TW200815544A - Silicone release plastic film with superior anti-static property - Google Patents

Silicone release plastic film with superior anti-static property Download PDF

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TW200815544A
TW200815544A TW096103192A TW96103192A TW200815544A TW 200815544 A TW200815544 A TW 200815544A TW 096103192 A TW096103192 A TW 096103192A TW 96103192 A TW96103192 A TW 96103192A TW 200815544 A TW200815544 A TW 200815544A
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film
polyoxyalkylene
coating
release
plastic film
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TW096103192A
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TWI346134B (en
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Jong-Uk Yoon
Jeong-Woo Lee
Moon-Bok Lee
Sang-Pil Kim
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Toray Saehan Inc
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/06Preparatory processes
    • C08G77/08Preparatory processes characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/06Biodegradable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/16Applications used for films

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Abstract

The invention concerns a unique silicone release composition and a silicone release plastic film with superior anti-static property obtained by inline coating for antistatic effect when producing a plastic film with the inventive composition. The silicone release liquid composition according to the invention comprises polysiloxane containing the hexenyl radical and the hydroxyl radical, hydrogen polysiloxane, platinum catalyst, etc. The inventive release liquid is applied in producing polyester stretched films to obtain a silicone release plastic film with all of good peeling force, release capability and antistatic effect as well as good interfacial anchorage between silicone and plastic, and also good silicone curing property by complete curing of silicone. To this end, the silicone release plastic film with superior anti-static property, characterized in that it consists of a substrate and a silicone release layer obtained by coating at least one side of the substrate with silicone release liquid with a given coating thickness through a coating process during the plastic film production process, the silicone release liquid comprising polysiloxane containing the hydroxyl radical and the hexenyl radical, and hydrogen polysiloxane.

Description

200815544 九、發明說明: L· W J^fr Λ ^ 1·技術領域 本發明係有關於具優異抗靜電性質之聚石夕氧燒離型塑 5膠膜,更特別地,係於高老化安定性及濕度之條件下老化 後具良好擦掉性質且亦以具羥基之聚矽氧烷層而具有抗靜 . 電效用之聚矽氧烷離型聚酯膜。 I:先前技術3 2·習知技藝說明 10 一般,聚矽氧烷離型劑係由聚矽氧烷主要成物、聚矽 氧烷硬化劑、催化劑等組成。主要成份係乙烯基聚矽氧烷, 且硬化劑係氫聚矽氧烷。 一般之離型層係藉由使脫離劑塗敷於基材(諸如,塑膠 膜、片材,或紙片、非機織之織物等)而獲得。公告之美國 15 專利申請案(USP 3,076,726、USP 3,169,884、USP 3,427,270 φ 及USP 3,900,6Π)揭示一種塗敷與矽氧烷混合之液體至基 材(例如,塑膠膜、纖維素膜,或紙片)產生聚矽氧烷層之方 法。 對於抗靜電效果,KR0175549揭示一種藉由含有矽酸 2〇鹽組份而獲得抗靜電效果之方法,但此膜具有與脫離能力 不同之物理性質。韓國專利KR 0157181案揭示之正離子性 抗靜包劑(四銨)於脫離能力展現問題。可藉由含有USp 5,318,724揭示之具羥基之矽酸鹽使親水性部份位向空氣, 因而能使水份吸收於表面上及形成達成抗靜電效果之水屏 5 200815544 故層、,’而獲得抗靜電效果。但是,於此情況,當使用獨自 a有^基之;糾,有關脫離能力之問題會展現。 【發明内容】200815544 IX. DESCRIPTION OF THE INVENTION: L·WJ^fr Λ ^ 1· Technical Field The present invention relates to a poly-stone-oxygenated plastic 5-ply film having excellent antistatic properties, and more particularly to high aging stability. It has a good rub-off property after aging under the condition of humidity and also has a polyoxyalkylene oxide layer having a hydroxyl group and a polyoxyalkylene-separated polyester film which is resistant to static electricity. I: Prior Art 3 2. Description of the Prior Art 10 In general, a polyoxyalkylene release agent is composed of a polysiloxane main component, a polyoxyalkylene hardener, a catalyst, and the like. The main component is vinyl polyoxyalkylene, and the hardener is hydrogen polyoxyalkylene. A typical release layer is obtained by applying a release agent to a substrate such as a plastic film, sheet, or paper sheet, non-woven fabric, or the like. U.S. Patent Application Serial No. (USP 3,076,726, U.S. Patent No. 3,169,884, U.S. Patent No. 3,427,270, and U.S. Pat. Paper sheet) A method of producing a polyoxyalkylene layer. For the antistatic effect, KR0175549 discloses a method for obtaining an antistatic effect by containing a component of bismuth citrate, but the film has physical properties different from those of detachment. The positive ionic antistatic agent (tetraammonium) disclosed in Korean Patent KR 0157181 shows problems in the ability to disengage. The hydrophilic portion can be placed in the air by the hydroxy acid-containing bismuth salt disclosed in US Pat. No. 5,318,724, so that the water can be absorbed on the surface and form a water-repellent layer which achieves an antistatic effect. Antistatic effect. However, in this case, when using alone, there is a basis; the problem of disengagement will be revealed. [Summary of the Invention]

發明概I 曰本U係用以解決上述問題而產生。本發明之目的係 提i、種藉由於膜製造方法顧使聚錢烧塗敷至聚醋膜 側或一側而降低線外費用,及藉由對聚石夕氧烧組成物 • 域藉由含有It基而具抗靜電效果之己稀基砂氧烧,及 、文良/、♦知之緊密鍵結之氫氫聚矽氧烷而於塗覆物具 優異抗靜電性質,之聚石夕氧院離型塑膠膜。 、 本t明切述及進_步之特徵及優點對熟習此項技藝 ;’】用於例示說明本發明較佳實施例之說明會變 明顯。 【貧施^冷式】SUMMARY OF THE INVENTION A U is used to solve the above problems. The object of the present invention is to reduce the out-of-line cost due to the film manufacturing method, and to reduce the cost of the off-line by applying the poly-smoke to the side or the side of the polyester film, and by using the composition of the poly-stone composition A dilute base oxy-sinter containing an It-based antistatic effect, and a close-bonded hydrogen hydride polyoxane of Wenliang/, knowing that it has excellent antistatic properties in the coating. Release plastic film. The features and advantages of the present invention will become apparent to those skilled in the art. [poor application cold type]

取用X達成4述目的之依據本發明之具優異抗靜電性質 氧烧離型塑膠膜特徵在於其係由—基材及—藉由於 产多、衣、方去期間級由塗覆方法以聚碎氧烧離型液體塗 二土材之至J一側而具有特定塗覆物厚度而獲得之聚矽 7、曰,1層所組成’其中,聚石夕氧燒離型液體包含4.5至30 所里%之3有搜基及己稀基之己稀基聚石夕氧院之固體物 3至3重惠%之氫聚矽氧烷,0.002%至0.005%之鉑催化 劑,及其餘為水。 車乂U,本發明之特徵在於含有經基及己稀基之聚石夕 6 200815544 氧烷具有下列化學式1之結構,且氫聚矽氧烷具有下列化學 式2之結構: [化學式1] R1 係 CH 二 CH2The use of X to achieve the above-mentioned purpose of the present invention has excellent antistatic properties. The oxygen-fired plastic film is characterized in that it is composed of a substrate and a coating method by a coating method. The crushed oxygen-burning liquid is coated with two soil materials to the J side and has a specific coating thickness to obtain a polythene, a crucible, and a layer composed of 'the poly-stone oxygen-containing liquid containing 4.5 to 30 3% of the total has a base and a dilute base of the rare earth polysulfide solids 3 to 3% of the hydrogen polyoxyalkylene, 0.002% to 0.005% of the platinum catalyst, and the rest is water . The rutting machine U is characterized in that the oxyalkylene containing a base group and a sulphur group has the structure of the following chemical formula 1, and the hydrogen polyoxymethane has the structure of the following chemical formula 2: [Chemical Formula 1] R1 CH two CH2

