TW200706680A - Method and apparatus for sputtering onto large flat panels - Google Patents

Method and apparatus for sputtering onto large flat panels

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Publication number
TW200706680A
TW200706680A TW095126272A TW95126272A TW200706680A TW 200706680 A TW200706680 A TW 200706680A TW 095126272 A TW095126272 A TW 095126272A TW 95126272 A TW95126272 A TW 95126272A TW 200706680 A TW200706680 A TW 200706680A
Authority
TW
Taiwan
Prior art keywords
target
magnetron
rectangular
scan
large flat
Prior art date
Application number
TW095126272A
Other languages
Chinese (zh)
Other versions
TWI363103B (en
Inventor
Hie-Minh Huu Le
Akihiro Hosokawa
Avi Tepman
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/211,141 external-priority patent/US20060049040A1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200706680A publication Critical patent/TW200706680A/en
Application granted granted Critical
Publication of TWI363103B publication Critical patent/TWI363103B/en

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Abstract

A rectangular magnetron placed at the back of a rectangular target to intensify the plasma in a sputter reactor configured for sputtering target material onto a rectangular panel. The magnetron has a size only somewhat less than that of the target and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100mm for a 2m target. The scan may follow a double-Z pattern along two links parallel to a target side and the two connecting diagonals. The magnetron includes a closed plasma loop formed in a convolute shape, for example, a folded shape or a rectangularized helix with an inner pole of nearly constant width extending along a single path and having one magnetic polarity completely surrounded by an outer pole having the opposed polarity. External actuators move the magnetron slidably suspended from a gantry which sliding perpendicularly on the chamber walls.
TW95126272A 2005-07-25 2006-07-18 Method and apparatus for sputtering onto large flat panels TWI363103B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70232705P 2005-07-25 2005-07-25
US70503105P 2005-08-02 2005-08-02
US11/211,141 US20060049040A1 (en) 2004-01-07 2005-08-24 Apparatus and method for two dimensional magnetron scanning for sputtering onto flat panels

Publications (2)

Publication Number Publication Date
TW200706680A true TW200706680A (en) 2007-02-16
TWI363103B TWI363103B (en) 2012-05-01

Family

ID=46750615

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95126272A TWI363103B (en) 2005-07-25 2006-07-18 Method and apparatus for sputtering onto large flat panels

Country Status (1)

Country Link
TW (1) TWI363103B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI387399B (en) * 2007-11-30 2013-02-21 Applied Materials Inc Control of arbitrary scan path of a rotating magnetron

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI387399B (en) * 2007-11-30 2013-02-21 Applied Materials Inc Control of arbitrary scan path of a rotating magnetron

Also Published As

Publication number Publication date
TWI363103B (en) 2012-05-01

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