TW200724507A - Method and apparatus of panel etching process (the third invention) - Google Patents

Method and apparatus of panel etching process (the third invention)

Info

Publication number
TW200724507A
TW200724507A TW094144794A TW94144794A TW200724507A TW 200724507 A TW200724507 A TW 200724507A TW 094144794 A TW094144794 A TW 094144794A TW 94144794 A TW94144794 A TW 94144794A TW 200724507 A TW200724507 A TW 200724507A
Authority
TW
Taiwan
Prior art keywords
panel
etching
tank
etching process
etching solution
Prior art date
Application number
TW094144794A
Other languages
Chinese (zh)
Inventor
Chun-Shia Chen
Original Assignee
Onano Ind Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Onano Ind Corp filed Critical Onano Ind Corp
Priority to TW094144794A priority Critical patent/TW200724507A/en
Publication of TW200724507A publication Critical patent/TW200724507A/en

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  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Provided is a method of panel etching process and the apparatus in making of the same. The method includes to horizontally place the panel securely in an etching operation tank followed by pour an appropriate amount of etching solution into the tank to sufficiently immerse the panel surface. The tank body is inclined to one side and having a conical rotation movement during the etching process thus causing the etching solution in the tank flows along with the slanting rotation of the tank body. In this way, the etching solution gives an effect of reciprocating rotation and rinsing over the panel which is horizontally and securely placed in the tank that may accelerate the etching efficiency. Therefore, the surface of the panel can be evenly contacted, and therefore, an homogenous etching effect can be obtained.
TW094144794A 2005-12-16 2005-12-16 Method and apparatus of panel etching process (the third invention) TW200724507A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094144794A TW200724507A (en) 2005-12-16 2005-12-16 Method and apparatus of panel etching process (the third invention)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094144794A TW200724507A (en) 2005-12-16 2005-12-16 Method and apparatus of panel etching process (the third invention)

Publications (1)

Publication Number Publication Date
TW200724507A true TW200724507A (en) 2007-07-01

Family

ID=57912376

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094144794A TW200724507A (en) 2005-12-16 2005-12-16 Method and apparatus of panel etching process (the third invention)

Country Status (1)

Country Link
TW (1) TW200724507A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104045242A (en) * 2014-06-26 2014-09-17 深圳市华星光电技术有限公司 Etching method of glass substrate and etching soaking device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104045242A (en) * 2014-06-26 2014-09-17 深圳市华星光电技术有限公司 Etching method of glass substrate and etching soaking device
CN104045242B (en) * 2014-06-26 2016-02-24 深圳市华星光电技术有限公司 The engraving method of glass substrate and etching infuser device

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