TW200708818A - Heat treatment device - Google Patents

Heat treatment device

Info

Publication number
TW200708818A
TW200708818A TW094129606A TW94129606A TW200708818A TW 200708818 A TW200708818 A TW 200708818A TW 094129606 A TW094129606 A TW 094129606A TW 94129606 A TW94129606 A TW 94129606A TW 200708818 A TW200708818 A TW 200708818A
Authority
TW
Taiwan
Prior art keywords
rotatable rod
another
heat treatment
spaced
gap
Prior art date
Application number
TW094129606A
Other languages
Chinese (zh)
Inventor
Hiroshi Kawamoto
Original Assignee
Koyo Thermo Sys Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koyo Thermo Sys Co Ltd filed Critical Koyo Thermo Sys Co Ltd
Publication of TW200708818A publication Critical patent/TW200708818A/en

Links

Landscapes

  • Furnace Charging Or Discharging (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A work support device 12 is provided within the heat treatment chamber 11. The work support device 12 has aplurality of horizontal support rods 31 arranged in spaced and parallel relation with one another. At least one of said plurality of horizontal support rods 31 is acted as a rotatable rod 33 which rotates freely around its axis. On a plurality of base lines mutually spaced and extended in the circumferential direction of the rotatable rod 33, a plurality of support pins 34 are provided in spaced relationship with one another in the axial direction of the rotatable rod and projected outwardly in the radial direction of the rotatable rod. The gap between the support pins 34 on one base line is different from the gap between the support pins 34 on another base line.
TW094129606A 2005-08-23 2005-08-30 Heat treatment device TW200708818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005240784A JP2007057132A (en) 2005-08-23 2005-08-23 Thermal processing apparatus

Publications (1)

Publication Number Publication Date
TW200708818A true TW200708818A (en) 2007-03-01

Family

ID=37920776

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094129606A TW200708818A (en) 2005-08-23 2005-08-30 Heat treatment device

Country Status (2)

Country Link
JP (1) JP2007057132A (en)
TW (1) TW200708818A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100978261B1 (en) * 2005-12-29 2010-08-26 엘지디스플레이 주식회사 Cassette for containing liquid crystal dispaly device
JP6512707B2 (en) * 2015-11-30 2019-05-15 中外炉工業株式会社 Substrate loading cassette

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05243798A (en) * 1992-02-27 1993-09-21 Oki Electric Ind Co Ltd Supporting device for printed-circuit board
JP3052116B2 (en) * 1994-10-26 2000-06-12 東京エレクトロン株式会社 Heat treatment equipment
JP3989384B2 (en) * 2003-02-07 2007-10-10 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method

Also Published As

Publication number Publication date
JP2007057132A (en) 2007-03-08

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