TW200711025A - Substrate container with pressure equalization - Google Patents
Substrate container with pressure equalizationInfo
- Publication number
- TW200711025A TW200711025A TW095106551A TW95106551A TW200711025A TW 200711025 A TW200711025 A TW 200711025A TW 095106551 A TW095106551 A TW 095106551A TW 95106551 A TW95106551 A TW 95106551A TW 200711025 A TW200711025 A TW 200711025A
- Authority
- TW
- Taiwan
- Prior art keywords
- pod
- diaphragm
- sensitive substrate
- undeflected position
- pressure equalization
- Prior art date
Links
Abstract
The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US65735505P | 2005-02-27 | 2005-02-27 | |
| US65735405P | 2005-02-27 | 2005-02-27 | |
| US77483406P | 2006-02-18 | 2006-02-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200711025A true TW200711025A (en) | 2007-03-16 |
Family
ID=57911143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095106551A TW200711025A (en) | 2005-02-27 | 2006-02-27 | Substrate container with pressure equalization |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200711025A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI666510B (en) * | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Euv reticle pod |
| CN112670219A (en) * | 2019-10-16 | 2021-04-16 | 家登精密工业股份有限公司 | Photomask holding system |
| TWI818800B (en) * | 2018-10-29 | 2023-10-11 | 家登精密工業股份有限公司 | Reticle accommodating system and method of reticle observation provided in the reticle accommodating system |
-
2006
- 2006-02-27 TW TW095106551A patent/TW200711025A/en unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI666510B (en) * | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Euv reticle pod |
| TWI818800B (en) * | 2018-10-29 | 2023-10-11 | 家登精密工業股份有限公司 | Reticle accommodating system and method of reticle observation provided in the reticle accommodating system |
| CN112670219A (en) * | 2019-10-16 | 2021-04-16 | 家登精密工业股份有限公司 | Photomask holding system |
| CN112670219B (en) * | 2019-10-16 | 2024-05-10 | 家登精密工业股份有限公司 | Photomask holding system |
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