TW200701386A - A semiconductor substrate processing apparatus with a passive substrate gripper - Google Patents

A semiconductor substrate processing apparatus with a passive substrate gripper

Info

Publication number
TW200701386A
TW200701386A TW095117722A TW95117722A TW200701386A TW 200701386 A TW200701386 A TW 200701386A TW 095117722 A TW095117722 A TW 095117722A TW 95117722 A TW95117722 A TW 95117722A TW 200701386 A TW200701386 A TW 200701386A
Authority
TW
Taiwan
Prior art keywords
substrate
support
gripper
passive
processing apparatus
Prior art date
Application number
TW095117722A
Other languages
English (en)
Inventor
Ralph M Wadensweiler
Rick R Endo
Alexander S Ko
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200701386A publication Critical patent/TW200701386A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW095117722A 2005-06-28 2006-05-18 A semiconductor substrate processing apparatus with a passive substrate gripper TW200701386A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/168,225 US7290976B2 (en) 2005-06-28 2005-06-28 Semiconductor substrate processing apparatus with a passive substrate gripper

Publications (1)

Publication Number Publication Date
TW200701386A true TW200701386A (en) 2007-01-01

Family

ID=37567592

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095117722A TW200701386A (en) 2005-06-28 2006-05-18 A semiconductor substrate processing apparatus with a passive substrate gripper

Country Status (3)

Country Link
US (1) US7290976B2 (zh)
TW (1) TW200701386A (zh)
WO (1) WO2007001663A2 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100742279B1 (ko) * 2005-12-22 2007-07-24 삼성전자주식회사 반도체 소자의 제조 장치 및 방법
US20090196724A1 (en) * 2008-02-05 2009-08-06 Chen Hui Fred Edge contact gripper
JP5744382B2 (ja) * 2008-07-24 2015-07-08 株式会社荏原製作所 基板処理装置および基板処理方法
JP5078928B2 (ja) * 2009-02-27 2012-11-21 三菱重工業株式会社 反転装置
US9530676B2 (en) * 2011-06-01 2016-12-27 Ebara Corporation Substrate processing apparatus, substrate transfer method and substrate transfer device
CN103094175B (zh) * 2012-12-21 2016-01-27 东莞市中镓半导体科技有限公司 一种晶片专用三夹头夹具
JP7291030B2 (ja) * 2018-09-06 2023-06-14 株式会社荏原製作所 基板処理装置
US20210391190A1 (en) * 2018-09-06 2021-12-16 Ebara Corporation Substrate processing apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3272350A (en) * 1964-09-25 1966-09-13 Westinghouse Electric Corp Method and apparatus for semiconductor wafer handling
US4854623A (en) * 1988-01-29 1989-08-08 Dexton, Inc. End effector
US5195729A (en) * 1991-05-17 1993-03-23 National Semiconductor Corporation Wafer carrier
US6267423B1 (en) * 1995-12-08 2001-07-31 Applied Materials, Inc. End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector
US6276731B1 (en) * 1997-07-15 2001-08-21 Kabushiki Kaisha Yaskawa Denki Wafer carrying fork
US20060113806A1 (en) * 2004-11-29 2006-06-01 Asm Japan K.K. Wafer transfer mechanism

Also Published As

Publication number Publication date
WO2007001663A3 (en) 2007-11-01
US7290976B2 (en) 2007-11-06
WO2007001663A2 (en) 2007-01-04
US20060291990A1 (en) 2006-12-28

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