformamide THF: tetrahydrofuran-furan DMSO: dimethyl hydrazine TMS: tetramethyl decane (Example) The compound of Example 1 (ΙΙ- a) synthesis

(IV-a) 工程1(IV-a) Project 1

Ο (IH-a)Ο (IH-a)

工程1 將化合物(III-a,39.1 2,0.454 mol)、化合物(IV-a,20.3 -43- 200835692 g,0.189 mol)之甲苯(142 mL)溶液脫水回流5·5小時。將 反應液減壓濃縮,得濃縮液。此濃縮液用於次一反應。 工程2 於工程1所得濃縮液加化合物(V-a,61.3 g ’ 0.283 m〇O ,於120°C攪拌8小時。將反應液減壓濃縮,得含有化合 物(I-a)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(60 mL)、24%氫氧化鈉水溶 # 液(38 mL),於25°C攪拌0.5小時。將反應液減壓濃縮,以 甲苯(213 mL)洗淨。於水層順序加61%硫酸(3.3 g)、31%硫 酸(26 g)作成酸性,以乙酸乙酯(144 mL)萃取。將萃取液減 壓濃縮,加2-丙醇(24 mL),於0°C晶析0.5小時。濾集析 出結晶,乾燥而得化合物(II-a,36.6 g,71.4%)。Process 1 A solution of the compound (III-a, 39.1 2, 0.454 mol) and the compound (IV-a, 20.3 - 43 - 200835692 g, 0.189 mol) in toluene (142 mL) was refluxed for 1.5 hours. The reaction solution was concentrated under reduced pressure to give a concentrate. This concentrate is used in the next reaction. In the concentrate obtained in the first step, the compound (Va, 61.3 g '0.283 m〇O, was stirred at 120 ° C for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (Ia). In the next reaction, the concentrate obtained in Engineering 2 was added with methanol (60 mL), 24% sodium hydroxide water solution (38 mL), and stirred at 25 ° C for 0.5 hour. The reaction solution was concentrated under reduced pressure toluene. (213 mL) was washed. Add 61% sulfuric acid (3.3 g) and 31% sulfuric acid (26 g) to the aqueous layer for acidification, and extract with ethyl acetate (144 mL). Propanol (24 mL) was crystallized at 0 ° C for 0.5 h. The crystals were crystallized and dried to give compound (II-a, 36.6 g, 71.4%).

熔點:114°C NMR(CDCh ^ TMS) : 1.18 (t, 3H, J = 7.7), 2.24 (s, 3H), 2.73 (q, 2H, J = 7.5), 5.49 (br s, 2H), 7.09 (m, 2H), 7.29-7.3 8 (m, ® 3H), 8.38 (s, 1H), 14.53 (br s, 1H) 粉末X線繞射之結果如表1及第1圖。 主要.峰之繞射角:20 =10.5,15.1,19.5,21.7,25.2 度 【表1】 -44- 200835692Melting point: 114 ° C NMR (CDCh ^ TMS): 1.18 (t, 3H, J = 7.7), 2.24 (s, 3H), 2.73 (q, 2H, J = 7.5), 5.49 (br s, 2H), 7.09 (m, 2H), 7.29-7.3 8 (m, ® 3H), 8.38 (s, 1H), 14.53 (br s, 1H) The results of powder X-ray diffraction are shown in Table 1 and Figure 1. Main. The diffraction angle of the peak: 20 = 10.5, 15.1, 19.5, 21.7, 25.2 degrees [Table 1] -44- 200835692

27.860 0.188 28.460 0.188 28. 960 0.165 29.520 0.188 30· 260 0.14127.860 0.188 28.460 0.188 28. 960 0.165 29.520 0.188 30· 260 0.141

7 6 6 4 2 9 3 0 3 1 9 3>8>25 110 0 9 ci 3· 3· 3· CsJ 30. 500 0.165 2. 9285 7170 30.940 0.212 2. 8878 7727 33.180 0.188 2. 6978 5917 33.480 0.141 2. 6743 3375 33. 580 0. t18 2. 6666 3507 35.120 36.540 37. 840 38. 800 6 5 1215 7 3 8 8 3 Λ/* 1— f i»~<— 1* 1— 0·0·0· 5 9 2 0¾ 3 5 8 2 22 23 3 f 1. 6 o 3 7 5 9 !55I5J7J1 »4 3 3 Cv} 2· 2· 2· 8 7 0 3 6 7 3 7 6 15 2 3 4 5 5 -2 . 1J · 2 Θ 捜峰設定幅 d値 強度 相對強度 10. 240 0.118 8.6314 8850 19 10. 540 0-165 8. 3864 4S120 100 11.540 0.188 7. 6618 21325 45 13. 600 0.165 6. 5055 13748 29 14. 080 0.165 6. 2848 4192 9 14.340 0.165 6.1714 5617 Ϊ2 15.100 0.188 5.8625 33417 70 16.380 0.188 5. 4071 3875 9 17. 280 0.212 5.1275 25265 53 m mi 18. 620 0.165 4. 7614 16650 35 19.160 0.118 4, 6284 5147 11 19. 460 0.188 4.5577 29203 61 20· 200 0.165 4.3924 4033 9 21.480 0.141 4.1335 16787 35 21,740 0,165 4.0846 27045 57 22.040 0.118 4.0297 19158 40 22· 220 0.165 3. 9974 22852 48 22.800 0. 212 3.8971 6607 14 23· 220 0.188 3· 8275 9S07 21 23.580 0. t41 3.7699 4500 10 25. 220 0.188 3.5283 42992 90 26.160 0.188 3.4036 62Q8 13 26.500 0.188 3.3607 6187 13 27.420 0.188 3· 2500 4648 10 17108 11918 4882 5660 5187 實施例2化合物(Π-b)之合成 -45 - 2008356927 6 6 4 2 9 3 0 3 1 9 3>8>25 110 0 9 ci 3· 3· 3· CsJ 30. 500 0.165 2. 9285 7170 30.940 0.212 2. 8878 7727 33.180 0.188 2. 6978 5917 33.480 0.141 2 6743 3375 33. 580 0. t18 2. 6666 3507 35.120 36.540 37. 840 38. 800 6 5 1215 7 3 8 8 3 Λ/* 1— fi»~<– 1* 1— 0·0·0· 5 9 2 03⁄4 3 5 8 2 22 23 3 f 1. 6 o 3 7 5 9 !55I5J7J1 »4 3 3 Cv} 2· 2· 2· 8 7 0 3 6 7 3 7 6 15 2 3 4 5 5 - 2 . 1J · 2 捜 Peak set width d値 intensity relative intensity 10. 240 0.118 8.6314 8850 19 10. 540 0-165 8. 3864 4S120 100 11.540 0.188 7. 6618 21325 45 13. 600 0.165 6. 5055 13748 29 14 080 0.165 6. 2848 4192 9 14.340 0.165 6.1714 5617 Ϊ2 15.100 0.188 5.8625 33417 70 16.380 0.188 5. 4071 3875 9 17. 280 0.212 5.1275 25265 53 m mi 18. 620 0.165 4. 7614 16650 35 19.160 0.118 4, 6284 5147 11 19. 460 0.188 4.5577 29203 61 20· 200 0.165 4.3924 4033 9 21.480 0.141 4.1335 16787 35 21,740 0,165 4.0846 27045 57 22.040 0.118 4.0297 19158 40 22· 220 0.165 3. 9974 22852 48 22.800 0. 21 2 3.8971 6607 14 23· 220 0.188 3· 8275 9S07 21 23.580 0. t41 3.7699 4500 10 25. 220 0.188 3.5283 42992 90 26.160 0.188 3.4036 62Q8 13 26.500 0.188 3.3607 6187 13 27.420 0.188 3· 2500 4648 10 17108 11918 4882 5660 5187 Implementation Synthesis of the compound of Example 2 (Π-b) -45 - 200835692

工程1Project 1

將化合物(ΙΠ-a,39.1 g,0.454 mol)、化合物(IV-b, 23.7g,0.189 mol)之甲苯(142 mL)溶液脫水回流5小時。將 反應液減壓濃縮,得濃縮液。此濃縮液用於次一反應。 工程2 於工程1所得濃縮液加化合物(V-a,61.3 g,0.283 mol) ,於1 1 7°C攪拌8小時。將反應液減壓濃縮,得含有化合 物(I-b)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(60 mL)、26%氫氧化鈉水溶 液(4 3.7 g),於25 °C攪拌0.5小時。將反應液減壓濃縮,以 甲苯(213 mL)洗淨。於水層順序加61 %硫酸(3.3 g)、31%硫 酸(26 g)作成酸性,以乙酸乙酯(144mL)萃取。以水(95 mL) 洗淨後,將萃取液減壓濃縮,加2-丙醇(24 mL),於〇°C晶 析0.5小時。濾集析出結晶,乾燥而得化合物(II-b,35.9 g ,65·6%)。A solution of the compound (ΙΠ-a, 39.1 g, 0.454 mol) and the compound (IV-b, 23.7 g, 0.189 mol) in toluene (142 mL) was refluxed for 5 hr. The reaction solution was concentrated under reduced pressure to give a concentrate. This concentrate is used in the next reaction. Engineering 2 The concentrate obtained in Engineering 1 was added with a compound (V-a, 61.3 g, 0.283 mol), and stirred at 1 17 ° C for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (I-b). This concentrate is used in the next reaction. Engineering 3 The concentrate obtained in Engineering 2 was added with methanol (60 mL) and 26% aqueous sodium hydroxide solution (4 3.7 g), and stirred at 25 ° C for 0.5 hour. The reaction solution was concentrated under reduced pressure and washed with toluene (213 mL). In the aqueous layer, 61% sulfuric acid (3.3 g) and 31% sulfuric acid (26 g) were acidified and extracted with ethyl acetate (144 mL). After washing with water (95 mL), the extract was concentrated under reduced pressure, and then 2-propanol (24 <RTIgt; The crystals were precipitated by filtration and dried to give compound (II-b, 35.9 g, 65.6%).

熔點:1 10〜11 1°C -46· 200835692 NMR(DMS〇-(h、TMS) : 1.05 (t,3H,J = 7.5),2.24 (s,3H), 2.75 (q, 2H, J = 7.5), 5.48 (s, 2H), 7.15-7.25 (m, 4H), 8.32 (s, 1H), 14.68 (s, 1H) 粉末X線繞射之結果如表2及第2圖。 主要峰之繞射角:20=13.7,19.〇,24·2,26·4,27·8 度 【表2】Melting point: 1 10~11 1°C -46· 200835692 NMR (DMS〇-(h, TMS): 1.05 (t, 3H, J = 7.5), 2.24 (s, 3H), 2.75 (q, 2H, J = 7.5), 5.48 (s, 2H), 7.15-7.25 (m, 4H), 8.32 (s, 1H), 14.68 (s, 1H) The results of powder X-ray diffraction are shown in Table 2 and Figure 2. Main peak winding Shooting angle: 20=13.7,19.〇,24·2,26·4,27·8 degrees [Table 2]

ο ο ο ο ο 2 0 4 2 8 »2275 Ιο2.3.3.4. 1— 1» 1— 1 1 8 16 5 -88406 t— 1— 1. 00 i— ιο· ο· ο· ο· ο· d値 強度 8.1700 13027 7. 24S7 3957 6.6816 17142 6. 4489 77085 6.0704 3063ο ο ο ο ο 2 0 4 2 8 »2275 Ιο2.3.3.4. 1—1» 1—1 1 8 16 5 -88406 t—1— 1. 00 i— ιο· ο· ο· ο· ο· d値Strength 8.1700 13027 7. 24S7 3957 6.6816 17142 6. 4489 77085 6.0704 3063

15.060 0.212 5. 8780 5818 8 15. 780 0.165 5.6114 10943 15 17.160 0.165 5.1631 7473 10 18. 040 0.188 4. 9132 27957 37 18. 960 0.188 4. 6768 48507 63 20. 440 21.740 22. 700 22-900 23. 320 24.180 25.140 25. 700 26. 420 27. 760 6 8 4 1 &amp; if 1— it it 1. 0·0·0·0· ο· 0Γ2ΪΙ 0.141 0.235 0.188 0.188 4. 3414 15035 4. 0846 9210 3. 9140 6683 3. 8803 5162 3.8113 7670 3. 6777 3. 5394 3.4635 3.3707 3. 2110 34875 3605 18045 34753 39982 20129 710465244652 28.240 0.188 3.1575 3567 5 29. 360 0.188 3.0395 3997 6 29. 820 0.235 2. 9937 17890 24 30. 380 0.165 2.9398 4750 7 31.900 0.118 2.8031 3463 5 32.160 0.188 2.7810 5760 8 32.880 0.2ί2 2.7217 5135 7 33.900 0. 212 2.6421 3972 6 36. 380 0.212 2.4675 3473 5 37.320 0.235 2.4075 4157 6 實施例3化合物(II-c)之合成 -47- 20083569215.060 0.212 5. 8780 5818 8 15. 780 0.165 5.6114 10943 15 17.160 0.165 5.1631 7473 10 18. 040 0.188 4. 9132 27957 37 18. 960 0.188 4. 6768 48507 63 20. 440 21.740 22. 700 22-900 23. 320 24.180 25.140 25. 700 26. 420 27. 760 6 8 4 1 &amp; if 1— it it 1. 0·0·0·0· ο· 0Γ2ΪΙ 0.141 0.235 0.188 0.188 4. 3414 15035 4. 0846 9210 3. 9140 6683 3. 8803 5162 3.8113 7670 3. 6777 3. 5394 3.4635 3.3707 3. 2110 34875 3605 18045 34753 39982 20129 710465244652 28.240 0.188 3.1575 3567 5 29. 360 0.188 3.0395 3997 6 29. 820 0.235 2. 9937 17890 24 30. 380 0.165 2.9398 4750 7 31.900 0.118 2.8031 3463 5 32.160 0.188 2.7810 5760 8 32.880 0.2ί2 2.7217 5135 7 33.900 0. 212 2.6421 3972 6 36. 380 0.212 2.4675 3473 5 37.320 0.235 2.4075 4157 6 Synthesis of the compound of Example 3 (II-c) - 47- 200835692

將化合物(ΙΠ-a,39.1 g,0.454 mol)、化合物(IV-c,21.4 g,0.189 mol)之甲苯(142 mL)溶液脫水回流5小時。將反 應液減_壓濃縮,得濃縮液。此濃縮液用於次一反應。 工程2 於工程1所得濃縮液加化合物(V-a,61.3 g,0.283 mol) ,於1 1 7 °C攪拌8小時。將反應液減壓濃縮,得含有化合 物(I-c)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(60 mL)、24%氫氧化鈉水溶 液(3 8.4 mL),於25 °C攪拌0.5小時。將反應液減壓濃縮, 以甲苯(213 mL)洗淨。於水層順序加61 %硫酸(3.3 g)、31% 硫酸(26 g)作成酸性,以乙酸乙酯(144 mL)萃取。以水(95 mL)洗淨後,萃取液減壓濃縮,加2-丙醇(24 mL) ’於0°C 晶析0.5小時。濾集析出結晶,乾燥而得化合物(II-c, 37.5 g,71.5%)。A solution of the compound (ΙΠ-a, 39.1 g, 0.454 mol) and the compound (IV-c, 21.4 g, 0.189 mol) in toluene (142 mL) was refluxed for 5 hours. The reaction solution was concentrated under reduced pressure to obtain a concentrated liquid. This concentrate is used in the next reaction. Engineering 2 The concentrate obtained in Engineering 1 was added with a compound (V-a, 61.3 g, 0.283 mol), and stirred at 1 1 ° C for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (I-c). This concentrate is used in the next reaction. Engineering 3 The concentrate obtained in Engineering 2 was added with methanol (60 mL) and 24% aqueous sodium hydroxide solution (3 8.4 mL), and stirred at 25 ° C for 0.5 hour. The reaction solution was concentrated under reduced pressure and washed with toluene (213 mL). The aqueous layer was sequentially acidified with 61% sulfuric acid (3.3 g) and 31% sulfuric acid (26 g), and extracted with ethyl acetate (144 mL). After washing with water (95 mL), the extract was concentrated under reduced pressure, and then 2-propanol (24 <RTIgt; The crystals were precipitated by filtration and dried to give compound (II-c, 37.5 g, 71.5%).

熔點:1 3 1°C -48- 200835692 NMR(DMSO-d6、TMS) : 1.00- 1.30(m, 5H), 1.22(t, 3H, J = 7.5), 1.55- 1.90(m, 6H), 2.24(s, 3H), 2.82(q, 2H, J = 7.2), 3.90-4.20(m, 2H), 8.29(s, 1H) 粉末X線繞射之結果如表3及第3圖。 主要峰之繞射角:20=9·8,14·5,2〇.4,21·9,25.6 度 【表3】 2 Θ 捜峰設定幅 強度相對強度Melting point: 1 3 1 ° C -48 - 200835692 NMR (DMSO-d6, TMS): 1.00 - 1.30 (m, 5H), 1.22 (t, 3H, J = 7.5), 1.55 - 1.90 (m, 6H), 2.24 (s, 3H), 2.82 (q, 2H, J = 7.2), 3.90-4.20 (m, 2H), 8.29 (s, 1H) The results of powder X-ray diffraction are shown in Table 3 and Figure 3. The diffraction angle of the main peak: 20=9·8, 14·5, 2〇.4, 21·9, 25.6 degrees [Table 3] 2 Θ Peak setting amplitude Strength relative intensity

9.160 9. 780 11.380 12.700 14. 520 15:26〇 17. 860 18. 420 19· 240 19. 800 5 15 8 9 6 4 6 8 5 1» t» 1» 1» rt/~ ο· d ο· ο· 5 5 5 5 8 6 6 6 3 1» 1— i— 1 Λ/- ci 0·0·0· o· 9, 6465 26548 9. 0363 60607 7.7692 15588 6. 9645 9470 6.0953 37578 5. 8241 10905 4.9623 9370 4.8126 10147 4. 6093 8260 4. 4802 15892 4 0 6 6 2 φ ο 2 1 6 8 6 7 if it 1427 20.440 0.165 21. 940 0.188 22. 520 0,188 22. 940 0.165 24. 000 0.188 4. 3414 28042 4. 0478 27668 3. 9449 22020 3. 8736 8088 3. 7048 4438 47463714δ 24. 320 24. 980 25.580 27.020 28. 060 29:160…’ 30.140 30· 900 32. 080 3 8 8 2 5·一 2 β 55 5 5 8 8 1 6;1 8 印 6 ^01121 „.2 111 0·0*0· 0· 010· ο· ο· ο. 3.6568 6000 to 3.5617 19927 33 3.4795 29438 49 3. 2972 10233 17 3J773 44S0 8 3:獅f 12447’…… ……·21 2. 9626 3910 7 2.8915 6073 11 2. 7878 6487 11 實施例4化合物(Π-d)之合成 -49- ,200835692 工程19.160 9. 780 11.380 12.700 14. 520 15:26〇17. 860 18. 420 19· 240 19. 800 5 15 8 9 6 4 6 8 5 1» t» 1» 1» rt/~ ο· d ο· ο· 5 5 5 5 8 6 6 6 3 1» 1— i— 1 Λ/- ci 0·0·0· o· 9, 6465 26548 9. 0363 60607 7.7692 15588 6. 9645 9470 6.0953 37578 5. 8241 10905 4.9623 9370 4.8126 10147 4. 6093 8260 4. 4802 15892 4 0 6 6 2 φ ο 2 1 6 8 6 7 if it 1427 20.440 0.165 21. 940 0.188 22. 520 0,188 22. 940 0.165 24. 000 0.188 4. 3414 28042 4. 0478 27668 3. 9449 22020 3. 8736 8088 3. 7048 4438 47463714δ 24. 320 24. 980 25.580 27.020 28. 060 29:160...' 30.140 30· 900 32. 080 3 8 8 2 5·1 2 β 55 5 5 8 8 1 6;1 8 India 6 ^01121 „.2 111 0·0*0· 0· 010· ο· ο· ο. 3.6568 6000 to 3.5617 19927 33 3.4795 29438 49 3. 2972 10233 17 3J773 44S0 8 3: lion f 12447'...... ......·21 2. 9626 3910 7 2.8915 6073 11 2. 7878 6487 11 Synthesis of the compound of Example 4 (Π-d) -49- , 200835692 Project 1

Me Me—( NH2 (IV-d)Me Me—( NH2 (IV-d)

〇 (lll-a)〇 (lll-a)

工程1 將化合物(ΙΠ-a,39·1 g,0.454 mol)、化合物(IV-d,16.5 g,0.189 mol)之甲苯(142 mL)溶液脫水回流8小時。將反 應液減壓濃縮,得濃縮液。此濃縮液用於次一反應。 工程2 於工程1所得濃縮液加化合物(V-a,61.3 g,0.28 3 mol) ,於120°C攪拌8小時。將反應液減壓濃縮,得含有化合 物(I-d)之濃縮液。此濃縮液用於次一反應。The solution of the compound (ΙΠ-a, 39·1 g, 0.454 mol) and the compound (IV-d, 16.5 g, 0.189 mol) in toluene (142 mL) was refluxed for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate. This concentrate is used in the next reaction. Engineering 2 The concentrate obtained in Engineering 1 was added with a compound (V-a, 61.3 g, 0.28 3 mol), and stirred at 120 ° C for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (I-d). This concentrate is used in the next reaction.

