TW200618129A - Substrate heating device - Google Patents
Substrate heating deviceInfo
- Publication number
- TW200618129A TW200618129A TW094132156A TW94132156A TW200618129A TW 200618129 A TW200618129 A TW 200618129A TW 094132156 A TW094132156 A TW 094132156A TW 94132156 A TW94132156 A TW 94132156A TW 200618129 A TW200618129 A TW 200618129A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- heater
- lifter pins
- heating device
- heating
- Prior art date
Links
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The object of the present invention is to provide a substrate heating device capable of coping with changes in size of substrate, and preventing the characteristics of coated film deposited on the substrate from being uneven without locally heating the substrate with lifter pins. The solution of the present invention is that a substrate heating device is provided with a heating section 2 that heats uniformly almost the entire surface of a substrate 1 on which a film or laminated deposition is formed, a number of the lifter pins 5 that receive and support the substrates and are penetratably-protrudably/sinkably-retreatably provided from a number of pin holes 3 provided in the heater 2, and a substrate receiving mechanism including a pin driver 6 that drives a number of the lifter pins 5 forward and backward, the substrate receiving mechanism is configured to protrude the lifter pins 5 through the pin holes 3 of the heater 2 to allow the lifter pins 5 to support the substrate 1 and to receive the substrate 1 and to sink the protruding lifter pins 5 back into the heater 2 so as to carry the substrate 1 in a condition of resting on or being close to the heater 2 and to allow the heater 2 to uniformly heating almost the entire surface of the substrate 1, and is characterized in that the lifter pins 5 that are can be sunk and retreated to load the substrate 1 received and supported by the lifter pins 5 on the heater 2 are configured so as to be able to sink/retreat in the pin driver 6 from the heater 2 further to a lower position without allowing the lifter pins to stand by in the heater 2, and the lifter pins 5 are configured so as to be penetratable/protrudable from a position lower the heater 2.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004344263 | 2004-11-29 | ||
JP2005245055A JP2006179859A (en) | 2004-11-29 | 2005-08-25 | Substrate heating device |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200618129A true TW200618129A (en) | 2006-06-01 |
Family
ID=36733633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094132156A TW200618129A (en) | 2004-11-29 | 2005-09-16 | Substrate heating device |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006179859A (en) |
KR (1) | KR20060059809A (en) |
TW (1) | TW200618129A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI564668B (en) * | 2014-09-25 | 2017-01-01 | 上海和輝光電有限公司 | Method and device for producting photoresist pattern and pre-bake device of producting photoresist |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2065177B1 (en) * | 2007-11-30 | 2010-08-18 | Komax Holding AG | Hotplate with lifting element |
KR102630782B1 (en) | 2016-08-19 | 2024-01-31 | 삼성전자주식회사 | Substrate treating apparatus |
-
2005
- 2005-08-25 JP JP2005245055A patent/JP2006179859A/en active Pending
- 2005-09-16 TW TW094132156A patent/TW200618129A/en unknown
- 2005-11-04 KR KR1020050105455A patent/KR20060059809A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI564668B (en) * | 2014-09-25 | 2017-01-01 | 上海和輝光電有限公司 | Method and device for producting photoresist pattern and pre-bake device of producting photoresist |
Also Published As
Publication number | Publication date |
---|---|
JP2006179859A (en) | 2006-07-06 |
KR20060059809A (en) | 2006-06-02 |
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