TW200825824A - Method for checking design rule of layout and computer readable recording medium for storing program thereof - Google Patents

Method for checking design rule of layout and computer readable recording medium for storing program thereof Download PDF

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Publication number
TW200825824A
TW200825824A TW95145959A TW95145959A TW200825824A TW 200825824 A TW200825824 A TW 200825824A TW 95145959 A TW95145959 A TW 95145959A TW 95145959 A TW95145959 A TW 95145959A TW 200825824 A TW200825824 A TW 200825824A
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layer
layout
graphic
flag
layers
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TW95145959A
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Chinese (zh)
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TWI321742B (en
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Chung-Chih Chang
Chien-Chih Kuo
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United Microelectronics Corp
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Abstract

A method for checking a design rule of layout and a computer readable recording medium for storing program thereof are provided. A layout comprising a plurality of layers is united so as to generate a flag layer to check the layout, through which any information about characters in the layout can be identified. Characters in the layout can be used in general command file to inspect the checking of the design rule for the purpose of saving time and manual effort.

Description

200825824 UMCD-2005-0072 19631twf.doc/n 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種佈局圖設計規則檢查的方法,且 特別是有關於一種依據佈局圖内之圖層特性以進行審視佈 局圖設計規則的方法。 【先前技術】 在半導體晶片的設計與開發中,設計規則檢查(Design rule check,DRC)是一可審視半導體整合電路是否有遵循 拓樸佈局規則(topologicallay out rules,TLR)的程序。其中 拓樸佈局規則將會依據各製程技術以及晶圓廠間儀器限制 的不同而有其獨特之規則。 請參閱圖1,其為檢查半導體整合電路是否符合設計 規則之審視方法的傳統流程圖。其步驟如下: 口 •首先,如步驟110所示,提供一個包含了數個m厗日 步驟12〇所示,以人工的方式依據200825824 UMCD-2005-0072 19631twf.doc/n IX. Description of the Invention: [Technical Field] The present invention relates to a method for checking layout rule design rules, and in particular to a layer property according to a layout diagram To review the layout design rules. [Prior Art] In the design and development of semiconductor wafers, Design Rule Check (DRC) is a program that examines whether semiconductor integrated circuits follow topological lay out rules (TLRs). The topology rules will have unique rules depending on the process technology and the limitations of the instrumentation between the fabs. Please refer to FIG. 1, which is a conventional flow chart for examining whether the semiconductor integrated circuit conforms to the design method of the design rule. The steps are as follows: Port • First, as shown in step 110, provide one that contains several m厗 days, as shown in step 12〇, manually

衣矛王技術、晶圓廠條件、以及日H 之拓樸佈局酬。接著如步驟同決定相對應 抬樸佈局規則,從-事先準備好^—⑽決定之 資料庫140中取出相對應的命令梓了 =(隱mand file) 命令擋利用設計規則檢查U對二=驟15°則是依據此 其過程中發現之任何設計 局圖進行審視與檢查。 中。 —於檢查結果⑽ 200825824 UMCD-2005-0072 19631 twf.doc/n 就傳統的設計規騎錢程㈣, 種製程技術設計不同的命令槽備用。且由於目前戶 計規則檢查工具都無法提供某一 3 目和所有的汉 的資訊,故必須使用人工的方式以==! 因大小的㈣去選擇相對應之命讀。益論是命人二 資=庫抑或是根據晶片的特性從命令财料庫中選擇= ΪΪ式來進仃設計規則檢查,都將耗費相當大的時間進而The technology of the Spear King, the conditions of the fab, and the top layout of the H. Then, if the step is the same as the decision, the layout rule is correspondingly removed, and the corresponding command is taken from the database 140 determined in advance - (10). = (hidden mand file) The command block uses the design rule to check the U pair 2 = 15° is examined and inspected based on any design maps found during this process. in. - Check the results (10) 200825824 UMCD-2005-0072 19631 twf.doc/n On the traditional design rules riding (4), the process technology is designed with different command slots. Moreover, since the current household rule checking tool cannot provide information of a certain 3 heads and all the Chinese, it is necessary to manually select the corresponding life reading by the size of (4). It is a matter of life or money, or it is necessary to select a design rule from the command library according to the characteristics of the chip, and it will take a considerable amount of time.

影響整個ic設計的流程。 【發明内容】 有鑑於此,本發明的目的就是提供一種佈局圖設計規 則檢查之方法’能找出某—佈局圖的特性再依其特性進 設計規則檢查。 本發明的再-目的是提供一種電腦可讀取記錄媒體, 由此紀錄媒體找出欲檢查之佈局圖特性,並依此特性進行 設計規則檢查。 本發明的又一目的是提供一種佈局圖設計規則檢查之 方法,檢查圖層並將之與旗標層比較,及依照旗標層圖形 之尺寸據以進行一鑑定規則(identified ruie)。 基於上述及其他目的,本發明提出一種佈局圖設計規 則檢查之方法,用以審視一佈局圖是否符合設計規則。本 發明之佈局圖設計規則檢查方法包括了一個具有多數圖層 的佈局圖、將此佈局圖中的部分或全部圖層進行聯集所得 到的旗標層、以及根據旗標層來檢查此佈局圖。 5 200825824 UMCD-2005-0072 19631twf.doc/n 依照本發明的較佳實施例所述佈局圖設計規則檢查之 方法,其中若某一圖層與旗標層相比較之結果為空集合, 則代表此圖層不存在於佈局圖中。反之若比較得到之結果 為非空集合,則表示此圖層存在於佈局圖内。這些存在的 圖層中,位於隶上方的圖層即是該佈局圖之最上圖層,其 餘的存在圖層則稱作内部圖層。設計規則檢查分別將以不 同的規則檢查最上圖層與内部圖層是否違反設計規則。 依照本發明的較佳實施例所述佈局圖設計規則檢查之 方法,將佈局圖與旗標層相比較,來判別此佈局圖之最上 圖層其第一步驟是設定圖形T〇PMn等於此佈局圖内最大 圖層數的圖形。第二步驟是檢查若旗標層BULK和圖形 TOPMN&無交集,則設定圖形N0JV[N_BULK為旗標層 BULK的圖形,反之則設定n〇_MnJBULK為空集合。第 三步驟是由上而下逐一檢查此佈局圖各個圖層,若此佈局 圖中第i層之圖層MEi與圖形NO_Mi+1_BULK有交集,則 設定圖形TOPMi為此i層的圖形MEi,否則設定TOPMi 為空集合,於第三步驟中的i為大於〇且小於N之整數。 若圖形NOJVIi+1JBULK與圖形TOPMi沒有交集,則設定 圖形NOJ^JBULK等於NO_Mi+1JBULK,反之則設定 NOJVIi—BULK為空集合。最後一個步驟是將圖形TOPMn 〜TOPMj聯集起來以取得此佈局圖中的最上圖層之圖 形’其中j表示此佈局圖内可能成為最上圖層之圖層數的 最小值。 6 200825824 UMCD-2005-0072 19631twf.doc/n 依照本發明的較佳實施例所述佈局圖設計規則檢查之 方法,可依據旗標層與一參考尺寸的比較結果,來判定應 施行大尺寸鑑定規則(identified rule )或小尺寸鑑定規則於 此佈局圖設計規則檢查之上。 由旗標層與佈局圖兩相比較所得到的結果,將被當作 參數用於一通用命令檔中,以進行適當的設計規則檢查。 從另一觀點來看,本發明提出一種電腦可讀取記錄媒 體,可藉由在電腦泉統I執-行儲 查一佈局圖。本紀錄媒體内之程式將包括讀取包含數個圖 層之佈局圖的指令、將佈局圖内數個或全部圖層進行聯集 得到的旗標層、及根據旗標層來檢查此佈局圖是否遵循設 計規則。 依妝本發明的較佳實施例所述電腦可讀取紀錄媒體, 上述媒體巾的程式其指令包括了將佈局圖巾的圖層和旗標 層做比較,若比較結果為空集合,則代表此圖層不存在。 若和旗標層味的結果為非空集合,則表示該圖層存在於 佈局圖中:這些存在的圖層之内最上層的圖層將被視為此 佈局圖之最上@層,其餘存在的圖層則被縣内部圖層。 設計規則檢查將會依關層是否為最上圖層制不同的檢 查規則。 、、依照本發明的較佳實施例所述電腦可讀取紀錄媒體, 上述媒體巾將佈局g與旗標層械較以朗此佈局圖之最 亡圖層的第-個指妓設定圖形TQPMn料此佈局圖内 最大可能®層數的圖形。第二指令是檢查若旗標層bulk 200825824 UMCD-2005-0072 1963 ltwf.doc/n 和圖形TOPMN並無交集,則設定圖形NO_Mn_BULK為 此旗標層BULK的圖形,反之則設定NO_Mn_BULK為空 集合。第三指令是由上而下逐一檢查此佈局圖各圖層,若 此佈局圖内的第i層圖層MEi與圖形NO_Mi+1_BULK有交 集,則設定圖形TOPMi為此i層MEi的圖形,否則設定 TOPMi為空集合,於此步驟中i為大於〇且小於n的整數。 形NO—Mi+1—BULK與圖形TOPMi沒有交集,則設定 等於NO—Mi+1—BULK,反之則設定 NO一Mi—BULK為空集合。最後一個指令是將圖形t〇PMn 〜TOPMj相聯集以取得此佈局圖中最上圖層之圖形,其中 j表不佈局圖内可能成為最上圖層之圖層數的最小值。The process that affects the entire ic design. SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a method for inspecting a layout design rule that can find out the characteristics of a certain layout picture and then enter the design rule check according to its characteristics. A further object of the present invention is to provide a computer readable recording medium whereby the recording medium finds the layout characteristics to be inspected and performs design rule checking in accordance with this characteristic. It is still another object of the present invention to provide a method for inspecting a layout design rule, inspecting a layer and comparing it to a flag layer, and performing an identification rule based on the size of the flag layer pattern. Based on the above and other objects, the present invention provides a method for checking the layout design rules to examine whether a layout conforms to design rules. The layout design rule checking method of the present invention includes a layout map having a plurality of layers, a flag layer obtained by combining some or all of the layers in the layout map, and checking the layout map according to the flag layer. 5 200825824 UMCD-2005-0072 19631 twf.doc/n A method for checking a layout design rule according to a preferred embodiment of the present invention, wherein if a layer is compared to a flag layer and the result is an empty set, it represents The layer does not exist in the layout. On the other hand, if the result of the comparison is a non-empty set, it means that the layer exists in the layout. Among the existing layers, the layer above the top is the top layer of the layout, and the remaining layers are called internal layers. The design rule check will check whether the top and inner layers violate the design rules with different rules. According to a preferred embodiment of the present invention, the layout pattern design rule checking method compares the layout map with the flag layer to determine the top layer of the layout map. The first step is to set the graphic T〇PMn equal to the layout image. The graph of the maximum number of layers within. The second step is to check if the flag layer BULK and the pattern TOPMN& have no intersection, then set the pattern N0JV [N_BULK is the flag layer BULK pattern, otherwise set n〇_MnJBULK to be an empty set. The third step is to check each layer of the layout map one by one from top to bottom. If the layer MEi of the i-th layer in the layout has an intersection with the graphic NO_Mi+1_BULK, set the graphic TOPMi to the graphic MEi of the i layer, otherwise set the TOPMi For an empty set, i in the third step is an integer greater than 〇 and less than N. If the graphic NOJVIi+1JBULK does not intersect with the graphic TOPMi, the graphic NOJ^JBULK is set equal to NO_Mi+1JBULK, otherwise the NOJVIi-BULK is set to an empty set. The final step is to combine the graphs TOPMn to TOPMj to obtain the top layer of the layout graph, where j represents the minimum number of layers in the layout that may be the top layer. 6 200825824 UMCD-2005-0072 19631twf.doc/n The method for checking the layout design rule according to the preferred embodiment of the present invention can determine the large-scale identification according to the comparison result between the flag layer and a reference size. The identified rule or small size identification rule is above this layout design rule check. The results obtained by comparing the flag layer with the layout map will be used as parameters in a general command file for proper design rule checking. From another point of view, the present invention proposes a computer readable recording medium which can be stored by a computer in a computer. The program in this recording medium will include an instruction to read a layout map containing several layers, a flag layer obtained by combining several or all layers in the layout map, and checking whether the layout map is followed according to the flag layer. Design rules. According to a preferred embodiment of the present invention, the computer can read the recording medium, and the program of the media towel includes instructions for comparing the layer of the layout towel with the flag layer, and if the comparison result is an empty set, the representative The layer does not exist. If the result of the flag layering is a non-empty set, it means that the layer exists in the layout: the top layer in the existing layer will be regarded as the top @ layer of the layout, and the remaining layers will be It is the inner layer of the prefecture. The design rule check will depend on whether the layer is the top layer and different inspection rules. According to a preferred embodiment of the present invention, the computer can read the recording medium, and the media towel sets the layout G and the flag layer to the first fingerprint of the most dead layer of the layout map. The largest possible number of layers in this layout. The second instruction is to check if the flag layer bulk 200825824 UMCD-2005-0072 1963 ltwf.doc/n and the graphic TOPMN do not intersect, then set the pattern NO_Mn_BULK as the pattern of the flag layer BULK, otherwise set NO_Mn_BULK to be an empty set. The third instruction is to inspect the layers of the layout map one by one from top to bottom. If the i-th layer layer MEi in the layout map has an intersection with the graphic NO_Mi+1_BULK, the graphic TOPMi is set as the graphic of the i-layer MEi, otherwise the TOPMi is set. An empty set, in this step i is an integer greater than 〇 and less than n. If the shape NO-Mi+1-BULK does not intersect with the graphic TOPMi, the setting is equal to NO-Mi+1-BULK, otherwise the NO-Mi-BULK is set to an empty set. The last instruction is to associate the graphs t〇PMn~TOPMj to obtain the graph of the top layer in the layout graph, where j is the minimum value of the number of layers in the layout that may become the top layer.

依照本發明的較佳實施例所述電腦可讀取紀錄媒體, 上述之媒體中的程式指令也包括了將旗㈣_融一 IAccording to a preferred embodiment of the present invention, the computer can read the recording medium, and the program instructions in the above media also include the flag (4)_融一I

錄媒體中的程式藉由比較佈局圖以及旗標 數,並將參數用於命令檔中以進行設計規 層得到所需的參數, 則檢查。The program in the recorded media checks by comparing the layout and the number of flags and using the parameters in the command file to make the design parameters to obtain the required parameters.

將此些圖層與旗標層進行比健檢查此些 8 200825824 UMCD-2005-0072 19631twf.doc/n 圖層、以及比較此旗標層的圖形尺寸與一參考尺寸,以施 行鑑定規則。 / 依照本發明的較佳實施例所述佈局圖設計規則檢查之 方法,其中比較此些圖層與此旗標層並且檢查此些圖層的 步驟包括了分別將佈局圖内的圖層與旗標層比較,若比較 結果為空集合,則表示此圖層不存在於佈局圖中。在所有 ,在於佈局圖内的圖層之中,最上層的被稱為此佈局圖的 最上圖層,其餘圖層則被稱為内部圖層。最上層規則檢查 將被使用於最上圖層的設計規則檢查,而内部規則檢查則 被用來檢查佈局圖内的内部圖層。 本發明因採用一種佈局圖設計規則檢查方法,其根據 佈局圖產生之旗標層得到此佈局圖之特性,再依其内容特 性自行產生適當的參數,用於一個通用的命令檔中以進行 設1檢查。此方法將不再需要根據不同的製程技術或是晶 片特性等條件,以人工方式選擇設計規則檢查所要用的命 令檔來進行設計規則檢查之審視。 ▲為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂,下文特舉較佳實施例,並配合所附圖式, 說 明如下。 ' 【實施方式】 二施例 圖2疋依照本發明較佳實施例所繪示的佈局圖設計規 則檢查方法之流程圖。如圖2所示,本方法主要是利用一 佈局圖設計規則檢查方法及一通用之命令檔24〇,對一個 200825824 UMCD-2005-0072 1963 ltwf.doc/n 例如為總體分佈系統(glGbal distribmiQn system,以 稱GDS)格式之佈局騎行設計規驗查㈣,並且 規則檢查之結果260。 首先’如步驟210所示,提供一佈局圖,射此佈局 含了多數_層。於本實_巾,此佈局 格式之檔案。 圖之部分或全部圖層 layer)。本例是將 稱之為BULK的旗標 第二,如步驟220所示將此佈局 進行聯集,以獲得一個旗標層(Hag 此佈局圖内的全部圖層聯集以得到一 層0 如芡驟230所示,依據此旗標層 本佈局圖 其中’可依據使用者之需要’而於步驟230中進行 ,檢查項目。制者可以將欲檢查項目之命令事先寫入通 =之命令樓。圖3所示為依照本發明實施舰明步驟⑽ 中之子步驟流程圖。請參照圖3。如步驟所示, 將此佈局圖之此些圖層與此旗標層進行比較。若此些 中之某-®層與此旗標層之比較結果為空集合,則曰 ,層為空層(步驟320);若此些圖層中之某—圖層邀 旗標層之比憾果非輕集合’跡味結果為非空2 的該些圖層之中’最上層的圖層稱之為該佈局圖的最= 層’其他存在且並非最上圖層的_収該佈局圖D 圖層(步驟33G)。依據比較之結果,將以一最上層規則 200825824 UMCD-2005-0072 19631twf.doc/n 檢查此佈局圖的最上圖層(步驟340),並且以—内部層 規則檢查該佈局圖的内部圖層(步驟350)。 曰 請參閱圖3及圖4。於圖3之步驟330中,判別此佈 局圖之最上圖層的詳細方法如下:首先,設定圖形T〇pM\ 等於此佈局圖中之第N圖層之圖形MEN,其中N為佈局 圖之最大圖層數(步驟410)。步驟420是檢查若此旗標 層BULK與圖形T〇PMn沒有產生交集,則設定圖; NO一MN—BULK等於此旗標層BULK之圖形,否則設定圖 形NO一MN—BULK為空集合。步驟430中,若該佈局圖内 第i層的圖層MEi與圖形NO一Mi+1JBULK有交集,則設定 圖形TOPMi等於該佈局圖中第i層之圖層的圖形MEi,否 則a又疋圖形TOPM{為空集合。前述i為一大於〇且小於n 之整數。步驟440則是檢查若圖形NO一Mi+1—BULK與圖形 TOPMi不會產生交集,則設定圖形no一Mi一BULK等於圖 形NO—Mi+1—BULK,否則設定圖形NO—Mi—BULK為空集 合。由上述步驟產生的圖形TOPMi只有在i值並非佈局圖 内最上圖層數時才會等於此圖層i之圖形,否則將被設為 空集合。於步驟450中,聯集圖形TOPMN〜TOPMj即可 獲得此佈局圖中最上圖層之圖形,其中j表示此佈局圖中 作為最上圖層之可能範圍之最小值。 此佈局圖設計規則檢查方法中,由旗標層和佈局圖相 比較也可找出此佈局圖中非最上層的圖形。首先檢查佈局 圖中第i層的圖形MEi與NO_Mi+1J3ULK是否產生交集。 若無交集則設定圖形COMMi等於圖形MEi,若有交集則 11 200825824 UMCD-2005-0072 19631twf.doc/n 設定COMMi為空集合。COMMi的圖形不等於空集合代表 的意義是此圖形為佈局圖中非最上層的圖層i之圖形。其 中i為一大於0且小於N之整數。Compare these layers with the flag layer to check the layer size and compare the pattern size of the flag layer with a reference size to perform the authentication rule. According to a preferred embodiment of the present invention, a method for checking a layout design rule, wherein comparing the layers to the flag layer and inspecting the layers includes comparing the layers in the layout with the flag layer respectively If the comparison result is an empty collection, it means that this layer does not exist in the layout. In all, among the layers in the layout, the top layer is called the top layer of the layout, and the remaining layers are called internal layers. The top-level rule check will be used for the design rule check of the top layer, while the internal rule check is used to check the inner layer inside the layout. The invention adopts a layout drawing design rule checking method, which obtains the characteristics of the layout picture according to the flag layer generated by the layout drawing, and then generates appropriate parameters according to the content characteristics thereof, and is used in a general command file for setting. 1 check. This method eliminates the need to manually select the command file to be used to check the design rules according to different process technologies or wafer characteristics. The above and other objects, features, and advantages of the present invention will become more apparent from the understanding of the appended claims. [Embodiment] Embodiment 2 FIG. 2 is a flow chart showing a method for inspecting a layout design rule according to a preferred embodiment of the present invention. As shown in FIG. 2, the method mainly utilizes a layout design rule checking method and a general command file 24〇, for a 200825824 UMCD-2005-0072 1963 ltwf.doc/n, for example, an overall distribution system (glGbal distribmiQn system , in the format of the GDS) format riding design check (4), and the result of the rule check 260. First, as shown in step 210, a layout is provided, which has a majority of layers. In this real _ towel, this layout format file. Part or all of the layer of the figure). In this example, the flag will be called BULK, and the layout is combined as shown in step 220 to obtain a flag layer (Hag all the layers in the layout map to obtain a layer 0. 230, according to the banner layer layout diagram, where 'can be based on the needs of the user' is performed in step 230, and the item can be checked. The controller can write the command to check the item in advance to the command floor of the pass =. 3 is a flow chart showing the sub-steps in the step (10) of the ship according to the present invention. Please refer to FIG. 3. As shown in the step, compare the layers of the layout with the flag layer. If the comparison between the -® layer and the flag layer is an empty set, then the layer is an empty layer (step 320); if one of the layers is a layer, the flag layer is less than the light collection. The result is that the top layer of the non-empty 2 layer is called the most layer of the layout map, and the other layer that is present and not the top layer is the map layer D layer (step 33G). , will be a top-level rule 200825824 UMCD-2005-0072 19631twf.doc/n The uppermost layer of the floor plan is checked (step 340), and the inner layer of the floor plan is checked with an internal layer rule (step 350). Please refer to FIG. 3 and FIG. 4. In step 330 of FIG. 3, the layout is discriminated. The detailed method of the uppermost layer of the figure is as follows: First, the graphic T〇pM\ is equal to the graphic MEN of the Nth layer in the layout, where N is the maximum number of layers of the layout (step 410). Step 420 is to check if If the flag layer BULK does not have an intersection with the graphic T〇PMn, the map is set; NO_MN_BULK is equal to the pattern of the flag layer BULK, otherwise the pattern NO_MN-BULK is set to be an empty set. In step 430, if If the layer MEi of the i-th layer in the layout map intersects with the pattern NO-Mi+1JBULK, the graphic TOPMi is set equal to the graphic MEi of the layer of the i-th layer in the layout image, otherwise a and the graphic TOPM{ is an empty set. An integer greater than 〇 and less than n. Step 440 is to check that if the pattern NO-Mi+1-BULK does not intersect with the graphic TOPMi, then the graph no-Mi-BULK is equal to the pattern NO-Mi+1-BULK, Otherwise, set the pattern NO_Mi-BULK to be an empty set. The generated pattern TOPMi will be equal to the pattern of the layer i only when the value of i is not the highest number of layers in the layout map, otherwise it will be set as an empty set. In step 450, the joint pattern TOPMN~TOPMj can obtain this. The graph of the top layer in the layout diagram, where j represents the minimum value of the possible range of the top layer in the layout diagram. In this layout diagram design rule checking method, the layout diagram can also be found by comparing the flag layer with the layout diagram. The top-level graph of Central Africa. First check whether the graph MEi of the i-th layer in the layout map and NO_Mi+1J3ULK intersect. If there is no intersection, the graphic COMMU is set equal to the graphic MEi, and if there is an intersection, 11 200825824 UMCD-2005-0072 19631twf.doc/n sets the COMMi to be an empty set. The meaning of COMMi's graph is not equal to that of an empty set. This is the graph of the layer i that is not the topmost layer in the layout. Where i is an integer greater than 0 and less than N.

若N為此佈局圖之最大可能圖層數。令圖形Lsiv^q 等於此佈局圖中第N-1層圖層之圖形。此佈局圖設計檢 查方法由第N-1層至第一層逐一向下檢查,若圖形c〇M]VLIf N is the maximum number of possible layers for this layout. Let the graph Lsiv^q be equal to the graph of the N-1th layer in this layout. This layout design check method is checked from the N-1th layer to the first layer one by one, if the graph c〇M]VL

1C (K為大於〇且小於N-1之整數)與圖形NOJVIk+2JBULK 產生交集,則設定LSMk等於COMMk,否則設定LSMk 為空集合。唯有對應此佈局圖内最上圖層之下一圖層匕的 圖形LSMk不會為空集合,因故聯集LSMm〜LSMi即可 獲得佈局圖中最上圖層之下一圖層的圖形。 以下將以最大可容納圖層數為11層的佈局圖為例。圖 5繪示為本發明實施例中,用於Mentor公司Calibre程式 的設計規則檢查命令檔之實例。請注意,圖5僅示出通用 命令檔之部分内容,以便於清楚說明本實施例。根據先前 所述圖2之步驟220所示,令旗標層BULK為此佈局圖中 金屬層1〜金屬層11的聯集。請參閱圖5中的命令碼區塊 51〇,若要從GDS格式的佈局圖中得知最上圖層的圖形資 訊,第一個步驟是將圖形TOPMn設為第η金屬層MEn 的圖形。接著按照圖4中的步驟420〜步驟440所述,設 定TOPMi以及NOJVti—BULK的内容,其中i為大於〇小 於11的整數。於此實施例中,假設佈局圖内之最上圖層為 弟10金屬圖層,且第1到第3層金屬層在此製程中必定存 12 200825824 UMCD-2005-0072 1963 ltwf.doc/n 之可能範圍的 在,故此佈局圖(GDS檔)中作為最上圖戶 最小值j為4。 Θ曰 請同時參閱圖4與圖5 ’按照步驟41()〜步驟45〇 執行「t〇PM11 = copyme11」指令後,圖形τ〇 被設定為並林在之第Η金屬㈣_, * 集合。由於旗標層祖Κ與第U圖層之_TOTMll^ 此為空集合)不可能產生交集,故在執行「N〇 Mu bulkIf 1C (K is an integer greater than 〇 and less than N-1) and the graph NOJVIk+2JBULK intersects, set LSMk equal to COMMk, otherwise set LSMk to be an empty set. Only the graph LSMk corresponding to the layer below the top layer in the layout graph will not be an empty set. Therefore, the LSMm~LSMi can be used to obtain the graph below the top layer in the top layer of the layout. The following will take an example of a layout that can accommodate up to 11 layers. FIG. 5 is a diagram showing an example of a design rule check command file for the Calibre program of the Mentor company according to an embodiment of the present invention. Please note that Figure 5 only shows part of the general command file to facilitate the clear description of the embodiment. The flag layer BULK is made to be a union of the metal layer 1 to the metal layer 11 in the layout as shown in step 220 of Fig. 2 previously described. Referring to the command code block 51 in FIG. 5, if the graphic information of the uppermost layer is to be known from the layout of the GDS format, the first step is to set the graphic TOPMn to the graphic of the nth metal layer MEn. Next, the contents of TOPMi and NOJVti_BULK are set as described in steps 420 to 440 of Fig. 4, where i is an integer greater than 〇 less than 11. In this embodiment, it is assumed that the uppermost layer in the layout map is the 10th metal layer, and the first to third metal layers must be stored in the process. 2008 200825824 UMCD-2005-0072 1963 ltwf.doc/n Possible range Therefore, in the layout map (GDS file), the minimum value j is 4 as the top picture. Θ曰 Please refer to Fig. 4 and Fig. 5' at the same time as step 41() to step 45〇. After executing the “t〇PM11 = copyme11” command, the graphic τ〇 is set to be the same as the Η metal (4) _, * set. Since the flag layer ancestors and the _TOTMll^ of the U layer are empty sets, it is impossible to generate an intersection, so "N〇 Mu bulk is executed.

=BULK NOT INTERACT T〇PMl i」指令後,一個不包含=BULK NOT INTERACT T〇PMl i" command, one does not contain

第11金屬層的旗標層NO_M„__BULK將被設定為BULK 金屬層,亦即第10金屬層必定會和現已被設為BULK的 圖形NO—Mn一BULK產生交集,故在執行rTOpM1〇 = ME10 INTERACTNO—Mil—BULK」指令後,TOPMl〇 將被 本身。由於本實施例中假設佈局圖内最上層金屬層為第1〇 設為圖形ME10。另外,由於NO—MuJBULK與TOPM10 之間有交集產生,故在執行「NO M10 BULK = NO—Mil—BULK NOT INTERACT TOPM10」指令後, NOJVIiBULK將被設為空集合。而在執行「TOPM9 = ME9 INTERACT NOJVI10 JBULK」指令後,第九金屬層的 圖形ME9和本例中為空集合的NO_M10_BULK並不會產生 交集,故TOPM9將被設為空集合。依此類推得到TOPM8 〜TOPM4的值。在此利用旗標層與佈局圖相比較以獲得最 上圖層的方法中,本例只有最上圖層10所對應之TOPM10 的圖形會被指定為ME1(),圖形TOPM4〜TOPM9以及 TOPMu都會被設定為空集合。將圖形TOPM4至圖形 13 200825824 UMCD-2005-0072 1963 ltwf.doc/n TOPMU進行聯集即可得到此佈局圖中作為最上圖層的圖 形。 承接上例,請參照圖5之命令碼區塊52〇。在執行 「COMMIO = (ME10 NOT INTERACT NO一Mil—BULK) NOT TOPMIO」指令後,此佈局圖中第1〇金屬層的圖形 將和圖形NO一MU—BULK發生交集,故圖形COMMi〇為空 集合;而第9金屬層和與為空集合之圖形Ν〇_Μι〇_Βυχκ ρ 並不會產生交集,故在執行「COMM9 = (ΜΕ9 NOT INTERACT NO—M10—BULK) NOT TOPM9」指令後,圖形 COMM9將被設為第9金屬層ME9之圖形。以此類推,因 此命令碼區塊520可向下推得其他各圖層是否為佈局圖中 的内部圖層。 請參照圖5之命令碼區塊540,指令「LSM10 = COPY COMM10」是設定LSM10為圖形COMM10,於本實施例是 空集合。由於圖形COMM9 (在此為ME9的圖形)將與 NO—Mu—BULK產生交集,故在執行「LSM9 = COMM9 i INTERACT NO—MilJBULK」指令後,圖形 LSM9 則為 comm9之圖形。由於圖形comm8 (在此為ME8的圖形) 和圖形NO_M1GJBULK(在此為空集合)並不會產生交集, 故在執行「LSM8 = COMM8 INTERACT NOJV[10_BULK」指令後,圖形LSM8的值將被設為空集 合。以此類推,除了此佈局圖之最上圖層(以本實施例假 定最上層為第10金屬層ME1())的下一金屬圖層所對應之 圖形LSMi將等於圖形COMMi,其餘圖層之LSMk都將為 200825824 UMCD-2005-0072 19631 twf.doc/nThe flag layer NO_M„__BULK of the 11th metal layer will be set to the BULK metal layer, that is, the 10th metal layer must be intersected with the pattern NO-Mn-BULK which has been set to BULK, so the rTOpM1〇= After the ME10 INTERACTNO-Mil-BULK command, the TOPMl will be itself. In the present embodiment, it is assumed that the uppermost metal layer in the layout map is the first 设为 is set as the pattern ME10. In addition, since there is an intersection between NO-MuJBULK and TOPM10, NOJVIiBULK will be set to an empty set after executing the "NO M10 BULK = NO-Mil-BULK NOT INTERACT TOPM10" command. After executing the "TOPM9 = ME9 INTERACT NOJVI10 JBULK" command, the pattern ME9 of the ninth metal layer and the NO_M10_BULK of the empty set in this example do not produce an intersection, so the TOPM9 will be set to an empty set. The value of TOPM8~TOPM4 is obtained by analogy. In the method of comparing the flag layer with the layout map to obtain the uppermost layer, in this example, only the TOPM10 corresponding to the uppermost layer 10 is designated as ME1(), and the graphics TOPM4 to TOPM9 and TOPMu are all set to be empty. set. Combine the graphic TOPM4 to the graphic 13 200825824 UMCD-2005-0072 1963 ltwf.doc/n TOPMU to get the image as the top layer in this layout. For the above example, please refer to the command code block 52 of Figure 5. After executing the "COMMIO = (ME10 NOT INTERACT NO - Mil-BULK) NOT TOPMIO" command, the pattern of the first metal layer in this layout will intersect with the pattern NO_MU-BULK, so the graphic COMMag〇 is an empty set. And the ninth metal layer and the 集合_Μι〇_Βυχκ ρ with the empty set do not produce an intersection, so after executing the "COMM9 = (ΜΕ9 NOT INTERACT NO-M10-BULK) NOT TOPM9" command, the graphic COMM9 will be set to the figure of the 9th metal layer ME9. By analogy, the command code block 520 can be pushed down to see if the other layers are internal layers in the layout. Referring to the command code block 540 of FIG. 5, the command "LSM10 = COPY COMM10" is to set the LSM 10 to the graphic COMM10, which is an empty set in this embodiment. Since the graphic COMM9 (here, the ME9 graphic) will intersect with NO-Mu-BULK, the graphic LSM9 is the comm9 graphic after executing the "LSM9 = COMM9 i INTERACT NO-MilJBULK" command. Since the graphic comm8 (here, the ME8 graphic) and the graphic NO_M1GJBULK (the empty set here) do not produce an intersection, the value of the graphic LSM8 will be set after executing the "LSM8 = COMM8 INTERACT NOJV[10_BULK" instruction. Empty collection. By analogy, the pattern LSMi corresponding to the next layer of the layout (the upper layer is assumed to be the 10th metal layer ME1() in this embodiment) will be equal to the pattern COMMi, and the LSMk of the remaining layers will be 200825824 UMCD-2005-0072 19631 twf.doc/n

空集合。故於本例中,將LSM 饰局圖中之最上圖層的下_圖層之^可得到此 為第9金屬層施9)。吸圖形(以本實施例假定 於圖5中命令碼區塊52〇以及命令碼區塊53 以自動分析出此佈局圖中的最上層;層、 固插基⑽⑽)以及内部介層窗插塞的資訊。命令石^ 塊550則是將先前得到的各個變數值Empty collection. Therefore, in this example, the lower layer of the uppermost layer in the LSM decoration map can be obtained as the ninth metal layer 9). The suction pattern (in this embodiment, the command code block 52 〇 and the command code block 53 are assumed in FIG. 5 to automatically analyze the uppermost layer in the layout; the layer, the fixed interposer (10) (10)), and the internal via plug. Information. The command stone block 550 is the previously obtained variable value.

需的參數位置中,以進行佈所 習知技術必須打開GD s格式之佈局圖槽, 檢視此佈關㈣—_為最上層金屬層。以1P5M之制 程為例’使用者需人錢視以確認此佈局圖 ^ 層是配置在第5金屬層,然後再以人工方式從多個以 (command file)中選擇適用於1?观製程之命令樓 對此佈局圖進行「設計規則檢查相 發明之實施例只需要使用單一個命令稽。由二= 自動判斷此佈局圖之最上層金屬層,因此本發明不需要人 工方式即可自動進行設計規則檢查。 使用者可視其需要而於步驟230中進行其他檢查項 目,並將欲檢查項目之命令事先寫入通用之命令檔。& 6 所不為依照本發明實施例說明步驟230中之子步驟流程 囷明同日守參閱圖2與圖6。步驟220將此佈局圖之部分 或全部圖層進行聯集,以獲得一個旗標層。本例是將此佈 15 200825824 UMCD-2005-0072 19631twfdoc/n ,圖内的王部圖層聯集以得到—稱之為NUB的旗標層。 曰圖2,步驟23〇中,依此旗標層檢查此佈局圖,可產生 曰曰片角,規則(dieC〇rnermle)所需要的資訊。圖6之步 驟灸I疋將由佈局_内之所有圖層聯集所得到的旗標層與 冬^寸進行比較。如步驟620所示,當旗標層之尺寸 大於此茶考尺寸,則進行一大尺寸鐘定規則(identified rule 。反之若旗標層之尺寸小於參考尺寸,則進行一小 尺寸酬(如步驟63G)。施行鑑定規則的方法首先 是設定圖,B—BCQR等於此旗標層之角落圖形,再者將佈 局,中之第h金屬層之圖形%與圖形B—BC〇R交集,並 將交集結果設定為圖形METhCA,其中h為大於〇且小於 N+1之整數’ n為此佈局圖之最大圖層數。最後檢查圖 形METhCA中是否存在未以45度角配置之部分圖形。 以一最大圖層數為6的佈局圖為例。圖γ為本發明實 施例中,用於Cadence公司DRACULA程式中的設計規則 檢查命令檔實例。如命令碼區塊71〇所示,首先根據旗標 層PSUB的大小來設定s—PSUB以及B—PSUB的值。在本 例中旗標層PSUB是圖層1至圖層6圖形之聯集。若旗標 層PSUB的大小介於〇〜i〇〇mm2間,則將圖形s—psuB設 為PSUB,且圖形B—PSUB為空集合;反之若此旗標層大 小超過100mm2,則圖形B一PSUB將被設為旗標層psuB 之圖形且圖形S—PSUB為空集合。命令碼區塊72〇是當旗 4示層PSUB付合大尺寸鑑定規則’也就是當旗標層psuB 之大小超過100mm2時,設計規則檢查會執行的程式部 16 200825824 UMCD-2005-0072 19631twf.doc/n 分。命令碼721是根據圖形B一PSUB指定角落圖形 B—BCOR的範圍。於本實施例中,BJBCOR是為分別從4 個晶片(die)之内角算起,邊長為340um之4個正方形所 構成之圖形。命令碼區塊723則是將圖形METKA至圖形 METfA分別設為圖層1至圖層6中與BJBCOR產生交集 之圖形。而命令碼區塊725是從圖形METiCA至圖形 MET0CA中找出以45度角配置之圖形。命令碼區塊爪 則找出圖形METiCA至圖形MET^CA中未以45度角配置 之圖形,並將其視為錯誤且輸出之。 命令碼區塊730是用類似之流程依照小尺寸鑑定規則 檢查錯誤。其中命令碼731為設定小尺寸鐘定規則檢查 中,所使用之角落圖形S—BCOR的範圍。於本實施例中圖 形S—BCOR為分別從4個晶片角落算起,邊長為⑵腿之 4個正方形所構成之圖形。命令碼區塊733、735、及737 則是檢查出圖層i至圖層6中,與角落_交#卻未以45 度角配置之圖形,將其視為錯誤並且輪出。 \ 啼術必射了開GDS格式之佈局圖標,然後以人工 2此佈局圖之尺寸大小’來決定佈局圖_於何種鑑定 =。且域人讀視的結果去敍命令檔㈣容,使其 相對應之尺寸鑑定酬。她於胃知麟,本發明之 在執行命令碼區塊71〇之後,即可自動判斷佈局圖 小。倘若此旗標層的大小介於G〜動腿2間,由 Μ集合,因此在執行命令碼區塊72〇所 k之大尺核定規職糾會影響檢查結果;反之若旗標 200825824 UMCD-2005-0072 19631twf.doc/n 層大小超過i〇〇mm2,由於圖形SJPSUB為空集合,因此 在進行規則設計檢查而執行命令碼區塊73()中所述之小尺 寸鑑定規則後,亦不會影響檢查結果。有別於習知技術, 本發明不須以人工檢查佈局圖之大小,且只需要使用單一 命令檔,即可對無論是應該以大尺寸鑑定規則、抑或是小 尺寸鐘定規則檢查之佈局圖進行檢查。 , 第三實施例 \ 使用者可視其需要而於圖2之步驟23〇中進行其他檢 查項目,例如檢查某個特定圖層是否存在於此佈局圖中, 並將欲檢查項目之命令事先寫入通用之命令播24〇。經由 將佈局圖中所有圖層聯集所產生之旗標層,可用來檢查某 個特定圖層是否存在於此佈局圖中。下文將以檢查圖層 NPLUS是否存在於-GDS格式之佈局圖中為例,以便說 明本發明之另一種可能實施方式。圖8是依照本發明實施 例,用於Mentor公司Calibre程式的設計規則檢查命令檔 之實例。 請參閱圖8,為了明確闡述本實施例之要點,圖8僅 不出通用命令檔内的部分内容。命令碼區塊81〇依據擴散 層(diffusion) DIFF圖形與N型井NWEL圖形之關係而 定義ACTIVE—NW與ACTIVEjS,然後分別依據圖形 ACTIVE—NW、與ACTIVE—Ps與圖層Npujs之關係而 疋義NDIF以及NTAP。如命令瑪區塊82〇所示,若圖層 NPLUS與一個由佈局圖中所有圖層聯集而得到之旗標^ 200825824 UMCD-2005-0072 1963 ltwf.doc/n BULK產生交集,則代表圖層NPLtjS存在於此佈局圖中, 因此將圖形X設定為旗標層BULK之圖形;反之若圖層 NPLUS與旗標層BULK並未產生交集,則表示圖層NpLUS 不存在,因此將圖形X設定為空集合。 命令碼區塊830則是用來輸出檢查結果。若圖形ndif 與圖形X有交集,則將圖形NDIF扣除圖層NPLUS之圖 形後輸出之。若圖形NTAP與圖形X有交集,則將圖形 NTAP扣除圖層NPLUS之圖形後輸出之。因此,利用檢查 圖層NPLUS是轉在於佈局圖巾的結果(於糊此檢查結 果被存入一區域變數X中),來對NDIF以及NTAp這兩個 事先於命令碼區塊81G巾定義完紅_進行設計規則檢 查。 習知技術若要檢視某-特定圖層是否存在於佈局圖 中’ 1-先需打開GDS格式之佈局圖稽,接著必須使用人工 =方式對此佈局_進行檢視。然耐目較於f知技術,本 赉明利用一個由佈局圖中各圖層相聯集所產生之旗俨声In the required parameter position, the conventional technique must be used to open the layout slot of the GD s format, and the layout is checked (4) - _ is the uppermost metal layer. Take the 1P5M process as an example. 'Users need money to confirm this layout. ^ The layer is placed on the 5th metal layer, and then manually selected from multiple (command files) for 1? The command building performs the design rule check on the layout diagram. The embodiment of the invention only needs to use a single command. The second layer is automatically judged by the second layer, so the invention can be automatically designed without manual means. The rule check: The user can perform other check items in step 230 according to his needs, and write the command of the item to be checked in advance to the common command file. & 6 The sub-steps in step 230 are not described in accordance with an embodiment of the present invention. The process is as follows: Figure 2 and Figure 6. Step 220 combines some or all of the layers of the layout to obtain a flag layer. This example is the cloth 15 200825824 UMCD-2005-0072 19631twfdoc/n The king layer in the figure is combined to obtain the flag layer called NUB. In Figure 2, in step 23, the layout is checked according to the flag layer, which can produce the corner of the slab, rule (dieC 〇 Rnermle) The required information. The step of Figure 6 is to compare the flag layer obtained by all the layers in the layout_ with the winter layer. As shown in step 620, when the size of the flag layer is larger than this For the tea test size, a large size rule is determined. If the size of the flag layer is smaller than the reference size, a small size is paid (such as step 63G). The method for applying the identification rule is first to set the picture, B. - BCQR is equal to the corner pattern of the flag layer, and then the layout %, the graph % of the hth metal layer is intersected with the graph B - BC 〇 R, and the intersection result is set to the graph METhCA, where h is greater than 〇 and less than The integer of N+1 'n is the maximum number of layers in the layout diagram. Finally, check whether there are some graphics in the graph METhCA that are not arranged at a 45-degree angle. Take a layout diagram with a maximum number of layers as 6 as an example. In the embodiment of the present invention, an example of a design rule check command file used in the Cadence DRACULA program. As shown in the command code block 71, first, s-PSUB and B-PSUB are set according to the size of the flag layer PSUB. Value. In this case the flag The standard layer PSUB is a combination of the layers 1 to 6 of the figure 6. If the size of the flag layer PSUB is between 〇~i〇〇mm2, the graphic s_psuB is set to PSUB, and the graphic B-PSUB is an empty set; On the other hand, if the size of the flag layer exceeds 100 mm2, the graphic B-PSUB will be set as the flag of the flag layer psuB and the graphic S-PSUB is an empty set. The command code block 72 is the flag 4 layer PSUB The size identification rule 'is the program part 16 200825824 UMCD-2005-0072 19631twf.doc/n when the size of the flag layer psuB exceeds 100 mm2. The command code 721 is a range in which the corner pattern B_BCOR is specified according to the graphic B-PSUB. In the present embodiment, BJBCOR is a pattern of four squares each having a side length of 340 um from the inner corner of four dies. The command code block 723 is a graph in which the graphic METKA to the graphic METfA are respectively set to intersect with the BJBCOR in the layer 1 to the layer 6. The command code block 725 is a pattern that is arranged at a 45 degree angle from the graphic METiCA to the graphic MET0CA. The command code block claw finds the graphic METiCA to the graphic which is not arranged at a 45 degree angle in the graphic MET^CA, and regards it as an error and outputs it. The command code block 730 checks for errors in accordance with the small size authentication rule using a similar process. The command code 731 is a range of the corner pattern S-BCOR used in setting the small-size clock rule check. In the present embodiment, the pattern S-BCOR is a pattern composed of four squares of the legs of the (2) legs from the corners of the four wafers. The command code blocks 733, 735, and 737 are patterns in which the layer i to the layer 6 are checked, and the corner _ intersection # is not arranged at a 45-degree angle, which is regarded as an error and is rotated. \ 啼 必 must shoot the layout icon in the GDS format, and then manually determine the size of the layout map ' And the results of the domain readers read the command file (four) capacity, so that the corresponding size of the reward. In Yu Zhilin, the invention can automatically determine that the layout map is small after executing the command code block 71〇. If the size of the flag layer is between G and 2, due to the collection, the verification result will be affected by the large-scale verification of the command code block 72; otherwise, if the flag is 200825824 UMCD- 2005-0072 19631twf.doc/n The layer size exceeds i〇〇mm2. Since the graphic SJPSUB is an empty set, after performing the rule design check and executing the small-size authentication rule described in the command code block 73(), Will affect the inspection results. Different from the prior art, the present invention does not need to manually check the size of the layout map, and only needs to use a single command file, and can be used for the layout check whether the rule should be checked with a large size or a small size. checking. Third Embodiment \ The user can perform other inspection items in step 23 of FIG. 2 according to his needs, for example, checking whether a specific layer exists in the layout diagram, and writing the command to check the item in advance. The order is broadcast 24 times. A flag layer generated by grouping all the layers in the layout can be used to check if a particular layer exists in this layout. An example of checking whether the layer NPLUS exists in the layout of the -GDS format will be exemplified below to illustrate another possible embodiment of the present invention. Figure 8 is an illustration of a design rule check command file for the Mentor Calibre program in accordance with an embodiment of the present invention. Referring to Fig. 8, in order to clearly explain the gist of the embodiment, Fig. 8 only shows part of the contents of the general command file. The command code block 81 defines ACTIVE-NW and ACTIVEjS according to the relationship between the diffusion DIFF pattern and the N-well NWEL pattern, and then deviates from the relationship between the ACTIVE-NW and the ACTIVE-Ps and the layer Npujs, respectively. NDIF and NTAP. As shown in the command block 82〇, if the layer NPLUS is combined with a flag obtained by all the layers in the layout map, 200825824 UMCD-2005-0072 1963 ltwf.doc/n BULK, the layer NPLtjS exists. In this layout, therefore, the graphic X is set as the graphic of the flag layer BULK; otherwise, if the layer NPLUS and the flag layer BULK do not intersect, it means that the layer NpLUS does not exist, so the graphic X is set to an empty set. The command code block 830 is used to output the check result. If the graphic ndif has an intersection with the graphic X, the graphic NDIF is deducted from the image of the layer NPLUS and output. If the graphic NTAP and the graphic X intersect, the graphic NTAP is subtracted from the graphic of the layer NPLUS and output. Therefore, the use of the inspection layer NPLUS is the result of the transition to the layout towel (the result of the inspection is stored in a region variable X), and the two definitions of the NDIF and NTAp are defined in the command code block 81G. Perform design rule checks. In order to check whether a certain layer exists in the layout map, the prior art needs to open the layout of the GDS format, and then the layout_ must be checked using the manual = method. However, compared with the known technology, Ben Ming uses a banner sound generated by the associated sets of layers in the layout.

確無誤的判斷出某—特㈣層是否存在於此“圖 中,進而自動輸出檢查結果。 Q 圖9是依照本發明較佳實施例所 丁 進仃佈局 設計規則檢查的程式流㈣。此程式 二^圖 紀錄媒體中。此紀錄媒體可以是硬碟、光碟或磁片等^取 200825824 UMCD-2005-0072 19631twf.doc/n 請參照圖9,此程式將可用來檢查於本實施例中為GDS格 式之佈局圖是否符合設計規則。 如步驟910所示,本程式將讀取此包含多數個圖層的 佈局圖。步驟920則顯示此程式可將佈局圖内的數個圖層 或全部圖層進行聯集,以得到一旗標層。於步驟93〇將依 據此旗標層檢查佈局圖是否遵循設計規則。其中,上述步 驟920與步驟930可以參照上述諸實施例施作之,故不在 此費述。 習知技術需打開GDS格式之佈局圖檔,並用人工檢視 的方式取得佈局圖的資訊,再依照此些資訊找出適用之命 來進行設計規則檢查。而有別於習之技術,本發明之 實施例可藉由旗標層和佈局圖的比較,提供此佈局圖的最 上圖層’内部圖層’最上圖層之下—圖層等資訊。且可利 用旗標層欺此佈局_驗大財減是小尺寸鑑定規 L 士並將此些貝5關於單—之命令樓中自動進行設計規則 施例 之用圖?。。圖1〇是依照本發明較佳實施例所繪示 圖。〜――目佈局圖的佈局圖設計規職查方法之流程 數個==驟如下:步驟1〇10是提供-個包含了多 全部邱、α θ。步驟ig2g則是根據此佈局圖,將其中 p或疋料的圖層進行,以得到-旗標層。步驟 20 200825824 UMCD-2005-0072 1963 ltwfdoc/n ==較旗制與此柄心的各圖層,並據以檢查此 些圖層。步驟1〇4〇則是將旗襟層的圖形與一參考尺寸作比 行相對應之鑑❻則。其中,上述步驟_、 與1〇40可以參照上述諸實施例施作之,故不在此贅 =於習知技術所述,f以人工的方式檢閱佈局圖, =找哥翻於此佈局圖之命令魏行規職查。本發 貝=可藉由圖層與旗標層的比較,取得設計檢查時 ^令檔的參數’好比最大圖層賴形,最大_之下〜 圖s圖形’内部圖層的圖形,或是佈局圖大小的範圍等, 以自動進行設計規則檢查。 、 絲上所述’在本發明之佈局圖設計規則檢查方法及 ,可讀取,錄媒體中,藉由旗標層和佈局圖之間的比較, 生用於早-命令檔内所需要的參數,根據此些參數 執打相對應之設計規則檢查。自動化的結果不僅能節 置的時間,且能減少因人工判別所產生的錯誤,進 半導體產業的生產效率。 —雖然本發明已以較佳實施例揭露如上,然其並非用以 限^本發明,任何熟習此技藝者,在不脫離本發明之精神 =範圍内,當可作些許之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 圖1緣示為習知佈局圖設計規則檢查之流程圖。 21 200825824 UMCD-2005-0072 1963 ltwf.doc/n 圖2、圖l〇繪示為佈局圖設計規則檢查方法之流程圖。 圖3繪示為佈局圖設計規則檢查方法中依據旗標層檢 查佈局圖方法之流程圖。 圖4繪不為比較佈局圖及旗標層以得到最上圖層方法 之流程圖。 圖5、圖7、圖8繪示為一設計檢查規則之程式實例。 圖6繪示為決定尺寸鑑定規則方法之流程圖。 圖9繪示為一存於電腦可讀取紀錄媒體且功能為檢查 一佈局圖是否遵循設計規則之程式的流程圖。 【主要元件符號說明】 110〜160 :習知佈局圖設計規則檢查之各步驟。 210〜260 ·本發明的較佳實施例所述佈局圖設計規則 檢查方法之各步驟。 310〜350 :本發明的較佳實施例所述由旗標層檢查佈 局圖方法之步驟。 410〜450 :本發明的較佳實施例所述比較佈局圖及旗 標層以得到最上圖層方法之步驟。 510、520、530、540、550、710、720、721、723、725、 727、730、731、733、735、737、810、820、830 :本發明 的較佳實施例所述之程式區塊。 610〜630 :本發明的較佳實施例所述決定尺寸鑑定規 則方法之各步驟。 22 200825824 UMCD-2005-0072 19631twf.doc/n 910〜930 ·本發明的較佳實施例所述之存於 志 取紀錄媒體且功能為檢查一佈局圖是否遵循設計規則之^ 式之各步驟。 ' 1010〜1030 :本發明的較佳實施例所述佈局圖設計規 則檢查方法之各步驟。 Γ 23It is true that it is determined whether a certain (four) layer exists in this figure, and the inspection result is automatically output. Q Fig. 9 is a program flow (4) of the layout design rule check according to the preferred embodiment of the present invention. In the recording medium, the recording medium can be a hard disk, a compact disc or a magnetic disk. For example, 200825824 UMCD-2005-0072 19631twf.doc/n Referring to FIG. 9, this program can be used to check in this embodiment. The layout of the GDS format conforms to the design rules. As shown in step 910, the program will read the layout map containing a plurality of layers. Step 920 shows that the program can connect several layers or all layers in the layout diagram. The set is to obtain a flag layer. In step 93, the layout layer is checked according to the flag layer to follow the design rule. The above steps 920 and 930 can be implemented by referring to the above embodiments, and therefore are not described herein. The conventional technology needs to open the layout file of the GDS format, and obtain the information of the layout map by manual inspection, and then find out the applicable life to check the design rules according to the information. According to the technique of the present invention, the comparison between the flag layer and the layout map can provide information such as the layer below the top layer of the top layer 'internal layer' of the layout layer, and the layer layer can be used to bully the layout. _ 验 大 财 是 是 是 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 小 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动Diagram. The layout of the layout diagram design rules and the number of procedures is as follows: Steps 1〇10 are provided - one contains more than all Qi, α θ. Step ig2g is based on this layout Figure, the layer in which p or dip is performed to obtain the -flag layer. Step 20 200825824 UMCD-2005-0072 1963 ltwfdoc/n == The layers of the flag and the handle, and check this The layer 1 step 4〇 is to compare the pattern of the flag layer with a reference size. The above steps _, and 1 〇 40 can be referred to the above embodiments, so Not here 赘 = as described in the prior art, f manually review the layout, = find Brother turned over the layout of the order of the Wei line rules. This hairbe = can be compared by the comparison of the layer and the flag layer, the parameters of the design file when the design check is 'like the largest layer, the largest_lower ~ s graphics 'the graphics of the internal layer, or the range of the size of the layout, etc., to automatically carry out the design rule check., on the silk, in the layout control rule checking method of the present invention, and can be read, recorded media, By comparing the flag layer and the layout map, the parameters required for the early-command file are generated, and the corresponding design rule check is performed according to the parameters. The automated result can not only save the time, but also It can reduce the errors caused by manual discrimination and enter the production efficiency of the semiconductor industry. The present invention has been disclosed in the above preferred embodiments, and it is not intended to limit the invention, and it is possible to make some modifications and refinements without departing from the spirit of the invention. The scope of the invention is defined by the scope of the appended claims. [Simple Description of the Drawings] Figure 1 shows the flow chart of the conventional layout drawing design rule check. 21 200825824 UMCD-2005-0072 1963 ltwf.doc/n Figure 2 and Figure 1D show the flow chart of the layout design rule checking method. FIG. 3 is a flow chart showing a method for inspecting a layout map according to a flag layer in a layout drawing design rule checking method. Figure 4 depicts a flow chart not comparing the layout and flag layers to obtain the top layer method. 5, 7, and 8 illustrate an example of a program design check rule. FIG. 6 is a flow chart showing a method for determining a dimensioning rule. Figure 9 is a flow diagram of a program stored on a computer readable recording medium and functioning to check whether a layout diagram follows design rules. [Main component symbol description] 110~160: The steps of the conventional layout design rule check. 210 to 260 - The steps of the layout design rule checking method of the preferred embodiment of the present invention. 310 to 350: The steps of the method of checking the layout map by the flag layer in the preferred embodiment of the present invention. 410 to 450: The preferred embodiment of the present invention compares the floor plan and the flag layer to obtain the steps of the top layer method. 510, 520, 530, 540, 550, 710, 720, 721, 723, 725, 727, 730, 731, 733, 735, 737, 810, 820, 830: a program area according to a preferred embodiment of the present invention Piece. 610-630: The steps of the method for determining the size identification rule described in the preferred embodiment of the present invention. 22 200825824 UMCD-2005-0072 19631 tw.doc/n 910 930 930 - The steps of the preferred embodiment of the present invention are stored in the recording medium and function to check whether a layout conforms to the design rules. '1010 to 1030: steps of the layout pattern design rule checking method of the preferred embodiment of the present invention. Γ 23

