TW200741354A - Process for imprinting a large-area nano-pattern on a substrate - Google Patents

Process for imprinting a large-area nano-pattern on a substrate

Info

Publication number
TW200741354A
TW200741354A TW095115349A TW95115349A TW200741354A TW 200741354 A TW200741354 A TW 200741354A TW 095115349 A TW095115349 A TW 095115349A TW 95115349 A TW95115349 A TW 95115349A TW 200741354 A TW200741354 A TW 200741354A
Authority
TW
Taiwan
Prior art keywords
substrate
electro
optical devices
imprinting
nano
Prior art date
Application number
TW095115349A
Other languages
Chinese (zh)
Inventor
Ming-Chang Lee
Kao-Chih Syao
Yu-Hung Cheng
Jia-Lin Wu
Tse-Ming Yang
Original Assignee
Univ Nat Tsing Hua
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Tsing Hua filed Critical Univ Nat Tsing Hua
Priority to TW095115349A priority Critical patent/TW200741354A/en
Publication of TW200741354A publication Critical patent/TW200741354A/en

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  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

The present invention discloses a technique for imprinting large-area nano-patterns of manufacturing electro-optical devices, wherein self-assembly substrates, such as an anodic aluminum oxide substrate, an ion beam drilled substrate, a macromolecular substrate, and a silicon substrate, are used as cavities to imprint a curable coating on a surface of the electro-optical devices, thereby forming a cured coating with the nano-patterns for use as an optical interface of the electro-optical devices, so as to increase efficiency of the electro-optical devices or manufacture diffusion points of a LCD backlight module.
TW095115349A 2006-04-28 2006-04-28 Process for imprinting a large-area nano-pattern on a substrate TW200741354A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095115349A TW200741354A (en) 2006-04-28 2006-04-28 Process for imprinting a large-area nano-pattern on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095115349A TW200741354A (en) 2006-04-28 2006-04-28 Process for imprinting a large-area nano-pattern on a substrate

Publications (1)

Publication Number Publication Date
TW200741354A true TW200741354A (en) 2007-11-01

Family

ID=57914022

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095115349A TW200741354A (en) 2006-04-28 2006-04-28 Process for imprinting a large-area nano-pattern on a substrate

Country Status (1)

Country Link
TW (1) TW200741354A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI419427B (en) * 2009-08-21 2013-12-11 Univ Nat Chiao Tung Photonic crystal band-edge laser diode
US11892771B2 (en) 2020-04-20 2024-02-06 Applied Materials, Inc. Methods for increasing the density of high-index nanoimprint lithography films

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI419427B (en) * 2009-08-21 2013-12-11 Univ Nat Chiao Tung Photonic crystal band-edge laser diode
US11892771B2 (en) 2020-04-20 2024-02-06 Applied Materials, Inc. Methods for increasing the density of high-index nanoimprint lithography films
TWI832363B (en) * 2020-04-20 2024-02-11 美商應用材料股份有限公司 Optically densified nanoimprint film, method of forming the same, and imprint composition comprising the same

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