TW200633046A - Semiconductor cleaning - Google Patents

Semiconductor cleaning

Info

Publication number
TW200633046A
TW200633046A TW095104710A TW95104710A TW200633046A TW 200633046 A TW200633046 A TW 200633046A TW 095104710 A TW095104710 A TW 095104710A TW 95104710 A TW95104710 A TW 95104710A TW 200633046 A TW200633046 A TW 200633046A
Authority
TW
Taiwan
Prior art keywords
semiconductor cleaning
cleaning
semiconductor substrate
composition
includes contacting
Prior art date
Application number
TW095104710A
Other languages
Chinese (zh)
Inventor
Robert J Small
Original Assignee
Robert J Small
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert J Small filed Critical Robert J Small
Publication of TW200633046A publication Critical patent/TW200633046A/en

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising an ionic liquid. Another method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.
TW095104710A 2005-02-14 2006-02-13 Semiconductor cleaning TW200633046A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65199805P 2005-02-14 2005-02-14
US75460505P 2005-12-30 2005-12-30

Publications (1)

Publication Number Publication Date
TW200633046A true TW200633046A (en) 2006-09-16

Family

ID=57809256

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095104710A TW200633046A (en) 2005-02-14 2006-02-13 Semiconductor cleaning

Country Status (1)

Country Link
TW (1) TW200633046A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI812342B (en) * 2021-11-22 2023-08-11 南韓商Ｌｇ化學股份有限公司 Stripper composition for removing photoresist and stripping method of photoresist using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI812342B (en) * 2021-11-22 2023-08-11 南韓商Ｌｇ化學股份有限公司 Stripper composition for removing photoresist and stripping method of photoresist using the same

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