TW200706265A - Coating method, coating apparatus and manufacturing method for photo mask blank - Google Patents

Coating method, coating apparatus and manufacturing method for photo mask blank

Info

Publication number
TW200706265A
TW200706265A TW095112393A TW95112393A TW200706265A TW 200706265 A TW200706265 A TW 200706265A TW 095112393 A TW095112393 A TW 095112393A TW 95112393 A TW95112393 A TW 95112393A TW 200706265 A TW200706265 A TW 200706265A
Authority
TW
Taiwan
Prior art keywords
coating
nozzle
substrate
manufacturing
mask blank
Prior art date
Application number
TW095112393A
Other languages
Chinese (zh)
Inventor
Michiaki Sano
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200706265A publication Critical patent/TW200706265A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

There is provided a coating method which uses a coating apparatus 10 for coating a coating liquid on a surface 28A of a substrate 28 by contacting the coating liquid reached a tip opening through a nozzle 82 of a coating system 30 with the surface 28A, and then moving the substrate relative to the nozzle, to thereby form a coating film. In the coating method, scanning speed of the substrate relative to the nozzle is corrected for each of coating regions of the surface along relative scanning direction between the substrate and the nozzle such that the thickness of the coating film formed in each of the coating regions is within a predetermined range, in accordance with a correlation between the coated film thickness and the scanning speed and film thickness data for each of the coating regions of the coating film formed previously before along the scanning direction.
TW095112393A 2005-04-08 2006-04-07 Coating method, coating apparatus and manufacturing method for photo mask blank TW200706265A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005112794A JP4260135B2 (en) 2005-04-08 2005-04-08 Resist coating method, resist coating apparatus, and photomask blank manufacturing method

Publications (1)

Publication Number Publication Date
TW200706265A true TW200706265A (en) 2007-02-16

Family

ID=37410432

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112393A TW200706265A (en) 2005-04-08 2006-04-07 Coating method, coating apparatus and manufacturing method for photo mask blank

Country Status (3)

Country Link
JP (1) JP4260135B2 (en)
KR (1) KR101012552B1 (en)
TW (1) TW200706265A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101145562B1 (en) * 2008-04-10 2012-05-15 호야 가부시키가이샤 Manufacturing method of photomask blank, and manufacturing method of photomask
JP5377881B2 (en) * 2008-04-10 2013-12-25 Ｈｏｙａ株式会社 Photomask blank manufacturing method and photomask manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1157587A (en) * 1997-08-22 1999-03-02 Dainippon Screen Mfg Co Ltd Coating device
KR100521060B1 (en) * 1998-11-12 2005-12-30 엘지전자 주식회사 Nozzle structure of substrate coating equipment and its control method
JP2005051220A (en) * 2003-07-17 2005-02-24 Hoya Corp Method for manufacturing substrate with resist film

Also Published As

Publication number Publication date
KR101012552B1 (en) 2011-02-07
JP4260135B2 (en) 2009-04-30
JP2006289252A (en) 2006-10-26
KR20060107377A (en) 2006-10-13

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