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Application filed by Chi Mei Optoelectronics CorpfiledCriticalChi Mei Optoelectronics Corp
Priority to TW94136152ApriorityCriticalpatent/TWI287138B/en
Publication of TW200717067ApublicationCriticalpatent/TW200717067A/en
Application grantedgrantedCritical
Publication of TWI287138BpublicationCriticalpatent/TWI287138B/en
A polyimide equipment roller cleaning apparatus is disclosed. The cleaning apparatus includes a main body, in which the main body further includes a cleaning surface, a cleaning device, in which the cleaning device is fixed onto the surface of the cleaning surface, and at least a supporting device disposed on the main body for fixing the main body within the polyimide equipment and attaching the cleaning device over the surface of the roller.
TW94136152A2005-10-172005-10-17Cleaning apparatus for roller of PI equipment
TWI287138B
(en)
Substrate peripheral portion measuring device and method, substrate peripheral portion polishing apparatus and method, and substrate rinsing apparatus and method
Method for prolonging the action on acupuncture points, including for reducing the excessive body weight and for correcting the body. device and needle (variants) for carrying out said method