TW200643656A - Photoresist cleaning solvent - Google Patents
Photoresist cleaning solventInfo
- Publication number
- TW200643656A TW200643656A TW094144393A TW94144393A TW200643656A TW 200643656 A TW200643656 A TW 200643656A TW 094144393 A TW094144393 A TW 094144393A TW 94144393 A TW94144393 A TW 94144393A TW 200643656 A TW200643656 A TW 200643656A
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning solvent
- photoresist
- photoresist cleaning
- human body
- easy
- Prior art date
Links
Landscapes
- Detergent Compositions (AREA)
Abstract
The present invention provides a photoresist cleaning solvent consisting of either propylene glycol mono-methyl ether acetate (PGMEA) or its derived compound and either cyclohexanone (ANONE) or its derived compound. The photoresist cleaning solvent has the following advantages: (1) With extremely low toxicity towards human body, the photoresist cleaning solvent is safe to use and does not generate any unpleasant odor. (2) It does not cause any environmental pollution when it is easy to process its waste liquid and waste water. (3) It has good solubility, ideal volatility, excellent cleaning effect towards photoresist material layers and adequate compatibility among different photoresists. (4) It can be stored at room temperature and its cost is low. Besides, since it has extremely low toxicity towards human body and its waste liquid and waste water are easy to process, there is no need to change any existing equipment or production condition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094144393A TW200643656A (en) | 2005-12-15 | 2005-12-15 | Photoresist cleaning solvent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094144393A TW200643656A (en) | 2005-12-15 | 2005-12-15 | Photoresist cleaning solvent |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200643656A true TW200643656A (en) | 2006-12-16 |
TWI338822B TWI338822B (en) | 2011-03-11 |
Family
ID=45074760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094144393A TW200643656A (en) | 2005-12-15 | 2005-12-15 | Photoresist cleaning solvent |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200643656A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115018068A (en) * | 2022-05-30 | 2022-09-06 | 福建天甫电子材料有限公司 | Automatic batching system and batching method for production of photoresist cleaning solution |
-
2005
- 2005-12-15 TW TW094144393A patent/TW200643656A/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115018068A (en) * | 2022-05-30 | 2022-09-06 | 福建天甫电子材料有限公司 | Automatic batching system and batching method for production of photoresist cleaning solution |
CN115018068B (en) * | 2022-05-30 | 2023-02-17 | 福建天甫电子材料有限公司 | Automatic batching system and batching method for production of photoresist cleaning solution |
Also Published As
Publication number | Publication date |
---|---|
TWI338822B (en) | 2011-03-11 |
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