Claims (1)

200825824 UMCD-2005-0072 19631twf.doc/n 十、申請專利範園: 1.-種佈局圖設計賴檢查之料,㈣檢查一佈局 圖,該方法包括: 提供該佈局圖,其中該佈局圖包含多數個圖層; 將該佈局圖之該些圖層其中部分或全㈣層進行聯 木’以獲得一旗標層;以及 依據該旗標層,檢查該佈局圖。 Γ 、2·如申請專利範圍第1項所述佈局圖設計規則檢查之 方去,其中該佈局圖為 GDS (global distribution system) 格式之檔案。 、3·如申料利顧第丨項所述佈局目設計酬檢查之 方去,其中該旗標層是該佈局圖中全部圖層之聯集。 、4·如申請專利範圍帛1項所述佈局圖設計規則檢查之 方去,其中依據該旗標層檢查該佈局圖之步驟包括: 分別將該佈局圖之該些圖層與該旗標層進行比較: χ 若該些圖層中之某一圖層與該旗標層之比較結果 、 為空集合,則表示該圖層為空層;以及 ^ 、 若該些圖層中之某一圖層與該旗標層之比較結 非為空集合,則比較結果為非空集合之該些圖層中, 層之圖層為該佈局圖中之最上圖層,而其下之其 該佈局圖中之内部圖層; 、他圖層為 以一最上層規則檢查該佈局圖中之最上圖層;以及 以一内部層規則檢查該佈局圖中之内部圖層。 24 200825824 UMCD-2005-0072 1963 ltwf.doc/n 5·如申請專利範圍第4項所述佈局圖設計規則檢查之 方法,其中分別將該佈局圖之該些圖層與該旗標層進行比 較之步驟包括: 设定圖形topmn等於該佈局圖中之第N層圖層MEn 之圖形,其中N為該佈局圖之最大圖層數; ,若該旗標層BULK與圖形TOPMN無交集,則設定圖 幵y N〇JV[n—BULK等於該旗標層BULK之圖形,否則設定 圖形NO一MN—BULK為空集合; 若該佈局圖中之第i層圖層MEi與圖形 N〇JV[i+1__BULK有交集,則設定圖形T〇pMi等於該佈局圖 中之苐i層圖層MEi之圖形,否則設定圖形TQp]^為空集 合,其中i為大於0且小於N之整數; 若圖形NO—Mi+1 一BULK與圖形TOPMi無交集,則設 定圖形NO—Mi—BULK等於圖形NOJMi+1—BULK,否則設 定圖形NO_MuBULK為空集合;以及 將圖形TOPMN〜TOPMj聯集,以獲得該佈局圖中最 上圖層,其中j表示於該佈局圖中作為最上圖層之可能範 圍之最小值。 6·如申請專利範圍第5項所述佈局圖設計規則檢查之 方法,其中分別將該佈局圖之該些圖層與該旗標層進行比 較之步驟更包括: 若該佈局圖中之第i層圖層MEi與圖形 NO JV[i+1 一BULK無交集,則設定圖形cOMMi等於圖層 之圖形,否則設定圖形COMMi為空集合; 1 25 200825824 UMCD-2005-0072 19631twf.doc/n 其中圖形COMMi表示該佈局圖中非最上圖層之圖形。 7·如申请專利範圍第6項所述佈局圖設計規則檢查之 方法,其中分別將該佈局圖之該些圖層與該旗標層進行比 較之步驟更包括: 没定圖形LSM>m等於該佈局圖中之第N-1層圖層 MEn]之圖形;以及 θ 右圖形COMMk與圖形NOJV[k+2—BULK有交集,則設 疋圖形LSMk等於c〇MMk,否則設定圖形LSMk為空集 合,其中k為大於〇且小於队丨之整數; 其中圖形LSMk表示該佈局圖中最上圖層之下一層圖 層之圖形。 、8·如申料娜圍第1項所述佈局圖輯規則檢查之 方法’其中依據該旗標層檢查該佈局圖之步驟包括: 比較該旗標層之圖形尺寸與一參考尺寸; 若該旗標層之尺寸大於該參考尺寸,則進行一大尺寸 鑑定規則(identified rule);以及 右该旗標層之尺寸小於該參考尺寸,則進行一小尺寸 鑑定規則。 9.^t請專利範圍第8項所述佈局圖設計規則檢查之 方法,其中該大尺寸鑑定規則包括: 設定圖形B_B〇)R等於該旗標層之角落圖形; R 局圖中之第h層圖層MEh之圖形與圖形 - 父集,並將交集結果設定為圖形METhCA,其中 26 200825824 UMCD-2005-0072 19631twf.doc/n h為大於G且小於N+l之整數’ * N為該佈局圖之最大圖 層數;以及 形 檢查圖形METhCA忖絲以45度肖崎之部分圖 10.如申請專職圍第1項所述佈局圖設計規則檢查 之方法,其中依據該旗標層檢查該佈局圖之步驟包括:— 若該旗標層與該佈局圖中之一指定層有交集,則以第200825824 UMCD-2005-0072 19631twf.doc/n X. Applying for the patent garden: 1.- The layout design depends on the inspection material, (4) Checking the layout, the method includes: providing the layout, wherein the layout includes a plurality of layers; a portion of the layers of the layout map or all (four) layers are joined to obtain a flag layer; and the layout map is checked according to the flag layer. Γ , 2 · If you want to check the layout design rules mentioned in item 1 of the patent application scope, the layout map is a file in the GDS (global distribution system) format. 3. If the application refers to the layout design of the layout item, the flag layer is the union of all the layers in the layout. 4) If the layout drawing design rule is checked according to the scope of the patent application, the step of checking the layout according to the flag layer includes: respectively performing the layers of the layout map and the flag layer Comparison: χ If the comparison between a layer in the layer and the flag layer is an empty set, it means that the layer is an empty layer; and ^, if a layer in the layers and the flag layer The comparison result is not an empty set, and in the layers in which the comparison result is a non-empty set, the layer of the layer is the uppermost layer in the layout diagram, and the inner layer in the layout diagram is below; the layer is Examine the topmost layer in the layout with a top-level rule; and examine the internal layers in the layout with an internal layer rule. 24 200825824 UMCD-2005-0072 1963 ltwf.doc/n 5. The method for checking the layout design rules described in claim 4, wherein the layers of the layout are compared with the flag layer respectively The step includes: setting a graph topmn equal to a pattern of the Nth layer layer MEn in the layout diagram, where N is the maximum number of layers of the layout map; if the flag layer BULK and the graphic TOPMN have no intersection, setting the map y N〇JV[n-BULK is equal to the pattern of the flag layer BULK, otherwise the graphic NO_MN-BULK is set as an empty set; if the i-th layer layer MEi and the graphic N〇JV[i+1__BULK in the layout map have In the intersection, the graphic T〇pMi is set equal to the graphic of the 苐i layer MEi in the layout, otherwise the graphic TQp]^ is an empty set, where i is an integer greater than 0 and less than N; if the graphic NO_Mi+1 If there is no intersection between a BULK and the graphic TOPMi, the graphic NO_Mi-BULK is equal to the graphic NOJMi+1-BULK, otherwise the graphic NO_MuBULK is set as an empty set; and the graphics TOPMN~TOPMj are combined to obtain the uppermost layer in the layout picture, Where j is represented as the top in the layout The minimum possible range of layers. 6) The method for checking a layout design rule according to item 5 of the patent application scope, wherein the step of respectively comparing the layers of the layout map with the flag layer further comprises: if the i-th layer in the layout diagram If the layer MEi and the graphic NO JV[i+1-BULK have no intersection, the graphic cOMMi is set equal to the graphic of the layer, otherwise the graphic COMMi is set as an empty set; 1 25 200825824 UMCD-2005-0072 19631twf.doc/n where the graphic COMMU indicates The graphics in the layout diagram that are not the topmost layer. 7. The method for checking a layout design rule according to item 6 of the patent application scope, wherein the step of respectively comparing the layers of the layout map with the flag layer comprises: the undetermined graphic LSM>m is equal to the layout In the figure, the graph of the N-1th layer layer MEn]; and the intersection of the θ right graph COMMk and the graph NOJV[k+2—BULK, the graph LSMk is equal to c〇MMk, otherwise the graph LSMk is set to an empty set, wherein k is an integer greater than 〇 and smaller than the team ;; where the graphic LSMk represents the graphic of the layer below the uppermost layer in the layout. 8. The method for checking the layout rule of the first item according to the first item of the claimant, wherein the step of checking the layout according to the flag layer comprises: comparing the graphic size of the flag layer with a reference size; If the size of the flag layer is larger than the reference size, a large size identification rule is performed; and when the size of the flag layer is smaller than the reference size, a small size identification rule is performed. 9.^t Please refer to the method for checking the layout design rule described in item 8 of the patent scope, wherein the large-scale identification rule includes: setting the graphic B_B〇) R is equal to the corner pattern of the flag layer; Layer layer MEh graphics and graphics - the parent set, and set the intersection result to the graphic METhCA, where 26 200825824 UMCD-2005-0072 19631twf.doc/nh is an integer greater than G and less than N + l ' * N is the layout The maximum number of layers; and the shape inspection pattern METhCA 以 silk to 45 degrees Xiao Qi part of the figure 10. If you apply for the full-time layout of the first floor layout design rule inspection method, according to the flag layer to check the layout The steps include: - if the flag layer intersects with one of the specified layers in the layout, -程序處理該佈局®,關以第二程序處嗎佈局圖。 /11. 一種電腦可讀取記錄媒體,用以儲存可執行於一電 腦系統的-程式’其巾該程式用以檢查—佈局圖,今二 包括下列指令: ° A 讀取該佈局圖,其中該佈局圖包含多數個圖層; 將該佈局圖之該些圖層其中部分或全部圖^進 集,以獲付一旗標層;以及 依據該旗標層,檢查該佈局圖。 12·如申請專利範圍第11項所述電腦可讀取記錄媒 體,其中該佈局圖為GDS (gl〇bal distributi〇n啊、久 式之檔案。 ° 13·如申請專利範圍第n項所述電腦可讀取記 體’其中該旗標層S該佈局圖中全部圖層之聯集。、 M•如申請專利範圍第11項所述電腦可讀取記錄媒 體’ ^中依據該旗標層檢查該佈局圖之指令包括: 分別將該佈局圖之該些圖層與該旗標層進行比較: 27 200825824 UMCD-2005-0072 1963 ltwf.doc/n 若该些圖層中之某一圖層與該旗標層之比較纟士果 為空集合,則表示該圖層為空層;以及 、 若§亥些圖層中之某一圖層與該旗標層之比較妹果 非為空集合,則比較結果為非空集合之該些圖層中,最上 層之圖層為該佈局圖中之最上圖層,而其下之其他圖層^ 該佈局圖中之内部圖層; 曰… 以一最上層規則檢查該佈局圖中之最上圖層;以及 以一内部層規則檢查該佈局圖中之内部圖層。 15·如申請專利範圍第14項所述電腦可讀取記錄媒 體’其中分別將該佈局圖之該些圖層與該旗標層進行比較 之指令包括: ^ 設定圖形T0PMn等於該佈局圖中之第N層圖層MEn 之圖形,其中N為該佈局圖之最大圖層數; 若該旗標層BULK與圖形TOPMN無交集,則設定圖 形N〇—MnJBULK等於該旗標層BULK之圖形,否則設定 圖形ncLMnJ3ULK為空集合; 若該佈局圖中之第i層圖層MEi與圖形 NG-Mw—BULK有交集,則設定圖形TOPMi等於該佈局圖 中之第i層圖層MEi之圖形,否則設定圖形TOPMi為空集 合’其中i為大於0且小於N之整數; 若圖形NO_Mi+1JBULK與圖形TOPMi無交集,則設 定圖形NOJMLBULK等於圖形NO_Mi+1_BULK,否則設 定圖形NOjviiJBULK為空集合;以及 28 200825824 UMCD-2005-0072 1963 ltwf.doc/n 將圖开y TOPM=〜TOPMj聯集,以獲得該佈局圖中最 上圖層,其中j表示於該佈局圖中作為最上圖層之可 圍之最小值。 16.如申請專利範圍第15項所述電腦可讀取記錄媒 體’其中分別將_局圖之該些圖層與該旗標 : 之指令更包括: T Γ 若該佈局圖中之第i層圖層MEi與圖步 NO—Mi+1—BULK無交集,設定圖形等於圖層^ 之圖形,否則設定圖形C〇MMi為空集合; 曰1 其中圖形COMMi表示該佈局圖中非最上圖層之圖带。 17·如申請專利範圍第16項所述電腦可讀取記二 體’將該佈局圖之該些圖層與該旗標層進行比較 設定圖形LSMNel等於該佈局圖中之第N-i屑円 MEg之圖形;以及 θ圖層 若圖形COMMk與圖形N〇—Mk+2—BULK有交集,則笋 定圖形LSMk等於C〇MMk,否則設定圖形乙叫為空= 合,其中k為大於〇且小於队丨之整數; 木 其中圖形LSMk表示該佈局圖中最上圖層之下一 層之圖形。 18·如申請專利範圍第n項所述電腦可讀取記錄媒 體’其中依據该旗標層檢查該佈局圖之指令包括·· 、 比較該旗標層之圖形尺寸與一參考尺寸; 29 200825824 UMCD-2005-0072 19631twf.doc/n 若該旗標層之尺寸大於該參考尺寸,則進行一大尺寸 鑑定規則(identified rule );以及 若該旗標層之尺寸小於該參考尺寸,則進行一小尺寸 鑑定規則。 19·如申請專利範圍第18項所述電腦可讀取記錄媒 體’其中該大尺寸鑑定規則包括: 設定圖形BJBCOR等於該旗標層之角落圖形; 將遠佈局圖中之第h層圖層MEh之圖形與圖形 B一BCOR交集,並將交集結果設定為圖形METhCA,其中 h為大於〇且小於N+1之整數,而N為該佈局圖之最大圖 層數;以及 檢查圖形METhCA中有無未以45度角配置之部分圖 形。 20·如申請專利範圍第η項所述電腦可讀取記錄媒 體’其中依據該旗標層檢查該佈局圖之指令包括: 若該旗標層與該佈局圖中之一指定層有交集,則以第 一程序處理該佈局圖,否則以第二程序處理該佈局圖。 21·—種佈局圖設計規則檢查之方法,用以檢查一佈局 圖’該方法包括: 提供該佈局圖,其中該佈局圖包含多數個圖層; 將該佈局圖之該些圖層其中部分或全部圖層進行聯 集,以獲得一旗標層; 比較該些圖層與該旗標層,並據以檢查該些圖層;以 及 八 30 200825824 UMCD-2005-0072 19631twf.doc/n 比車义忒旗標層之圖形尺寸與一參考尺寸,並據以進行 一鑑定規則(identified rule)。 22·如申請專利範圍第21項所述佈局圖設計規則檢查 之方去’其中該佈局圖為GDS ( gl〇bal沿对仙说system) 格式之檔案。 23·如申請專利範圍第21項所述佈局圖設計規則檢查 之方去,其中戎旗標層是該佈局圖中全部圖層之聯集。 f 之24.如申請專利範圍第21項所述佈局圖設計規則檢查 去其中比車父该些圖層與該旗標層並據以檢查該些圖 層之步驟包括: $別將該佈局圖之該些圖層與該旗標層進行比較; 隹右邊些圖層中之某一圖層與該旗標層之比較結果為空 木5,則表示該圖層為空層; 命隹若層中之某—圖層與該旗標層之比較結果非為 =合,則味結果為輕集合之該些圖層巾,最上層之 ^為該佈局圖中之最上圖層,而其下之其他圖層為該佈 句_中之内部圖層; 以一最上層規則檢查該佈局圖中之最上圖層;以及 以一内部層規則檢查該佈局圖中之内部圖層。 之25·如巾明專利|&圍第24項所述佈局圖設計規則檢查 法,其巾分縣該佈局圖之該些_與賴標層; 比車乂之步驟包括: 叮 設定®形tqpmn等於該佈局圖巾之第Ν層圖層Με 圖形,其中Ν為該佈局圖之最大圖層數; Ν 31 200825824 UMCD-2005-0072 19631twf.doc/n 若該旗標層BULK與圖形T〇PMN無交集,則設定圖 形NO_MnJBULK等於該旗標層BULK之圖形,否則設定 圖形NOJBULK為空集合; 若該佈局圖中之第i層圖層MEi與圖形 NOJV[i+1 JBULK有交集,則設定圖形TOPMi等於該佈局圖 中之第i層圖層MEi之圖形,否則設定圖形TOPMi為空集 合,其中i為大於0且小於N之整數; 若圖形NO_Mi+1_BULK與圖形TOPMi無交集,則設 定圖形NO__MiJBULK等於圖形NO_Mi+1 JBULK,否則設 定圖形NO_Mi_BULK為空集合;以及 將圖形TOPMN〜TOPMj聯集,以獲得該佈局圖中最 上圖層,其中j表示於該佈局圖中作為最上圖層之可能範 圍之最小值。 26·如申請專利範圍第25項所述佈局圖設計規則檢查 之方法,其中分別將該佈局圖之該些圖層與該旗標層進行 比較之步驟更包括: 若該佈局圖中之第i層圖層MEi與圖形 N0一Mi+1 一BULK無交集,則設定圖形等於圖層MEi 之圖形,否則設定圖形COMMi為空集合; 其中圖表示該佈局圖中非最上圖層之圖形。 27·如申4專她圍第26項所述佈局圖設計規則檢查 之方法’其中分別將該佈局圖之該些圖層與該旗標層進行 比較之步驟更包括: 32 200825824 UMCD-2005-0072 19631twf.doc/n 設定圖形LSMN-1等於該佈局圖中之第N_][層圖層 MEn-〗之圖形;以及 若圖形COMMk與圖形NO_Mk+2JBULK有交集,則設 定圖形LSMk等於COMMk,否則設定圖形LSMk為空集 合,其中k為大於〇且小於N-1之整數; 其中圖形1^1]\^表示該佈局圖中最上圖層之下一層圖 層之圖形。 28·如申請專利範圍第21項所述佈局圖設計規則檢查 之方法,其中比較該旗標層之圖形尺寸與參考尺寸並據以 進行鑑定規則之步驟包括: 比較该旗標層之圖形尺寸與該參考尺寸,· 若該旗彳示層之尺寸大於該參考尺寸,則進行一大尺寸 鑑定規則;以及 若該旗標層之尺寸小於該參考尺寸,則進行一小尺寸 鑑定規則。 29·如申請專利範圍第μ項所述佈局圖設計規則檢查 之方法,其中該大尺寸鑑定規則包括: e又疋圖形B一BCOR專於該旗標層之角落圖形; 將該佈局圖中之第h層圖層MEh之圖形與圖形 B一BCOR交集,並將交集結果設定為圖eMEThCA,其中 h為大於0且小於N+1之整數,而N為該佈局圖之最大圖 層數;以及 檢查圖形METhCA中有無未以45度角配置之部分圖 形。 β 33 200825824 UMCD-2U05-0072 1963 ltwf.doc/n 30.如申請專利範圍第21項所述佈局圖設計規則檢查 之方法,更包括: 若該旗標層與該佈局圖中之一指定層有交集,則以第 一程序處理該佈局圖,否則以第二程序處理該佈局圖。- The program processes the layout®, and closes the layout of the second program. /11. A computer-readable recording medium for storing a program executable on a computer system, the program for checking - a layout diagram, and the second instruction includes the following instructions: ° A reading the layout map, wherein The layout map includes a plurality of layers; some or all of the layers of the layout map are collected to obtain a flag layer; and the layout map is checked according to the flag layer. 12. The computer-readable recording medium according to claim 11, wherein the layout is GDS (gl〇bal distributi〇n, a long-form file. ° 13) as described in item n of the patent application scope The computer can read the record 'where the flag layer S is the union of all the layers in the layout diagram. M. The computer-readable recording medium as described in claim 11 of the patent application' ^ is checked according to the flag layer The instructions of the layout diagram include: respectively comparing the layers of the layout map with the flag layer: 27 200825824 UMCD-2005-0072 1963 ltwf.doc/n If a layer in the layers and the flag If the comparison of the layer is empty, it means that the layer is an empty layer; and if the comparison between a layer in the layer and the flag layer is not an empty set, the comparison result is non-empty. Among the layers of the collection, the uppermost layer is the uppermost layer in the layout, and the other layers below it are the inner layers in the layout; 曰... check the top layer in the layout with a top-level rule ; and check with an internal layer rule The internal layer in the layout diagram. 15. The computer-readable recording medium of claim 14, wherein the instructions for respectively comparing the layers of the layout map with the flag layer include: ^ setting a graphic T0PMn is equal to the pattern of the Nth layer layer MEn in the layout diagram, where N is the maximum number of layers of the layout map; if the flag layer BULK has no intersection with the graphic TOPMN, the setting pattern N〇-MnJBULK is equal to the flag The pattern of the layer BULK, otherwise the graphic ncLMnJ3ULK is set as an empty set; if the i-th layer MEi in the layout has an intersection with the graphic NG-Mw-BULK, the setting graphic TOPMi is equal to the ith layer MEi in the layout Graphic, otherwise set the graphic TOPMi to be an empty set 'where i is an integer greater than 0 and less than N; if the graphic NO_Mi+1JBULK has no intersection with the graphic TOPMi, the set graphic NOJMLBULK is equal to the graphic NO_Mi+1_BULK, otherwise the set graphic NOjviiJBULK is an empty set; And 28 200825824 UMCD-2005-0072 1963 ltwf.doc/n The map is opened y TOPM=~TOPMj to obtain the top layer in the layout, where j is represented in the layout The minimum value of the uppermost layer. 16. The computer-readable recording medium as described in claim 15 of the patent application, wherein the layers of the map and the flag are respectively included: T Γ The i-th layer layer MEi in the layout map has no intersection with the step NO_Mi+1-BULK, and the set graph is equal to the graph of the layer ^, otherwise the set graph C〇MMi is an empty set; 曰1 where the graphic COMMi indicates the layout map The belt of the top layer of Central Africa. 17. The computer-readable readable two-body as described in claim 16 of the patent application section compares the layers of the layout map with the flag layer, and sets the graphic LSMNel to be equal to the pattern of the Nith 円MEg in the layout map. And the θ layer if the graphic COMCOM and the graphic N〇—Mk+2—BULK have an intersection, the shot pattern LSMk is equal to C〇MMk, otherwise the set graph B is called empty=close, where k is greater than 〇 and less than the team Integer; Wood where the graphic LSMk represents the layer below the topmost layer in the layout. 