TW200715063A - Immersion lithography contamination gettering layer - Google Patents
Immersion lithography contamination gettering layerInfo
- Publication number
- TW200715063A TW200715063A TW095117637A TW95117637A TW200715063A TW 200715063 A TW200715063 A TW 200715063A TW 095117637 A TW095117637 A TW 095117637A TW 95117637 A TW95117637 A TW 95117637A TW 200715063 A TW200715063 A TW 200715063A
- Authority
- TW
- Taiwan
- Prior art keywords
- photoresist layer
- regions
- forming
- actinic radiation
- layer
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Abstract
A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and one or more cation complexing agents; exposing the photoresist layer to actinic radiation through a photomask having opaque and clear regions, the opaque regions blocking the actinic radiation and the clear regions being transparent to the actinic radiation, the actinic radiation changing the chemical composition of regions of the photoresist layer exposed to the radiation forming exposed and unexposed regions in the photoresist layer; and removing either the exposed regions of the photoresist layer or the unexposed regions of the photoresist layer. The contamination gettering layer includes one or more polymers, one or more cation complexing agents and a casting solvent.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13518505A | 2005-05-23 | 2005-05-23 | |
US11/144,857 US7807335B2 (en) | 2005-06-03 | 2005-06-03 | Immersion lithography contamination gettering layer |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200715063A true TW200715063A (en) | 2007-04-16 |
Family
ID=57911536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095117637A TW200715063A (en) | 2005-05-23 | 2006-05-18 | Immersion lithography contamination gettering layer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200715063A (en) |
-
2006
- 2006-05-18 TW TW095117637A patent/TW200715063A/en unknown
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