TW200718484A - Mold and method for manufacturing the same - Google Patents

Mold and method for manufacturing the same

Info

Publication number
TW200718484A
TW200718484A TW094139798A TW94139798A TW200718484A TW 200718484 A TW200718484 A TW 200718484A TW 094139798 A TW094139798 A TW 094139798A TW 94139798 A TW94139798 A TW 94139798A TW 200718484 A TW200718484 A TW 200718484A
Authority
TW
Taiwan
Prior art keywords
layer
additive
mold
adhensive
protective layer
Prior art date
Application number
TW094139798A
Other languages
Chinese (zh)
Other versions
TWI358335B (en
Inventor
Ga-Lane Chen
Original Assignee
Hon Hai Prec Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hon Hai Prec Ind Co Ltd filed Critical Hon Hai Prec Ind Co Ltd
Priority to TW94139798A priority Critical patent/TWI358335B/en
Publication of TW200718484A publication Critical patent/TW200718484A/en
Application granted granted Critical
Publication of TWI358335B publication Critical patent/TWI358335B/en

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  • Physical Vapour Deposition (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

The present invention relates to a mold, method and apparatus for manufacturing the same. The mold includes a substrate and a protective layer formed on the substrate. The protective layer includes an adhensive layer, a gradient multilayer nanostructure formed on the adhensive layer and a diamond-like carbon film. The gradient multilayer nanostructure has an N layers structure where 5≤N≤30, each layer of the gradient multilayer nanostructure has a content of an additive, the additive can be one of chromium, titanium, silicon, chromium nitride, titanium nitride, silicon carbide, silicon nitride or mixture thereof. From the first layer formed on the adhensive layer to the layer contacted with the diamond-like carbon film the concentration of the additive is gradually reduced. The protective layer of the present invention has better adhesion, corrosion resistance, lower friction coefficient, good tribology and good wear resistance.
TW94139798A 2005-11-11 2005-11-11 Mold and method for manufacturing the same TWI358335B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94139798A TWI358335B (en) 2005-11-11 2005-11-11 Mold and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94139798A TWI358335B (en) 2005-11-11 2005-11-11 Mold and method for manufacturing the same

Publications (2)

Publication Number Publication Date
TW200718484A true TW200718484A (en) 2007-05-16
TWI358335B TWI358335B (en) 2012-02-21

Family

ID=46728175

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94139798A TWI358335B (en) 2005-11-11 2005-11-11 Mold and method for manufacturing the same

Country Status (1)

Country Link
TW (1) TWI358335B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112458438A (en) * 2020-12-07 2021-03-09 武汉理工大学 Chromium-based nitride gradient composite coating structure and in-situ preparation method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103510046A (en) * 2013-09-29 2014-01-15 星弧涂层新材料科技（苏州）股份有限公司 Metal-doped diamond-like carbon thick film and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112458438A (en) * 2020-12-07 2021-03-09 武汉理工大学 Chromium-based nitride gradient composite coating structure and in-situ preparation method thereof

Also Published As

Publication number Publication date
TWI358335B (en) 2012-02-21

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees