TW200804541A - Phosphoric ester containing coating fluid and antireflection coatings - Google Patents
Phosphoric ester containing coating fluid and antireflection coatings Download PDFInfo
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- TW200804541A TW200804541A TW096113125A TW96113125A TW200804541A TW 200804541 A TW200804541 A TW 200804541A TW 096113125 A TW096113125 A TW 096113125A TW 96113125 A TW96113125 A TW 96113125A TW 200804541 A TW200804541 A TW 200804541A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
- C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
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Abstract
Description
200804541 (1) 九、發明說明 【發明所屬之技術領域】 本發明關於含有聚矽氧烷和磷酸酯化合物的被膜形成 用塗佈液,及由其所形成的被膜,以及此等之製造方法。 詳細地,關於含有在側鍵具有經氟原子所取代的有機基之 聚矽氧烷、及具有羥基的磷酸酯化合物之被膜形成用塗佈 液,及由此等所形成的被膜,以及被膜的形成方法。再者 Φ ,關於前述被膜形成用塗佈液及由此等所形成的被膜對防 反射用途的適用。 【先前技術】 以往,已知若使顯示比基材之折射率還低折射率的被 膜形成在該基材的表面上,則降低從該被膜的表面所反射 的光之反射率。因此,如此顯示經降低光反射率的被膜, 係利用作用爲防光反射膜,適用於各種基材表面。 # 例如’有揭示將作爲Mg源的鎂鹽、烷氧基鎂化合物 等’與作爲F源的氟化物鹽所反應而生成的MgF2微粒子 之醇分散液’或將於其加有用於提高膜強度的四烷氧基矽 烷等之液當作塗佈液,塗佈在布朗恩管等玻璃基材上,接 著在1〇〇至5 〇〇°C熱處理,而在該基材上形成顯示低折射率 的防反射膜之方法(參照專利文獻1)。 又’有揭示藉由混合平均分子量不同的2種以上之四 烷氧基矽烷、甲基三烷氧基矽烷、乙基三烷氧基矽烷等的 水解聚縮合物與醇等溶劑,以成爲塗液,於從該塗液來形 -4- 200804541 (2) 成被膜時,在上述混合之際施加混合比例、相對濕度的控 制等手段,以製作被膜,然後藉由加熱,而在玻璃基板上 形成具有1.21至1.40的折射率之具有微坑或凹凸的厚度從 60至160nm的薄膜之低反射玻璃,該微坑或凹凸具有50至 2 0 0nm的直徑(參照專利文獻2)。 再者,有揭示由玻璃、與在其表面所形成之具有高折 射率的下層膜、及在該下層膜的表面所形成之具有低折射 φ 率層膜而成的低反射率玻璃。(參照專利文獻3)。於該公 報中,就該上層膜的形成方法之詳細而言,記載使 CF3(CF2)2C2H4Si(OCH3)3等之具有多氟烴鏈的含氟矽酮化 合物與對其而言5至90重量%的Si(OCΗ3)4等的矽烷偶合劑 ,在醇溶劑中,於醋酸等觸媒的存在下,在室溫水解後, 過漉而調製共縮合物之液’接著將該液塗佈於上述下層膜 上,在120至25 0°C加熱而成構對的方法。 又,有揭示使含有特定比例之Si(OR)4所示的矽化合 # 物、CFHCFdndCHdUOR1);所示的矽化合物、 R2CH2OH所示的醇、及草酸的反應混合物,於水的不存 在下,在40至180 °C加熱以生成聚矽氧烷的溶液,接著將 含有該溶液的塗佈液塗佈在基材表面上,在80至450 °C使 該塗膜熱硬化,以在該基材表面上密接地形成具有1.28至 1.38的折射率且90至11 5度的水接觸角之被膜(參照專利文 獻4) 〇 於由如上述的技術所防反射處理的顯示元件(尤其液 晶顯示元件)中,由於使用環境的影響而帶電,引發塵埃 -5- 200804541 (3) 的附著,而變成難以見到影像。又,由於所附著的塵埃常 常不能容易被擦掉,故要求能容易擦掉附著於防反射膜的 塵埃之顯示元件。因此,於位於顯示元件的最表面之防反 射薄膜’尤其防反射層,強烈要求能賦予抑制帶電而防止 塵埃之附著,以及容易擦掉所附著的塵埃之機能(塵埃擦 掉性)。 專利文獻1 :特開平05- 1 05424號公報 籲 專利文獻2 :特開平〇6-157〇76號公報 專利文獻3 :特開昭6 1 -0 1 0043號公報 專利文獻4:特開平09-208 898號公報 【發明內容】 發明所欲解決的問題 本發明之目的爲提供保存安定性優異、水接觸角高、 塵埃擦掉性良好的被膜形成用塗佈液,及由其所形成的被 • 膜’和其製造方法。又,本發明之目的爲利用上述被膜形 成用塗佈液及由其所形成的被膜於防反射用途。 解決問題的手段 本案發明者們鑒於上述狀,經過精心的硏究,結果完 成下述所示的本發明。即,本發明係具有以下的要旨。 1.一種被膜形成用塗佈液,其特徵爲含有:(A)成分 ’即在側鏈具有經氟原子所取代的有機基之聚矽氧烷;及 (B)成分,即在磷原子鍵結有羥基的磷酸酯化合物。 200804541 (4) 2.如上述1中記載的被膜形成用塗佈液,其中(A)成分 係將含有式(1)所表示的烷氧基矽烷及式(2)所表示的烷氧 基矽烷之烷氧基矽烷,進行聚縮合而得之聚矽氧烷, [化1][Technical Field] The present invention relates to a coating liquid for forming a film containing a polysiloxane and a phosphate compound, and a film formed therefrom, and a method for producing the same. Specifically, the coating liquid for forming a film containing a polyoxyalkylene having an organic group substituted with a fluorine atom in a side bond, and a phosphate compound having a hydroxyl group, and a film formed thereby, and a film Forming method. Further, Φ is applied to the anti-reflection application of the coating liquid for forming a film and the film formed thereby. [Prior Art] Conventionally, it has been known that when a film having a refractive index lower than the refractive index of the substrate is formed on the surface of the substrate, the reflectance of light reflected from the surface of the film is lowered. Therefore, the film having reduced light reflectance is displayed as a light-proof reflective film, and is suitable for use on various substrate surfaces. #, for example, an alcohol dispersion of MgF2 fine particles which is formed by reacting a magnesium salt, an alkoxymagnesium compound or the like as a source of Mg with a fluoride salt as a source of F, or added thereto for improving film strength A liquid such as tetraalkoxy decane is used as a coating liquid, coated on a glass substrate such as a Brownian tube, and then heat-treated at 1 Torr to 5 ° C to form a low refractive index on the substrate. A method of preventing an antireflection film (see Patent Document 1). Further, it is disclosed that a hydrolyzed polycondensate such as two or more kinds of tetraalkoxydecane, methyltrialkoxydecane or ethyltrialkoxydecane having a different average molecular weight is mixed with a solvent such as an alcohol to form a coating. When the liquid is formed into a film from the coating liquid, the method of mixing the ratio and the relative humidity is applied to the film to form a film, and then heating is performed on the glass substrate. A low-reflection glass having a film having a thickness of 1.21 to 1.40 and having a thickness of from 60 to 160 nm having micropits or concavities and convexities having a diameter of 50 to 200 nm (refer to Patent Document 2) is formed. Further, there is disclosed a low reflectance glass which is formed of glass, an underlayer film having a high refractive index formed on the surface thereof, and a film having a low refractive index φ formed on the surface of the underlayer film. (Refer to Patent Document 3). In this publication, the details of the method for forming the upper layer film include a fluorine-containing fluorenone compound having a polyfluorocarbon chain such as CF3(CF2)2C2H4Si(OCH3)3, and 5 to 90 weights thereof. % of a decane coupling agent such as Si(OCΗ3)4, which is hydrolyzed at room temperature in an alcohol solvent in the presence of a solvent such as acetic acid, and then pulverized to prepare a liquid of the cocondensate. The above-mentioned underlayer film is heated at 120 to 250 ° C to form a conformation method. Further, a reaction mixture containing a ruthenium compound represented by Si(OR) 4 in a specific ratio, CFHCFdndCHdUOR1), an alcohol represented by R2CH2OH, and oxalic acid is disclosed in the absence of water. Heating at 40 to 180 ° C to form a solution of polyoxyalkylene, and then coating a coating liquid containing the solution on the surface of the substrate, and thermally curing the coating film at 80 to 450 ° C to The surface of the material is densely grounded to form a film having a water contact angle of 1.28 to 1.38 and a water contact angle of 90 to 11 5 (refer to Patent Document 4), and a display element (especially a liquid crystal display element) which is antireflection treated by the above-described technique In the case of charging due to the influence of the use environment, the adhesion of dust-5-200804541 (3) is caused, and it becomes difficult to see an image. Further, since the adhered dust is often not easily rubbed off, a display element which can easily wipe off dust adhering to the antireflection film is required. Therefore, in the antireflection film ' particularly the antireflection layer on the outermost surface of the display element, it is strongly required to impart the function of suppressing the electrification to prevent the adhesion of dust and to easily wipe off the adhered dust (dust erasability). Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. 208 898 OBJECTS OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION The object of the present invention is to provide a coating liquid for forming a film which is excellent in storage stability, has a high water contact angle, and has excellent dust repellency, and is formed of the film formed therefrom. • Membrane' and its method of manufacture. Further, an object of the present invention is to use the coating liquid for coating film formation and the film formed therefrom for antireflection use. Means for Solving the Problems The inventors of the present invention have intensively studied in view of the above-described conditions, and have completed the present invention shown below. That is, the present invention has the following gist. A coating liquid for forming a film, comprising: (A) a component, that is, a polyoxyalkylene having an organic group substituted with a fluorine atom in a side chain; and (B) a component, that is, a phosphorus atom bond A phosphate compound having a hydroxyl group. (4) The coating liquid for forming a film according to the above-mentioned item 1, wherein the component (A) contains the alkoxydecane represented by the formula (1) and the alkoxydecane represented by the formula (2). Alkoxy decane, polycondensed by polycondensation, [Chemical 1]
Si(OR1)4 (1)Si(OR1)4 (1)
(R1表示具有1至5個碳原子的烴基), [化2] R2Si(OR3)3 (2) (R2表示經氟原子所取代的有機基,R3表示具有1至5個碳 原子的烴基)。 3 .如上述2中記載的被膜形成用塗佈液,其中式(2)中 的R2係全氟烷基。 4·如上述2或3中記載的被膜形成用塗佈液,其中(a) 成分係更將式(3)所表示的烷氧基矽烷進行聚縮合而得之 聚砂氧院, [化3] R4nSi(〇R5)4.n (3) (R表示未經氟原子所取代的有機基,R5表示具有〗至5個 200804541 (5) 碳原子的烴基,η表示1至3的整數)。 5.如上述1至4中任一項記載的被膜形成用塗佈液,其 中(Β)成分係式(4)所表示的磷酸酯化合物。 [化4] 〇P(〇H)m(OR6)3.m (4) (R6表示碳數1至20的有機基,m表示1或2的整數)。 6·如上述5中記載的被膜形成用塗佈液,其中式(4)中 的R6係碳數1至6的有機基。 7·如上述1至6中任一項記載的被膜形成用塗佈液,其 中對於1莫耳的(A)成分之矽原子的合計量而言,含有〇.〇1 至0.45莫耳的(B)成分之磷原子。 8 .如上述2至7中任一項記載的被膜形成用塗佈液,其 中(A)成分係將含有60至95莫耳%的式(1)所表示的烷氧基 矽烷及5至40莫耳%的式(2)所表示的烷氧基矽烷之烷氧基 矽烷進行聚縮合而得之聚矽氧烷。 9 · 一種被膜,其係使用如上述1至8中任一項記載的被 膜形成用塗佈液來形成。 10·—種防反射膜,其係如上述1至8項中任一項記的 被膜形成用塗佈液來形成。 1 1 · 一種被膜之形成方法,其係將如上述1至8中任一 項記載的被膜形成用塗佈液塗佈於基材上,在室溫至 150°C乾燥後,在室溫至150°C使硬化。 200804541 (6) 1 2· —種防反射膜之形成方法,其係將如上述1至8中 任一項的被膜形成用塗佈液塗佈於基材上,在室溫至 1 5 0 °C乾燥後,在室溫至i 5 〇 °C使硬化。 1 3 · —種防反射基材,其具有如上述9中記載的被膜或 如Jl述1 0中記載的防反射膜。 ' 14·一種防反射薄膜,其具有如上述9中記載的被膜或 如上:述1 0中記載的防反射膜。 • 1 5 · —種被膜形成用塗佈液之製造方法,其特徵爲在 用於得到(A)成分之在側鏈具有經氟原子所取代的有機基 之聚矽氧烷的全烷氧基矽烷之內,將含有60至95莫耳%的 式(1)所表示的烷氧基矽烷及5至40莫耳%的式(2)所表示的 烷氧基矽烷之烷氧基矽烷,與對於1莫耳的全部烷氧基砂 烷的烷氧基而言,0·2至2莫耳的草酸,在有機溶劑中,於 50至180°C的液溫作加熱,進行聚縮合而得到聚矽氧院的 溶液,使其與在磷原子鍵結有羥基的磷酸酯化合物混合, [化5](R1 represents a hydrocarbon group having 1 to 5 carbon atoms), [Chemical 2] R2Si(OR3)3 (2) (R2 represents an organic group substituted by a fluorine atom, and R3 represents a hydrocarbon group having 1 to 5 carbon atoms) . The coating liquid for forming a film according to the above 2, wherein R2 is a perfluoroalkyl group in the formula (2). 4. The coating liquid for forming a film according to the above 2 or 3, wherein the component (a) is obtained by polycondensing an alkoxysilane represented by the formula (3). R4nSi(〇R5)4.n (3) (R represents an organic group which is not substituted by a fluorine atom, R5 represents a hydrocarbon group having from 〗 〖200804541 (5) carbon atoms, and η represents an integer of from 1 to 3). 5. The coating liquid for forming a film according to any one of the above 1 to 4, wherein the (Β) component is a phosphate compound represented by the formula (4). 〇P(〇H)m(OR6)3.m (4) (R6 represents an organic group having 1 to 20 carbon atoms, and m represents an integer of 1 or 2). 6. The coating liquid for forming a film according to the above 5, wherein R6 in the formula (4) is an organic group having 1 to 6 carbon atoms. The coating liquid for forming a film according to any one of the above-mentioned items 1 to 6, wherein the total amount of the ruthenium atoms of the (A) component is 1 至1 to 0.45 mol ( B) The phosphorus atom of the component. The coating liquid for forming a film according to any one of the above aspects, wherein the component (A) contains 60 to 95 mol% of the alkoxydecane represented by the formula (1) and 5 to 40. The polyoxyalkylene obtained by polycondensation of the alkoxydecane of the alkoxydecane represented by the formula (2). A coating film formed by using the coating liquid for forming a film according to any one of the above 1 to 8 above. An antireflection film formed by the coating liquid for forming a film according to any one of the above items 1 to 8. A coating film forming method according to any one of the above 1 to 8, which is applied to a substrate, dried at room temperature to 150 ° C, and then at room temperature. Hardening at 150 °C. 200804541 (6) The method for forming an anti-reflection film, which is applied to a substrate by a coating liquid for forming a film according to any one of the above 1 to 8, at room temperature to 150 ° After C is dried, it is hardened at room temperature to i 5 °C. An antireflection substrate comprising the film according to the above 9 or the antireflection film described in JP. An antireflection film comprising the film according to the above 9 or the antireflection film described in the above. A method for producing a coating liquid for forming a film, characterized by a peralkoxy group for obtaining a polyoxyalkylene having an organic group substituted with a fluorine atom in a side chain of the component (A). Within the decane, 60 to 95 mol% of the alkoxydecane represented by the formula (1) and 5 to 40 mol% of the alkoxydecane of the alkoxydecane represented by the formula (2), and For alkoxy groups of 1 mol of all alkoxy squalane, 0. 2 to 2 mol of oxalic acid is heated in an organic solvent at a liquid temperature of 50 to 180 ° C to obtain a polycondensation. a solution of a polyoxane, which is mixed with a phosphate compound having a hydroxyl group bonded to a phosphorus atom, [Chemical 5]
Si(〇R1)4 (1) (R1表示具有1至5個碳原子的烴基), [化6] (2) R2Si(OR3) 200804541 (7) (R2表示經氟原子所取代的有機基,R3表示具有1至5個碳 原子的煙基)。 發明的效果 本發明的被膜形成用塗佈液係可形成保存安定性優異 、水接觸角高、塵埃擦掉性良好、沒有經時變化的安定被 膜。其中,顯示低反射率的被膜形成用塗佈液,係適用作 • 爲防反射膜形成用塗佈液,用其所形成的被膜由於顯示低 反射率、高防污性、塵埃擦掉性,故非常有益於當作防反 射膜。 【實施方式】 實施發明的最佳形態 以下詳細說明本發明。 本發明關於被膜形成用塗佈液,其含有(A)成分之在 Φ 側鏈具有經氟原子所取代的有機基之聚矽氧烷,及(B)成 分之在磷原子鍵結有羥基的磷酸酯化合物;及由其所形成 的被膜,及此等之製造方法。 < (A)成分〉 (A)成分係在側鏈具有經氟原子所取代的有機基之聚 政氧院。 於本發明中,前述之側鏈係主要賦予被膜具有高的水 接觸角,只要藉此展現防污性即可,前述側鏈並沒有特別 -10- 200804541 (8) 的限定。 如此之經氟原子所取代的有機基,係脂肪族基或芳香 族基的氫原子的一部分或全部經氟原子取代的有機基。此 等的具體例子係如以下。 例如,可舉出三氟丙基、十三氟辛基、十七氟癸基、 ' 五氟苯基丙基等。 於此等之中,較佳爲全氟烷基,因爲容易得到透明性 ^ 局的被膜。更佳爲碳數3至的15的全氟院基。 作爲具體例子,可舉出三氟丙基、十三氟辛基、十七 氟癸基等。 於本發明,可複數種倂用如上述之具有側鏈的聚矽氧 烷。 得到如上述之在側鏈具有經氟原子所取代的有機基之 聚矽氧烷的方法,係沒有特別的限定。一般地,可使上述 在側鏈具有有機基的烷氧基矽烷與其以外的烷氧基矽烷進 Φ 行聚縮合而得。 其中,較佳爲由含有式(1)所表示的院氧基砂院及式 (2)所表示的烷氧基矽烷之烷氧基矽烷進行聚縮合而得之 聚砂氧院。 [化7]Si(〇R1)4 (1) (R1 represents a hydrocarbon group having 1 to 5 carbon atoms), [6] (2) R2Si(OR3) 200804541 (7) (R2 represents an organic group substituted by a fluorine atom, R3 represents a nicotinic group having 1 to 5 carbon atoms). According to the coating liquid for forming a film of the present invention, it is possible to form a stable film which is excellent in storage stability, has a high water contact angle, is excellent in dust repellency, and does not change with time. Among them, a coating liquid for forming a film having a low reflectance is used as a coating liquid for forming an antireflection film, and a film formed therewith exhibits low reflectance, high antifouling property, and dust erasing property. Therefore, it is very useful as an anti-reflection film. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. The present invention relates to a coating liquid for forming a film comprising a polyoxyalkylene having an organic group substituted with a fluorine atom in a Φ side chain of the component (A), and a hydroxyl group bonded to a phosphorus atom in the (B) component. a phosphate compound; and a film formed therefrom, and a method of producing the same. <(A) Component> The component (A) is a polyoxo having an organic group substituted with a fluorine atom in a side chain. In the present invention, the aforementioned side chain system mainly imparts a high water contact angle to the film, and as long as the antifouling property is exhibited thereby, the aforementioned side chain is not particularly limited by -10-200804541 (8). The organic group substituted by such a fluorine atom is an organic group in which a part or all of a hydrogen atom of an aliphatic group or an aromatic group is substituted with a fluorine atom. Specific examples of these are as follows. For example, a trifluoropropyl group, a tridecafluorooctyl group, a heptadecafluorodecyl group, a 'pentafluorophenylpropyl group, etc. are mentioned. Among these, a perfluoroalkyl group is preferred because it is easy to obtain a film having transparency. More preferred is a perfluorocarbon base having a carbon number of 3 to 15. Specific examples thereof include a trifluoropropyl group, a tridecafluorooctyl group, and a heptadecafluoroindenyl group. In the present invention, a plurality of polysiloxanes having a side chain as described above may be used. The method for obtaining a polyoxyalkylene having an organic group substituted with a fluorine atom in the side chain as described above is not particularly limited. In general, the alkoxydecane having an organic group in the side chain described above may be obtained by polycondensation of alkoxysilane having the other group. In particular, it is preferably obtained by polycondensation of an alkoxy decane containing an alkoxy decane represented by the formula (1) and an alkoxy decane represented by the formula (2). [Chemistry 7]
SiCOR1)^ [化8] (2) R2Si(OR3) -11 - 200804541 ⑼ 式(1)中的R1表示烴基,由於碳數係愈少而反應性愈高, 故較佳爲碳數1至5的飽和烴基,更佳爲甲基、乙基、丙基 、丁基。 作爲如此的四烷氧基矽烷之具體例子,可舉出四甲氧 基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷等 ,其可由市售品容易取得。 於本發明中,可使用式(1)所表示的烷氧基矽烷中的 至少1種,視需要亦可使用複數種。 式(2)所表示的烷氧基矽烷係上述在側鏈具有經氟原 子所取代的有機基之烷氧基矽烷。因此,該烷氧基矽烷係 爲賦予塗膜具有撥水性者。 此處,式(2)中的R2表示上述經氟原子所取代的有機 基,但是該有機基所具有有的氟原子之數目係沒有特別的 限定。 又,式(2)中的R3表示碳數1至5的烴基,較佳爲碳數1 至5的飽和烴基,更佳爲甲基、乙基、丙基、丁基。 於如此之式(2)所表示的烷氧基矽烷之中,R2較佳爲 全氟烷基的烷氧基矽烷,R2更佳爲式(5)所表示的有機基 之院氧基砂垸。 [化9] CF3(CF2)kCH2CH2 (5) 式(5)中,k表示〇至12的整數。 -12- (10) 200804541 作爲具有式(5)所表示的有機基之烷氧基矽烷的具體 例子’可舉出三氟丙基三甲氧基矽烷、三氟丙基三乙氧基 政院、十七氟癸基三甲氧基矽烷、十三氟辛基三乙氧基矽 院 '十七氟癸基三甲氧基矽烷、十七氟癸基三乙氧基矽烷 等。 特佳爲k係2至12的整數,因爲防反射膜的指紋擦掉 性良好。 # 於本發明中’可使用式(2)所表示的烷氧基矽烷中的 至少1種,視需要亦可使用複數種。 又’聚矽氧烷(A)亦可由式(1)及式(2)所表示的烷氧基 矽烷、與其以外的式(3)及/或式(6)所表示的烷氧基矽烷進 行聚縮合而成者。此時,除了式(1)及式(2)所表示烷氧基 砂垸以外,可單獨地使用式(3 )所表示的垸氧基砂院與式 (6)所表示的烷氧基矽烷中任一者,也可倂用兩者。 [化 10] R4nSi(OR5)4-n (3) 式(3 )中,R4表示未經氟原子所取代的有機基,R5表示具 有1至5個碳原子的烴基’ n表不1至3的整數。 [化 1 1] (6) (R70)3SiR8Si(0R7)3 -13- (11) (11)200804541 式(6)中,R7表示具有1至5個碳原子的烴基,R8表示具有1 〜20個碳原子的有機鏈。 式(3)的烷氧基矽烷係具有R4未經氟原子所取代的有 機基及含有1、2或3個烷氧基的烷氧基矽烷。式(3 )中的R5 係各自具有1至5個碳原子的烴基。η爲1、2時,通常R5爲 相同的情況係多的,但於本發明中,R5可爲相同或不同。 式(3)中的R4係碳數1至20的有機基,較佳爲碳數1至 1 5的有機基。η爲2、3時,通常R4爲相同的情況係多的, 但於本發明中,R4可爲相同或不同。 以下顯示如此的式(3)所表示的烷氧基矽烷之具體例 子,惟不受其所限定。 可舉出甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基 三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、 丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽 烷、戊基三甲氧基矽烷、戊基三乙氧基矽烷、庚基三甲氧 基矽烷、庚基三乙氧基矽烷、辛基三甲氧基矽烷、辛基三 乙氧基矽烷、十二基三甲氧基矽烷、十二基三乙氧基矽烷 、十六基三甲氧基矽烷、十六基三乙氧基矽烷、十八基三 甲氧基矽烷、十八基三乙氧基矽烷、苯基三甲氧基矽烷、 苯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧 基矽烷、3 -異氰酸基丙基三甲氧基矽烷、3 -異氰酸基丙 基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基 三乙氧基矽烷、γ·縮水甘油氧基丙基三甲氧基矽烷、γ-縮 水甘油氧基丙基三乙氧基矽烷、γ-锍基丙基三甲氧基矽烷 -14- 200804541 (12) 、γ-锍基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基 矽烷、3-丙烯醯氧基丙基三乙氧基矽烷、γ-甲基丙烯醯氧 基丙基三甲氧基砂院、γ -甲基丙燒醯氧基丙基三乙氧基砍 烷、γ-脲基丙基三甲氧基矽烷、γ·脲基丙基三乙氧基矽烷 及二甲基二甲氧基矽烷、二甲基二乙氧基矽烷等的二烷氧 " 基矽烷等。 式(3)中R5係碳數1至5的烴基,較佳係碳數1至4的飽 φ 和烴基,更佳係碳數1至3的飽和烴基。 於本發明中,視需要可使用複數種的式(3)所表示的 院氧基砍院。 又,式(6)的烷氧基矽烷係R7爲具有1至5個碳原子的 烴基,較佳爲碳數1至4的飽和烴基,更佳係碳數1至3的飽 和烴基。 於本發明中,視需要可使用複數種的式(6)所表示的 烷氧基矽烷。一般地,R7爲相同的情況係多的,但於本發 # 明中,R7可爲相同或不同。R8係碳數1至20的有機鏈,構 造上並沒有特別的限定,亦可含有雙鍵或三鍵、苯基等的 環狀構造及支鏈構造。又,也可含有、氮、氧、氟等的雜 原子。 爲了使本發明所形成的被膜之撥水性成爲更良好,於 式(6)所表示的烷氧基矽烷之中,較佳爲使用R8的一部分 係含有全氟烷基鏈的式(7)般之有機鏈的烷氧基矽烷。 [化 12] -15- (13) (13)200804541 -CH2CH2(CF2)pCH2CH2- (7) 式(7)中,p表示1至12的整數。 作爲如此之式(6)的R8之一部分係含有式(7)所表示的 全氟烷基鏈的有機鏈般構造的烷氧基矽烷之具體例子,可 舉出1,6 —雙(三甲氧基矽烷基乙基)十二氟己烷、1,6-雙( 三乙氧基矽烷基乙基)十二氟己烷等。 本發明中所用的(A)成分,通常必須有式(1)及式(2)所 表示的烷氧基矽烷,視需要可使式(3)與式(6)所表示的烷 氧基矽烷中任一者或兩者進行聚縮合而得,只要在溶劑中 爲均質的溶液狀態即可,此等烷氧基矽烷的使用比例係沒 有特別的限定。 式(2)所表示的烷氧基矽烷,對於用於得到(A)成分的 烷氧基矽烷之合計量而言,若爲5莫耳%以上時,則可容 易得到水的接觸角爲8 0。以上的被膜,故係較宜的,而若 爲40莫耳%以下時,則可抑制凝膠或雜質的生成,容易得 到均質的(A)成分之溶液,故係較宜的。 另一方面,式(1)的烷氧基矽烷之使用量,在用於得 到(A)成分的全部烷氧基矽烷之合計量中,較佳係6〇莫耳 %至9 5莫耳%。 於僅倂用式(3)所表示的烷氧基矽烷時,在用於得到 (A )成分的烷氧基矽烷之合計量中,較佳係0莫耳%至3 5莫 耳%。又,於僅倂用式(6)所表示的烷氧基矽烷時,在用於 1¾1到(A)成分的院氧基砂院之合計量中,較佳係〇莫耳%至 20莫耳%。