TW200833598A - Process for manufacturing ordered nano-particles - Google Patents

Process for manufacturing ordered nano-particles

Info

Publication number
TW200833598A
TW200833598A TW96104181A TW96104181A TW200833598A TW 200833598 A TW200833598 A TW 200833598A TW 96104181 A TW96104181 A TW 96104181A TW 96104181 A TW96104181 A TW 96104181A TW 200833598 A TW200833598 A TW 200833598A
Authority
TW
Taiwan
Prior art keywords
nano
material layer
particles
particle material
holes
Prior art date
Application number
TW96104181A
Other languages
Chinese (zh)
Other versions
TWI333935B (en
Inventor
Yung-Chun Lee
Chuan-Pu Liu
Fei-Bin Hsiao
Chun-Hung Chen
Cheng-Yu Chiu
Chicheng Chiu
Original Assignee
Univ Nat Cheng Kung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Cheng Kung filed Critical Univ Nat Cheng Kung
Priority to TW96104181A priority Critical patent/TWI333935B/en
Publication of TW200833598A publication Critical patent/TW200833598A/en
Application granted granted Critical
Publication of TWI333935B publication Critical patent/TWI333935B/en

Links

Landscapes

  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

A process for manufacturing ordered nano-particles, comprising: providing a mold including a first surface and a second surface on opposite sides, wherein the mold comprises a pattern structure comprising a plurality of holes and a plurality of mesas between the holes; forming a nano-particle material layer to cover the first surface of the mold to make the nano-particle material layer exist in the holes; providing a substrate including a first surface and a second surface on opposite sides; deposing the substrate onto the nano-particle material layer to make the first surface of the substrate connect with the nano-particle material layer on the mesas; performing a thermal treatment to make the nano-particle material layer within the holes form a plurality of nano-particles each of which is located in each hole; and removing the substrate.
TW96104181A 2007-02-05 2007-02-05 Method for manufacturing ordered nano-particles TWI333935B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW96104181A TWI333935B (en) 2007-02-05 2007-02-05 Method for manufacturing ordered nano-particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW96104181A TWI333935B (en) 2007-02-05 2007-02-05 Method for manufacturing ordered nano-particles

Publications (2)

Publication Number Publication Date
TW200833598A true TW200833598A (en) 2008-08-16
TWI333935B TWI333935B (en) 2010-12-01

Family

ID=44209624

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96104181A TWI333935B (en) 2007-02-05 2007-02-05 Method for manufacturing ordered nano-particles

Country Status (1)

Country Link
TW (1) TWI333935B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8841147B2 (en) 2012-03-28 2014-09-23 Tsinghua University Method for making light emitting diode
TWI478210B (en) * 2011-07-01 2015-03-21 Univ Nat Cheng Kung Photomask
US9048347B2 (en) 2012-03-28 2015-06-02 Tsinghua University Epitaxial structure including carbon nanotube layer in grooves
TWI553907B (en) * 2012-03-28 2016-10-11 鴻海精密工業股份有限公司 Method for making epitaxial base
US9570292B2 (en) 2012-03-28 2017-02-14 Tsinghua University Method for making an epitaxial structure with carbon nanotube layer
US9613802B2 (en) 2012-03-28 2017-04-04 Tsinghua University Method for making epitaxial structure
US9773664B2 (en) 2012-03-28 2017-09-26 Tsinghua University Epitaxial base

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI478210B (en) * 2011-07-01 2015-03-21 Univ Nat Cheng Kung Photomask
US8841147B2 (en) 2012-03-28 2014-09-23 Tsinghua University Method for making light emitting diode
US9048347B2 (en) 2012-03-28 2015-06-02 Tsinghua University Epitaxial structure including carbon nanotube layer in grooves
TWI553907B (en) * 2012-03-28 2016-10-11 鴻海精密工業股份有限公司 Method for making epitaxial base
US9570293B2 (en) 2012-03-28 2017-02-14 Tsinghua University Method for making epitaxial base
US9570292B2 (en) 2012-03-28 2017-02-14 Tsinghua University Method for making an epitaxial structure with carbon nanotube layer
US9613802B2 (en) 2012-03-28 2017-04-04 Tsinghua University Method for making epitaxial structure
US9773664B2 (en) 2012-03-28 2017-09-26 Tsinghua University Epitaxial base

Also Published As

Publication number Publication date
TWI333935B (en) 2010-12-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees