TW200643656A - Photoresist cleaning solvent - Google Patents

Photoresist cleaning solvent

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Publication number
TW200643656A
TW200643656A TW094144393A TW94144393A TW200643656A TW 200643656 A TW200643656 A TW 200643656A TW 094144393 A TW094144393 A TW 094144393A TW 94144393 A TW94144393 A TW 94144393A TW 200643656 A TW200643656 A TW 200643656A
Authority
TW
Taiwan
Prior art keywords
cleaning solvent
photoresist
photoresist cleaning
human body
easy
Prior art date
Application number
TW094144393A
Other languages
Chinese (zh)
Other versions
TWI338822B (en
Inventor
Kuang-Lung Kuo
Sing-Ru Dai
Original Assignee
Echem Solutions Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Echem Solutions Corp filed Critical Echem Solutions Corp
Priority to TW094144393A priority Critical patent/TW200643656A/en
Publication of TW200643656A publication Critical patent/TW200643656A/en
Application granted granted Critical
Publication of TWI338822B publication Critical patent/TWI338822B/zh

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Abstract

The present invention provides a photoresist cleaning solvent consisting of either propylene glycol mono-methyl ether acetate (PGMEA) or its derived compound and either cyclohexanone (ANONE) or its derived compound. The photoresist cleaning solvent has the following advantages: (1) With extremely low toxicity towards human body, the photoresist cleaning solvent is safe to use and does not generate any unpleasant odor. (2) It does not cause any environmental pollution when it is easy to process its waste liquid and waste water. (3) It has good solubility, ideal volatility, excellent cleaning effect towards photoresist material layers and adequate compatibility among different photoresists. (4) It can be stored at room temperature and its cost is low. Besides, since it has extremely low toxicity towards human body and its waste liquid and waste water are easy to process, there is no need to change any existing equipment or production condition.
TW094144393A 2005-12-15 2005-12-15 Photoresist cleaning solvent TW200643656A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094144393A TW200643656A (en) 2005-12-15 2005-12-15 Photoresist cleaning solvent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094144393A TW200643656A (en) 2005-12-15 2005-12-15 Photoresist cleaning solvent

Publications (2)

Publication Number Publication Date
TW200643656A true TW200643656A (en) 2006-12-16
TWI338822B TWI338822B (en) 2011-03-11

Family

ID=45074760

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094144393A TW200643656A (en) 2005-12-15 2005-12-15 Photoresist cleaning solvent

Country Status (1)

Country Link
TW (1) TW200643656A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115018068A (en) * 2022-05-30 2022-09-06 福建天甫电子材料有限公司 Automatic batching system and batching method for production of photoresist cleaning solution

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115018068A (en) * 2022-05-30 2022-09-06 福建天甫电子材料有限公司 Automatic batching system and batching method for production of photoresist cleaning solution
CN115018068B (en) * 2022-05-30 2023-02-17 福建天甫电子材料有限公司 Automatic batching system and batching method for production of photoresist cleaning solution

Also Published As

Publication number Publication date
TWI338822B (en) 2011-03-11

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