工程3 於工程2所得濃縮液加甲醇(60 mL)、24%氫氧化鈉水溶 液(3 8.4 mL),於25 °C攪拌0.5小時。將反應液減壓濃縮, 以甲苯(213 mL)洗淨。於水層順序加61 %硫酸(3.3 g)、31% 硫酸(26 g)作成酸性,以乙酸乙酯(144 mL)萃取。以水(95 mL)洗淨後,萃取液減壓濃縮,加2-丙醇(24 mL),於0°C 晶析0.5小時。濾集析出結晶,乾燥而得化合物(Il-d, 28.2 g,59.3%)。Engineering 3 The concentrate obtained in Engineering 2 was added with methanol (60 mL) and 24% aqueous sodium hydroxide solution (3 8.4 mL), and stirred at 25 ° C for 0.5 hour. The reaction solution was concentrated under reduced pressure and washed with toluene (213 mL). The aqueous layer was sequentially acidified with 61% sulfuric acid (3.3 g) and 31% sulfuric acid (26 g), and extracted with ethyl acetate (144 mL). After washing with water (95 mL), the extract was concentrated under reduced pressure, and then 2-propanol (24 <RTIgt; The crystals were precipitated by filtration and dried to give compound (Il-d, 28.2 g, 59.3%).

熔點:1 0 6 °C -50- .200835692 NMR(DMS〇-d6、TMS) : l.〇2(d, 6H, J = 6.6), 1.28(t, 3H, J = 7.5), 1.56- 1.66(m, 2H), 1.78(m, 1H), 2.23(s, 3H)? 2.79(q? 2H, J = 7.5), 4.10-4.21(m, 2H), 8.28(s, 1H)粉末X線繞射之結果如表4及第4圖。 主要峰之繞射角:20=1〇.1,1〇·8,21·3,26·〇度 【表4】 2 Θ 捜峰設定幅 d値 強度 相對強度Melting point: 1 0 6 ° C -50- .200835692 NMR (DMS〇-d6, TMS) : l.〇2(d, 6H, J = 6.6), 1.28(t, 3H, J = 7.5), 1.56- 1.66 (m, 2H), 1.78(m, 1H), 2.23(s, 3H)? 2.79(q? 2H, J = 7.5), 4.10-4.21(m, 2H), 8.28(s, 1H) powder X-ray winding The results of the shooting are shown in Table 4 and Figure 4. The diffraction angle of the main peak: 20=1〇.1,1〇·8,21·3,26·〇 [Table 4] 2 Θ Peak setting width d値 Intensity Relative strength

o o o o Q 4 6 2 2 4 17 9 17 ο· ο· 2·4.5. i— li 1— 1» 1— 8 5 5 5 1 18 6 6 6 4 1— 1» 1 t» 1» 8. 7163 65433 100 8. 2154 32057 49 6· 8464 7662 12 6· 2671 13083 20 5.6255 3253 5 16.060 0.165 5.5142 10022 16 18. 000 0.188 4. 9240 15025 23 18. 680 0.165 4. 7462 11157 18 19.740 0.165 4.4937 10558 17 20. 380 0.188 4. 3540 4202 7 20. 900 0.188 4.2468 14033 22 21. 260 0.188 4.1757 38532 59 21. 660 0.188 4. 0995 16912 26 21.860 0.118 4.0625 8093 13 22.440 0.188 3. 9588 11630 18 22.960 0.188 3/8703 6895 11 23. 320 0.188 3.8113 9763 15 24. 500 0.165 3. 6304 3357 6 25.120 0.188 3.5421 16370 26 25.360 0.118 3.5092 8232 13 §§gQSIII§ 2628293131:32333 ___Β 1» S Γ______, 8 8 4 25 ρ:6 6 π i— i— it .tf Λύ ^11 i· 0.ο· 0.0.010.ο· ο· 6 ο 7 1 6【6 ο 8 1 φ 5 8^7 t 2 2 8 4 7 τ«5 ο 7 4 1 ο 8 8Τ 7 6 3· 3· 3* m2* 2· C\i 6512931822703-0705 9 8 7 砌 4¾ rr 7 7 3 3 2 4 00 436 620716 714 實施例5化合物(Π-e)之合成 -5l - .200835692Oooo Q 4 6 2 2 4 17 9 17 ο· ο· 2·4.5. i— li 1— 1» 1— 8 5 5 5 1 18 6 6 6 4 1— 1» 1 t» 1» 8. 7163 65433 100 8. 2154 32057 49 6· 8464 7662 12 6· 2671 13083 20 5.6255 3253 5 16.060 0.165 5.5142 10022 16 18. 000 0.188 4. 9240 15025 23 18. 680 0.165 4. 7462 11157 18 19.740 0.165 4.4937 10558 17 20. 380 0.188 4. 3540 4202 7 20. 900 0.188 4.2468 14033 22 21. 260 0.188 4.1757 38532 59 21. 660 0.188 4. 0995 16912 26 21.860 0.118 4.0625 8093 13 22.440 0.188 3. 9588 11630 18 22.960 0.188 3/8703 6895 11 23. 320 0.188 3.8113 9763 15 24. 500 0.165 3. 6304 3357 6 25.120 0.188 3.5421 16370 26 25.360 0.118 3.5092 8232 13 §§gQSIII§ 2628293131:32333 ___Β 1» S Γ______, 8 8 4 25 ρ:6 6 π i— i— It .tf Λύ ^11 i· 0.ο· 0.0.010.ο· ο· 6 ο 7 1 6【6 ο 8 1 φ 5 8^7 t 2 2 8 4 7 τ«5 ο 7 4 1 ο 8 8Τ 7 6 3· 3· 3* m2* 2· C\i 6512931822703-0705 9 8 7 Building 43⁄4 rr 7 7 3 3 2 4 00 436 620716 714 Synthesis of the compound of Example 5 (Π-e) -1l - . 200835692

Me〆 〇 (lll-a)Me〆 〇 (lll-a)

工程1Project 1

(l-e)(l-e)

工程1Project 1

將化合物(III-a,58.6 g,0.681 mol)、化合物(IV-e,27.1g ,0.189 mol)之甲苯(142 mL)溶液脫水回流5小時。將反應 液減壓濃縮,得濃縮液。此濃縮液用於次一反應。 工程2 於工程1所得濃縮液加化合物(V-a,61.3 g,0.283 mol) ,於117°C攪拌8小時。將反應液減壓濃縮,得含有化合 物(I-e)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(59 mL)、24%氫氧化鈉水溶 液(3 8.6 mL),於25 °C攪拌0.5小時。將反應液減壓濃縮, 以甲苯(212 mL)洗淨。於水層順序加61 %硫酸(3.3 g),次 以31%硫酸(26 g)作成酸性,以乙酸乙酯(144 mL)萃取。以 水(95 mL)洗淨後,萃取液減壓濃縮,加2-丙醇(24 mL), 於0°C晶析0.5小時。濾集析出結晶,乾燥而得化合物(π_ e,39.6 g,68.1%)。A solution of the compound (III-a, 58.6 g, 0.681 mol), compound (IV-e, 27.1 g, 0.189 mol) in toluene (142 mL) was refluxed for 5 hours. The reaction solution was concentrated under reduced pressure to give a concentrate. This concentrate is used in the next reaction. Engineering 2 The concentrate obtained in Engineering 1 was added with a compound (V-a, 61.3 g, 0.283 mol), and stirred at 117 ° C for 8 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (I-e). This concentrate is used in the next reaction. Engineering 3 The concentrate obtained in Engineering 2 was added with methanol (59 mL) and 24% aqueous sodium hydroxide solution (3 8.6 mL), and stirred at 25 ° C for 0.5 hour. The reaction solution was concentrated under reduced pressure and washed with toluene (212 mL). The aqueous layer was sequentially added with 61% sulfuric acid (3.3 g), followed by 31% sulfuric acid (26 g), and extracted with ethyl acetate (144 mL). After washing with water (95 mL), the extract was concentrated under reduced pressure, and then 2-propanol (24 <RTIgt; The crystals were precipitated by filtration and dried to give compound (π_e, 39.6 g, 68.1%).

熔點:1 3 1〜1 3 2 °C -52- 200835692 H-NMR(CDCh、TMS) : 1.21(t, 3H,J = 7.7),2.25(s,2,73(q,2H,J = 7.4),5.42(br s,2H),6.86(m,1H),6·9ι 1H,J=10.8,7.4 and 2.3),7.15(dt,1H,J = 9.9 and 8.39(s, 1H), 14.31(br s, 1H) 粉末X線繞射之結果如表5及第5圖。 主要峰之繞射角:20=13.4,13.8,19·〇,24·3,27.9 度 【表5】 ~2 Θ 捜峰設定幅 d値—~強度 相對強度 3H), (ddd, 8.3),Melting point: 1 3 1~1 3 2 °C -52- 200835692 H-NMR (CDCh, TMS): 1.21 (t, 3H, J = 7.7), 2.25 (s, 2, 73 (q, 2H, J = 7.4) ), 5.42 (br s, 2H), 6.86 (m, 1H), 6·9ι 1H, J = 10.8, 7.4 and 2.3), 7.15 (dt, 1H, J = 9.9 and 8.39 (s, 1H), 14.31 ( Br s, 1H) The results of powder X-ray diffraction are shown in Tables 5 and 5. The diffraction angle of the main peaks: 20=13.4, 13.8, 19·〇, 24·3, 27.9 degrees [Table 5] ~2 Θ 捜Peak set width d値—~ intensity relative intensity 3H), (ddd, 8.3),

o w o o Q 04(0 ο 4 8 0 4 8 0 ο· 2· 3· 3* 5· 1— ii 1— 1— 1 0.188 0.188 0.188 0.188 0.165 0 7 2 7 7 5 4 2 15 8 4 0 18 13 6 4 8 5 5 〇9 8 8 6 6558 8 1 t— 1 1— 1. cri ο· ο· ο· ο· 5 4 t &gt;-420 :0592t ”90260 5 2 9 6 4 19250 40 5348 12 27512 57 48528 100 4795 10 8180 17一 3640 8 18187 38 22233 46 5250 11 15. 840 11020 17.980 19.020 20.160 21.820 0.306 4.0698 4742 10 22. m 0.165 3. 9518 3413 8 22.820 0.188 3· 8937 5980 13 23.400 0.188 3· 7985 5430 12 24. 260 0.212 3. 6657 22273 46 25. 620 26.460 26. 900 27.880 28,480 一29:*800^…. 30.240 31.620 32.840 33.340 2 8 5 85^8 3 2 8 2 18 6 86^8 5 1-8^ 2 t 1 11* 3 A/w f 2 0·0·0♦0.0·*0:0·0·0· ο. 3· 4741 12558 26 3· 3657 21558 45 3.3117 4582 to 3.1974 30877 64 3.1314 3447 8 …2:爾厂 —葡7……… ……—39* 2.9531 61S5 13 2,8273 4927 11 2.7250 3157 7 2.6852 3182 7 2.2630 3738 8 39.800 0.212 實施例6化合物(ΙΙ-f)之合成 -53- 200835692Owoo Q 04(0 ο 4 8 0 4 8 0 ο· 2· 3· 3* 5· 1— ii 1— 1— 1 0.188 0.188 0.188 0.188 0.165 0 7 2 7 7 5 4 2 15 8 4 0 18 13 6 4 8 5 5 〇9 8 8 6 6558 8 1 t— 1 1— 1. cri ο· ο· ο· ο· 5 4 t &gt;-420 :0592t ”90260 5 2 9 6 4 19250 40 5348 12 27512 57 48528 100 4795 10 8180 17 a 3640 8 18187 38 22233 46 5250 11 15. 840 11020 17.980 19.020 20.160 21.820 0.306 4.0698 4742 10 22. m 0.165 3. 9518 3413 8 22.820 0.188 3· 8937 5980 13 23.400 0.188 3· 7985 5430 12 24. 260 0.212 3. 6657 22273 46 25. 620 26.460 26. 900 27.880 28,480 a 29:*800^.... 30.240 31.620 32.840 33.340 2 8 5 85^8 3 2 8 2 18 6 86^8 5 1-8^ 2 t 1 11* 3 A/wf 2 0·0·0♦0.0·*0:0·0·0· ο. 3· 4741 12558 26 3· 3657 21558 45 3.3117 4582 to 3.1974 30877 64 3.1314 3447 8 ...2 :尔厂—Portuguese 7...............—39* 2.9531 61S5 13 2,8273 4927 11 2.7250 3157 7 2.6852 3182 7 2.2630 3738 8 39.800 0.212 Synthesis of the compound of Example 6 (ΙΙ-f) -53- 200835692

將化合物(III-b,10.0g,0.079 mol)、化合物(IV-C,8.97 g,0.07 9 mol)之甲苯(100 mL)溶液脫水回流7小時。 工程2 於工程1所得反應液加化合物(V-b,20.56 g,0.095 mol) ,加熱回流16小時。將反應液減壓濃縮,得含有化合物 (I-f)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(150 mL)、2N氫氧化鈉水溶 液(7 9 mL,0.158 mol),於25 °C攪拌3小時。將反應液減 壓濃縮,加甲苯和水,分離水層。於水層加5N鹽酸(34 mL),以乙酸乙酯萃取。萃取液減壓濃縮,力卩2-丙醇(40 mL),於0°C攪拌1小時而晶析。濾集析出結晶,乾燥而得 化合物(ΙΙ-f,15.5 g,61.6%)。 NMR(CDCh、TMS) : 1.05-1.71 (m, 19H), 2.70-2.74(m, 2H), 2.98-3.01(m,2H),4.06 (bs,2H),8·21 (s,1H),14.96 (s,1H) 粉末X線繞射之結果如表6及第6圖。 主要峰之繞射角:20 =10.2,11.4,15.0,18.2,20.6, 21.5 度 -54- 200835692A solution of the compound (III-b, 10.0 g, 0.079 mol) and the compound (IV-C, 8.97 g, 0.07 mol) in toluene (100 mL) was refluxed for 7 hr. In the reaction liquid obtained in the above, the compound (V-b, 20.56 g, 0.095 mol) was added and heated under reflux for 16 hours. The reaction solution was concentrated under reduced pressure to give a concentrated liquid containing compound (I-f). This concentrate is used in the next reaction. Engineering 3 The concentrate obtained in Engineering 2 was added with methanol (150 mL), 2N aqueous sodium hydroxide solution (7 9 mL, 0.158 mol), and stirred at 25 ° C for 3 hours. The reaction solution was concentrated under reduced pressure, toluene and water were added, and the aqueous layer was separated. 5N Hydrochloric acid (34 mL) was added to aq. The extract was concentrated under reduced pressure and EtOAc (EtOAc) The crystals were precipitated by filtration and dried to give compound (?-f, 15.5 g, 61.6%). NMR (CDCh, TMS): 1.05-1.71 (m, 19H), 2.70-2.74 (m, 2H), 2.98-3.01 (m, 2H), 4.06 (bs, 2H), 8. 21 (s, 1H), 14.96 (s, 1H) The results of powder X-ray diffraction are shown in Tables 6 and 6. Diffraction angle of the main peak: 20 = 11.2, 11.4, 15.0, 18.2, 20.6, 21.5 degrees -54- 200835692

2 Θ d値 強度 相對強度 10.225 8.64424 75.6 68.3 11.368 7.777 72.3 65.4 14.963 5.91599 70.3 63.5 15.34 5.7713 32.9 29.7 15.857 5.58444 21.2 19.2 17.052 5.19562 34.5 31.2 18.15 4.88349 72.3 65.4 18.713 4.73784 15 13.6 19.73 4.49593 26.2 23.7 20.074 4.41965 42.2 38.1 20.565 4.31529 111 100 21.196 4.18823 ^ 43.8 39.6 21.466 4.13617 83.3 75.3 21.975 4.04138 27.9 25.2 22.823 3.89325 62.6 56.6 23.408 3.79726 50.8 45.9 23.748 3.74359 49.8 45,1 24.105 3.68889 26.5 24 26.736 3.33161 14.3 13 28.598 3.11872 12.4 ^ 11.2 28.892 3.08773 11.8 10.7 29.557 3.01971 13.5 12.2 29.82 2.99372 13 11.7 31.52 2.83599 16.1 14.6 33.017 2.71078 11.3 10.2 33.454 2.67632 9.61 8.7 34.817 2.57465 8.55 7.7 35.301 2.54042 8.78 7.9 35.937 2.49694 8.51 7.7 36.337 2.47034 6.89 6.2 37.262 2.4111 6.34 5.7 38,3 2.34809 7.61 6.9 實施例7化合物(II_g)之合成 Et〇、 02 Θ d値 intensity relative intensity 10.225 8.64424 75.6 68.3 11.368 7.777 72.3 65.4 14.963 5.91599 70.3 63.5 15.34 5.7713 32.9 29.7 15.857 5.58444 21.2 19.2 17.052 5.19562 34.5 31.2 18.15 4.88349 72.3 65.4 18.713 4.73784 15 13.6 19.73 4.49593 26.2 23.7 20.074 4.41965 42.2 38.1 20.565 4.31529 111 100 21.196 4.18823 ^ 43.8 39.6 21.466 4.13617 83.3 75.3 21.975 4.04138 27.9 25.2 22.823 3.89325 62.6 56.6 23.408 3.79726 50.8 45.9 23.748 3.74359 49.8 45,1 24.105 3.68889 26.5 24 26.736 3.33161 14.3 13 28.598 3.11872 12.4 ^ 11.2 28.892 3.08773 11.8 10.7 29.557 3.01971 13.5 12.2 29.82 2.99372 13 11.7 31.52 2.83599 16.1 14.6 33.017 2.71078 11.3 10.2 33.454 2.67632 9.61 8.7 34.817 2.57465 8.55 7.7 35.301 2.54042 8.78 7.9 35.937 2.49694 8.51 7.7 36.337 2.47034 6.89 6.2 37.262 2.4111 6.34 5.7 38,3 2.34809 7.61 6.9 Synthesis of the compound of Example 7 (II_g) Et〇, 0

Me- (IV-f)Me- (IV-f)

NH 2 (lll-b) 工程1NH 2 (lll-b) Project 1

EtOOC COOEt (V-b) -^ 工程2EtOOC COOEt (V-b) -^ Project 2

(i-g) 工程3(i-g) Project 3

(ii-g) -55- 200835692 工程1 將化合物(ΙΠ-b,30.0 g,0.238 mol)、化合物(iv-f,20.9 g,0.286 mol)之甲苯(80 mL)溶液脫水回流5.5小時。 工程2 於工程1所得反應液加化合物(V-b,5 1.5 g,0.238 mol) ,加熱回流2小時。將反應液減壓濃縮,得含有化合物(I-g)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(200 mL)、四氫呋喃(200 mL) 、2N氫氧化鈉水溶液(149 mL),反應終了後,仿實施例1操 作,於所得結晶性之濃縮殘渣加甲醇(200 mL),施行再結 晶。濾集析出結晶,乾燥而得化合物(II-g,47.9 g,72.5%) ο NMR(DMSO-d6、TMS) : 1.00(t,· 3H,J = 7.5),1.3 5 - 1.5 5 (m, 6H),1.60- 1.86(m,6H),2.63-2.71(m,2H),2.90-2.99(m,2H), 3.99-4.21(m,2H),8.27(s,1H),14.78(br s,1H) 粉末X線繞射之結果如表7及第7圖。 主要峰之繞射角:20=9.2,9.7,1〇.〇,15.5,19.7度 -56- 200835692(ii-g) -55- 200835692. Project 1 A solution of the compound (ΙΠ-b, 30.0 g, 0.238 mol), compound (iv-f, 20.9 g, 0.286 mol) in toluene (80 mL) was refluxed for 5.5 hours. Engineering 2 The compound obtained in Engineering 1 was added with a compound (V-b, 5 1.5 g, 0.238 mol), and heated under reflux for 2 hours. The reaction liquid was concentrated under reduced pressure to give a concentrated liquid containing compound (I-g). This concentrate is used in the next reaction. Engineering 3 The concentrated liquid obtained in Engineering 2 was added with methanol (200 mL), tetrahydrofuran (200 mL), and 2N aqueous sodium hydroxide solution (149 mL). After the reaction was completed, the operation of Example 1 was carried out, and methanol was added to the obtained crystalline residue. (200 mL), recrystallization was performed. The crystals were separated by filtration and dried to give compound (II- g, 47.9 g, 72.5%) NMR (DMSO-d6, TMS): 1.00 (t, · 3H, J = 7.5), 1.3 5 - 1.5 5 (m, 6H), 1.60- 1.86 (m, 6H), 2.63-2.71 (m, 2H), 2.90-2.99 (m, 2H), 3.99-4.21 (m, 2H), 8.27 (s, 1H), 14.78 (br s , 1H) The results of powder X-ray diffraction are shown in Table 7 and Figure 7. The diffraction angle of the main peak: 20 = 9.2, 9.7, 1 〇. 〇, 15.5, 19.7 degrees -56- 200835692

