TW200732504A - Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing system - Google Patents
Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing systemInfo
- Publication number
- TW200732504A TW200732504A TW095132424A TW95132424A TW200732504A TW 200732504 A TW200732504 A TW 200732504A TW 095132424 A TW095132424 A TW 095132424A TW 95132424 A TW95132424 A TW 95132424A TW 200732504 A TW200732504 A TW 200732504A
- Authority
- TW
- Taiwan
- Prior art keywords
- electrode
- electrode assembly
- processing system
- substrates
- plasma processing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32605—Removable or replaceable electrodes or electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S269/00—Work holders
- Y10S269/905—Work holder for doors and door frames
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/23—Chucks or sockets with magnetic or electrostatic means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Plasma Technology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Treatment Of Fiber Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/239,570 US7455735B2 (en) | 2005-09-28 | 2005-09-28 | Width adjustable substrate support for plasma processing |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200732504A true TW200732504A (en) | 2007-09-01 |
TWI381065B TWI381065B (zh) | 2013-01-01 |
Family
ID=37832784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095132424A TWI381065B (zh) | 2005-09-28 | 2006-09-01 | 電漿處理系統中用於處理不同寬度基板之可調式電極組件 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7455735B2 (zh) |
JP (1) | JP5420144B2 (zh) |
CN (1) | CN1956138B (zh) |
DE (1) | DE102006040593A1 (zh) |
SG (1) | SG131038A1 (zh) |
TW (1) | TWI381065B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7465680B2 (en) * | 2005-09-07 | 2008-12-16 | Applied Materials, Inc. | Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2 |
US8171877B2 (en) * | 2007-03-14 | 2012-05-08 | Lam Research Corporation | Backside mounted electrode carriers and assemblies incorporating the same |
JP4850811B2 (ja) * | 2007-11-06 | 2012-01-11 | 東京エレクトロン株式会社 | 載置台、処理装置および処理システム |
JP4805286B2 (ja) * | 2008-02-06 | 2011-11-02 | シャープ株式会社 | 搬送装置 |
US8276604B2 (en) * | 2008-06-30 | 2012-10-02 | Lam Research Corporation | Peripherally engaging electrode carriers and assemblies incorporating the same |
CN102398234A (zh) * | 2010-09-07 | 2012-04-04 | 安特(苏州)精密机械有限公司 | 一种弹簧片配送夹具 |
DE102014211713A1 (de) * | 2014-06-18 | 2015-12-24 | Siemens Aktiengesellschaft | Vorrichtung zur Plasmabeschichtung und Verfahren zum Beschichten einer Platine |
CN104409401B (zh) * | 2014-12-26 | 2017-02-22 | 合肥彩虹蓝光科技有限公司 | 一种等离子清洗设备 |
JP6645921B2 (ja) * | 2016-07-07 | 2020-02-14 | キオクシア株式会社 | プラズマ処理装置およびプラズマ処理方法 |
US20180308661A1 (en) * | 2017-04-24 | 2018-10-25 | Applied Materials, Inc. | Plasma reactor with electrode filaments |
US10510515B2 (en) | 2017-06-22 | 2019-12-17 | Applied Materials, Inc. | Processing tool with electrically switched electrode assembly |
DE102019201166A1 (de) * | 2019-01-30 | 2020-07-30 | Siemens Aktiengesellschaft | Werkstückträger zum Halten eines zu beschichtenden Bauteils, Verwendung eines solchen Werkstückträgers sowie Vorrichtung und Verfahren zum Beschichten eines Bauteils |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3133307B2 (ja) * | 1989-10-13 | 2001-02-05 | 株式会社日立製作所 | 電子顕微鏡 |
US5075530A (en) * | 1990-07-23 | 1991-12-24 | Lee Shih Lu | Multi-head type of electro-discharging machine |
EP0572716B1 (fr) | 1992-05-30 | 1996-10-09 | Charmilles Technologies S.A. | Machine d'électroérosion à fil avec pièce à usiner fixe |
US5895549A (en) * | 1994-07-11 | 1999-04-20 | Applied Komatsu Technology, Inc. | Method and apparatus for etching film layers on large substrates |
US6245189B1 (en) * | 1994-12-05 | 2001-06-12 | Nordson Corporation | High Throughput plasma treatment system |
JP4937474B2 (ja) * | 1999-07-13 | 2012-05-23 | ノードソン コーポレーション | 高速対称プラズマ処理システム |
US6709522B1 (en) * | 2000-07-11 | 2004-03-23 | Nordson Corporation | Material handling system and methods for a multichamber plasma treatment system |
US6451120B1 (en) * | 2000-09-21 | 2002-09-17 | Adc Telecommunications, Inc. | Apparatus and method for batch processing semiconductor substrates in making semiconductor lasers |
JP2001326266A (ja) * | 2001-02-20 | 2001-11-22 | Matsushita Electric Ind Co Ltd | プラズマクリーニング装置 |
US6841033B2 (en) * | 2001-03-21 | 2005-01-11 | Nordson Corporation | Material handling system and method for a multi-workpiece plasma treatment system |
US6852169B2 (en) * | 2001-05-16 | 2005-02-08 | Nordson Corporation | Apparatus and methods for processing optical fibers with a plasma |
US7013834B2 (en) * | 2002-04-19 | 2006-03-21 | Nordson Corporation | Plasma treatment system |
US7018555B2 (en) * | 2002-07-26 | 2006-03-28 | Dainippon Screen Mfg. Co., Ltd. | Substrate treatment method and substrate treatment apparatus |
JP4413084B2 (ja) * | 2003-07-30 | 2010-02-10 | シャープ株式会社 | プラズマプロセス装置及びそのクリーニング方法 |
JP4281692B2 (ja) * | 2005-02-15 | 2009-06-17 | パナソニック株式会社 | プラズマ処理装置 |
-
2005
- 2005-09-28 US US11/239,570 patent/US7455735B2/en not_active Expired - Fee Related
-
2006
- 2006-08-30 DE DE102006040593A patent/DE102006040593A1/de not_active Withdrawn
- 2006-09-01 TW TW095132424A patent/TWI381065B/zh not_active IP Right Cessation
- 2006-09-08 SG SG200606058-6A patent/SG131038A1/en unknown
- 2006-09-28 CN CN200610141520.XA patent/CN1956138B/zh not_active Expired - Fee Related
- 2006-09-28 JP JP2006264246A patent/JP5420144B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI381065B (zh) | 2013-01-01 |
JP5420144B2 (ja) | 2014-02-19 |
US7455735B2 (en) | 2008-11-25 |
US20070068455A1 (en) | 2007-03-29 |
JP2007095695A (ja) | 2007-04-12 |
CN1956138A (zh) | 2007-05-02 |
DE102006040593A1 (de) | 2007-03-29 |
SG131038A1 (en) | 2007-04-26 |
CN1956138B (zh) | 2010-06-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |