TW200720295A - Curable Resin Composition, Process for Forming a Cured Film, and Cured Film - Google Patents
Curable Resin Composition, Process for Forming a Cured Film, and Cured FilmInfo
- Publication number
- TW200720295A TW200720295A TW095136925A TW95136925A TW200720295A TW 200720295 A TW200720295 A TW 200720295A TW 095136925 A TW095136925 A TW 095136925A TW 95136925 A TW95136925 A TW 95136925A TW 200720295 A TW200720295 A TW 200720295A
- Authority
- TW
- Taiwan
- Prior art keywords
- cured film
- resin composition
- polymer
- molecular weight
- forming
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 3
- 239000004793 Polystyrene Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229920002223 polystyrene Polymers 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 125000003700 epoxy group Chemical group 0.000 abstract 1
- 238000005227 gel permeation chromatography Methods 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 238000010526 radical polymerization reaction Methods 0.000 abstract 1
- 238000004260 weight control Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
- C08K5/372—Sulfides, e.g. R-(S)x-R'
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
- C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
- C08K5/28—Azides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
- C08L101/08—Carboxyl groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
Abstract
The radiation-sensitive resin composition contains (A) a polymer having carboxyl and epoxy groups, wherein the ratio (Mw/Mn) of the weight average molecular weight (Mw) of the polymer (expressed in terms of polystyrene) to the number average molecular weight (Mn) (expressed in terms of polystyrene) measured by gel permeation chromatography is ≤1.7, (B) a polymerizable unsaturated compound and (C) a radiation-sensitive polymerization initiator. A living radical polymerization for producing the polymer (A) is a polymerization that uses a specific thiocarbonyl thio(disulfide) compound as a molecular weight control agent.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005294721A JP4654867B2 (en) | 2005-10-07 | 2005-10-07 | Radiation-sensitive resin composition, interlayer insulating film and microlens, and production method thereof |
JP2005294722A JP2007100020A (en) | 2005-10-07 | 2005-10-07 | Curable resin composition, over coat, and method for producing the same |
JP2005294720A JP4650630B2 (en) | 2005-10-07 | 2005-10-07 | Radiation sensitive resin composition for spacer, spacer, and formation method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200720295A true TW200720295A (en) | 2007-06-01 |
Family
ID=38160045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095136925A TW200720295A (en) | 2005-10-07 | 2006-10-04 | Curable Resin Composition, Process for Forming a Cured Film, and Cured Film |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20070038903A (en) |
TW (1) | TW200720295A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI789434B (en) * | 2017-09-26 | 2023-01-11 | 日商大阪有機化學工業股份有限公司 | Photosensitive resin composition for forming photo-spacer, method for forming photo-spacer, substrate with photo-spacer, and color filter |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101462275B1 (en) * | 2007-09-27 | 2014-11-20 | 동우 화인켐 주식회사 | A colored photosensitive resin composition, color filter and liquid crystal display device having the same |
-
2006
- 2006-10-04 KR KR1020060097589A patent/KR20070038903A/en not_active Application Discontinuation
- 2006-10-04 TW TW095136925A patent/TW200720295A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI789434B (en) * | 2017-09-26 | 2023-01-11 | 日商大阪有機化學工業股份有限公司 | Photosensitive resin composition for forming photo-spacer, method for forming photo-spacer, substrate with photo-spacer, and color filter |
Also Published As
Publication number | Publication date |
---|---|
KR20070038903A (en) | 2007-04-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2125916A4 (en) | Water absorbent resin production method and usage thereof | |
EA200600510A1 (en) | METHOD OF SPRAY POLYMERIZATION | |
TW200636387A (en) | Radiation-sensitive resin composition and color filter | |
ATE454426T1 (en) | EPOXY VINYL ESTER HARDENED WITH AN AMPHIPHILIC BLOCK COPOLYMER AND UNSATURATED POLYESTER RESINS | |
ATE235522T1 (en) | POLYMER COMPOSITION AND METHOD FOR PRODUCING THEREOF | |
TW360666B (en) | Block polymer, thermoplastic addition polymer, and their production process and use | |
ATE521373T1 (en) | BONE CEMENT COMPOSITION | |
ATE502094T1 (en) | METHOD FOR PRODUCING A PENSIONAL ADHESIVE | |
SG155952A1 (en) | Use of polyalkyl(meth)acrylate bead polymers and moulding material for producing extruded moulded parts with a matt surface | |
TW200604217A (en) | Radiation-sensitive resin composition, spacer, and method of forming the same | |
WO2009044885A1 (en) | Photocurable resin composition and method for producing the same | |
WO2009063967A1 (en) | Curable composition for dental applications | |
WO2005087875A8 (en) | High energy curable coatings comprising thermoplastic polymers | |
JP2018138682A5 (en) | ||
ATE401354T1 (en) | AQUEOUS VINYL LIGOMER AND VINYL POLYMER COMPOSITIONS | |
ATE496951T1 (en) | FLOURPOLYMERS WITH NITROGEN CONTAINING CROSSLINKING POINTS | |
DK1636318T3 (en) | Swelling coating compositions | |
ATE349715T1 (en) | PLASTIC LENS AND METHOD FOR PRODUCING THE SAME | |
ATE404592T1 (en) | MODIFIED POLY(METH)ACRYLATE WITH REACTIVE ETHYLENIC GROUPS AND USE THEREOF | |
WO2009022724A1 (en) | Photosensitive resin composition and laminate thereof | |
TW200613420A (en) | Vinyl acetate resin emulsion and manufacturing method thereof | |
DE50307516D1 (en) | HAGEL-RESISTANT COMPOSITE ACRYLIC GLASS AND METHOD FOR THE PRODUCTION THEREOF | |
CN101921362A (en) | Trimethylolpropane diallyl ether modified acrylate micro-gel emulsion and preparation method thereof | |
TW200725175A (en) | Curable resin composition, forming method of cured film, and cured film | |
TW200720295A (en) | Curable Resin Composition, Process for Forming a Cured Film, and Cured Film |