5 R2 係 CHr CHr CHr CHr CH=CHZ RH8i-0]^[SiK)]n -[Si-0]p-Rl5 R2 system CHr CHr CHr CHr CH=CHZ RH8i-0]^[SiK)]n -[Si-0]p-Rl

1 I _ % 棚 [化學式2] CH3 CHS ⑽1 I _ % Shed [Chemical Formula 2] CH3 CHS (10)

I II I

MrW-〇lr[Si-OjrSl- CHs CHI M 〇補 較佳地,於上示之化學式1及2中,本發明之特徵在於 10 111、11、卩、9及1>係等於或大於5之整數,且1.2<1'/111<2.5且 η/p> 3之條件被滿足。 更佳地,本發明之特徵在於聚矽氧烷離型層乾燥後之 塗覆物厚度係位於0.06與1.6/zm之間。 其後,本發明之實施例將參考本發明之實施例詳細描 15 述。 對於熟習此項技藝者顯見者係此等實施例僅欲用以更 詳細地例示說明本發明,但本發明之實圍不應受此等實施 例限制。 7 200815544 一般,聚酯或聚矽氧烷(諸如,聚對苯二曱酸乙二酯或MrW-〇lr[Si-OjrSl-CHs CHI M 〇 较佳 preferably, in the chemical formulas 1 and 2 shown above, the invention is characterized in that 10 111, 11, 卩, 9 and 1 are equal to or greater than 5 An integer, and a condition of 1.2 < 1 '/111 < 2.5 and η / p > 3 is satisfied. More preferably, the invention is characterized in that the coating thickness after drying of the polyoxynitride release layer is between 0.06 and 1.6/zm. Hereinafter, embodiments of the present invention will be described in detail with reference to the embodiments of the present invention. It is obvious to those skilled in the art that these embodiments are only intended to illustrate the invention in more detail, but the invention should not be limited by these embodiments. 7 200815544 In general, polyester or polyoxyalkylene (such as polyethylene terephthalate or

聚對苯二甲酸丁二酯)具有如介電物質般之低極性(見D.WPolybutylene terephthalate) has a low polarity like a dielectric substance (see D.W)

Van Krevelen Properties of Polymers,第 3版)。聚酉旨聚石夕氧 烷離型膜具有於脫離操作期間及保護黏著劑時會展現出之 5靜電作用,此作用可能造成外來物質被混合及顯現不安定 性。因為靜電係依溫度、相對濕度等而定,因而此被認為 膜皆會隨季節而具不安定性及老化不安定性。因此,對於 剝離之離型膜係具有獲得用於電及電子顯示器之黏著劑之 光學安定性且亦藉由聚矽氧烷離型膜内之抗靜電作用避免 10外來物貝被混合而獲传脫離均一性之重要技術性需求。 為此,發明人看出可藉由使用具有含羥基及己烯基之 聚矽氧烷結構之聚合物產生具優異剝離力及良好抗靜電效 用之離型膜。 依據本發明,當製造聚酿膜時,此膜係以聚石夕氧烧均 15勻塗覆,且形成之膜可被用於各種離型膜領域,諸如,極 化膜、用於製造多層陶究電容器(黯)之載體離型膜、 LCD保護離型膜、上覆膜、醫學療法、㈣保護膜、心電圖 保遵膜等,其等係具有與傳統離型膜不同之效用,作為所 有種類之離型膜市場之高階膜,其離型膜係由 20 膜Μ成。 依據本發明之具優異抗靜電 包改貝之♦石夕氣院離型塑膠 膜之一實施例之聚矽氧烷離型Van Krevelen Properties of Polymers, 3rd edition). Polyurethane polyoxane release film exhibits an electrostatic effect during the detachment operation and protection of the adhesive, which may cause foreign matter to be mixed and manifest unsafe. Since the static electricity is determined by temperature, relative humidity, etc., it is considered that the film will be unstable and aging unsatisfactory with the seasons. Therefore, the peeling release film has optical stability for obtaining an adhesive for electrical and electronic displays and is also prevented from being mixed by the antistatic action in the polyoxynitride release film. Out of the important technical needs of uniformity. For this reason, the inventors have found that a release film having excellent peeling force and good antistatic effect can be produced by using a polymer having a polyoxyalkylene structure having a hydroxyl group and a hexenyl group. According to the present invention, when a pulverized film is produced, the film is uniformly coated with a polysulfide, and the formed film can be used in various release film fields, such as a polarizing film for producing a multilayer. Ceramic carrier (黯) carrier release film, LCD protective release film, overlying film, medical therapy, (4) protective film, electrocardiogram, etc., which have different effects from traditional release film, as all A high-grade film of the type of release film market, the release film of which is composed of 20 films. According to the present invention, the polyoxyxane release type of the embodiment of the invention is an excellent antistatic package.

Pi材枓之組成物( 矽氧烷離型液體,,)包含4·5至3〇舌甘 匕、傻%為承 主30重ΐ%之含有羥基己 聚矽氧烷固體材料,0·3至3重^ s 丞之己烯基 *里之氫聚矽氧烷,0.002%至 8 200815544 0.005%之鉑催化劑,及其餘為水。 己烯基聚矽氧烷之固體材料之平均尺寸係 等級。 聚矽氧烷離型液體可直接塗敷至以聚酯、聚丙稀、聚 5乙烯、聚氣乙烯、耐綸、聚碳酸酯及塑料、牛皮紙、非機 織織物、布料等形成層狀之膜。較佳地,組成物内之固體 材料之含量係4.5至30重里%,更佳係6至20重量%。若固體 材料之含量少於4.5重量%,形成之膜於均一塗覆(覆蓋)展 現問題,且於脫離及剝離亦具有差的物理性質。若超過3〇 10重量%,離型液體内之固體材料之含量增加,造成增加之 黏度。因此,形成之膜於塗覆物展現諸如塗覆條狀物及塗 覆瑕疵等之問題。 較佳係聚石夕氧炫離型液體具有0.04至2.0克/公尺2,更佳 係0.06至1.6克/公尺2,等級之乾燥聚矽氧烷厚度含量。 15 下列之化學式1係顯示於依據本發明之具優異抗靜電 性質之聚矽氧烷離型塑膠膜之一實施例之聚秒氧燒離型液 體組成物中之含有羥基之己烯基聚矽氧烷之結構。下列之 化學式2顯示氫聚矽氧烷之結構: [化學式1] 20 R1#.CH-CH2 R2^CHr CHr CHr CH,- CH- CH2 9 200815544 R1^[Si^0]r[Si^0]n ^[Si^0]p^R1 [化學式2] iHi T ΐ liCHS 卜0]cf[S卜0]「幻- CH3The composition of the Pi material (the oxime-separating liquid,) contains 4·5 to 3 〇 匕 匕, silly% is the host 30% ΐ% of the hydroxy-containing polyoxy siloxane solid material, 0·3 Hydrogen polyoxyalkylene in the hexanyl group of 3 s 丞 0.00 0.00, 0.002% to 8 200815544 0.005% platinum catalyst, and the rest is water. The average size of the solid material of the hexenyl polyoxyalkylene is grade. The polyoxyalkylene release liquid can be directly applied to a film formed of polyester, polypropylene, polyethylene, polyethylene, nylon, polycarbonate, plastic, kraft paper, non-woven fabric, cloth, or the like. Preferably, the solid material in the composition is present in an amount of from 4.5 to 30% by weight, more preferably from 6 to 20% by weight. If the content of the solid material is less than 4.5% by weight, the formed film exhibits problems in uniform coating (covering), and also has poor physical properties in detachment and peeling. If it exceeds 3 〇 10% by weight, the content of the solid material in the release liquid increases, resulting in an increased viscosity. Therefore, the formed film exhibits problems such as coating strips and coating defects on the coating. Preferably, the polyoxo igniting liquid has a thickness of from 0.04 to 2.0 g/m 2 , more preferably from 0.06 to 1.6 g/m 2 , of a dry polysiloxane concentration. The following chemical formula 1 is a hydroxyl group-containing hexenyl polyfluorene in a polysecond oxygen-burning liquid composition of an embodiment of a polyoxyalkylene-separated plastic film having excellent antistatic properties according to the present invention. The structure of oxyalkylene. The following chemical formula 2 shows the structure of a hydrogen polyoxyalkylene: [Chemical Formula 1] 20 R1#.CH-CH2 R2^CHr CHr CHr CH,- CH- CH2 9 200815544 R1^[Si^0]r[Si^0] n ^[Si^0]p^R1 [Chemical Formula 2] iHi T ΐ liCHS Bu 0]cf[S Bu 0] "Magic - CH3

CHS H CHS 於上述化學式中,m、n、p、q及r係等於或大於5之整 5 數。再者,r/m係位於1.2 < r/m < 2.5之範圍,再者,η /p > 3 需被滿足。當r/m少於1.2,於固化具有問體。當大於2.5時, 聚矽氧烷層被固化後之未反應之氫聚矽氧烷與諸如丙烯系 之黏著劑反應,如此,反應造成剝離力增加。當n/p少於3, 抗靜電作用於形成之膜變成主要,如此獲得剝離力大於所 10 欲者之塗覆物膜。 再者,當塗敷作為依據本發明一實施例之具優異抗靜 電性質之聚矽氧烷離型塑膠膜之離型液體時,塑膠膜可被 施用至於未經拉伸之片材上之經電暈或電漿處理之單軸拉 伸之膜,或經電暈或電漿處理之雙軸拉伸之膜,或於其同 15 時雙軸拉伸前立即經電暈或電漿處理之諸如聚酯、聚乙 烯、聚丙烯、耐綸、聚碳酸酯、聚氯乙烯、PVA等之基材。 [實施例1-3] 實施例1及3將個別例示具有以下列之第1表所示般之 10 200815544 叙…抗靜電性質之聚錢燒離型歸膜。於此等實施例, 使用具有上述化學式出之結構之㈣,線内塗覆( 〇atlng)於聚㈣之製造方法期間被細。線内塗覆於凹版 :線棒式、溝槽式、逗點式、MpG(多壓力凹版式)之^ 3、6乾塗覆被施用時不會造成任何問題。再者,亦可使 义日種1式之網材控制塗覆物厚度。實驗巾使狀基材係 毛月人發展出之具有與用於t〇raysaehanmlcc離型載 —之可購知之XD5〇〇_38 _相似之表面特徵之B片材。在 10 ,為製造”B片材”,”A片材,,係先藉由於聚賴製造方法 峨塑聚_聚合化切片而製造,然後,將其冷卻製 成非、、、。晶性片材。然後,Β片材係藉由以縱方向拉伸”Α片 材”而製得。 於形成之B片材上,線内塗覆被應用,其塗覆方式係塗 敷包合10、8、6重量%之含有羥基及己烯基之己烯基聚矽 5氧烷之固體材料(個別對於實施例1、2及3)、1重量%之氫聚 石夕氧燒、〇·003%之鉑催化劑,及其餘為水之聚矽氧烷離型 液體。聚矽氧烷離型層乾燥後之塗覆物厚度係〇·12μιη。 [比較例1-3] 比較例1至3係與依據實施例1至3製造者相同但其係個 2 0 別於第1表所示之條件下製造而製得之聚矽氧烷離型塑膠 膜。 其後,應用於依據本發明之實施例及比較例之實驗例 將更詳細地說明。 [實驗例] 11 200815544 膠帶剝籬力 塗覆聚矽氧烷後之固化膜係與於以聚矽氧烷塗覆之表 面上之膠帶TESA 7475結合及組合。70克/公分2之鐵棒置於 組合之離型膜上,且於23T:及50% RH維持24小時。然後, 5 其剝離力以得自Chemlnstrument Co之AR1000以180度之剝 離角及0·3公尺/分鐘之剝離速度測量三次。然後,測量值被 平均。 老化後之擦桓性皙 以聚矽氧烷塗覆之膜與得自JEIOTECH Co之ΤΗΙ180於 10 50°C及95% RH維持3天。然後,以手指強烈地擦掉以對於 聚酉旨膜上之聚矽氧烷層作擦掉性質測試,然後,檢查固化 聚矽氧烷及PET膜間之黏著狀況。 表面電阻 離型膜於23°C及60%相對濕度維持8小時以便以表面 15電阻測量機評估抗靜電效用,且表面電阻係以Ω/□表示。 盘留之黏荖性屮你丨 殘留之黏著性比例係一種測量聚矽氧烷層固化程度之 間接方法。於使膠帶附著於以聚矽氧烷塗覆之層上之後, 膠帶於特定時間消逝後去除。然後,膠帶被附著至未經處 20理之膜上以檢查膠帶之黏著性變化。在此,若殘留之黏著 性比例係95%,其係意指對於5%,聚石夕氧烧係於無任何反 應下被轉移。 12 200815544 [第1表] 類別 條件 剝離 力 形成之黏 著比例 表面電阻 剝離力, 表面電阻 n/p r/m 固體材 料 (重量) 塗覆物 厚度 實施例1 13 1.5 10 0.12 15.5 95.4 3·2*10Λ8 ◎ 實施例2 13 L5 8 0.08 233 95.7 5.7*10Λ9 〇 實施例3 13 1.5 6 0.06 27.8 94.8 7.2*10Λ9 〇 比較例1 8 3 8 0.08 75.4 97.8 1·3*10Λ8 ▲ 比較例2 8 3 6 0.06 83.8 97.5 2·5*10Λ9 ▲ 比較例3 2.5 3 10 0.12 354.3 98.0 4·7*10Λ7 ▲ 註 ◎優異;〇良好;▲差 於上述第1表中,”固體材料(重量%)"表示聚矽氧烷離CHS H CHS In the above chemical formula, m, n, p, q and r are equal to or greater than 5 integers. Furthermore, the r/m system is in the range of 1.2 < r/m < 2.5, and further, η /p > 3 needs to be satisfied. When r/m is less than 1.2, it has a problem in curing. When it is more than 2.5, the unreacted hydrogen polyoxyalkylene which is cured after the polyoxyalkylene layer is cured reacts with an adhesive such as propylene, and thus, the reaction causes an increase in peeling force. When n/p is less than 3, the antistatic effect on the formed film becomes dominant, thus obtaining a coating film having a peeling force greater than that of the desired one. Further, when a release liquid which is a polyoxyalkylene-separated plastic film having excellent antistatic properties according to an embodiment of the present invention is applied, the plastic film can be applied to the unstretched sheet. A uniaxially stretched film of corona or plasma treatment, or a biaxially stretched film treated by corona or plasma, or treated with corona or plasma immediately prior to biaxial stretching at 15 o'clock. Substrates such as polyester, polyethylene, polypropylene, nylon, polycarbonate, polyvinyl chloride, PVA, and the like. [Example 1-3] Each of Examples 1 and 3 will be exemplified by a polyanthmized release film having an antistatic property as shown in the following Table 1. In these examples, (4) having the structure of the above chemical formula was used, and the in-line coating (〇atlng) was fine during the production method of the poly(tetra). In-line coating on intaglio: wire rod, grooved, comma, MpG (multi-pressure gravure) 3, 6 dry coating is applied without causing any problems. Furthermore, it is also possible to control the thickness of the coating by the mesh type of the Japanese type. The test towel-like substrate was developed into a B-sheet having a surface characteristic similar to that of the commercially available XD5〇〇_38_ for the t〇raysaehanmlcc release load. At 10, in order to manufacture a "B sheet", "A sheet" is first produced by plasticizing a poly-polymerized section by a poly Lai manufacturing method, and then cooling it to a non-, crystalline, crystalline sheet. Then, the enamel sheet is obtained by stretching the Α sheet in the longitudinal direction. On the formed B sheet, the in-line coating is applied, and the coating method is coating coating 10, 8. 6 wt% of a solid material of hexenyl polyfluorene oxane containing a hydroxyl group and a hexenyl group (individually for Examples 1, 2 and 3), 1% by weight of hydrogen polysulfide, 〇·003 The platinum catalyst of %, and the remaining polyoxane deionized liquid of water. The thickness of the coating after drying of the polyoxynitride release layer is 〇·12 μιη. [Comparative Example 1-3] Comparative Examples 1 to 3 A polyoxyalkylene release plastic film produced in the same manner as in the examples 1 to 3 except that it is manufactured under the conditions shown in Table 1. Thereafter, it is applied to the practice according to the present invention. The experimental examples of the examples and the comparative examples will be explained in more detail. [Experimental Example] 11 200815544 The cured film of the tape stripping force coated with polyoxyalkylene is coated with polyoxyalkylene oxide. The surface tape TESA 7475 was combined and combined. A 70 g/cm 2 iron rod was placed on the combined release film and maintained at 23T: and 50% RH for 24 hours. Then, 5 its peel force was obtained from Chemlnstrument Co. The AR1000 was measured three times at a peel angle of 180 degrees and a peel speed of 0.33 m/min. Then, the measured values were averaged. The rubbed after aging was coated with a polysiloxane and obtained from JEIOTECH Co. Thereafter, the crucible 180 was maintained at 10 50 ° C and 95% RH for 3 days. Then, it was strongly rubbed off with a finger to test the rubbing property of the polyoxyalkylene layer on the polythene film, and then the cured polyoxyalkylene was examined. Adhesion between PET film and surface film. The surface resist release film was maintained at 23 ° C and 60% relative humidity for 8 hours to evaluate the antistatic effect with a surface 15 resistance measuring machine, and the surface resistance was expressed in Ω / □. Adhesiveness The adhesive ratio of your residue is a method of measuring the degree of cure of the polyoxyalkylene layer. After the tape is attached to the layer coated with polyoxymethane, the tape is removed after a certain time has elapsed. Then, the tape is attached to the film that has not been treated In order to check the adhesion change of the tape, here, if the residual adhesive ratio is 95%, it means that for 5%, the polyoxoxime is transferred without any reaction. 12 200815544 [Table 1] Adhesive ratio of surface condition peeling force Surface resistance peeling force, surface resistance n/pr/m Solid material (weight) Coating thickness Example 1 13 1.5 10 0.12 15.5 95.4 3·2*10Λ8 ◎ Example 2 13 L5 8 0.08 233 95.7 5.7*10Λ9 〇Example 3 13 1.5 6 0.06 27.8 94.8 7.2*10Λ9 〇Comparative Example 1 8 3 8 0.08 75.4 97.8 1·3*10Λ8 ▲ Comparative Example 2 8 3 6 0.06 83.8 97.5 2·5*10Λ9 ▲ Comparative Example 3 2.5 3 10 0.12 354.3 98.0 4·7*10Λ7 ▲ Note ◎ excellent; 〇 is good; ▲ is worse than the above table 1, "solid material (% by weight) " indicates polyoxane separation

