TW200720453A - Apparatus and method of vacuum deposition - Google Patents

Apparatus and method of vacuum deposition

Info

Publication number
TW200720453A
TW200720453A TW094141482A TW94141482A TW200720453A TW 200720453 A TW200720453 A TW 200720453A TW 094141482 A TW094141482 A TW 094141482A TW 94141482 A TW94141482 A TW 94141482A TW 200720453 A TW200720453 A TW 200720453A
Authority
TW
Taiwan
Prior art keywords
nozzle
vacuum deposition
windpipe
worktable
holes
Prior art date
Application number
TW094141482A
Other languages
Chinese (zh)
Other versions
TWI306903B (en
Inventor
Jung-Lung Huang
Jia-Pang Pang
Chien-Ting Lai
Chiu-Lien Yang
Original Assignee
Innolux Display Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innolux Display Corp filed Critical Innolux Display Corp
Priority to TW94141482A priority Critical patent/TWI306903B/en
Publication of TW200720453A publication Critical patent/TW200720453A/en
Application granted granted Critical
Publication of TWI306903B publication Critical patent/TWI306903B/en

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  • Physical Vapour Deposition (AREA)

Abstract

This present invention relates to a vacuum deposition apparatus. The apparatus includes a vacuum chamber, a nozzle, a windpipe, a diffusion device and a worktable. The worktable and the nozzle are arranged in the vacuum chamber and opposite to each other. The nozzle has a plurality of holes. The windpipe connects to the holes of the nozzle, and the diffusion device is setting on the nozzle. The present invention also relates to a vacuum deposition method that uses the above-mentioned vacuum deposition apparatus.
TW94141482A 2005-11-25 2005-11-25 Apparatus and method of vacuum deposition TWI306903B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94141482A TWI306903B (en) 2005-11-25 2005-11-25 Apparatus and method of vacuum deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94141482A TWI306903B (en) 2005-11-25 2005-11-25 Apparatus and method of vacuum deposition

Publications (2)

Publication Number Publication Date
TW200720453A true TW200720453A (en) 2007-06-01
TWI306903B TWI306903B (en) 2009-03-01

Family

ID=45071485

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94141482A TWI306903B (en) 2005-11-25 2005-11-25 Apparatus and method of vacuum deposition

Country Status (1)

Country Link
TW (1) TWI306903B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI479040B (en) * 2012-12-05 2015-04-01 Nat Inst Chung Shan Science & Technology Evaporating device with linear spray head
TWI496928B (en) * 2010-06-21 2015-08-21 Semes Co Ltd Thin film vapor deposition apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI582251B (en) 2014-10-31 2017-05-11 財團法人工業技術研究院 Evaporation system and evaporation method
CN106676476B (en) * 2015-11-11 2019-10-25 清华大学 Vacuum deposition method
CN106676478B (en) * 2015-11-11 2019-09-17 清华大学 Vacuum deposition apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI496928B (en) * 2010-06-21 2015-08-21 Semes Co Ltd Thin film vapor deposition apparatus
TWI479040B (en) * 2012-12-05 2015-04-01 Nat Inst Chung Shan Science & Technology Evaporating device with linear spray head

Also Published As

Publication number Publication date
TWI306903B (en) 2009-03-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees