TW200814280A - Power supply layout for integrated circuit - Google Patents

Power supply layout for integrated circuit Download PDF

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TW200814280A
TW200814280A TW95133251A TW95133251A TW200814280A TW 200814280 A TW200814280 A TW 200814280A TW 95133251 A TW95133251 A TW 95133251A TW 95133251 A TW95133251 A TW 95133251A TW 200814280 A TW200814280 A TW 200814280A
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Taiwan
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ring
power supply
power
metal
ground
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TW95133251A
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Chinese (zh)
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TWI307952B (en
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Jian-Liang Chen
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Ali Corp
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Abstract

A component placed in an integrated circuit reduces the electro-magnetic interference, the noise interference, the EM, the IR drop and the cost due to producing printed circuit boards and increases the reliability of chips based on a stack structure. In the stack structure, a metal layer is stacked under a power ring, and another one is stacked under a ground ring. Hence, there is a great stack capacitance produced in the stack structure.

Description

200814280 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種積體電路,特別 體電路之電源供應連結線路及其備製方法。,、知種知 【先前技術】 在競爭激烈的時代,產品不只要求產品上市的速度要快, 就連產品的品質也要要求,因此積體電路的電源可靠度(p_ reliability)設計相對日益重要。因為積體電路的可靠度影響產品 的良率及壽命,相對的影響產品的品質及顧客滿意=曰广 ❿目前韻電路的電·設計主要可分為三種,分別是電源 環(P_mg),電源帶(ρ_及電源網㈣赠歸)。電 源環是把積體電路整個⑽住.:,且因為要與電壓源連接並供給 紐^路所有電流,_單位電流密絲高,相對金屬寬度— 疋,見才可承S,電源帶是負責運送電流到·電路的每—個 角落’因為電源帶電阻會消耗電流,因此電源帶的寬度也是相 對要寬才可卿電流消耗;電_功能就是從電源帶上取 出電流然後供给積體電路上局部的單位元件(Std⑽),因為承 刪流:大所以金屬線寬度不用粗,但為了要一^ /瓜,所以迅源_的距離要密且均勻。200814280 IX. Description of the Invention: [Technical Field] The present invention relates to an integrated circuit, a power supply connection line of a special body circuit, and a preparation method thereof. In the era of fierce competition, products not only require the speed of product launch, but also the quality of products, so the power supply reliability (p_reliability) design of integrated circuits is relatively important. . Because the reliability of the integrated circuit affects the yield and life of the product, it affects the quality of the product and customer satisfaction. The current power and design of the current rhyme circuit can be divided into three types, namely the power supply ring (P_mg), and the power supply. With (ρ_ and power network (four) gift return). The power supply ring is the whole (10) of the integrated circuit.:, and because it is connected to the voltage source and supplies all currents of the circuit, the _ unit current is high, and the relative metal width is 疋, see the S, the power supply is Responsible for carrying current to every corner of the circuit' because the power supply belt resistor consumes current, so the width of the power supply belt is relatively wide to be able to consume current; the power_ function is to take current from the power supply belt and supply it to the integrated circuit. The local unit component (Std(10)), because the cut flow: large, the metal line width is not thick, but in order to have a ^ / melon, the distance of the source _ should be dense and uniform.

D 、二:?可#度的因素有四個,分別為電壓降(IR int〇Pf );〇 ^ ^(EM) ? 1 ^ ^ ^ (EMI) ^ ^ ^ ^ (Noise ererence弟―圖係為習用技術之積體電路之示意圖。積 200814280 體電路1包含第一電源環no、第一接地環12〇 二第:接地環122、連接孔15、第—電源帶i3〇、第:電: f 132、弟二電源帶134及第四電源帶136。 恭 ’、 巧層,亚在不同料接處會打上連接孔15加以連接。電= ,疋透過連接孔15與第-電源環削、第—接地環12、: 或第二接地環122連接。因為二不同電位之金二 ==Γ’所以一般積體電路會藉由金屬層側:: 側这之間曾產生寄生電容Qide,如第二圖所示。 、一 八=寄生f容小是與二金辭板長度成正比及盘 了益屬層距•成反*,—般電源環或接地環因為金屬層的側 =⑺,而且是固定的’所以只能藉由增長金屬層的長度(= 或結短一金屬層之間距_來增加寄生電容 ^來 的寄生電容cslde有限,原因是寄生雷 本出末 藉由金屬層側邊面積來當電容^板產生的主要來源是 【發明内容】 本發明為-積體電路之電源供應連結線路及其備繁方 法,,分別在電源環與接地環下附加一金屬層,使電源環 與金屬層間、接地環與全屬厗門年 ^ 兩金屬層_ 舰環間、及 包谷’使和脰電路内之等效雷容揾 昇=2制電斜,雜訊干擾, 路瓜的I阻值,k幵積體電路承載電流的 低 作印刷電路板的成本。 木k低衣 根據本發明所提出之積體電路之電 其備製方法,其包含電源環、接地環、複數個=路複 200814280 數個電源焊墊、$ 換金屬層及複數:二焊塾、複數個 層’·金·係直接二,!與^地環皆附加一金屬 源環,或傳於畜命f連、、、口屬哀,用以傳輸正電壓至電 路運作之所接地環’來進-步供應該積體電 屬線,用以提供係直接地連結於部分的該些金 部分的金屬線地焊塾係直接地連結於 之連接孔連結於部。換金屬層係透過部分 接孔及換金屬層;:二線,;=源帶係透過部分之連 間。連結於母一電源環之間及每-接地環之 【實施方式】 明麥考第二圖所示,其係為本 雕帝 + 匯流排之示意圖。積體電路2包含至少 個物L25、複數個電源焊墊 28ail夂28b固i妾地^塾(gr〇Und Pad) 27、複數個換金屬層 28a與28b及稷數個金屬線與2%。 連,孔25係用來作為不同金屬層之間的連結。換金屬 二换叫28b則是利用連接孔25作為不同金屬層之間傳輸 =樑。金祕29a係直接連結於上述之電轉墊=3 2 m係直接連結於上述之接地焊墊27。上収金屬環 ,為-弟-電源環(power ring) 210及一第一接地環 k(g舰ndnng) 22G’這些金屬環皆係為電源匯流排(power us用以傳輪供應電源(p〇wersupply)所提供之電流至 積體電路内部’使積體電路得以運作。每—電源焊塾^ 係用以透過其所對應之金屬、線施,來連結於第一電源環 200814280 210,並知供一正電壓(positive v〇itage)至第一電源環 210,而每一接地焊墊27係用以透過其所對應之金屬線 29b ’及金屬線29b利用連接孔25所連結對應之換金屬層 28a與28b,來連結於第一接地環22〇,並提供一負電厣 (negadve voltage)至第一接地環22〇,使供應電源所提^ 之電流得以進-步地傳送至積體電路内。其中,此正 通稱為VDD,而負電源通稱為vss。 "、There are four factors of D and 2: ?#, which are voltage drop (IR int〇Pf); 〇^ ^(EM) ? 1 ^ ^ ^ (EMI) ^ ^ ^ ^ (Noise ererence-- Schematic diagram of the integrated circuit of the conventional technology. Product 200814280 The body circuit 1 includes a first power supply ring no, a first grounding ring 12〇2: a grounding ring 122, a connecting hole 15, a first power supply belt i3〇, a first: f 132, the second power supply belt 134 and the fourth power supply belt 136. Gong', the layer, the sub-connection at the different material joints will be connected with the connection hole 15. Electric =, 疋 through the connection hole 15 and the first-power ring cutting, The first grounding ring 12, or the second grounding ring 122 is connected. Because the two different potentials are gold==Γ', the general integrated circuit will generate a parasitic capacitance Qide between the metal layer side:: side, such as The second figure shows that, one eight = parasitic f capacity is proportional to the length of the two gold plates and the plate is beneficial to the layer distance • into the inverse *, the general power ring or ground ring because the side of the metal layer = (7), And it is fixed 'so only by increasing the length of the metal layer (= or the junction is shorter than the distance between the metal layers _ to increase the parasitic capacitance ^ the parasitic capacitance cslde limited The reason is that the parasitic ray is out of the metal layer side area to be the main source of the capacitor board. [Invention] The present invention is an integrated circuit power supply connection line and its preparation method, respectively, in the power supply A metal layer is attached under the ring and the grounding ring, so that the equivalent lightning capacity in the power supply ring and the metal layer, the grounding ring and the entire metal door layer _ the ship ring, and the Baogu 's and the circuit are soared = 2 power supply slant, noise interference, I resistance value of road melon, low cost of printed circuit board for carrying current of k 幵 体 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 木 木 木 木 木 木 木 木 木 木 木The method comprises a power ring, a grounding ring, a plurality of = Lu Fu 200814280, a plurality of power pads, a metal layer and a plurality of layers: a second soldering cymbal, a plurality of layers, a gold, a direct two, and a ground ring Attaching a metal source ring, or transmitting it to the grounding ring of the life of the circuit, to transmit the positive voltage to the grounding ring of the circuit operation, to supply the integrated electric line directly Wire-bonding the wire to the portion of the gold portion directly The connecting hole is connected to the connecting portion. The metal changing layer is transmitted through the partial connecting hole and the metal changing layer; the second line; the source line is connected to the connecting portion, and is connected between the mother and the power ring and the grounding ring. [Embodiment] The second picture of Ming Mai is shown in the figure, which is a schematic diagram of the engraving + bus bar. The integrated circuit 2 contains at least one object L25, a plurality of power pads 28ail夂28b. (gr〇Und Pad) 27. A plurality of metal-changing layers 28a and 28b and a plurality of metal wires and 2%. The holes 25 are used as a connection between different metal layers. Changing the metal 2B is to use the connection hole 25 as a transmission between different metal layers = beam. The gold secret 29a is directly connected to the above-mentioned electric pad = 3 2 m and is directly connected to the above-mentioned ground pad 27. The upper metal ring is a power ring 210 and a first ground ring k (g ship ndnng) 22G'. These metal rings are power bus bars (power us for power supply (p power supply) 〇wersupply) The current supplied to the internal circuit of the integrated circuit enables the integrated circuit to operate. Each power supply is connected to the first power supply ring 200814280 210 through its corresponding metal and wire. A positive voltage is applied to the first power supply ring 210, and each of the ground pads 27 is connected through the corresponding metal wire 29b' and the metal wire 29b by the connection hole 25. The metal layers 28a and 28b are connected to the first grounding ring 22A and provide a negative voltage to the first grounding ring 22〇, so that the current supplied by the power supply can be further transferred to the integrated body. Inside the circuit, where this is called VDD, and the negative power is called vss.

」如此-來,第-電源環210與第一接地環22〇之 i目t對應ΐ相互平行’因此’請參考第四圖所示,其係為 本發明内容之電賴及接地㈣所產生之二 :電rc電源接地環-的組 生电谷‘。而寄生電容Cside之關係式如下·· side D2 離m: -的值係隨著高度τ、長声l及 ::而改變’亦即寄生電容cslde的值與高户:: 成正比,與距離D2成反比。高度^ 及長度 地環220的厚度。長度L係為第1::: 「220的長度。距離D2 —電# 2 〇 弟-接地環220之間的距離 為电屌% 210 倍長。 你為圖—中矩離D1的 所,而,這樣單只有第-電源環21() =成之電源匯流排結構,使積體所接地環2: 然很有限,因此本發明的寄 =讀每210及第-接地環細的 步地分別. 运金屬層,且附加的金屬層分別與 ^附加了 甩原%之1〇及第, 200814280 接地環220相隔一間距,如第三圖所示。 因此,本發明内容之積體電路2更進一步地包 二電源環212及-第二接地環222。附加在第一電源 下之金制係為第二接地環222,附加在第—接地環 下之金屬層係為第二電源、環212。第二電源環加盘 接地環222亦相隔一間距。 /、乐— 而且,上述之電源焊墊26不僅可以透過其所對應之全 1 29a來連結於第—電源環21(),亦可以透過 之金屬線29a,或/以及全屬妗、杀、证4 7 t應 換全屬心)、二屬 透過連結孔25所連結的 ^屬層28a,來連結於上述之第二電源環212。上 不僅可以透過其所對應之金屬線视來連 U 線2%所連結的換金屬層28卜來連結於上述 接地環220。因此’積體電路2可由電轉墊%, 处匕,、所對應之金屬線來 帝 一 29a^ ^;; t« i地=輸入ί電屋至第二電源環212。積體電路2可由 第’透過其所對應之金屬線29b來輪人負電屡至 ”及換金屬層28b來輸入屬線外、連接孔 u木掏入負電壓至第一接地環22〇。 結構的電四圖所不’其係為本發明内容之堆疊 環210盘第:接地對應且相互平行’因此第-電源 行,因此筮_十 衣222亦係相互對應且相互平 口此弟-琶源環212與第二接地環222之間亦會形成 200814280 二寄生電容cslde。由於第二電源環212與第二接地 η ^刀別係為附加在第一接地環22〇與第一電源'^ 金屬層,因此,第一電源環21〇與第二' 〃之 對應且相互平行,因而第—電源環=相互 之間會形成―寄生電容cP]ate。同理,第, 二電源環212亦係相互對應且相互和亍,因此弟 220與第二電源環222之間亦會形成一寄接地 可生電容Cplate之關係式如下: 叫咖。而Thus, the first power supply ring 210 and the first grounding ring 22 are in parallel with each other. Therefore, please refer to the fourth figure, which is generated by the power supply and grounding (4) of the present invention. The second: the electric rc power grounding ring - the group of electricity valley '. The relationship between the parasitic capacitance Cside is as follows: · side D2 The value of m: - changes with the height τ, long sound l and ::: 'that is, the value of the parasitic capacitance cslde is proportional to the high:::, and the distance D2 is inversely proportional. Height ^ and length The thickness of the ground ring 220. The length L is the length of the first::: "220. The distance between the distance D2 and the electric #2 〇-the grounding ring 220 is 210 times longer than the electric 屌 。. You are the figure - the middle moment is away from D1, and Therefore, only the first power supply ring 21 () = the power supply bus structure, so that the grounding ring 2 of the integrated body is very limited, so the send/read of each 210 and the ground ring of the present invention are finely stepped respectively. The metal layer is provided, and the additional metal layer is respectively spaced apart from the grounding ring 220 of the 200814280, as shown in the third figure. Therefore, the integrated circuit 2 of the present invention is further Further, the power supply ring 212 and the second grounding ring 222 are included. The gold system attached to the first power supply is the second grounding ring 222, and the metal layer attached to the first grounding ring is the second power supply and the ring 212. The second power supply ring and the grounding ring 222 are also separated by a distance. /, Le - Moreover, the above-mentioned power pad 26 can be connected not only to the first power ring 21 () through its corresponding all-one 29a, but also Through the metal wire 29a, or / and all belong to the 妗, kill, the certificate 4 7 t should be replaced by the whole heart), the two genus through the connection hole 25 The junction layer 28a is connected to the second power supply ring 212. The grounding ring 220 can be connected to the grounding ring 220 by connecting the metal-changing layer 28 connected to the U-line 2% through the corresponding metal line. Therefore, the 'integrated circuit 2 can be made up of the electric rotating pad %, in the 匕, the corresponding metal wire to the emperor 29a ^ ^;; t « i ground = input ί electric house to the second power supply ring 212. The integrated circuit 2 can be The first 'through the corresponding metal wire 29b, the wheel is negatively charged repeatedly" and the metal layer 28b is changed to input the outside of the line, and the connection hole u receives a negative voltage to the first ground ring 22A. The electric four-figure of the structure is not the same as the stacking ring 210 of the present invention: the grounding corresponds to and is parallel to each other 'therefore the first-power supply line, so the 筮_十衣222 also corresponds to each other and is flattened to each other-琶A 200814280 two parasitic capacitance cslde is also formed between the source ring 212 and the second ground ring 222. Since the second power supply ring 212 and the second grounding power θ are attached to the first grounding ring 22〇 and the first power supply metal layer, the first power supply ring 21〇 corresponds to the second “〃” and corresponds to each other. Parallel, so the first - power supply ring = will form a "parasitic capacitance cP]ate. Similarly, the second power supply ring 212 also corresponds to each other and is mutually symmetrical. Therefore, a relationship between the ground 220 and the second power supply ring 222 is also formed as follows: and

WxLWxL

C plate ε χ 跖其中’寄生電容^的值係隨著寬度%C plate ε χ 跖 where the value of 'parasitic capacitance ^ is the width %

而改變’亦㈣生電容‘的值與=^ 的值成正比,而與間距s成反 w ,度I ^第二電源環212、第—接地環源環 的2度。長度L係第_電源環21()、第# t -接地環220及第二接地環222的長度=扣、弟 f環21〇與第二接地環222之間的間距,以及2弟一電 2 2 Ο”二電源環2〗2之間的間距,且係:=: 長。此外,高度τ亦係為第二電源環212 的兩化 的厚度,距離Μ亦係為第二電源環21:=,222 之間的距離。 弗一接地環222 :接地環2卿分別附加-金屬 雙電容c磁係為寄生電容 c 隹豐形成的堆 生電容Γ知「认 .,plate 7 Uside的總和,且隨著寄 ::Cplate和Cside的改變而改變,亦 及見度w成正比,與距離m及間距s成反長度1 200814280 + D2The value of the change 'also (four) raw capacitance ' is proportional to the value of =^, and is opposite to the distance s, and the degree I ^ is 2 degrees of the second power supply ring 212 and the first ground ring source ring. The length L is the length of the first power ring 21 (), the #t - the ground ring 220, and the second ground ring 222 = the distance between the buckle, the brother f ring 21 〇 and the second ground ring 222, and the 2 brothers 2 2 Ο "two power supply ring 2" 2 between the spacing, and is: =: long. In addition, the height τ is also the thickness of the second power ring 212, the distance Μ is also the second power ring 21 :=, the distance between 222. E. a grounding ring 222: grounding ring 2 qing separately attached - metal double capacitor c magnetic system for the parasitic capacitance c 堆 形成 formed by the stack capacitor Γ know, the sum of plate 7 Uside And change with the change of::Cplate and Cside, and the degree of visibility is proportional to the length, and the distance m and the spacing s are inverse length 1 200814280 + D2

stack 一 2 X £ XStack one 2 X £ X

S 产源環210、第二電源環I第^ %< 220及弟二接地環222相互堆疊之結弟一接辦 應提供積體電路2運作所需電流的㈣非為電源侣 依賴上述之電源匯流排的結構來作為二::接:而,韻 ,二::傳輸的路徑,是無法均句地傳= 體电路2内母個角落。因此,積!也傳輪到積 帶的傳送功能,、再搭過電源 的結構’才能真正地將積體電路所 3匯流排 到每個角落。下所而要的電流傳輪 =考第五圖所示’其係為本發㈣容之+ 电源匯、•排結合電源帶之示意圖。積體 、电路内 含ί數個電源帶,以作為製作在積體電:2内,提:ί包 =裝置。電源帶可以透過換金屬層二 ^孔5,連結於上述之電源環或接地環,形 路,以均勻地傳輪電源供應所提 。狀、.罔 的每個角落。 促1,、〜-至知體電路2内 電源上^1源帶係分別為第—電源帶攻、第二 ㈣〇及第二電源帶232係為一組電源帶,且相=平= 源帶234及第四電源帶236係為另一組電源帶,且 3ΪΓ丁二此兩組電源帶内之第一電源帶230、第二電 "、苹、弟二電源帶234及第四電源帶23 一 源環210、第一接蚰护^ 乐 222之間相互交㈣源環212及第二接地環 200814280 源淨5兄’弟—電源帶23°係透過連接孔25由第一電 ^至第Γ黑’經由第二電源環212之相對應的兩側, 連筮 妾地環222 ’先透過換金屬層28b ϋ.Γ-t地環22G相對應的兩端,再連結至第二接地 Γ第—;^源帶234係透過連接孔25及換金屬層撕, 連結至第二電源環212之—端後,與 G及第二電源帶232交錯,並與第—電源帶The source loop 210, the second power loop I, the second < 220, and the second ground loop 222 are stacked on top of each other. The receiver should provide the current required for the operation of the integrated circuit 2 (4). The structure of the power bus is used as the second:: pick: and, rhyme, two:: the path of the transmission, can not be uniformly transmitted = the inner corner of the body circuit 2. Therefore, the product! It is also the transmission function of the tape, and the structure of the power supply can be used to truly connect the integrated circuits to each corner. The current current transmission wheel = the fifth picture shown in the figure, which is the schematic diagram of the power supply sink and the power supply belt. The integrated circuit and the circuit contain a number of power supply belts, which are used in the production of the integrated body: 2, and the following: ί package = device. The power strip can be connected to the above-mentioned power ring or grounding ring through a metal-changing layer 2 hole 5 to form a uniform transmission power supply. Every corner of the shape, .罔. Promote 1,, ~- to the body of the body circuit 2 ^1 source band is the first - power band attack, the second (four) 〇 and the second power band 232 is a set of power bands, and phase = flat = source The belt 234 and the fourth power strip 236 are another set of power strips, and the first power strip 230, the second electric ", the second power strip 234 and the fourth power source in the two sets of power strips The belt 23 has a source ring 210, and the first interface ^ 乐 222 intersects each other (4) the source ring 212 and the second ground ring 200814280 source net 5 brothers brother - power belt 23 ° system through the connection hole 25 by the first electric ^ Up to the second black through the two opposite sides of the second power supply ring 212, the connecting ground ring 222 ' first through the metal exchange layer 28b ϋ. Γ-t ground ring 22G corresponding ends, and then connected to the second The grounding strap ——the source strap 234 is torn through the connecting hole 25 and the metal changing layer, is connected to the end of the second power ring 212, and is interleaved with the G and the second power strip 232, and the first power strip

相對鹿H接山孔25相連結,再經過第二電源環212之另一 *、二为―端’連結至第—電源環210相對應的另—端; =,帶236係透過連接孔25,由第:接_ 222而 H妾地環22G之相對應的兩端,再連結至第二接地環 222相對應的另一端。 及第此t積體電路2可更進—步地分別在第一金屬環210 ==環220的下方,利用附加多層的金屬層來達到 句句“的效能’也就是說,積體電路2内之金屬 係可以根據制者的需求而設計,金屬層的數量越多, 表不所產生的寄生電容就越大,如第六圖所示。 ,於#§fL干擾(nGlseinterf_ee)程度與積體電路内 电容值大小有關.,因此當積體電路2所產生的堆a带容 ,越大時,積體電路2所具備的抗雜訊干㈣ 而且積體電路2内之第一電源環21〇與供應電源距離 取k,亦可以用來抑制電磁波的干擾(dectr〇仰c mterference,歷)。由於積體電路2所產生的堆疊 可:從20pf到200Pf ’或大於2〇〇pf,因此可視為一内8: 於積體電路2狀-用來抑制電磁干擾的大電容。倘若將 12 200814280 二二兒路2整合到印刷電路板㈤价以circuit b〇ard, Π13 )上時,可η雜少( ρ« «η + , 名「刷黾路板上供應電壓源與接地之 ά太:电磁干擾的大電容’以減少製作印刷電路板的 ' 一弟私源1展210及第一接地環220的下方附加上 估^ 屬層’不僅可以提高積體電路2内之電容 士 ’、、可使电源匯流排流通路徑的電阻值大幅降低,因此 严^^ 〇扣版迅路2内之電壓降效應,以及由於每一金 的電流能均句地分散,因此可以改善積體電路 2内之仏密度(Electr〇migrati〇n,EM)不均勾的問題。 電者可隨其使用上之需要,進—步地在第二 接地環222下方再繼續堆疊金屬層,以 達到%肢電路内具高電容值之目的。 方始提供之優點在於,分別在電源環與接地環下 構的產生L環’以形成堆疊結 料所提供之另—優點在於,此兩組金屬環會產生 擾^L電容,以增加積體電路預防電磁干擾與雜訊干 ☆本么月所提供之再一優點在於,積體電路内之等效電 二不,可隨制者之f要來雜㈣環或接地環的寬度, 使用者之f要_整電_與接地 達到尚電容值得目的。 提供之再—優點在於,將具麵疊結構的電 ^匯w非之積體電路製作在印刷電路板上,可節省印刷電 路扳上用來抑制電磁干擾的電容,以節省成本。 本發明所提供之再-優點在於,此堆疊結構的電源匯 13 200814280 流排可以使電源匯流排流通路徑 _ 善積體電路内電壓降的問題。 值大低’以改 本發明所提供之再—優點在於 流排利用換金屬層、連接孔及相互二的電源匯 電源環間與每—接地環間作電源的^ 將每— 源匯,,此堆叠結構的電 之電流能均句地分散職以、應積體$路運作所需 本發_= 以改善電流密度的問題。 流排所附加的金屬層,可此堆疊結構的電源匯 所附圖式僅提供參考‘明f者f求來作調整。 以限制者。惟以上所述3為^ = ’亚翻剌本發明加 因此即拘限本發明之專利之較佳可行實施例,非 及圖示内容所為:②以:故舉凡運 範圍内,合予陳明 均同理包含於本發明之 圖式簡單說明】 f —圖係為龍技術之積體電路之示意圖; 術,流排的等效電容之示意圖; 圖;θ 、’龟明内谷之積體電路内電源匯流排之示意 容之㈣谷之堆疊結構的電源匯流排的等效電 :之二本υ内谷之積體電路内電源匯流排結合電源 中〈不思圖;以及 14 200814280 第六圖係為本發明内容之堆疊結構的電源匯流排的等效電 容之剖面示意圖。 【主要元件符號說明】The deer H is connected to the mountain hole 25, and then passes through the other end of the second power supply ring 212, and the other end is connected to the other end corresponding to the first power supply ring 210; =, the band 236 is transmitted through the connection hole 25. The corresponding ends of the second grounding ring 22G are connected to the other end corresponding to the second grounding ring 222 by the first: _ 222. And the first t-integrated circuit 2 can be further stepped under the first metal ring 210 == ring 220, respectively, using an additional multi-layer metal layer to achieve the "performance" of the sentence, that is, the integrated circuit 2 The metal system inside can be designed according to the needs of the manufacturer. The more the number of metal layers, the larger the parasitic capacitance generated by the table, as shown in the sixth figure. The degree and product of #§fL interference (nGlseinterf_ee) The capacitance value in the body circuit is related to the magnitude of the capacitance. Therefore, when the stack a generated by the integrated circuit 2 is larger, the anti-missing device (4) of the integrated circuit 2 and the first power supply ring in the integrated circuit 2 are provided. The distance between the 21 〇 and the power supply source can also be used to suppress the interference of electromagnetic waves. The stack generated by the integrated circuit 2 can be: from 20pf to 200Pf ' or greater than 2〇〇pf, Therefore, it can be regarded as an inner 8: in the form of an integrated circuit 2 - a large capacitor used to suppress electromagnetic interference. If 12 200814280 2 2 Er 2 is integrated into the printed circuit board (5), the circuit b〇ard, Π 13 ) Can be mixed with η ( ρ « « η + , named "brush supply circuit board supply voltage source and The ground is too large: the large capacitance of electromagnetic interference 'to reduce the production of printed circuit boards' Capacitor ', can greatly reduce the resistance value of the power supply bus flow path, so the voltage drop effect in the 版 迅 迅 迅 2, and the current can be improved even if the current of each gold can be uniformly dispersed The problem of uneven density (Electr〇migrati〇n, EM) in the integrated circuit 2. The electrician can continue to stack the metal layer under the second grounding ring 222 as needed. In order to achieve a high capacitance value in the % limb circuit, the advantage provided by the invention is that the L-rings respectively formed under the power ring and the grounding ring to form a stacked material are provided, the advantage is that the two groups of metals The ring will generate a disturbance capacitor to increase the integrated circuit to prevent electromagnetic interference and noise. ☆ This month's other advantage is that the equivalent of the integrated circuit is not the same as the manufacturer. The width of the hybrid (four) ring or ground ring, The user's f _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The capacitor for suppressing electromagnetic interference is used to save cost. The re-expected advantage of the present invention is that the power supply sink 13 of the stack structure can make the power supply bus flow path _ the problem of voltage drop in the good integrated circuit The value of the value is lower than that provided by the invention. The advantage is that the flow row uses the metal exchange layer, the connection hole, and the power supply ring between the two power supply and the power supply between the ground ring and the grounding ring. The electric current of the stacked structure can be uniformly dispersed, and the current body _= required to improve the current density. The metal layer attached to the flow row can be adjusted only by referring to the figure of the power supply of the stacked structure. To limit the person. However, the above 3 is ^ = ' 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 因此 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌 剌A brief description of the drawings included in the present invention] f - the schematic diagram of the integrated circuit of the dragon technology; the schematic diagram of the equivalent capacitance of the flow and the flow row; Fig.; θ, the inside of the integrated circuit of the turtle The equivalent of the power busbar of the stacking structure of the power supply (4) The equivalent power of the power busbar of the stacking structure of the valley: the power supply busbar of the integrated circuit of the inner valley of the valley is combined with the power supply (not thinking; and 14 200814280 A schematic cross-sectional view of an equivalent capacitance of a power bus of a stacked structure of the present invention. [Main component symbol description]

積體電路 1,2 第一電源環 110,210 第二電源環 112,212 第一接地環 120,220 第二接地環 122,222 第一電源帶 130,230 第二電源帶 132,232 第三電源帶 134,234 第四電源帶 136,236 連接孔 15,25 電源焊墊 26 接地焊墊 27 換金屬層 28a,28b 金屬線 29a,29b 15Integrated circuit 1, 2 first power ring 110, 210 second power ring 112, 212 first ground ring 120, 220 second ground ring 122, 222 first power band 130, 230 second power band 132, 232 third power band 134, 234 fourth power band 136, 236 connection hole 15, 25 power pad 26 ground pad 27 metal layer 28a, 28b metal wire 29a, 29b 15

Claims (1)

200814280 十、申請專利範圍: 1. 一種電源供應連結線路,係應用於一積體電路内,包 • 含: • 一第一電源環與一第一接地環,該第一電源環與該 第一接地環皆分別於相隔一間距處至少附加一金屬層; 複數個金屬線,係直接地連結於該第一電源環及該 第一接地環,用以傳輸一正電壓至該第一電源環,或傳 輸一.負電壓至該第一接地環; φ 複數個電源焊墊,係直接地連結於部分的該些金屬 線,用以提供該正電壓;以及 複數個接地焊墊,係直接地連結於部分的該些金屬 線,用以提供該負電壓。 2. 如申請專利範圍第1項所述之電源供應連結線路,其 中該第一電源環下所附加之該金屬層係為一第二接地 環,而該第一接地環下所附加之該金屬層係為一第二 電源環。 φ 3.如申請專利範圍第2項所述之電源供應連結線路,其 中該第一電源環與該第二接地環相疊,該第一接地環 與該第二電源環相疊,形成一堆疊結構。 4.如申請專利範圍第1項所述之電源供應連結線路,更 進一步包含: 複數個連接孔; 複數個換金屬層,係透過部分之該些連接孔連結於 部分之該些金屬線;以及 複數個電源帶,係透過部分之該些連接孔及該些換 16 200814280 金屬層,連結於該第一電源環、該第一接地環及該些金 屬層之間。 5. 如申請專利範圍第4項所述之電源供應連結線路,其 中該些電源帶係相互交錯,且透過該些連接孔來相互 連結。 , 6. 如申請專利範圍第4項所述之電源供應連結線路,其 中部分之該些電源帶係為彼此平行。 7·如申請專利範圍第4項所述之電源供應連結線路,其 中該第一電源環、該第一接地環、該些金屬層及該些 電源帶間形成一格狀網路。 8· —種備製積體電路内之電源供應連結線路之方法,包 含·· 形成一第一電源環與一第一接地環; 分別對應於該第一電源環與該第一接地環下相隔 一間距處,形成至少一金屬層; .提供複數個金屬線,以分別連結於該第一電源環、 該第一接地環及該些金屬層; 提供複數俯電源焊墊,以分別連結於該第一電源環 及部分之該些金屬層;以及 提供複數個接地焊墊,以分別連結於該第一接地環 及另一部分之該些金屬層。 9.如申請專利範圍第8項所述之備製積體電路内之電源 供應連結線路之方法,其中該電源環下所附加之該金 屬層係為一第二接地環,而該接地環下所附加之該金 屬層係為一第二電源環。 17 200814280 10.如申請專利範圍第8項所述之備製積體電路内之電源 供應連結線路之方法,其中更進一步包含: 提供複數個連接孔; 提供複數個換金屬層,以透過部分之該些連接孔連 結於該些金屬線;以及 提供複數對電源帶,以透過該些換金屬層及部分之 談些連接孔,連結於第一電源環、第一接地環及該些金 屬層之間。 11·如申請專利範圍第10項所述之備製積體電路内之電源 供應連結線路之方法,其中該些對電源帶係相互交 錯,且透過該些連接孔來相互連結。 12. 如申請專利範圍第10項所述之備製積體電路内之電源 供應連結線路之方法,其中每一對電源帶中,其中一 個電源帶係平行於另一電源帶。 13. 如申請專利範圍第10項所述之備製積體電路内之電源 供應連結線路之方法,其中該第一電源環、該第一接 地環、該些金屬層與該些電源帶間形成一格狀網路。 18200814280 X. Patent application scope: 1. A power supply connection line is applied to an integrated circuit package, including: • a first power supply ring and a first grounding ring, the first power supply ring and the first The grounding ring is respectively provided with at least one metal layer at a distance from each other; a plurality of metal wires are directly connected to the first power ring and the first ground ring for transmitting a positive voltage to the first power ring. Or transmitting a negative voltage to the first grounding ring; φ a plurality of power supply pads directly connected to the portions of the metal wires for providing the positive voltage; and a plurality of ground pads directly connected The portions of the metal lines are used to provide the negative voltage. 2. The power supply connection line according to claim 1, wherein the metal layer attached to the first power ring is a second ground ring, and the metal is attached under the first ground ring. The layer is a second power ring. Φ 3. The power supply connection line of claim 2, wherein the first power ring and the second ground ring are stacked, the first ground ring and the second power ring are stacked to form a stack structure. 4. The power supply connection line according to claim 1, further comprising: a plurality of connection holes; a plurality of metal exchange layers connected to the portions of the metal wires through the connection holes; and A plurality of power strips are connected between the first power ring, the first ground ring and the metal layers through the connecting holes and the plurality of layers of the 200814280 metal layer. 5. The power supply connection line of claim 4, wherein the power supply lines are interlaced and connected to each other through the connection holes. 6. The power supply connection line as described in claim 4, wherein some of the power supply belts are parallel to each other. 7. The power supply connection line of claim 4, wherein the first power ring, the first ground ring, the metal layers, and the power strips form a grid network. 8. The method for preparing a power supply connection line in a circuit, comprising: forming a first power ring and a first ground ring; respectively corresponding to the first power ring and the first ground ring Forming at least one metal layer at a pitch; providing a plurality of metal wires respectively connected to the first power ring, the first ground ring and the metal layers; providing a plurality of power supply pads for respectively connecting to the a first power ring and a portion of the metal layers; and a plurality of ground pads for respectively connecting the metal layers of the first ground ring and the other portion. 9. The method of claim 3, wherein the metal layer attached to the power supply ring is a second grounding ring, and the grounding ring is under the grounding ring. The metal layer attached is a second power ring. The method of the power supply connection line in the preparation circuit of the method of claim 8, further comprising: providing a plurality of connection holes; providing a plurality of metal exchange layers for transmitting the portion The connection holes are connected to the metal wires; and a plurality of pairs of power supply lines are provided to pass through the metal exchange layers and the portion of the connection holes, and are connected to the first power ring, the first ground ring and the metal layers. between. 11. The method of claim 1, wherein the pair of power supply straps are interlaced with each other and are connected to each other through the connection holes. 12. The method of claim 1, wherein each of the pair of power strips is parallel to the other of the power strips. 13. The method of claim 1, wherein the first power ring, the first ground ring, the metal layers, and the power strips are formed between the power supply lines in the integrated circuit of claim 10; A grid of networks. 18
TW95133251A 2006-09-08 2006-09-08 Power supply layout for integrated circuit TWI307952B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636542B (en) * 2017-10-20 2018-09-21 智原科技股份有限公司 Power distribution network of integrated circuit
TWI692063B (en) * 2018-09-13 2020-04-21 奇景光電股份有限公司 Circuit routing method and circuit routing system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636542B (en) * 2017-10-20 2018-09-21 智原科技股份有限公司 Power distribution network of integrated circuit
US10490502B2 (en) 2017-10-20 2019-11-26 Faraday Technology Corp. Power distribution network of integrated circuit
TWI692063B (en) * 2018-09-13 2020-04-21 奇景光電股份有限公司 Circuit routing method and circuit routing system

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