2 Θ 「d値 強度 相對強度 9.157 9.64983 515 100 9.74 ί 9.0733 82.4 16 9.998 8.83963 165 32 10.701 8.26016 16.5 卜 3.2 14.051 6.29757 24.7 4.8~ 15.129 5.8512 37.9 7.4 15.504 5.71047 77.8 「15.1 16.271 5.44302 20.2 3.9~ 17.419 5.08702 8.46 1.6 18.146 4.88461 43.7 8.5 18.432 4.80948 32.7 6.4 18.749 ^4.7289 25.2 4.9 19.4 4.57168 41.5 8 19.66 4.51179 80.8 15.7 20.188 4.39506 33.8 Γ 6.6 20.53 4.32258 47.7 9.3 21.466 4.13612 77.1 15 22.073 4.02376 22.6 4.4 22.349 3.97472 20.2 3.9 22.882 3.88329 10.6 2.1 23.449 3.79069 23.4 4.5 24.491 3.63169 29 5.6 24.807 3.5861 27.9 5.4 25.1 3.54492 16.3 3.2 26.069 3.41533 18 3.5 26.504 3,3602 12.2 2.4 27.549 3.23514 8,93 1.7 28.49 3.13036 11.8 2.3 28.914 3.08543 17.5 3,4 29.707 3.00485 13,6 2.6 30.226 2.95439 13.9 2.7 30.66 2.91355 14.9 2.9 30.92 2,88962 35,6 6.9 31.382 2.84813 8.82 1.7 31.978 2.79642 18.2 3.5 32.236 2.77461 14.7 2.9 32.916 2.71881 7.92 1.5 34.088 2.62797 7.28 1.4 34.783 2.57704 9.52 1.8 35.37 2.53563 10.3 2 36.075 2.48769 6.57 1.3 38.451 2.33925 8.15 1.6 38.959 2.30987 6.79 L3 實施例8化合物(ΙΙ-h)之合成 -57- .200835692 〇2 「 "d値 intensity relative strength 9.157 9.64983 515 100 9.74 ί 9.0733 82.4 16 9.998 8.83963 165 32 10.701 8.26016 16.5 Bu 3.2 14.051 6.29757 24.7 4.8~ 15.129 5.8512 37.9 7.4 15.504 5.71047 77.8 "15.1 16.271 5.44302 20.2 3.9~ 17.419 5.08702 8.46 1.6 18.146 4.88461 43.7 8.5 18.432 4.80948 32.7 6.4 18.749 ^4.7289 25.2 4.9 19.4 4.57168 41.5 8 19.66 4.51179 80.8 15.7 20.188 4.39506 33.8 Γ 6.6 20.53 4.32258 47.7 9.3 21.466 4.13612 77.1 15 22.073 4.02376 22.6 4.4 22.349 3.97472 20.2 3.9 22.882 3.88329 10.6 2.1 23.449 3.79069 23.4 4.5 24.491 3.63169 29 5.6 24.807 3.5861 27.9 5.4 25.1 3.54492 16.3 3.2 26.069 3.41533 18 3.5 26.504 3,3602 12.2 2.4 27.549 3.23514 8,93 1.7 28.49 3.13036 11.8 2.3 28.914 3.08543 17.5 3,4 29.707 3.00485 13,6 2.6 30.226 2.95439 13.9 2.7 30.66 2.91355 14.9 2.9 30.92 2,88962 35,6 6.9 31.382 2.84813 8.82 1.7 31.978 2.79642 18.2 3.5 32.236 2.77461 14.7 2.9 32.916 2.71881 7.92 1.5 34.088 2.62797 7.28 1.4 34.783 2.57704 9.52 1.8 35 .37 2.53563 10.3 2 36.075 2.48769 6.57 1.3 38.451 2.33925 8.15 1.6 38.959 2.30987 6.79 L3 Synthesis of the compound of Example 8 (ΙΙ-h) -57- .200835692 〇

(lll-b)(lll-b)

(ll-h) 水解 工程3 工程1(ll-h) Hydrolysis Engineering 3 Project 1

將化合物(III-b,10.0 g,0.079 mol)、化合物(IV-b,11.9 g,0.095 mol)之甲苯(100 mL)溶液脫水回流7小時。 工程2 於工程1所得反應液加化舍物(V-b,2 3.99 g,0.111 mol) ,加熱回流1 5小時。將反應液減壓濃縮,得含有化合物 (I-h)之濃縮液。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加甲醇(150 mL)、2N氫氧化鈉水溶 液(7 9 mL,O,15 8mol),於25°C攪拌2小時。將反應液減壓 濃縮,加甲苯和水,分離水層。於水層加2-丙醇(35 mL)、 5N鹽酸34mL,於25°C攪拌1小時而晶析。濾集析出結晶 ,乾燥而得化合物(ΙΙ-h,19.8 g,76.0%)。 NMR(DMSO-d6、TMS) : 1.20- 1.45 (m, 4H), 1.5 5 - 1.63 (m, 4H), 2.70-2.80 (m, 2H),2.85-2.95 (m, 2H), 5.47 (s, 2H), 7.18 (d, 4H,J = 8.1), 8.29 (s, 1H), 14.7(s, 1H) 粉末X線繞射之結果如表8及第8圖。 主要峰之繞射角:2Θ=13.2,18.7,19.5,20.0,22.7 度 -58 - 200835692A solution of the compound (III-b, 10.0 g, 0.079 mol) and the compound (IV-b, 11.9 g, 0.095 mol) in toluene (100 mL) was refluxed for 7 hr. Engineering 2 The reaction liquid obtained in Engineering 1 was added (V-b, 2 3.99 g, 0.111 mol), and heated under reflux for 15 hours. The reaction solution was concentrated under reduced pressure to give a concentrated liquid containing compound (I-h). This concentrate is used in the next reaction. Engineering 3 The concentrate obtained in Engineering 2 was stirred with methanol (150 mL), 2N aqueous sodium hydroxide (7 9 mL, O, 15 8 mol) and stirred at 25 ° C for 2 hours. The reaction solution was concentrated under reduced pressure, toluened water and water, and the aqueous layer was separated. 2-propanol (35 mL) and 5N hydrochloric acid (34 mL) were added to the aqueous layer, and the mixture was stirred at 25 ° C for 1 hour to crystallize. The crystals were precipitated by filtration and dried to give a compound (y-h, 19.8 g, 76.0%). NMR (DMSO-d6, TMS): 1.20- 1.45 (m, 4H), 1.5 5 - 1.63 (m, 4H), 2.70-2.80 (m, 2H), 2.85-2.95 (m, 2H), 5.47 (s, 2H), 7.18 (d, 4H, J = 8.1), 8.29 (s, 1H), 14.7 (s, 1H) The results of powder X-ray diffraction are shown in Table 8 and Figure 8. The diffraction angle of the main peak: 2Θ=13.2, 18.7, 19.5, 20.0, 22.7 degrees -58 - 200835692

2 Θ d値 強度 相對強度 7.566 11.67471 15 9.6 10.77 8.20772 15.4 Γ 9.9 12.192 7.25359 41.7 26.7 13.203 6.70005 ^ 84.9 54.4 14.048 6.29902 25.7 16.4 14.683 6.02792 7.87 5 15.147 5.8443 48.2 30.8 17.193 5.15322 39 24.9 17.799 4.97912 11.3 7.2 18.657 4.75212 136 86.8 19.469 4.55556 101 64.7 20.022 4.43099 156 100 21.775 4.0781 「33.4 21.4 22.332 3.97759 18.2 11.6 22.707 卜 3.91287 96.4 61.7 23.972 3.70907 37.4 23.9 24.275 3.66343 [45.2 28.9 25.153 3.5375 34.9 22.3 25.995 3.42484 32.8 21 26.297 3.38625 14.7 9.4 26.62 3.34582 11.4 7.3 27.171 3.27922 14.4 9.2 28.373 3,14302 9.63 6.2 28.98 3.07852 10.4 6.7 29.205 3.05527 13.4 8.6 30.55 2.92382 8.97 5.7 30.839 2.89702 14.1 9 31.677 2.82234 14.7 9.4 32.168 2.78033 9.8 6.3 32.465 2.75559 15.4 9.8 32.75 2.7322 8.08 5.2 33.771 2.6519 8.76 5.6 34.306 2.6118 13.7 8.8 34.966 2.56396 13,7 8.8 36.025 2.49102 17 10.9 39.509 2.27902 16.6 10.6 實施例9化合物(Π-i)之合成 -59- 2008356922 Θ d値 intensity relative strength 7.566 11.67471 15 9.6 10.77 8.20772 15.4 Γ 9.9 12.192 7.25359 41.7 26.7 13.203 6.70005 ^ 84.9 54.4 14.048 6.29902 25.7 16.4 14.683 6.02792 7.87 5 15.147 5.8443 48.2 30.8 17.193 5.15322 39 24.9 17.799 4.97912 11.3 7.2 18.657 4.75212 136 86.8 19.469 4.55556 101 64.7 20.022 4.43099 156 100 21.775 4.0781 "33.4 21.4 22.332 3.97759 18.2 11.6 22.707 Bu 3.91287 96.4 61.7 23.972 3.70907 37.4 23.9 24.275 3.66343 [45.2 28.9 25.153 3.5375 34.9 22.3 25.995 3.42484 32.8 21 26.297 3.38625 14.7 9.4 26.62 3.34582 11.4 7.3 27.171 3.27922 14.4 9.2 28.373 3,14302 9.63 6.2 28.98 3.07852 10.4 6.7 29.205 3.05527 13.4 8.6 30.55 2.92382 8.97 5.7 30.839 2.89702 14.1 9 31.677 2.82234 14.7 9.4 32.168 2.78033 9.8 6.3 32.465 2.75559 15.4 9.8 32.75 2.7322 8.08 5.2 33.771 2.6519 8.76 5.6 34.306 2.6118 13.7 8.8 34.966 2.56396 13, 7 8.8 36.025 2.49102 17 10.9 39.509 2.27902 16.6 10.6 Synthesis of the compound of Example 9 (Π-i) -59- 200835692

將化合物(ΙΠ-b,10.1 g,0.0800 mol)、化合物(IV-d, 6·98 g,0.0800 mol)之甲苯(100 mL)溶液脫水回流6小時。 工程2 於工程1所得反應溶液加化合物(V-b,20.8 g,0.0960 mol),而加熱回流1 5小時。將反應液減壓濃縮,得含有化 合物(I-i)之濃縮液。此濃縮液用於次一反應。 工程3A solution of the compound (ΙΠ-b, 10.1 g, 0.0800 mol) and the compound (IV-d, 6·98 g, 0.0800 mol) in toluene (100 mL) was refluxed for 6 hours. Process 2 The compound (V-b, 20.8 g, 0.0960 mol) was added to the reaction solution obtained in Engineering 1, and heated under reflux for 15 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing compound (I-i). This concentrate is used in the next reaction. Project 3

於工程2所得濃縮液加甲醇(86 mL)和四氫呋喃(86 mL)、 2N氫氧化鈉水溶液(8 0.0 mL),於25 °C攪拌3小時。將反 應液減壓濃縮,加甲苯和水,分離水層。所得水層加在5N 鹽酸(40 mL)和乙酸乙酯(300 mL)之混合溶液,以乙酸乙酯 (50 mL)萃取。將萃取液減壓濃縮,加2-丙醇(8 mL),於 25 °C攪拌1 5小時而晶析。濾集析出結晶,乾燥而得化合 物(ΙΙ-i,12.1 g,52.0%)。 NMR(DMS〇-d6) : 0.95(d, 6H, 1 = 6.6), 1.33(brs, 2H), 1.43(brs,2H),1.50-1.60(m,4H),1.71-1.78(m,3H),2.70(m, -60- .200835692 2H), 2.97(m, 2H), 4.14(m, 2H)? 8.19(s, 1 H), 1 4.9 (s, 1 H) 粉末X線繞射之結果如表9及第9圖。 主要峰之繞射角·· 20 =8.4,9.8,14.3,20.3,21.8 度 【表9】The concentrate obtained in the work 2 was stirred with methanol (86 mL) and tetrahydrofuran (86 mL), 2N aqueous sodium hydroxide (80.0 mL), and stirred at 25 ° C for 3 hours. The reaction solution was concentrated under reduced pressure, toluene and water were added, and the aqueous layer was separated. The resulting aqueous layer was combined with EtOAc (EtOAc) The extract was concentrated under reduced pressure, and 2-propanol (8 mL) was added and stirred at 25 ° C for 15 hours to crystallize. The crystals were precipitated by filtration and dried to give a compound (?-i, 12.1 g, 52.0%). NMR (DMS 〇-d6): 0.95 (d, 6H, 1 = 6.6), 1.33 (brs, 2H), 1.43 (brs, 2H), 1.50-1.60 (m, 4H), 1.71-1.78 (m, 3H) , 2.70 (m, -60- .200835692 2H), 2.97 (m, 2H), 4.14 (m, 2H)? 8.19(s, 1 H), 1 4.9 (s, 1 H) powder X-ray diffraction results See Table 9 and Figure 9. The diffraction angle of the main peak·· 20 = 8.4, 9.8, 14.3, 20.3, 21.8 degrees [Table 9]

2 Θ d値 強度 相對強度 8.353 10.57689 232 100 9.833 8.98789 211 90.9 13.02 6.79412 6.61 2.9 13.585 6.51263 9.94 4.3 14.328 6.17642 96.4 41.6 15.338 5.77198 25.4 11 15.666 5.65203 51.9 22.4 16.078 5.50794 12.6 5.4 16.586 5.34029 35.5 15.3 17.345 5.10841 29.8 12.9 19.34 4.58573 63.5 27.4 19.572 4.532 114 49.4 20.319 4.36688 71.5 30.9 20.668 4.29392 20.5 8.8 21.371 4.15431 24.4 10.5 21.771 4.0789 71.3 30.8 22.525 3.94392 15.7 6.8 23.241 3.82401 19 8.2 24.12 3.68663 67.3 29.1 24.791 3.58837 38.5 16.6 25.156 3.53711 10.5 4.6 25.8 3.45029 8.02 3.5 27.238 3.2713 8.36 3.6 28.016 3.18219 10.3 4.5 29.022 3.07416 42.1 18.2 29.417 3.03379 10.4 4.5 29.859 2.98982 19.3 8.4 30.463 2.93195 15 6.5 30.925 2,88921 9.75 4.2 31.742 2.81665 9.82 4.2 32.534 2.74985 10.1 4.4 32.892 2.72077 13.8 5.9 33.51 2.67202 7.83 3.4 34.2 2.61964 9.04 3.9 34.484 2.59868 8.55 3.7 35,75 2.50956 8.67 3.7 36.751 2.44343 8.08 3.5 37.722 2.38277 11.8 5.1 39.205 2.29599 9.1 3.9 39.765 2.26492 7.78 3.4 -61 - .2008356922 Θ d値 Intensity relative strength 8.353 10.57689 232 100 9.833 8.98789 211 90.9 13.02 6.79412 6.61 2.9 13.585 6.51263 9.94 4.3 14.328 6.17642 96.4 41.6 15.338 5.77198 25.4 11 15.666 5.65203 51.9 22.4 16.078 5.50794 12.6 5.4 16.586 5.34029 35.5 15.3 17.345 5.10841 29.8 12.9 19.34 4.58573 63.5 27.4 19.572 4.532 114 49.4 20.319 4.36688 71.5 30.9 20.668 4.29392 20.5 8.8 21.371 4.15431 24.4 10.5 21.771 4.0789 71.3 30.8 22.525 3.94392 15.7 6.8 23.241 3.82401 19 8.2 24.12 3.68663 67.3 29.1 24.791 3.58837 38.5 16.6 25.156 3.53711 10.5 4.6 25.8 3.45029 8.02 3.5 27.238 3.2713 8.36 3.6 28.016 3.18219 10.3 4.5 29.022 3.07416 42.1 18.2 29.417 3.03379 10.4 4.5 29.859 2.98982 19.3 8.4 30.463 2.93195 15 6.5 30.925 2,88921 9.75 4.2 31.742 2.81665 9.82 4.2 32.534 2.74985 10.1 4.4 32.892 2.72077 13.8 5.9 33.51 2.67202 7.83 3.4 34.2 2.61964 9.04 3.9 34.484 2.59868 8.55 3.7 35 , 75 2.50956 8.67 3.7 36.751 2.44343 8.08 3.5 37.722 2.38277 11.8 5.1 39.205 2.29599 9.1 3.9 39.7 65 2.26492 7.78 3.4 -61 - .200835692

實施例10化合物(Il-j)之合成Synthesis of the compound of Example 10 (Il-j)

將化合物(III-b,10.6 g,0.084 mol)、化合物(IV-e,10.0 g,0.07 0 mol)之甲苯(80 mL)溶液脫水回流7小時。 工程2 於工程1所得反應液加化合物(V-b,15.9 g,0.074 mol) ,加熱回流7小時。將反應液減壓濃縮,得含有化合物(I_ j)之濃縮液。此濃縮液用於次一反應。 工程3A solution of the compound (III-b, 10.6 g, 0.084 mol), compound (IV-e, 10.0 g, 0.07 mol) in toluene (80 mL) was refluxed for 7 hr. Engineering 2 The compound obtained in Engineering 1 was added with a compound (V-b, 15.9 g, 0.074 mol), and heated under reflux for 7 hours. The reaction solution was concentrated under reduced pressure to give a concentrate containing Compound (Ij). This concentrate is used in the next reaction. Project 3

於工程2所得濃縮液加甲醇(7 0 m L)、氫氧化鈉(8.3 8 g)之 水(40 mL)溶液,於室溫攪拌1小時。反應終了後,仿實施 例1操作,於所得結晶性濃縮殘渣加甲醇(1 〇〇 mL),濃縮 至50g,於0°C靜置。濾集析出結晶,以少量冷甲醇洗淨, 乾燥而得化合物(ΙΙ-j,12.5 g,51.7%)。 NMR(DMS〇-d6、TMS): 1.37 - 1.5 5 (m,4H),1·65-1·80(ιη,4H), 2.64-2.72(m, 2Η), 2.82-2.91(m, 2H), 5.42(s, 2H), 6.85(m, 1H), 6.95(m, 1H), 7.15(m, 1H), 8.38(s, 1H), 14.34(br s, 1H) 粉末X線繞射之結果如表1 0及第1 0圖。 -62- ,200835692 ,27.7 度 主要峰之繞射角:20=14.6,15.7,1 7.9,23.5,26.8 【表1 0】The concentrate obtained in the work 2 was added with a solution of methanol (70 ml) and sodium hydroxide (8.38 g) in water (40 mL) and stirred at room temperature for 1 hour. After the completion of the reaction, the procedure of Example 1 was carried out, and methanol (1 〇〇 mL) was added to the obtained crystalline concentrated residue, and the mixture was concentrated to 50 g and stood at 0 ° C. The crystals were precipitated by filtration, washed with a small amount of cold methanol and dried to give compound (?-j, 12.5 g, 51.7%). NMR (DMS〇-d6, TMS): 1.37 - 1.5 5 (m, 4H), 1·65-1·80 (ιη, 4H), 2.64-2.72 (m, 2Η), 2.82-2.91 (m, 2H) , 5.42(s, 2H), 6.85(m, 1H), 6.95(m, 1H), 7.15(m, 1H), 8.38(s, 1H), 14.34(br s, 1H) Results of powder X-ray diffraction See Table 10 and Figure 10. -62- , 200835692 , 27.7 degrees Diffraction angle of main peaks: 20 = 14.6, 15.7, 1 7.9, 23.5, 26.8 [Table 1 0]