型液體之組成物中之π含有羥基及己烯基之己烯基聚矽氧 烷之固體材料"。 5 由上述第1表看出,當使用實施例1至3所述之相同聚矽 氧烷分子結構,發明人可看出乾燥之塗覆層愈厚時,剝離 力愈低。發明人亦可看出關於氫聚矽氧烷内所含之羥基重 複單元r及含己烯基官能基之矽氧烷之己烯基之重複單元 m,r/m值愈高時,殘留之黏著性比例愈高。發明人因此可 10 由上述實施例1至3及比較例1至3看出氫聚矽氧烷及聚對苯 二曱酸乙二酯與丙烯系膠帶間之高反應性。n/p值(此值係藉 13 200815544 由使具有己烯基官能基之石夕氧烷之二甲基重複單元與經基 重複單元比較而獲得)愈小時,剝離力愈大且抗靜電效用愈 高。羥基重複單元愈高時,抗靜電效用愈高,但剝離力變 更大。綜言之,於實施例1中可使用適當含量之固體材料達 5到良好剝離力及抗靜電效用。於實施例2及3,更大之剝離 力由於比實施例1更少含量之塗覆材料而被測得。但是,與 實施例相比較,比較例1至3於剝離力及抗靜電效用展現不 令人滿意之程度。 再者,於製造接續式雙轴拉伸膜(即,雜伸欲拉伸之 10膜前施用線内塗t,然後以濕離型液體塗覆此膜),與傳統 之線外塗覆相比,藉由本發明,可降低加工處理_ 合之外來材料之量。若更多步驟包含於此加工處理方: 中,必然會具有更高之具有昆合之外來材料之可能性。外 來材料於電子應用之情況由於較大之剝離力及轉移之黏著 層而可能造成嚴重之外部缺失。藉由本發明,可藉由以針 對習知技藝問題而提出之具有此申請案所述之獨特結構化 學式之石夕氧烧施行線内塗覆而產生優異之離型膜。 习需注意上述實施例係例示說明(而非限制)本發明,且熟 γ此項技藝者能於未偏離藉由所㈣請專利範圍所界定之 ^明範圍下设計許多另外之實施例。 最佳功效 精由本电明,可猎由達成良好抗靜電效用及良好脫離 月匕力而降低附著於聚醋膜上灰塵或外來材料之量。因此, 本發明之前競驗高功能,_型膜、Μα。離型戴體 14 200815544 - 膜、極化離型膜、極化保護離型膜(分隔器)、醫學用離型膜、 - 電子應用、用於保護顯示器之離型膜等。 【圖式簡單說明】 (無) 5 【主要元件符號說明】 (無)In the composition of the liquid type, π contains a solid material of a hydroxy group and a hexenyl group of a hexenyl polyoxyalkylene. 5 From the above Table 1, it can be seen that when the molecular structure of the same polysiloxane described in Examples 1 to 3 is used, the inventors can see that the thicker the coating layer is, the lower the peeling force is. The inventors can also see that the repeating unit m, the higher the r/m value of the hydroxy group repeating unit r contained in the hydrogen polyoxyalkylene and the hexenyl group of the decyloxy group containing the hexenyl functional group, remains. The higher the adhesion ratio. The inventors can therefore see the high reactivity between the hydrogen polyoxymethane and the polyethylene terephthalate and the acrylic tape from the above Examples 1 to 3 and Comparative Examples 1 to 3. The smaller the n/p value (this value is obtained by comparing the dimethyl repeating unit of the hexanyloxy group having a hexenyl functional group with the transradical repeating unit), the greater the peeling force and the antistatic effect. The higher the height. The higher the hydroxyl repeating unit, the higher the antistatic effect, but the peeling force becomes larger. In summary, a suitable amount of solid material can be used in Example 1 to achieve good peel strength and antistatic effect. In Examples 2 and 3, the greater peel force was measured due to a lower amount of coating material than in Example 1. However, Comparative Examples 1 to 3 exhibited unsatisfactory peel strength and antistatic effect as compared with the examples. Furthermore, in the manufacture of a continuous biaxially stretched film (i.e., applying a coating in the line before the 10th film to be stretched and then coating the film with a wet release liquid), and conventional off-line coating By the present invention, it is possible to reduce the amount of material to be processed. If more steps are included in this processing: in the middle, there is bound to be a higher probability of having a material that is outside. The use of foreign materials in electronic applications can cause serious external defects due to the large peeling force and the transfer of the adhesive layer. By the present invention, an excellent release film can be produced by performing in-line coating with a unique structural formula of the invention described in the application of the present application. It is to be understood that the above-described embodiments are illustrative and not restrictive, and that the skilled artisan can design many additional embodiments without departing from the scope of the invention as defined by the scope of the invention. Optimum Efficacy This product can be used to reduce the amount of dust or foreign materials attached to the polyester film by achieving good antistatic effect and good separation from the moon. Therefore, the present invention has previously competed for a high function, _ type film, Μα. Released body 14 200815544 - Membrane, polarized release film, polarized protective release film (separator), medical release film, - electronic applications, release film for protecting displays, etc. [Simple description of the diagram] (none) 5 [Description of main component symbols] (none)

1515

Claims (1)

200815544 十、申請專利範圍: 1. 一種具優異抗靜電性質之聚矽氧烷離型塑膠膜,特徵在 於其包含: 一基材;及 5 一聚矽氧烷離型層,其係藉由於塑膠膜製造方法期間經 由塗覆方法以聚矽氧烷離型液體塗覆該基材之至少一 側而具特定塗覆物厚度而獲得, 其中,該聚矽氧烷離型液體包含4.5至30重量%之含有羥 基及己烯基之己烯基聚矽氧烷之固體物質,0.3至3重量 10 %之氫聚矽氧烷,0·002%至0.005%之鉑催化劑,及其餘 為水。 2. 如申請專利範圍第1項之膜,其特徵在於含有該羥基及該 己烯基之該聚矽氧烷具有下列化學式1之結構,且該氫聚 矽氧烷具有下列化學式2之結構: 15 [化學式1] R1 係 CH=CHZ R2 係 CH2-CH2-CH7-CHr CH=CH2 rife m CH _ 卜 〇Hs 卜〇lr[ 1 R2 Oft ( [化學式2] Γ卜 0kR1 1 16 200815544 CHs CHs CHi H3C-[ShO]〖r[SiH3]r-i卜 CHi 1人I CHS H CHS 。 3.如申請專利範圍第2項之膜,其特徵在於,在申請專利範 圍第2項中之化學式1及2中,m、η、p、q及r係等於或大 於5之整數,且1.2 < r/m < 2.5及η/p> 3之條件被滿足。 5 4.如申請專利範圍第1至3項中任一項之膜,其特徵在於該 聚矽氧烷離型層乾燥後之塗覆物厚度係位於0.06與1.6// m之間。 17 200815544 七、指定代表圖: (一)本案指定代表圖為:第()圖。(無) 、 (二)本代表圖之元件符號簡單說明: (無) 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式:200815544 X. Patent application scope: 1. A polyoxyalkylene release plastic film with excellent antistatic properties, characterized in that it comprises: a substrate; and 5 a polyoxynitride release layer, which is made of plastic The film manufacturing method is obtained by coating at least one side of the substrate with a polyoxynitride release liquid by a coating method with a specific coating thickness, wherein the polyoxyalkylene release liquid contains 4.5 to 30 weights. % of a solid matter of a hexenyl polyoxyalkylene having a hydroxyl group and a hexenyl group, 0.3 to 3 weight% of a hydrogen polyoxyalkylene oxide, 0.002% to 0.005% of a platinum catalyst, and the balance being water. 2. The film of claim 1, wherein the polyoxyalkylene having the hydroxyl group and the hexenyl group has the structure of the following Chemical Formula 1, and the hydrogen polyoxymethane has the structure of the following Chemical Formula 2: 15 [Chemical Formula 1] R1 is CH=CHZ R2 is CH2-CH2-CH7-CHr CH=CH2 rife m CH _ 〇Hs 〇 〇lr[ 1 R2 Oft ( [Chemical Formula 2] Γ卜0kR1 1 16 200815544 CHs CHs CHi H3C-[ShO] [r[SiH3]ri, CHi, 1 person, I CHS H CHS. 3. The film of claim 2, characterized in that it is in the chemical formulas 1 and 2 in the second claim of the patent application. , m, η, p, q, and r are integers equal to or greater than 5, and the conditions of 1.2 < r/m < 2.5 and η/p > 3 are satisfied. 5 4. For the patent scopes 1 to 3 A film according to any one of the preceding claims, characterized in that the thickness of the coating after drying of the release layer of the polyoxyalkylene is between 0.06 and 1.6//m. 17 200815544 VII. Designation of representative drawings: (1) Designation of the case The representative picture is: the () picture. (none), (b) the simple description of the symbol of the representative figure: (none) 8. If there is a chemical formula in this case, please reveal the most Shows the chemical formula of the invention is characterized in:
TW096103192A 2006-09-29 2007-01-29 Silicone release plastic film with superior anti-static property TWI346134B (en)

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Publication number Priority date Publication date Assignee Title
JPH0635546B2 (en) 1986-08-26 1994-05-11 信越化学工業株式会社 Silicone composition for release film
JP4101469B2 (en) 2001-04-10 2008-06-18 信越化学工業株式会社 Semiconductive silicone rubber composition
JP2003292895A (en) 2002-03-29 2003-10-15 Toray Ind Inc Polysiloxane composition and releasing film
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