TW200745974A - Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture - Google Patents

Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture

Info

Publication number
TW200745974A
TW200745974A TW095120606A TW95120606A TW200745974A TW 200745974 A TW200745974 A TW 200745974A TW 095120606 A TW095120606 A TW 095120606A TW 95120606 A TW95120606 A TW 95120606A TW 200745974 A TW200745974 A TW 200745974A
Authority
TW
Taiwan
Prior art keywords
virtual metrology
prediction model
quality control
selection method
semiconductor manufacture
Prior art date
Application number
TW095120606A
Other languages
Chinese (zh)
Inventor
Haw-Jyue Luo
Hung-En Tai
Shiue-Fen Lai
Original Assignee
Powerchip Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Powerchip Semiconductor Corp filed Critical Powerchip Semiconductor Corp
Priority to TW095120606A priority Critical patent/TW200745974A/en
Publication of TW200745974A publication Critical patent/TW200745974A/en

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

A selection method for virtual metrology prediction model for quality control in semiconductor manufacture. Historical process data for a tool is first retrieved. The historical process data is analyzed to generate data groups with the tool been maintained. A plurality of virtual metrology prediction models are generated according to the data groups and are merged to a virtual metrology model management and selection system of a virtual metrology engine. The first process data after the tool is re-maintained and implements a process to a wafer. A best virtual metrology prediction model is selected according to the first process data to predict the wafer.
TW095120606A 2006-06-09 2006-06-09 Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture TW200745974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095120606A TW200745974A (en) 2006-06-09 2006-06-09 Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095120606A TW200745974A (en) 2006-06-09 2006-06-09 Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture

Publications (1)

Publication Number Publication Date
TW200745974A true TW200745974A (en) 2007-12-16

Family

ID=57914559

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095120606A TW200745974A (en) 2006-06-09 2006-06-09 Selection method and system for virtual metrology prediction model for quality control in semiconductor manufacture

Country Status (1)

Country Link
TW (1) TW200745974A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101976045A (en) * 2010-08-25 2011-02-16 江苏大学 Panel quality virtual measurement method and system for TFT-LCD etching process
US20110202160A1 (en) * 2010-02-16 2011-08-18 James Moyne Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
TWI399660B (en) * 2008-07-09 2013-06-21 Inotera Memories Inc A method of detecting variance by regression model
TWI412906B (en) * 2010-04-13 2013-10-21 Univ Nat Cheng Kung Manufacturing execution system with virtual-metrology capabilities and manufacturing system including the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399660B (en) * 2008-07-09 2013-06-21 Inotera Memories Inc A method of detecting variance by regression model
US20110202160A1 (en) * 2010-02-16 2011-08-18 James Moyne Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
CN102763048A (en) * 2010-02-16 2012-10-31 应用材料公司 Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
US9002492B2 (en) * 2010-02-16 2015-04-07 Applied Materials, Inc. Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
TWI509550B (en) * 2010-02-16 2015-11-21 Applied Materials Inc Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
US9886009B2 (en) 2010-02-16 2018-02-06 Applied Materials, Inc. Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
US10409231B2 (en) 2010-02-16 2019-09-10 Applied Materials, Inc. Methods and apparatuses for utilizing adaptive predictive algorithms and determining when to use the adaptive predictive algorithms for virtual metrology
TWI412906B (en) * 2010-04-13 2013-10-21 Univ Nat Cheng Kung Manufacturing execution system with virtual-metrology capabilities and manufacturing system including the same
US8983644B2 (en) 2010-04-13 2015-03-17 National Cheng Kung University Manufacturing execution system with virtual-metrology capabilities and manufacturing system including the same
CN101976045A (en) * 2010-08-25 2011-02-16 江苏大学 Panel quality virtual measurement method and system for TFT-LCD etching process

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