2 Θ d値 強度 相對強度 8.874 9.95659 8.86 1.2 9.756 9.05824 32.6 4.3 10.305 8.57703 47.9 6.4 11.144 7.93334 51.1 6.8 12.553 7.04558 28.5 3.8 12.919 6.84683 9.64 1.3 13.851 6.38822 13.2 1.8 14.621 6.05345 134 17.8 15.313 5,78145 41.5 5.5 15.731 5.62873 148 19.7 17.352 5.10646 90.8 12.1 17.9 4.95135 751 100 19.655 4.51293 27.7 3.7 20.749 4.27748 58.3 7.8 21.418 4.14532 13.1 1.7 21.857 4.06297 87.7 11.7 22.607 3.92993 14.1 1.9 23.513 3.78048 216 28.8 24.278 3.66308 116 15.4 25.212 3.52939 8.67 1.2 25.957 3.42984 14 1.9 26.267 3.39 20 2.7 26.794 3.32453 128 17.1 27.652 3.22326 160 21.3 27.965 3.18785 57.8 7.7 28.673 3.11081 15 2 29.929 2.98303 29.2 3.9 30.87 2.89423 9.3 1.2 31.709 2.81953 47.4 6.3 32.895 2.72054 10.5 1.4 34.761 2.57864 21.3 2.8 35.43 2.53147 21.3 2.8 35.996 2.49297 9.23 1.2 37.007 2.42715 10.1 1.3 37.632 2.38823 7.93 1.1 38.335 2.34608 9.16 1.2 39.15 2.29909 8.46 1.1 實施例11化合物(VIII-a)之合成 -63- 2008356922 Θ d値 strength relative strength 8.874 9.95659 8.86 1.2 9.756 9.05824 32.6 4.3 10.305 8.57703 47.9 6.4 11.144 7.93334 51.1 6.8 12.553 7.04558 28.5 3.8 12.919 6.84683 9.64 1.3 13.851 6.38822 13.2 1.8 14.621 6.05345 134 17.8 15.313 5,78145 41.5 5.5 15.731 5.62873 148 19.7 17.352 5.10646 90.8 12.1 17.9 4.95135 751 100 19.655 4.51293 27.7 3.7 20.749 4.27748 58.3 7.8 21.418 4.14532 13.1 1.7 21.857 4.06297 87.7 11.7 22.607 3.92993 14.1 1.9 23.513 3.78048 216 28.8 24.278 3.66308 116 15.4 25.212 3.52939 8.67 1.2 25.957 3.42984 14 1.9 26.267 3.39 20 2.7 26.794 3.32453 128 17.1 27.652 3.22326 160 21.3 27.965 3.18785 57.8 7.7 28.673 3.11081 15 2 29.929 2.98303 29.2 3.9 30.87 2.89423 9.3 1.2 31.709 2.81953 47.4 6.3 32.895 2.72054 10.5 1.4 34.761 2.57864 21.3 2.8 35.43 2.53147 21.3 2.8 35.996 2.49297 9.23 1.2 37.007 2.42715 10.1 1.3 37.632 2.38823 7.93 1.1 38.335 2.34608 9.16 1.2 39.15 2.29909 8.46 1.1 Synthesis of the compound of Example 11 (VIII-a) -63- 200835692

•CI+H3N^COOMe (Vll-a) 工程2•CI+H3N^COOMe (Vll-a) Project 2

(ll-b) (Vl-a)(ll-b) (Vl-a)

工程1 於實施例2所得化合物(Π-b,7·35 g,25·4 mmol)、甲苯 (8.7 mL)和N-甲基吡啶酮(8.7 mL)之溶液,加亞磺醯氯 (3.32 g,27.9 mmol),於25°C攪拌0.5小時,得含有化合 物(VI-a)之反應液。此反應液用於次一反應。 工程2Engineering 1 A solution of the compound obtained in Example 2 (Π-b, 7.35 g, 25·4 mmol), toluene (8.7 mL), and N-methylpyridone (8.7 mL), and sulfinium chloride (3.32) g, 27.9 mmol), and stirred at 25 ° C for 0.5 hour to obtain a reaction liquid containing the compound (VI-a). This reaction solution was used for the next reaction. Project 2

於工程1所得反應液加化合物(VII-a,5.90 g,30.5 mmol) 和三乙胺(3.1 g,30.5 mmol)之甲苯(18.5 mL)、N-甲基吡啶 酮(18.5 mL)之溶液。次加三乙胺(5.66 g,55.9 mmol)後, 於25°C攪拌0.5小時,得含有化合物(IX-a)之反應液。以 6%硫酸(34.6 g)、4%氫氧化鈉(32.2 g),精製水(14.5 mL)洗 淨後,減壓濃縮。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液,加甲醇(25.9 mL)、36%氫氧化鈉水 溶液(7.06g),於50°C攪拌4小時。將反應液減壓濃縮,加 -64- 2008356922-丙醇(54·6 g)、10%硫酸(68.5 g)作成酸性,於25°C晶析 〇·3小時。濾集析出結晶,乾燥而得化合物(vill-a,9.78g ,9 2.9%)。 熔點:237〜23 8°C NMR(DMS〇-d6、TMS) : 1.05 (t,3H,J = 7.8Hz),1.15-2.10 (m, 10H), 2.19 (s, 3H), 2.67 (dd, 2H, J = 7.2 and 15 Hz), 5.42 (s, 2H), 7.13-7.22 (m, 4H), 8.19 (s, 1H), 10.14 (s, IH),12.17 (br, 1H)Φ 粉末X線繞射之結果如表1 1及第1 1圖。 主要峰之繞射角:20=9.4,17·8,18·5,2Ο·9,38·4 度 【表1 1】 2 Θ 搜峰設定幅___I値 強虔:相對強ίί 8 8 2 6 8 QV 7* 1» βν Λ» 2 3 8 6 8 4 3 1» 8 8 0 9 0 4 3 J— 1 1—A solution of the compound (VII-a, 5.90 g, 30.5 mmol) and triethylamine (3.1 g, 30.5 mmol) in toluene (18.5 mL) and N-methylpyridone (18.5 mL) was added. After triethylamine (5.66 g, 55.9 mmol) was added thereto, the mixture was stirred at 25 ° C for 0.5 hour to obtain a reaction mixture containing Compound (IX-a). It was washed with 6% sulfuric acid (34.6 g), 4% sodium hydroxide (32.2 g), purified water (14.5 mL), and concentrated. This concentrate is used in the next reaction. The concentrate obtained in Engineering 2 was added with methanol (25.9 mL) and a 36% aqueous sodium hydroxide solution (7.06 g), and stirred at 50 ° C for 4 hours. The reaction solution was concentrated under reduced pressure, and then -64-2008356922-propanol (54.6 g) and 10% sulfuric acid (68.5 g) were acidified and crystallized at 25 ° C for 3 hours. The crystals were precipitated by filtration and dried to give compound (vill-a, 9.78 g, 9. 2.9%). Melting point: 237~23 8°C NMR (DMS〇-d6, TMS): 1.05 (t, 3H, J = 7.8 Hz), 1.15-2.10 (m, 10H), 2.19 (s, 3H), 2.67 (dd, 2H, J = 7.2 and 15 Hz), 5.42 (s, 2H), 7.13-7.22 (m, 4H), 8.19 (s, 1H), 10.14 (s, IH), 12.17 (br, 1H) Φ powder X-ray The results of the diffraction are shown in Tables 1 1 and 11. The diffraction angle of the main peak: 20=9.4,17·8,18·5,2Ο·9,38·4 degrees [Table 1 1] 2 搜 Search peak setting ___I 値 虔: Relatively strong ίί 8 8 2 6 8 QV 7* 1» βν Λ» 2 3 8 6 8 4 3 1» 8 8 0 9 0 4 3 J-1 1—

9.440 9. 840 12. 840 13.220 14.860 0. 212 0.212 0.212 0.235 0.212 9.3610 8.9813 6. 8888 6.6917 5. 9566 15.720 0,235 5. 6326 2123 24 17.820 0.235 4.9733 6841 76 18. 540 0. 235 4.7818 3695 42 19.520 0. 282 4. 5439 1781 20 20. 880 0. 235 4.2509 3834 43 21. 700 22. 340 22. 840 23.140 23. 740 24.320 24. 640 25. 800 26. 540 28. 500 '29.000 29. 340 29. 780 30. 280 32. 920 35.300 36.140 38. 400 39.160 9 5 5 2 8 5 3 3 18 2 2 2 2 1 00.0.0·0· 82699..5 2592 8 1055:3 1358 1 2 3 2 2:2 2 2 2 2 00.0·00.:0.0.0·0.0· 8 9 6 6 8 5 0 0 12 3 3 0·.00.0. 4. 0920 3. 9762 3. 8903 3.8406 3. 7448 0568 3.6100 3. 4503 3.3558 3.1293 3: 0764 3.0416 2. 9976 2. 9493 2.7185 2: 5405 2. 4833 2. 3422 2. 2985 3 0 3 9 7 3 3 4 8 5 3 2 6 4 5 12 11 6 9 3 9-^ :98492 3 2619:3 6716 6!106 :o 7583 3 1 1:1 7 6 12 8 7 0 0 4 3 0 6 9 5 5 9 7 _ 12 11 8 9 6 2 9i2 9 7 ο 0〇 1— 1— -1— 1— 5 6 5 00 實施例12化合物(VIII-b)之合成 -65- 2008356929.440 9. 840 12. 840 13.220 14.860 0. 212 0.212 0.212 0.235 0.212 9.3610 8.9813 6. 8888 6.6917 5. 9566 15.720 0,235 5. 6326 2123 24 17.820 0.235 4.9733 6841 76 18. 540 0. 235 4.7818 3695 42 19.520 0. 282 4. 5439 1781 20 20. 880 0. 235 4.2509 3834 43 21. 700 22. 340 22. 840 23.140 23. 740 24.320 24. 640 25. 800 26. 540 28. 500 '29.000 29. 340 29. 780 30. 280 32. 920 35.300 36.140 38. 400 39.160 9 5 5 2 8 5 3 3 18 2 2 2 2 1 00.0.0·0· 82699..5 2592 8 1055:3 1358 1 2 3 2 2:2 2 2 2 2 00.0·00.:0.0.0·0.0· 8 9 6 6 8 5 0 0 12 3 3 0·.00.0. 4. 0920 3. 9762 3. 8903 3.8406 3. 7448 0568 3.6100 3. 4503 3.3558 3.1293 3: 0764 3.0416 2. 9976 2. 9493 2.7185 2: 5405 2. 4833 2. 3422 2. 2985 3 0 3 9 7 3 3 4 8 5 3 2 6 4 5 12 11 6 9 3 9-^ : 98492 3 2619:3 6716 6!106 :o 7583 3 1 1:1 7 6 12 8 7 0 0 4 3 0 6 9 5 5 9 7 _ 12 11 8 9 6 2 9i2 9 7 ο 0〇1— 1— -1— 1— 5 6 5 00 Synthesis of the compound of Example 12 (VIII-b) -65- 200835692

(ll-b) (Vl-a)(ll-b) (Vl-a)

(IX-b) …丨丨丨七) 工程1 於實施例 2所得化合物(Π-b,7.36 g ’ 25.4 mmol)、 DMF(1.0 mL)、THF(73.6 mL)溶液加亞磺醯氯(3.3 g,27.9 m m ο 1),於2 5 °C攪拌Ο · 5小時,得含有化合物(VI - a)之反應 液。此反應液用於次一反應。 工程2(IX-b) ... 丨丨丨 7) Project 1 The compound obtained in Example 2 (Π-b, 7.36 g ' 25.4 mmol), DMF (1.0 mL), THF (73.6 mL) was added with sulfinium chloride (3.3) g, 27.9 mm ο 1), stirred at 25 ° C for 5 hours to obtain a reaction solution containing the compound (VI - a). This reaction solution was used for the next reaction. Project 2

於工程 1所得反應液加化合物(VII-b,5.85 g,27.9 mmol)、吡啶(20.1 g,254 mmol)、二甲胺基吡啶(620 mg' 5.1 mmol),於 25°C 攪拌 20 小時後,力□ 14%鹽酸(134.6 g) ,以乙酸乙酯(217 mL)萃取。萃取液以水(74 mL)、5%碳酸 氫鈉水(74 mL)洗淨。萃取液減壓濃縮,得含有化合物(IX-b)之濃縮液。此濃縮液用於次一反應。 工程3To the reaction mixture obtained in the procedure 1, the compound (VII-b, 5.85 g, 27.9 mmol), pyridine (20.1 g, 254 mmol), dimethylaminopyridine (620 mg '5.1 mmol) was stirred at 25 ° C for 20 hours. , □ 14% hydrochloric acid (134.6 g), extracted with ethyl acetate (217 mL). The extract was washed with water (74 mL) and 5% aqueous sodium hydrogen carbonate (74 mL). The extract was concentrated under reduced pressure to give a concentrate containing Compound (IX-b). This concentrate is used in the next reaction. Project 3

於工程2所得濃縮液加THF(35.7 mL)、甲醇(25.5 mL)、 IN氫氧化鈉水溶液(45.9 mL),於0°C攪拌2小時。加2N -66 - .200835692 鹽酸(25.2 mL)作成酸性,加水(40 mL)後,於〇°C晶析0.5 小時。濾集析出結晶,乾燥而得化合物(VIII-b,9.04g, 91.7%)。The concentrate obtained in Engineering 2 was added with THF (35.7 mL), methanol (25.5 mL), and IN aqueous sodium hydroxide (45.9 mL), and stirred at 0 ° C for 2 hours. Add 2N-66 - .200835692 hydrochloric acid (25.2 mL) to make acidity, add water (40 mL), and crystallize at 〇 °C for 0.5 hours. The crystals were precipitated by filtration, and dried to give Compound (VIII-b, 9.04 g, 91.7%).

熔點:202〜203 °C NMR(DMS〇-d6、TMS) : 1.06(t,3H,J = 7.5Hz),2.24(s,3H), 2.75(q, 2H, J = 7.5Hz), 3.79 (s, 2H), 5.49(br-s, 2H), 7.13-7.28(m, 4H), 8.42(s, 1H), 13.65(s, 1H) 粉末X線繞射之結果如表1 2及第1 2圖。 主要峰之繞射角:20 =8.5,18.4,23.9,25.2度 【表12 2 θ 8.000 8.540 10. 720 11.140 11.880 Ϊ5:400 16.160 16.340 16.940 17.740 Ϊ8.380 19. 440 20.120 20.680 21.000Melting point: 202~203 °C NMR (DMS 〇-d6, TMS): 1.06 (t, 3H, J = 7.5 Hz), 2.24 (s, 3H), 2.75 (q, 2H, J = 7.5 Hz), 3.79 ( s, 2H), 5.49(br-s, 2H), 7.13-7.28(m, 4H), 8.42(s, 1H), 13.65(s, 1H) The results of powder X-ray diffraction are shown in Table 1 2 and 1 2 picture. Diffraction angle of the main peak: 20 = 8.5, 18.4, 23.9, 25.2 degrees [Table 12 2 θ 8.000 8.540 10. 720 11.140 11.880 Ϊ 5:400 16.160 16.340 16.940 17.740 Ϊ8.380 19. 440 20.120 20.680 21.000

I |値i Id i5 8888i8 5882ί2 2288 6 00 8 8 8:8 6 8 8 1:1 1 1 8 8 1— 11 1 1— 1i '1— i— 1· 1— 1— 1— 0·00.00.0.0.0·0*0·00.0*0·0 ί4 4 9 ο 3:0 3 3 6 6io 4 7 5 8 2 5 5 β 3:9 ο ο 3 5:cc{ 2 玢 Π SR 4 4 4 3 4.4 8 2 2 9-2 6 0 9 2 ο 3 2 9 φ一7 4 4 2 9:8 5 4 2 2 1*0*8* L 7Ί5· 5* 5 54.4.4.4.4· 4. 7 9 6 7 5-8 17 5 4 8 7 7 2 9 7 7 1 1 3:5 7 o 5 4:6 9 1 6 &amp; 5 5 0 4 2 0 8 3 9 41 0 5 7 8 2 1 :1 1 ..3 1 一度| ii I對一 85464 5 2836 00 5711 no 1» '1· 1— 1 1— 4 1 11 21.960 22. 840 23.080 23.480 23. 880 25.160 25.920 27. 240 28. 380 29. 260 30.960 34. 700 38. 360 0.188 4. 0442- 0.188 3. 8903 0.188 3. 8504 0.188 3. 7857 0. 212 3. 7232 0: 212 3. 5366 0. 259 3, 4346 0.235 3. 2711 0. 259 3.1422 0. 259 3. 0497 0.447 18860 0. 235 2. 5830 0. 235 2. 3446 9 5 3 9 0 8 3 7 7 4 2 4 4 6 4 3 4 6 i 5 6 7 6 15 73 557&amp;8054 34477434 CvJ 1— 1— 7. o 7-2 7 0 4 ^—6 5 o 143 221 o 實施例13化合物(VIII-c)之合成 -67- .200835692I |値i Id i5 8888i8 5882ί2 2288 6 00 8 8 8:8 6 8 8 1:1 1 1 8 8 1— 11 1 1—1i '1—i—1· 1—1—1—0·00.00. 0.0.0·0*0·00.0*0·0 ί4 4 9 ο 3:0 3 3 6 6io 4 7 5 8 2 5 5 β 3:9 ο ο 3 5:cc{ 2 玢Π SR 4 4 4 3 4.4 8 2 2 9-2 6 0 9 2 ο 3 2 9 φ_7 4 4 2 9:8 5 4 2 2 1*0*8* L 7Ί5· 5* 5 54.4.4.4.4· 4. 7 9 6 7 5-8 17 5 4 8 7 7 2 9 7 7 1 1 3:5 7 o 5 4:6 9 1 6 &amp; 5 5 0 4 2 0 8 3 9 41 0 5 7 8 2 1 :1 1 ..3 1 once | ii I-to-85464 5 2836 00 5711 no 1» '1· 1– 1 1– 4 1 11 21.960 22. 840 23.080 23.480 23. 880 25.160 25.920 27. 240 28. 380 29. 260 30.960 34. 700 38. 360 0.188 4. 0442- 0.188 3. 8903 0.188 3. 8504 0.188 3. 7857 0. 212 3. 7232 0: 212 3. 5366 0. 259 3, 4346 0.235 3. 2711 0. 259 3.1422 0 259 3. 0497 0.447 18860 0. 235 2. 5830 0. 235 2. 3446 9 5 3 9 0 8 3 7 7 4 2 4 4 6 4 3 4 6 i 5 6 7 6 15 73 557&amp;8054 34477434 CvJ 1 —1— 7. o 7-2 7 0 4 ^—6 5 o 143 221 o Synthesis of the compound of Example 13 (VIII-c) -67- .200835692

(VHI-c) 工程1 於實施例4所得化合物(Π-d,6.38 g,25.4 mmol)、甲苯 (10.7 1111)、1甲基吡啶酮(1〇.7 1111〇之溶液加亞磺醯氯(3.32 g,27.9 mmol),於25 °C攪拌0.5小時,得含有化合物(VI-d)之反應液。此反應液用於次一反應。 工程2(VHI-c) Engineering 1 The compound obtained in Example 4 (Π-d, 6.38 g, 25.4 mmol), toluene (10.7 1111), 1 methylpyridone (1〇.7 1111〇 solution plus sulfinium chloride (3.32 g, 27.9 mmol), stirred at 25 ° C for 0.5 hours to obtain a reaction solution containing the compound (VI-d). This reaction solution was used for the next reaction.

於工程1所得反應液加化合物(VII-a,5.41 g,27.9 mmol) 和三乙胺(2.83 g,27.9 mmol)之甲苯(15.9 mL)、N-甲基吡 啶酮(15.9 mL)之溶液。次加三乙胺(5.66 g,55 _ 9 mmol)後 ,於25 °C攪拌1小時,得含有化合物(IX-c)之反應液。以 6%硫酸(30.3 g)、4%氫氧化鈉(28.3 g)、水(12.6 mL)洗淨後 ,減壓濃縮。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液,加甲醇(22.7 mL)、36%氫氧化鈉水 溶液(7.06g),於50°C攪拌4小時。將反應液減壓濃縮,加 -68 - 200835692 2 -丙醇(6 〇 · 3 m L)、1 0 %硫酸(6 8 · 5 g)作成酸性,於〇。〇晶析 1 ·5小時。濾集析出結晶,乾燥而得化合物(νΐΠ-d,7.77 g ,81.3%)。A solution of the compound (VII-a, 5.41 g, 27.9 mmol) and triethylamine (2.83 g, 27.9 mmol) in toluene (15.9 mL) and N-methylpyridinone (15.9 mL) was added. After triethylamine (5.66 g, 55 -9 mmol) was added thereto, the mixture was stirred at 25 ° C for 1 hour to obtain a reaction mixture containing the compound (IX-c). After washing with 6% sulfuric acid (30.3 g), 4% sodium hydroxide (28.3 g), and water (12.6 mL), it was concentrated under reduced pressure. This concentrate is used in the next reaction. The concentrate obtained in Engineering 2 was added with methanol (22.7 mL) and a 36% aqueous sodium hydroxide solution (7.06 g), and stirred at 50 ° C for 4 hours. The reaction solution was concentrated under reduced pressure, and then -68 - &lt;RTI ID=0.0&gt;&gt; 〇 Crystallization 1 · 5 hours. The crystals were precipitated by filtration, and dried to give a compound (vd-d, 7.77 g, 81.3%).