再者,於倂用式(3)及式(6)所表示的烷氧基矽 •16- 200804541 (14) 烷兩者時,式(3)和式(6)所表示的烷氧基矽烷之合計量, 在用於得到(A)成分的烷氧基矽烷之合計量中係0至3 5莫耳 %,而且其中式(6)所表示的烷氧基矽烷之比例,在用於得 到(A)成分的院氧基砍院之合計量中,較佳係0至15莫耳% 〇 ' 用於縮合本發明中所用的(A)成分之聚矽氧烷的方法 係沒有特別的限定,例如可舉出使烷氧基矽烷在醇或二醇 φ 溶劑中進行水解·縮合之方法。此時,水解·縮合反應係 可爲部分水解及完全水解中任一者。於完全水解時,理論 上可添加烷氧基矽烷中的全部烷氧基之0· 5倍莫耳的水, 但通常添加比0.5倍莫耳還過剩量的水。 於本發明中,用於上述反應的水量,係可依照所欲來 適宜選擇,但通常爲烷氧基矽烷中的全部烷氧基的0.1至 2.5倍莫耳。 又,通常以促進縮合反應爲目的,可使用鹽酸、硫酸 Φ 、硝酸、醋酸、甲酸、草酸、馬來酸等的酸;氨、甲胺、 乙胺、乙醇胺、三乙胺等的鹼;鹽酸、硫酸、或硝酸等的 金屬鹽等當作觸媒。於該情況下,用於反應的觸媒之量, 較佳爲烷氧基矽烷中的全部烷氧基的0 · 0 0 1至0.0 5倍莫耳 左右。此外,藉由加熱溶解有烷氧基矽烷的溶液,一般亦 可更促進水解•縮合反應。此時,加熱溫度及加熱時間係 可依照所欲來適宜選擇,較佳係使反應系成爲50至180°C ’以不引起液的蒸發、揮散等的方式,在密閉容器中或回 流下進行數十分鐘至數十小時。例如可舉出在5 0 °C加熱、 -17- 200804541 (15) 攪拌24小時,或在回流下加熱、攪拌8小時等的方法。 另外’作爲其它方法,例如可舉出加熱烷氧基矽烷、 溶劑及草酸的混合物之方法。具體地,預先將草酸加到醇 中以成爲草酸的醇溶液後,混合該溶液與烷氧基矽烷及加 熱的方法。此時,草酸的量,對於1莫耳的烷氧基矽烷所 具有的全邰院氧基而言’ 一般係0.2至2莫耳。此方法中的 加熱可在液溫5 0至1 8 0 °C進行,較佳爲以不引起液的蒸發 # 、揮散等的方式,例如在密閉容器中或回流下進行數十分 鐘至數十小時。 於上述各個方法中,使用複數的烷氧基矽烷時,可以 預先混合複數的烷氧基矽烷而使用,也可依順序添加複數 的烷氧基矽烷。 於藉由上述方法使烷氧基矽烷聚縮合時,所投入的烷 氧基矽烷之矽原子的合計量換算成Si02的濃度(以下稱爲 Si02換算濃度)一般係20質量%以下。藉由在如此濃度範圍 • 內選擇任意的濃度,可抑制凝膠的生成,得到均質的聚矽 氧烷之溶液。 於烷氧基矽烷之聚縮合時所用的溶劑,只要能溶解式 (1)及式(2)所表示的烷氧基矽烷及視需要選用的式(3)及式 (6)所表示的烷氧基矽烷者即可,而沒有特別的限定。一 般地,爲了藉由烷氧基矽烷的聚縮合反應來生成醇,使用 醇類或與醇類有良好相溶性的有機溶劑。 作爲如此的有機溶劑之具體例子’可舉出甲醇、乙醇 、丙醇、丁醇等的醇類;乙二醇單甲基醚、乙二醇單乙基 -18- 200804541 (16) 醚、二乙二醇單甲基醚、二乙二醇單乙基醚等的醚類;丙 酮、甲基乙基酮、甲基異丁基酮等的酮類等。 於本發明中,可以混合複數種的上述有機溶劑。 < (B)成分〉 本發明中所用的(B)成分係具有羥基的磷酸酯化合物 〇 # 爲了展現本發明的效果之良好塵埃擦掉性,較佳爲1 分子中具有1個或2個鍵結於磷原子的羥基之磷酸酯化合物 〇 於如此的磷酸酯化合物之中,較佳爲式(4)所表示的 磷酸酯化合物。 [化 13] OP(OH)m(OR6)3.m (4)(2) R2Si(OR3) -11 - 200804541 (9) R1 in the formula (1) represents a hydrocarbon group, and since the carbon number is less, the reactivity is higher, so the carbon number is preferably from 1 to 5. The saturated hydrocarbon group is more preferably a methyl group, an ethyl group, a propyl group or a butyl group. Specific examples of such a tetraalkoxy decane include tetramethoxy decane, tetraethoxy decane, tetrapropoxy decane, and tetrabutoxy decane, which are easily available from commercially available products. In the present invention, at least one of the alkoxydecanes represented by the formula (1) can be used, and a plurality of kinds can be used as needed. The alkoxydecane represented by the formula (2) is an alkoxydecane having an organic group substituted with a fluorine atom in the side chain. Therefore, the alkoxysilane is a person who imparts water repellency to the coating film. Here, R2 in the formula (2) represents the above-mentioned organic group substituted by a fluorine atom, but the number of fluorine atoms which the organic group has is not particularly limited. Further, R3 in the formula (2) represents a hydrocarbon group having 1 to 5 carbon atoms, preferably a saturated hydrocarbon group having 1 to 5 carbon atoms, more preferably a methyl group, an ethyl group, a propyl group or a butyl group. Among the alkoxydecanes represented by the formula (2), R2 is preferably a perfluoroalkyl alkoxydecane, and R2 is more preferably an organosiloxane of the organic group represented by the formula (5). . CF3(CF2)kCH2CH2 (5) In the formula (5), k represents an integer of 〇 to 12. -12- (10) 200804541 Specific examples of the alkoxydecane having an organic group represented by the formula (5) include trifluoropropyltrimethoxydecane and a trifluoropropyltriethoxy group. Heptafluorodecyltrimethoxydecane, tridecafluorooctyltriethoxyphthalate, heptafluorodecyltrimethoxydecane, heptadecafluorodecyltriethoxydecane, and the like. It is particularly preferable that k is an integer of 2 to 12 because the anti-reflection film has good fingerprint erasability. In the present invention, at least one of the alkoxysilanes represented by the formula (2) may be used, and a plurality of kinds may be used as needed. Further, the polyoxyalkylene (A) may be carried out from the alkoxydecane represented by the formula (1) and the formula (2), and the alkoxydecane represented by the formula (3) and/or the formula (6) other than the above. Polycondensation is the result. In this case, in addition to the alkoxysilanes represented by the formulas (1) and (2), the decyl oxide sand represented by the formula (3) and the alkoxy decane represented by the formula (6) may be used singly. Either of them can also use both. R4nSi(OR5)4-n (3) In the formula (3), R4 represents an organic group which is not substituted by a fluorine atom, and R5 represents a hydrocarbon group having 1 to 5 carbon atoms, and n is not 1 to 3 The integer. (6) (6) (R70)3SiR8Si(0R7)3 -13- (11) (11)200804541 In the formula (6), R7 represents a hydrocarbon group having 1 to 5 carbon atoms, and R8 represents 1 to 20 An organic chain of carbon atoms. The alkoxydecane of the formula (3) has an organic group in which R4 is not substituted with a fluorine atom and an alkoxydecane having 1, 2 or 3 alkoxy groups. R5 in the formula (3) is a hydrocarbon group each having 1 to 5 carbon atoms. When η is 1, 2, it is usually the case that R5 is the same, but in the present invention, R5 may be the same or different. R4 in the formula (3) is an organic group having 1 to 20 carbon atoms, preferably an organic group having 1 to 15 carbon atoms. When η is 2 or 3, usually R4 is the same, but in the present invention, R4 may be the same or different. Specific examples of the alkoxydecane represented by the formula (3) are shown below, but are not limited thereto. Methyl trimethoxy decane, methyl triethoxy decane, ethyl trimethoxy decane, ethyl triethoxy decane, propyl trimethoxy decane, propyl triethoxy decane, butyl Trimethoxy decane, butyl triethoxy decane, pentyl trimethoxy decane, pentyl triethoxy decane, heptyl trimethoxy decane, heptyl triethoxy decane, octyl trimethoxy decane, Octyltriethoxydecane, dodecyltrimethoxydecane,dodecyltriethoxydecane,hexadecyltrimethoxydecane,hexadecyltriethoxydecane,octadecyltrimethoxydecane, Octadecyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, 3-isocyanate propyl trimethoxy Decane, 3-isocyanatepropyltriethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, γ-glycidoxypropyltrimethoxy Decane, γ-glycidoxypropyltriethoxydecane, γ-mercaptopropyltrimethoxydecane-14- 200804541 (12) Γ-mercaptopropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, 3-propenyloxypropyltriethoxydecane, γ-methylpropenyloxypropyltrimethyl Oxygen sand yard, γ-methylpropenyl methoxypropyl triethoxy decane, γ-ureidopropyl trimethoxy decane, γ·ureidopropyl triethoxy decane and dimethyl di Dioxane " decane and the like such as methoxy decane or dimethyldiethoxy decane. R5 in the formula (3) is a hydrocarbon group having 1 to 5 carbon atoms, preferably a saturated φ and a hydrocarbon group having 1 to 4 carbon atoms, more preferably a saturated hydrocarbon group having 1 to 3 carbon atoms. In the present invention, a plurality of types of hospital oxygen chopping represented by the formula (3) can be used as needed. Further, the alkoxydecane system R7 of the formula (6) is a hydrocarbon group having 1 to 5 carbon atoms, preferably a saturated hydrocarbon group having 1 to 4 carbon atoms, more preferably a saturated hydrocarbon group having 1 to 3 carbon atoms. In the present invention, a plurality of alkoxydecanes represented by the formula (6) can be used as needed. In general, R7 is the same in many cases, but in the present invention, R7 may be the same or different. R8 is an organic chain having 1 to 20 carbon atoms, and is not particularly limited in structure, and may have a cyclic structure or a branched structure such as a double bond or a triple bond or a phenyl group. Further, a hetero atom such as nitrogen, oxygen or fluorine may be contained. In order to make the water repellency of the film formed by the present invention more excellent, among the alkoxy decanes represented by the formula (6), it is preferred to use a formula (7) in which a part of R8 contains a perfluoroalkyl chain. The alkoxy decane of the organic chain. -15- (13) (13) 200804541 -CH2CH2(CF2)pCH2CH2- (7) In the formula (7), p represents an integer of 1 to 12. Specific examples of the alkoxydecane having an organic chain-like structure of a perfluoroalkyl chain represented by the formula (7), which is one of R8 in the formula (6), may be 1,6-bis(trimethoxy). Base alkyl ethyl) dodecafluorohexane, 1,6-bis(triethoxydecylethyl)dodecafluorohexane, and the like. The component (A) used in the present invention usually has an alkoxydecane represented by the formula (1) and the formula (2), and the alkoxydecane represented by the formula (3) and the formula (6) may be optionally used. Either or both of them are obtained by polycondensation, and the ratio of the alkoxydecane used is not particularly limited as long as it is in a homogeneous solution state in a solvent. When the alkoxydecane represented by the formula (2) is 5 mol% or more in the total amount of the alkoxydecane used to obtain the component (A), the contact angle of water can be easily obtained as 8 0. The above film is preferably used, and if it is 40 mol% or less, the formation of a gel or impurities can be suppressed, and a homogeneous solution of the component (A) can be easily obtained, which is preferable. On the other hand, the amount of the alkoxydecane of the formula (1) is preferably from 6 mol% to 95 mol% in the total amount of all the alkoxydecane used to obtain the component (A). . In the case of using only the alkoxydecane represented by the formula (3), the total amount of the alkoxydecane used for obtaining the component (A) is preferably from 0 mol% to 35 mol%. Further, in the case of using only the alkoxydecane represented by the formula (6), it is preferable to use a molar amount of from 20 to 20 moles in the total amount of the alkoxysilane used for the composition of the compound (1) to (A). %. Further, in the case of using the alkoxy fluorene•16-200804541 (14) alkane represented by the formula (3) and the formula (6), the alkoxydecane represented by the formula (3) and the formula (6) The total amount of the alkoxydecane used to obtain the component (A) is 0 to 35 mol%, and the ratio of the alkoxydecane represented by the formula (6) is used for In the total amount of the hospitality of the component (A), it is preferably 0 to 15 mol%. The method for condensing the polyoxane of the component (A) used in the present invention is not particularly limited. For example, a method of hydrolyzing and condensing an alkoxydecane in an alcohol or a diol φ solvent can be mentioned. In this case, the hydrolysis/condensation reaction may be either partial hydrolysis or complete hydrolysis. In the case of complete hydrolysis, it is theoretically possible to add 0.5 to 5 moles of water of all alkoxy groups in the alkoxysilane, but usually an excess of water is added in excess of 0.5 times mole. In the present invention, the amount of water used in the above reaction can be appropriately selected as desired, but is usually 0.1 to 2.5 times moles of all alkoxy groups in the alkoxydecane. Further, in general, for the purpose of promoting the condensation reaction, an acid such as hydrochloric acid, Φ sulfuric acid, nitric acid, acetic acid, formic acid, oxalic acid or maleic acid; a base such as ammonia, methylamine, ethylamine, ethanolamine or triethylamine; or hydrochloric acid; A metal salt such as sulfuric acid or nitric acid is used as a catalyst. In this case, the amount of the catalyst used for the reaction is preferably from about 0.001 to about 0.05 moles of all alkoxy groups in the alkoxydecane. Further, by heating a solution in which an alkoxysilane is dissolved, the hydrolysis/condensation reaction is generally further promoted. In this case, the heating temperature and the heating time may be appropriately selected as desired, and it is preferred that the reaction system be 50 to 180 ° C. in a closed container or under reflux without causing evaporation or evaporation of the liquid. Dozens to tens of hours. For example, a method of heating at 50 ° C, stirring at -17-200804541 (15) for 24 hours, or heating under reflux, stirring for 8 hours, or the like can be mentioned. Further, as another method, for example, a method of heating a mixture of alkoxysilane, a solvent and oxalic acid can be mentioned. Specifically, a method in which oxalic acid is previously added to an alcohol to form an alcohol solution of oxalic acid, and the solution and alkoxysilane are mixed and heated. At this time, the amount of oxalic acid is generally 0.2 to 2 moles for the total oxo-oxyl group of 1 mole of alkoxydecane. The heating in the method can be carried out at a liquid temperature of 50 to 180 ° C, preferably in a manner that does not cause evaporation of the liquid #, volatilization, etc., for example, in a closed vessel or under reflux for several tens of minutes to several tens hour. In the above respective methods, when a plurality of alkoxydecanes are used, a plurality of alkoxydecanes may be mixed in advance, or a plurality of alkoxydecane may be added in order. When the alkoxy decane is polycondensed by the above-mentioned method, the total amount of the argon atoms of the alkoxy decane to be charged is converted into a concentration of SiO 2 (hereinafter referred to as a concentration of SiO 2 ) of generally 20% by mass or less. By selecting an arbitrary concentration within such a concentration range, gel formation can be suppressed, and a homogeneous polyoxane solution can be obtained. The solvent used in the polycondensation of the alkoxydecane is capable of dissolving the alkoxydecane represented by the formula (1) and the formula (2) and optionally the alkane represented by the formula (3) and the formula (6). The oxane can be used without particular limitation. In general, in order to form an alcohol by a polycondensation reaction of an alkoxydecane, an alcohol or an organic solvent having good compatibility with an alcohol is used. Specific examples of such an organic solvent include alcohols such as methanol, ethanol, propanol, and butanol; ethylene glycol monomethyl ether, ethylene glycol monoethyl-18-200804541 (16) ether, and An ether such as ethylene glycol monomethyl ether or diethylene glycol monoethyl ether; a ketone such as acetone, methyl ethyl ketone or methyl isobutyl ketone. In the present invention, a plurality of the above organic solvents may be mixed. <(B) Component> The component (B) used in the present invention is a phosphate compound having a hydroxyl group. 〇# In order to exhibit the excellent dust rubbing property of the effect of the present invention, it is preferred to have one or two molecules in one molecule. The phosphate compound bonded to the hydroxyl group of the phosphorus atom is preferably a phosphate compound represented by the formula (4). OP(OH)m(OR6)3.m (4)
式(4)中的R6係碳數1至20的有機基,亦可含有雙鍵或三鍵 、苯基等的環狀構造及支鏈構造。又,也可含有氮、氧等 的雜原子。 於R6的碳數爲21以上時,與聚矽氧烷(A)的相溶性變 不充分,不能充分得到塗佈液的保存安定性,故較佳爲碳 數1至20的有機基。於使用本發明的被膜於防反射膜時, 更佳爲碳數1至10,因爲可抑制反射率的上升,特佳爲碳 數1至6,因爲反射率幾乎沒有上升。 -19- (17) (17)200804541 式(4)中m係1或2的整數,但於m爲0時,式(4)的化 合物係成爲不具有羥基的磷酸酯化合物,難以得到本發明 之效果的抗靜電效果。另一方面,於m爲3時,式(4)的化 合物表示磷酸,由於與聚矽氧烷(A)的親和性不足,所形 成的被膜隨著時間的經過會不安定化而白化。 因此,具有保持被膜的安定性及抗靜電性,且藉此展 現本發明的效果之塵埃擦掉性的化合物,係m爲1或2的 兼具羥基和烷基酯部位的磷酸酯化合物。由於羥基的數目 愈多則抗靜電效果愈強,特別在m爲2時,以少量即能達 成本發明的效果,故係較宜的。 以下舉出如此的磷酸酯化合物之具體例子,惟不受其 所限定。 例如,磷酸甲酯(別名磷酸甲基酯,單酯:二酯=50:50( 質量%)混合物)、磷酸乙酯(別名磷酸乙基酯,單酯:二酯 =3 7:63 (質量%)混合物)、磷酸異丙基(別名磷酸異丙基酯 ,單酯:二酯=30:70(質量%)混合物)、磷酸二正丁酯(單酯: 二酯=3 6:64(質量%)混合物)、磷酸二正丁酯(二酯離析晶) 、磷酸苯酯(別名磷酸單苯基酯,單酯離析品)、磷酸二苯 酯(別名磷酸二苯基酯,二酯離析品)、磷酸2-乙基己酯(別 名磷酸2-乙基己基酯,單酯:二酯=40:60(質量%)混合物)、 磷酸單正十二酯(別名磷酸單正十二基酯,單酯離析晶)、 磷酸正十三酯(別名磷酸正十三基酯,單酯·二酯混合物) 、磷酸1-胺基丙酯(別名磷酸單1-胺基丙基酯,單酯離析 晶)、磷酸1-胺基-2-甲基丙酯(別名磷酸1-胺基-2 _甲基丙基 -20- 200804541 (18) 磷酸酯,單酯離析品)、磷酸乙烯酯、磷酸3_丙烯醯氧基 丙酯、磷酸3-甲基丙烯醯氧基丙等。 本發明中的(B)成分,只要與(A)成分有良好的相溶性 即可’而沒有限定,亦可以使用複數種的此等。 如此的(B)成分之含量,對於1莫耳的(a)成分中矽原 子的合計量而言,較佳爲使(B)成分的磷原子成爲〇〇1莫 耳以上,更佳爲0.1莫耳以上,特佳爲〇.15莫耳以上。若 Φ 低於0.0 1莫耳,則難以得到本發明的效果之良好塵埃擦掉 性。另一方面,若超過0.45莫耳,則特別難以提高麈埃擦 掉性的效果,故較佳爲〇 . 4 5莫耳以下。於用於防反射膜時 ,更佳爲0.4莫耳以下,特佳爲0.25莫耳以下。 < (C)溶劑〉 本發明的被膜形成用塗佈液通常係爲將(A)成分、(B) 成为、及視需要运用的後述其它成分溶解在溶劑中的溶液 Φ 狀態。 因此,本發明中所用的(C)溶劑,只要能均勻溶解(A) 成分、(B)成分、及視需要選用的後述其它成分即可,而 沒有特別的限定。通常係有機溶劑。 作爲如此的彳谷劑之具體例,可舉出甲醇、乙醇、丙醇 、丁醇、二丙酮醇等的醇類;丙酮、甲基乙基酮、甲基異 丁基酮等的酮類;乙二醇、丙二醇、己二醇等的二醇類; 乙一醇單甲基醚' 乙二單乙基醚、乙二醇單丁基醚、乙基 卡必醇、丁基卡必醇、二乙二醇單甲基醚、丙二醇單甲基 -21 - (19) (19)200804541 醚、丙二醇單丁基醚、四氫呋喃等的醚類;醋酸甲酯、醋 酸乙酯、乳酸乙酯等的酯類等。 於本發明中’亦可以使用複數的溶劑。 <其它成分> 於本發明中,只要不損害本發明的效果,則亦可含有 (A)成分及(B)成分以外的其它成分,例如無機微粒子、塡 料、均平劑、表面改質劑、界面活性劑等的成分。 作爲無機微粒子,可舉出金屬氧化物微粒子、金屬複 氧化物微粒子、氟化鎂微粒子等。 作爲金屬氧化物,可舉出矽石、氧化鋁、氧化鈦、氧 化鉻、氧化錫、氧化鋅等,作爲金屬複氧化物,ITO、 ΑΤΟ、AZO、銻酸鋅等。又,亦可例示中空的矽石微粒子 或多孔質矽石微粒子等。 如此的無機微粒子可以爲粉體及膠體溶液中任一種, 但膠體溶液由於操作容易而係較佳的。該膠體溶液可爲無 機微粒子粉分散於分散介質中者,也可爲市售品膠體溶液 〇 於本發明中,藉由含有無機微粒子,而可以賦予所形 成的硬化被膜之表面形狀或其它機能。 作爲無機微粒子,較佳爲平均粒徑0.001至0.2μπι者 ,更佳爲0.001至0.1 μηι者。無機微粒子的平均粒徑若超 過0.2 μιη,則所調製的塗佈液所形成的硬化被膜之透明性 會降低。 -22- 200804541 (20) 作爲無機微粒子的分散介質,可舉出水及有機溶齊1 ° 作爲膠體溶液,從被膜形成用塗佈液的安定性之觀點來看 ,較佳爲將pH或pKa調整到2至1〇 ’更佳爲3至7 ° 作爲膠體溶液之分散介質所用的有機溶劑’可舉出甲 醇、乙醇、丙醇、丁醇等的醇類;乙二醇等的二醇類;甲 基乙基酮、甲基異丁基酮等的酮類;甲苯、二甲苯等的芳 香族烴類;二甲基甲醯胺、二甲基乙醯胺、N_甲基11 比咯D定 φ 酮等的醯胺類;醋酸乙酯、醋酸丁酯、丁內酯等的酯類 ;乙二醇單丙基醚、四氫呋喃、1,4_二噚烷等的醚類。於 此等之中,較佳爲醇類及酮類。此等有機溶劑可單獨地或 混合2種以上當作分散介質來使用。 又,塡料 '均平劑、表面改質劑、界面活性劑等係可 使用習知者,市售品由於容易取得故係特佳的。 <被膜形成用塗佈液> • 本發明的被膜形成用塗佈液之調製方法係沒有特別的 限定。(Α)成分與(Β)成分可成爲均勻的溶液狀態。通常’ (Α)成分由於係在溶劑中聚縮合’而係以溶液狀態得到。 因此,含有(Α)成分的溶液(以下稱爲(Α)成分的溶液)照原 樣地使用,與(Β)成分的混合之方法係簡便的。又,視需 要亦可將(Α)成分的溶液濃縮’添加溶劑稀釋,或置換成 其它溶劑,然後與(Β)成分混合。再者,於混合(Α)成分的 溶液與(Β)成分後,亦可添加溶劑。又,亦可使(Β)成分溶 解於(C)溶劑中後,與(Α)成分的溶液混合。 -23- (21) (21)200804541 被膜形成用塗佈液中的Si〇2換算濃度,較佳係0.5至 15質量%,更佳係〇·5至6質量%。Si〇2換算濃度若比〇.5質 量%還低’則一次塗佈難以得到所欲的膜厚,而若比1 5質 量%還高,則溶液的保存安定性容易不足。 稀釋或置換等所用的溶劑,係可與上述烷氧基矽烷的 聚縮合時所用者同樣的溶劑,亦可爲其它溶劑。該溶劑只 要不損害(A)成分與(B)成分的相溶性即可,而沒有特別的 限定,可以任意地選擇一種或複數種來使用。 作爲上述混合其它成分的方法,可爲與(A)成分及(B) 成分同時,也可在(A)成分及(B)成分的混合後,而沒有特 別的限定。 以下舉出於本發明中’被膜形成用塗佈液的具體例子 〇 [1 ]被膜形成用塗佈液,其含有(A)成分,與對於1莫 耳的(A)成分之矽原子的合計量而言,(B)成分的磷原子爲 0.01至0.45莫耳。 [2] 被膜形成用塗佈液’其含有上述[1]及無機微粒子 〇 [3] 被膜形成用塗佈液,其含有上述[1]或[2]及由塡料 、均平劑、表面改質劑和界面活性劑所組成族群所選出的 至少一種。 <被膜的形成> 本發明的被膜形成用塗佈液係可塗佈於基材上,使熱 -24 - (22) 200804541 硬化而得到所欲的被膜。 塗佈方法係可採用習知或周知的方法。例如,可以採 用浸塗法、流塗法、旋塗法、膠版印刷法、噴墨塗覆法、 噴灑塗覆法、桿塗法、凹槽輥塗覆法、輥塗法、刮板塗覆 法、氣刮刀塗覆法、氣刀塗覆法、線刮塗覆法、逆塗覆法 、傳料輥塗覆法、微凹槽輥塗覆法、吻輥塗覆法、流延塗 覆法、縫孔塗覆法、簾幕塗覆法、口模式塗覆法等方法。 # 此時,所用的基材例如可爲塑膠、玻璃、陶瓷等習知 或周知的基材。作爲塑膠,可舉出聚碳酸酯、聚(甲基)丙 烯酸酯、聚醚楓、聚芳酯、聚胺甲酸酯、聚颯、聚醚、聚 醚酮、三甲基戊烯、聚烯烴、聚對酞酸乙二酯、(甲基)丙 烯腈、三乙醯纖維素、二乙醯纖維素、乙酸丁酸纖維素等 的板及薄膜等。 形成於基材上的塗膜,可照原樣地在室溫至450 °C, 較佳在溫度40至45 0°C使熱硬化,亦可在其之前,於室溫 # 至1 5 0 °C的溫度範圍中,較佳在溫度1 〇 °C至1 5 0 °C的溫度範 圍中,使乾燥後,熱硬化。此時,乾燥所需要的時間較佳 係10秒至10分鐘。 熱硬化所需要的時間,係可依照所欲的被膜特性來適 宜選擇,但通常爲1小時至1 〇日。於選擇低的硬化溫度時 ,由硬化時間變長,而容易得到具有充分耐擦傷性的被膜 〇 特別地,於基材爲TAC(三乙醯纖維素)薄膜或PET( 聚酯)薄膜般的有機基材時,考慮基材的耐熱性’塗膜的 -25- 200804541 (23) 硬化溫度係室溫至15(TC,較佳係溫度10°C至150°C。此時 ,使用乾燥步驟時,較佳爲在室溫至15(TC的溫度範圍中 ’更佳爲在溫度1(TC至150 °C的溫度範圍中,使乾燥10秒 至1 0分鐘。 如此所得到的本發明之被膜,具有特徵爲水接觸角係 • 80°以上,麈埃擦掉性優異。此外,於本發明所形成的被 膜之中’反射率低者係特別適用作爲防反射用途的低折射 Φ 率層。 使用本發明的被膜於防反射用途時,在具有比本發明 的被膜之折射率還高折射率的基材上,例如在通常的玻璃 或TAC (三乙醯纖維素)薄膜等的表面上,形成本發明的被 膜’可容易地將該基材轉換成具有防光反射能力的基材。 此時,本發明的被膜即便使用當作基材表面的單一被膜也 是有效的,於具有高折射率的下層被膜之上形成被膜,亦 有效使用作爲防反射積層體。 φ 此處,說明被膜的厚度與光的波長之關係,在具有折 射率a的被膜之厚度d(nm),與藉由該被膜而希望降低反 射率的光的波長λ(ηπι)之間,已知d = (2b-1)λ/4&(式中,b 表示1以上的整數)的關係式係成立。因此,利用該式來決 定被膜的厚,則可容易地防止所欲波長之光的反射。 作爲具體例子,對於波長5 5 0nm的光,形成具有1.3 2 的折射率之被膜,爲了防止來自玻璃表面的反射光,可這 些數値代入上述式中的λ和a,而算出最適合的膜厚。此 時,b係可代入任意的正整數。例如,將1代入b而得到 -26- (24) (24)200804541 的膜厚係1 0 4 n m,將2代入b而得到的膜厚係3 1 2 n m。採用 如此所算出的被膜厚度,則可以容易地賦予防反射能力。 基材上所形成的被膜之厚度,係可依照塗佈時的膜厚 來調節,但亦可藉由調節塗佈液的Si02換算濃度,而容 易地調節。 本發明的被膜之特徵爲具有撥水性(防污性)和良好的 塵埃擦掉性,而且反射率係低的。因此,可適用於玻璃製 的布朗恩管,電視、電腦、汽車導航器、攜帶式電話等的 顯示器,具玻璃表面的鏡子;玻璃製展視箱等希望防止光 的反射之領域中。特別地,液晶顯示器、電漿顯示器、投 影顯示器、EL顯示器、SED、FET、CRT等的偏光板、前 面板中所用的防反射薄膜。 實施例 以下顯示合成例、實施例及比較例來具體說明本發明 ,惟本發明不受此等實施例所限定解釋者。 茲說明本實施例中的縮寫符號。 