TW200712118A - Curable resin composition and antireflection film - Google Patents

Curable resin composition and antireflection film

Info

Publication number
TW200712118A
TW200712118A TW095122767A TW95122767A TW200712118A TW 200712118 A TW200712118 A TW 200712118A TW 095122767 A TW095122767 A TW 095122767A TW 95122767 A TW95122767 A TW 95122767A TW 200712118 A TW200712118 A TW 200712118A
Authority
TW
Taiwan
Prior art keywords
antireflection film
resin composition
curable resin
mass
unsaturated group
Prior art date
Application number
TW095122767A
Other languages
Chinese (zh)
Inventor
Takaro Yashiro
Yasuharu Yamada
Akio Taira
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200712118A publication Critical patent/TW200712118A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Disclosed a curable composition containing 1-90% by mass of a fluorine-containing polymer (A) containing an ethylenically unsaturated group and 10-99% by mass of chained spherical silica particles (B) which are bonded with an organic compound having a polymerizable unsaturated group, relative to the total amount of the composition excluding an organic solvent. A cured product of such a curable composition can be used as a low refractive index layer (18) for an antireflection film (10).
TW095122767A 2005-06-24 2006-06-23 Curable resin composition and antireflection film TW200712118A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005185254 2005-06-24
JP2006132394 2006-05-11

Publications (1)

Publication Number Publication Date
TW200712118A true TW200712118A (en) 2007-04-01

Family

ID=37570393

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095122767A TW200712118A (en) 2005-06-24 2006-06-23 Curable resin composition and antireflection film

Country Status (2)

Country Link
TW (1) TW200712118A (en)
WO (1) WO2006137365A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007327018A (en) * 2005-06-24 2007-12-20 Jsr Corp Curable resin composition and antireflective film
JP5950667B2 (en) * 2012-04-16 2016-07-13 キヤノン株式会社 OPTICAL MEMBER, MANUFACTURING METHOD THEREOF, AND OPTICAL FILM FOR OPTICAL MEMBER
CN110734561B (en) * 2019-10-28 2022-02-11 中国工程物理研究院激光聚变研究中心 Frequency doubling element matching film of intense laser device and preparation method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4892790B2 (en) * 2001-03-30 2012-03-07 Ｊｓｒ株式会社 Laminated body
US20060093786A1 (en) * 2003-02-21 2006-05-04 Toshihiko Ohashi Silica-containing laminated structure, and coating composition for use in forming a porous silica layer
US7604866B2 (en) * 2003-06-18 2009-10-20 Asahi Kasei Kabushiki Kaisha Antireflection film
JP2006036835A (en) * 2004-07-23 2006-02-09 Jsr Corp Curable resin composition and antireflection coating film
JP2006097003A (en) * 2004-08-31 2006-04-13 Jsr Corp Resin composition and antireflection coating
JP4609088B2 (en) * 2004-12-24 2011-01-12 Ｊｓｒ株式会社 Radiation curable resin composition for flattening layer, flattening layer, method for producing flattening layer, and solid-state imaging device

Also Published As

Publication number Publication date
WO2006137365A1 (en) 2006-12-28

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