TW200746892A - High-strength sputtering target for forming fluorescent film in electroluminescent element - Google Patents

High-strength sputtering target for forming fluorescent film in electroluminescent element

Info

Publication number
TW200746892A
TW200746892A TW096105800A TW96105800A TW200746892A TW 200746892 A TW200746892 A TW 200746892A TW 096105800 A TW096105800 A TW 096105800A TW 96105800 A TW96105800 A TW 96105800A TW 200746892 A TW200746892 A TW 200746892A
Authority
TW
Taiwan
Prior art keywords
intermetallic compound
compound phase
sputtering target
electroluminescent element
solid
Prior art date
Application number
TW096105800A
Other languages
Chinese (zh)
Other versions
TWI408992B (en
Inventor
shou-bin Zhang
Shozo Komiyama
Akifumi Mishima
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW200746892A publication Critical patent/TW200746892A/en
Application granted granted Critical
Publication of TWI408992B publication Critical patent/TWI408992B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729—Chalcogenides
    • C09K11/7731—Chalcogenides with alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Luminescent Compositions (AREA)

Abstract

A high-strength sputtering target for forming a fluorescent film in an electroluminescent element, includes: a component composition including Al:20 to 50% by weight, Eu:1 to 10 by weight, and Mg:0.5 to 20% by weight, with the balance including Ba and inevitable impurities; and a texture including an intermetallic compound phase of Mg and Al, and an intermetallic compound phase of Al and Ba in which Eu is solid-solved, wherein the intermetallic compound phase of Mg and Al includes an Al3Mg2 intermetallic compound, an Al12Mg17 intermetallic compound, and an AlMg intermetallic compound, and the intermetallic compound phase of Al and Ba in which Eu is solid-solved includes an intermetallic compound phase of a BaAl4 inwhich Eu is solid-solved in Ba and an intermetallic compound phase of a Ba7Al13 inwhich Eu is solid-solved in Ba.
TW96105800A 2006-02-17 2007-02-15 High-strength sputtering target for forming fluorescent film in electroluminescent element TWI408992B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006040338A JP2007217755A (en) 2006-02-17 2006-02-17 High-strength sputtering target for depositing phosphor film in electroluminescent element

Publications (2)

Publication Number Publication Date
TW200746892A true TW200746892A (en) 2007-12-16
TWI408992B TWI408992B (en) 2013-09-11

Family

ID=38371625

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96105800A TWI408992B (en) 2006-02-17 2007-02-15 High-strength sputtering target for forming fluorescent film in electroluminescent element

Country Status (3)

Country Link
JP (1) JP2007217755A (en)
TW (1) TWI408992B (en)
WO (1) WO2007094449A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6447654B1 (en) * 2001-05-29 2002-09-10 Ifire Technology Inc. Single source sputtering of thioaluminate phosphor films
JP2005538516A (en) * 2002-09-13 2005-12-15 アイファイア テクノロジー コーポレーション Thin film phosphor for electroluminescence display
JP4263001B2 (en) * 2003-03-06 2009-05-13 アイファイヤー アイピー コーポレイション Sputtering target

Also Published As

Publication number Publication date
TWI408992B (en) 2013-09-11
WO2007094449A1 (en) 2007-08-23
JP2007217755A (en) 2007-08-30

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees