TW200802664A - Optical metrology of multiple patterned layers - Google Patents
Optical metrology of multiple patterned layersInfo
- Publication number
- TW200802664A TW200802664A TW096109973A TW96109973A TW200802664A TW 200802664 A TW200802664 A TW 200802664A TW 096109973 A TW096109973 A TW 096109973A TW 96109973 A TW96109973 A TW 96109973A TW 200802664 A TW200802664 A TW 200802664A
- Authority
- TW
- Taiwan
- Prior art keywords
- patterned layer
- diffraction signal
- optical metrology
- patterned layers
- measured
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
- G01N2021/95615—Inspecting patterns on the surface of objects using a comparative method with stored comparision signal
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/394,591 US7522293B2 (en) | 2006-03-30 | 2006-03-30 | Optical metrology of multiple patterned layers |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200802664A true TW200802664A (en) | 2008-01-01 |
TWI366879B TWI366879B (en) | 2012-06-21 |
Family
ID=38558409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109973A TWI366879B (en) | 2006-03-30 | 2007-03-22 | Optical metrology of multiple patterned layers |
Country Status (3)
Country | Link |
---|---|
US (1) | US7522293B2 (zh) |
TW (1) | TWI366879B (zh) |
WO (1) | WO2007123701A2 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010007010A1 (en) * | 2008-07-18 | 2010-01-21 | Asml Netherlands B.V. | Scatterometry method and measurement system for lithography |
NL2005346A (en) * | 2009-10-12 | 2011-04-13 | Asml Netherlands Bv | Method, inspection apparatus and substrate for determining an approximate structure of an object on a substrate. |
NL2006700A (en) | 2010-06-04 | 2011-12-06 | Asml Netherlands Bv | Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods & apparatus. |
KR101850407B1 (ko) | 2013-08-13 | 2018-04-19 | 에이에스엠엘 네델란즈 비.브이. | 구조체의 관심 파라미터 값의 재구성의 품질을 평가하는 방법, 검사 장치 및 컴퓨터 프로그램 제품 |
NL2013745A (en) | 2013-12-05 | 2015-06-08 | Asml Netherlands Bv | Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods & apparatus. |
US10502549B2 (en) * | 2015-03-24 | 2019-12-10 | Kla-Tencor Corporation | Model-based single parameter measurement |
WO2016207891A1 (en) * | 2015-06-22 | 2016-12-29 | Nova Measuring Instruments Ltd. | Method for use in process control of manufacture of patterned samples |
EP3318927A1 (en) | 2016-11-04 | 2018-05-09 | ASML Netherlands B.V. | Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods & apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6891626B2 (en) * | 2000-01-26 | 2005-05-10 | Timbre Technologies, Inc. | Caching of intra-layer calculations for rapid rigorous coupled-wave analyses |
US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
US6943900B2 (en) * | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
US6650422B2 (en) * | 2001-03-26 | 2003-11-18 | Advanced Micro Devices, Inc. | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith |
US6785638B2 (en) * | 2001-08-06 | 2004-08-31 | Timbre Technologies, Inc. | Method and system of dynamic learning through a regression-based library generation process |
US7092110B2 (en) * | 2002-07-25 | 2006-08-15 | Timbre Technologies, Inc. | Optimized model and parameter selection for optical metrology |
US20040267397A1 (en) * | 2003-06-27 | 2004-12-30 | Srinivas Doddi | Optical metrology of structures formed on semiconductor wafer using machine learning systems |
US7388677B2 (en) * | 2004-03-22 | 2008-06-17 | Timbre Technologies, Inc. | Optical metrology optimization for repetitive structures |
-
2006
- 2006-03-30 US US11/394,591 patent/US7522293B2/en active Active
-
2007
- 2007-03-22 TW TW096109973A patent/TWI366879B/zh active
- 2007-03-29 WO PCT/US2007/007937 patent/WO2007123701A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
TWI366879B (en) | 2012-06-21 |
WO2007123701A2 (en) | 2007-11-01 |
US7522293B2 (en) | 2009-04-21 |
WO2007123701A3 (en) | 2008-06-26 |
US20070229854A1 (en) | 2007-10-04 |
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