熔點:1 7 0〜1 7 1°C NMR(DMS〇-d6、TMS) : 0.97(d, 6H, J = 6.6), 1.18(s, 3H, J = 7.5), 1.26- 1.78(m, 8H), 2· 16(s,3H),2.75(Q,2H,J = 7.5), 4.09(m,2H),8.09(s,1H),10.24(s,3H) 粉末X線繞射之結果如表1 3及第1 3圖。Melting point: 1 7 0 to 1 7 1 ° C NMR (DMS 〇-d6, TMS): 0.97 (d, 6H, J = 6.6), 1.18 (s, 3H, J = 7.5), 1.26- 1.78 (m, 8H) ), 2· 16(s, 3H), 2.75 (Q, 2H, J = 7.5), 4.09 (m, 2H), 8.09 (s, 1H), 10.24 (s, 3H) The result of powder X-ray diffraction Table 1 3 and Figure 13.

主要峰之繞射角:20=1〇.9,13.3,2〇_4,22.7度 【表13】 2 θ 榑峰設定幅 d値 強度 租對強度 8.200 0.188 10.7735 1992 18 9.320 0.141 9.4812 570 5 9.600 0.165 9.2053 1527 14 ! 10. 900 0·188 8J102 9876 86 | 13.300 0.188 6. 6516 5380 47 ! 14.940 0.165 5.9249 604 6 15.660 0.235 5.6541 646 6 16.440 0.212 5.3875 2045 18 17.080 0.306 5.1871 2255 20 17.580 0.212 5.0407 2161 19 : 0.235 4.7513 864 8 0.212 4.5952 2117 19 0.212 4.4624 1848 17 0.212 4.3498 2649 24 0.188 4.0920 2470 22 : 0.188 4.0369 2234 20 0.165 3. 9762 1512 14 0. 259 3.9106 2561 23 0. 212 3.6539 780 7 0.212 3.4216 2090 19 26. 620 0. 235 3.3459 1382 13 27.040 0.212 3. 2948 658 6 28. 760 0. 165 3.1016 671 6 30.440 0.165 2.9341 569 5 30.620 0.165 2. 9173 546 5 32.360 0. 188 2. 7643 544 5 33.500 0; 259 2. 6728 734 7 37.640 0.165 2.3878 693 7 38.420 0J88 2.3411 11499 100 ο ο ο ο ο .6:630884070 8.9.οί ο* L — 112 2 ο ο ο ο ο J0J4?2J4)2 J 3 7 3 ο 2.2.2.4.6. 2 2 2 22 實施例14化合物(VIII-d)之合成 -69- .200835692Diffraction angle of the main peak: 20 = 1 〇.9, 13.3, 2 〇 _4, 22.7 degrees [Table 13] 2 θ peak set width d 値 intensity rent versus intensity 8.200 0.188 10.7735 1992 18 9.320 0.141 9.4812 570 5 9.600 0.165 9.2053 1527 14 ! 10. 900 0·188 8J102 9876 86 | 13.300 0.188 6. 6516 5380 47 ! 14.940 0.165 5.9249 604 6 15.660 0.235 5.6541 646 6 16.440 0.212 5.3875 2045 18 17.080 0.306 5.1871 2255 20 17.580 0.212 5.0407 2161 19 : 0.235 4.7513 864 8 0.212 4.5952 2117 19 0.212 4.4624 1848 17 0.212 4.3498 2649 24 0.188 4.0920 2470 22 : 0.188 4.0369 2234 20 0.165 3. 9762 1512 14 0. 259 3.9106 2561 23 0. 212 3.6539 780 7 0.212 3.4216 2090 19 26. 620 0. 235 3.3459 1382 13 27.040 0.212 3. 2948 658 6 28. 760 0. 165 3.1016 671 6 30.440 0.165 2.9341 569 5 30.620 0.165 2. 9173 546 5 32.360 0. 188 2. 7643 544 5 33.500 0; 259 2. 6728 734 7 37.640 0.165 2.3878 693 7 38.420 0J88 2.3411 11499 100 ο ο ο ο ο . 6:630884070 8.9.οί ο* L — 112 2 ο ο ο ο ο J0J4?2J4)2 J 3 7 3 ο 2.2.2.4.6. 2 2 2 22 Real Synthesis Example 14 Compound (VIII-d) of -69- .200835692

(H-e) (Vl-c)(H-e) (Vl-c)

於實施例5所得化合物(li-e,7.81 g,25.4 mmol)、甲苯 (18 mL)、N-甲基吡啶酮(18 mL)之溶液,加亞磺醯氯(3.33 g,28.0 mmol),於25°C攪拌0.5小時,得含有化合物(VI-c)之反應液。此反應液用於次一反應。 工程2a solution of the compound (li-e, 7.81 g, 25.4 mmol), toluene (18 mL), N-methylpyridinone (18 mL), and sulfinium chloride (3.33 g, 28.0 mmol), After stirring at 25 ° C for 0.5 hour, a reaction liquid containing the compound (VI-c) was obtained. This reaction solution was used for the next reaction. Project 2

於工程1所得反應液加化合物(VII-c,6.20 g,28.0 mmol) 、甲苯(10.8 mL)、N-甲基毗啶酮(10.8 mL)、三乙胺(8.49 g ,83.9 mmol),於25°C攪拌0.5小時,得含有化合物(IX-e) 之反應液。以6%硫酸(37·3 g)、4%氫氧化鈉(33.7 g)、水 (15.6 mL)洗淨後,減壓濃縮。此濃縮液用於次一反應。 工程3 於工程2所得濃縮液加THF(42 mL)、甲醇(30 mL)、1N 氫氧化鈉水溶液(50·8 mL),於50°C攪拌3小時。力Π 2N鹽 酸(25.4 mL)作成酸性,加水(24 mL)後,於0°C晶析0.3小 -70- ‘200835692 時。濾集析出結晶,乾燥而得化合物(νπΐ-d,10.6 g, 90.7%)。To the reaction solution obtained in Engineering 1, compound (VII-c, 6.20 g, 28.0 mmol), toluene (10.8 mL), N-methylpyridinone (10.8 mL), triethylamine (8.49 g, 83.9 mmol) were added. The mixture was stirred at 25 ° C for 0.5 hour to obtain a reaction liquid containing the compound (IX-e). After washing with 6% sulfuric acid (37·3 g), 4% sodium hydroxide (33.7 g), and water (15.6 mL), it was concentrated under reduced pressure. This concentrate is used in the next reaction. The concentrate obtained in Engineering 2 was added with THF (42 mL), methanol (30 mL), and 1N aqueous sodium hydroxide (50·8 mL), and stirred at 50 ° C for 3 hours. The 2N hydrochloric acid (25.4 mL) was made acidic, and after adding water (24 mL), it was crystallized at 0 °C for 0.3 small -70- ‘200835692. The crystals were precipitated by filtration and dried to give a compound (νπΐ-d, 10.6 g, 90.7%).

熔點:1 9 4〜1 9 5 °C NMR(DMS〇-d6、TMS): 1.04 (t,3H,J = 7.5),1.22- 1.58 (m, 1〇Η)? 2.17 (s, 2H), 2.18 (s, 3H), 2.65 (q, 2H, J = 7.5), 3.40 (d, 2H, J = 6.3), 5.43 (brs, 2H), 7.11-7.21 (m, 4H), 8.25 (s, 1H),9.94 (t,1H,J = 5.7),12.15 (brs,1H) 粉末X線繞射之結果如表1 4及第1 4圖。 ⑩ 主要峰之繞射角:2 Θ =4.7,12.8,15.8,17·5,24.3,25·7 度 【表14】 _________捜一驗定幅 d値 4. 860 8.380 9.680 12.800 14. 200 15:760 17.460 17. 860 18. 520 19.740 20.940 21.140 22.220 24. 280 25.220Melting point: 1 9 4 to 1 9 5 ° C NMR (DMS 〇-d6, TMS): 1.04 (t, 3H, J = 7.5), 1.22 - 1.58 (m, 1 〇Η)? 2.17 (s, 2H), 2.18 (s, 3H), 2.65 (q, 2H, J = 7.5), 3.40 (d, 2H, J = 6.3), 5.43 (brs, 2H), 7.11-7.21 (m, 4H), 8.25 (s, 1H ), 9.94 (t, 1H, J = 5.7), 12.15 (brs, 1H) The results of powder X-ray diffraction are shown in Tables 14 and 14. 10 Diffraction angle of the main peak: 2 Θ = 4.7, 12.8, 15.8, 17·5, 24.3, 25·7 degrees [Table 14] _________ 验 验 验 验 . . 8.86 8.380 9.680 12.800 14. 200 15: 760 17.460 17. 860 18. 520 19.740 20.940 21.140 22.220 24. 280 25.220

強I 2 0·0·0·0· οΓ·.ο· 0·0·0·0*0.0·0.0· ο* 88 25.720 26.460 28.180 28. 660 29.260 29:540 29. 900 30.340 31.480 32.000 33.700 37.560 38.420 39. 320 ιζ cvi CVI CVJ 1:3 1 3 2 2:2 2 3 0·00.00.:0·0·0*0‘0·0.0♦0* ο. 2 2 2 2-5 5 2 5 5.5 8 9 5 6^5 5 2 5 5-9 5 3 9 9 2 2 6 8 1 1 1 1:3 3 1 3 3:6 8 5 3 7 3 3 8 3 6:2 6 5 5 5:8 1 ο 8 2 2 2 2&quot;CSJ 2 2 2 2·1 1 2 2 3 2 2 2 2 1:3 1 3 2 2:2 2 3 1 18.1675 10.5425 9.1294 6 . 9103 6. 2320 5.6184 5.0750 4. 9623 4. 7869 4.4937 4.2388 4.1992 3. 9974 3. 6628 3. 5283TUM 3. 3657 3.1641 3.1122 3.0497 3; 0214 2.9859 2. 9436 2. 8395 2.7945 2. 6574 2.3927 2.3411 2. 2895 度 i76 6 8 9 9 6 7 4 3 9 0 19 6 8 5 3 2 9 6 7 5 2 7 3 0 8 2¾ 4 0 8 2 3 4 2 5 9 9 2 8 15 7159592311 2 1 12 3 1 5 0596:9 1281 2 0 12 2 1 06408.5 9805 7 227 42979:6 854 3:8 2 2 2 87273733303323 2 18 37414440 4 343 11 7 實施例15化合物(VIII-e)之合成 -7l - .200835692Strong I 2 0·0·0·0· οΓ·.ο· 0·0·0·0*0.0·0.0· ο* 88 25.720 26.460 28.180 28. 660 29.260 29:540 29. 900 30.340 31.480 32.000 33.700 37.560 38.420 39. 320 ιζ cvi CVI CVJ 1:3 1 3 2 2:2 2 3 0·00.00.:0·0·0*0'0·0.0♦0* ο. 2 2 2 2-5 5 2 5 5.5 8 9 5 6^5 5 2 5 5-9 5 3 9 9 2 2 6 8 1 1 1 1:3 3 1 3 3:6 8 5 3 7 3 3 8 3 6:2 6 5 5 5:8 1 ο 8 2 2 2 2&quot;CSJ 2 2 2 2·1 1 2 2 3 2 2 2 2 1:3 1 3 2 2:2 2 3 1 18.1675 10.5425 9.1294 6 . 9103 6. 2320 5.6184 5.0750 4. 9623 4. 7869 4.4937 4.2388 4.1992 3. 9974 3. 6628 3. 5283TUM 3. 3657 3.1641 3.1122 3.0497 3; 0214 2.9859 2. 9436 2. 8395 2.7945 2. 6574 2.3927 2.3411 2. 2895 degrees i76 6 8 9 9 6 7 4 3 9 0 19 6 8 5 3 2 9 6 7 5 2 7 3 0 8 23⁄4 4 0 8 2 3 4 2 5 9 9 2 8 15 7159592311 2 1 12 3 1 5 0596:9 1281 2 0 12 2 1 06408.5 9805 7 227 42979: 6 854 3:8 2 2 2 87273733303323 2 18 37414440 4 343 11 7 Synthesis of the compound of Example 15 (VIII-e) -7l - .200835692

於實施例6所得化合物(Π-f,800 mg,2.52 mmol)、四氫 呋喃(8mL)之溶液加草醯氯(35 2 mg,2.77 mmol)和二甲基 甲醯胺(2滴),於25°C攪拌1小時,得含有化合物(VI-d)之 反應液。此反應液用於次一反應。 工程2A solution of the compound obtained in Example 6 (Π-f, 800 mg, 2.52 mmol) and tetrahydrofuran (8 mL) was added with chlorobenzene (35 2 mg, 2.77 mmol) and dimethylformamide (2 drops) at 25 After stirring at ° C for 1 hour, a reaction liquid containing the compound (VI-d) was obtained. This reaction solution was used for the next reaction. Project 2

於工程 1所得反應液加化合物(VII-d,516 mg,2.77 mmol)和三乙胺(0.798 g,7.89 mmol)。於 25°C 攪拌 2 小時 ,得含有化合物(IX-e)之反應液。加稀鹽酸,以乙酸乙酯 萃取,以飽和重碳酸氫鈉水、精製水(14.5 mL)洗淨後,減 壓濃縮。殘渣由丙酮-己烷再結晶,得IX-e(577 mg,47%) 工程3 於工程2所得IX-e(350 mg,0.72 mmol)加甲醇(3 m L)、四氫呋喃(3 mL)及IN氫氧化鈉水溶液(2.2 -72- ,200835692 mL,2.2 mmol),於室溫攪拌2小時。加稀鹽酸作 以乙酸乙酯萃取而水洗。將有機層濃縮,殘渣由P 再結晶,濾集析出結晶,乾燥而得化合物(VIII-e ,80.9%)。 NMR(CDCh ' TMS) : 1.00-1.90 (m, 19H), 2.62-2.73 2.90-3.00 (m, 2H), 3.90-4.20 (br, 2H), 5.68 (br, (br, 1H), 8.35 (s, 1H), 8.91 (s, 1H), 13.64 (s, 1H) 粉末X線繞射之結果如表1 5及第1 5圖。 ♦ 主要峰之繞射角:20=6.9,14.0,19.4,21.6度 成酸性, ?酮-己烷 ,370 mg (m, 2H), 1H), 7.46To the reaction mixture obtained in Engineering 1, compound (VII-d, 516 mg, 2.77 mmol) and triethylamine (0.798 g, 7.89 mmol) were added. After stirring at 25 ° C for 2 hours, a reaction liquid containing the compound (IX-e) was obtained. Diluted with hydrochloric acid, extracted with ethyl acetate, washed with saturated aqueous sodium bicarbonate and purified water (14.5 mL) and concentrated. Residues were recrystallized from acetone-hexane to give IX-e (577 mg, 47%). </ RTI> </ RTI> IX-e (350 mg, 0.72 mmol) from Engineering 2 with methanol (3 m) and THF (3 mL) IN aqueous sodium hydroxide (2.2-72-, 200835692 mL, 2.2 mmol) was stirred at room temperature for 2 h. Dilute hydrochloric acid was added for extraction with ethyl acetate and washed with water. The organic layer was concentrated, and the residue was recrystallized from P. The crystals were collected by filtration and dried to give compound (VIII-e, 80.9%). NMR (CDCh ' TMS) : 1.00-1.90 (m, 19H), 2.62-2.73 2.90-3.00 (m, 2H), 3.90-4.20 (br, 2H), 5.68 (br, (br, 1H), 8.35 (s , 1H), 8.91 (s, 1H), 13.64 (s, 1H) The results of powder X-ray diffraction are shown in Tables 1 5 and 15. Figure ♦ Diffraction angle of main peaks: 20 = 6.9, 14.0, 19.4, 21.6 Acidic, ketone-hexane, 370 mg (m, 2H), 1H), 7.46

-73- .200835692 【表15】-73- .200835692 [Table 15]

2 Θ d値 強度 相對強度 6.949 12.71033 ~~ 69.4 1 100 9.383 9.4175 19.8 28,6 9.976 8,85919 6.77 Γ 9.8 10.494 「8.42308 6.46 9.3 10.842 8.15343 13.2 19 11.195 7.89695 7.49 10.8 11.687 7.56596 13 18.8 12.927 6.84278 10.8 15.6 13.652 6.48101 7.87 11.3 13.984 6.32766 51.8 74.6 15.096 5.86399 23.7 34.1 15.575 Γ 5.68475 Γ 10.9 15.8 16.531 5.35819 19 27.4 16.903 5.24084 7.62 11 17.856 4.96333 24.1 34.7 18.43 4.81014 30.6 44.1 19.354 4.58237 64.3 92.7 19.995 4.43699 9.79 14.1 20.529 4.32276 32.5 46.9 21.057 4.21553 ^ 16.5 23.8 21.594 4.11181 48.7 70.2 21.78 4.07719 35.5 51.2 22.495 3.94922 23.1 33.2 23.35 3.80645 ^ 11.1 16.1 25.334 3.51274 12.3 17.7 26.345 3.38018 15.9 22.9 27.262 3.26852 7.63 11 27.908 3.19429 10.3 14.9 28.811 3.09624 11.6 16.8 29.656 3.00984 8.7 12.5 31.556 2.8328 11.9 17.1 32.193 2.77826 6.21 8.9 32.632 2.74186 6.26 9 33.814 2.64866 7.25 10.4 34.344 2.60901 8.31 12 35.005 2.56119 6.12 8.8 36.622 2.45176 7.11 10.2 37.24 2.41248 6.2 8.9 38.748 2.32197 10.3 14.8 實施例16化合物(Vlll-f)之合成 -74- 2008356922 Θ d値 intensity relative intensity 6.949 12.71033 ~~ 69.4 1 100 9.383 9.4175 19.8 28,6 9.976 8,85919 6.77 Γ 9.8 10.494 "8.42308 6.46 9.3 10.842 8.15343 13.2 19 11.195 7.89695 7.49 10.8 11.687 7.56596 13 18.8 12.927 6.84278 10.8 15.6 13.652 6.48101 7.87 11.3 13.984 6.32766 51.8 74.6 15.096 5.86399 23.7 34.1 15.575 Γ 5.68475 Γ 10.9 15.8 16.531 5.35819 19 27.4 16.903 5.24084 7.62 11 17.856 4.96333 24.1 34.7 18.43 4.81014 30.6 44.1 19.354 4.58237 64.3 92.7 19.995 4.43699 9.79 14.1 20.529 4.32276 32.5 46.9 21.057 4.21553 ^ 16.5 23.8 21.594 4.11181 48.7 70.2 21.78 4.07719 35.5 51.2 22.495 3.94922 23.1 33.2 23.35 3.80645 ^ 11.1 16.1 25.334 3.51274 12.3 17.7 26.345 3.38018 15.9 22.9 27.262 3.26852 7.63 11 27.908 3.19429 10.3 14.9 28.811 3.09624 11.6 16.8 29.656 3.00984 8.7 12.5 31.556 2.8328 11.9 17.1 32.193 2.77826 6.21 8.9 32.632 2.74186 6.26 9 33.814 2.64866 7.25 10.4 34.344 2.60901 8.31 12 35.005 2.56119 6.12 8.8 36.622 2.45176 7.11 10.2 37.24 2.41248 6.2 8.9 38.748 2.32197 10.3 14.8 Synthesis of the compound of Example 16 (Vlll-f) -74- 200835692

