TW200733242A - Methods and apparatuses for high pressure gas annealing - Google Patents

Methods and apparatuses for high pressure gas annealing

Info

Publication number
TW200733242A
TW200733242A TW096101409A TW96101409A TW200733242A TW 200733242 A TW200733242 A TW 200733242A TW 096101409 A TW096101409 A TW 096101409A TW 96101409 A TW96101409 A TW 96101409A TW 200733242 A TW200733242 A TW 200733242A
Authority
TW
Taiwan
Prior art keywords
gas
anneal
apparatuses
high pressure
methods
Prior art date
Application number
TW096101409A
Other languages
Chinese (zh)
Inventor
Suk-Dong Hong
Sang-Shin Kim
Manuel Scott Rivera
Original Assignee
Poongsan Microtec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Poongsan Microtec Co Ltd filed Critical Poongsan Microtec Co Ltd
Publication of TW200733242A publication Critical patent/TW200733242A/en

Links

Abstract

Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.
TW096101409A 2006-02-10 2007-01-15 Methods and apparatuses for high pressure gas annealing TW200733242A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2006351816 2006-02-10

Publications (1)

Publication Number Publication Date
TW200733242A true TW200733242A (en) 2007-09-01

Family

ID=57913268

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096101409A TW200733242A (en) 2006-02-10 2007-01-15 Methods and apparatuses for high pressure gas annealing

Country Status (1)

Country Link
TW (1) TW200733242A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109950177A (en) * 2017-12-20 2019-06-28 东京毅力科创株式会社 Vertical heat processing apparatus
US11462417B2 (en) 2017-08-18 2022-10-04 Applied Materials, Inc. High pressure and high temperature anneal chamber

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11462417B2 (en) 2017-08-18 2022-10-04 Applied Materials, Inc. High pressure and high temperature anneal chamber
US11469113B2 (en) 2017-08-18 2022-10-11 Applied Materials, Inc. High pressure and high temperature anneal chamber
CN109950177A (en) * 2017-12-20 2019-06-28 东京毅力科创株式会社 Vertical heat processing apparatus
CN109950177B (en) * 2017-12-20 2023-05-23 东京毅力科创株式会社 Vertical heat treatment device

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