18. The computer readable recording medium of claim n, wherein the instruction to check the layout according to the flag layer comprises: comparing the graphic size of the flag layer with a reference size; 29 200825824 UMCD -2005-0072 19631twf.doc/n If the size of the flag layer is larger than the reference size, a large-scale identification rule is performed; and if the size of the flag layer is smaller than the reference size, a small Dimensional identification rules. 19. The computer-readable recording medium according to claim 18, wherein the large-scale identification rule comprises: setting a graphic BJBCOR equal to a corner pattern of the flag layer; and setting a second layer of the MEh in the far layout The intersection of the graphic and the graphic B-BCOR, and setting the intersection result as the graphic METhCA, where h is an integer greater than 〇 and less than N+1, and N is the maximum number of layers of the layout; and checking whether the graphic METhCA is not Part of the graphic with a 45 degree angle configuration. 20. The computer-readable recording medium of claim n, wherein the instruction to check the layout map according to the flag layer comprises: if the flag layer intersects with a designated layer in the layout map, The floor plan is processed in a first program, otherwise the floor plan is processed in a second program. a method for inspecting a layout design rule for inspecting a layout diagram. The method includes: providing the layout map, wherein the layout map includes a plurality of layers; and some or all of the layers of the layout map Performing a union to obtain a flag layer; comparing the layers with the flag layer, and checking the layers accordingly; and eight 30 200825824 UMCD-2005-0072 19631twf.doc/n than the car flag layer The graphic size and a reference size are used to perform an identified rule. 22. If the layout design rule check mentioned in item 21 of the patent application scope is checked, 'the layout picture is the file of GDS ( gl〇bal along the system) format. 23. If the layout design rule check mentioned in item 21 of the patent application scope is checked, the flag layer is the union of all the layers in the layout. f. 24. The layout design rule check as described in claim 21 of the scope of the patent application, wherein the steps of checking the layers of the layer and the flag layer are included: The layers are compared with the flag layer; 比较 the comparison between a layer in the right layer and the flag layer is empty wood 5, indicating that the layer is an empty layer; a certain layer in the layer - the layer and If the comparison result of the flag layer is not =, the result is a light collection of the layer towels, the uppermost layer is the uppermost layer in the layout picture, and the other layers below it are the cloth sentence _ middle The inner layer; the topmost layer in the layout is checked with a top-level rule; and the inner layer in the layout is checked with an internal layer rule. 25·如巾明专利|& 围24th floor plan design rule inspection method, the towel is divided into the layout of the map of the _ and Lai standard; the steps of the rut include: 叮 set о shape Tqpmn is equal to the layer Με of the layout layer, where Ν is the maximum number of layers of the layout; Ν 31 200825824 UMCD-2005-0072 19631twf.doc/n If the flag layer BULK and the graphic T〇PMN If there is no intersection, the graph NO_MnJBULK is set equal to the graph of the flag layer BULK, otherwise the graph NOJBULK is set as an empty set; if the i-th layer layer MEi in the layout map and the graph NOJV[i+1 JBULK have an intersection, the graph TOPMi is set. Equal to the figure of the i-th layer layer MEi in the layout diagram, otherwise the graphic TOPMi is set to be an empty set, where i is an integer greater than 0 and less than N; if the graphic NO_Mi+1_BULK has no intersection with the graphic TOPM, the graphic NO__MiJBULK is set equal to the graphic NO_Mi+1 JBULK, otherwise the graphic NO_Mi_BULK is set as an empty set; and the graphics TOPMN~TOPMj are combined to obtain the uppermost layer in the layout, where j is the highest possible range in the layout as the uppermost layer Value. 26. The method for checking a layout design rule according to claim 25, wherein the step of comparing the layers of the layout with the flag layer further comprises: if the i-th layer in the layout If the layer MEi has no intersection with the graphic N0-Mi+1-BULK, the graphic is set equal to the graphic of the layer MEi, otherwise the graphic COMMi is set to be an empty set; wherein the graphic represents the graphic of the non-top layer in the layout. 27·If Shen 4 specializes in the method of checking the layout design rules described in item 26, the steps of comparing the layers of the layout map with the flag layer respectively include: 32 200825824 UMCD-2005-0072 19631twf.doc/n sets the graph LSMN-1 equal to the graph of the N_][layer layer MEn-] in the layout; and if the graph COMCOM has an intersection with the graph NO_Mk+2JBULK, the graph LSMk is set equal to COMMk, otherwise the graph is set LSMk is an empty set, where k is an integer greater than 〇 and less than N-1; where graph 1^1]\^ represents the layer of the layer below the topmost layer in the layout. 28. The method of checking a layout design rule according to claim 21, wherein comparing the graphic size of the flag layer with the reference size and performing the identification rule comprises: comparing the graphic size of the flag layer with The reference size, if the size of the flag layer is larger than the reference size, performs a large size identification rule; and if the size of the flag layer is smaller than the reference size, a small size identification rule is performed. 29. The method for inspecting a layout design rule according to the item μ of the patent application scope, wherein the large-scale identification rule comprises: e and the graphic B-BCOR is dedicated to the corner graphic of the flag layer; The pattern of the layer h layer MEh intersects with the pattern B-BCOR, and the intersection result is set to the graph eMEThCA, where h is an integer greater than 0 and less than N+1, and N is the maximum number of layers of the layout; and There are some graphics in the METhCA that are not configured at a 45-degree angle. 33 33 200825824 UMCD-2U05-0072 1963 ltwf.doc/n 30. The method for checking the layout design rule according to claim 21 of the patent application scope, further comprising: if the flag layer and one of the layout layers are specified If there is an intersection, the layout is processed by the first program, otherwise the layout is processed by the second program.
TW95145959A 2006-12-08 2006-12-08 Method for checking design rule of layout and computer readable recording medium for storing program thereof TWI321742B (en)

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US9760671B2 (en) 2012-10-31 2017-09-12 Np Komplete Technologies B.V. Rule checking

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* Cited by examiner, † Cited by third party
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US9760671B2 (en) 2012-10-31 2017-09-12 Np Komplete Technologies B.V. Rule checking
TWI603215B (en) * 2012-10-31 2017-10-21 Np康普利特科技有限責任公司 Design rule checking

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