TW200622226A - Optical method for detecting the surface structure on thin film of nano crystal - Google Patents

Optical method for detecting the surface structure on thin film of nano crystal

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Publication number
TW200622226A
TW200622226A TW093140978A TW93140978A TW200622226A TW 200622226 A TW200622226 A TW 200622226A TW 093140978 A TW093140978 A TW 093140978A TW 93140978 A TW93140978 A TW 93140978A TW 200622226 A TW200622226 A TW 200622226A
Authority
TW
Taiwan
Prior art keywords
thin film
nano crystal
surface structure
film
optical
Prior art date
Application number
TW093140978A
Other languages
Chinese (zh)
Inventor
Cheng-Jia Huang
Original Assignee
Grace Semiconductor Mfg Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace Semiconductor Mfg Corp filed Critical Grace Semiconductor Mfg Corp
Priority to TW093140978A priority Critical patent/TW200622226A/en
Publication of TW200622226A publication Critical patent/TW200622226A/en

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The invention is proposed a kind of optical method for detecting the surface structure on thin film of nano crystal. It utilities the gas phase deposition to get the property of surface structure with the low integral rate of nano crystal film. The thin film of the nano crystal is divided into high and low refraction index surface layers to generate the twin-structure with non-uniformity. Using the optical mode of twin-structure to simulate the performance of nano crystal. It is also to note that the thin film deposition process for thin film is done and if the film structure is fitted with optical mode of the twin-structure, it shows the nano crystal for the thin film. Thus, the surface structure and thickness of nano thin film in processing can be detected precisely using optical apparatus' measurement and optical parameters' calculation for the film and substrate.
TW093140978A 2004-12-28 2004-12-28 Optical method for detecting the surface structure on thin film of nano crystal TW200622226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW093140978A TW200622226A (en) 2004-12-28 2004-12-28 Optical method for detecting the surface structure on thin film of nano crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093140978A TW200622226A (en) 2004-12-28 2004-12-28 Optical method for detecting the surface structure on thin film of nano crystal

Publications (1)

Publication Number Publication Date
TW200622226A true TW200622226A (en) 2006-07-01

Family

ID=57808458

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093140978A TW200622226A (en) 2004-12-28 2004-12-28 Optical method for detecting the surface structure on thin film of nano crystal

Country Status (1)

Country Link
TW (1) TW200622226A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10030306B2 (en) 2012-10-26 2018-07-24 Applied Materials, Inc. PECVD apparatus and process
CN112361973A (en) * 2020-11-18 2021-02-12 华侨大学 Method for detecting thickness and optical constant of diamond film
TWI756454B (en) * 2017-07-25 2022-03-01 美商克萊譚克公司 Multilayer film metrology using an effective media approximation

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10030306B2 (en) 2012-10-26 2018-07-24 Applied Materials, Inc. PECVD apparatus and process
TWI632250B (en) * 2012-10-26 2018-08-11 應用材料股份有限公司 Pecvd apparatus and process
TWI756454B (en) * 2017-07-25 2022-03-01 美商克萊譚克公司 Multilayer film metrology using an effective media approximation
CN112361973A (en) * 2020-11-18 2021-02-12 华侨大学 Method for detecting thickness and optical constant of diamond film

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