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Application filed by Au Optronics CorpfiledCriticalAu Optronics Corp
Priority to TW94124740ApriorityCriticalpatent/TWI281571B/en
Publication of TW200705002ApublicationCriticalpatent/TW200705002A/en
Application grantedgrantedCritical
Publication of TWI281571BpublicationCriticalpatent/TWI281571B/en
An active mask particle disposal apparatus for cleaning particles on a mask is described. The active mask particle disposal apparatus includes a particle scanner and a particle removing air brush disposed on one surface of the mask to clean and detect the particles on the surface. The active mask dust disposal apparatus further includes another particle scanner and another particle removing air brush disposed on another surface of the mask to clean and detect the particles on the another surface. When a pellicle is fixed on the mask, the active mask particle disposal apparatus can clean and detect the particles on the pellicle. An active mask particle disposal method is also disclosed herein.
CLEANING SHEET FOR CLEANING AND REMOVING PARTICLES, CLEANING TOOL TO COLLECT AND STOP WASTE, EQUIPMENT FOR CLEANING SURFACES AND COLLECTING AND RETAINING WASTE, AND METHOD FOR ADAPTING A SURFACE
Method of removing hazardous substance, and hazardous substance removing material using the same such as air cleaning filter, mask and wiping sheet, and method of storing the same