工程1 於實施例6所得化合物(Π-f,0.73 g,2 3〇 mm〇1)之 THF(3.5 mL)懸浮液,加亞磺醯氯(300 mg,2.53 mmol)及 DMF(2滴),於25°C攪拌0.5小時,得含有化合物(vi-d)之 反應液。此反應液用於次一反應。 工程2 將工程1所得反應液於冰冷下徐徐滴下在化合物(VII-e, 529 mg,2.53 mmol)、三乙胺(815 mg,8.05 mmol)及四氫 呋喃(4 mL)溶液,於25°C攪拌1.5小時。加稀鹽酸,以乙 酸乙酯萃取。萃取液以水、5%碳酸氫鈉水洗淨。萃取液減 壓濃縮,於所得殘渣加甲醇,得化合物(IX-f,832 mg ’ 74.2%” 工程3 於工程2所得化合物(IX-f,832 mg,1.71 mmol)加THF(2 mL)、甲醇(1.5 mL)、IN氫氧化鈉水溶液(2.5 mL) ’於室溫 攪拌3小時。於反應液加甲苯和水,分離水層。於分離之 -75- 褽 200835692 水層加稀鹽酸作成酸性,濾集析出結晶,乾燥而得目的化 合物(VIII-f,838 mg,定量)。 NMR(DMS〇-d6、TMS) : 1.04- 1.88(m, 19H), 2.60(t, 2H, J = 7.5), 2.71(t-like, 2H), 2.84(t, 2H, J-7.5), 3.00(t-like, 2H), 4.07(brd, 2H), 6.86(s, 1H), 8.28(s, 1H), 12,15(br, 1H), 13.43(s, 1H) 粉末X線繞射之結果如表1 6及第1 6圖。 主要峰之繞射角:20=12.9,19.9,20.4,21.2度Engineering 1 A suspension of the compound obtained in Example 6 (Π-f, 0.73 g, 2 3〇mm〇1) in THF (3.5 mL), sulfinium chloride (300 mg, 2.53 mmol) and DMF (2 drops) After stirring at 25 ° C for 0.5 hour, a reaction liquid containing the compound (vi-d) was obtained. This reaction solution was used for the next reaction. The reaction solution obtained in the work 1 was slowly dropped under ice cooling in a solution of the compound (VII-e, 529 mg, 2.53 mmol), triethylamine (815 mg, 8.05 mmol) and tetrahydrofuran (4 mL), and stirred at 25 ° C. 1.5 hours. Dilute hydrochloric acid was added and extracted with ethyl acetate. The extract was washed with water and 5% sodium hydrogencarbonate. The extract was concentrated under reduced pressure, and the residue was evaporated, mjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjjj Methanol (1.5 mL), 1 N aqueous sodium hydroxide solution (2.5 mL) was stirred at room temperature for 3 hours. Toluene and water were added to the reaction mixture, and the aqueous layer was separated. The aqueous layer was separated from the -75- 褽200835692 aqueous layer. The crystals were precipitated by filtration, and dried to give the title compound ( VIII-f, 838 mg, quantitative). NMR (DMS 〇-d6, TMS): 1.04- 1.88 (m, 19H), 2.60 (t, 2H, J = 7.5 ), 2.71(t-like, 2H), 2.84(t, 2H, J-7.5), 3.00(t-like, 2H), 4.07(brd, 2H), 6.86(s, 1H), 8.28(s, 1H) ), 12,15(br, 1H), 13.43(s, 1H) The results of powder X-ray diffraction are shown in Table 16 and Figure 16. The diffraction angle of the main peaks: 20 = 12.9, 19.9, 20.4, 21.2 degrees

-76- ,200835692 【表1 6】-76- , 200835692 [Table 1 6]

2 Θ d値 強度 相對強度 8.852 9.98183 17.6 16.8 10.352 8.53796 10.8 10.3 11.18 7.90788 12.8 12.2 11.557 7.65022 24 23 12,378 7.14502 17.7 16.9 12.896 6.8589 54.7 52.3 13.529 6.53961 28,1 26.8 14.554 6.08113 26.1 24.9 14.937 5.92591 8.7 8.3 16.278 5.44072 19.6 18.7 17.059 5.19342 48.5 46.3 17.7 5.00682 21.4 20.4 18.735 4.73242 15.1 14.4 19.018 4.66255 21.2 20.2 19.937 4.44975 68.6 65.5 20.441 4,34118 105 100 20.764 4.27442 40.4 38.6 21.224 4.18275 54.3 51.8 21.855 4.06333 37.1 35.4 22.324 3.97903 12 11.4 23.186 3.833 31.8 30.4 24.18 3.6776 21.4 20.4 24.815 3.58502 17.9 17 26.771 3.32733 9.96 9.5 27.751 3.21199 9.41 9 28.115 3.17129 7.64 7.3 28.69 3.109 9.85 9.4 29.415 3.03399 11.2 10.7 31.776 2.81376 8.94 8.5 32.046 2.79062 8.99 8.6 32.698 2.73647 7.7 7.4 34.257 2.61544 6.36 6.1 36.77 2.44222 6.31 6 37.503 2.39615 6.75 6.4 38.905 2.31298 7.03 6.7 39.776 2.26429 8.36 8 實施例17化合物(Vlll-g)之合成 -77- ,2008356922 Θ d値 intensity relative strength 8.852 9.98183 17.6 16.8 10.352 8.53796 10.8 10.3 11.18 7.90788 12.8 12.2 11.557 7.65022 24 23 12,378 7.14502 17.7 16.9 12.896 6.8589 54.7 52.3 13.529 6.53961 28,1 26.8 14.554 6.08113 26.1 24.9 14.937 5.92591 8.7 8.3 16.278 5.44072 19.6 18.7 17.059 5.19342 48.5 46.3 17.7 5.00682 21.4 20.4 18.735 4.73242 15.1 14.4 19.018 4.66255 21.2 20.2 19.937 4.44975 68.6 65.5 20.441 4,34118 105 100 20.764 4.27442 40.4 38.6 21.224 4.18275 54.3 51.8 21.855 4.06333 37.1 35.4 22.324 3.97903 12 11.4 23.186 3.833 31.8 30.4 24.18 3.6776 21.4 20.4 24.815 3.58502 17.9 17 26.771 3.32733 9.96 9.5 27.751 3.21199 9.41 9 28.115 3.17129 7.64 7.3 28.69 3.109 9.85 9.4 29.415 3.03399 11.2 10.7 31.776 2.81376 8.94 8.5 32.046 2.79062 8.99 8.6 32.698 2.73647 7.7 7.4 34.257 2.61544 6.36 6.1 36.77 2.44222 6.31 6 37.503 2.39615 6.75 6.4 38.905 2.31298 7.03 6.7 39.776 2.26429 8.36 8 Synthesis of the compound of Example 17 (Vlll-g) -77- , 200835692

工程1 於實施例6所得化合物(π-f,i.oo g,3.15 mmol)之 THF(5 mL)懸浮液加亞磺醯氯(410 mg,3·45 mmol)及 DMF(2 滴),於25°C攪拌0.5小時,得含有化合物(vi-d)之反應液 。此反應液用於次一反應。 工程2Engineering 1 A suspension of the compound obtained in Example 6 (π-f, i.oo g, 3.15 mmol) in THF (5 mL) with sulfinium chloride (410 mg, 3.45 mmol) and DMF (2 drops). After stirring at 25 ° C for 0.5 hour, a reaction liquid containing the compound (vi-d) was obtained. This reaction solution was used for the next reaction. Project 2

將工程1所得反應液徐徐滴下在化合物(νπ-f,786 mg, 4.76 mmol)、三乙胺(958 mg,9.47 mmol)及四氫呋喃(5 mL) 溶液,於25 ΐ:攪拌1.5小時後,加稀鹽酸,以乙酸乙酯萃 取。萃取液以水、5 %碳酸氫鈉水洗淨。將萃取液減壓濃縮 ,得含有化合物(IX-g)之殘渣(1·57 g)。此殘渣用於次一反 工程3 於工程2所得殘渣(1·57 g)加THF(7.8 mL)、甲醇(7.8 mL) 、2N氫氧化鈉水溶液(4·73 mL) ’於室溫攪拌1 ·5小時。於 反應液加甲苯和水,分離水層。於分離之水層加稀鹽酸作 -78- ,200835692 成酸性,以乙酸乙酯萃取。將有機層水洗,乾燥後,蒸除 溶劑,得油上之殘渣。於殘渣加醚來結晶化後,由丙酮-己 烷再結晶,得化合物(VIII_g,917 mg,65%)。 NMR(DMSO-d6、TMS) : 1.04- 1.84(m, 1 9H),2.6 3 - 2.7 5 (m, 2H), 2 · 90-3.0 5 (m, 2H), 3.67(s, 2H), 3.95-4.20(m, 2H), 7.09(m, 1H), 7.23-7.32(m, 2H), 8.06(d, 1H, J = 8.1), 8.24(s, 1H), 12.08(s, 1H), 12.37(br s, 1H) 粉末X線繞射之結果如表1 7及第1 7圖。 # 主要峰之繞射角:2 Θ =6.6,9.8,13.2,16.1,20.1,20.9,24.1 度The reaction solution obtained in the work 1 was slowly dropped on a solution of the compound (νπ-f, 786 mg, 4.76 mmol), triethylamine (958 mg, 9.47 mmol) and tetrahydrofuran (5 mL) at 25 ΐ: after stirring for 1.5 hours, Dilute hydrochloric acid was extracted with ethyl acetate. The extract was washed with water and 5% sodium bicarbonate water. The extract was concentrated under reduced pressure to give a residue (1·57 g) of Compound (IX-g). This residue was used in the next reverse engineering. 3 Residues from Engineering 2 (1·57 g) plus THF (7.8 mL), methanol (7.8 mL), 2N aqueous sodium hydroxide (4·73 mL). ·5 hours. Toluene and water were added to the reaction mixture, and the aqueous layer was separated. The separated aqueous layer was diluted with hydrochloric acid as -78-, 200835692 to acid and extracted with ethyl acetate. The organic layer was washed with water, dried, and then evaporated to give a residue. After the residue was crystallized by ether, it was recrystallized from acetone-hexane to give Compound ( VIII g, 917 mg, 65%). NMR (DMSO-d6, TMS): 1.04- 1.84 (m, 1 9H), 2.6 3 - 2.7 5 (m, 2H), 2 · 90-3.0 5 (m, 2H), 3.67 (s, 2H), 3.95 -4.20(m, 2H), 7.09(m, 1H), 7.23-7.32(m, 2H), 8.06(d, 1H, J = 8.1), 8.24(s, 1H), 12.08(s, 1H), 12.37 (br s, 1H) The results of powder X-ray diffraction are shown in Tables 17 and 17. # diffraction angle of the main peak: 2 Θ =6.6,9.8,13.2,16.1,20.1,20.9,24.1 degrees

-79- .200835692 【表17】-79- .200835692 [Table 17]

2 Θ d値 強度 相對強度 6.558 13.4674 67.4 59.6 7.285 12.12488 21.1 18.7 9.765 9.05037 76.6 67.8 10.226 广8.64285 53.2 47.1 10.548 8.37979 11.8 10.4 13.197 Γ 6.70345 67.4 59.6 14.067 6.29065 33.8 29.9 14.915 5.93493 21.4 18.9 16.05 5.51758 59.1 52.3 16.888 5.24575 9.95 8.8 18.351 4.83054 38.7 34.3 19.031 4.6595 32.1 28.4 19.37 4.57858 32.2 28.5 19.708 4.50103 37.4 33.1 20.09 4.41622 91.7 81.2 20.855 4.25595 104 92.2 22.339 3.97649 30.2 26.7 22.87 3.88526 24.4 21.6 24.09 3.69114 113 100 25.31 3.51598 30.5 27 25.778 3.45322 12.3 10.9 26.5 3.36071 9.03 8 27.674 3.22072 8 7.1 28.341 3.14647 10 8.8 28.75 3.10262 12.9 11.4 29.803 2.99537 10.3 9.1 30.402 2.93767 13.3 11.8 30.97 2.88513 11.9 10.5 32.176 2.77966 8.35 7,4 32.92 2.71848 7.08 6.3 34.161 2.62251 14.1 12.5 34.764 2.5784 7.62 6.7 35.746 2.50978 6.53 5.8 36.454 2.4627 7.46 6.6 37.348 2.40576 8.57 7.6 38.582 2.3316 5.86 5.2 實施例18化合物(VIII-h)之合成 ,2008356922 Θ d値 strength relative strength 6.558 13.4674 67.4 59.6 7.285 12.12488 21.1 18.7 9.765 9.05037 76.6 67.8 10.226 wide 8.64285 53.2 47.1 10.548 8.37979 11.8 10.4 13.197 Γ 6.70345 67.4 59.6 14.067 6.29065 33.8 29.9 14.915 5.93493 21.4 18.9 16.05 5.51758 59.1 52.3 16.888 5.24575 9.95 8.8 18.351 4.83054 38.7 34.3 19.031 4.6595 32.1 28.4 19.37 4.57858 32.2 28.5 19.708 4.50103 37.4 33.1 20.09 4.41622 91.7 81.2 20.855 4.25595 104 92.2 22.339 3.97649 30.2 26.7 22.87 3.88526 24.4 21.6 24.09 3.69114 113 100 25.31 3.51598 30.5 27 25.778 3.45322 12.3 10.9 26.5 3.36071 9.03 8 27.674 3.22072 8 7.1 28.341 3.14647 10 8.8 28.75 3.10262 12.9 11.4 29.803 2.99537 10.3 9.1 30.402 2.93767 13.3 11.8 30.97 2.88513 11.9 10.5 32.176 2.77966 8.35 7,4 32.92 2.71848 7.08 6.3 34.161 2.62251 14.1 12.5 34.764 2.5784 7.62 6.7 35.746 2.50978 6.53 5.8 36.454 2.4627 7.46 6.6 37.348 2.40576 8.57 7.6 38.582 2.3316 5.86 5.2 Synthesis of the compound of Example 18 (VIII-h), 200835692

工程1 於實施例10所得化合物500 mg’ i.44 mmol)、四 氫呋喃(5 mL)之溶液加草醯氯(201 mS,i.58 mmol)和二甲 基甲醯胺(1滴),於25°C攪拌1小時’得含有化合物(VI-e) 之反應液。此反應液用於次一反應。 工程2 將工程 1所得反應液徐徐加在化合物(VII-d,320 mg, 1.72 mmol)和三乙胺(〇·435 g,4.30 mmol)之四氫呋喃(5 mL) 溶液。於25°C攪拌2小時,得含有化合物(IX-h)之反應液 。加稀鹽酸,以乙酸乙酯萃取,以飽和重碳酸氫鈉水 '精 製水洗淨後,減壓濃縮。殘渣由丙酮-己烷再結晶,得IX-h(600 mg,81%)。 工程3 於工程 2 所得 IX-h(5 80 mg,1.12 mmol)加甲醇(3.4 mL)、四氫呋喃(3.4 mL)及IN氫氧化鈉水溶液(3 .4 mL,3.4 mmol),於室溫攪拌1.5小時。加稀鹽酸作成酸 -81 - 200835692 性,以乙酸乙酯萃取,有機層予以水洗而乾燥後濃縮,殘 渣由丙酮-己烷再結晶,濾集析出結晶,乾燥而得化合物 (VIII-h,520 mg,95.2%)。 NMR(DMS〇-d6、TMS): 1.27-1.49(m,4H),1·55-1·72(ιη,4H), 2.67-2.80(m, 2H), 2.85-2.97(m, 2H), 3.60(s, 2H), 5.48(br s, 2H), 6.96-7.04(m, 1H),7.03(s, 1H),7.30-7.46(m, 2H), 8.38(s, 1H), 12.39(br s, 1H), 13.26(s? 1H) 粉末X線繞射之結果如表1 8及第1 8圖。 主要峰之繞射角:20 =1〇.〇,17.9,18.7,20.6,21.5,21.9 度Engineering 1 A solution of the compound obtained in Example 10 (500 mg 'i.44 mmol) and tetrahydrofuran (5 mL) was added with hydrazine chloride (201 mS, i.58 mmol) and dimethylformamide (1 drop). The mixture was stirred at 25 ° C for 1 hour to obtain a reaction liquid containing the compound (VI-e). This reaction solution was used for the next reaction. Engineering 2 The reaction solution obtained in Engineering 1 was slowly added to a solution of the compound (VII-d, 320 mg, 1.72 mmol) and triethylamine (〇·435 g, 4.30 mmol) in tetrahydrofuran (5 mL). The mixture was stirred at 25 ° C for 2 hours to obtain a reaction liquid containing the compound (IX-h). Diluted with hydrochloric acid, extracted with ethyl acetate and washed with saturated aqueous sodium bicarbonate water, and concentrated under reduced pressure. The residue was recrystallized from acetone-hexane to give IX-h (600 mg, 81%). Engineering 3 IX-h (5 80 mg, 1.12 mmol) obtained in Engineering 2, methanol (3.4 mL), tetrahydrofuran (3.4 mL) and 1N aqueous sodium hydroxide (3. 4 mL, 3.4 mmol). hour. Dilute hydrochloric acid was used as acid-81-200835692, extracted with ethyl acetate. The organic layer was washed with water, dried and concentrated. The residue was recrystallized from acetone-hexane, and crystals were collected by filtration to give compound (VIII-h, 520 Mg, 95.2%). NMR (DMS〇-d6, TMS): 1.27-1.49 (m, 4H), 1·55-1·72 (ιη, 4H), 2.67-2.80 (m, 2H), 2.85-2.97 (m, 2H), 3.60(s, 2H), 5.48(br s, 2H), 6.96-7.04(m, 1H), 7.03(s, 1H), 7.30-7.46(m, 2H), 8.38(s, 1H), 12.39(br s, 1H), 13.26 (s? 1H) The results of powder X-ray diffraction are shown in Tables 18 and 18. Diffraction angle of the main peak: 20 = 1 〇. 〇, 17.9, 18.7, 20.6, 21.5, 21.9 degrees

-82- 200835692 【表18】-82- 200835692 [Table 18]

2 Θ d値 強度 相對強度 6.93 12.74467 14.9 17.7 9.22 9.58399 4.7 5.6 9.965 8.86909 48.7 57.7 10.694 8.26601 8.06 9.6 11.435 7.73216 10.8 12.8 11.783 7.50413 6.36 7.5 12.246 7.22174 14.4 17.1 12,897 6,85834 23.2 27.5 13.897 6.36718 14.9 17.6 14.948 5.92164 35.4 42 16.764 5.28428 8.47 10 17.855 4.96368 45.9 54.3 18.48 4.79715 26.4 31.3 18.728 4.7343 75.2 89.2 19.652 4.51364 14.5 17.2 20.595 4.30904 53.8 63.7 21.536 4.12277 75.5 89.5 21.871 4.06047 84.4 100 22.893 3.88147 18.4 21.8 24.118 3.687 8.55 10.1 24.732 3.59682 11.6 13.7 25.731 3.45937 7.53 8.9 26,261 3.39075 30.9 36.6 27.083 3.28971 8.25 9.8 27.799 3.20653 9.91 11.7 28.488 3.13054 25.4 30 30.135 2.96313 11.6 13.7 30.827 2.89811 12.7 15.1 31.354 2.85067 ^ 9v67 11.5 32.333 2.76655 5.56 6.6 32.827 2.72603 11.9 14.1 33.707 2.6568 5 5.9 36.292 2.47327 9.49 11.2 36.823 2.43882 7.03 8.3 37.19 2.41562 7.76 9.2 37.769 2.37988 8.61 10.2 39.238 2.29409 6.65 7.9 39.846 2.26049 5.73 6.8 -83- 2008356922 Θ d値 intensity relative intensity 6.93 12.74467 14.9 17.7 9.22 9.58399 4.7 5.6 9.965 8.86909 48.7 57.7 10.694 8.26601 8.06 9.6 11.435 7.73216 10.8 12.8 11.783 7.50413 6.36 7.5 12.246 7.22174 14.4 17.1 12,897 6,85834 23.2 27.5 13.897 6.36718 14.9 17.6 14.948 5.92164 35.4 42 16.764 5.28428 8.47 10 17.855 4.96368 45.9 54.3 18.48 4.79715 26.4 31.3 18.728 4.7343 75.2 89.2 19.652 4.51364 14.5 17.2 20.595 4.30904 53.8 63.7 21.536 4.12277 75.5 89.5 21.871 4.06047 84.4 100 22.893 3.88147 18.4 21.8 24.118 3.687 8.55 10.1 24.732 3.59682 11.6 13.7 25.731 3.45937 7.53 8.9 26,261 3.39075 30.9 36.6 27.083 3.28971 8.25 9.8 27.799 3.20653 9.91 11.7 28.488 3.13054 25.4 30 30.135 2.96313 11.6 13.7 30.827 2.89811 12.7 15.1 31.354 2.85067 ^ 9v67 11.5 32.333 2.76655 5.56 6.6 32.827 2.72603 11.9 14.1 33.707 2.6568 5 5.9 36.292 2.47327 9.49 11.2 36.823 2.43882 7.03 8.3 37.19 2.41562 7.76 9.2 37.769 2.37988 8.61 10.2 39.238 2.29409 6.65 7.9 39.846 2.26049 5.73 6.8 -83- 2008356 92

工程1 於實施例9所得化合物(Π-i’ 300 mg,1.03 mmol)、四氫 呋喃(3 mL)之溶液加草醯氯(143 mg,1.13 mmol)和二甲基 甲醯胺(1滴),於25°C攪拌0.5小時,得含有化合物(vi-f) 之反應液。此反應液用於次一反應。 工程2Process 1 A solution of the compound obtained in Example 9 (Π-i' 300 mg, 1.03 mmol), tetrahydrofuran (3 mL) was added with chlorobenzene (143 mg, 1.13 mmol) and dimethylformamide (1 drop). After stirring at 25 ° C for 0.5 hour, a reaction liquid containing the compound (vi-f) was obtained. This reaction solution was used for the next reaction. Project 2

將工程1所得反應液徐徐加在化合物(VII-g,260 mg, 1.24 mmol)和吡啶(3 mL)溶液。於25°C攪拌14小時,得含 有化合物(IX-i)之反應液。加稀鹽酸,以乙酸乙酯萃取, 以飽和重碳酸氫鈉水、精製水洗淨後,減壓濃縮。殘渣以 矽膠層析(己烷-乙酸乙酯(1 : 2))精製,得IX-i淡黄色固體 (350 mg,76.1%) 〇 工程3 於工程 2 所得 IX - i (3 4 0 m g,0 · 7 6 m m ο 1)加甲醇(2.3 m L)、 四氫呋喃(2·3 mL)及 IN氫氧化鈉水溶液(2.3 mL ’ 2·3 mmol),於室溫攪拌1小時。加稀鹽酸作成酸性’以乙酸 -84- ^200835692 乙酯萃取,將有機層水洗。有機層乾燥後濃縮,殘渣由丙 酮-己烷再結晶,濾集析出結晶,乾燥而得化合物(VIII-i, 250 mg 5 76.1%)。 NMR(DMS〇-d6、TMS) : 0.98(d,6H, J = 6.6), 1.26- 1.86(m, 11H), 2.65-2.80(m, 2H), 2.90-3.05(m, 2H), 3.81(s, 2H)? 4.10-4.25(m, 2H), 8.32(s? 1H), 12.65(br s, 1H), 13.84(s, 1H) 粉末X線繞射之結果如表1 9及第1 9圖。 主要峰之繞射角:20=10.4,18.0, 20.7,21.0度 • 【表19】 2 Θ d値 強度 相對強度 7.156 12.34303 7.55 1 10.477 8.43668 789 100 11.78 7.50651 6.6 0.8 13.103 6.75132 24.8 3.1 14.007 6.31735 16.9 2Λ 14.36 6.16303 8.91 1.1 15.704 5.63842 17.8 2.3 17.15 5.16619 29.1 3.7 18.016 4.91976 63.8 8.1 18.596 4.76749 28.4 3.6 20.691 4.28929 60.7 7.7 20.988 4.22917 52.9 6.7 21.547 4.12084 17.2 2.2 22.62 3.92757 13 1,7 23.018 3.86056 9.8 1.2 23.629 3.76217 10.8 1.4 24.281 3.66264 8.27 1 24.867 3.5776 29.2 3.7 26.363 3.37783 16.3 2.1 27.151 3,28156 17.2 2.2 28.762 3.10138 7.19 0.9 29.739 3.00163 11.5 1.5 30.329 2.94461 13.5 1.7 31.724 2.81822 15.7 2 33.979 2.63617 10 1.3 38.848 2.31625 5 0.6 -85- 200835692The reaction solution obtained in Engineering 1 was slowly added to a solution of the compound (VII-g, 260 mg, 1.24 mmol) and pyridine (3 mL). After stirring at 25 ° C for 14 hours, a reaction liquid containing the compound (IX-i) was obtained. Dilute hydrochloric acid was added, and the mixture was extracted with ethyl acetate, washed with saturated aqueous sodium bicarbonate and purified water, and concentrated. The residue was purified by silica gel chromatography (hexane-ethyl acetate (1: 2)) to give IX-i pale-yellow solid (350 mg, 76.1%) 〇 Engineering 3 IX - i (3 4 0 mg, 0 · 7 6 mm ο 1) Add methanol (2.3 m L), tetrahydrofuran (2.3 mL) and 1N aqueous sodium hydroxide (2.3 mL '2.3 mmol) and stir at room temperature for 1 hour. Adding dilute hydrochloric acid to make acid' is extracted with ethyl acetate -84-^200835692, and the organic layer is washed with water. The organic layer was dried, concentrated, and the residue was recrystallized from acetone-hexane, and crystals were collected by filtration to afford compound (VIII-i, 250 mg 5 76.1%). NMR (DMS 〇-d6, TMS): 0.98 (d, 6H, J = 6.6), 1.26- 1.86 (m, 11H), 2.65-2.80 (m, 2H), 2.90-3.05 (m, 2H), 3.81 ( s, 2H)? 4.10-4.25(m, 2H), 8.32(s? 1H), 12.65(br s, 1H), 13.84(s, 1H) The results of powder X-ray diffraction are shown in Table 1 9 and No. 9 Figure. Diffraction angle of the main peak: 20 = 10.4, 18.0, 20.7, 21.0 degrees • [Table 19] 2 Θ d値 Strength relative strength 7.156 12.34303 7.55 1 10.477 8.43668 789 100 11.78 7.50651 6.6 0.8 13.103 6.75132 24.8 3.1 14.007 6.31735 16.9 2Λ 14.36 6.16303 8.91 1.1 15.704 5.63842 17.8 2.3 17.15 5.16619 29.1 3.7 18.016 4.91976 63.8 8.1 18.596 4.76749 28.4 3.6 20.691 4.28929 60.7 7.7 20.988 4.22917 52.9 6.7 21.547 4.12084 17.2 2.2 22.62 3.92757 13 1,7 23.018 3.86056 9.8 1.2 23.629 3.76217 10.8 1.4 24.281 3.66264 8.27 1 24.867 3.5776 29.2 3.7 26.363 3.37783 16.3 2.1 27.151 3,28156 17.2 2.2 28.762 3.10138 7.19 0.9 29.739 3.00163 11.5 1.5 30.329 2.94461 13.5 1.7 31.724 2.81822 15.7 2 33.979 2.63617 10 1.3 38.848 2.31625 5 0.6 -85- 200835692

工程1 於實施例4所得化合物(II-i,300 mg,1. 〇3 mmο 1)、四氫 呋喃(3 mL)之溶液加草醯氯(143 mg,1.13 mmol)和二甲基 甲醯胺(1滴),於25°C攪拌0.5小時,得含有化合物(VI-f) 之反應液。此反應液用於次一反應。 工程2 將工程1所得反應液徐徐加在化合物(VII-h,310 mg, 1.22 mmol)和三乙胺(415 mg,4.1 mmol)和四氫呋喃(3 mL) 溶液。於25°C攪拌14小時,得含有化合物(IX-j)之反應液 。加稀鹽酸,以乙酸乙酯萃取,以飽和重碳酸氫鈉水、精 製水洗淨後,減壓濃縮。殘渣以矽膠層析(己烷-乙酸乙酯 (2 : 1))精製,得 IX-j(3 50 mg,76.3%)。 工程3 於工程 2 所得 IX-j(340 mg,0.76 mmol)加甲醇(2.3 mL)、 四氫呋喃(2.3 mL)及IN氫氧化鈉水溶液(2·3 mL,2.3 mmol),於室溫攪拌2.5小時。力[]稀鹽酸作成酸性,以乙酸 -86- .200835692 乙酯萃取,將有機層水洗而乾燥後濃縮,殘渣以丙酮-己烷 再結晶’滅集析出結晶,乾燥而得化合物(VIII-j,230 mg ,70.1%)。 NMR(DMS〇-d6、TMS) : 0.98(d, 6H, J = 6.6), 1.26- 1.84(m, 11H), 2.65-2.77(m, 2H), 2.90-3.03(m, 2H)? 3.82(s, 2H), 4.1〇.4.25(m, 2H), 7.31(s, 1H), 8.24(s, 1H), 12.63(br s, 1H), 13.39(s, 1H) 粉末X線繞射之結果如表20及第20圖。 Φ 主要峰之繞射角:20=9.1,12.1,18.0,18.3,19.7 度 -87- 200835692 【表20】Work 1 A solution of the compound (II-i, 300 mg, 1. 〇3 mmο 1) and tetrahydrofuran (3 mL) obtained in Example 4 was added with hydrazine chloride (143 mg, 1.13 mmol) and dimethylformamide ( One drop) was stirred at 25 ° C for 0.5 hour to obtain a reaction liquid containing the compound (VI-f). This reaction solution was used for the next reaction. Engineering 2 The reaction solution obtained in Engineering 1 was slowly added to a solution of the compound (VII-h, 310 mg, 1.22 mmol) and triethylamine (415 mg, 4.1 mmol) and tetrahydrofuran (3 mL). After stirring at 25 ° C for 14 hours, a reaction liquid containing the compound (IX-j) was obtained. Diluted with hydrochloric acid, extracted with ethyl acetate, washed with saturated aqueous sodium bicarbonate and purified water. The residue was purified by silica gel chromatography (hexane-ethyl acetate (2:1)) to yield IX-j (3 50 mg, 76.3%). Engineering 3 IX-j (340 mg, 0.76 mmol) from Engineering 2 was added methanol (2.3 mL), tetrahydrofuran (2.3 mL) and 1N aqueous sodium hydroxide (2·3 mL, 2.3 mmol). . Force [] dilute hydrochloric acid is made acidic, extracted with ethyl acetate -86-.200835692 ethyl ester, the organic layer is washed with water, dried and concentrated, and the residue is recrystallized from acetone-hexane to decompose and precipitate crystals, which are dried to obtain compound (VIII-j). , 230 mg, 70.1%). NMR (DMS〇-d6, TMS): 0.98 (d, 6H, J = 6.6), 1.26- 1.84 (m, 11H), 2.65-2.77 (m, 2H), 2.90-3.03 (m, 2H)? s, 2H), 4.1〇.4.25(m, 2H), 7.31(s, 1H), 8.24(s, 1H), 12.63(br s, 1H), 13.39(s, 1H) Results of powder X-ray diffraction See Table 20 and Figure 20. Φ The diffraction angle of the main peak: 20=9.1, 12.1, 18.0, 18.3, 19.7 degrees -87- 200835692 [Table 20]

2 Θ d値 強度 相對強度 8.59 10.2848 6.48 2.1 9.103 9.70638 94.3 30 11.69 7.56398 15.7 5 12.143 7.28278 314 100 12.676 6.9775 13.1 4.2 14.963 5.91566 19.1 6.1 16.459 5.38127 12.2 ~ 3.9 17.536 5.05318 119 38 18.007 4.9222 93.9 29.9 18.255 4.85589 87.4 27.8 18.522 4.78638 44.1 14.1 18.935 4.68288 44.2 14.1 19.503 4.54787 53.1 16.9 19.704 4.50176 60.6 19.3 19.96 4.44466 33.2 10.6 20.349 4.36048 29.4 9.4 20.579 4.31244 35 11.2 21.386 4.15142 14.6 4.7 22.764 3.90315 28.2 9 23.736 3.7455 18.3 5.8 23.954 3.71186 23.3 7.4 24.316 3.65734 13.7 4.4 24.783 3.58953 13.5 4.3 25.843 3.4447 8.89 2.8 26.668 3.33999 47.2 15 27.399 3.25242 10.2 r 3.2 28.948 3.08184 11.7 3.7 29,136 3.0624 9.3 3 30.006 2.97557 9.05 2.9 30.971 2.88499 24.8 7.9 31.478 2.83971 6.16 2 32.29 2.77007 9.95 3.2 34.289 2.61305 15.6 5 34.762 2.57857 12.3 3.9 35.325 2.53873 6.28 2 35.734 2.5106 7.04 2.2 37.371 2.40432 6.61 2.1 39.096 2.30212 7.75 2.5 用與實施例1〜20同樣之方法,合成化合物(VIII-k)〜(VIII-nn)。構造式如表21〜表26。 【表2 1】 -88- 2008356922 Θ d値 strength relative strength 8.59 10.2848 6.48 2.1 9.103 9.70638 94.3 30 11.69 7.56398 15.7 5 12.143 7.28278 314 100 12.676 6.9775 13.1 4.2 14.963 5.91566 19.1 6.1 16.459 5.38127 12.2 ~ 3.9 17.536 5.05318 119 38 18.007 4.9222 93.9 29.9 18.255 4.85589 87.4 27.8 18.522 4.78638 44.1 14.1 18.935 4.68288 44.2 14.1 19.503 4.54787 53.1 16.9 19.704 4.50176 60.6 19.3 19.96 4.44466 33.2 10.6 20.349 4.36048 29.4 9.4 20.579 4.31244 35 11.2 21.386 4.15142 14.6 4.7 22.764 3.90315 28.2 9 23.736 3.7455 18.3 5.8 23.954 3.71186 23.3 7.4 24.316 3.65734 13.7 4.4 24.783 3.58953 13.5 4.3 25.843 3.4447 8.89 2.8 26.668 3.33999 47.2 15 27.399 3.25242 10.2 r 3.2 28.948 3.08184 11.7 3.7 29,136 3.0624 9.3 3 30.006 2.97557 9.05 2.9 30.971 2.88499 24.8 7.9 31.478 2.83971 6.16 2 32.29 2.77007 9.95 3.2 34.289 2.61305 15.6 5 34.762 2.57857 12.3 3.9 35.325 2.53873 6.28 2 35.734 2.5106 7.04 2.2 37.371 2.40432 6.61 2.1 39.096 2.30212 7.75 2.5 In the same way as in Examples 1 to 20, To compound (VIII-k) ~ (VIII-nn). The structural formula is as shown in Table 21 to Table 26. [Table 2 1] -88- 200835692

【表22】 -89- 200835692[Table 22] -89- 200835692

【表23】 -90- 200835692[Table 23] -90- 200835692

【表24】 -91 - 200835692 化合物 編號 構造式 NMR (DMS 〇-d 6、 TMS) 5 VIII —Z ocC^ 1.04-1.88(m, 19H), 2.7〇(brt, 2H), 2.99(brt, 2H), 3.49(s, 2H), 4.05(br, 2H), 6.78*6.7 9(m, 2H), 8.23(s, 1H), 12.8 8(s, 1H) VIII -a a 0、 0 S-N Voh OCC〆 1.0-1.8(m, 19H),2.72(br-s, 2H), 3.0l(br-s, 2H), 3.8l(s, 2H), 4.07(br-s, 2H), 8.33(s, 1H), 12.6(br-s, 1H), 13.8(b r-s, 1H) VIII -b b Me 〇T^N々。H Nk〇 CDC13: 0.94(t, 3H, J=7.2), 1.05-1.88(m, 25H), 2.60-2.8 2(m, 4H), 2.93(t, 2H,J=6.0 ),4.00(bs, 1H), 4.3l(bs, 1H ),8.33(s, 1H), 10.4(s, 1H) VIII -c c Me 〇rx^ 以H CDC13: 0.90(t, 3H, J=6.9), 1.00-1.90(m, 27H), 2.60-2.8 0(m, 4H), 2.93(t, 2H, J=6.0 ),4.00(bs, 1H), 4.25-4.37(m ,1H), 8.33(s, 1H), 10.4(s, 1 H) VIII -d d ccC^B? 1.00-L90(m, 19Ή), 2.65-2.7 7(m, 2H), 2.93-3.07(m, 2H), 3.6l(s, 2H), 3.95-4.15(br, 2H), 8.29(s, 1H), 12.20Ί3.0 0(br, 1H), 13.64(s, 1H) 【表25 -92- 蜒 200835692 蜒[Table 24] -91 - 200835692 Compound No. Structural NMR (DMS 〇-d 6, TMS) 5 VIII - Z ocC^ 1.04-1.88 (m, 19H), 2.7 〇 (brt, 2H), 2.99 (brt, 2H) ), 3.49(s, 2H), 4.05(br, 2H), 6.78*6.7 9(m, 2H), 8.23(s, 1H), 12.8 8(s, 1H) VIII -aa 0, 0 SN Voh OCC〆 1.0-1.8 (m, 19H), 2.72 (br-s, 2H), 3.0 l (br-s, 2H), 3.8 l (s, 2H), 4.07 (br-s, 2H), 8.33 (s, 1H) ), 12.6(br-s, 1H), 13.8(b rs, 1H) VIII -bb Me 〇T^N々. H Nk 〇 CDC13: 0.94 (t, 3H, J = 7.2), 1.05-1.88 (m, 25H), 2.60-2.8 2 (m, 4H), 2.93 (t, 2H, J = 6.0), 4.00 (bs, 1H), 4.3l(bs, 1H), 8.33(s, 1H), 10.4(s, 1H) VIII -cc Me 〇rx^ to H CDC13: 0.90(t, 3H, J=6.9), 1.00-1.90 ( m, 27H), 2.60-2.8 0(m, 4H), 2.93(t, 2H, J=6.0), 4.00(bs, 1H), 4.25-4.37(m ,1H), 8.33(s, 1H), 10.4 (s, 1 H) VIII -dd ccC^B? 1.00-L90(m, 19Ή), 2.65-2.7 7(m, 2H), 2.93-3.07(m, 2H), 3.6l(s, 2H), 3.95 -4.15(br, 2H), 8.29(s, 1H), 12.20Ί3.0 0(br, 1H), 13.64(s, 1H) [Table 25 -92- 蜒200835692 蜒

化合物 編號 構造式 NMR (DMS 〇—d 6、 TMS) δ VIII -e e 〇cci0H &quot;o 1.02*1.86(m, 19H), 2.62-2. 75(m, 2H), 2.92-3.05(m, 2 H), 3.85-4.15(br, 2H), 5.43 (m, 1H), 8.18(s, 1H), 10.8 3(d, 1H, J=9.0), 14.22(brs, 1H) VIII —f f 〇cC^OH &quot;cc; 1.26-1.68(m, 18H), 2.17(s, 2H), 2.67(br s, 2H), 2.81 (br s,2H),3.40(d,2H,J二 6.3),5.41(br s,2H),6.86( m,1H), 7.25(ddd,1H,J=1 1.9,7.7 and 2.3),7,39(dt, 1H, J=10.8 and 8.4), 8.2 3(s, 1H), 9.89(t,1H,J=6. 0),12.06(br s,1H) VIII -g g 〇CC^0H 1.25-1.50(m, 4H), 1.57Ί.7 0(m, 4H), 2.67-2.77(m, 2H ),2·85·2·95(ιη,2H),3.60(s ,2H),5.48(s,2H),7.12-7. 26(m,4H),7.72(dd,1H,J =2.4, 8.4), 8.19(d, 1H, J= 2.1),8.23(d,1H,J=8.4),8 • 38(s,1H),12.47(s,1H) VIII -h h ocx&gt;、n 〇 &quot;a; 1.26-1.50(m,4H),1.55-1.7 3(m, 4H), 2.66*2.78(m, 2H ),2.83-2.95(m, 2H), 3,6〇(s ,2H), 5.46(s, 2H), 6.96(m ,1H), 7.26-7.48(m, 2H), 7 • 72(dd,1H, J=2.4, 8.4),8. 19(d, 1H, J = 2.4), 8.23(d, 1H, J=8.4), 8.37(s, 1H), 1 2.43(s, lH),12.44(br s, 1H ) VIII —i i 0〔〇〕0 OCC 卜。H &quot;cc 1.20*2.20(m, 12H), 2.60-2. 95(m, 4H), 2,86(s, 2H), 3 •48(t’ 2H, J=10.5),3·60·3. 75(m,2H),5,30-5.55(m, 2 H), 6.82-7.48(m, 2H), 8.2 0(s, 1H), 9.98(s, 1H) -93- .200835692 (產業上之利用可能性) 發現以簡便、高產率且高純度得具有優異類大麻鹼受體 激動劑活性之2-吡啶酮-3-胺甲醯基衍生物之重要中間體之 製法,更發現用該重要中間體可以高產率且高純度製造2-吡啶酮-3 -胺甲醯基衍生物之方法。 【圖式簡單說明】 【第1圖】實施例1所得化合物(Π-a)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度(單位:cps),横軸爲繞射 • 角度(2 0,單位:度)。 【第2圖】實施例2所得化合物(ΙΙ-b)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度(單位:cps),橫軸爲繞射 角度(2 0,單位:度)。 【第3圖】貫施例3所得化合物(11 - c)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度(單位:cps),橫軸爲繞射 角度(2 (9,單位:度)。 【第4圖】實施例4所得化合物(Π-d)結晶之粉末X線 ® 繞射圖案及其峰値。縱軸爲強度(單位:cps),横軸爲繞射 角度(2 Θ,單位:度)。 【第5圖】實施例5所得化合物(Π-e)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度(單位:cps) ’横軸爲繞射 角度(2 0,單位:度)。 【第6圖】實施例6所得化合物(Π-0結晶之粉末X線繞 射圖案及其峰値。縱軸爲強度’横軸爲繞射角度(2 Θ,單 位:度)。 -94- 200835692 【第7圖】實施例7所得化合物(π-g)結晶之粉末χ線 繞射圖案及其峰値。縱軸爲強度,橫軸爲繞射角度(2 0 , 單位:度)。 ’ 【第8圖】實施例8所得化合物(n-h)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度’横軸爲繞射角度(2 0, 單位:度)。 【第9圖】實施例9所得化合物(Π-i)結晶之粉末X線繞 射圖案及其峰値。縱軸爲強度,橫軸爲繞射角度(2 0,單 β 位:度)。 【第10圖】實施例10所得化合物(ΙΙ-j)結晶之粉末X線 繞射圖案及其峰値。縱軸爲強度,横軸爲繞射角度(2 0, 單位:度)。 【第11圖】實施例11所得化合物(VIII-a)結晶之粉末X 線繞射圖案及其峰値。縱軸爲強度(單位:cps),横軸爲繞 射角度(2 0,單位:度)。 【第12圖】實施例12所得化合物(VIII-b)結晶之粉末X ® 線繞射圖案及其峰値。縱軸爲強度(單位:cps),橫軸爲繞 射角度(2 Θ,單位:度)。 【第13圖】實施例13所得化合物(VIII-c)結晶之粉末X 線繞射圖案及其峰値。縱軸爲強度(單位:cps),横軸爲繞 射角度(20,單位:度)。 【第14圖】實施例14所得化合物(VIII-d)結晶之粉末X 線繞射圖案及其峰値。縱軸爲強度(單位:cps),横軸爲繞 射角度(2 (9,單位:度)。 -95- 200835692 【第15圖】實施例15所得化合物(Vlll-e)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度(單位:cps),橫軸爲繞 射角度(2 0,單位:度)。 【第16圖】實施例16所得化合物(VIII-f)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度,横軸爲繞射角度(2 0 ,單位:度)。 【第17圖】實施例17所得化合物(VIII-g)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度,橫軸爲繞射角度(2 θ ,單位:度)。 【第18圖】實施例18所得化合物(VIII_h)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度,橫軸爲繞射角度(2|9 ,單位:度)。 【第19圖】實施例19所得化合物(vill-i)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度,横軸爲繞射角度(2 0 ,單位:度)。 【第20圖】實施例2〇所得化合物(νηΜ)結晶之粉末χ 線繞射圖案及其峰値。縱軸爲強度,横軸爲繞射角度(2 Θ ,單位:度)。 -96-Compound No. Construction NMR (DMS 〇-d 6, TMS) δ VIII -ee 〇cci0H &quot;o 1.02*1.86(m, 19H), 2.62-2. 75(m, 2H), 2.92-3.05(m, 2 H), 3.85-4.15(br, 2H), 5.43 (m, 1H), 8.18(s, 1H), 10.8 3(d, 1H, J=9.0), 14.22(brs, 1H) VIII —ff 〇cC^ OH &quot;cc; 1.26-1.68(m, 18H), 2.17(s, 2H), 2.67(br s, 2H), 2.81 (br s, 2H), 3.40 (d, 2H, J 6.3), 5.41 ( Br s,2H), 6.86( m,1H), 7.25(ddd,1H,J=1 1.9,7.7 and 2.3), 7,39(dt, 1H, J=10.8 and 8.4), 8.2 3(s, 1H ), 9.89(t,1H,J=6. 0),12.06(br s,1H) VIII -gg 〇CC^0H 1.25-1.50(m, 4H), 1.57Ί.7 0(m, 4H), 2.67 -2.77(m, 2H ), 2·85·2·95(ιη, 2H), 3.60(s, 2H), 5.48(s, 2H), 7.12-7. 26(m, 4H), 7.72 (dd, 1H, J = 2.4, 8.4), 8.19 (d, 1H, J = 2.1), 8.23 (d, 1H, J = 8.4), 8 • 38 (s, 1H), 12.47 (s, 1H) VIII - hh ocx &gt ;, n 〇&quot;a; 1.26-1.50(m,4H), 1.55-1.7 3(m, 4H), 2.66*2.78(m, 2H ), 2.83-2.95(m, 2H), 3,6〇 ( s , 2H), 5.46(s, 2H), 6.96(m ,1H), 7.26-7.48(m, 2H), 7 • 72(dd,1H, J=2.4, 8.4), 8. 19(d, 1H , J = 2.4), 8.23(d, 1H, J=8.4), 8.37(s, 1H), 1 2.43(s, lH), 12.44(br s, 1H) VIII —i i 0[〇]0 OCC Bu. H &quot;cc 1.20*2.20(m, 12H), 2.60-2. 95(m, 4H), 2,86(s, 2H), 3 •48(t' 2H, J=10.5), 3·60· 3. 75(m,2H),5,30-5.55(m, 2 H), 6.82-7.48(m, 2H), 8.2 0(s, 1H), 9.98(s, 1H) -93- .200835692 ( Industrial Applicability) It has been found that a method for producing an important intermediate of 2-pyridone-3-amine-methyl hydrazino derivative having excellent cannabinoid receptor agonist activity in a simple, high-yield and high-purity manner is further found. A process for producing a 2-pyridone-3-aminecarbamyl derivative in high yield and high purity using this important intermediate. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] A powder X-ray diffraction pattern of a compound (Π-a) obtained in Example 1 and its peak enthalpy. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 0, unit: degree). [Fig. 2] A powder X-ray diffraction pattern of the compound (ΙΙ-b) obtained in Example 2 and its peak enthalpy. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 0, unit: degree). [Fig. 3] A powder X-ray diffraction pattern of the compound (11-c) obtained in Example 3 and its peak enthalpy. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 (9, unit: degree). [Fig. 4] The powder of the compound (Π-d) obtained in Example 4 is X-ray® diffraction pattern. And its peak value. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 Θ, unit: degree). [Fig. 5] Powder X-ray of the compound (Π-e) obtained in Example 5 Diffraction pattern and its peak 値. The vertical axis is the intensity (unit: cps) 'The horizontal axis is the diffraction angle (20, unit: degree). [Fig. 6] The compound obtained in Example 6 (Π-0 crystal powder) X-ray diffraction pattern and its peak 値. The vertical axis is the intensity 'horizontal axis is the diffraction angle (2 Θ, unit: degree). -94- 200835692 [Fig. 7] The compound (π-g) crystal obtained in Example 7 The powder enthalpy diffraction pattern and its peak 値. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (20, unit: degree). ' [Fig. 8] The powder of the compound (nh) obtained in Example 8 is X. The line diffraction pattern and its peak 値. The vertical axis is the intensity 'the horizontal axis is the diffraction angle (20, unit: degree). [Fig. 9] The compound obtained in Example 9 (Π-i) is crystallized. The powder X-ray diffraction pattern and its peak 値. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (20, single β position: degree). [Fig. 10] The compound (ΙΙ-j) obtained in Example 10 is crystallized. Powder X-ray diffraction pattern and its peak 値. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (20, unit: degree). [Fig. 11] The powder of the compound (VIII-a) obtained in Example 11 is X. The line diffraction pattern and its peak 値. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (20, unit: degree). [Fig. 12] Crystallization of the compound (VIII-b) obtained in Example 12 The powder X ® line diffraction pattern and its peak 値. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 Θ, unit: degree). [Fig. 13] The compound obtained in Example 13 (VIII) -c) crystallization of the powder X-ray diffraction pattern and its peak 値. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (20, unit: degree). [Fig. 14] The compound obtained in Example 14 (VIII-d) Crystalline powder X-ray diffraction pattern and its peak 値. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2 (9, unit: degree) -95-200835692 [Fig. 15] The powder χ diffraction pattern of the compound (Vlll-e) obtained in Example 15 and its peak 値. The vertical axis is the intensity (unit: cps), and the horizontal axis is the diffraction angle (2). 0, unit: degree) [Fig. 16] The powder of the compound (VIII-f) obtained in Example 16 is a ruthenium diffraction pattern and its peak 値. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (20). Unit: degree) [Fig. 17] The powder of the compound (VIII-g) obtained in Example 17 was a ruthenium diffraction pattern and its peak. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (2 θ, unit: degree). [Fig. 18] A powder entangled pattern of the compound (VIII_h) obtained in Example 18 and its peak enthalpy. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (2|9, unit: degree). [Fig. 19] The powder of the compound (vill-i) obtained in Example 19 was a ruthenium diffraction pattern and its peak. The vertical axis is the intensity, and the horizontal axis is the diffraction angle (20, unit: degree). [Fig. 20] Example 2 χ The obtained compound (νηΜ) crystal powder χ line diffraction pattern and its peak 値. The vertical axis is the intensity and the horizontal axis is the diffraction angle (2 Θ in degrees). -96-

Claims (1)

200835692 十、申請專利範圍: 1. 一種化合物之製法,包括如下工程: 工程A :水解如下式(I)化合物: R4200835692 X. Patent application scope: 1. A method for preparing a compound, including the following works: Engineering A: Hydrolysis of a compound of the following formula (I): R4 R1R1 (式中R1爲可有非反應性取代基取代之烷基、可有非反 應性取代基取代之烯基、或可有非反應性取代基取代之炔 基; R2及R3各自獨立爲烷基、院氧烷基、或烷氧基;或 R2及R3可與鄰接之碳原子一起形成環烯; R4爲氫原子或羥基; R5爲院基),及 工程B :於工程A生成之式(I)化合物之水解物添加醇’ 而得如下式(II)化合物: R4(wherein R1 is an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkynyl group which may be substituted with a non-reactive substituent; R2 and R3 are each independently an alkyl group Or alkoxy, or alkoxy; or R2 and R3 may form a cycloolefin together with an adjacent carbon atom; R4 is a hydrogen atom or a hydroxyl group; R5 is a hospital base), and Engineering B: a formula generated in Engineering A ( I) The hydrolyzate of the compound is added with an alcohol' to obtain a compound of the following formula (II): R4 I R1 (式中R1、R2、R3、及R4同前述意義)。 2. 如申請專利範圍第1項之製法,其中工程A及工程B係連 續施行。 3. 如申請專利範圍第1或2項之製法,其中包括: 工程C :將如下式(III)化合物: r1-nh2 (III) (式中R1如申請專利範圍第1項所定義),與如•下式(IV) -97- 200835692 化合物反應: R2^YR3 (iv) ο (式中R2及R3如申請專利範圍第1項所定義 &gt; 及 工程D :將於工程C生成之化合物,跑加 、如下式(V)化合 物反應: R60、/R4 T (V) R5OOC^COOR5 (式中R4及R5如申請專利範圍第1項所定義;^爲太完 基),而得如下式(I)化合物: R4I R1 (wherein R1, R2, R3, and R4 have the same meanings as defined above). 2. For the application of the first paragraph of the patent scope, Project A and Project B are continuously implemented. 3. For the preparation of the patent scope 1 or 2, including: Engineering C: a compound of the following formula (III): r1-nh2 (III) (wherein R1 is as defined in claim 1), and For example, the following formula (IV) -97- 200835692 Compound reaction: R2^YR3 (iv) ο (wherein R2 and R3 are as defined in claim 1 of the patent application &gt; and Engineering D: a compound to be produced in Engineering C, Run the reaction of the compound of the following formula (V): R60, /R4 T (V) R5OOC^COOR5 (wherein R4 and R5 are as defined in the first item of the patent application; ^ is too complete), and the following formula is obtained ( I) Compound: R4 XOOR5 (I) (式中R1、V、V、R、及V如申請專利範圍第丨項所 定義)。 4. 一種化合物之製法,包括: 工程C :將如下式(III)化合物: R1-NH2 (III) (式中R1如申請專利範圍第1項所定義),與如下式(IV)化合 物反應: R2)R3 ㈣ (式中R2及R3如申請專利範圍第1項所定義), 工程D :將工程C生成之化合物,與如下式(v)化合物反應: R〇 X (V) r5o〇c&quot;^c〇or5 (式中R4及R5如申請專利範圍第1項所定義;R6如申請專利 -98- 200835692 範圍第3項所定義),而生成如下式(I)化合物:XOOR5 (I) (where R1, V, V, R, and V are as defined in the scope of the patent application). 4. A process for the preparation of a compound comprising: Engineering C: a compound of the formula (III): R1-NH2 (III) (wherein R1 is as defined in claim 1) and reacted with a compound of the formula (IV): R2) R3 (iv) (wherein R2 and R3 are as defined in claim 1), and engineering D: reacting a compound produced by engineering C with a compound of the following formula (v): R〇X (V) r5o〇c&quot; ^c〇or5 (wherein R4 and R5 are as defined in claim 1; R6 is as defined in claim 3 of the scope of the patent-98-200835692), and a compound of the following formula (I) is formed: (式中R1、R2、R3、R4、及R5如申請專利範圍第1項所定義) 工程A :將式(I)化合物水解, 工程B ··於工程A生成之式(I)化合物之水解物添加醇,而得(wherein R1, R2, R3, R4, and R5 are as defined in claim 1 of the patent application) Engineering A: Hydrolysis of a compound of formula (I), Engineering B · Hydrolysis of a compound of formula (I) produced in Engineering A Adding alcohol, and getting 如下(II)化合物:The following compound (II): (式中R1、R2、R3、及R4如申請專利範圍第1項所定義), 工程E :將所得式(II)化合物與鹵化試藥反應,而生成如 (VI)化合物: R4 Ο(wherein R1, R2, R3, and R4 are as defined in claim 1 of the patent application), Process E: reacting the obtained compound of the formula (II) with a halogenated reagent to form a compound of the formula (VI): R4 Ο R1 HalR1 Hal (VI) (式中R1、R2、R3、及R4如申請專利範圍第1項所定義;Hal 爲鹵原子),及 工程F :將所得式(VI)化合物,與如下式(VII)化合物反應: h2n-x-y-coor7(vii) (式中R7爲氫原子或院基; X爲可有雜原子介在而可有非反應性取代基取代之伸烷基、 可有雜原子介在而可有非反應性取代基取代之伸烯基、可 -99- 200835692 有雜原子介在而可有非反應性取代基取代之伸炔基、可有 非反應性取代基取代之環烷二基、可有非反應性取代基取 代之環烯二基、可有非反應性取代基取代之芳二基、可有 非反應性取代基取代之雜芳二基、或可有非反應性取代基 取代之非芳香族雜環二基;及 γ爲單鍵、可有非反應性取代基取代之伸烷基、可有非反應 性取代基取代之伸烯基、或可有非反應性取代基取代之伸 炔基), 必要時予以水解反應,而得如下式(VIII)化合物:(VI) (wherein R1, R2, R3, and R4 are as defined in claim 1; Hal is a halogen atom), and Engineering F: reacting the obtained compound of the formula (VI) with a compound of the following formula (VII) : h2n-xy-coor7(vii) (wherein R7 is a hydrogen atom or a deutero group; X is an alkylene group which may have a hetero atom and may have a non-reactive substituent, may have a hetero atom or may be a reactive substituent substituted alkenyl group, may be -99-200835692 having an alkyne group which may be substituted with a non-reactive substituent, a cycloalkanediyl group which may have a non-reactive substituent, or a non-reactive a reactive substituent-substituted cycloalkenyldiyl group, an aryldiyl group which may be substituted with a non-reactive substituent, a heteroaryldiyl group which may be substituted with a non-reactive substituent, or a non-aromatic which may be substituted with a non-reactive substituent a heterocyclic diyl group; and γ is a single bond, an alkyl group which may be substituted with a non-reactive substituent, an alkenyl group which may be substituted with a non-reactive substituent, or an alkyne which may be substituted with a non-reactive substituent Base), if necessary, hydrolyzed to give a compound of formula (VIII): (式中R1、R2、R3、及R4如申請專利範圍第1項所定義;R7 、又、及丫與上述同意義)。 5. 如申請專利範圍第3或4項之製法,其中連續施行工程C 、D、A、及 B 〇 6. 如申請專利範圍第1至5項中任一項之製法,其中式(Π)化 合物以結晶獲得。 7. 如申請專利範圍第1至6項中任一項之製法,其中R1爲可 有非反應性取代基取代之烷基,R2爲C卜C2烷基’ R3爲 C1-C3烷基,R4爲氫原子,及R5爲C1-C2烷基。 8 ·如申請專利範圍第1至6項中任一項之製法,其中R1爲可 有非反應性取代基取代之烷基,R2及R3與鄰接之碳原子一 起形成環辛烯,R4爲氫原子,及R5爲C卜C2烷基。 9·如申請專利範圍第7或8項之製法,其中添加之醇爲異丙 -100- 200835692 醇。 10.—種如下式(II)化合物之結晶之製法(wherein R1, R2, R3, and R4 are as defined in item 1 of the patent application; R7, 、, and 丫 have the same meaning as above). 5. For the application of the third or fourth method of the patent scope, the continuous implementation of the works C, D, A, and B 〇 6. For the production method of any one of the patent scopes 1 to 5, where (Π) The compound is obtained by crystallization. 7. The process according to any one of claims 1 to 6, wherein R1 is an alkyl group which may be substituted with a non-reactive substituent, R2 is a C-C2 alkyl group, and R3 is a C1-C3 alkyl group, R4 It is a hydrogen atom, and R5 is a C1-C2 alkyl group. The method of any one of claims 1 to 6, wherein R1 is an alkyl group which may be substituted with a non-reactive substituent, and R2 and R3 together with adjacent carbon atoms form a cyclooctene, and R4 is hydrogen. Atom, and R5 is C-C2 alkyl. 9. The method of claim 7 or 8, wherein the alcohol added is isopropyl-100-200835692 alcohol. 10. A method for preparing a crystal of a compound of the following formula (II) (式中R1、R2、R3、及R4如申請專利範圍第1項所定義) ,其特徵爲於含有式(II)化合物之溶液添加醇。 1 1.如申請專利範圍第1 0項之製法,其中醇爲異丙醇。(wherein R1, R2, R3, and R4 are as defined in claim 1 of the patent application), characterized in that an alcohol is added to a solution containing the compound of the formula (II). 1 1. The method of claim 10, wherein the alcohol is isopropanol. -101 --101 -
TW96150437A 2006-12-27 2007-12-27 Process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives TWI414524B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006351281 2006-12-27

Publications (2)

Publication Number Publication Date
TW200835692A true TW200835692A (en) 2008-09-01
TWI414524B TWI414524B (en) 2013-11-11

Family

ID=39608567

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96150437A TWI414524B (en) 2006-12-27 2007-12-27 Process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives

Country Status (5)

Country Link
JP (1) JP5252498B2 (en)
CN (1) CN101668744A (en)
MX (1) MX2009006814A (en)
TW (1) TWI414524B (en)
WO (1) WO2008084671A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BRPI1015259A2 (en) * 2009-04-27 2016-05-03 Elan Pharm Inc alpha-4 integrin pyridinone antagonists

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100828982B1 (en) * 2000-12-28 2008-05-14 시오노기세이야쿠가부시키가이샤 Pyridone derivative having affinity for cannabinoid 2-type receptor
BRPI0507180A (en) * 2004-01-29 2007-06-26 Pfizer 1-Isopropyl-2-oxo-1,2-dihydropyridine-3-carboxamide derivatives having 5-ht4 receptor agonistic activity
TWI360539B (en) * 2004-10-28 2012-03-21 Shionogi & Co 3-carbamoyl-2-pyridone derivatives

Also Published As

Publication number Publication date
JP5252498B2 (en) 2013-07-31
CN101668744A (en) 2010-03-10
WO2008084671A1 (en) 2008-07-17
JPWO2008084671A1 (en) 2010-04-30
MX2009006814A (en) 2009-07-02
TWI414524B (en) 2013-11-11

Similar Documents

Publication Publication Date Title
TWI510451B (en) Manufacturing method for compounds having hiv integrase inhibitory activities
US8034950B2 (en) Processes for the facile synthesis of diaryl amines and analogues thereof
TW200526635A (en) Hydroxypyrimidinone derivative having HIV integrase inhibitory activity
WO1998057934A1 (en) (AMIDINO)6-MEMBERED AROMATICS AS FACTOR Xa INHIBITORS
WO2007010964A1 (en) Indole derivative having pgd2 receptor antagonist activity
JP2006517235A5 (en)
TWI280239B (en) Process for preparation of pyridine derivatives
AU2007211789A1 (en) Viral polymerase inhibitors
CN107709298A (en) Spiral shell [indoline of cyclobutane 1,3 &#39;] 2 &#39; ketone derivatives as bromine domain inhibitor
EP4037670A1 (en) 5-fluoronicotinamide derivatives and uses thereof
US8222282B2 (en) Sulfonate salts of 2-amino-3-carbethoxyamino-6-(4-fluoro-benzylamino)-pyridine
JP5610599B2 (en) Method for producing N-phenyl-N&#39;-phenylsulfonylpiperazine derivative
WO2009011627A1 (en) Pyridine compounds and their use as p2y12 antagonists
CA3081558A1 (en) Anti-infective heterocyclic compounds and uses thereof
TW200835692A (en) Process for preparing 1-substituted-2-pyridone-3-carboxylic acid derivatives
TWI466872B (en) A process for preparing quinazoline derivatives
TWI545114B (en) Process for preparing biphenyl imidazole compounds
ES2670677T3 (en) Manufacturing process of 5-chloromethyl-2,3-dicarboxylic anhydride
JP2005035933A (en) Method for producing nitrogen-containing condensed heterocyclic compound
JP5740042B2 (en) Compound, method for producing compound, and method for purifying compound
KR20230117416A (en) Methods for synthesizing aminopyrimidine-based FAK inhibitor compounds
JP6009851B2 (en) Method for producing 1H-tetrazole derivative
CN116874468A (en) Synthesis and application of small molecular compound with 2-pyridine substituted formamide structure
TW201036953A (en) Processes for making isoxazoline derivatives
TW201540713A (en) Piperidine derivatives as orexin receptor antagonist

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees