TW200801068A - Polymerizable unsaturated compound and method for producing the same - Google Patents

Polymerizable unsaturated compound and method for producing the same

Info

Publication number
TW200801068A
TW200801068A TW096110466A TW96110466A TW200801068A TW 200801068 A TW200801068 A TW 200801068A TW 096110466 A TW096110466 A TW 096110466A TW 96110466 A TW96110466 A TW 96110466A TW 200801068 A TW200801068 A TW 200801068A
Authority
TW
Taiwan
Prior art keywords
group
formula
hydrogen atom
represents hydrogen
independently represents
Prior art date
Application number
TW096110466A
Other languages
Chinese (zh)
Inventor
Yoshihiro Hosaka
Nobutaka Shimamura
Kenichi Inoue
Original Assignee
Wako Pure Chem Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chem Ind Ltd filed Critical Wako Pure Chem Ind Ltd
Publication of TW200801068A publication Critical patent/TW200801068A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/19—Hydroxy compounds containing aromatic rings
    • C08G63/193—Hydroxy compounds containing aromatic rings containing two or more aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C08G63/54—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/547—Hydroxy compounds containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/04—Polyesters derived from hydroxycarboxylic acids, e.g. lactones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)

Abstract

This invention provides a novel polymerizable unsaturated compound having high heat-resistance, and being able fine-cured by light or heat, and a novel producing method easily adjusting the molecular weight, acid value, etc. of said compound.The present invention provides a compound containing the constituting unit represented by formula (1) and a method for producing said compound: [wherein, R1, R2, R1' and R2' each independently represents hydrogen atom, halogen atom, alkyl group or alkoxy group, R3 and R4 each independently represents hydrogen atom or a group represented by formula (2) (wherein, R6 represents hydrogen atom, an alkyl group having carbon number 1 to 6, a group represented by formula (3) (wherein, R7 represents a vinylcarbonyl group or isopropenylcarbonyl group, T3 represents a straight chain alkylene group), a group represented by formula (4) (wherein, R7 represents a vinylcarbonyl group or isopropenylcarbonyl group, T4 represents a straight chain alkylene group) ), T1 and T2 each independently represents a straight chain alkylene group having carbon number 1 to 6 or an arylene group, U represents a binding bond or a two valent group represented by any one formula of (1-1) to (1-8) (wherein, R5 and R5 each independently represents hydrogen atom or halogen atom), V1 and V2 each independently represents oxygen atom or -NH-, Y1 represents oxygen atom, -NH- or a group represented by formula (5) (Wherein, R8 represents hydrogen atom or R7), Y2 represents oxygen atom, -NH- or a group represented by formula (6) (Wherein, R9 represents hydrogen atom or R7), z represents a tetravalent hydrocarbon group, a and each independently represents 0 or 1, k represents natural number, provided that at least one of R6, R8 and R9 having double bond).
TW096110466A 2006-04-11 2007-03-27 Polymerizable unsaturated compound and method for producing the same TW200801068A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006109216 2006-04-11

Publications (1)

Publication Number Publication Date
TW200801068A true TW200801068A (en) 2008-01-01

Family

ID=38624923

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096110466A TW200801068A (en) 2006-04-11 2007-03-27 Polymerizable unsaturated compound and method for producing the same

Country Status (5)

Country Link
JP (1) JPWO2007123017A1 (en)
KR (1) KR101050728B1 (en)
CN (1) CN101379111B (en)
TW (1) TW200801068A (en)
WO (1) WO2007123017A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100725023B1 (en) * 2006-10-16 2007-06-07 제일모직주식회사 Cardo type resin-containing resist composition and method for preparing a pattern by the same and a color filter using the same
CN101965375B (en) * 2008-03-25 2014-05-28 综研化学株式会社 Photosensitive resin and photosensitive resin composition comprising the same
WO2009119623A1 (en) * 2008-03-25 2009-10-01 綜研化学株式会社 Photosensitive resin and photosensitive resin composition comprising the same
CN102344369A (en) * 2010-07-30 2012-02-08 华东师范大学 High oriented luminescent polyacetylene monomer with side chains containing fluorene group and preparation method thereof
JP6031807B2 (en) * 2012-04-13 2016-11-24 Jsr株式会社 Coloring composition, color filter and display element
KR102054045B1 (en) * 2017-03-03 2019-12-09 주식회사 엘지화학 Polymer resion compound and photosensitive resin composition for black bank
KR102420415B1 (en) 2017-10-17 2022-07-15 덕산네오룩스 주식회사 Adhesion enhanced photo sensitive resin composition and light blocking layer using the same
KR102227606B1 (en) * 2018-04-06 2021-03-12 주식회사 엘지화학 Cardo-based binder resin, photo-sensitive resin composition comprising the same, black matrix, color filter and display device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0791365B2 (en) * 1987-03-06 1995-10-04 新日鐵化学株式会社 Epoxy resin composition
JP3148429B2 (en) * 1992-02-04 2001-03-19 新日本製鐵株式会社 Photopolymerizable unsaturated compound and alkali-developable photosensitive resin composition
JP3673321B2 (en) * 1996-05-10 2005-07-20 新日鐵化学株式会社 Photosensitive resin composition capable of alkali development
JP4036550B2 (en) * 1998-11-25 2008-01-23 日本化薬株式会社 Radiation sensitive polyester resin and negative resist composition using the same
JP2000338344A (en) * 1999-03-25 2000-12-08 Unitika Ltd High-polymer optical material for optical device, high- polymer optical device and their production
JP4665189B2 (en) * 2003-10-03 2011-04-06 ナガセケムテックス株式会社 Alkali-soluble resin
TW200519081A (en) * 2003-10-03 2005-06-16 Nagase Chemtex Corp An alkali soluble resin
JP2005281620A (en) * 2004-03-30 2005-10-13 Sumitomo Bakelite Co Ltd Functional resin and functional element

Also Published As

Publication number Publication date
CN101379111A (en) 2009-03-04
KR20090009236A (en) 2009-01-22
CN101379111B (en) 2012-01-11
KR101050728B1 (en) 2011-07-21
WO2007123017A1 (en) 2007-11-01
JPWO2007123017A1 (en) 2009-09-03

Similar Documents

Publication Publication Date Title
TW200801068A (en) Polymerizable unsaturated compound and method for producing the same
CY1123333T1 (en) INDOLINONE DERIVATIVES AND PROCESS FOR THEIR PRODUCTION
ATE533773T1 (en) PHOSPHORUS-CONTAINING HEPTAZINE DERIVATIVES, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE AS FLAME RETARDANTS
MA32731B1 (en) CEPHALOSPORINE HAVING A CATÉCHOL GROUP
CY1109854T1 (en) AZADICYLIC PRODUCTS (3.1.0) EXCELLENT USEFUL AS D3 DOPAMIN RECEPTOR REGULATORS
CY1110651T1 (en) N - '(1,5-DIFINYL-1H-PYRAZOL-3-YL) Methylyl sulfonamide derivative with an affinity for their CB1 receptors
ATE509936T1 (en) OLEFINICALLY UNSATURATED PHOSPHONATE COMPOUNDS, POLYMERS PRODUCED THEREFROM AND THE USE THEREOF
EP2311893A4 (en) Compound containing 1,3-diene structure and method for producing same
CU23926B1 (en) DERIVATIVE OF OXOPIRAZINE AND HERBICIDE
WO2010051926A8 (en) Novel halogen-substituted compounds
SE0303180D0 (en) Novel compounds
SE0302232D0 (en) Novel Compounds
TW200738684A (en) Novel sulfated cyclic urea derivatives, preparation thereof and pharmaceutical use thereof as kinase inhibitors
UA105185C2 (en) Pyrrols
CO6150142A2 (en) BEZOXAZOLES AND OXAZOLOPIRIDINS THAT ARE USEFUL AS INHIBITORS OF JANUS KINASES
GB0501964D0 (en) Chemical compounds
CY1114869T1 (en) 5-AMINO-2- (1-HYDROXY-AYTHYL) -TETHYDROPYRANIUM PRODUCTION
TW200609223A (en) Process for the preparation of n-piperidino-1,5-diphenylpyrazole-3-carboxamide derivatives
ATE500212T1 (en) BISPHENOL MONOESTER
ATE507232T1 (en) COPPER COMPLEX COMPOUND AND ELECTROPHOTOGRAPHIC TONER CONTAINING SAME
MX2010009092A (en) Novel 3-aminoalkyl-1,3-dihydro-2h-indol-2-one derivatives, preparation thereof and therapeutic use thereof.
TW200708506A (en) Derivatives of triazines, their preparation and their application in therapeutics
PL2186782T3 (en) Methods for the purification of radiolabelled products using a solid-support scavanger
TW200643629A (en) Positive photosensitive resin composition
WO2009150369A3 (en) Additives for bituminous products