TEOS :四乙氧基矽烷 UPS : γ-脲基丙基三乙氧基矽烷 MAS : γ-甲基丙烯醯氧基丙基三甲氧基矽烷 MPS : γ-锍基丙基三甲氧基矽烷 GPS : γ-縮水甘油氧基丙基三甲氧基矽烷 APS : 3-胺基丙基三乙氧基矽烷 F3:三氟丙基三甲氧基矽烷 -27- 200804541 (25) F13:十三氟辛基三甲氧基矽烷 F17:十七氟三甲氧基矽烷 F12: 1,6-雙(三甲氧基矽烷基乙基)十二氟己烷R6 in the formula (4) is an organic group having 1 to 20 carbon atoms, and may have a cyclic structure or a branched structure such as a double bond or a triple bond or a phenyl group. Further, a hetero atom such as nitrogen or oxygen may be contained. When the carbon number of R6 is 21 or more, the compatibility with the polyoxyalkylene (A) is insufficient, and the storage stability of the coating liquid cannot be sufficiently obtained. Therefore, an organic group having 1 to 20 carbon atoms is preferable. When the film of the present invention is used for the antireflection film, it is more preferably a carbon number of 1 to 10 because the increase in reflectance can be suppressed, and particularly preferably a carbon number of 1 to 6, because the reflectance hardly rises. -19- (17) (17) 200804541 In the formula (4), m is an integer of 1 or 2, but when m is 0, the compound of the formula (4) is a phosphate compound having no hydroxyl group, and it is difficult to obtain the present invention. The antistatic effect of the effect. On the other hand, when m is 3, the compound of the formula (4) represents phosphoric acid, and since the affinity with the polyoxyalkylene (A) is insufficient, the formed film becomes unstable and whitens over time. Therefore, the compound having the dust-repelling property of maintaining the stability and antistatic property of the film and exhibiting the effects of the present invention is a phosphate compound having a hydroxyl group and an alkyl ester moiety in which m is 1 or 2. The more the number of hydroxyl groups is, the stronger the antistatic effect is. In particular, when m is 2, the effect of the invention can be achieved in a small amount, which is preferable. Specific examples of such a phosphate compound are exemplified below, but are not limited thereto. For example, methyl phosphate (alias methyl phosphate, monoester: diester = 50:50 (% by mass) mixture), ethyl phosphate (alias ethyl phosphate, monoester: diester = 3 7:63 (quality) %) mixture), isopropyl phosphate (alias isopropyl phosphate, monoester: diester = 30:70 (% by mass) mixture), di-n-butyl phosphate (monoester: diester = 3 6:64 ( Mass %) mixture), di-n-butyl phosphate (diester isolated crystal), phenyl phosphate (alias monophenyl phosphate, monoester isolate), diphenyl phosphate (alias diphenyl phosphate, diester segregation) (product), 2-ethylhexyl phosphate (alias 2-ethylhexyl phosphate, monoester: diester = 40:60 (% by mass) mixture), mono-n-dodecyl phosphate (alias phosphate mono-n-dodecyl) Ester, monoester segregation crystal), n-tridecyl phosphate (alias n-tridecyl phosphate, monoester diester mixture), 1-aminopropyl phosphate (alias mono-aminopropyl phosphate), single Ester isolation crystal), 1-amino-2-methylpropyl phosphate (alias phosphate 1-amino-2 _methylpropyl-20- 200804541 (18) phosphate, monoester isolate), ethylene phosphate , Bing Xixi 3_ phosphate ester group, phosphoric acid group, 3-methyl-Bing Xixi C class. The component (B) in the present invention is not particularly limited as long as it has good compatibility with the component (A), and a plurality of these may be used. The content of the component (B) is preferably such that the phosphorus atom of the component (B) is 〇〇1 mol or more, more preferably 0.1, in terms of the total amount of the ruthenium atoms in the (a) component. More than Mo Er, especially good for 〇.15 Moule. If Φ is less than 0.01 mol, it is difficult to obtain good dust erasability of the effect of the present invention. On the other hand, if it exceeds 0.45 mol, it is particularly difficult to improve the effect of rubbing rubbing, and therefore it is preferably 〇45 5 or less. When used for an antireflection film, it is preferably 0.4 m or less, and particularly preferably 0.25 m or less. < (C) Solvents The coating liquid for forming a film of the present invention is usually a solution Φ in which the components (A), (B), and other components to be used, which are used as needed, are dissolved in a solvent. Therefore, the solvent (C) used in the present invention is not particularly limited as long as it can uniformly dissolve the component (A), the component (B), and other components to be described later. Usually it is an organic solvent. Specific examples of such a glutinous agent include alcohols such as methanol, ethanol, propanol, butanol, and diacetone; and ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; Glycols such as ethylene glycol, propylene glycol, hexanediol, etc.; ethyl alcohol monomethyl ether 'ethylene diethyl ether, ethylene glycol monobutyl ether, ethyl carbitol, butyl carbitol, two Ethylene glycol monomethyl ether, propylene glycol monomethyl-21 - (19) (19) 200804541 Ether, propylene glycol monobutyl ether, tetrahydrofuran and other ethers; esters of methyl acetate, ethyl acetate, ethyl lactate, etc. Classes, etc. In the present invention, a plurality of solvents can also be used. <Other components> In the present invention, other components other than the components (A) and (B) may be contained as long as the effects of the present invention are not impaired, for example, inorganic fine particles, dips, leveling agents, surface modification A component such as a granule or a surfactant. Examples of the inorganic fine particles include metal oxide fine particles, metal double oxide fine particles, and magnesium fluoride fine particles. Examples of the metal oxide include vermiculite, alumina, titania, chromium oxide, tin oxide, zinc oxide, and the like, and metal oxides such as ITO, ruthenium, AZO, and zinc ruthenate. Further, hollow vermiculite particles or porous vermiculite particles or the like can be exemplified. Such inorganic fine particles may be any of a powder and a colloidal solution, but the colloidal solution is preferred because of ease of handling. The colloidal solution may be a dispersion of the inorganic fine particle powder in a dispersion medium, or may be a commercially available colloidal solution. In the present invention, by containing inorganic fine particles, the surface shape or other functions of the formed hardened film can be imparted. The inorganic fine particles are preferably those having an average particle diameter of 0.001 to 0.2 μm, more preferably 0.001 to 0.1 μm. When the average particle diameter of the inorganic fine particles exceeds 0.2 μm, the transparency of the cured film formed by the prepared coating liquid is lowered. -22-200804541 (20) As a dispersion medium of the inorganic fine particles, water and organic solvent are dissolved at 1 ° as a colloidal solution, and from the viewpoint of the stability of the coating liquid for forming a film, pH or pKa is preferable. The organic solvent used for the dispersion medium of the colloidal solution is adjusted to 2 to 1 〇, preferably 3 to 7 °, and alcohols such as methanol, ethanol, propanol, and butanol; glycols such as ethylene glycol; a ketone such as methyl ethyl ketone or methyl isobutyl ketone; an aromatic hydrocarbon such as toluene or xylene; dimethylformamide, dimethylacetamide, and N-methyl 11 D is a guanamine such as φ ketone; an ester such as ethyl acetate, butyl acetate or butyrolactone; an ether such as ethylene glycol monopropyl ether, tetrahydrofuran or 1,4-dioxane. Among these, alcohols and ketones are preferred. These organic solvents may be used singly or in combination of two or more kinds as a dispersion medium. Further, the "leveling agent, surface modifier, surfactant, etc." can be used by a conventional one, and a commercial product is particularly preferable because it is easy to obtain. <Coating Liquid for Film Formation> The method for preparing the coating liquid for forming a film of the present invention is not particularly limited. The (Α) component and the (Β) component can be in a uniform solution state. Usually, the '(Α) component is obtained in a solution state because it is polycondensed in a solvent. Therefore, a solution containing a (Α) component (hereinafter referred to as a solution of a (Α) component) is used as it is, and a method of mixing with a (Β) component is simple. Further, if necessary, the solution of the (Α) component may be concentrated by adding solvent or substituted with another solvent, and then mixed with the (Β) component. Further, after mixing the (与) component solution and the (Β) component, a solvent may be added. Further, the (Β) component may be dissolved in the (C) solvent and then mixed with the solution of the (Α) component. -23- (21) (21) 200804541 The concentration of Si〇2 in the coating liquid for forming a film is preferably from 0.5 to 15% by mass, more preferably from 5 to 6% by mass. When the Si〇2 conversion concentration is lower than 〇.5 mass%, it is difficult to obtain a desired film thickness in one application, and if it is higher than 15% by mass, the storage stability of the solution tends to be insufficient. The solvent to be used for dilution or replacement may be the same solvent as that used in the above-mentioned polycondensation of the above alkoxydecane, or may be another solvent. The solvent is not particularly limited as long as it does not impair the compatibility between the component (A) and the component (B), and may be arbitrarily selected from one or more of them. The method of mixing the other components may be carried out simultaneously with the components (A) and (B), or after the mixing of the components (A) and (B), and is not particularly limited. In the present invention, a specific example of the coating liquid for forming a film 〇[1] coating liquid for film formation, which contains the component (A) and the total amount of the ruthenium atom of the (A) component for 1 mol. In terms of quantity, the phosphorus atom of the component (B) is from 0.01 to 0.45 mol. [2] The coating liquid for forming a film, which contains the above [1] and the inorganic fine particle 〇 [3] coating liquid for forming a film, which contains the above [1] or [2] and a coating material, a leveling agent, and a surface. At least one selected from the group consisting of a modifier and a surfactant. <Formation of Coating Film> The coating liquid for forming a film of the present invention can be applied onto a substrate, and the heat-24 - (22) 200804541 is cured to obtain a desired film. The coating method can be carried out by a conventional or well-known method. For example, dip coating, flow coating, spin coating, offset printing, inkjet coating, spray coating, bar coating, gravure coating, roll coating, and blade coating may be employed. Method, air knife coating method, air knife coating method, wire coating method, reverse coating method, transfer roll coating method, micro-groove roll coating method, kiss roll coating method, casting coating Method, slit hole coating method, curtain coating method, port mode coating method, and the like. # At this time, the substrate to be used may be, for example, a conventional or well-known substrate such as plastic, glass, or ceramic. Examples of the plastic include polycarbonate, poly(meth)acrylate, polyether maple, polyarylate, polyurethane, polyfluorene, polyether, polyetherketone, trimethylpentene, and polyolefin. A plate or a film of polyethylene terephthalate, (meth)acrylonitrile, triacetyl cellulose, diacetyl cellulose, cellulose acetate butyrate or the like. The coating film formed on the substrate may be thermally cured at room temperature to 450 ° C, preferably at a temperature of 40 to 45 ° C, or before, at room temperature # to 150 ° ° In the temperature range of C, it is preferably in a temperature range of from 1 〇 ° C to 150 ° C to be thermally hardened after drying. At this time, the time required for drying is preferably from 10 seconds to 10 minutes. The time required for the heat hardening can be appropriately selected depending on the characteristics of the film desired, but it is usually from 1 hour to 1 day. When a low hardening temperature is selected, the hardening time becomes long, and it is easy to obtain a film having sufficient scratch resistance, in particular, the substrate is a TAC (triethylene cellulose) film or a PET (polyester) film. For the organic substrate, consider the heat resistance of the substrate. -25-200804541 (23) The curing temperature is room temperature to 15 (TC, preferably the temperature is 10 ° C to 150 ° C. At this time, the drying step is used. Preferably, it is preferably from room temperature to 15 (temperature range of TC) at a temperature of 1 (TC to 150 ° C in a temperature range of 10 seconds to 10 minutes. The thus obtained invention is The film is characterized by a water contact angle system of 80° or more, and is excellent in rubbing property. Further, in the film formed by the present invention, the low reflectance is particularly suitable as a low refractive Φ layer for antireflection use. When the film of the present invention is used for antireflection, on a substrate having a refractive index higher than that of the film of the present invention, for example, on a surface of a usual glass or TAC (triethylene cellulose) film. Forming the film of the present invention' can easily convert the substrate into a film A substrate having a light-reflecting ability. In this case, the film of the present invention is effective even when a single film which is a surface of the substrate is used, and a film is formed on the lower film having a high refractive index, and is effectively used as an anti-reflection layer. φ Here, the relationship between the thickness of the film and the wavelength of light, the thickness d (nm) of the film having the refractive index a, and the wavelength λ (ηπι) of the light which is desired to reduce the reflectance by the film are described. In the meantime, a relational expression of d = (2b-1)λ/4& (wherein b represents an integer of 1 or more) is known. Therefore, by determining the thickness of the film by this formula, it is possible to easily prevent the desired Reflection of light of a wavelength. As a specific example, for a light having a wavelength of 550 nm, a film having a refractive index of 1.3 2 is formed, and in order to prevent reflected light from the surface of the glass, these numbers are substituted into λ and a in the above formula, The optimum film thickness is calculated. In this case, b can be substituted with an arbitrary positive integer. For example, 1 is substituted into b to obtain a film thickness of -26-(24) (24) 200804541 of 1 0 4 nm, and 2 is substituted. The film thickness obtained by b is 3 1 2 nm. The thickness can be easily imparted to the antireflection ability. The thickness of the film formed on the substrate can be adjusted according to the film thickness at the time of coating, but it can be easily adjusted by adjusting the concentration of the coating solution in terms of SiO 2 conversion. The film of the present invention is characterized by water repellency (antifouling property) and good dust repellency, and has low reflectance. Therefore, it can be applied to a glass-made Bronze tube, television, computer, car navigation. A display such as a portable telephone, a mirror with a glass surface, a glass display box, etc., which is intended to prevent reflection of light, in particular, a liquid crystal display, a plasma display, a projection display, an EL display, an SED, an FET, A polarizing plate such as a CRT or an antireflection film used in the front panel. EXAMPLES Hereinafter, the present invention will be specifically described by way of Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited by the examples. The abbreviations in the embodiment are explained. TEOS: Tetraethoxydecane UPS: γ-ureidopropyltriethoxydecane MAS: γ-Methyl propylene methoxypropyltrimethoxydecane MPS : γ-mercaptopropyltrimethoxydecane GPS: Γ-glycidoxypropyltrimethoxydecane APS: 3-aminopropyltriethoxydecane F3:trifluoropropyltrimethoxydecane-27- 200804541 (25) F13: trifluorooctyltrimethyl Oxydecane F17: heptadecafluorotrimethoxydecane F12: 1,6-bis(trimethoxydecylethyl)dodecafluorohexane
MeOH :甲醇 IPA :異丙醇(2-丙醇) ' n-BuOH :正 丁基醇(1-丁醇) PG :丙二醇 φ PA :磷酸MeOH: methanol IPA: isopropanol (2-propanol) 'n-BuOH: n-butyl alcohol (1-butanol) PG: propylene glycol φ PA: phosphoric acid
MePA:磷酸甲酯(別名磷酸甲基酯,單酯:二酯 = 50:50(質量%)混合物)MePA: methyl phosphate (alias methyl phosphate, monoester: diester = 50:50 (% by mass) mixture)
EtPA :磷酸乙酯(別名磷酸乙基酯,單酯:二酯 = 3 7:63 (質量%)混合物) IPPA :磷酸異丙酯(別名磷酸異丙基酯,單酯:二酯 = 30:70(質量%)混合物)EtPA: Ethyl phosphate (alias ethyl phosphate, monoester: diester = 3 7:63 (% by mass) mixture) IPPA: isopropyl phosphate (alias isopropyl phosphate, monoester: diester = 30: 70 (% by mass) mixture)
PhPA :磷酸苯酯(別名磷酸單苯基酯,單酯離析品) • EhPA :磷酸2_乙基己酯(別名磷酸2-乙基己基酯,單 酯:二酯=4 0:60(質量%)混合物)PhPA: phenyl phosphate (alias monophenyl phosphate, monoester isolate) • EhPA: 2-ethylhexyl phosphate (alias 2-ethylhexyl phosphate, monoester: diester = 4 0:60 (quality %)mixture)
DdP A :磷酸單正十二酯(別名磷酸單正十二基酯,單 酯離析晶) 丁 MePA :磷酸三甲酯(別名磷酸三甲基酯,三酯離析 品) 以下顯示下述合成例中的測定法。 [殘留烷氧基矽烷單體測定法] -28- 200804541 (26) 藉由氣相層析術(以下稱爲GC)來測定聚矽氧烷(A)的 溶液中之殘留烷氧基矽烷單體。GC測定係使用島津製作 所公司製的Shimadzu GC-14B,在下述條件下測定。 管柱··毛細管柱 CBPl-W25- 100(25mmx0.53mm(D χίμπι) 管柱溫度··開始溫度爲5 0 °C,以1 5 °C /分鐘升溫,到達 溫度爲290°C(3分鐘)。DdP A: mono-n-dodecyl phosphate (alias mono-n-dodecyl phosphate, monoester-isolated crystal) Butane MePA: trimethyl phosphate (alias trimethyl phosphate, triester isolate) The following synthesis examples are shown below. In the assay. [Residual alkoxydecane monomer assay] -28- 200804541 (26) Determination of residual alkoxydecane in a solution of polyoxane (A) by gas chromatography (hereinafter referred to as GC) body. The GC measurement was carried out under the following conditions using Shimadzu GC-14B manufactured by Shimadzu Corporation. Column · Capillary column CBPl-W25- 100 (25mmx0.53mm (D χίμπι) Column temperature · Start temperature is 50 °C, heat up at 15 °C / min, reach temperature 290 °C (3 minutes) ).
樣品注入量:1 μ L φ 注射溫度:240°C 檢測器溫度:290°C 載體氣體:氮氣(流量30mL/分鐘) 檢測法:FID法 [合成例1] 於具備回流管的4 口反應燒瓶內,投入32.54克MeOH ,於攪拌下少量一點一點地添加18·〇〇克草酸,以調製草 φ 酸的MeOH溶液。接著,將該草酸-甲醇溶液加熱及使回 流,然後滴下 24.73克1^〇11'17.71克丁£〇8、7.02克?13 的混合物。滴下結束後,在回流下繼續反應5小時後’放 置冷卻以調製聚矽氧烷(A)的溶液(P1) °藉由GC來測定該 聚矽氧烷(A)的溶液(P 1 ),結果沒有檢測出烷氧基矽烷單 am 體。 [合成例2至11] 以表1中所示的組成,藉由與合成例1同樣的方法,得 -29- (27) (27)200804541Sample injection amount: 1 μ L φ Injection temperature: 240 ° C Detector temperature: 290 ° C Carrier gas: nitrogen (flow rate 30 mL / min) Detection method: FID method [Synthesis Example 1] 4-reaction flask with reflux tube Inside, 32.54 g of MeOH was charged, and 18 gram of oxalic acid was added little by little with stirring to prepare a solution of oxalic acid in MeOH. Next, the oxalic acid-methanol solution was heated and refluxed, and then 24.73 g of 1^〇11'17.71 g of D.8, 7.02 g was dropped. A mixture of 13. After the completion of the dropwise addition, the reaction was continued under reflux for 5 hours, and then left to cool to prepare a solution (P1) of the polyoxane (A). The solution (P 1 ) of the polyoxane (A) was determined by GC. As a result, no alkoxydecane monoammonium was detected. [Synthesis Examples 2 to 11] With the composition shown in Table 1, by the same method as in Synthesis Example 1, -29-(27) (27) 200804541 was obtained.
到聚矽氧烷(A)的溶液(P2至PI 1)。此時,與合成例1同樣 地,預先混合複數種的烷氧基矽烷(以下稱爲單體)而使用 。藉由GC來分別測定所得到的聚矽氧烷(A)的溶液(P2至 P 1 1 ),結果沒有檢測出單體。 •30- (28)200804541 [表1]To the solution of polyoxane (A) (P2 to PI 1). At this time, in the same manner as in Synthesis Example 1, a plurality of alkoxysilanes (hereinafter referred to as monomers) were mixed in advance and used. The solution (P2 to P 1 1 ) of the obtained polyoxane (A) was separately measured by GC, and as a result, no monomer was detected. •30- (28)200804541 [Table 1]
聚矽氧 烷(A) 的溶液 烷氧基矽烷 (克) (莫耳) MeOH (克) 草酸-甲醇溶液 草酸(克) MeOH(克) 合成例1 P1 TEOS F13 17.71 7.02 24.73 18.00 32.54 0.085 0.015 合成例2 P2 TEOS F13 UPS 16.77 7.02 1.29 25.08 18.00 31.84 0.0805 0.015 0.0045 合成例3 P3 TEOS FI 3 UPS 19.06 1.87 1.29 22.22 18.00 37.56 0.0915 0.004 0.0045 合成例4 P4 TEOS F13 UPS 16.25 8.19 L29 25.73 18.00 30.54 0.078 0.0175 0.0045 合成例5 P5 TEOS F3 UPS 15.73 4.36 1.29 21.38 18.00 39.24 0.0755 0.02 0.0045 合成例6 P6 TEOS F17 UPS 17.81 5.68 1.29 24.78 18.00 32.44 0.0855 0.01 0.0045 合成例7 P7 TEOS F13 MAS 16.77 7.02 1.12 24.91 18.00 32.18 0.0805 0.015 0.0045 合成例8 P8 TEOS F13 MPS 16.77 7.02 0.88 24.67 18.00 32.66 0.0805 0.015 0.0045 合成例9 P9 TEOS F13 GPS 16.77 7.02 1.06 24.85 18.00 32.30 0.0805 0.015 0.0045 合成例10 P10 TEOS F13 APS GPS 13.85 9.36 1.00 2.12 26.33 18.00 29.34 0.0665 0.02 0.0045 0.009 合成例11 P11 TEOS F13 F12 UPS 9.08 3.12 3.99 0.86 17.05 12.00 53.89 0.0437 0.0067 0.0067 0.003 -31 - (29) 200804541 [合成例12] 於具備回流管的4 口反應燒瓶內,投入2 8.8 3克MeOH ,於攪拌下少量一點一點地添加27.91克TE0S、1 1.70克 F1 3、1.98克UPS,以調製複數種的烷氧基矽烷化合物之 混合M e Ο Η溶液。接著,在室溫攬拌該混合溶液後,滴下 14.42克 MeOH、15.01克水、0.15克草酸的混合物。滴下 結束後,開始加熱,從回流開始繼續1小時反應後,放置 冷卻以調製聚矽氧烷(A)的溶液(P 12)。藉由GC來測定該 聚矽氧烷(A)的溶液(P 12),結果沒有檢測出單體。 表2] 聚矽氧烷 (A)的溶液 烷氧基矽烷-MeOH溶液 水·草酸-MeOH溶液 烷氧基矽烷 (克) (莫耳) MeOH (克) 水 (克) 草酸 (克) MeOH (克) TEOS F13 UPS 合成例12 P12 27.91 11.70 1.98 28.83 15.01 0.15 14.42 0.134 0.025 0.0075Solution of polyoxyalkylene (A) alkoxy decane (g) (mole) MeOH (g) oxalic acid-methanol solution oxalic acid (g) MeOH (g) Synthesis Example 1 P1 TEOS F13 17.71 7.02 24.73 18.00 32.54 0.085 0.015 Synthesis Example 2 P2 TEOS F13 UPS 16.77 7.02 1.29 25.08 18.00 31.84 0.0805 0.015 0.0045 Synthesis Example 3 P3 TEOS FI 3 UPS 19.06 1.87 1.29 22.22 18.00 37.56 0.0915 0.004 0.0045 Synthesis Example 4 P4 TEOS F13 UPS 16.25 8.19 L29 25.73 18.00 30.54 0.078 0.0175 0.0045 Synthesis Example 5 P5 TEOS F3 UPS 15.73 4.36 1.29 21.38 18.00 39.24 0.0755 0.02 0.0045 Synthesis Example 6 P6 TEOS F17 UPS 17.81 5.68 1.29 24.78 18.00 32.44 0.0855 0.01 0.0045 Synthesis Example 7 P7 TEOS F13 MAS 16.77 7.02 1.12 24.91 18.00 32.18 0.0805 0.015 0.0045 Synthesis Example 8 P8 TEOS F13 MPS 16.77 7.02 0.88 24.67 18.00 32.66 0.0805 0.015 0.0045 Synthesis Example 9 P9 TEOS F13 GPS 16.77 7.02 1.06 24.85 18.00 32.30 0.0805 0.015 0.0045 Synthesis Example 10 P10 TEOS F1 3 APS GPS 13.85 9.36 1.00 2.12 26.33 18.00 29.34 0.0665 0.02 0.0045 0.009 Synthesis Example 11 P11 TEOS F13 F12 UPS 9.08 3.12 3.99 0.86 17.05 12.00 53.89 0.0437 0.0067 0.0067 0.003 -31 - (29) 200804541 [Synthesis Example 12] In a 4-neck reaction flask, 28.8 3 g of MeOH was charged, and 27.91 g of TEOS, 1.70 g of F1 3, and 1.98 g of UPS were added little by little with stirring to prepare a mixture of a plurality of alkoxydecane compounds. e Ο Η solution. Next, after mixing the mixed solution at room temperature, a mixture of 14.42 g of MeOH, 15.01 g of water, and 0.15 g of oxalic acid was added dropwise. After the completion of the dropwise addition, heating was started, and after continuing the reaction for 1 hour from the reflux, the mixture was cooled to prepare a solution (P 12) of the polyoxane (A). The solution (P 12) of the polyoxyalkylene (A) was measured by GC, and as a result, no monomer was detected. Table 2] Solution of polyoxyalkylene (A) alkoxy decane-MeOH solution water oxalic acid-MeOH solution alkoxy decane (g) (mole) MeOH (g) water (g) oxalic acid (g) MeOH ( g) TEOS F13 UPS Synthesis Example 12 P12 27.91 11.70 1.98 28.83 15.01 0.15 14.42 0.134 0.025 0.0075
[實施例1至20] 以表3中所示的組成,於聚矽氧烷(A)的溶液中混合磷 酸酯化合物(B)及溶劑,以調製被膜形成用塗佈液。使用 該塗佈液,進行下述所示的保存安定性及被膜之評價。 [比較例1至8 ] 以表3中所示的組成,於聚ί夕氧院(A)的溶液中混合溶 -32- (30) (30)200804541[Examples 1 to 20] The phosphoric acid compound (B) and the solvent were mixed in a solution of polysiloxane (A) in the composition shown in Table 3 to prepare a coating liquid for forming a film. Using the coating liquid, the storage stability and the film evaluation described below were carried out. [Comparative Examples 1 to 8] In the composition shown in Table 3, the solution was mixed in a solution of the polyethoxylate (A) -32- (30) (30) 200804541
劑,以調製塗佈液。使用該塗佈液,與實施例同樣地進行 下述所示的保存安定性及被膜之評價。但是,於比較例6 中,使用PA代替實施例中的磷酸酯化合物(B)而成之塗佈 液,於比較例7中,使用TMePA的塗佈液,進行評價。 -33- (31)200804541 [表3]To prepare a coating solution. Using the coating liquid, the storage stability and the film evaluation described below were carried out in the same manner as in the examples. However, in Comparative Example 6, a coating liquid obtained by substituting PA for the phosphate compound (B) in the example was used, and in Comparative Example 7, the coating liquid of TMePA was used for evaluation. -33- (31)200804541 [Table 3]
聚矽氧烷 (A)溶液 (克) 磷酸酯化 合物(B) (克) 溶劑 P/Si 莫耳比 PG (克) n-BuOH (克) IPA (克) 實施例1 P1 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例2 P2 33.33 MePA 0.60 7.00 10.00 49.07 0.15 實施例3 P2 33.33 IPPPA 0.85 7.00 10.00 48.82 0.15 實施例4 P2 33.33 PhPA 0.12 7.00 10.00 49.55 0.02 實施例5 P2 33.33 PhPA 0.58 7.00 10.00 49.09 0.10 實施例6 P2 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例7 P2 33.33 EhPA 1.42 7.00 10.00 48.25 0.15 實施例8 P2 33.33 DdPA 1.33 7.00 10.00 48.34 0.15 實施例9 P3 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例10 P4 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例11 P5 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例12 P6 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例13 P7 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例14 P8 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例15 P9 33.33 PhPA 0·87 7.00 10.00 48.80 0.15 實施例16 ΡΙ0 3.33 PhPA 0.87 7.00 10.00 48.80 0.15 實施例Π P12 20.00 PhPA 0.87 7.00 10.00 62.13 0.15 實施例18 P2 33.33 EtPA 0.96 7.00 10.00 48.71 0.20 實施例19 P2 33.33 EtPA 1.92 700 10.00 47.75 0.40 實施例20 P11 50.00 PhPA 0.87 7.00 10.00 32.13 0.15 比較例1 P1 33.33 - 7.00 10.00 49.67 - 比較例2 P2 33.33 - 7.00 10.00 49.67 - 比較例3 P5 33.33 - 7.00 10.00 49.67 - 比較例4 P6 33.33 - 7.00 10.00 49.67 - 比較例5 P12 20.00 - 7.00 10.00 63.00 - 比較例6 P2 33.33 PA 0.49 7.00 10.00 49.18 0.15 比較例7 P2 33.33 TMePA 0.70 7.00 10.00 48.97 0.15 比較例8 P11 50.00 - 7.00 10.00 33.00 - -34- 200804541 (32) 表3中的P/Si莫耳比表示磷酸酯化合物(B)的磷原子 與聚矽氧烷(A)的矽原子之莫耳比。 <保存安定性> 將由表3之組成所調製的被膜形成用塗佈液,在室溫 靜置1個月後,藉由孔徑〇·45μπι、(DxL : 1 8x22mm的非水 系聚四氟乙烯過濾器(倉敷紡績公司製的 Kuromatodisk 1 3 N)過濾100 cc,以可過濾者當作〇,以發生堵塞(clog)者 當作x。表4中顯示塗佈液的保存安定性之評價結果。 <被膜的評價> 使用線桿(No .3),將所調製的被膜形成用塗佈液塗佈 到施有下述所示處理的三乙醯纖維素(以下稱爲TAC)薄膜 上(薄膜厚80μηι,在波長5 5 0nm時的反射率爲4.5%),以形 成塗膜。然後,在室溫放置1分鐘,使用乾淨烘箱,在溫 度1〇〇 °C使乾燥5分鐘,接著在溫度40 °C中3日使硬化。 此時所用的TAC薄膜係將日本製紙公司製的附有硬 塗層之TAC薄膜(薄膜厚80μιη),在40°C加熱後,浸漬於5 質量%氫氧化鉀(KOH)水溶液中3分鐘以進行鹼處理後,用 純水洗淨,接著浸漬在室溫的〇.5質量%硫酸(H2S04)水溶 液中3 0秒,最後用純水洗淨,然後在溫度70°(:的烘箱中1 小時乾燥而成爲的薄膜。 對於所得到的被膜,進行水接觸角、奇異筆(magic) 擦掉性、指紋擦掉性、霧度(HAZE)、透射率、反射率、 -35 _ (33) (33)200804541 表面電阻、摩擦帶電指數、塵埃擦掉性的評價。此等評價 方法係如下述,表4及表5中顯示評價結果。 [水接觸角] 使用協和界面科學公司製自動接觸角測定裝置 F A C E (C A - W型),藉由液適法5點平均來測定。此時’在 2 3 t:、相對濕度5 0 %的環境中,於針尖產生3 · 0 μ 1的純水之 水滴,使其滴到被膜表面,測定其接觸角。 [奇異筆擦掉性] 用黑色奇異筆(Magic ink公司製Μ7 0 0- Τ1)在被膜面 上書寫後,使乾燥’然後用衛生紙來擦拭’依照下述基準 ,目視評估其擦掉程度。 〇:可完全擦掉油墨。 △:油墨大部分被擦掉,但痕跡殘留著。 X :油墨本身殘留,幾乎不能擦掉。 [指紋擦掉性] 使指紋附著於被膜面後,用衛生紙來擦拭’依照下述 基準,目視評估其擦掉程度。 〇:可完全擦掉指紋和油分。 △:油分可擦掉,但指紋的痕跡殘留著。 X :無法擦掉指紋和油分。 -36- (34) 200804541 [霧度及透射率] 使用東京電色公司製的8?£(:1八[11八2丑%£了£11丁(:-1 8 0 0 Η來測定。 [反射率] 以砂紙來磨擦塗佈面之相反側的薄膜面(裏面),塗佈 黑色塗料使消籠後,連接於島津製作所公司製的分光光度 • 計UV-3 100PC中的UV反射率測定裝置MPC-3100,在波 長範圍400-800nm作測定。測定波長550nm、入射角5。的 反射率。 [表面電阻] 使用東亞D K K公司製數位絕緣計d S Μ - 8 1 0 3來測定表 面電阻値。此時,使用在2 3 °C、相對濕度5 0 %的環境下放 置3小時後的樣品。 參 [摩擦帶電壓] 使用安裝有當作摩擦布的羊毛布(薄紗jIS L 0803用) 之鐘紡工程公司製的鐘紡摩擦帶電壓測定裝置EST-8,對 在2 3 °C、相對濕度5 0 %的環境中放置3小時以上後的樣品被 膜面作1 0次摩擦後,測定6 0秒的表面帶電壓値。以由此所 得之摩擦帶電指數IFC(帶電壓-時間曲線的積分値)來評估 被膜的帶電性(愈小愈不易帶電,塵埃擦掉性愈良好)。本 評估法係根據JIS L 1 094。 -37- (35) (35)200804541 〔塵埃擦掉性〕 於被膜面上,將衛生紙撕細,使紙塵附著於被膜面後 ,藉由衛生紙來擦拭,依照下述基準,目視評估其擦掉程 度。 〇:擦拭前所附著麈埃之7成以上被去除 △ ··擦拭前所附著塵埃之4至7成被去除 X :幾乎不能擦掉Polyoxane (A) solution (g) Phosphate compound (B) (g) Solvent P/Si Mobi ratio PG (g) n-BuOH (g) IPA (g) Example 1 P1 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 2 P2 33.33 MePA 0.60 7.00 10.00 49.07 0.15 Example 3 P2 33.33 IPPPA 0.85 7.00 10.00 48.82 0.15 Example 4 P2 33.33 PhPA 0.12 7.00 10.00 49.55 0.02 Example 5 P2 33.33 PhPA 0.58 7.00 10.00 49.09 0.10 Example 6 P2 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 7 P2 33.33 EhPA 1.42 7.00 10.00 48.25 0.15 Example 8 P2 33.33 DdPA 1.33 7.00 10.00 48.34 0.15 Example 9 P3 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 10 P4 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 11 P5 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 12 P6 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 13 P7 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 14 P8 33.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example 15 P9 33.33 PhPA 0·87 7.00 10.00 48.80 0.15 Example 16 ΡΙ0 3.33 PhPA 0.87 7.00 10.00 48.80 0.15 Example Π P12 2 0.00 PhPA 0.87 7.00 10.00 62.13 0.15 Example 18 P2 33.33 EtPA 0.96 7.00 10.00 48.71 0.20 Example 19 P2 33.33 EtPA 1.92 700 10.00 47.75 0.40 Example 20 P11 50.00 PhPA 0.87 7.00 10.00 32.13 0.15 Comparative Example 1 P1 33.33 - 7.00 10.00 49.67 - Comparative Example 2 P2 33.33 - 7.00 10.00 49.67 - Comparative Example 3 P5 33.33 - 7.00 10.00 49.67 - Comparative Example 4 P6 33.33 - 7.00 10.00 49.67 - Comparative Example 5 P12 20.00 - 7.00 10.00 63.00 - Comparative Example 6 P2 33.33 PA 0.49 7.00 10.00 49.18 0.15 Comparative Example 7 P2 33.33 TMePA 0.70 7.00 10.00 48.97 0.15 Comparative Example 8 P11 50.00 - 7.00 10.00 33.00 - -34- 200804541 (32) The P/Si molar ratio in Table 3 indicates the phosphorus atom of the phosphate compound (B). The molar ratio of the ruthenium atom of polyoxyalkylene (A). <Preservation stability> The coating liquid for forming a film prepared by the composition of Table 3 was allowed to stand at room temperature for one month, and then had a pore diameter of 4545 μm (DxL: 1 8 x 22 mm of non-aqueous polytetrafluoroethylene). Ethylene filter (Kuromatodisk 1 3 N, manufactured by Kuraboki Co., Ltd.) was filtered to 100 cc, and the filter was used as the 〇, and the clog was used as the x. The storage stability of the coating liquid is shown in Table 4. [Evaluation of the film] The coating liquid for forming a film to be formed was applied to the triethylenesulfide cellulose (hereinafter referred to as TAC) to which the treatment shown below was carried out using a wire rod (No. 3). On the film (film thickness 80 μm, reflectance at a wavelength of 550 nm, 4.5%) to form a coating film. Then, it was allowed to stand at room temperature for 1 minute, and dried at a temperature of 1 ° C for 5 minutes using a clean oven. Then, it was hardened at a temperature of 40 ° C for 3 days. The TAC film used at this time was a TAC film (film thickness 80 μm) made of Nippon Paper Co., Ltd., which was hard-coated at 40 ° C, and then immersed in 5 After being treated with alkali for 3 minutes in a mass% potassium hydroxide (KOH) aqueous solution, it is washed with pure water and then connected. It was immersed in a 5% mass% sulfuric acid (H2S04) aqueous solution at room temperature for 30 seconds, and finally washed with pure water, and then dried in an oven at a temperature of 70 ° (for 1 hour) to form a film. , water contact angle, magic eraser, fingerprint erasability, haze (HAZE), transmittance, reflectivity, -35 _ (33) (33) 200804541 surface resistance, frictional charge index, dust Evaluation of the erasability. The evaluation methods are as follows, and the evaluation results are shown in Tables 4 and 5. [Water Contact Angle] The automatic contact angle measuring device FACE (CA-W type) manufactured by Kyowa Interface Science Co., Ltd. was used. The liquid method is measured at an average of 5 points. At this time, in the environment of 2 3 t: and relative humidity of 50%, water droplets of 3 · 0 μ 1 of pure water are generated at the tip of the needle, and dripped onto the surface of the film to measure the contact. [Singular pen erasing property] After writing on the film surface with a black singular pen (manufactured by Magic Ink Co., Ltd. 0 00 0 - Τ 1), dry it and then wipe it with toilet paper. Visually evaluate the rubbing off according to the following criteria. Degree: 〇: The ink can be completely wiped off. △: Most of the ink It is rubbed off, but the traces remain. X: The ink itself remains and can hardly be wiped off. [Fingerprint erasability] After the fingerprint is attached to the film surface, wipe it with a toilet paper. 'According to the following criteria, visually evaluate the degree of rubbing off. 〇: The fingerprint and oil can be completely wiped off. △: The oil can be wiped off, but the fingerprint remains. X: The fingerprint and oil can not be erased. -36- (34) 200804541 [Haze and Transmittance] Use Tokyo The electric color company made 8? £ (: 1 eight [11 8 2 ug%] £11 ding (: -1 800 Η to measure. [Reflectance] The surface of the film on the opposite side of the coated surface (inside) was rubbed with a sandpaper, and after applying a black paint to the cage, the UV reflectance in the spectrophotometer UV-3 100PC manufactured by Shimadzu Corporation was attached. The measuring device MPC-3100 was measured in the wavelength range of 400-800 nm. The measurement wavelength was 550 nm and the incident angle was 5. Reflectivity. [Surface Resistance] The surface resistance 値 was measured using a digital insulation meter d S Μ - 8 1 0 3 manufactured by East Asia D K K. At this time, the sample was placed in an environment of 23 ° C and a relative humidity of 50% for 3 hours. Reference [friction band voltage] The bell-spinning friction band voltage measuring device EST-8 manufactured by Chung Textile Engineering Co., Ltd., which is a wool cloth (for gauze jIS L 0803), which is used as a rubbing cloth, is used at 23 ° C, relative humidity 5 After the sample placed in the 0% environment for 3 hours or more was rubbed by the film surface for 10 times, the surface band voltage 6 of 60 seconds was measured. The thus obtained triboelectric charging index IFC (integral enthalpy with voltage-time curve) was used to evaluate the chargeability of the film (the smaller the charge, the less charged, the better the dust rubbing property). This evaluation method is based on JIS L 1 094. -37- (35) (35) 200804541 [Dust-erasing property] On the surface of the film, the toilet paper is torn off, and the paper dust is adhered to the film surface, and then wiped with a toilet paper, and the rubbing is visually evaluated according to the following criteria. The extent of it. 〇: 70% or more of the adhered 麈 before wiping is removed △ ·· 4 to 70% of the dust attached before wiping is removed X: Almost wiped off
-38- (36) 200804541 表4] 實施例 保存安定性 水接觸角 (度) 奇異筆擦掉性 指紋擦掉性 實施例1 〇 >100 〇 〇 實施例2 〇 >100 〇 〇 實施例3 〇 >100 〇 〇 實施例4 〇 >100 〇 〇 實施例5 〇 >100 〇 〇 實施例6 〇 >100 〇 〇 實施例7 〇 >100 〇 〇 實施例8 〇 >100 〇 〇 實施例9 〇 >100 〇 〇 實施例10 〇 >100 〇 〇 實施例11 〇 >80 〇 〇 實施例12 〇 >100 〇 〇 實施例13 〇 >100 〇 〇 實施例14 〇 >100 〇 〇 實施例15 〇 >100 〇 〇 實施例16 〇 >100 〇 〇 實施例17 〇 >100 〇 〇 實施例18 〇 >100 〇 〇 實施例19 〇 >100 〇 〇 實施例20 〇 >100 〇 〇 比較例1 〇 >100 〇 〇 比較例2 〇 >100 〇 〇 比較例3 〇 >80 〇 〇 比較例4 〇 >100 〇 〇 比較例5 〇 >100 〇 〇 比較例6 〇 >100 〇 〇 比較例7 〇 >100 〇 〇 比較例8 〇 >100 〇 〇 -39- (37)200804541 [表5]-38- (36) 200804541 Table 4] Example to preserve the stability water contact angle (degrees) Singular pen erasing fingerprint erasing property Example 1 〇 > 100 〇〇 Example 2 〇 > 100 〇〇 Example 3 〇 > 100 〇〇 Example 4 〇 > 100 〇〇 Example 5 〇 > 100 〇〇 Example 6 〇 > 100 〇〇 Example 7 〇 > 100 〇〇 Example 8 〇 > 100 〇〇Example 9 〇>100 〇〇Example 10 〇>100 〇〇Example 11 〇>80 〇〇Example 12 〇>100 〇〇Example 13 〇>100 〇〇Example 14 〇>100 〇〇Example 15 〇>100 〇〇Example 16 〇>100 〇〇Example 17 〇>100 〇〇Example 18 〇>100 〇〇Example 19 〇>100 〇 Example 20 〇 > 100 〇〇 Comparative Example 1 〇 > 100 〇〇 Comparative Example 2 〇 > 100 〇〇 Comparative Example 3 〇 > 80 〇〇 Comparative Example 4 〇 > 100 〇〇 Comparative Example 5 〇 >100 〇〇Comparative Example 6 〇>100 〇〇Comparative Example 7 〇>100 〇〇Comparative Example 8 〇> ;100 〇 〇 -39- (37)200804541 [Table 5]
實施例 霧度 透射率 (%) 反射率 (%) 表面電阻 (Ω /□) 摩擦帶電指數 IFC(kV/min) 塵埃擦 掉性 成膜後 不久 1星期經 過後 實施例1 0.2 0.2 94.7 1.4 1011 0.01 〇 實施例2 0.2 0.2 95.0 1.5 1012 0.08 〇 實施例3 0.2 0.2 94.4 1.5 1012 0.12 〇 實施例4 0.2 0.2 94.7 1.4 1013 0.20 〇 實施例5 0.2 0.2 94.5 L5 1012 0.02 〇 實施例6 0.2 0.2 94.6 1.5 1011 0.00 〇 實施例7 0.2 0.2 94.0 L8 1013 0.05 〇 實施例8 0.2 0.2 93.0 1.7 1012 0.05 〇 實施例9 0.2 0.2 93.7 2.0 1010 0.00 〇 實施例10 0.2 0.2 94.5 1.4 1012 0.00 〇 實施例11 0.2 0.2 93.5 2.2 1010 0.00 〇 實施例12 0.2 0.2 94.2 1.7 1011 0.00 〇 實施例13 0.2 0.2 94.0 1.7 1010 0.00 〇 實施例14 0.2 0.2 94.2 1.7 1011 0.00 〇 實施例15 0.2 0.2 94.3 1.5 1010 0.00 〇 實施例16 0.2 0.2 93.4 1.8 1011 0.01 〇 實施例17 0.2 0.2 94.6 1.7 1012 0.01 〇 實施例18 0,2 0.2 94.7 1.7 1011 0.02 〇 實施例19 0.2 0.2 94.4 1.8 1010 0.01 〇 實施例20 0.2 0.2 94.1 1.9 1012 0.04 〇 比較例1 0.2 0.2 95.0 1.3 1015 1.00 X 比較例2 0.2 0.2 94.8 1.4 1015 0.60 X 比較例3 0.2 0.2 94.1 1.9 1014 0.30 X 比較例4 0.2 0.2 94.7 1.5 1015 0.48 X 比較例5 0.2 0.2 94.9 1.6 1015 2.99 X 比較例6 0.4 0.8 94.2 1.4 1〇10 0.00 〇 比較例7 0.2 0.2 94.5 1.9 1015 0.55 X 比較例8 0.2 0.2 94.3 1.8 1015 0.62 X -40- (38) (38)200804541 於實施例1至實施例20中,得到水接觸角高、麈埃擦 掉性良好的被膜,但於比較例1至比較例5、比較例7、及 比較例8中,塵埃擦掉性差。 又’比較例6,雖然與實施例同樣地,水接觸角高, 塵埃擦掉性亦良好,但是1星期經過後的霧度値上升,得 不到如實施例1至實施例20的安定被膜。 產業上的利用可能性 本發明的被膜形成用塗佈液係可形成保存安定性優異 、水接觸角高、塵埃擦掉性良好、沒有經時變化的安定被 膜。其中,顯示低反射率者係適用作爲防反射膜形成用塗 佈液,用其所形成的被膜係非常有益於當作防反射膜。因 此,非常適用作爲以液晶顯示元件爲首的電漿顯示器等之 顯示元件中所用的防反射膜。 而且’ 2006年4月13日所申請的日本發明專利申請案 2 0 0 6 -1 1 0 7 2 5號之說明書、申請專利範圍、及摘要的全部 內容係在此引用,當作本發明的說明書之揭示而納入者。Example Haze transmittance (%) Reflectance (%) Surface resistance (Ω / □) Frictional charge index IFC (kV / min) After 1 week after the dust-off film formation, Example 1 0.2 0.2 94.7 1.4 1011 0.01 〇 Example 2 0.2 0.2 95.0 1.5 1012 0.08 〇 Example 3 0.2 0.2 94.4 1.5 1012 0.12 〇 Example 4 0.2 0.2 94.7 1.4 1013 0.20 〇 Example 5 0.2 0.2 94.5 L5 1012 0.02 〇 Example 6 0.2 0.2 94.6 1.5 1011 0.00 〇 Example 7 0.2 0.2 94.0 L8 1013 0.05 〇 Example 8 0.2 0.2 93.0 1.7 1012 0.05 〇 Example 9 0.2 0.2 93.7 2.0 1010 0.00 〇 Example 10 0.2 0.2 94.5 1.4 1012 0.00 〇 Example 11 0.2 0.2 93.5 2.2 1010 0.00 〇 Example 12 0.2 0.2 94.2 1.7 1011 0.00 〇 Example 13 0.2 0.2 94.0 1.7 1010 0.00 〇 Example 14 0.2 0.2 94.2 1.7 1011 0.00 〇 Example 15 0.2 0.2 94.3 1.5 1010 0.00 〇 Example 16 0.2 0.2 93.4 1.8 1011 0.01 〇 Example 17 0.2 0.2 94.6 1.7 1012 0.01 〇 Example 18 0, 2 0.2 94.7 1.7 1011 0.02 〇 Example 19 0.2 0.2 94.4 1.8 1010 0.01 〇 Example 20 0.2 0.2 94 .1 1.9 1012 0.04 〇Comparative Example 1 0.2 0.2 95.0 1.3 1015 1.00 X Comparative Example 2 0.2 0.2 94.8 1.4 1015 0.60 X Comparative Example 3 0.2 0.2 94.1 1.9 1014 0.30 X Comparative Example 4 0.2 0.2 94.7 1.5 1015 0.48 X Comparative Example 5 0.2 0.2 94.9 1.6 1015 2.99 X Comparative Example 6 0.4 0.8 94.2 1.4 1〇10 0.00 〇Comparative Example 7 0.2 0.2 94.5 1.9 1015 0.55 X Comparative Example 8 0.2 0.2 94.3 1.8 1015 0.62 X -40- (38) (38) 200804541 In Examples 1 to 20, a film having a high water contact angle and good rubbing property was obtained, but in Comparative Examples 1 to 5, Comparative Example 7, and Comparative Example 8, dust rubbing property was inferior. Further, in Comparative Example 6, the water contact angle was high and the dust rubbing property was good as in the example. However, the haze after one week passed increased, and the stable film of Examples 1 to 20 could not be obtained. . Industrial Applicability The coating liquid for forming a film of the present invention can form a stable film which is excellent in storage stability, has a high water contact angle, is excellent in dust repellency, and does not change with time. Among them, those exhibiting low reflectance are suitable as coating liquids for forming antireflection films, and the film formed by them is very useful as an antireflection film. Therefore, it is very suitable as an antireflection film used for a display element such as a plasma display device including a liquid crystal display element. Moreover, the entire contents of the specification, the scope of the patent application, and the abstract of the Japanese Patent Application No. 2000-101, filed on Apr. 13, 2006, are hereby incorporated by reference. Incorporated by the disclosure of the specification.
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TWI576667B (en) * | 2012-04-27 | 2017-04-01 | Asahi Glass Co Ltd | A partially hydrolyzed condensate, a dialing agent, a negative photosensitive resin composition, a hardened film, a partition wall, and an optical element |
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