TW200722786A - Method of sample preparation for scanning capacitance microscope and measuring method thereby - Google Patents
Method of sample preparation for scanning capacitance microscope and measuring method therebyInfo
- Publication number
- TW200722786A TW200722786A TW094142750A TW94142750A TW200722786A TW 200722786 A TW200722786 A TW 200722786A TW 094142750 A TW094142750 A TW 094142750A TW 94142750 A TW94142750 A TW 94142750A TW 200722786 A TW200722786 A TW 200722786A
- Authority
- TW
- Taiwan
- Prior art keywords
- sample preparation
- gate structure
- scanning capacitance
- capacitance microscope
- measured
- Prior art date
Links
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
A method of sample preparation for scanning capacitance microscope is described. A portion to be measured is cut off from a wafer, and material layers are disposed on the portion to be measured a gate structure and a doped region under the gate structure are disposed in the material layers, wherein the gate structure comprises a doped polysilicon layer and a spacer disposed on the sidewalls of the doped polysilicon layer. The doped polysilicon layer of the gate structure is removed, and remaining the spacer. A side of the portion to be measured is polished to form a cross-section until exposing the doped region. A dielectric layer is form on the cross-section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94142750A TWI276832B (en) | 2005-12-05 | 2005-12-05 | Method of sample preparation for scanning capacitance microscope and measuring method thereby |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94142750A TWI276832B (en) | 2005-12-05 | 2005-12-05 | Method of sample preparation for scanning capacitance microscope and measuring method thereby |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI276832B TWI276832B (en) | 2007-03-21 |
| TW200722786A true TW200722786A (en) | 2007-06-16 |
Family
ID=38646367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94142750A TWI276832B (en) | 2005-12-05 | 2005-12-05 | Method of sample preparation for scanning capacitance microscope and measuring method thereby |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI276832B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103941043B (en) * | 2013-01-18 | 2015-12-23 | 中芯国际集成电路制造(上海)有限公司 | The preparation method of SCM sample transversal section |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112146953B (en) * | 2020-09-21 | 2024-03-01 | 长江存储科技有限责任公司 | Test sample and preparation method thereof |
-
2005
- 2005-12-05 TW TW94142750A patent/TWI276832B/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103941043B (en) * | 2013-01-18 | 2015-12-23 | 中芯国际集成电路制造(上海)有限公司 | The preparation method of SCM sample transversal section |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI276832B (en) | 2007-03-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |